KR20010016585A - Continuous wire feeding equipment of vacuum evaporation material - Google Patents
Continuous wire feeding equipment of vacuum evaporation material Download PDFInfo
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- KR20010016585A KR20010016585A KR1020000081351A KR20000081351A KR20010016585A KR 20010016585 A KR20010016585 A KR 20010016585A KR 1020000081351 A KR1020000081351 A KR 1020000081351A KR 20000081351 A KR20000081351 A KR 20000081351A KR 20010016585 A KR20010016585 A KR 20010016585A
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- evaporation
- evaporation material
- evaporating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
본 발명의 증발물질 연속공급장치는 양산용 진공증착기(Vacuum Evaporator)에 적용할 수 있는 장치이다. 본 장치는 다량의 증발원을 증발용기에 일정한 속도로 장시간동안 안정적으로 공급해줌으로써 한번에 많은 제품의 표면에 박막을 증착시켜 줄 수 있다. 또한 증발물질 공급장치를 증발 용기와 전기적으로 절연시킴으로써 기판과 증발용기 사이에 전계를 인가하여 방전을 시키면서 박막이 제조되는 이온플레이팅 방법도 가능하게된다.Evaporation material continuous supply device of the present invention is a device that can be applied to the mass production vacuum evaporator (Vacuum Evaporator). This device can deposit a thin film on the surface of many products at once by supplying a large amount of evaporation source to the evaporation vessel stably for a long time at a constant speed. In addition, an ion plating method in which a thin film is manufactured while discharging by applying an electric field between the substrate and the evaporation vessel by electrically insulating the evaporation material supply device from the evaporation vessel is also possible.
따라서 증발물질 연속공급장치는 반도체공정의 금속박막제조부문, 광학렌즈의 멀티코팅부문, 박막들로 이루어진 첨단소재 연구부문 등과 산업용 소재 등에 이용되는 각종 진공증착기에 증발물질을 연속적으로 안정되게 공급할 수 있는 장치로 사용될 수 있다.Therefore, the continuous evaporation material supplying device can stably supply evaporation materials to various vacuum evaporators used in metal thin film manufacturing, semiconductor lens multi-coating, high-tech materials research, etc. Can be used as a device.
종래의 권선형 증발물질선 공급장치는 압연형 롤러의 양 축에 스프링을 직접 연결하여 압력을 전달하여 증발물질선을 잡아당김으로서 속도가 변하게 되면 그 힘이 충분치 않아 일정한 속도의 증발원 공급이 원활히 이루어지지 않았으며, 증발물질선의 강도에 따라 롤러사이의 압력을 조절하여 공급할 필요가 있으나 압력을 변화시키기가 힘든 구조를 가지고 있다.Conventional winding evaporation material wire supply device is connected to the springs directly on both shafts of the rolling roller to transfer the pressure to pull the evaporation material wire by pulling the evaporation material wire is not enough force to supply the evaporation source at a constant speed smoothly It is not supported, and it is necessary to control the pressure between the rollers according to the strength of the evaporation material line, but it has a structure that is difficult to change the pressure.
또한 전극 위에 직접 가열을 위한 증발용기와 공급되는 증발물질선이 계속적인 접촉으로 공급장치와 증발용기가 전기적 위치에너지가 같고 동일 전극이 됨으로써, 이온 플레이팅 방법으로 증착 할 때는 증발물질 공급장치와도 방전이 일어나 증발 물질의 이온화율이 떨어지는 현상이 있어 박막의 질이 나빠지는 문제점이 있다.In addition, the evaporation vessel for direct heating and the evaporation material line supplied are continuously contacted with each other so that the supply device and the evaporation vessel have the same electrical potential energy and become the same electrode. There is a problem that the discharge occurs due to the phenomenon that the ionization rate of the evaporation material falls, the quality of the thin film is bad.
본 발명에서는 진공 증착기에서 선형 증발물질을 연속으로 공급해 줄 때 회전축에 볼트 혹은 스프링볼트(3)로 베아링을 통해 상단롤러(1)에 적합한 가변적 압력을 제공할 수 있게 설계하여 증발물질선 종류에 따라 쉽게 적용할 수 있는 구조로 바꾸었다. 또한 진공 증착기에서 선형 증발물질선을 연속공급시 증발물질이 증발원(가열된 보트 등)에 도달하여 증발원과 동일 전위를 가지므로 해서 일어 날 수 있는 각종 방전을 방지하고, 열에너지 손실을 최소로 하기 위해서 증발물질 출구(17), 롤러(1), 가이드(13) 및 회전실패(7)의 최소의 부품만 기타장치와 전기적으로 절연시키고, 장치 내부에 숨기는 구조로 변경시켰다.In the present invention, when the linear evaporation material is continuously supplied from the vacuum evaporator, it is designed to provide a variable pressure suitable for the upper roller (1) through the bearing to the rotating shaft with a bolt or spring bolt (3) according to the type of evaporation material line Changed to a structure that can be easily applied. In addition, when the linear evaporation material line is continuously supplied from the vacuum evaporator, the evaporation material reaches the evaporation source (heated boat, etc.) and has the same potential as the evaporation source to prevent various discharges that may occur and to minimize thermal energy loss. Only the minimum parts of the evaporation material outlet 17, the roller 1, the guide 13, and the rotational failure 7 were electrically insulated from other devices and changed into a structure that was hidden inside the device.
도 1은 본 발명에 따른 진공 증발물질 연속공급장치의 평면도1 is a plan view of a vacuum evaporation material continuous supply apparatus according to the present invention
도 2는 도 1의 A-A'단면도FIG. 2 is a cross-sectional view taken along the line A-A 'of FIG.
도 3은 도 1의 B-B'단면도3 is a cross-sectional view taken along line B-B 'of FIG.
도 4는 도 1의 D에서 본 상세도4 is a detailed view as seen from D of FIG.
도 5는 도 1의 C부분의 상세도5 is a detailed view of the portion C of FIG.
도 6은 도 2의 E부분의 상세도6 is a detailed view of the portion E of FIG.
도 7은 도 2의 F부분의 상세도7 is a detailed view of the portion F of FIG.
도 8은 증발물질선을 밀어내는 롤러 축의 단면도8 is a cross-sectional view of the roller shaft for pushing off the vaporization material line;
〈도면의 주요부분에 대한 부호의 설명〉<Explanation of symbols for main parts of drawing>
1 : 상단롤러 2 : 회전용기어 3 : 볼트 혹은 스프링 볼트1: upper roller 2: rotating gear 3: bolt or spring bolt
4-1, 4-2, 4-3 : 베어링 5-1 : 상부구동축 5-2 : 하부구동축4-1, 4-2, 4-3: Bearing 5-1: Upper drive shaft 5-2: Lower drive shaft
6, 6-1, 6-2, 6-3, 6-4, 6-5 : 절연세라믹6, 6-1, 6-2, 6-3, 6-4, 6-5: Insulated ceramic
7 : 회전실패 8 : 실패날개 9 : 핸들7: Rotating failure 8: Failed wing 9: Handle
10 : 세라믹 판 11 : 튜브 12 : 스테인레스 판10 ceramic plate 11 tube 12 stainless plate
13 : 가이드 14 : 세라믹 15 : 스프링13: guide 14: ceramic 15: spring
16 : 증발물질선 17 : 증발물질선 출구16 evaporation material line 17 evaporation material line exit
이하 첨부된 도면에 의해 상세히 설명하면 다음과 같다.Hereinafter, described in detail by the accompanying drawings as follows.
도 1은 증발물질 공급장치의 전체적인 구조를 나타낸다. 장치의 전체적인 구조는 스테인레스로 만들어져 있으며 증발용기로부터 전기적 절연을 시키기 위해 고순도 세라믹(알루미나)을 이용하였다. 연속적이며 원활한 증발선의 공급을 위해 동력 전달을 직결형으로 하였으며, 기계적·전기적인 안전성을 확보하기 위해 증발물질선이 접촉할 수 있는 부분들을 절연시켰다.Figure 1 shows the overall structure of the evaporation material supply device. The overall structure of the device is made of stainless steel and high purity ceramics (alumina) are used to provide electrical insulation from the evaporation vessel. In order to supply continuous and smooth evaporation line, power transmission is directly connected and insulated parts that evaporation material line can contact to ensure mechanical and electrical safety.
진공챔버 내부에 공급장치가 설치되며 전동모터를 동력원으로 하고 진공용 통해 연결되어 공급장치의 회전축이 구동된다. 도 2는 공급장치의 상세 단면도로서 A-A'단면을 도시하여 보여주고 있다. 회전용 기어(2)에 의해 회전하는 상단롤러(1)가 실제로 증발선을 잡아당기는 역할을 하게 된다. 도 2의 F에서 보이듯이 증발선이 잘 끌려나오도록 빗살무늬처리를 하였다. 단면 A-A'에서 상부구동축(5-1)은 동력 전달축으로 그 위치가 고정되어 있으며 베어링(4)으로 고정되어 있다. 하부구동축(5-2)은 약 1.5mm가량 상하 간격을 조절할 수 있도록 위쪽에 볼트(3)를 부착하였으며 축의 양쪽 끝은 베어링(4)에 고정시켜 원활한 회전이 가능하도록 하였다. 상부구동축(5-1)의 간격 조절은 사용되는 증발선의 굵기와 공급속도의 다양화에 대응하기 위함이다.The supply device is installed inside the vacuum chamber, and the rotary motor of the supply device is driven by connecting the electric motor as a power source and connected for vacuum. Figure 2 shows a cross-sectional view A-A 'as a detailed cross-sectional view of the feeder. The upper roller 1 rotating by the rotating gear 2 actually serves to pull the evaporation line. As shown in FIG. 2F, the comb pattern treatment was performed so that the evaporation line was well drawn. In the section A-A ', the upper drive shaft 5-1 is fixed to the power transmission shaft and fixed to the bearing 4. The lower driving shaft (5-2) was attached to the upper bolt (3) to adjust the vertical gap about 1.5mm and both ends of the shaft was fixed to the bearing (4) to enable a smooth rotation. The interval adjustment of the upper drive shaft (5-1) is to cope with the divergence of the thickness and feed rate of the evaporation line used.
단면 B-B'는 금속선을 감아놓는 실패의 단면도로서 회전실패(7)에 금속선이 감기게 되고 축은 역시 베어링(4)으로 고정되어 있으며 그 외부에는 세라믹(6)으로 둘러싸여져 있게 된다. 그리하여 금속선은 지지구조물과 전기적 절연이 이루어지게 된다. 금속선이 다 소모된 경우에는 회전축 끝 부분의 핸들을 풀고 회전실패축을 교체하거나 증발선을 보충한 뒤 다시 장착하여 사용하면 된다.The cross-section B-B 'is a cross-sectional view of the failure of winding the metal wire, and the metal wire is wound around the rotational failure 7, the shaft is also fixed by the bearing (4) and the outside is surrounded by the ceramic (6). Thus, the metal wire is electrically insulated from the supporting structure. When the metal wire is exhausted, you can loosen the handle at the end of the rotating shaft and replace the rotating shaft or replace the evaporation line and refit it.
도 1의 C는 증발선 공급 보조장치로서 증발선이 지그재그 방향으로 풀리더라도 공급되는 방향이 가운데로 모이게끔 해준다.1C is an evaporation line supply assistance device, which allows the supply direction to be centered even when the evaporation line is released in the zigzag direction.
다음으로 상세도 C인 도 5에서도 마찬가지로 선이 닿는 부분이므로 세라믹 튜브를 사용하여 바닥과 절연시켰다. 그리고 증발선이 물려 들어가게 되는 출구부분 또한 전기적 절연을 위해 도면 4 도와 같이 튜브와 앞판 사이에 세라믹을 사용하여 절연시켰다. 도 8은 세라믹 막대를 축에 관통시켜 롤러가 회전할 수 있도록 구동력을 전달하며 그 외부에 세라믹 반원 링을 두름으로서 축과 접촉되는 롤러면이 전기적으로 분리되게 하였다. 도 3은 권선형 회전대이며 권선회전축과 지지대를 절연세라믹(6-1)으로 절연시킴. 상기와 같이 증발용기로부터 증발선을 타고 들어올 수 있는 모든 전류를 차단함으로써, 각종방전을 미연에 방지하여 증발선 공급시 전기적으로 안정된 공급을 유지할 수 있게 하였다.Next, as shown in FIG. 5, which is detail C, the wires are similarly insulated from the bottom using a ceramic tube. In addition, the outlet portion into which the evaporation line is fed is also insulated using ceramic between the tube and the front plate as shown in FIG. 4 for electrical insulation. FIG. 8 transmits a driving force to allow the roller to rotate by passing the ceramic rod through the shaft, and the roller surface in contact with the shaft is electrically separated by placing a ceramic semicircle ring on the outside thereof. Figure 3 is a winding type rotary table and insulates the winding shaft and the support with an insulating ceramic (6-1). By blocking all currents that can enter the evaporation vessel from the evaporation vessel as described above, it is possible to prevent various discharges in advance to maintain an electrically stable supply when supplying the evaporation vessel.
본 발명으로 진공 증착기에서 선형 증발물질을 연속으로 안정되게 공급해 줄 수 있게되었으며, 적합하면서 일정한 압력을 제공할 수 있게 설계되어 있어 증발물질선 종류에 따라 쉽게 변경 적용할 수 있는 구조를 갖추었다. 또한 진공 증착기에서 선형 증발물질선을 연속공급시 증발물질이 증발원(가열된 보트 등)에 도달하여 증발원과 동일 전위를 가지므로 해서 일어 날 수 있는 각종 방전을 방지하고, 열에너지 손실을 최소화 할 수 있게 되어 진공증착 또는 이온플레이팅 증착시 박막의 질을 향상시킬 수 있게 된다.According to the present invention, it is possible to stably supply linear evaporation material continuously in a vacuum evaporator, and is designed to provide a suitable and constant pressure so that the evaporation material can be easily changed and applied according to the type of evaporation material. Also, when the linear evaporation material line is continuously supplied from the vacuum evaporator, the evaporation material reaches the evaporation source (heated boat, etc.) and has the same potential as the evaporation source to prevent various discharges that may occur and to minimize thermal energy loss. Therefore, it is possible to improve the quality of the thin film during vacuum deposition or ion plating deposition.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03294481A (en) * | 1990-04-10 | 1991-12-25 | Matsushita Electric Ind Co Ltd | Vacuum vapor deposition apparatus |
KR19990012829A (en) * | 1997-07-31 | 1999-02-25 | 손욱 | Vacuum deposition equipment |
KR0181535B1 (en) * | 1995-12-30 | 1999-04-15 | 김광호 | Temperature compensated reference current generating circuit |
KR19990075346A (en) * | 1998-03-19 | 1999-10-15 | 손욱 | Vacuum Evaporator and Deposition Method Using the Same |
KR20000006965A (en) * | 1999-11-16 | 2000-02-07 | 이경희 | Thin layer film fabrication method and it's fabrication machine |
-
2000
- 2000-12-23 KR KR1020000081351A patent/KR20010016585A/en not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03294481A (en) * | 1990-04-10 | 1991-12-25 | Matsushita Electric Ind Co Ltd | Vacuum vapor deposition apparatus |
KR0181535B1 (en) * | 1995-12-30 | 1999-04-15 | 김광호 | Temperature compensated reference current generating circuit |
KR19990012829A (en) * | 1997-07-31 | 1999-02-25 | 손욱 | Vacuum deposition equipment |
KR19990075346A (en) * | 1998-03-19 | 1999-10-15 | 손욱 | Vacuum Evaporator and Deposition Method Using the Same |
KR20000006965A (en) * | 1999-11-16 | 2000-02-07 | 이경희 | Thin layer film fabrication method and it's fabrication machine |
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