KR20000010119A - METHOD FOR COATING DEVICE FOR DENTAL ORTHOPEDICS USING TiN ION PLATING APPARATUS - Google Patents

METHOD FOR COATING DEVICE FOR DENTAL ORTHOPEDICS USING TiN ION PLATING APPARATUS Download PDF

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KR20000010119A
KR20000010119A KR1019980030862A KR19980030862A KR20000010119A KR 20000010119 A KR20000010119 A KR 20000010119A KR 1019980030862 A KR1019980030862 A KR 1019980030862A KR 19980030862 A KR19980030862 A KR 19980030862A KR 20000010119 A KR20000010119 A KR 20000010119A
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ion plating
coating
plating apparatus
color
tin
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KR1019980030862A
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KR100304389B1 (en
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최만용
김교한
권오원
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정명세
한국표준과학연구원
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: A method for coating a device for dental orthopedics by using a TiN ion plating apparatus is provided which forms a film having a bright color and a high chroma on a surface of the device and removes rejection and discomfort of patients or other persons. CONSTITUTION: A method for coating a device for dental orthopedics using a Tin ion plating apparatus comprises the steps of:maintaining at 10¬(-5) to 10¬(-7) torr with a known ARC discharging high vacuum ion plating device; and vaporizing Ti by an electron beam at the internal temperature of the vacuum chamber of 250°C to generate TiN ions, the TiN ions reacting with nitrogen for 30 minutes to form a coating of 1 to 2 micrometers in thickness.

Description

ＴｉＮ 이온 플레이팅 장치를 이용한 치과교정용 장치의 코팅방법Coating method of orthodontic device using TiN ion plating device

본 발명은 TiN 이온 플레이팅 장치를 이용한 치과교정용 장치의 코팅방법에 관한 것으로, 더욱 상세하게는 이온 플레이팅 장치를 사용하여 치과교정용으로 사용되는 기구 표면에 황색을 띄면서 채도가 큰 피막을 형성함으로써, 환자가 시술중이나 시술후에 금속성 기구 때문에 생기는 거부감을 없앨 수 있고, 또한 심미감을 높일 수 있는 TiN 이온 플레이팅 장치를 이용한 치과교정용 장치의 코팅방법에 관한 것이다.The present invention relates to a coating method of a device for orthodontic treatment using a TiN ion plating apparatus, and more particularly to a yellow saturation coating on the surface of the instrument used for orthodontic treatment using an ion plating apparatus. The present invention relates to a method for coating a device for orthodontics using a TiN ion plating apparatus which can eliminate the objection caused by metallic instruments during or after a procedure and can enhance aesthetics.

일반적으로 치과교정용 장치, 예를 들어 교정용 브라켓이나 밴드 또는 선재는 주로 스테인레스 스틸이나 Co-Cr등의 비귀금속으로 이루어져 있다.Generally, orthodontic devices, for example orthodontic brackets or bands or wires, are mainly made of non-noble metals such as stainless steel or Co-Cr.

그러나, 이러한 장치는 재질이 대개 은색계통의 색채를 띄게 되어 치아교정을 위한 시술시 환자가 금속 색깔 때문에 거부감을 가지게 되고, 이에 따라 교정치료를 회피하는 경향이 있었다.However, these devices usually have a silver system color, and thus patients have rejections due to the metal color during orthodontic treatment, thus tending to avoid orthodontic treatment.

본 발명은 이러한 점을 감안하여 안출한 것으로, 통상의 이온 플레이팅 장치를 사용하여 교정구의 표면을 TiN으로 코팅처리하여 밝은 색상과 높은 채도를 갖게 함으로써, 치아를 교정하기 위한 시술시에 환자가 금속성 기구에 대한 거부감을 느껴 교정치료를 회피하는 것을 막을 수 있고, 또한 시술후에 환자나 그 주변 사람들로 하여금 불쾌감을 없앨 수 있는 TiN 이온 플레이팅 장치를 이용한 치과교정용 기구의 코팅방법를 제공하는데 그 목적이 있다.The present invention has been made in view of this point, and the surface of the orthodontic appliance is coated with TiN using a conventional ion plating apparatus to have a bright color and high saturation, so that the patient is metallic during the procedure for correcting teeth. The object of the present invention is to provide a coating method for orthodontic appliances using TiN ion plating apparatus, which can prevent the orthodontic treatment from being avoided due to the objectionability of the instrument and also eliminate the discomfort after the procedure. have.

이러한 목적을 달성하기 위해, 본 발명은 통상의 ARC 방전형 고진공 이온 플레이팅 장치를 사용하여 10-5∼10-7torr를 유지하고, 이 장치의 진공조 내부 온도를 250℃에서 전자 빔(beam) 방식으로 Ti를 증발시키면서 이때에 발생된 이온이 질소와 30분간 반응하여 피막이 형성되게 한 것을 특징으로 하는 것이다.In order to achieve this object, the present invention maintains 10 -5 to 10 -7 torr using a conventional ARC discharge type high vacuum ion plating apparatus, and maintains the temperature inside the vacuum chamber of the apparatus at 250 ° C. While evaporating the Ti in a) method, the generated ions react with nitrogen for 30 minutes to form a film.

도 1은 본 발명에 따른 TiN와 두가지 금합금(gold alloy)의 색채를 비교하여 나타낸 그래프.1 is a graph comparing the colors of TiN and two gold alloys according to the present invention.

이하, 본 발명을 보다 상세하게 설명하면 다음과 같다.Hereinafter, the present invention will be described in more detail.

본 발명은 치과교정을 위해 사용되는 교정용 브라켓이나 밴드, 또는 선재와 같은 기구를 스테인레스나 비귀금속로 제작한 다음 통상의 이온 플레이팅 장치를 사용하여 TiN 코팅을 함으로써, 기구 표면에 강한 황색이면서 채도가 높은 피막이 형성되어 시술시나 시술후에 환자나 주변인들로 하여금 거부감을 느끼지 않도록 심미감을 높일 수 있게 한 것이다.According to the present invention, a device such as orthodontic brackets, bands, or wire rods used for orthodontics is made of stainless steel or non-noble metal, and then TiN coated using a conventional ion plating apparatus, thereby providing a strong yellow color and saturation on the surface of the instrument. The high film is formed to enhance the aesthetics so that patients or bystanders do not feel rejected during or after the procedure.

여기서, 상기 장치에 코팅하는 방법을 살펴보면, 먼저 이미 알려진 기술로 제작된 ARC 방전형 고진공 이온 플레이팅 장치의 진공조에 일정압력을 유지하게 되는데, 본 발명의 바람직한 구현예에서는 그 압력과 내부온도를 각각 10-5∼10-7torr 및 250℃를 유지시켜주게 된다.Here, looking at the coating method of the device, first to maintain a constant pressure in the vacuum chamber of the ARC discharge type high vacuum ion plating apparatus manufactured by a known technique, in the preferred embodiment of the present invention, the pressure and the internal temperature, respectively 10-5 is dropped to maintain the ~10 -7 torr and 250 ℃.

이어, 전자 빔 방식으로 Ti을 증발시켜 이온을 발생시키고 여기에 반응성 가스로 질소를 주입하여 피막을 형성하게 되며, 이때 이온과 반응성 질소의 반응시간을 30분으로 하여 피막의 두께를 임의로 조절하게 된다.Subsequently, Ti is evaporated to generate ions by injecting an electron beam, and nitrogen is injected into the reactive gas to form a film. In this case, the thickness of the film is arbitrarily adjusted by setting the reaction time between the ions and the reactive nitrogen to 30 minutes. .

특히, 상기 피막의 두께는 Ti 이온과 반응성 가스인 질소의 반응량에 따라 달라지게 되는데, 본 발명의 바람직한 구현예에서는 이 피막이 일반적으로 금 합금보다 채도가 높은 진한 황색을 띄게 하여, 금속재를 시술에 사용하는데에서 오는 혐오감을 없앨 수 있도록 색조를 맞춰주는 것이 바람직하다.In particular, the thickness of the coating is dependent on the reaction amount of Ti ions and nitrogen, which is a reactive gas. In a preferred embodiment of the present invention, the coating has a dark yellow color with a higher saturation than a gold alloy, and thus a metal material is used in the procedure. It is advisable to adjust the color tone to eliminate the disgust that comes from using it.

여기서, 본 발명에 따른 코팅방법에서 피막의 두께를 1∼2㎛ 범위내에서 금합금(gold alloy)보다 조금 진한 색상으로 코팅하게 되며, 이때의 색조를 금색에 가까운 색으로 L*a*b 표색계로 다음과 같은 값을 갖게 하는 것이 좋다.Here, in the coating method according to the present invention, the thickness of the film is coated in a slightly darker color than gold alloy within the range of 1 to 2 μm, and the color tone of the film is closer to the color of L * a * b by the color system. It is a good idea to have the following values:

통상 L*a*b 표색계는 모든 물체의 색을 적, 녹, 청의 3가지 원색에 대한 평균반사율로 색공간좌표상의 한 점으로 표시하는 방법으로, L*는 명도지수를 나타내며, a*와 b*는 채도지수를 각각 나타낸다.In general, the L * a * b color system displays the color of all objects as a point on the color space coordinates with the average reflectance of three primary colors of red, green, and blue, where L * represents the brightness index, and a * and b * Indicates saturation index, respectively.

본 발명에 따른 코팅 피막은 이 L*a*b 표색계에 따르면, L*이 60∼65, a*가 3∼4, b*가 24∼26 가지도록 색조를 조절하여 사용하게 되며, 가장 바람직한 피막의 색조값은 L*이 61.8, a*가 2.3, b*가 26.2로 금색에 가장 가까운 색상을 가지게 하여 기구 사용할 때 거부감을 최소화하는 것이 좋다.According to the L * a * b color system, the coating film according to the present invention is used by adjusting the color tone so that L * is 60 to 65, a * is 3 to 4, and b * is 24 to 26. The color tone of L * is 61.8, a * is 2.3, and b * is 26.2, so it has a color closest to gold.

한편, 첨부도면 1은 본 발명에 따른 TiN와 금속성 합금의 색채값을 비교한 그래프로, 본 발명에 따라 코팅한 피막과 2가지의 금합금(gold alloy)의 색상비교를 보여주고 있다.On the other hand, Figure 1 is a graph comparing the color values of the TiN and the metallic alloy according to the present invention, showing the color comparison of the coating film and the two gold alloy (gold alloy) according to the present invention.

여기서, 2개의 금합금 type II와 typeIV는 각각 Au:75∼78%, Ag:12∼14.5%, Cu:7∼10%, Pd:1∼4%, Pt:0∼1%와, Au:60∼71.5%, Ag:2.5∼20%, Cu:11∼16%, Pd:0∼5%, Pt:0∼3.5%의 조성을 나타내는 시판용 치과용 금합금을 통상의 주조기술로 제작하여 사용되고 있는 것을 그대로 사용하게 되며, 이 2가지 금합금의 L*a*b* 표색계값은 각각 L*이 60과 65, a*가 4.9와 3.9, b*가 23.4와 11의 값을 가지고 있다.The two gold alloy types II and type IV are Au: 75 to 78%, Ag: 12 to 14.5%, Cu: 7 to 10%, Pd: 1 to 4%, Pt: 0 to 1%, and Au: 60, respectively. Commercially available dental gold alloys having compositions of-71.5%, Ag: 2.5-20%, Cu: 11-16%, Pd: 0-5%, and Pt: 0-3.5% are manufactured and used by conventional casting techniques. The L * a * b * colorimetric values of these two gold alloys have L * of 60 and 65, a * of 4.9 and 3.9, and b * of 23.4 and 11, respectively.

본 발명에 따른 TiN 피막의 표색계값은 L*이 61.8로 type IV 합금의 L*65보다 약간 작은 값을 나타내며, a*와 b*는 각각 3.3과 26.2로 type IV 합금의 a*와 b*의 3.9 및 11 값보다 a*는 작고, b*는 큰 값을 나타나게 되어 Munsell 표색계로 색상이 2.5Y이며 채도가 4인 색채로 나타나게 된다.The colorimetric value of the TiN film according to the present invention is L * of 61.8, which is slightly smaller than L * 65 of type IV alloys, and a * and b * of 3.3 and 26.2, respectively, of a * and b * of type IV alloys. A * is smaller than 3.9 and 11, and b * is larger. The Munsell color system shows a color of 2.5Y and a saturation of 4.

따라서, 이 피막의 표색계값은 type II 금합금보다는 약간 진한 황색을 나타내면서 채도가 약간 큰 색채를 보이게 되어, 본 발명의 피막 형성으로 얻어지는 표색계의 색채 영역이 금색에 가까운 색상을 띄게 되어 심미적으로 안정적인 색채를 얻을 수 있게 된다.Therefore, the film color value of the film is slightly darker than the type II gold alloy, and the color is slightly larger in saturation, and the color area of the color system obtained by forming the film of the present invention has a color close to gold, resulting in an aesthetically stable color. You can get it.

이상에서 본 바와 같이 본 발명은 통상의 ARC 방전형 고진공 이온 플레이팅 장치를 사용하여 소정의 진공압과 온도를 갖는 진공조 내에 전자빔 방식으로 Ti를 증발시키고, 이렇게 증발된 이온이 질소와 반응하여 치과교정용 기구의 표면에 일정두께의 피막을 형성하게 함으로써, 치과교정용 기구 표면이 진한 금색채를 띄게 되어, 시술중인 환자가 시술후 주변 사람들로하여금 거부감과 불쾌감을 없앨 수 있는 효과가 있는 것이다.As described above, the present invention uses a conventional ARC discharge type high vacuum ion plating apparatus, and evaporates Ti in an electron beam method in a vacuum chamber having a predetermined vacuum pressure and temperature, and the ions thus evaporated react with nitrogen to form a dental By forming a film of a certain thickness on the surface of the orthodontic appliance, the surface of the orthodontic appliance is a dark gold color, the effect of the patient during the procedure to eliminate the gold objection and discomfort to the people around the procedure.

Claims (3)

통상의 ARC 방전형 고진공 이온 플레이팅 장치를 사용하여 10-5∼10-7torr를 유지하고, 이 장치의 진공조 내부 온도를 250℃에서 전자 빔(beam) 방식으로 Ti를 증발시키면서 이때에 발생된 이온이 질소와 30분간 반응하여 피막이 형성되게 한 것을 특징으로 하는 TiN 이온 플레이팅 장치를 이용한 치과교정용 기구의 코팅방법.It is generated at this time while maintaining a temperature of 10 -5 to 10 -7 torr using a conventional ARC discharge type high vacuum ion plating apparatus and evaporating Ti at 250 ° C. in an electron beam method. A method of coating a dental orthodontic appliance using a TiN ion plating apparatus, wherein the ions react with nitrogen for 30 minutes to form a film. 제 1 항에 있어서, 상기 피막은 두께가 1∼2㎛인 것을 특징으로 하는 TiN 이온 플레이팅 장치를 이용한 치과교정용 기구의 코팅방법.2. The method of claim 1, wherein the coating has a thickness of 1 to 2 mu m. 제 1 항에 있어서, 상기 피막은 L*a*b*표색계에서 L*이 60∼65, a*가 3∼4, b*가 24∼26인 것을 특징으로 하는 TiN 이온 플레이팅 장치를 이용한 치과교정용 기구의 코팅방법.The dental coating using a TiN ion plating apparatus according to claim 1, wherein said coating has L * a * b * color system with L * of 60 to 65, a * of 3 to 4, and b * of 24 to 26. Coating method of orthodontic appliance.
KR1019980030862A 1998-07-30 1998-07-30 Coating method of dental correction device using TIN ion plating device KR100304389B1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
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KR100767526B1 (en) * 2006-03-15 2007-10-17 주식회사 금강기건 Method for producing a dental prosthesis
WO2011019146A2 (en) * 2009-08-10 2011-02-17 휴비트 주식회사 Surface coating method for an orthodontic corrective bracket
KR101157551B1 (en) * 2009-12-09 2012-06-19 이상훈 method for maunfacturing a frame work

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234770A (en) * 1988-07-22 1990-02-05 Raimuzu:Kk Formation of gold-colored hard titanium nitride film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100767526B1 (en) * 2006-03-15 2007-10-17 주식회사 금강기건 Method for producing a dental prosthesis
WO2011019146A2 (en) * 2009-08-10 2011-02-17 휴비트 주식회사 Surface coating method for an orthodontic corrective bracket
KR101039638B1 (en) * 2009-08-10 2011-06-09 휴비트 주식회사 Method for coating the surface of an orthodontic bracket
WO2011019146A3 (en) * 2009-08-10 2011-06-30 휴비트 주식회사 Surface coating method for an orthodontic corrective bracket
US8632848B2 (en) 2009-08-10 2014-01-21 Hubit Co., Ltd. Surface coating method for an orthodontic corrective bracket
KR101157551B1 (en) * 2009-12-09 2012-06-19 이상훈 method for maunfacturing a frame work

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