KR102812044B1 - 임프린트 장치, 임프린트 방법, 물품 제조 방법 및 저장 매체 - Google Patents
임프린트 장치, 임프린트 방법, 물품 제조 방법 및 저장 매체 Download PDFInfo
- Publication number
- KR102812044B1 KR102812044B1 KR1020210167967A KR20210167967A KR102812044B1 KR 102812044 B1 KR102812044 B1 KR 102812044B1 KR 1020210167967 A KR1020210167967 A KR 1020210167967A KR 20210167967 A KR20210167967 A KR 20210167967A KR 102812044 B1 KR102812044 B1 KR 102812044B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- pattern
- target shot
- region
- imprint
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2020-205610 | 2020-12-11 | ||
| JP2020205610A JP7581033B2 (ja) | 2020-12-11 | 2020-12-11 | インプリント装置、インプリント方法、物品の製造方法、およびコンピュータプログラム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20220083588A KR20220083588A (ko) | 2022-06-20 |
| KR102812044B1 true KR102812044B1 (ko) | 2025-05-23 |
Family
ID=81942415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020210167967A Active KR102812044B1 (ko) | 2020-12-11 | 2021-11-30 | 임프린트 장치, 임프린트 방법, 물품 제조 방법 및 저장 매체 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12228855B2 (https=) |
| JP (1) | JP7581033B2 (https=) |
| KR (1) | KR102812044B1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160327857A1 (en) * | 2014-01-21 | 2016-11-10 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5828626B2 (ja) * | 2010-10-04 | 2015-12-09 | キヤノン株式会社 | インプリント方法 |
| JP5868215B2 (ja) | 2012-02-27 | 2016-02-24 | キヤノン株式会社 | インプリント装置およびインプリント方法、それを用いた物品の製造方法 |
| JP6494185B2 (ja) * | 2013-06-26 | 2019-04-03 | キヤノン株式会社 | インプリント方法および装置 |
| JP6320183B2 (ja) * | 2014-06-10 | 2018-05-09 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品製造方法 |
| JP6525567B2 (ja) * | 2014-12-02 | 2019-06-05 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| JP6628491B2 (ja) * | 2015-04-13 | 2020-01-08 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品の製造方法 |
| JP2017157635A (ja) | 2016-02-29 | 2017-09-07 | キヤノン株式会社 | インプリント装置及び物品の製造方法 |
| JP2018029101A (ja) | 2016-08-16 | 2018-02-22 | キヤノン株式会社 | インプリント装置、および物品製造方法 |
| KR102369538B1 (ko) * | 2017-09-28 | 2022-03-03 | 캐논 가부시끼가이샤 | 성형 장치 및 물품 제조 방법 |
| JP7210155B2 (ja) | 2018-04-16 | 2023-01-23 | キヤノン株式会社 | 装置、方法、および物品製造方法 |
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2020
- 2020-12-11 JP JP2020205610A patent/JP7581033B2/ja active Active
-
2021
- 2021-11-30 KR KR1020210167967A patent/KR102812044B1/ko active Active
- 2021-12-06 US US17/542,834 patent/US12228855B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160327857A1 (en) * | 2014-01-21 | 2016-11-10 | Canon Kabushiki Kaisha | Imprint apparatus and method of manufacturing article |
Also Published As
| Publication number | Publication date |
|---|---|
| US12228855B2 (en) | 2025-02-18 |
| US20220187702A1 (en) | 2022-06-16 |
| JP7581033B2 (ja) | 2024-11-12 |
| KR20220083588A (ko) | 2022-06-20 |
| JP2022092734A (ja) | 2022-06-23 |
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Legal Events
| Date | Code | Title | Description |
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| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20211130 |
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| PG1501 | Laying open of application | ||
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| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20221110 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20211130 Comment text: Patent Application |
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Comment text: Notification of reason for refusal Patent event date: 20240603 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20250305 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20250520 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20250521 End annual number: 3 Start annual number: 1 |
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