KR19980040888A - Transparent electrode formation method of plasma display device - Google Patents

Abstract

The present invention discloses a novel method of forming a transparent electrode of a PDP.

Conventionally, since the transparent electrode is formed by a photolithography method, there is a problem that the conductive property is low due to the residual of the photosensitive material, and the metal electrode on the upper part thereof is not applicable to the printing method.

In the present invention, a photosensitive layer is formed on a protruding layer such as a metal electrode and then photo-etched to retain islands to apply ITO to the entire surface. It was implemented as.

Description

Transparent electrode formation method of plasma display device

1 is a cross-sectional view showing the configuration of a DC PDP,

2 is a cross-sectional view showing the configuration of the reflective AC PDP,

3 is a cross-sectional view showing the configuration of the applicant PDP of the present application,

4 (a) to (bar) are sequential cross-sectional views showing a conventional method for forming a transparent electrode,

5 (a) to (bar) are sequential cross-sectional views showing a method of forming a transparent electrode according to the present invention.

* Description of the symbols for the main parts of the drawings *

P1: Front Board

M: metal electrode

X: additional layer (black stripe or black electrode)

R: photosensitive layer

T: transparent electrode

T ': ITO layer

The present invention relates to the manufacture of a plasma display panel (PDP), and more particularly to a method of forming a transparent electrode.

PDP uses gas discharge for image display, and according to the principle, the direct current (DC) PDP of the simplest configuration has two electrodes (P1, P2) on the front and back substrates P1 and P2 as shown in FIG. E2) is arranged to face each other, the discharge gas is charged therebetween, and the partition B partitions the pixels.

In the DC PDP, when the driving voltage of the two electrodes E1 and E2 is selected, discharge is generated between the electrodes E1 and E2 to display an image. When the number of pixels increases, the discharge holding time of each pixel is short, which causes a problem of low luminance.

Accordingly, AC PDP as shown in FIG. 2 is mainly used for high resolution image display, which covers the dielectric layer (I) on one of the electrodes (E1, E2) to wall the surface of the dielectric layer (I). By forming a wall charge, it is possible to achieve rapid and strong discharge and continuous discharge, thereby improving the luminance of light emitted.

However, in order to display a specific color or to implement a color image, phosphors should be applied to each pixel between the partition walls B. The composition applied to the front substrate P1 becomes a transmissive type and is applied to the rear substrate P2. The applied structure becomes a reflection type.

Here, in order to configure the transmissive PDP, the phosphor should be coated in a thin and uniform layer. Since there are many difficulties in manufacturing technology, the phosphor is usually coated on the back substrate P2 to form a reflective PDP.

Accordingly, the dielectric layer I and its protective layer P are formed on the front substrate P1 side, and the electrode E1 on the front substrate P1 side is made of ITO (Indium) to compensate for the deterioration of light transmittance. It is mainly composed of a transparent electrode T such as Tin Oxide), and the metal electrode M is laminated in a small area to compensate for its conductivity.

Electrodes (E1) is a Ni, Cr, LaB ₆ relatively low there is a configuration of a metal material, a metal electrode (M) of the AC PDP, compared, such as a first-degree DC PDP front substrate (P1) of the DC to the conductivity and stability problems Materials such as PDP are difficult to use, and high quality materials such as Au, Al, or Ag are mainly used.

In addition, the transparent electrode T such as ITO has a problem in that the adhesion to the front substrate P1 made of glass is poor, so that it is easily peeled off even with a slight external force.

However, Ni and Cr materials have black or brown body color after firing, while Au, yellow, and Ag are white. Therefore, even if AC PDP can achieve high brightness, contrast ( There is a problem that it is difficult to implement a high quality image due to low contrast.

Accordingly, as shown in FIG. 3, the present inventors improved contrast by forming a black stripe X on the bottom surface of the electrode E1 of the front substrate P1 or forming a black electrode on the bottom surface of the metal electrode M. As shown in FIG. Are filed in Utility Model Registration Application Nos. 96-27299 and 27300, respectively.

It is an object of the present invention to provide a method particularly suitable for the formation of transparent electrodes of such pre-applied PDPs.

First, the conventional method will be described through the angle of FIG. 4.

On the front substrate P1, an ITO layer (T ') containing a photosensitive material is applied on the entire surface as shown in (a), and selectively exposed through a mask (K) as shown in (b) and then developed. A transparent electrode T is formed as shown in (c).

Next, as shown in (d), the metal layer M 'including photosensitive material is coated on the transparent electrode T as a whole, and then exposed and developed through the mask K as shown in (e). The electrode E1 of the front substrate P1 on which the metal electrode M is stacked is completed.

The reason why the transparent electrode T cannot be formed by a simple thick film method, such as a printing method, is because ITO has poor printability and adhesion. In this conventional method, the metal electrode M is also subjected to the photolithography method. we have to rely on photo lithography.

It is difficult to print on the upper part due to the poor adhesion of the transparent electrode T, and the electrical properties of the transparent electrode T, which are vulnerable to heat, must be accompanied by the firing process when the metal electrode M is printed. It is because it degrades.

In addition, according to the conventional method, the material of the ITO layer (T ') having photosensitive characteristics is not only expensive but requires a long time exposure, and since the formed transparent electrode (T) contains a large amount of photosensitive material, poor conductivity is not required. Etc., there is a problem that the electrical properties are further reduced.

In addition, it is more difficult to apply the conventional method to the above-described application of the present applicant, such that the transparent electrode T is not protruded on the front substrate P1 but the protruding metal electrode M and the black stripe X or black. This is because the transparent electrode T formed of the ITO layer T 'having poor adhesion is easily peeled off and thus uniform patterning cannot be made on the electrode.

The method of the present invention, which can solve these problems, will be described with reference to FIG. 5.

In (a), the black stripe X or the black electrode (hereinafter referred to as additional layer for convenience and referred to as the same member No. X) and the metal electrode M are first formed on the front substrate P1.

Wherein the additional layer (X) and the metal electrode (M) can be formed by the printing method, respectively, because of the excellent printability on the front substrate (P1) of the metal paste, even if they are printed and fired sequentially by heat This is because there is no deterioration.

The present invention can be applied to the configuration in which only the metal electrode M is formed without the additional layer X and the transparent electrode T is formed thereon.

Next, the photosensitive layer R is coated on the additional layer X and the metal electrode M as a whole as shown in (b), and then exposed and developed through the mask K as shown in (c). An island of the photosensitive layer R is formed remaining between the additional layer X and the metal electrode M. FIG.

Next, the ITO layer (T ') is applied over the entire surface as shown in (e). Here, the photosensitive layer (R), as is well known, by mixing a photosensitive agent such as ADC (Ammonium Di Chloride) with a polymer base such as PVA to discriminate the polymer bond of the base according to the exposure light exposure, the phenomenon caused by the injection of the washing water, etc. The degree of decomposition is different. Therefore, since the photoresist layer (R) is based on a polymer resin such as PVA, the thermal decomposition temperature of the photosensitive layer (R) is inevitably lower than that of the ITO layer (T ') composed mainly of metal compounds.

Therefore, when the front substrate P1 is put into a heating furnace and heated above the thermal decomposition temperature of the photosensitive layer R, the photosensitive layer R is thermally decomposed and released, and thus the ITO applied on the remaining islands of the photosensitive layer R. The layer T 'is decomposed together, resulting in an electrode structure in which the transparent electrode T surrounds the metal electrode M and the additional layer X in the form of a hat as shown in (bar).

The present invention can be applied to the case where the transparent electrode T is directly formed on the front substrate P1, but the transparent electrode T is formed on the protruding layer such as the metal electrode M or the additional layer X. In this case, a particularly large effect can be obtained.

Accordingly, the completed transparent electrode T is composed of a pure ITO layer without a photosensitive material, and thus has excellent electrical characteristics such as conductivity, and is well peeled off because it is supported by the metal electrode M and the additional layer X. It is possible to construct a solid layer that is not. In addition, since the metal electrode M and the additional layer X may be formed by a printing method rather than a photolithography method, it is possible to significantly reduce the manufacturing cost and manufacturing man-hour.

As described above, the present invention is not only particularly suitable for the implementation of the prior applications, but also has a great effect of providing a high quality PDP with low manufacturing cost and high productivity.

Claims (5)

In the method of forming a transparent electrode on the protruding layer formed on the front substrate of the plasma display device, Applying a photosensitive layer on the protruding layer and photo-etched it to form remaining islands of the photosensitive layer between the protruding layer, It is possible to thermally decompose the remaining islands of the photosensitive layer after applying the ITO layer on the whole surface. A method for forming a transparent electrode of a plasma display device. The method of claim 1, The protruding layer comprises a metal electrode A method for forming a transparent electrode of a plasma display device. The method according to any one of claims 1 to 2, The protruding layer comprises an additional layer A method for forming a transparent electrode of a plasma display device. The method of claim 3, wherein The additional layer is a black stripe A method for forming a transparent electrode of a plasma display device. The method of claim 3, wherein The additional layer is a black electrode A method for forming a transparent electrode of a plasma display device.