KR19980018255A - - Google Patents
Info
- Publication number
- KR19980018255A KR19980018255A KR19970036334A KR19970036334A KR19980018255A KR 19980018255 A KR19980018255 A KR 19980018255A KR 19970036334 A KR19970036334 A KR 19970036334A KR 19970036334 A KR19970036334 A KR 19970036334A KR 19980018255 A KR19980018255 A KR 19980018255A
- Authority
- KR
- South Korea
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
- H10B12/318—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor the storage electrode having multiple segments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
- H01L28/91—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by depositing layers, e.g. by depositing alternating conductive and insulating layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
- H01L28/92—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by patterning layers, e.g. by etching conductive layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8211513A JPH1056151A (ja) | 1996-08-09 | 1996-08-09 | 半導体装置及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR19980018255A true KR19980018255A (ko) | 1998-06-05 |
Family
ID=16607169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR19970036334A KR19980018255A (ko) | 1996-08-09 | 1997-07-31 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH1056151A (ko) |
KR (1) | KR19980018255A (ko) |
DE (1) | DE19730346A1 (ko) |
TW (1) | TW382145B (ko) |
-
1996
- 1996-08-09 JP JP8211513A patent/JPH1056151A/ja active Pending
-
1997
- 1997-06-12 TW TW086108151A patent/TW382145B/zh active
- 1997-07-15 DE DE19730346A patent/DE19730346A1/de not_active Ceased
- 1997-07-31 KR KR19970036334A patent/KR19980018255A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
DE19730346A1 (de) | 1998-02-12 |
TW382145B (en) | 2000-02-11 |
JPH1056151A (ja) | 1998-02-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |