KR102935027B1 - 개선된 기판 상용성으로 dsa에 사용하기 위한 신규 중성층 및 소수성 피닝 매트 물질의 개발 - Google Patents

개선된 기판 상용성으로 dsa에 사용하기 위한 신규 중성층 및 소수성 피닝 매트 물질의 개발

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KR102935027B1
KR102935027B1 KR1020247022039A KR20247022039A KR102935027B1 KR 102935027 B1 KR102935027 B1 KR 102935027B1 KR 1020247022039 A KR1020247022039 A KR 1020247022039A KR 20247022039 A KR20247022039 A KR 20247022039A KR 102935027 B1 KR102935027 B1 KR 102935027B1
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copolymer
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KR20240112937A (ko
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에드워드 더블유 응
두라이라지 바스카란
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메르크 파텐트 게엠베하
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
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    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/02—Homopolymers or copolymers of hydrocarbons
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    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
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    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
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    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
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    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020247022039A 2021-12-02 2022-11-30 개선된 기판 상용성으로 dsa에 사용하기 위한 신규 중성층 및 소수성 피닝 매트 물질의 개발 Active KR102935027B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202163264797P 2021-12-02 2021-12-02
US63/264,797 2021-12-02
US202263322334P 2022-03-22 2022-03-22
US63/322,334 2022-03-22
PCT/EP2022/083791 WO2023099534A1 (en) 2021-12-02 2022-11-30 Neutral layer and hydrophobic pinning mat materials for use in dsa with improved substrate compatibility

Publications (2)

Publication Number Publication Date
KR20240112937A KR20240112937A (ko) 2024-07-19
KR102935027B1 true KR102935027B1 (ko) 2026-03-05

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US (1) US12509540B2 (https=)
EP (1) EP4441110A1 (https=)
JP (1) JP2024545433A (https=)
KR (1) KR102935027B1 (https=)
WO (1) WO2023099534A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12509540B2 (en) 2021-12-02 2025-12-30 Merck Patent Gmbh Development of novel neutral layer and hydrophobic pinning mat materials for use in DSA with improved substrate compatibility
TW202600500A (zh) * 2024-03-15 2026-01-01 德商默克專利有限公司 可硬化之組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190233636A1 (en) 2018-02-01 2019-08-01 Brewer Science, Inc. Gradient block copolymers for directed self-assembly
US20190259607A1 (en) 2018-02-16 2019-08-22 Imec Vzw Method for Forming a Cross-Linked Layer
US20210230339A1 (en) 2019-09-10 2021-07-29 Merck Patent Gmbh Novel hydrophobic pinning mat for directed self-assembly of diblock copolymer novel compositions and processes for self-assembly of block copolymers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8691925B2 (en) * 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
JP6558894B2 (ja) 2013-12-31 2019-08-14 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ コポリマーの設計、その製造方法およびそれを含む物品
US9574104B1 (en) * 2015-10-16 2017-02-21 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions and processes for self-assembly of block copolymers
JP2022077356A (ja) * 2020-11-11 2022-05-23 Jsr株式会社 組成物、基材の製造方法及び基材表面の選択的修飾方法
JP7648560B2 (ja) * 2021-02-26 2025-03-18 Jsr株式会社 多層配線基板の製造方法、積層膜形成用キット及び組成物
US12509540B2 (en) 2021-12-02 2025-12-30 Merck Patent Gmbh Development of novel neutral layer and hydrophobic pinning mat materials for use in DSA with improved substrate compatibility

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190233636A1 (en) 2018-02-01 2019-08-01 Brewer Science, Inc. Gradient block copolymers for directed self-assembly
US20190259607A1 (en) 2018-02-16 2019-08-22 Imec Vzw Method for Forming a Cross-Linked Layer
US20210230339A1 (en) 2019-09-10 2021-07-29 Merck Patent Gmbh Novel hydrophobic pinning mat for directed self-assembly of diblock copolymer novel compositions and processes for self-assembly of block copolymers

Also Published As

Publication number Publication date
JP2024545433A (ja) 2024-12-06
KR20240112937A (ko) 2024-07-19
US20250034306A1 (en) 2025-01-30
TW202340270A (zh) 2023-10-16
EP4441110A1 (en) 2024-10-09
US12509540B2 (en) 2025-12-30
WO2023099534A1 (en) 2023-06-08

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