KR20010028523A - Micro passive element and method for manufacturing micro passive element - Google Patents
Micro passive element and method for manufacturing micro passive element Download PDFInfo
- Publication number
- KR20010028523A KR20010028523A KR1019990040802A KR19990040802A KR20010028523A KR 20010028523 A KR20010028523 A KR 20010028523A KR 1019990040802 A KR1019990040802 A KR 1019990040802A KR 19990040802 A KR19990040802 A KR 19990040802A KR 20010028523 A KR20010028523 A KR 20010028523A
- Authority
- KR
- South Korea
- Prior art keywords
- forming
- mold
- passive element
- insulation film
- depositing
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000009413 insulation Methods 0.000 abstract 5
- 238000000151 deposition Methods 0.000 abstract 4
- 239000004020 conductor Substances 0.000 abstract 3
- 238000000059 patterning Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 229910001004 magnetic alloy Inorganic materials 0.000 abstract 2
- 230000002500 effect on skin Effects 0.000 abstract 1
- 239000012634 fragment Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F17/0033—Printed inductances with the coil helically wound around a magnetic core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Coils Or Transformers For Communication (AREA)
Abstract
PURPOSE: A micro passive element and method for manufacturing micro passive element is provided to reduce skin effect and eddy current losses in a high frequency by dividing the magnetic core into a plurality of rectangular fragments. CONSTITUTION: A micro passive element comprises a substrate; upper and lower magnetic cores(1,2) formed onto the substrate; a plurality of side magnetic cores(3) arranged between each of edges of upper and lower magnetic cores; conductive lines(5,6) wound at the circumference of the side magnetic core. A method comprises the steps of forming a first mold for forming the lower magnetic core by forming a sacrificial layer onto the substrate and patterning the resultant structure; depositing magnetic alloys to the first mold and forming an insulation film all over the resultant structure; forming a second mold for forming the lower conductive line by forming and patterning the sacrificial layer onto the insulation film; depositing a conductive material onto the second mold and forming an insulation film all over the resultant structure; selectively forming a via to the conductive material, and forming a third mold by forming and patterning a sacrificial layer onto the insulation film; depositing a conductive material onto the third mold and forming an insulation film all over the resultant structure; forming a fourth mold and a fifth mold; and depositing magnetic alloys to the fifth mold and removing the sacrificial layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990040802A KR100357096B1 (en) | 1999-09-21 | 1999-09-21 | micro passive element and fabrication method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990040802A KR100357096B1 (en) | 1999-09-21 | 1999-09-21 | micro passive element and fabrication method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010028523A true KR20010028523A (en) | 2001-04-06 |
KR100357096B1 KR100357096B1 (en) | 2002-10-18 |
Family
ID=19612547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019990040802A KR100357096B1 (en) | 1999-09-21 | 1999-09-21 | micro passive element and fabrication method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100357096B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100776406B1 (en) * | 2006-02-16 | 2007-11-16 | 삼성전자주식회사 | Micro inductor and fabrication method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5945902A (en) * | 1997-09-22 | 1999-08-31 | Zefv Lipkes | Core and coil structure and method of making the same |
-
1999
- 1999-09-21 KR KR1019990040802A patent/KR100357096B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100776406B1 (en) * | 2006-02-16 | 2007-11-16 | 삼성전자주식회사 | Micro inductor and fabrication method |
Also Published As
Publication number | Publication date |
---|---|
KR100357096B1 (en) | 2002-10-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
N231 | Notification of change of applicant | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20070918 Year of fee payment: 6 |
|
LAPS | Lapse due to unpaid annual fee |