KR20000010868A - Positioning device - Google Patents

Abstract

PURPOSE: A positioning device is provided to perform a first process including a series of first positioning steps of a first object holder and a second process including a series of second positioning steps, simultaneously and independently. CONSTITUTION: The device comprises a lead surface extending toward X and Y-directions in parallel, a first and a second object holders respectively led onto the surface to be displaced in parallel with the X and Y-directions, and a displacement system for displacing the holders on the surface. The system includes a first displacement unit and a second displacement unit where the holders are alternatively coupled. The first unit displaces an object holder to an intermediate position between a first position and a second position from the first position, and the second unit displaces the object holder to the second position from the intermediate position.

Description

Positioning device

Lithographic devices and positioning devices of the kind mentioned above are known from EP-A-0 687 957. Known lithographic apparatuses are used for the exposure of semiconductor substrates in the manufacturing process of integrated semiconductor circuits and operate according to the so-called step-and-repeat process. Known positioning devices are used in known lithographic devices for displacing semiconductor substrates with respect to the focusing unit and with respect to the characterization unit. The first position of the known positioning device is a load and unload position in which the semiconductor substrate can be loaded and unloaded from the first or second object holder. The second position of the positioning device is an exposure position at which the semiconductor substrate present on the first or second object holder can be exposed through the focusing unit. The first and second object holders are displaceable by a displacement system of the positioning device, which is not described in EP-A-0 687 957 from the first position to the second position and vice versa. When the first object holder is in the second position and the semiconductor substrate present thereon is exposed, the second object holder is in the first position and the subsequent semiconductor substrate is first loaded on it. The second object holder is then displaced from the first position to the characterization position where the semiconductor substrate present on the second object holder is characterized by the characterization unit. When the second object holder is in the characterization position, the first object holder and the second object holder are displaced like a lockstep. In this manner, the exposure of the semiconductor substrate present on the first object holder and the characterization of the semiconductor substrate present on the second object holder are simultaneously performed, so that a high throughput of the step-and-repeat device is obtained.

A problem with known positioning devices and known lithographic devices is that the characterization of the semiconductor substrate present on the second object holder and the exposure of the semiconductor substrate present on the first object holder are dependent on the lockstep of the first and second object holders. It cannot be done independently of one another due to the same displacement. As a result, the exposure of the semiconductor substrate present on the first object holder cannot begin until the second object holder reaches the characterization position.

The present invention provides a guide surface extending in parallel in the X direction and the Y direction, and first and second object holders which are respectively guided on the guide surface and can be displaced in parallel in the X and Y directions from the first position to the second position. holder, and a displacement system for displacing the first object holder and the second object holder on a guide surface.

The invention also relates to a lithographic apparatus having a radiation source, a mask holder, a focusing unit with a main axis, a characterizing unit and a positioning device, the positioning device being parallel to the X direction perpendicular to the main axis. A guide surface extending parallel to the X direction and a Y direction perpendicular to the main axis, and a second surface respectively guided on the guide surface and displaceable in parallel to the X and Y directions from a first position to a second position positioned near the focusing unit, respectively. And a displacement system for displacing the first substrate holder and the second substrate holder on the first substrate holder, the second substrate holder and the guide surface.

1 schematically depicts a lithographic apparatus according to the invention.

2 is a schematic plan view of a first embodiment of a positioning device according to the invention suitable for use in the lithographic apparatus of FIG.

3 shows the positioning device of FIG. 2 with the two substrate holders of the positioning device in an intermediate position;

4 is a schematic plan view of a second embodiment of a positioning device according to the invention suitable for use in the lithographic apparatus of FIG.

It is an object of the present invention that a first process comprising a first series of positioning steps of a first object holder is carried out simultaneously and independently of a second process comprising a second series of positioning steps of a second object holder. Providing a positioning device of the kind described in the opening paragraph, in which the first process can be carried out with the second object holder and the second process can be carried out simultaneously and independently with the first object holder. Is in.

It is another object of the present invention that a characterization process comprising a first series of positioning steps of a first substrate holder may be performed simultaneously and independently of an exposure process comprising a second series of positioning steps of a second substrate holder. And also to provide a lithographic apparatus of the kind described in the second paragraph in which the characterization process can be carried out with the second substrate holder and the exposure process can be carried out simultaneously and independently with the first substrate holder.

To this end, the positioning device according to the present invention comprises a first displacement unit and a second displacement unit, in which the displacement system can be alternately coupled with the first displacement unit, the first object holder and the second object holder. The displacement unit is adapted to displace the object holder from the first position to an intermediate position between the first position and the second position, and the second displacement unit is adapted to displace the object holder from the intermediate position to the second position. It is done. As a result of using the first and second displacement units, a first process comprising a first series of positioning steps of the first object holder can be performed by the first displacement unit in the first position, and the second object holder The second process comprising a second series of positioning steps of may be performed by the second displacement unit simultaneously and independently of the first process at the second position. When the first process and the second process are finished, the first object holder is displaced from the first position to the intermediate position by the first displacement unit and the second object holder is displaced from the second position to the intermediate position by the second displacement unit. do. In the intermediate position, the first object holder is released from the first displacement unit and engaged with the second displacement unit, while the second object holder is released from the second displacement unit and engaged with the first displacement unit. The first object holder is then displaced from the intermediate position to the second position by the second displacement unit and the second object holder is displaced from the intermediate position to the first position by the first displacement unit. The first process can then be done with the second object holder in the first position, and simultaneously and independently the second process can be done with the first object holder in the second position. Moreover, by using the two displacement units, the distance that each individual unit has to displace the object holder is reduced, so that the required dimensions of the displacement unit are reduced. In addition, the displaceable portion of the first displacement unit and the displaceable portion of the second displacement unit are prevented from having to be configured to pass through each other, so that the displacement unit can be made fairly simple.

To this end, in the lithographic apparatus according to the present invention, the positioning apparatus of the lithographic apparatus is the positioning apparatus according to the present invention, each object holder of the positioning apparatus is a substrate holder of the lithographic apparatus, and the first of the object holder The position is characterized in that the characterization position exists in the vicinity of the characterization unit. With the use of the positioning device according to the invention in a lithographic apparatus according to the invention, the characterization process comprising a first series of positioning steps of the first substrate holder is carried out by the first displacement unit of the positioning device. The exposure process, which can be done in one position, comprising a second series of positioning steps of the second substrate holder, can be done by the second displacement unit of the positioning device simultaneously and independently of the first process in the second position. . The first process can also be done with the second substrate holder in the first position, and simultaneously and independently the second process can be done with the first object holder in the second position.

A particular embodiment of the positioning device according to the invention is the first part of which the displacement unit extends in parallel in the X direction and the first part of the X-motor which is displaceable and alternately to the first object holder and the second object holder. An X-motor having a second part that can be joined, and two Y-motors each having a first part extending parallel to the Y direction and a second part displaceable along the first part of the associated Y-motor; Each comprising a first part of the X-motor of each displacement unit being connected to a second part of the two Y-motors of the associated displacement unit. The first part of the X-motor of each displacement unit is connected to the second part of the two Y-motors of the associated displacement unit, and a relatively firm and stable support of the X-motor by the two Y-motors is obtained, and the displacement The positioning accuracy of the unit is improved. Since the first displacement unit has a limited displacement range from the first position to the intermediate position and the second displacement unit has a limited displacement range from the intermediate position to the second position, the Y-motors of the two displacement units can be arranged in two rows. This enables a dense and simple configuration of the positioning device.

Another embodiment of the positioning device according to the invention rotates around a rotation axis in which the first part of the Y-motor of the two displacement units is displaceable parallel to the X and Y directions and extends perpendicular to the X and Y directions. It is characterized in that it is connected to a common balance unit guided with respect to the base of the positioning device. Since the first part of the Y motor of the displacement unit is connected to the common balance unit, the reaction force of the X-motor and the Y-motor of the displacement unit is transmitted to the balance unit through the first part of the Y-motor and in the X direction and Y The displacement of the balance unit parallel to the direction and the rotation of the balance unit around the axis of rotation about the base. In this way, the transfer of repulsive force to the base, the guide surface and the object holder is prevented as much as possible to further improve the positioning accuracy of the positioning device.

Another embodiment of the positioning device according to the invention respectively comprises a foundation portion on which the object holder is guided on the guide surface and can be combined with a displacement unit and an object table displaceable relative to the foundation portion by the actuator unit of the associated object holder. It is characterized by. In another embodiment of the positioning device, the object table of the object holder is displaceable by the displacement unit with a relatively low precision over a relatively large distance, while the object table is relatively high precision over a relatively small distance by the actuator. It is displaceable. As such, the displacement unit can be quite simple and traditional in shape, while the dimensions of the precise actuator unit can be limited as much as possible.

A particular embodiment of the positioning device according to the invention is that the object table of each of the object holders is displaceable with respect to the base portion parallel to the X direction and parallel to the Z direction extending perpendicular to the X and Y directions, and And a first pivot axis extending parallel to the X direction, a second pivot axis extending parallel to the Y direction and a third pivot axis extending parallel to the Z direction with respect to the base portion. . In this way, high adjustment accuracy of the object table with respect to the base portion is obtained.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

The lithographic apparatus according to the invention shown schematically in FIG. 1 is used for exposing a semiconductor substrate in the manufacturing process of an integrated semiconductor circuit and, when viewed in parallel in the vertical Z direction, the positioning apparatus according to the invention in the following order: (3), a focusing unit 5, a mask holder 7 and a frame 1 for supporting the radiation source 9. A lithographic apparatus is an optical lithographic apparatus in which the radiation source 9 comprises a light source 11. The mask holder 7 extends perpendicular to the Z-direction and can be disposed with a mask 15 and includes a support surface 13 comprising a pattern or sub-pattern of an integrated semiconductor circuit. The focusing unit 5 comprises an optical lens system 17 and an optical reduction factor, for example 4, 5, which is an image or projection system and has a main optical axis 4, 5 extending parallel to the Z axis direction. The positioning device 3 comprises a first substrate holder 21 and a second substrate holder 23 identical to the first substrate holder 21. The substrate holders 21 and 23 each include support surfaces 25 and 27 extending perpendicular to the Z direction. In the case shown in FIG. 1, the first semiconductor substrate 29 is on the support surface of the first substrate holder 21 and the second semiconductor substrate 31 is the support surface 27 of the second substrate holder 23. Above) The positioning device 3 also includes a guide surface 33 extending parallel to the horizontal X direction and parallel to the horizontal Y direction perpendicular to the Z direction. The substrate holders 21, 23 are respectively guided on the guide surface 33 and are displaceable on the guide surface 33 parallel to the X direction and parallel to the Y direction by the displacement system 35 of the positioning device 3, respectively.

In the case shown in FIG. 1, the first substrate holder 21 with the first semiconductor substrate 29 corresponds to the positioning device 3 corresponding to the exposure position of the lithographic apparatus in the vicinity of the focusing unit 5. In the second position. In this position, the light beam generated by the light source 11 is guided through the mask 15 and focused on the first semiconductor substrate 29 by the focusing unit 5 so that the pattern present on the mask 15 is the first semiconductor. Images form on a scale scaled down on the substrate 29. The first semiconductor substrate 29 includes a plurality of individual fields in which the same semiconductor circuit is simulated. The field of the first semiconductor substrate 29 is subsequently exposed through the mask 15 for this purpose. In the exposure process used in the lithographic apparatus of FIG. 1, the first semiconductor substrate 29 and the mask 15 are in a fixed position relative to the focusing unit 5 during exposure of the respective fields of the first semiconductor substrate 29, The next field of the first semiconductor substrate 29 in which the first substrate holder 21 after the exposure of the previously exposed field is displaced parallel to the X direction and / or the Y direction by the displacement system of the positioning device 3 It is a so-called step-and-repeat process that goes to a position relative to the focusing unit 5. This process is repeated many times with different masks each time, so that a complex integrated semiconductor circuit having a stacked structure can be manufactured.

In the case shown in FIG. 1, the second substrate holder 23 with the second semiconductor substrate 31 is at the first position of the positioning device 3 corresponding to the characterization position of the lithographic apparatus. In the case shown, the previous semiconductor substrate fully exposed at the exposure position through the mask 15 is unloaded from the second substrate holder 23 and transferred to the semiconductor substrate stack during manufacturing, not shown in the figure. After the second semiconductor substrate 31 shown in FIG. 1 has just been taken from the stack of semiconductor substrates and loaded onto the second substrate holder 23 and should be exposed through the mask 15 over the first semiconductor substrate 29. Semiconductor substrate. In the characterization position, the second semiconductor substrate 31 is characterized by the characterizing unit 37 of the lithographic apparatus which is also supported by the frame 1. When the second semiconductor substrate 31 is fully characterized and the first semiconductor substrate 29 is fully exposed, the second substrate holder 23 with the second semiconductor substrate 31 is displaced from the characterization position to the exposure position. The first substrate holder 21, displaced by 35 and with the first semiconductor substrate 29, is displaced by the displacement system 35 from the exposure position to the characterization position. The characterizing unit 37 comprises a measuring system used for measuring the field positions of the individual second semiconductor substrates 31 with respect to the second substrate holder 23, for example. Since these positions have already been measured at the characterization position, the individual fields of the second semiconductor substrate 31 continue to measure the position of the second substrate holder 23 relative to the focusing unit 5 so that the focusing unit is in the exposure position. Positioning relative to (5). In this way, the throughput of the lithographic apparatus is significantly improved because the time required for successive semiconductor substrates to position individual fields relative to the focusing unit 5 in the exposure position is significantly limited. Since the position of each of the fields of the individual second semiconductor substrates 31 must be measured at the characterization position, the positioning device in which the second substrate holder 23 with the second semiconductor substrate 31 has a stepwise displacement is at the characterization position. (3) is performed by the displacement system 35. By using two separate identical substrate holders 21 and 23, the exposure process of the semiconductor substrate at the exposure position is concurrent with the unload process of the previous semiconductor substrate and the characterization process of the next semiconductor substrate at the load and characterization position. As can be done, the throughput of the lithographic apparatus is further improved.

As shown in FIG. 2, the displacement system 35 of the positioning device 3 comprises a first displacement unit 39 and a second displacement unit 41. The substrate holders 21, 23 each comprise a gas statically supported foot 43, 45 provided with a static gas bearing in which the associated substrate holders 21, 23 are guided on the guide surface 33. The guide surface 33 consists of an upper surface of the granite block 47 attached to the frame 1 of the lithographic apparatus. Moreover, the substrate holders 21 and 23 are provided with a first coupling member 49 in which the substrate holders 21 and 23 can be selectively coupled to the coupling member of the first displacement unit 39 and the second displacement unit 41, respectively. 51 and the second coupling members 53 and 55, respectively. In the case shown in FIG. 2, the first substrate holder 21 is coupled with the engaging member 59 of the second displacement unit 41 and the second substrate holder 23 is coupled with the first displacement unit 39. Is engaged with the member 57. Alternatively, the first substrate holder 21 is engaged with the engaging member 57 of the first displacement unit 39 and the second substrate holder 23 is the engaging member 59 of the second displacement unit 41. It can be combined with The coupling members 41, 51, 53, 55, 57, 59 may be in the form of, for example, mechanical or electro-mechanical coupling members, which are themselves known and customary.

As shown in Fig. 2, the first displacement unit 39 and the second displacement unit 41 are each of two types of linear X-motors 61 and 63 of the conventional type, which are known per se and are common. Linear Y-motors 65, 67. The X-motors 61, 63 are respectively displaceable along the first portions 73, 75 extending parallel to the X direction and the first portions 73, 75 of the associated X-motors 61, 63. It includes parts 77 and 79 and includes engaging members 57 and 59 of the associated X-motors 61 and 63. Y-motors 65, 67, 69, 71 are first portions 81, 83, 85, 87 extending parallel to the Y direction and first portions of associated Y-motors 65, 67, 69, 71. Second portions 89, 91, 93, 95 displaceable along 81, 83, 85, 87, respectively. The two Y-motors 65 and 67 and the X-motor 61 of the first displacement unit 39 are arranged in H-shape with each other, and the first end 97 and the first part of the X-motor 61 are The second end of 73 is coupled to the second portion 89 of the Y-motor 65 and the second portion 91 of the Y-motor 67, respectively. Similarly, the two Y-motors 69 and 71 of the X-motor 63 and the second displacement unit 41 are arranged in H-shape with each other, and the first end 101 and the X-motor 63 The second end 103 of the first portion 75 is coupled to the second portion 93 of the Y-motor 69 and the second portion 95 of the Y-motor 71, respectively.

In the case shown in FIG. 2, the characterization process comprises a first series of positioning steps of the second substrate holder 23 and the second substrate holder 23 is in a first position or characterization position. By the unit 39. At the same time, the first substrate holder 21 is in the second position or the exposure position and the exposure process comprising the second series of positioning steps of the first substrate holder 21 is carried out by the second displacement unit 41. All. Therefore, as a result of using the first displacement unit 39 and the second displacement unit 41, the characterization process can be performed not only simultaneously but also independently of the exposure process. An exposure process using the first substrate holder 21 and a characterization process using the second substrate holder 23 are performed by the second displacement unit 41 between the exposure position and the exposure position as shown in FIG. 3. Displaced to the intermediate position M ', and the second substrate holder 23 is displaced from the characterization position to the intermediate position M "position between the exposure position and the characterization position by the first displacement unit 39. The intermediate position M', In M ″, the second coupling member 53 of the first substrate holder 21 is released from the coupling member 59 of the second displacement unit 41 and the first coupling member of the second substrate holder 23 ( 51 is released at the engaging member 57 of the first displacement unit 39. Subsequently, as shown in FIG. 3, the coupling member of the first displacement unit 39 is coupled to the first coupling member 49 of the first substrate holder 21 and the coupling member of the second displacement unit 41 ( 59 is coupled to the second coupling member 55 of the second substrate holder 23. Then, the first substrate holder 21 is displaced by the first displacement unit 39 to the characterization position where the substrate existing on the first substrate holder 21 at the intermediate position M 'is unloaded and the next substrate is loaded and characterized. do. At the same time with or independently of them, the second substrate holder 23 is brought into the exposure position by which the substrate present on the second substrate holder 23 is exposed at the intermediate position M ″ by the second displacement unit 41. The first displacement unit 39 is adapted to displace both substrate holders 21, 23 from the first position or the characterization position to the intermediate positions M ', M "and the second displacement unit 41 It is suitable for displacing the holders 21 and 23 from the intermediate position M ', M "to the exposure position, and the distance that each displacement unit 39, 41 has to displace the substrate holders 21 and 23 is reduced, so that the displacement Reduce the required dimensions of the units 39, 41. As shown in Figure 2, in particular the dimensions of the Y-motors 65, 67, 69, 71 of the displacement units 39, 41 are parallel to the Y direction. Significantly reduced when viewed in one direction, moreover, by using two displacement units 39, 41, in particular the displacement system 35, in particular The displaceable parts of the X-motors 61, 63 are prevented from having to be configured to pass through each other, and as a result a relatively simple configuration of the displacement system 35 is achieved. And the arrangement of two H-shaped Y-motors 65, 67, 69, 71 are relatively robust and stable support of the X-motors 61, 63 by the associated Y-motors 65, 67, 69, 71. And the positioning accuracy of the displacement units 39, 41 are good, and when viewed in parallel in the Y direction, the limited displacement range of the displacement units 39, 41 is four Y-motors 65, 67, The mutual arrangement of 69, 71 is possible with two two-row Y-motors 65, 69, 67, 71, respectively, to obtain a positioning device 3 of compact and simple configuration.

4 shows a second embodiment of a positioning device 105 according to the invention suitable for use in a lithographic apparatus according to the invention. Corresponding parts of the first embodiment of the positioning device 3 and the second embodiment of the positioning device 105 are indicated by corresponding reference numerals in FIGS. 2, 3 and 4. The important differences between the positioning devices 3 and 105 will now be described.

Substrate holders 21 and 23 of positioning device 105 are foot statically supported foot, first coupling members 49 and 51 and second coupling members 953 of associated substrate holders 21 and 23. And base portions 107, 109, each including 55. Furthermore, the substrate holders 21, 23 of the positioning device 105 comprise substrate tables 111, 113, which comprise the supporting surfaces 25, 27 of the associated substrate holders 21, 23, respectively. The substrate holders 21, 23 are only schematically shown in FIG. 4, and the base portions 107, 109 of the associated substrate holders 21, 23 have a base portion 107, 109 of the associated substrate holders 21, 23. Actuator units 115 and 117, respectively, that are displaceable relative to each other. In the second embodiment of the positioning device 105 according to the invention, the actuator units 115, 117 are known per se and are conventional and are the substrate tables 111, 113 of the associated substrate holders 21, 23. ) Displacement with respect to the base portions 107, 109 of the associated substrate holders 21, 23 and over a fairly small distance in the direction parallel to the X direction, parallel to the Y direction and parallel to the Z direction with a fairly high precision. And the substrate tables 111 and 113 of the associated substrate holders 21 and 23 are made parallel to the base portions 107 and 109 of the associated substrate holders 21 and 23 and in the X direction with a considerable high accuracy. 1 pivot axis, a second pivot axis extending parallel to the Y direction, a contactless Lorentz-force motor system pivotable over a significantly smaller angle with respect to the third pivot axis extending parallel to the Z direction, respectively. Include. As such, the displacement units 39, 41 constitute so-called coarse-fine displacement units, respectively, wherein the substrate holders 21, 23 with the substrate tables 111, 113 have a significantly greater distance. Displaceable by the X-motors 61, 63 and the Y-motors 65, 67, 69, 71 of the displacement units 39, 41 over and with significantly lower precision, where the substrate tables 111, 113 are It is displaceable by the actuator units 115, 117 of the displacement units 39, 41 with a considerably high precision and at a considerably small distance and at a small angle with respect to the base portions 107, 109 of the substrate holders 21, 23. As such, the X-motors 61, 63 and the Y-motors 65, 67, 69, 71 can be of a relatively simple, conventional and low cost form, while providing the required dimensions and The cost for increasing the precision and the battery actuator units 115 and 117 can be limited as much as possible. Further, by using the actuators 115 and 117 as described above, the controllability of the substrate tables 111 and 113 with respect to the focusing unit 5 and the characterization unit 37 of the lithographic apparatus can be improved.

As also shown in FIG. 4, the first portions 81, 83, 85, 87 of the Y-motors 65, 67, 69, 71 of the displacement units 39, 41 of the positioning device 105. Is fixed to the equilibrium unit 119 common to the two displacement units 39 and 41. The balancing unit 119 extends approximately parallel to the Y direction and extends substantially parallel to the Y direction with the first beam 121 to which the first portion of the Y-motor 65 of the first displacement unit 39 is fixed. And a second to which the first portion 83 of the Y-motor 67 of the first displacement unit 39 and the first first portion 87 of the Y-motor 71 of the second displacement unit 41 are fixed. Beam 123. The first beam 121 and the second beam 123 are interconnected by the first cross beam 125 and the second cross beam 127, and the beams 121, 123 and the cross beams 125, 127 are It is arranged in a quadrangular shape surrounding the granite block 47 supporting the guide surface 33. As schematically shown in FIG. 4, the first beam 121 of the balancing unit 119 is provided over the base 133 of the positioning device 105 and extends parallel to the X and Y directions. Guided by the static gas bearing 129 on the guide surface 131, the second beam 123 of the balancing unit 119 is guided by the correction gas bearing 135 on the other guide surface 131. Therefore, the balancing unit 119 is displaceable in the directions parallel to the X direction and the Y direction, and displaceable in the direction extending parallel to the Z direction. In operation, the repulsive force of the actuator units 115, 117 of the displacement units 39, 41, pointing parallel to the X-direction and / or the Y-direction, causes the X-motors 61, 63 and the Y-motors 65, 67, The repulsive force of the Y-motors 65, 67, 69, 71 of the displacement units 39, 41 which are transmitted to the balance unit 119 via 69, 71 and are directed parallel to the X-direction and / or Y-direction It is delivered directly to the unit 119. Since the balancing unit 119 is guided by the static gas bearings 129 and 135 on the other guide surface 131, the repulsive force is controlled by a relatively small displacement of the balancing unit in a direction parallel to the X and / or Y direction and Z. Almost completely converted to a relatively small rotation of the balancing unit 119 about the axis of rotation extending parallel to the direction. As such, the mechanical vibrations generated by the repulsive force at the base 133 and transmitted to the substrate holders 21 and 23 of the granite block 47 and the lithographic apparatus 105 and to the frame 1 of the lithographic apparatus are Since as much as possible is prevented, the positioning accuracy of the displacement system 35 of the positioning device 105 is further improved.

Another type of displacement unit may be used for the positioning apparatus according to the present invention instead of the displacement units 39 and 41 used for the positioning apparatuses 3 and 105 described above. For example, the displacement units of the positioning device may each have a different linear Y-motor and X-Lorentz-force motor and associated object table for a large distance displacement of a single linear X-motor and associated object holder. It can be seen that the actuator unit may include a Y-Lorentz-force motor alone for a small distance displacement of.

It can also be seen that the present invention also relates to a lithographic apparatus to which an exposure process following the step-and-scan principle is applied. Such lithographic apparatus is provided with an additional positioning device in which the mask holder is displaceable, for example, in the scanning direction parallel to the X direction. According to the step-and-scan process, the mask and the semiconductor substrate are not in a fixed position with respect to the focusing unit during the exposure process but can be simultaneously displaced in the scanning direction, so that the pattern present in the mask is scanned.

Finally, it can be seen that the positioning device according to the invention can be used not only in lithographic devices but also in other devices having two object tables and performing a series of positioning steps simultaneously and independently of each other. Examples are finishing machines, machining tools or devices in which the object to be machined or processed is first characterized with respect to the object holder in the characterization position and subsequently machined or processed in the operating position.

Claims (6)

A guide surface extending parallel to the X and Y directions, a first object holder and a second object holder guided on the guide surface and displaceable in parallel in the X and Y directions from the first position to the second position, respectively; A positioning device having a displacement system for displacing a first object holder and a second object holder, The displacement system includes a first displacement unit and a second displacement unit to which the first object holder and the second object holder can be alternately coupled, the first displacement unit being adapted to move the object holder from the first position to the first position and the first position. And a second displacement unit displaces the object holder from the intermediate position to the second position between the two positions. The apparatus of claim 1, wherein the displacement unit is configured to be displaceable along the first portion of the X-motor and the first portion respectively extending parallel to the X direction and alternately coupled to the first object holder and the second object holder. Each displacement unit comprising an X-motor with two parts and two Y-motors each having a first part extending parallel to the Y direction and a second part displaceable along the first part of the associated Y-motor; And the first portion of the X-motor of is connected to the second portions of the two Y-motors of the associated displacement unit. 3. The device of claim 2, wherein the first portion of the Y-motor of the two displacement units is guided relative to the base of the positioning device to be displaceable parallel to the X and Y directions and to extend perpendicular to the X and Y directions. A positioning device, characterized in that connected to a common balance unit that is rotatable about a rotation axis. 4. An object holder according to claim 1, 2 or 3, wherein the object holder is guided onto the guiding surface and can be coupled to the displacement unit, respectively, and an object table displaceable relative to the foundation by the actuator unit of the associated object holder. Positioning apparatus comprising a. 5. An object table according to claim 4, wherein the object table of each object holder is displaceable with respect to a base portion parallel to the Z direction parallel to the X direction, the Y direction and extending perpendicular to the X direction and the Y direction, and extending parallel to the X direction And a first pivot axis, a second pivot axis extending parallel to the Y direction, and a base portion around the third pivot axis extending parallel to the Z direction. A radiation source, a mask holder, a focusing unit with a major axis, a characterizing unit and a positioning device are provided, the positioning device extending parallel to the X direction perpendicular to the main axis and parallel to the X direction and the Y direction perpendicular to the main axis. A first substrate holder and a second substrate holder and a first substrate holder on the guide surface, the first substrate holder being respectively guided on the guide surface and displaceable in parallel to the X and Y directions from a first position to a second position in the vicinity of the focusing unit; A lithographic apparatus comprising a displacement system for displacing a second substrate holder, the lithographic apparatus comprising: The positioning apparatus of the lithographic apparatus is a positioning apparatus as described in claim 1, 2, 3, 4 or 5, wherein each object holder of the positioning apparatus is a substrate holder of the lithographic apparatus. And the first position of the object holder is a characterization position existing near the characterization unit.