KR20000063944A - The Removing Compositions and Polishing Pads for Manicure - Google Patents

The Removing Compositions and Polishing Pads for Manicure Download PDF

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Publication number
KR20000063944A
KR20000063944A KR1020000046711A KR20000046711A KR20000063944A KR 20000063944 A KR20000063944 A KR 20000063944A KR 1020000046711 A KR1020000046711 A KR 1020000046711A KR 20000046711 A KR20000046711 A KR 20000046711A KR 20000063944 A KR20000063944 A KR 20000063944A
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South Korea
Prior art keywords
nail
manicure
acid
removing composition
nail polish
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KR1020000046711A
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Korean (ko)
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김대원
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김대원
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Priority to KR1020000046711A priority Critical patent/KR20000063944A/en
Publication of KR20000063944A publication Critical patent/KR20000063944A/en

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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/37—Esters of carboxylic acids
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
    • A61K8/0208—Tissues; Wipes; Patches
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/49—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
    • A61K8/4906—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with one nitrogen as the only hetero atom
    • A61K8/4913—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with one nitrogen as the only hetero atom having five membered rings, e.g. pyrrolidone carboxylic acid
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q3/00—Manicure or pedicure preparations
    • A61Q3/04—Nail coating removers
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
    • A61K2800/80—Process related aspects concerning the preparation of the cosmetic composition or the storage or application thereof
    • A61K2800/87—Application Devices; Containers; Packaging

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Emergency Medicine (AREA)
  • Cosmetics (AREA)

Abstract

PURPOSE: A manicure removing composition and a remover pads containing same are provided, which remove manicure rapidly by rubbing without giving damage to nail or skin, and make nail to be strengthen and show skin moisturizing effect. CONSTITUTION: A process for the preparation of manicure removing composition and remover pads containing same comprises of: mixing Esteres of lactic acid 10-50%(based on volume), 15-30% of dimethylester of Glutaric acid Adipic acid, Succic acid, tetrahydrofurfuryl alcohol 10-30%, fruit-odor syrup 2-5% fully; adding aloe vera 0.1-2%, propylene glycol or glycerin 0.1-3% to strenthen nail and to maintain moisture on skin around the nail; mixing thoroughly to gain objective manicure removing composition. The remover pads is manufactured by pouring the manicure removing composition to an adequate size of tissue or cosmetic cotton, which is packed in a vacuumed container or an aluminium foil.

Description

매니큐어 제거액 조성물 및 그 조성물이 함침된 리무브 패드{The Removing Compositions and Polishing Pads for Manicure}The nail polish removal liquid composition and the removal pad impregnated with the composition TECHNICAL FIELD

본 발명은 손톱에 칠해진 매니큐어를 인체에 유해함이 없이 손쉽고 간편하게 지울 수 있는 매니큐어 제거액 조성물 및 그 조성물이 함침된 리무브 패드(Remover Pads)에 관한 것이다. 보다 자세하게는 락트산, 글루타르산, 아디프산, 숙신산 의 에스테르에 알코올, 알로에 베라 및 향료를 일체로 혼합한 신규 매니큐어 제거액 조성물에 적당한 크기로 재단된 메쉬형태의 부직포, 티슈 등을 함침시켜 밀폐 용기 또는 알루미늄 호일로 낱장 또는 여러장을 포장하여 사용자가 휴대하면서 필요시 한 장씩 인출하여 손쉽고 간단하게 사용할 수 있다. 한편, 종래의 매니큐어 제거 조성물의 대부분은 아세톤, 메틸 에틸케톤, 에틸 아세테이트 등 계열로 문지르는 과정에서 매니큐어 제거액의 일부가 손톱 주변의 피부를 하얗게 변색시키고 손톱을 건조하게 하는 등 인체를 손상시키는 문제점이 있었던 것이다. 또한, 종래의 대부분의 제거액은 별도의 솜이나 티슈 등에 묻혀 사용하고 있어 손톱 매니큐어 제거에 있어 제거작업이 번거롭고 시간이 많이 걸리는 단점이 있었다.The present invention relates to a nail polish removal liquid composition which can be easily and simply erased nail polish painted on the nail without harm to the human body and remover pads impregnated with the composition. More specifically, a new nail polish remover composition comprising an ester of lactic acid, glutaric acid, adipic acid, succinic acid, and a mixture of alcohol, aloe vera, and fragrance is impregnated with a non-woven fabric, tissue, etc., cut to a suitable size, and then sealed. Alternatively, by wrapping a single sheet or several sheets with aluminum foil, the user can carry them easily and withdraw them one by one if necessary. On the other hand, most of the conventional nail polish removal composition had a problem of damaging the human body, such as part of the nail polish removal liquid whitening the skin around the nail and drying the nail in the process of rubbing with acetone, methyl ethyl ketone, ethyl acetate, etc. will be. In addition, most of the conventional removal liquid is used to be buried in a separate cotton or tissue, etc. There was a disadvantage that the removal work is cumbersome and time-consuming to remove nail polish.

본 발명은 상기와 같은 제반 문제점을 해결하기 위한 것으로, 본 발명은 매니큐어 등을 이용하여 손톱화장을 한 후 이를 지우고자할 때 피부나 손톱에 손상을 주지 않고 안전하고 손쉽게 매니큐어를 제거할 수 있는 제거액 조성물 및 그 조성물이 함침된 리무브 패드를 제공함에 있다.The present invention is to solve the above-mentioned problems, the present invention is to remove the nail polish using nail polish, etc. when removing it to remove the nail polish can safely and easily remove the nail polish without damage It is to provide a composition and a removable pad impregnated with the composition.

상기의 과제를 달성하기 위하여 본 발명의 구성을 실시예를 인용하여 상세히 설명하고자 한다.In order to achieve the above object, the configuration of the present invention will be described in detail by quoting an embodiment.

(실시예 1)(Example 1)

락트산 에스테르(Esters of lactic acid) 10 내지 50%(이하 부피%), 글루타르산(Glutaric acid), 아디프산(Adipic acid), 숙신산(Succic acid)의 디메틸에스테르 15 내지 30%, 테트라하이드로퍼퓨릴 알코올(Tetrahydrofurfuryl alcohol) 10 내지 30%, 과일향 시럽 2 내지 5%을 충분히 혼합하여 균질화된 매니큐어 제거액 조성물을 제조하였다.Esters of lactic acid 10-50% (hereinafter volume%), glutaric acid, adipic acid, dimethyl ester of succinic acid 15-30%, tetrahydroper 10-30% of tetrahydrofurfuryl alcohol and 2-5% of fruit-flavored syrup were sufficiently mixed to prepare a homogenized nail polish remover composition.

또한, 손톱강화 및 손톱주변피부의 보습유지를 위해 알로에 베라 0.1 내지 2%, 프로필렌 글리콜 또는 글리세린을 0.1 내지 3%를 첨가하여 사용할 수 있다.In addition, aloe vera 0.1 to 2%, propylene glycol or glycerin 0.1 to 3% may be added to the nail for strengthening and maintaining the moisturizing of the peripheral skin of the nail.

(실시예 2)(Example 2)

실시 예1에서 제조된 조성물을 한면이 메쉬형태로 된 약 1mm 두께의 부직포를 직경 약 64mm 크기로 재단하여 얻은 여러장을 전기의 조성물에 충분히 젖게하고 조성액이 어느정도 빠진후 꺼내어 밀폐된 용기에 넣는다. 이러한 함침작업시 조성액의 증발을 막기위해 콘덴사가 부착된 응축기를 가동하는 것도 바람직하다.The composition prepared in Example 1 is obtained by cutting a plurality of sheets obtained by cutting a nonwoven fabric having a thickness of about 1 mm in one side into a mesh of about 64 mm in size by sufficiently wetting the composition and removing the composition liquid to some extent, and then putting the composition into a closed container. In this impregnation operation, it is also preferable to operate a condenser with condensate to prevent evaporation of the composition liquid.

(실시예 3)(Example 3)

상기 실시예 1, 2에 의한 리무브 패드를 통상의 아세톤 계열 매니큐어 제거액과 솜으로 매니큐어 제거 성능 및 사용후 결과를 평가하였다.The remove pads according to Examples 1 and 2 were evaluated using acetone-based nail polish removal solution and cotton, and nail polish removal performance and results after use.

1. 매니큐어 제거 성능실험1. Nail Polish Removal Performance Test

① 대상: 손톱매니큐어 화장을 하지 않은 여성 20명① Subject: 20 women without nail manicure makeup

② 실험방법: 대상 여성 20명의 손톱상태를 먼저 확인한 후 물로 손을 깨끗하게 닦게하고 완전 건조시킨 다음 동일색상 및 성분의 에나멜 매니큐어를 손가락당 2회로 제한하여 화장하게 하였다. 충분한 건조를 위해 3시간후 손톱매니큐어의 화장 상태를 다시 점검하고 여성 20명에게 본 발명에 의한 리무브 패드와 아세톤 계열의 제거액 및 묻힘 솜을 각각 지급하고 매니큐어제거 실험을 하였다.② Experimental Method: After checking the nail condition of 20 female subjects first, clean the hands with water, dry them completely, and then make-up by limiting the enamel nail polish of the same color and composition to 2 times per finger. After 3 hours, the makeup state of the nail manicure was again checked for sufficient drying, and 20 women were given a remove pad and acetone-based removing solution and buried cotton according to the present invention, and a manicure removal experiment was carried out.

③ 제거방법: 인원 개개인의 오른손, 다섯 손가락은 먼저 아세톤 계열을 사용하고 다른 왼손의 다섯 손가락은 본 발명에 의한 리무브 패드를 사용하여 매니큐어를 제거하게 하면서 평균 제거 및 건조시간, 제거후 상태를 측정하였다.③ How to remove: Each person's right hand and five fingers first use the acetone series and the other left hand's five fingers using the remove pad according to the present invention while removing the nail polish while measuring the average removal and drying time, after removal It was.

④ 매니큐어 제거의 결과는 다음 표1과 같다.④ The results of nail polish removal are shown in Table 1 below.

⑤ 실험결과: 실험에 참가한 대상 여성의 70-80%가 본 발명에 의한 제거액의 냄새는 아세톤 제거액에 비해 거부감이 없고 리무브 패드 한 장으로 양손 모두의 매니큐어를 제거할 수 있어 경제적이고 제거 후에도 피부의 건조함이 없다고 피력하였다. 한편 아세톤 제거액에 솜을 젖혀 사용한 경우에는 냄새에 대한 거부감이 있고 손톱 주변에 솜털이 끼이고 일부 여성은 피부가 하얗게 변색되고 건조함을 느꼈다고 했다.⑤ Experimental Results: 70-80% of the women who participated in the experiment had no odor of the removal liquid according to the present invention compared to the acetone removal liquid and can remove the nail polish on both hands with one piece of remove pad. It was said that there was no dryness. On the other hand, when cotton was used in acetone removal solution, there was a sense of rejection of odor, hair was caught around nails, and some women felt skin discoloration and dryness.

이상에서 상세히 설명하고 입증했듯이, 본 발명에 따른 제거액 조성물에 함침된 리무브 패드의 효과는 그 한장 만으로 손톱 전부에 칠해진 매니큐어를 충분히 제거할 수 있어 매우 경제적일 뿐 아니라 알로에 베라, 프로필렌 글리콜 또는 글리세린을 첨가하여 제거액 휘산 후에도 손톱강화 및 손톱주변피부의 보습유지도 기대할 수 있다.As described and demonstrated in detail above, the effect of the remove pad impregnated in the removal liquid composition according to the present invention is not only very economical because it can sufficiently remove the nail polish applied to all the nails with one sheet, but also aloe vera, propylene glycol or glycerin. Even after volatilization of the removal solution, it can be expected to strengthen the nail and moisturize the skin around the nail.

Claims (2)

락트산 에스테르(Esters of lactic acid) 10 내지 50%(이하 부피%), 글루타르산(Glutaric acid), 아디프산(Adipic acid), 숙신산(Succic acid)의 디메틸 에스테르 15 내지 30%, 테트라하이드로퍼퓨릴 알콜(Tetra hydro furfuryl alcohol) 10 내지 30%, 과일향 시럽 2 내지 5%을 충분히 혼합하여 균질화된 매니큐어 제거액 조성물Esters of lactic acid 10-50% (hereinafter volume%), glutaric acid, adipic acid, dimethyl ester of succinic acid 15-30%, tetrahydroper 10% to 30% of tetrahydro furfuryl alcohol and 2% to 5% of fruit flavored syrup are homogenized. 1. 제1항에 있어, 손톱 강화 및 손톱주변피부의 보습유지를 위해 알로에 베라 0.1 내지 2%, 프로필렌 글리콜 또는 글리세린을 0.1 내지 3%를 첨가한 매니큐어 제거액 조성물1. The nail polish removal liquid composition according to claim 1, wherein 0.1 to 2% of aloe vera and 0.1 to 3% of propylene glycol or glycerin are added to strengthen the nails and maintain the moisturizing of the skin around the nails. 2. 제1항에 있어, 한면이 메쉬형태로 된 부직포를 적당한 원형 크기로 재단하여 얻은 여러장을 제1항의 매니큐어 제거액 조성물에 충분히 젖게하고 조성액이 어느정도 빠진 후 꺼내어 밀폐용기나 알루미늄 호일 등에 넣어 포장하는 리무브 패 드의 제조방법2. The product of paragraph 1, which is obtained by cutting a nonwoven fabric having a mesh shape on one side into a suitable circular size and sufficiently wetted with the nail polish removing liquid composition of paragraph 1, after removing the composition liquid to some extent, and then packing it in an airtight container or aluminum foil, etc. Manufacturing method of removable pad
KR1020000046711A 2000-08-11 2000-08-11 The Removing Compositions and Polishing Pads for Manicure KR20000063944A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007142753A1 (en) * 2006-06-09 2007-12-13 Bortz Steven H Lacquer thinner
US8329634B2 (en) 2005-06-10 2012-12-11 Bortz Steven H Water based paint thinner
US8337608B2 (en) 2005-06-10 2012-12-25 Bortz Steven H Soy ester based multi-purpose solvent
JP2019199432A (en) * 2018-05-16 2019-11-21 レック株式会社 Enamel remover

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4781916A (en) * 1984-05-24 1988-11-01 Karl Heinrich Pegel Cosmetic preparation
WO1994016671A1 (en) * 1993-01-22 1994-08-04 Dotolo Research Corporation Nail polish remover
KR950028763A (en) * 1994-04-25 1995-11-22 한동근 Nail Polish Remover Composition
JP2000119142A (en) * 1998-10-08 2000-04-25 Masao Umemoto Nail-enamel remover and manicure solvent

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4781916A (en) * 1984-05-24 1988-11-01 Karl Heinrich Pegel Cosmetic preparation
WO1994016671A1 (en) * 1993-01-22 1994-08-04 Dotolo Research Corporation Nail polish remover
KR950028763A (en) * 1994-04-25 1995-11-22 한동근 Nail Polish Remover Composition
JP2000119142A (en) * 1998-10-08 2000-04-25 Masao Umemoto Nail-enamel remover and manicure solvent

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7785413B2 (en) 2005-06-10 2010-08-31 Bortz Steven H Lacquer thinner
US8329634B2 (en) 2005-06-10 2012-12-11 Bortz Steven H Water based paint thinner
US8337608B2 (en) 2005-06-10 2012-12-25 Bortz Steven H Soy ester based multi-purpose solvent
WO2007142753A1 (en) * 2006-06-09 2007-12-13 Bortz Steven H Lacquer thinner
JP2019199432A (en) * 2018-05-16 2019-11-21 レック株式会社 Enamel remover
JP7075812B2 (en) 2018-05-16 2022-05-26 レック株式会社 Enamel remover

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