KR102668938B1 - Reactive polycarboxylic acid resin mixture, active energy ray-curable resin composition using the same and its cured product, and reactive epoxycarboxylate resin mixture - Google Patents
Reactive polycarboxylic acid resin mixture, active energy ray-curable resin composition using the same and its cured product, and reactive epoxycarboxylate resin mixture Download PDFInfo
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- KR102668938B1 KR102668938B1 KR1020217000349A KR20217000349A KR102668938B1 KR 102668938 B1 KR102668938 B1 KR 102668938B1 KR 1020217000349 A KR1020217000349 A KR 1020217000349A KR 20217000349 A KR20217000349 A KR 20217000349A KR 102668938 B1 KR102668938 B1 KR 102668938B1
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- South Korea
- Prior art keywords
- reactive
- active energy
- equation
- resin
- polycarboxylic acid
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- 229920005989 resin Polymers 0.000 title claims abstract description 129
- 239000011347 resin Substances 0.000 title claims abstract description 129
- 239000002253 acid Substances 0.000 title claims abstract description 96
- 239000000203 mixture Substances 0.000 title claims abstract description 72
- 239000011342 resin composition Substances 0.000 title claims description 56
- 150000001875 compounds Chemical class 0.000 claims abstract description 53
- 239000003822 epoxy resin Substances 0.000 claims abstract description 48
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 48
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 32
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 24
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 13
- 150000007519 polyprotic acids Polymers 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 7
- 125000005843 halogen group Chemical group 0.000 claims abstract description 7
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 3
- 239000000463 material Substances 0.000 claims description 41
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 38
- 239000000376 reactant Substances 0.000 claims description 28
- -1 vinyl compound Chemical class 0.000 claims description 24
- 239000004593 Epoxy Substances 0.000 claims description 22
- 239000003999 initiator Substances 0.000 claims description 21
- 239000000049 pigment Substances 0.000 claims description 21
- 238000004040 coloring Methods 0.000 claims description 10
- 125000000524 functional group Chemical group 0.000 claims description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000012778 molding material Substances 0.000 claims description 3
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- 239000007795 chemical reaction product Substances 0.000 abstract description 7
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- 239000000047 product Substances 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 23
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 239000000243 solution Substances 0.000 description 15
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- 238000004519 manufacturing process Methods 0.000 description 14
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- 238000011161 development Methods 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
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- 238000007259 addition reaction Methods 0.000 description 7
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- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical class C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 6
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
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- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
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- 230000000694 effects Effects 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 3
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- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
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- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical class C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 3
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
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- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
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- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
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- LRRJQNMXIDXNIM-UHFFFAOYSA-M benzyl(trimethyl)azanium;iodide Chemical compound [I-].C[N+](C)(C)CC1=CC=CC=C1 LRRJQNMXIDXNIM-UHFFFAOYSA-M 0.000 description 2
- IDSLNGDJQFVDPQ-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-yl) hexanedioate Chemical compound C1CC2OC2CC1OC(=O)CCCCC(=O)OC1CC2OC2CC1 IDSLNGDJQFVDPQ-UHFFFAOYSA-N 0.000 description 2
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- 125000002091 cationic group Chemical group 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
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- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
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- 239000003504 photosensitizing agent Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
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- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
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- 238000004528 spin coating Methods 0.000 description 1
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- 239000003381 stabilizer Substances 0.000 description 1
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- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
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- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
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- 238000005406 washing Methods 0.000 description 1
Classifications
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/144—Polymers containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
- C08G59/1466—Acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/10—Epoxy resins modified by unsaturated compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
- C09D163/10—Epoxy resins modified by unsaturated compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
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- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
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- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Emergency Medicine (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
식 (1)로 나타내어지는 에폭시 수지 (a), 1분자 중에 중합 가능한 에틸렌성 불포화기와 카르복시기를 겸비하는 화합물 (b), 및 필요에 따라 1분자 중에 수산기와 카르복시기를 겸비하는 화합물 (c)를 반응시켜서 얻어지는 반응성 에폭시카르복실레이트 수지와 다염기산 무수물 (d)의 반응물인 반응성 폴리카르복실산 수지 및 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지 (a'), 화합물 (b), 및 필요에 따라 화합물 (c)를 반응시켜서 얻어지는 반응성 에폭시카르복실레이트 수지와 다염기산 무수물 (d)의 반응물인 반응성 폴리카르복실산 수지를 포함하는 반응성 폴리카르복실산 수지 혼합물.
(식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화수소기를 나타내고, n은 1~10의 정수를 나타낸다)An epoxy resin (a) represented by formula (1), a compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule, and, if necessary, a compound (c) having both a hydroxyl group and a carboxyl group in one molecule are reacted. A reactive polycarboxylic acid resin that is a reaction product of a reactive epoxycarboxylate resin and a polybasic acid anhydride (d) obtained by and, optionally, a reactive polycarboxylic acid resin mixture containing a reactive polycarboxylic acid resin that is a reaction product of a reactive epoxycarboxylate resin obtained by reacting compound (c) and a polybasic acid anhydride (d).
(R 1 in formula (1) may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10.)
Description
본 발명은 반응성 폴리카르복실산 수지 혼합물, 그것을 사용한 활성 에너지선 경화형 수지 조성물 및 그 경화물, 및 반응성 에폭시카르복실레이트 수지 혼합물에 관한 것이다.The present invention relates to a reactive polycarboxylic acid resin mixture, an active energy ray-curable resin composition using the same and its cured product, and a reactive epoxycarboxylate resin mixture.
프린트 배선판은 휴대 기기의 소형 경량화나 통신 속도의 향상을 목표로 하여 고정밀도, 고밀도화가 요구되고 있다. 그것에 따라 그 회로 자체를 피복하는 솔더 레지스트로의 요구도 점점 고도로 되고 있다. 종래의 요구보다 추가로 내열성, 열 안정성을 유지하면서 기판 밀착성, 고절연성, 무전해 금 도금성에 견딜 수 있는 성능이 요구되고 있으며, 보다 강인한 경화 물성을 갖는 피막 형성용 재료가 요구되고 있다.Printed wiring boards are required to have higher precision and higher density with the goal of making portable devices smaller and lighter and improving communication speeds. Accordingly, the requirements for solder resist that covers the circuit itself are becoming more and more sophisticated. In addition to conventional requirements, performance that can withstand substrate adhesion, high insulation, and electroless gold plating while maintaining heat resistance and thermal stability is required, and materials for film formation with stronger curing properties are required.
이들 재료로서 일반적인 에폭시 수지에 아크릴산과 수산기를 갖는 카르복실산 화합물을 함께 반응시켜서 얻어지는 카르복실레이트 수지가 저산가이면서 우수한 현상성을 갖는 재료로서 공지이다. 또한, 이 수지가 레지스트 잉크 적성을 갖는 것은 공지이다(특허문헌 1).As these materials, carboxylate resins obtained by reacting acrylic acid with a general epoxy resin and a carboxylic acid compound having a hydroxyl group are known as materials with a low acid value and excellent developability. Additionally, it is known that this resin has resist ink compatibility (Patent Document 1).
한편, 특정 구조의 다환식 탄화수소기를 갖는 에폭시 수지(예를 들면, Nippon Kayaku Co., Ltd.제 XD-1000 등)를 기본 골격으로 한 산 변성 에폭시아크릴레이트는 경화 후에 높은 강인성을 나타내는 재료로서 일반적으로 공지이다. 또한, 이것을 사용한 솔더 레지스트로서의 용도에 대해서도 검토가 행해지고 있다(특허문헌 2).On the other hand, acid-modified epoxy acrylate whose basic skeleton is an epoxy resin having a polycyclic hydrocarbon group of a specific structure (e.g., XD-1000 manufactured by Nippon Kayaku Co., Ltd., etc.) is a general material that exhibits high toughness after curing. This is a notice. In addition, studies are being conducted on the use of this as a soldering resist (patent document 2).
이 외에 TrisP-PA 골격을 갖는 에폭시를 기본 골격으로 한 산 변성 에폭시아크릴레이트는 내열성이 우수하고, 현상성, 구리 도금 밀착성이 우수한 점에서 감광성의 층간 절연층으로서의 용도에 대해서도 검토가 행해지고 있다(특허문헌 3).In addition, acid-modified epoxy acrylate, whose basic skeleton is epoxy with a TrisP-PA skeleton, is being studied for use as a photosensitive interlayer insulating layer because it has excellent heat resistance, developability, and copper plating adhesion (patent Document 3).
그러나 이들 검토에 의해서도 높은 절연성과 현상성을 양립하는 수지 조성물의 실현에는 도달해 있지 않다.However, even through these studies, the realization of a resin composition that has both high insulation and developability has not been reached.
본 발명은 상기 종래 기술의 문제점을 개선하고, 높은 절연 신뢰성을 떨어뜨리는 일 없이 양호한 현상 특성을 갖는 반응성 폴리카르복실산 수지 혼합물 및 그것을 함유하는 활성 에너지선 경화형 수지 조성물을 제공하는 것을 제 1 목적으로 한다. 또한, 본 발명은 상기 종래 기술의 문제점을 개선하고, 높은 강인성과 내열성을 떨어뜨리는 일 없이 양호한 현상 특성과 절연 신뢰성을 갖는 반응성 에폭시카르복실레이트 수지 혼합물을 제공하는 것을 제 2 목적으로 한다.The first purpose of the present invention is to improve the problems of the prior art and to provide a reactive polycarboxylic acid resin mixture having good development characteristics without compromising high insulation reliability and an active energy ray-curable resin composition containing the same. do. In addition, the present invention has a second purpose to improve the problems of the prior art and to provide a reactive epoxycarboxylate resin mixture having good development characteristics and insulation reliability without deteriorating high toughness and heat resistance.
본 발명자들은 상술한 과제를 해결하기 위해서 예의 검토한 결과 특정 구조를 갖는 에폭시카르복실레이트 수지, 추가로 다염기산 무수물을 반응시켜서 얻어지는 반응성 폴리카르복실산 수지가 우수한 수지 물성을 갖는 것을 발견하고, 본 발명에 도달했다.In order to solve the above-mentioned problem, the present inventors conducted intensive studies and discovered that an epoxycarboxylate resin having a specific structure and a reactive polycarboxylic acid resin obtained by reacting a polybasic acid anhydride have excellent resin physical properties, and the present invention reached.
즉, 본 발명은 이하의 [1]~[15]에 관한 것이다.That is, the present invention relates to the following [1] to [15].
[1][One]
하기 식 (1)로 나타내어지는 에폭시 수지 (a), 1분자 중에 중합 가능한 에틸렌성 불포화기와 카르복시기를 겸비하는 화합물 (b), 및 필요에 따라 1분자 중에 수산기와 카르복시기를 겸비하는 화합물 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 다염기산 무수물 (d)의 반응물인 반응성 폴리카르복실산 수지 및 상기 에폭시 수지 (a)와는 상이한 에폭시 수지 (a'), 상기 화합물 (b), 및 필요에 따라 상기 화합물 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 상기 다염기산 무수물 (d)의 반응물인 반응성 폴리카르복실산 수지로서, 상기 에폭시 수지 (a')가 하기 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지인 반응성 폴리카르복실산 수지를 포함하는 반응성 폴리카르복실산 수지 혼합물.An epoxy resin (a) represented by the following formula (1), a compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule, and, if necessary, a compound (c) having both a hydroxyl group and a carboxyl group in one molecule. A reactive epoxycarboxylate resin, which is a reactant obtained by reacting, a reactive polycarboxylic acid resin, which is a reactant of a polybasic acid anhydride (d), an epoxy resin (a') different from the epoxy resin (a), the compound (b), and the necessary A reactive epoxycarboxylate resin, which is a reactant obtained by reacting the compound (c) according to the above, and a reactive polycarboxylic acid resin, which is a reactant of the polybasic acid anhydride (d), wherein the epoxy resin (a') has the following formula (2) ~ A reactive polycarboxylic acid resin mixture containing a reactive polycarboxylic acid resin that is an epoxy resin represented by any of formula (4).
(식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화수소기를 나타내고, n은 1~10의 정수를 나타낸다)(R 1 in formula (1) may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10.)
(식 (2) 중 p는 0~2의 정수를 나타낸다)(In equation (2), p represents an integer from 0 to 2)
(식 (3) 중 m은 0~30의 정수를 나타낸다)(In equation (3), m represents an integer from 0 to 30)
(식 (4) 중 Ar은 각각 독립적으로 식 (5) 또는 식 (6) 중 어느 것이며, 식 (5)와 식 (6)의 몰비율은 식 (5)/식 (6)=1~3이다. q는 반복수이며, 0~5의 정수이다. r은 가수를 나타내고, 1 또는 2이다)(Ar in equation (4) is each independently either equation (5) or equation (6), and the molar ratio of equations (5) and (6) is equation (5) / equation (6) = 1~3 q is the number of repetitions, and r represents the mantissa and is 1 or 2.
[2][2]
전항 [1]에 있어서, 상기 에폭시 수지 (a) 및 상기 에폭시 수지 (a')의 혼합물, 상기 화합물 (b), 및 필요에 따라 상기 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지 혼합물과 상기 다염기산 무수물 (d)의 반응물인 반응성 폴리카르복실산 수지 혼합물.The reactive epoxycarboxylate according to the preceding item [1], which is a reactant obtained by reacting the epoxy resin (a) and the mixture of the epoxy resin (a'), the compound (b), and, if necessary, the component (c). A reactive polycarboxylic acid resin mixture that is a reaction product of the resin mixture and the polybasic acid anhydride (d).
[3][3]
전항 [1] 또는 [2]에 기재된 반응성 폴리카르복실산 수지 혼합물을 포함하는 활성 에너지선 경화형 수지 조성물.An active energy ray-curable resin composition comprising the reactive polycarboxylic acid resin mixture according to the preceding item [1] or [2].
[4][4]
전항 [3]에 있어서, 반응성 화합물 (C)를 더 포함하고, 상기 반응성 화합물 (C)가 라디칼 반응형의 아크릴레이트류, 양이온 반응형의 에폭시 화합물류, 이들 쌍방에 감응하는 비닐 화합물류 또는 활성 에너지선에 감응 가능한 관능기를 갖는 반응성 올리고머류인 활성 에너지선 경화형 수지 조성물.The method of the preceding item [3], further comprising a reactive compound (C), wherein the reactive compound (C) is a radical-reactive acrylate, a cation-reactive epoxy compound, a vinyl compound sensitive to both, or an active An active energy ray-curable resin composition that is a reactive oligomer having a functional group sensitive to energy rays.
[5][5]
전항 [3] 또는 [4]에 있어서, 광중합 개시제를 더 포함하는 활성 에너지선 경화형 수지 조성물.The active energy ray-curable resin composition according to the preceding item [3] or [4], further comprising a photopolymerization initiator.
[6][6]
전항 [3] 내지 [5] 중 어느 한 항에 있어서, 착색 안료를 더 포함하는 활성 에너지선 경화형 수지 조성물.The active energy ray-curable resin composition according to any one of the preceding items [3] to [5], further comprising a coloring pigment.
[7][7]
전항 [3] 내지 [6] 중 어느 한 항에 있어서, 성형용 재료인 활성 에너지선 경화형 수지 조성물.The active energy ray-curable resin composition according to any one of the preceding items [3] to [6], which is a molding material.
[8][8]
전항 [3] 내지 [6] 중 어느 한 항에 있어서, 피막 형성용 재료인 활성 에너지선 경화형 수지 조성물.The active energy ray-curable resin composition according to any one of the preceding items [3] to [6], which is a material for forming a film.
[9][9]
전항 [3] 내지 [6] 중 어느 한 항에 있어서, 레지스트 재료 조성물인 활성 에너지선 경화형 수지 조성물.The active energy ray-curable resin composition according to any one of the preceding items [3] to [6], which is a resist material composition.
[10][10]
전항 [3] 내지 [9] 중 어느 한 항에 기재된 활성 에너지선 경화형 수지 조성물의 경화물.A cured product of the active energy ray-curable resin composition according to any one of the preceding items [3] to [9].
[11][11]
전항 [10]에 기재된 경화물로 오버 코팅된 물품.An article overcoated with the cured material according to the preceding paragraph [10].
[12][12]
하기 식 (1)로 나타내어지는 에폭시 수지 (a)에 1분자 중에 중합 가능한 에틸렌성 불포화기와 카르복시기를 겸비하는 화합물 (b)와, 필요에 따라 1분자 중에 수산기와 카르복시기를 겸비하는 화합물 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지 및 하기 식 (2)~식 (4)로 나타내어지는 에폭시 수지의 군으로부터 선택되는 1종 이상인 에폭시 수지에 상기 화합물 (b)와, 필요에 따라 상기 화합물 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지를 포함하는 반응성 에폭시카르복실레이트 수지 혼합물.To the epoxy resin (a) represented by the following formula (1), a compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule, and, if necessary, a compound (c) having both a hydroxyl group and a carboxyl group in one molecule, The compound (b) and, if necessary, the compound (b) in an epoxy resin selected from the group of reactive epoxycarboxylate resins and epoxy resins represented by the following formulas (2) to (4), which are reactants obtained by reacting A reactive epoxycarboxylate resin mixture containing a reactive epoxycarboxylate resin, which is a reactant obtained by reacting (c).
(식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화수소기를 나타내고, n은 1~10의 정수를 나타낸다)(R 1 in formula (1) may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10.)
(식 (2) 중 p는 0~2의 정수를 나타낸다)(In equation (2), p represents an integer from 0 to 2)
(식 (3) 중 m은 0~30의 정수를 나타낸다)(In equation (3), m represents an integer from 0 to 30)
(식 (4) 중 Ar은 각각 독립적으로 식 (5) 또는 식 (6) 중 어느 것이며, 식 (5)와 식 (6)의 몰비율은 식 (5)/식 (6)=1~3이다. q는 반복수이며, 0~5의 정수이다. r은 가수를 나타내고, 1 또는 2이다)(Ar in equation (4) is each independently either equation (5) or equation (6), and the molar ratio of equations (5) and (6) is equation (5) / equation (6) = 1~3 q is the number of repetitions, and r represents the mantissa and is 1 or 2.
(발명의 효과)(Effects of the Invention)
본 발명의 특정 구조의 다환식 탄화수소기를 갖는 반응성 에폭시카르복실레이트 수지의 혼합물 및/또는 그 산 변성 수지를 포함하는 활성 에너지선 경화형 수지 조성물은 강인한 경화물을 얻을 수 있고, 또한 양호한 현상성을 갖는다. 또한, 본 발명의 활성 에너지선 경화형 수지 조성물을 자외선 등의 활성 에너지선 등에 의해 경화해서 얻어지는 경화물은 내열성이 우수하고, 높은 절연 신뢰성을 갖는 피막 형성용 재료에 적합하게 사용할 수 있다.The active energy ray-curable resin composition comprising a mixture of a reactive epoxycarboxylate resin having a polycyclic hydrocarbon group of a specific structure and/or an acid-modified resin thereof according to the present invention can obtain a strong cured product and has good developability. . In addition, the cured product obtained by curing the active energy ray-curable resin composition of the present invention with active energy rays such as ultraviolet rays has excellent heat resistance and can be suitably used as a film forming material with high insulation reliability.
적합하게는, 예를 들면 특히 높은 절연 신뢰성이 요구되는 프린트 배선판용 솔더 레지스트, 다층 프린트 배선판의 보호막, 다층 프린트 배선판용 층간 절연 재료, 플렉시블 프린트 배선판용 솔더 레지스트, 도금 레지스트, 감광성 광도파로 등의 용도로 사용할 수 있다.Suitable applications include, for example, solder resist for printed wiring boards that require particularly high insulation reliability, protective films for multilayer printed wiring boards, interlayer insulating materials for multilayer printed wiring boards, solder resists for flexible printed wiring boards, plating resists, photosensitive optical waveguides, etc. It can be used as
또한, 본 발명에 의한 특정 구조는 카본 블랙 등의 착색 안료와의 높은 친화성을 갖고 있으며, 높은 안료 농도에 있어서도 양호한 현상성을 발휘할 수 있고, 컬러 레지스트, 컬러 필터용의 레지스트 재료, 특히 블랙 매트릭스 재료, 블랙 칼럼 스페이서 등에도 적합하게 사용할 수 있다.In addition, the specific structure according to the present invention has high affinity with coloring pigments such as carbon black, can exhibit good developability even at high pigment concentrations, and can be used as a color resist, a resist material for color filters, especially a black matrix. It can also be suitably used for materials, black column spacers, etc.
본 발명의 반응성 폴리카르복실산 수지 혼합물은 적어도 하기 1~2에 나타내는 2종의 반응성 폴리카르복실산 수지를 포함하는 것이다.The reactive polycarboxylic acid resin mixture of the present invention contains at least two types of reactive polycarboxylic acid resins shown in 1 to 2 below.
1. 상기 식 (1)로 나타내어지는 에폭시 수지 (a)(이하, 간단히 「성분 (a)」라고도 나타낸다), 1분자 중에 중합 가능한 에틸렌성 불포화기와 카르복시기를 겸비하는 화합물 (b)(이하, 간단히 「성분 (b)」라고도 나타낸다), 및 필요에 따라 1분자 중에 수산기와 카르복시기를 겸비하는 화합물 (c)(이하, 간단히 「성분 (c)」라고도 나타낸다)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 다염기산 무수물 (d)(이하, 간단히 「성분 (d)」라고도 나타낸다)의 반응물인 반응성 폴리카르복실산.1. Epoxy resin (a) represented by the above formula (1) (hereinafter simply referred to as “component (a)”), compound (b) (hereinafter simply referred to as “component (a)”), which has both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule. Reactive epoxy carboxyl, which is a reactant obtained by reacting “component (b)”) and, if necessary, a compound (c) having both a hydroxyl group and a carboxyl group in one molecule (hereinafter also simply referred to as “component (c)”) A reactive polycarboxylic acid that is a reaction product of late resin and polybasic acid anhydride (d) (hereinafter also simply referred to as “component (d)”).
2. 성분 (a)와는 상이한 에폭시 수지 (a')(이하, 간단히 「성분 (a')」라고도 나타낸다), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 성분 (d)의 반응물인 반응성 폴리카르복실산 수지로서, 성분 (a')가 상기 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지인 반응성 폴리카르복실산 수지.2. Reactive epoxy, which is a reactant obtained by reacting an epoxy resin (a') different from component (a) (hereinafter also simply referred to as "component (a')"), component (b), and, if necessary, component (c). A reactive polycarboxylic acid resin that is a reaction product of a carboxylate resin and component (d), wherein component (a') is an epoxy resin represented by any of the formulas (2) to (4) above. .
마찬가지로 본 발명의 반응성 에폭시카르복실레이트 수지 혼합물은 적어도 하기 3~4에 나타내는 2종의 반응성 에폭시카르복실레이트 수지를 포함하는 것이다.Similarly, the reactive epoxycarboxylate resin mixture of the present invention contains at least two types of reactive epoxycarboxylate resins shown in 3 to 4 below.
3. 성분 (a), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지.3. Reactive epoxycarboxylate resin, which is a reactant obtained by reacting component (a), component (b), and, if necessary, component (c).
4. 성분 (a'), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지로서, 성분 (a')가 상기 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지인 반응성 에폭시카르복실레이트 수지.4. A reactive epoxycarboxylate resin that is a reactant obtained by reacting component (a'), component (b), and, if necessary, component (c), wherein component (a') is one of the above formulas (2) to (4). ) A reactive epoxycarboxylate resin, which is an epoxy resin represented by any of the following.
에폭시 수지 (a)는 상기 식 (1)[식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화수소기를 나타내고, n은 1~10의 정수를 나타낸다]로 나타내어진다.The epoxy resin (a) is represented by the above formula (1) [In formula (1), R 1 may be the same or different and represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10. ] is displayed.
식 (1) 중의 R1에 있어서 할로겐 원자로서는 불소 원자, 염소 원자, 브롬 원자 또는 요오드 원자를 들 수 있다. 식 (1) 중의 R1에 있어서 탄소수 1~4개의 탄화수소기로서는, 예를 들면 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, s-부틸기 또는 t-부틸기 등을 들 수 있다.In R 1 in formula (1), examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. Examples of the hydrocarbon group having 1 to 4 carbon atoms for R 1 in formula (1) include methyl, ethyl, n-propyl, isopropyl, n-butyl, s-butyl, and t-butyl groups. I can hear it.
그 중에서도 R1이 전부 수소 원자인 화합물 또는 메틸기인 화합물이 저렴하게 입수 가능하며, 바람직하다.Among them, compounds in which all R 1 is a hydrogen atom or a methyl group are available inexpensively and are preferred.
또한, 상기 식 (1)로 나타내어지는 에폭시 수지의 제법은 특허문헌 3 등에 기재되어 있다. R1이 전부 수소 원자이며, n이 1~10의 정수를 나타내는 화합물은 Nippon Kayaku Co., Ltd.로부터 XD-1000 시리즈로서 입수 가능하다. 또한, KUKDO CHEMICAL CO., LTD.로부터 KDCP-130, LDCP-150으로서도 입수 가능하다.In addition, the manufacturing method of the epoxy resin represented by the above formula (1) is described in Patent Document 3, etc. Compounds in which R 1 is all hydrogen atoms and n represents an integer of 1 to 10 are available from Nippon Kayaku Co., Ltd. as the XD-1000 series. Additionally, it is also available as KDCP-130 and LDCP-150 from KUKDO CHEMICAL CO., LTD.
성분 (a)는, 예를 들면 이들 제품 중으로부터 연화점 그레이드로 적합한 화합물을 적당히 선택하거나 합성하면 좋다.For component (a), for example, a compound suitable for the softening point grade may be appropriately selected or synthesized from among these products.
성분 (a')는 성분 (a) 이외의 에폭시 수지이며, 1종 단독이어도 2종 이상 병용해도 좋다.Component (a') is an epoxy resin other than component (a), and may be used alone or in combination of two or more types.
성분 (a')는 분자 내에 3개 이상의 에폭시기를 갖는 에폭시 수지인 것이 바람직하다. 구체예로서는 방향족 노볼락형 에폭시 수지, 비페닐형 에폭시 수지, 트리페닐메탄형 에폭시 수지, 페놀아랄킬형 에폭시 수지 등을 들 수 있다. 본 발명에 있어서는 성분 (a')로서 상기 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지를 적어도 사용한다.Component (a') is preferably an epoxy resin having three or more epoxy groups in the molecule. Specific examples include aromatic novolak-type epoxy resin, biphenyl-type epoxy resin, triphenylmethane-type epoxy resin, and phenol aralkyl-type epoxy resin. In the present invention, at least an epoxy resin represented by any of the above formulas (2) to (4) is used as component (a').
또한, 성분 (a')의 에폭시 당량은 180~220g/eq인 것이 바람직하고, 185~210g/eq인 것이 더 바람직하다. 에폭시 당량이 상기 범위에 있음으로써 내열성이 더 우수하다.Additionally, the epoxy equivalent of component (a') is preferably 180 to 220 g/eq, and more preferably 185 to 210 g/eq. When the epoxy equivalent weight is within the above range, heat resistance is superior.
상기 식 (2)[식 (2) 중 p는 0~2의 정수를 나타낸다]로 나타내어지는 에폭시 수지의 제법 등에 대해서는 공지이며, 일반적으로는 Nippon Kayaku Co., Ltd. NC-6000, NC-6300으로서 입수 가능하다. 또한, Printec Corporation으로부터 TECMOREVG 3101L로서 입수가 가능하다. 상기 식 (2)의 화합물은, 예를 들면 이들 중으로부터 적합한 화합물을 적당히 선택하거나 합성하면 좋다.The manufacturing method of the epoxy resin represented by the above formula (2) [in formula (2), p represents an integer of 0 to 2] is well known, and is generally known as Nippon Kayaku Co., Ltd. Available as NC-6000 and NC-6300. It is also available from Printec Corporation as TECMOREVG 3101L. The compound of the formula (2) can be selected, for example, by appropriately selecting or synthesizing a suitable compound from among these.
상기 식 (3)[식 (3) 중 m은 0~30의 정수를 나타낸다]으로 나타내어지는 에폭시 수지의 제법 등에 대해서는 공지이며, 일반적으로는 Nippon Kayaku Co., Ltd.로부터 EPPN-501H, EPPN-501HY, EPPN-502H, EPPN-503으로서 입수 가능하다. 또한, KUKDO CHEMICAL CO., LTD.로부터 KDMN-1065로서 입수 가능하다. 상기 식 (3)의 화합물은, 예를 들면 이들 중으로부터 적합한 화합물을 적당히 선택하거나 합성하면 좋다. 본 발명에 있어서 상기 식 (3) 중 m은 0~8의 정수인 것이 바람직하다.The manufacturing method of the epoxy resin represented by the above formula (3) [m in formula (3) represents an integer of 0 to 30] is known, and generally EPPN-501H and EPPN- are manufactured by Nippon Kayaku Co., Ltd. Available as 501HY, EPPN-502H, and EPPN-503. It is also available as KDMN-1065 from KUKDO CHEMICAL CO., LTD. The compound of the formula (3) can be selected, for example, by appropriately selecting or synthesizing a suitable compound from among these. In the present invention, m in the above formula (3) is preferably an integer of 0 to 8.
상기 식 (4)[식 (4) 중 Ar은 각각 독립적으로 식 (5) 또는 식 (6) 중 어느 것이며, 식 (5)와 식 (6)의 몰비율은 식 (5)/식 (6)=1~3이다. q는 반복수이며, 0~5의 정수이다. r은 가수를 나타내고, 1 또는 2이다]로 나타내어지는 에폭시 수지의 제법 등에 대해서는 공지이며, 일반적으로는 Nippon Kayaku Co., Ltd.로부터 NC-3500 시리즈로서 시판품을 입수 가능하다. 상기 식 (4)의 화합물은, 예를 들면 NC-3500 시리즈의 그레이드 중에서 적합한 것을 적당히 선택하거나 합성하면 좋다.In the above formula (4) [Ar in formula (4) is each independently either formula (5) or formula (6), and the molar ratio of formula (5) and formula (6) is formula (5) / formula (6) )=1~3. q is the number of repetitions and is an integer from 0 to 5. r represents the valence and is 1 or 2], etc. are known for the production method of the epoxy resin, and generally commercially available products are available from Nippon Kayaku Co., Ltd. as the NC-3500 series. The compound of formula (4) may be appropriately selected or synthesized from, for example, grades of the NC-3500 series.
1분자 중에 중합 가능한 에틸렌성 불포화기와 카르복시기를 겸비하는 화합물 (b)로서는, 예를 들면 (메타)아크릴산류나 크로톤산, α-시아노신남산, 신남산, 또는 포화 또는 불포화 2염기산과 불포화기 함유 모노글리시딜 화합물의 반응물 등을 들 수 있다. 상기에 있어서 (메타)아크릴산류로서는, 예를 들면 (메타)아크릴산, β-스티릴아크릴산, β-푸르푸릴아크릴산, (메타)아크릴산 2량체, 포화 또는 불포화 2염기산 무수물과 1분자 중에 1개의 수산기를 갖는 (메타)아크릴레이트 유도체와 당몰 반응물인 반에스테르류, 포화 또는 불포화 2염기산과 모노글리시딜(메타)아크릴레이트 유도체류의 당몰 반응물인 반에스테르류 등의 1분자 중에 카르복시기를 1개 포함하는 모노카르복실산 화합물, 또한 1분자 중에 복수의 수산기를 갖는 (메타)아크릴레이트 유도체와 당몰 반응물인 반에스테르류, 포화 또는 불포화 2염기산과 복수의 에폭시기를 갖는 글리시딜(메타)아크릴레이트 유도체류의 당몰 반응물인 반에스테르류 등의 1분자 중에 카르복시기를 복수 갖는 폴리카르복실산 화합물 등을 들 수 있다.Compounds (b) that have both an ethylenically unsaturated group and a carboxyl group that can be polymerized in one molecule include, for example, (meth)acrylic acids, crotonic acid, α-cyanocinnamic acid, cinnamic acid, or saturated or unsaturated dibasic acids and unsaturated group-containing mono Reactants of glycidyl compounds, etc. can be mentioned. In the above, (meth)acrylic acids include, for example, (meth)acrylic acid, β-styrylacrylic acid, β-furfuryl acrylic acid, (meth)acrylic acid dimer, saturated or unsaturated dibasic acid anhydride, and one molecule per molecule. One carboxyl group per molecule, such as half-esters, which are molar reactants of (meth)acrylate derivatives with hydroxyl groups, and half-esters, which are molar reactants of saturated or unsaturated dibasic acids and monoglycidyl (meth)acrylate derivatives. monocarboxylic acid compounds, including (meth)acrylate derivatives having multiple hydroxyl groups in one molecule, half-esters that are molar reactants, glycidyl (meth)acrylate having a saturated or unsaturated dibasic acid, and multiple epoxy groups. Examples include polycarboxylic acid compounds having multiple carboxyl groups in one molecule, such as half esters, which are mole reactants of derivatives.
이들 중 에폭시 수지와 성분 (b)의 반응의 안정성을 고려하면 성분 (b)는 모노카르복실산인 것이 바람직하고, 모노카르복실산과 폴리카르복실산을 병용하는 경우에도 모노카르복실산의 몰량/폴리카르복실산의 몰량으로 나타내어지는 값이 15 이상인 것이 바람직하다.Among these, considering the stability of the reaction between the epoxy resin and component (b), it is preferable that component (b) is a monocarboxylic acid. Even when monocarboxylic acid and polycarboxylic acid are used together, the molar amount of monocarboxylic acid / poly It is preferable that the value expressed in molar amount of carboxylic acid is 15 or more.
가장 바람직하게는 활성 에너지선 경화형 수지 조성물로 했을 때의 감도의 점에서 (메타)아크릴산, (메타)아크릴산과 ε-카프로락톤의 반응 생성물 또는 신남산을 들 수 있다.Most preferably, in terms of sensitivity when used as an active energy ray-curable resin composition, (meth)acrylic acid, a reaction product of (meth)acrylic acid and ε-caprolactone, or cinnamic acid are used.
1분자 중에 1개 이상의 중합 가능한 에틸렌성 불포화기와 1개 이상의 카르복시기를 겸비하는 화합물로서는 화합물 중에 수산기를 갖지 않는 것이 바람직하다.As a compound having both one or more polymerizable ethylenically unsaturated groups and one or more carboxyl groups in one molecule, it is preferable that the compound does not have a hydroxyl group.
1분자 중에 수산기와 카르복시기를 겸비하는 화합물 (c)는 카르복실레이트 화합물 중에 수산기를 도입하는 것을 목적으로 하여 반응시키는 것이다. 이들에는 1분자 중에 1개의 수산기와 1개의 카르복시기를 겸비하는 화합물, 1분자 중에 2개 이상의 수산기와 1개의 카르복시기를 겸비하는 화합물, 1분자 중에 1개 이상의 수산기와 2개 이상의 카르복시기를 겸비하는 화합물이 있다. Compound (c), which has both a hydroxyl group and a carboxyl group in one molecule, is reacted for the purpose of introducing a hydroxyl group into the carboxylate compound. These include compounds that have both one hydroxyl group and one carboxyl group in one molecule, compounds that have both two or more hydroxyl groups and one carboxyl group in one molecule, and compounds that have both one or more hydroxyl groups and two or more carboxyl groups in one molecule. there is.
1분자 중에 1개의 수산기와 1개의 카르복시기를 겸비하는 화합물로서는, 예를 들면 히드록시프로피온산, 히드록시부탄산, 히드록시스테아르산 등을 들 수 있다. 또한, 1분자 중에 2개 이상의 수산기와 1개의 카르복시기를 겸비하는 화합물로서는 디메틸올아세트산, 디메틸올프로피온산, 디메틸올부탄산 등을 들 수 있다. 1분자 중에 1개 이상의 수산기와 2개 이상의 카르복시기를 겸비하는 화합물로서는 히드록시프탈산 등을 들 수 있다.Examples of compounds having both one hydroxyl group and one carboxyl group in one molecule include hydroxypropionic acid, hydroxybutanoic acid, and hydroxystearic acid. Additionally, compounds having both two or more hydroxyl groups and one carboxyl group in one molecule include dimethylolacetic acid, dimethylolpropionic acid, and dimethylolbutanoic acid. Examples of compounds having both one or more hydroxyl groups and two or more carboxyl groups in one molecule include hydroxyphthalic acid.
이들 중 수산기는 1분자 중에 2개 이상 포함되는 것이 본 발명의 효과를 고려하면 바람직하다. 또한, 카르복시기는 1분자 중 1개인 것이 카르복실레이트화 반응의 안정성을 고려하면 바람직하다. 가장 바람직하게는 1분자 중에 2개의 수산기와 1개의 카르복시기를 갖는 것이 바람직하다. 원재료의 입수를 고려하면 디메틸올프로피온산과 티메틸올부탄산이 특히 적합하다.Among these, it is preferable that two or more hydroxyl groups are included in one molecule, considering the effect of the present invention. Additionally, considering the stability of the carboxylate reaction, it is preferable that there is only one carboxyl group per molecule. Most preferably, it has two hydroxyl groups and one carboxyl group in one molecule. Considering the availability of raw materials, dimethylolpropionic acid and thimethylolbutanoic acid are particularly suitable.
1분자 중에 1개 이상의 수산기와 1개 이상의 카르복시기를 겸비하는 화합물로서는 화합물 중에 중합 가능한 에틸렌성 불포화기를 갖지 않는 것이 바람직하다.As a compound having both one or more hydroxyl groups and one or more carboxyl groups in one molecule, it is preferable that the compound does not have a polymerizable ethylenically unsaturated group.
이 카르복실레이트화 반응에 있어서의 에폭시 수지와 성분 (b) 및 성분 (c)의 주입 비율로서는 용도에 따라 적당히 변경되어야 할 것이다. 즉, 모든 에폭시기를 카르복실레이트화한 경우에는 미반응의 에폭시기가 잔존하지 않기 때문에 반응성 에폭시카르복실레이트 수지로서의 보존 안정성은 높다. 이 경우에는 도입한 2중 결합에 의한 반응성만을 이용하게 된다.The injection ratio of the epoxy resin and component (b) and component (c) in this carboxylate reaction should be appropriately changed depending on the application. That is, when all epoxy groups are carboxylated, no unreacted epoxy groups remain, so the storage stability as a reactive epoxycarboxylate resin is high. In this case, only the reactivity due to the introduced double bond is used.
한편, 성분 (b) 및 성분 (c)의 주입량을 감량하여 미반응의 잔존 에폭시기를 남김으로써 도입한 불포화 결합에 의한 반응성과, 잔존하는 에폭시기에 의한 반응, 예를 들면 광 양이온 촉매에 의한 중합 반응이나 열중합 반응을 복합적으로 이용하는 것도 가능하다. 그러나 이 경우에는 반응성 에폭시카르복실레이트 수지의 보존및 제조 조건의 검토에는 주의를 기울여야 한다.On the other hand, by reducing the injection amount of component (b) and component (c) to leave unreacted remaining epoxy groups, the reactivity due to the introduced unsaturated bond and the reaction due to the remaining epoxy group, for example, polymerization reaction using a photo cation catalyst It is also possible to use a combination of thermal polymerization reactions. However, in this case, care must be taken to review the storage and manufacturing conditions of the reactive epoxycarboxylate resin.
에폭시기를 잔존시키지 않는 반응성 에폭시카르복실레이트 수지를 제조할 경우 성분 (b) 및 성분 (c)의 총계가 에폭시 수지의 합계의 1당량에 대해서 0.9당량 이상 1.2당량 이하인 것이 바람직하다. 이 범위이면 비교적 안정적인 조건에서의 제조가 가능하다. 이것보다 카르복실산 화합물의 주입량이 많을 경우에는 과잉의 성분 (b) 및 성분 (c)가 잔존해 버리기 때문에 바람직하지 않다.When producing a reactive epoxy carboxylate resin that does not retain epoxy groups, it is preferable that the total of component (b) and component (c) is 0.9 equivalent to 1.2 equivalent based on 1 equivalent of the total epoxy resin. Within this range, manufacturing is possible under relatively stable conditions. If the amount of the carboxylic acid compound injected is greater than this, excess component (b) and component (c) remain, which is not preferable.
또한, 에폭시기를 잔류시킬 경우에는 성분 (b) 및 성분 (c)의 총계가 에폭시 수지의 합계의 1당량에 대해서 0.2 당량 이상 0.9 당량 미만인 것이 바람직하다. 이것의 범위를 일탈할 경우에는 복합 경화의 효과가 약해진다. 물론 이 경우에는 반응 중의 겔화나 반응성 에폭시카르복실레이트 수지의 경시 안정성에 대해서 충분한 주의가 필요하다.In addition, when the epoxy group is left, it is preferable that the total of component (b) and component (c) is 0.2 equivalent to less than 0.9 equivalent based on 1 equivalent of the total epoxy resin. If it deviates from this range, the effect of composite hardening becomes weaker. Of course, in this case, sufficient attention must be paid to gelation during the reaction and the stability over time of the reactive epoxycarboxylate resin.
카르복실레이트화 반응은 무용제로 반응시키거나 또는 용제로 희석해서 반응시킬 수도 있다. 여기에서 사용할 수 있는 용제로서는 카르복실레이트화 반응에 대해서 이너트인 용제이면 특별히 한정은 없다.The carboxylate reaction can be carried out using a non-solvent or diluted with a solvent. The solvent that can be used here is not particularly limited as long as it is a solvent that is inert to the carboxylate reaction.
바람직한 용제의 사용량은 얻어지는 수지의 점도나 용도에 의해 적당히 조정되어야 할 것이지만 바람직하게는 고형분 함유율 90~30질량%, 보다 바람직하게는 80~50질량%가 되도록 사용된다.The amount of the preferred solvent must be adjusted appropriately depending on the viscosity of the resulting resin and its intended use, but it is preferably used so that the solid content is 90 to 30% by mass, more preferably 80 to 50% by mass.
카르복실레이트 반응에 사용하는 용제로서는, 예를 들면 톨루엔, 크실렌, 에틸벤젠, 테트라메틸벤젠 등의 방향족계 탄화수소 용제, 헥산, 옥탄, 데칸 등의 지방족계 탄화수소 용제, 및 그들의 혼합물인 석유 에테르, 화이트 가솔린, 솔벤트 나프타 등, 에스테르계 용제, 에테르계 용제, 케톤계 용제 등을 들 수 있다.Solvents used in the carboxylate reaction include, for example, aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, and mixtures thereof such as petroleum ether and white. Gasoline, solvent naphtha, etc., ester-based solvents, ether-based solvents, ketone-based solvents, etc. can be mentioned.
에스테르계 용제로서는 아세트산 에틸, 아세트산 프로필, 아세트산 부틸 등의 알킬아세테이트류, γ-부티로락톤 등의 환형상 에스테르류, 에틸렌글리콜모노메틸에테르아세테이트, 디에틸렌글리콜모노메틸에테르모노아세테이트, 디에틸렌글리콜모노에틸에테르모노아세테이트, 트리에틸렌글리콜모노에틸에테르모노아세테이트, 디에틸렌글리콜모노부틸에테르모노아세테이트, 프로필렌글리콜모노메틸에테르모노아세테이트, 부틸렌글리콜모노메틸에테르아세테이트 등의 모노 또는 폴리알킬렌글리콜모노알킬에테르모노아세테이트류, 글루타르산 디알킬, 숙신산 디알킬, 아디프산 디알킬 등의 폴리카르복실산 알킬에스테르류 등을 들 수 있다.Ester-based solvents include alkyl acetates such as ethyl acetate, propyl acetate, butyl acetate, cyclic esters such as γ-butyrolactone, ethylene glycol monomethyl ether acetate, diethylene glycol monomethyl ether monoacetate, and diethylene glycol mono. Mono or polyalkylene glycol monoalkyl ether monoacetate such as ethyl ether monoacetate, triethylene glycol monoethyl ether monoacetate, diethylene glycol monobutyl ether monoacetate, propylene glycol monomethyl ether monoacetate, butylene glycol monomethyl ether acetate, etc. and polycarboxylic acid alkyl esters such as acetates, dialkyl glutarate, dialkyl succinate, and dialkyl adipic acid.
에테르계 용제로서는 디에틸에테르, 에틸부틸에테르 등의 알킬에테르류, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 디프로필렌글리콜디메틸에테르, 디프로필렌글리콜디에틸에테르, 트리에틸렌글리콜디메틸에테르, 트리에틸렌글리콜디에틸에테르 등의 글리콜에테르류, 테트라히드로푸란 등의 환형상 에테르류 등을 들 수 있다.Ether-based solvents include alkyl ethers such as diethyl ether and ethyl butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, triethylene glycol dimethyl ether, and triethylene glycol. Glycol ethers such as diethyl ether, cyclic ethers such as tetrahydrofuran, etc. are mentioned.
케톤계 용제로서는 아세톤, 메틸에틸케톤, 시클로헥산온, 이소포론 등을 들 수 있다.Examples of ketone-based solvents include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
카르복실레이트 반응 시에는 반응을 촉진시키기 위해서 촉매를 사용하는 것이 바람직하다. 상기 촉매의 사용량은 에폭시 수지, 성분 (b), 필요에 따라 사용되는 성분 (c), 및 경우에 따라 용제 그 외를 첨가한 반응물의 총량 100질량부에 대해서 0.1~10질량부이다. 그 때의 반응 온도는 60~150℃이며, 또한 반응 시간은 바람직하게는 5~60시간이다. 사용할 수 있는 촉매의 구체예로서는, 예를 들면 트리에틸아민, 벤질디메틸아민, 트리에틸암모늄클로라이드, 벤질트리메틸암모늄브로마이드, 벤질트리메틸암모늄아이오다이드, 트리페닐포스핀, 트리페닐스티빈, 메틸트리페닐스티빈, 옥탄산 크롬, 옥탄산 지르코늄 등 기지 일반의 염기성 촉매 등을 들 수 있다.During carboxylate reaction, it is preferable to use a catalyst to promote the reaction. The amount of the catalyst used is 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the reactant to which the epoxy resin, component (b), component (c) used as needed, and solvent and others are added as the case may be. The reaction temperature at that time is 60 to 150°C, and the reaction time is preferably 5 to 60 hours. Specific examples of catalysts that can be used include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, triphenylstivine, and methyltriphenylstivine. Common basic catalysts such as bean, chromium octanoate, and zirconium octanoate can be mentioned.
또한, 열중합 금지제를 사용할 수도 있다. 열중합 금지제로서 하이드로퀴논모노메틸에테르, 2-메틸하이드로퀴논, 하이드로퀴논, 디페닐피크릴히드라진, 디페닐아민, 3,5-디-tert-부틸-4-히드록시톨루엔 등을 사용하는 것이 바람직하다.Additionally, a thermal polymerization inhibitor can also be used. It is recommended to use hydroquinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-di-tert-butyl-4-hydroxytoluene, etc. as thermal polymerization inhibitors. desirable.
카르복실레이트화 반응은 적당히 샘플링하면서 샘플의 산가가 5㎎KOH/g 이하, 바람직하게는 3㎎KOH/g 이하가 된 시점을 종점으로 한다.The end point of the carboxylation reaction is when the acid value of the sample reaches 5 mgKOH/g or less, preferably 3 mgKOH/g or less, while sampling appropriately.
이렇게 해서 얻어진 반응성 에폭시카르복실레이트 수지의 바람직한 분자량 범위로서는 GPC(겔 퍼미에이션 크로마토그래피)에 있어서의 폴리스티렌 환산 중량 평균 분자량이 500~50,000의 범위이며, 보다 바람직하게는 800~30,000이며, 특히 바람직하게는 800~10,000이다.A preferable molecular weight range of the reactive epoxycarboxylate resin obtained in this way is a polystyrene-equivalent weight average molecular weight in GPC (gel permeation chromatography) of 500 to 50,000, more preferably 800 to 30,000, and especially preferably 800 to 30,000. is 800~10,000.
상기 분자량이 500보다 작을 경우에는 경화물의 강인성이 충분히 발휘되지 않고, 또한 50,000보다 클 경우에는 점도가 높아져 도공(塗工) 등이 곤란해진다.If the molecular weight is less than 500, the toughness of the cured product is not sufficiently exhibited, and if it is greater than 50,000, the viscosity increases and coating becomes difficult.
이어서, 본 발명에 의한 반응성 폴리카르복실산 수지는 상기 반응성 에폭시카르복실레이트 수지에 다염기산 무수물 (d)를 반응시켜서 얻어진다.Next, the reactive polycarboxylic acid resin according to the present invention is obtained by reacting the reactive epoxycarboxylate resin with a polybasic acid anhydride (d).
이 산 부가 공정에 의해 카르복실기를 도입하는 이유로서는, 예를 들면 레지스트 패터닝 등이 필요하게 되는 용도에 있어서 활성 에너지선 비조사부에 알칼리수로의 가용성을 부여시키는 것 및 금속, 무기물 등으로의 밀착성을 부여시키는 것 등이다. 이 산 부가 공정은 에폭시카르복실레이트 화합물의 수산기에 성분 (d)를 반응시켜서 에스테르 결합을 통해서 카르복실기를 도입하는 것이다.The reason for introducing a carboxyl group through this acid addition process is to provide solubility in alkaline water to the area not irradiated with active energy rays and adhesion to metals, inorganic substances, etc. in applications requiring resist patterning, etc. What to do, etc. This acid addition process involves reacting component (d) with the hydroxyl group of the epoxycarboxylate compound to introduce a carboxyl group through an ester bond.
성분 (d)로서는, 예를 들면 1분자 중에 환형상 산무수물 구조를 갖는 화합물이면 전부 사용할 수 있지만 알칼리 수용액 현상성, 내열성, 가수 분해 내성 등이 우수한 무수숙신산, 무수프탈산, 테트라히드로무수프탈산, 헥사히드로무수프탈산, 무수이타콘산, 3-메틸-테트라히드로무수프탈산, 4-메틸-헥사히드로무수프탈산, 수소 첨가 무수트리멜리트산, 무수트리멜리트산 또는 무수말레산이 바람직하다.As component (d), for example, any compound that has a cyclic acid anhydride structure in one molecule can be used, but succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, and hexahydrate, which are excellent in alkaline aqueous solution developability, heat resistance, and hydrolysis resistance, etc. Hydrophthalic anhydride, itaconic anhydride, 3-methyl-tetrahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, hydrogenated trimellitic anhydride, trimellitic anhydride or maleic anhydride are preferred.
성분 (d)를 부가시키는 반응은 상기 에폭시카르복실레이트 화합물의 용액에 성분 (d)를 첨가함으로써 행할 수 있다. 첨가량은 용도에 따라 적당히 변경하면 좋다.The reaction for adding component (d) can be performed by adding component (d) to the solution of the epoxycarboxylate compound. The amount added may be appropriately changed depending on the intended use.
그러나 본 발명의 반응성 폴리카르복실산 수지 혼합물을 알칼리 현상형의 레지스트로서 사용할 경우 성분 (d)를 상기 산 부가 공정에 의해 얻어지는 반응성 폴리카르복실산 수지의 고형분 산가(JISK5601-2-1: 1999에 준거)가 20~120㎎·KOH/g, 보다 바람직하게는 40~100㎎·KOH/g이 되는 계산량을 주입하는 것이 바람직하다.However, when the reactive polycarboxylic acid resin mixture of the present invention is used as an alkali-developable resist, component (d) is adjusted to the solid acid value of the reactive polycarboxylic acid resin obtained by the acid addition process (JISK5601-2-1: 1999). It is desirable to inject a calculated amount such that the standard) is 20 to 120 mg·KOH/g, more preferably 40 to 100 mg·KOH/g.
고형분 산가가 이 범위일 경우 본 발명의 활성 에너지선 경화형 수지 조성물의 알칼리 수용액 현상성이 양호한 성능을 나타낸다. 즉, 양호한 패터닝성과 과현상에 대한 관리 폭도 넓고, 또한 과잉의 산무수물이 잔류하는 경우도 없다.When the solid acid value is within this range, the active energy ray-curable resin composition of the present invention exhibits good alkaline aqueous solution developability. In other words, it has good patterning properties and a wide range of control over over-development, and there is no case where excess acid anhydride remains.
반응 시에는 반응을 촉진시키기 위해서 촉매를 사용하는 것이 바람직하고, 상기 촉매의 사용량은 반응성 에폭시카르복실레이트 수지 및 성분 (d), 경우에 따라 용제 그 외를 첨가한 반응물의 총량에 대해서 0.1~10질량부이다. 그 때의 반응 온도는 60~150℃이며, 또한 반응 시간은 바람직하게는 5~60시간이다. 사용할 수 있는 촉매의 구체예로서는, 예를 들면 트리에틸아민, 벤질디메틸아민, 트리에틸암모늄클로라이드, 벤질트리메틸암모늄브로마이드, 벤질트리메틸암모늄아이오다이드, 트리페닐포스핀, 트리페닐스티빈, 메틸트리페닐스티빈, 옥탄산 크롬, 옥탄산 지르코늄 등을 들 수 있다.During the reaction, it is preferable to use a catalyst to promote the reaction, and the amount of the catalyst used is 0.1 to 10 based on the total amount of reactants to which the reactive epoxycarboxylate resin, component (d), and, in some cases, solvent and others are added. It is the mass part. The reaction temperature at that time is 60 to 150°C, and the reaction time is preferably 5 to 60 hours. Specific examples of catalysts that can be used include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, triphenylstivine, and methyltriphenylstivine. Examples include bean, chromium octanoate, and zirconium octanoate.
본 산 부가 반응은 무용제 또는 용제로 희석해서 반응시킬 수 있다. 용제로서는 산 부가 반응에 영향을 주지 않는 용제이면 특별히 한정은 없다. 또한, 전 공정인 에폭시카르복실레이트화 반응에서 용제를 사용했을 경우에는 산 부가 반응에 영향을 주지 않는 것을 조건으로 용제를 제거하는 일 없이 직접 산 부가 반응에 부여할 수도 있다. 사용할 수 있는 용제는 카르복실레이트화 반응에서 사용할 수 있는 것과 동일한 것이어도 좋다.This acid addition reaction can be carried out without a solvent or by diluting with a solvent. There is no particular limitation as to the solvent as long as it is a solvent that does not affect the acid addition reaction. Additionally, when a solvent is used in the epoxy carboxylate reaction, which is the previous step, it can be directly applied to the acid addition reaction without removing the solvent, provided that it does not affect the acid addition reaction. The solvent that can be used may be the same as that that can be used in the carboxylation reaction.
바람직한 용제의 사용량은 얻어지는 수지의 점도나 용도에 따라 적당히 조정되어야 할 것이지만 바람직하게는 고형분 함유율 90~30질량%, 보다 바람직하게는 80~50질량%가 되도록 사용된다.The amount of the preferred solvent must be adjusted appropriately depending on the viscosity and use of the resulting resin, but is preferably used so that the solid content is 90 to 30% by mass, more preferably 80 to 50% by mass.
이 외에도 단독 또는 혼합 유기 용제 중에서 행할 수 있다. 이 경우 경화형 수지 조성물로서 사용했을 경우에는 직접 조성물로서 이용할 수 있으므로 바람직하다.In addition to this, it can be carried out alone or in mixed organic solvents. In this case, when used as a curable resin composition, it is preferable because it can be used directly as a composition.
또한, 열중합 금지제의 사용이 바람직하고, 상기 열중합 금지제로서는 상기 에폭시카르복실레이트화 반응에 있어서의 열중합 금지제와 마찬가지의 것을 들 수 있다.Additionally, the use of a thermal polymerization inhibitor is preferable, and examples of the thermal polymerization inhibitor include those similar to the thermal polymerization inhibitor in the epoxycarboxylation reaction.
본 산 부가 반응은 적당히 샘플링하면서 반응물의 산가가 설정한 산가의 플러스 마이너스 10%의 범위가 된 점을 들어 종점으로 한다.This acid addition reaction is sampled appropriately and the end point is set at the point where the acid value of the reactant falls within plus or minus 10% of the set acid value.
이렇게 해서 얻어진 반응성 폴리카르복실산 수지의 바람직한 분자량 범위로서는 GPC 측정에 있어서의 폴리스티렌 환산 중량 평균 분자량이 500~50,000의 범위이며, 보다 바람직하게는 800~30,000이며, 특히 바람직하게는 800~10,000이다.As a preferable molecular weight range of the reactive polycarboxylic acid resin obtained in this way, the polystyrene conversion weight average molecular weight in GPC measurement is in the range of 500 to 50,000, more preferably 800 to 30,000, and particularly preferably 800 to 10,000.
상기 분자량이 500보다 작을 경우에는 경화물의 강인성이 충분히 발휘되지 않고, 또한 50,000보다 클 경우에는 점도가 높아져 도공 등이 곤란해진다.If the molecular weight is less than 500, the toughness of the cured product is not sufficiently exhibited, and if it is greater than 50,000, the viscosity increases, making coating difficult.
본 발명의 활성 에너지선 경화형 수지 조성물은 반응성 폴리카르복실산 수지 혼합물을 포함하는 것이며, 반응성 에폭시카르복실레이트 수지를 병용해도 아무런 문제는 없다.The active energy ray-curable resin composition of the present invention contains a reactive polycarboxylic acid resin mixture, and there is no problem even if a reactive epoxycarboxylate resin is used in combination.
본 발명의 반응성 폴리카르복실산 수지 혼합물은The reactive polycarboxylic acid resin mixture of the present invention is
제법 1: 성분 (a), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 성분 (d)의 반응물인 반응성 폴리카르복실산 수지, 및 성분 (a'), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 성분 (d)의 반응물인 반응성 폴리카르복실산 수지를 각각 합성해서 혼합하는 방법,Manufacturing method 1: a reactive epoxycarboxylate resin as a reactant obtained by reacting component (a), component (b), and optionally component (c), a reactive polycarboxylic acid resin as a reactant of component (d), and components Reactive epoxycarboxylate resin, which is a reactant obtained by reacting (a'), component (b), and, if necessary, component (c), and reactive polycarboxylic acid resin, which is a reactant of component (d), are synthesized and mixed, respectively. method,
제법 2: 성분 (a) 및 성분 (a'), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지 혼합물과 성분 (d)를 반응시키는 방법에 의해 얻을 수 있고, 어느 제법을 사용해도 좋다.Manufacturing Method 2: A method of reacting component (d) with a reactive epoxycarboxylate resin mixture, which is a reactant obtained by reacting component (a), component (a'), component (b), and, if necessary, component (c). It can be obtained by any manufacturing method.
제법 1을 사용할 경우 성분 (a)로부터 얻어지는 반응성 폴리카르복실산 수지와 성분 (a')로부터 얻어지는 반응성 폴리카르복실산 수지의 혼합 비율은 용도에 따라 적당히 변경되어야 할 것이다. 성분 (a')로부터 얻어지는 반응성 폴리카르복실산 수지의 비율이 많아지면 현상성은 양호해지지만 경화물의 절연 신뢰성이 저하된다.When using Production Method 1, the mixing ratio of the reactive polycarboxylic acid resin obtained from component (a) and the reactive polycarboxylic acid resin obtained from component (a') should be appropriately changed depending on the intended use. As the proportion of the reactive polycarboxylic acid resin obtained from component (a') increases, developability improves, but the insulation reliability of the cured product deteriorates.
성분 (a')로부터 얻어지는 반응성 폴리카르복실산 수지는 반응성 폴리카르복실산 수지 혼합물의 총량 100질량%에 대해서 1~50질량%가 바람직하고, 1~30질량%가 보다 바람직하고, 1~20질량%가 더 바람직하다.The reactive polycarboxylic acid resin obtained from component (a') is preferably 1 to 50% by mass, more preferably 1 to 30% by mass, and 1 to 20% by mass relative to the total amount of 100% by mass of the reactive polycarboxylic acid resin mixture. Mass percent is more preferable.
제법 2에서 얻어진 반응성 폴리카르복실산 수지 혼합물은 절연 신뢰성, 현상성이 양호해지기 때문에 제법 2를 사용하는 것이 보다 바람직하다.Since the reactive polycarboxylic acid resin mixture obtained in Production Method 2 has good insulation reliability and developability, it is more preferable to use Production Process 2.
이것은 제법 2에 의해 성분 (a)와 성분 (a')가 성분 (c) 및/또는 성분 (d)를 개재하여 결합하는 구조가 얻어지기 때문이라고 생각한다.This is believed to be because, through manufacturing method 2, a structure is obtained in which component (a) and component (a') are bonded via component (c) and/or component (d).
성분 (a)와 성분 (a')의 혼합 비율로서는 용도에 따라 적당히 변경되어야 할 것이다. 성분 (a')의 비율이 많아지면 현상성은 양호해지지만 경화물의 절연 신뢰성이 저하된다.The mixing ratio of component (a) and component (a') should be appropriately changed depending on the intended use. As the ratio of component (a') increases, developability improves, but the insulation reliability of the cured product deteriorates.
성분 (a')는 성분 (a)와 성분 (a')의 총량 100질량%에 대해서 1~50질량%가 바람직하고, 1~30질량%가 보다 바람직하고, 1~20질량%가 더 바람직하다.Component (a') is preferably 1 to 50% by mass, more preferably 1 to 30% by mass, and still more preferably 1 to 20% by mass, based on 100% by mass of the total amount of component (a) and component (a'). do.
또한, 본 발명의 반응성 에폭시카르복실레이트 수지 혼합물은 상기 제법 2의 중간 생성물로서 얻을 수 있다. 또한, 본 발명의 에폭시카르복실레이트 수지 혼합물은 성분 (a), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지와 성분 (a'), 성분 (b), 및 필요에 따라 성분 (c)를 반응시켜서 얻어지는 반응물인 반응성 에폭시카르복실레이트 수지를 각각 합성해서 혼합해도 좋다.Additionally, the reactive epoxycarboxylate resin mixture of the present invention can be obtained as an intermediate product of Production Method 2 above. In addition, the epoxycarboxylate resin mixture of the present invention is a reactive epoxycarboxylate resin obtained by reacting component (a), component (b), and, if necessary, component (c), and component (a') and component (c). (b) and, if necessary, the reactive epoxy carboxylate resin, which is a reactant obtained by reacting component (c), may be synthesized and mixed, respectively.
본 발명의 반응성 폴리카르복실산 혼합물의 산가는 50~70㎎·KOH/g인 것이 바람직하고, 55~65㎎·KOH/g인 것이 더 바람직하고, 58~62㎎·KOH/g인 것이 특히 바람직하다. 산가가 상기 범위에 있음으로써 현상성이 양호해진다.The acid value of the reactive polycarboxylic acid mixture of the present invention is preferably 50 to 70 mg·KOH/g, more preferably 55 to 65 mg·KOH/g, and especially 58 to 62 mg·KOH/g. desirable. When the acid value is within the above range, developability becomes good.
또한, 본 발명의 활성 에너지선 경화형 수지 조성물은 반응성 화합물 (C)(이하, 간단히 「성분 (C)」라고도 나타낸다)를 포함하고 있어도 좋다. 성분 (C)는 상기 반응성 폴리카르복실산 수지 이외의 화합물이면 특별히 한정되지 않고, 구체예로서는 라디칼 반응형의 아크릴레이트류, 양이온 반응형의 그 외 에폭시 화합물류, 그 쌍방에 감응하는 비닐 화합물류 등의 소위 반응성 올리고머류를 들 수 있다.In addition, the active energy ray-curable resin composition of the present invention may contain a reactive compound (C) (hereinafter also simply referred to as “component (C)”). Component (C) is not particularly limited as long as it is a compound other than the above reactive polycarboxylic acid resin, and specific examples include radically reactive acrylates, cationic reactive epoxy compounds, vinyl compounds sensitive to both, etc. So-called reactive oligomers can be mentioned.
사용할 수 있는 아크릴레이트류로서는 단관능 (메타)아크릴레이트류, 다관능 (메타)아크릴레이트류, 그 외 에폭시아크릴레이트, 폴리에스테르아크릴레이트, 우레탄아크릴레이트 등을 들 수 있다.Acrylates that can be used include monofunctional (meth)acrylates, polyfunctional (meth)acrylates, epoxy acrylates, polyester acrylates, and urethane acrylates.
단관능 (메타)아크릴레이트류로서는 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 라우릴(메타)아크릴레이트, 폴리에틸렌글리콜(메타)아크릴레이트, 폴리에틸렌글리콜(메타)아크릴레이트모노메틸에테르, 페닐에틸(메타)아크릴레이트, 이소보르닐(메타)아크릴레이트, 시클로헥실(메타)아크릴레이트, 벤질(메타)아크릴레이트, 테트라히드로푸르푸릴(메타)아크릴레이트 등을 들 수 있다.Monofunctional (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, lauryl (meth)acrylate, polyethylene glycol (meth)acrylate, and polyethylene glycol (meth)acrylate. ) Acrylate monomethyl ether, phenylethyl (meth)acrylate, isobornyl (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, etc. I can hear it.
다관능 (메타)아크릴레이트류로서는 부탄디올디(메타)아크릴레이트, 헥산디올디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 노난디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸이소시아누레이트, 폴리프로필렌글리콜디(메타)아크릴레이트, 아디프산 에폭시디(메타)아크릴레이트, 비스페놀에틸렌옥사이드디(메타)아크릴레이트, 수소화비스페놀에틸렌옥사이드디(메타)아크릴레이트, 비스페놀디(메타)아크릴레이트, 히드록시피발산 네오펜글리콜의 ε-카프로락톤 부가물의 디(메타)아크릴레이트, 디펜타에리스리톨과 ε-카프로락톤의 반응물의 폴리(메타)아크릴레이트, 디펜타에리스리톨폴리(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 트리에틸올프로판트리(메타)아크릴레이트 및 그 에틸렌옥사이드 부가물, 펜타에리스리톨트리(메타)아크릴레이트 및 그 에틸렌옥사이드 부가물, 펜타에리스리톨테트라(메타)아크릴레이트 및 그 에틸렌옥사이드 부가물, 디펜타에리스리톨헥사(메타)아크릴레이트 및 그 에틸렌옥사이드 부가물 등을 들 수 있다.Polyfunctional (meth)acrylates include butanediol di(meth)acrylate, hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, nonanediol di(meth)acrylate, and ethylene glycol di(meth)acrylate. ) Acrylate, diethylene di(meth)acrylate, polyethylene glycol di(meth)acrylate, tris(meth)acryloyloxyethyl isocyanurate, polypropylene glycol di(meth)acrylate, adipic acid epoxy Di(meth)acrylate, bisphenol ethylene oxide di(meth)acrylate, hydrogenated bisphenol ethylene oxide di(meth)acrylate, bisphenol di(meth)acrylate, ε-caprolactone adduct of hydroxypivalic acid neopen glycol Di(meth)acrylate, poly(meth)acrylate of the reaction product of dipentaerythritol and ε-caprolactone, dipentaerythritol poly(meth)acrylate, trimethylolpropane tri(meth)acrylate, triethylolpropane tri. (meth)acrylate and its ethylene oxide adduct, pentaerythritol tri(meth)acrylate and its ethylene oxide adduct, pentaerythritol tetra(meth)acrylate and its ethylene oxide adduct, dipentaerythritol hexa(meth)acrylate Rate and its ethylene oxide adduct, etc. can be mentioned.
사용할 수 있는 비닐 화합물류로서는 비닐에테르류, 스티렌류, 그 외 비닐 화합물을 들 수 있다. 비닐에테르류로서는 에틸비닐에테르, 프로필비닐에테르, 히드록시에틸비닐에테르, 에틸렌글리콜디비닐에테르 등을 들 수 있다. 스티렌류로서는 스티렌, 메틸스티렌, 에틸스티렌 등을 들 수 있다. 그 외 비닐 화합물로서는 트리알릴이소시아누레이트, 트리메타알릴이소시아누레이트 등을 들 수 있다.Vinyl compounds that can be used include vinyl ethers, styrenes, and other vinyl compounds. Examples of vinyl ethers include ethyl vinyl ether, propyl vinyl ether, hydroxyethyl vinyl ether, and ethylene glycol divinyl ether. Styrenes include styrene, methyl styrene, and ethyl styrene. Other vinyl compounds include triallyl isocyanurate and trimetalyl isocyanurate.
또한, 소위 반응성 올리고머류로서는 활성 에너지선에 감응 가능한 관능기와 우레탄 결합을 동일 분자 내에 겸비하는 우레탄아크릴레이트, 마찬가지로 활성 에너지선에 감응 가능한 관능기와 에스테르 결합을 동일 분자 내에 겸비하는 폴리에스테르아크릴레이트, 그 외 에폭시 수지로부터 유도되고, 활성 에너지선에 감응 가능한 관능기를 동일 분자 내에 겸비하는 에폭시아크릴레이트, 이들의 결합이 복합적으로 사용되어 있는 반응성 올리고머 등을 들 수 있다.In addition, so-called reactive oligomers include urethane acrylate, which has both a functional group that is sensitive to active energy rays and a urethane bond in the same molecule, polyester acrylate, which also has a functional group that is sensitive to active energy rays and an ester bond, etc., in the same molecule. In addition, epoxy acrylates derived from epoxy resins and having functional groups sensitive to active energy rays in the same molecule, reactive oligomers in which these bonds are used in combination, etc.
또한, 양이온 반응형 단량체로서는 일반적으로 에폭시기를 갖는 화합물이면 특별히 한정은 없다. 예를 들면, 글리시딜(메타)아크릴레이트, 메틸글리시딜에테르, 에틸글리시딜에테르, 부틸글리시딜에테르, 비스페놀A디글리시딜에테르, 3,4-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카르복실레이트(Union Carbide Corporation제 「CYRACURE UVR-6110」 등), 3,4-에폭시시클로헥실에틸-3,4-에폭시시클로헥산카르복실레이트, 비닐시클로헥센디옥시드(Union Carbide Corporation제 「ELR-4206」 등), 리모넨디옥시드(DAICEL CHEMICAL INDUSTRIES, LTD.제 「CELLOXIDE 3000」 등), 알릴시클로헥센디옥시드, 3,4-에폭시-4-메틸시클로헥실-2-프로필렌옥시드, 2-(3,4-에폭시시클로헥실-5,5-스피로-3,4-에폭시)시클로헥산-m-디옥산, 비스(3,4-에폭시시클로헥실)아디페이트(Union Carbide Corporation제 「CYRACURE UVR-6128」 등), 비스(3,4-에폭시시클로헥실메틸)아디페이트, 비스(3,4-에폭시시클로헥실)에테르, 비스(3,4-에폭시시클로헥실메틸)에테르, 비스(3,4-에폭시시클로헥실)디에틸실록산 등을 들 수 있다.Additionally, there is no particular limitation as to the cation-reactive monomer, as long as it is generally a compound having an epoxy group. For example, glycidyl (meth)acrylate, methyl glycidyl ether, ethyl glycidyl ether, butyl glycidyl ether, bisphenol A diglycidyl ether, 3,4-epoxycyclohexylmethyl-3, 4-Epoxycyclohexanecarboxylate (“CYRACURE UVR-6110” manufactured by Union Carbide Corporation, etc.), 3,4-epoxycyclohexylethyl-3,4-epoxycyclohexanecarboxylate, vinylcyclohexenedioxide (Union Carbide Corporation's "ELR-4206", etc.), limonene dioxide (DAICEL CHEMICAL INDUSTRIES, LTD.'s "CELLOXIDE 3000", etc.), allylcyclohexene dioxide, 3,4-epoxy-4-methylcyclohexyl-2-propylene oxide Seed, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-m-dioxane, bis(3,4-epoxycyclohexyl)adipate (manufactured by Union Carbide Corporation) "CYRACURE UVR-6128", etc.), bis(3,4-epoxycyclohexylmethyl) adipate, bis(3,4-epoxycyclohexyl)ether, bis(3,4-epoxycyclohexylmethyl)ether, bis( 3,4-epoxycyclohexyl)diethylsiloxane, etc. are mentioned.
이들 중 성분 (C)로서는 라디칼 경화형인 아크릴레이트류가 가장 바람직하다. 양이온형의 경우 카르복실산과 에폭시기가 반응해 버리기 때문에 2액 혼합형으로 할 필요가 발생한다.Among these, as component (C), radically curable acrylates are most preferable. In the case of the cationic type, the carboxylic acid and epoxy group react, so it is necessary to use a two-liquid mixed type.
본 발명의 활성 에너지선 경화형 수지 조성물은 조성물 중에 반응성 폴리카르복실산 수지를 97~5질량%, 바람직하게는 87~10질량%, 성분 (C)를 3~95질량%, 바람직하게는 3~80질량% 포함한다. 필요에 따라 그 외의 성분을 70질량% 정도를 상한으로 포함해도 좋다. 그 외의 성분으로서는 광중합 개시제, 그 외의 첨가제, 착색 재료, 경화 촉진제, 또한 도공 적성 부여 등을 목적으로 점도 조정을 위해 첨가되는 휘발성 용제 등을 들 수 있다. 하기에 사용할 수 있는 그 외의 성분을 예시한다.The active energy ray-curable resin composition of the present invention contains 97 to 5% by mass of reactive polycarboxylic acid resin, preferably 87 to 10% by mass, and 3 to 95% by mass of component (C), preferably 3 to 10% by mass. Contains 80% by mass. If necessary, other components may be included at an upper limit of about 70% by mass. Other components include photopolymerization initiators, other additives, coloring materials, curing accelerators, and volatile solvents added to adjust viscosity for the purpose of providing coating suitability, etc. Other components that can be used are exemplified below.
본 발명의 활성 에너지선 경화형 수지 조성물에는 추가로 착색 안료를 포함하고 있어도 좋고, 착색 안료는 본 발명의 수지 조성물을 착색 재료로 하기 위해서 사용되는 것이다. 본 발명의 활성 에너지선 경화형 수지 조성물에 사용되는 반응성 폴리카르복실산 수지 혼합물의 수산기에 의해 특히 우수한 안료로의 친화성, 즉 분산성이 발휘된다고 추찰된다. 분산성이 양호한 결과로서 안료 농도를 높게 할 수 있다. 또한, 현상을 필요하게 되는 조성물에 있어서는 분산성이 보다 적합하며, 양호한 패터닝 특성이 발휘되고, 또한 현상 용해부에 있어서의 현상 잔류물도 적어 적합하다.The active energy ray-curable resin composition of the present invention may further contain a coloring pigment, and the coloring pigment is used to use the resin composition of the present invention as a coloring material. It is assumed that the hydroxyl group of the reactive polycarboxylic acid resin mixture used in the active energy ray-curable resin composition of the present invention exhibits particularly excellent affinity for pigments, that is, dispersibility. As a result of good dispersibility, the pigment concentration can be increased. In addition, for compositions that require development, the dispersibility is more suitable, good patterning characteristics are exhibited, and the development residue in the development and dissolution area is small, so it is suitable.
상기 착색 안료로서는 프탈로시아닌계, 아조계, 퀴나크리돈계 등의 유기 안료, 카본 블랙, 산화티탄 등의 무기 안료를 들 수 있다. 이들 중 카본 블랙의 분산성이 높아 바람직하다.Examples of the coloring pigment include organic pigments such as phthalocyanine-based, azo-based, and quinacridone-based pigments, and inorganic pigments such as carbon black and titanium oxide. Among these, carbon black is preferable due to its high dispersibility.
본 발명의 활성 에너지선 경화형 수지 조성물은 추가로 광중합 개시제를 포함할 수 있다. 광중합 개시제로서는 라디칼형 광중합 개시제, 양이온계 광중합 개시제가 바람직하다.The active energy ray-curable resin composition of the present invention may further include a photopolymerization initiator. As the photopolymerization initiator, a radical type photopolymerization initiator and a cationic photopolymerization initiator are preferable.
라디칼형 광중합 개시제로서는, 예를 들면 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인프로필에테르, 벤조인이소부틸에테르 등의 벤조인류; 아세토페논, 2,2-디에톡시-2-페닐아세토페논, 1,1-디클로로아세토페논, 2-히드록시-2-메틸-페닐프로판-1-온, 디에톡시아세토페논, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노-프로판-1-온 등의 아세토페논류; 2-에틸안트라퀴논, 2-t-부틸안트라퀴논, 2-클로로안트라퀴논, 2-아밀안트라퀴논 등의 안트라퀴논류; 2,4-디에틸티옥산톤, 2-이소프로필티옥산톤, 2-클로로티옥산톤 등의 티옥산톤류; 아세토페논디메틸케탈, 벤질디메틸케탈 등의 케탈류; 벤조페논, 4-벤조일-4'-메틸디페닐술피드, 4,4'-비스메틸아미노벤조페논 등의 벤조페논류; 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥사이드 등의 포스핀옥사이드류 등의 공지 일반의 라디칼형 광중합 개시제를 들 수 있다.Examples of the radical photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; Acetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone, 2-hydroxy-2-methyl-phenylpropan-1-one, diethoxyacetophenone, 1-hydroxycyclo Acetophenones such as hexylphenyl ketone and 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propan-1-one; Anthraquinones such as 2-ethylanthraquinone, 2-t-butylanthraquinone, 2-chloroanthraquinone, and 2-amylanthraquinone; Thioxanthone such as 2,4-diethylthioxanthone, 2-isopropylthioxanthone, and 2-chlorothioxanthone; Ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal; Benzophenones, such as benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, and 4,4'-bismethylaminobenzophenone; Known general radical type photopolymerization initiators such as phosphine oxides such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide can be mentioned.
또한, 양이온계 광중합 개시제로서는 루이스산의 디아조늄염, 루이스산의 요오드늄염, 루이스산의 술포늄염, 루이스산의 포스포늄염, 그 외의 할로겐화물, 트리아진계 개시제, 보레이트계 개시제, 및 그 외의 광산 발생제 등을 들 수 있다.Additionally, cationic photopolymerization initiators include diazonium salts of Lewis acids, iodonium salts of Lewis acids, sulfonium salts of Lewis acids, phosphonium salts of Lewis acids, other halides, triazine initiators, borate initiators, and other mineral acids. Generating agents, etc. can be mentioned.
루이스산의 디아조늄염으로서는 p-메톡시페닐디아조늄플루오로포스포네이트, N,N-디에틸아미노페닐디아조늄헥사플루오로포스포네이트(SANSHIN CHEMICAL INDUSTRY CO., LTD.제 SAN-AID SI-60L/SI-80L/SI-100L 등) 등을 들 수 있고, 루이스산의 요오드늄염으로서는 디페닐요오드늄헥사플루오로포스포네이트, 디페닐요오드늄헥사플루오로안티모네이트 등을 들 수 있고, 루이스산의 술포늄염으로서는 트리페닐술포늄헥사플루오로포스포네이트(Union Carbide Corporation제 CYRACURE UVI-6990 등), 트리페닐술포늄헥사플루오로안티모네이트(Union Carbide Corporation제 CYRACURE UVI-6974 등) 등을 들 수 있고, 루이스산의 포스포늄염으로서는 트리페닐포스포늄헥사플루오로안티모네이트 등을 들 수 있다.Examples of diazonium salts of Lewis acids include p-methoxyphenyldiazonium fluorophosphonate and N,N-diethylaminophenyldiazonium hexafluorophosphonate (SAN-AID SI manufactured by SANSHIN CHEMICAL INDUSTRY CO., LTD. -60L/SI-80L/SI-100L, etc.), etc., and examples of iodonium salts of Lewis acids include diphenyliodonium hexafluorophosphonate, diphenyliodonium hexafluoroantimonate, etc. , Sulfonium salts of Lewis acids include triphenylsulfonium hexafluorophosphonate (CYRACURE UVI-6990, etc., manufactured by Union Carbide Corporation) and triphenylsulfonium hexafluoroantimonate (CYRACURE UVI-6974, etc., manufactured by Union Carbide Corporation). and the like, and examples of phosphonium salts of Lewis acids include triphenylphosphonium hexafluoroantimonate and the like.
그 외의 할로겐화물로서는 2,2,2-트리클로로-[1-4'-(디메틸에틸)페닐]에탄온(Akzo Corporation제 TRIGONAL PI 등), 2,2-디클로로-1-4-(페녹시페닐)에탄온(Sandoz AG제 SANDRAY1000 등), α,α,α-트리브로모메틸페닐술폰(Seitetsu Kagaku Co., Ltd.제 BMPS 등) 등을 들 수 있다. 트리아진계 개시제로서는 2,4,6-트리스(트리클로로메틸)-트리아진, 2,4-트리클로로메틸-(4'-메톡시페닐)-6-트리아진(Panchim S.A.제 TRIAZINE A 등), 2,4-트리클로로메틸-(4'-메톡시스티릴)-6-트리아진(Panchim S.A.제 TRIAZINE PMS 등), 2,4-트리클로로메틸-(피프로닐)-6-트리아진(Panchim S.A.제 TRIAZINE PP 등), 2,4-트리클로로메틸-(4'-메톡시나프틸)-6-트리아진(Panchim S.A.제 TRIAZINE B 등), 2[2'(5-메틸푸릴)에틸리덴]-4,6-비스(트리클로로메틸)-s-트리아진(SANWA CHEMICAL CO., LTD.제 등), 2(2'-푸릴에틸리덴)-4,6-비스(트리클로로메틸)-s-트리아진(SANWA CHEMICAL CO., LTD.제) 등을 들 수 있다.Other halides include 2,2,2-trichloro-[1-4'-(dimethylethyl)phenyl]ethanone (TRIGONAL PI manufactured by Akzo Corporation, etc.), 2,2-dichloro-1-4-(phenoxy Phenyl)ethanone (SANDRAY1000 manufactured by Sandoz AG, etc.), α,α,α-tribromomethylphenylsulfone (BMPS manufactured by Seitetsu Kagaku Co., Ltd., etc.), etc. are mentioned. Triazine-based initiators include 2,4,6-tris(trichloromethyl)-triazine, 2,4-trichloromethyl-(4'-methoxyphenyl)-6-triazine (TRIAZINE A manufactured by Panchim S.A., etc.), 2,4-trichloromethyl-(4'-methoxystyryl)-6-triazine (TRIAZINE PMS, manufactured by Panchim S.A., etc.), 2,4-trichloromethyl-(fipronil)-6-triazine ( TRIAZINE PP manufactured by Panchim S.A., etc.), 2,4-trichloromethyl-(4'-methoxynaphthyl)-6-triazine (TRIAZINE B manufactured by Panchim S.A., etc.), 2[2'(5-methylfuryl)ethyl Liden]-4,6-bis(trichloromethyl)-s-triazine (manufactured by SANWA CHEMICAL CO., LTD., etc.), 2(2'-furylethylidene)-4,6-bis(trichloromethyl) )-s-triazine (manufactured by SANWA CHEMICAL CO., LTD.), etc. can be mentioned.
보레이트계 광중합 개시제로서는 Japanese Research Institute for Photosensitizing Dyes Co., Ltd.제 NK-3876 및 NK-3881 등을 들 수 있고, 그 외의 광산 발생제 등으로서는 9-페닐아크리딘, 2,2'-비스(o-클로로페닐)-4,4',5,5'-테트라페닐-1,2-비이미다졸(KUROGANE KASEI Co., Ltd.제 비이미다졸 등), 2,2-아조비스(2-아미노-프로판)디히드로클로라이드(Wako Pure Chemical Industries, Ltd.제 V50 등), 2,2-아조비스[2-(이미다졸린-2일)프로판]디히드로클로라이드(Wako Pure Chemical Industries, Ltd.제 VA044 등), [이타-5-2-4-(시클로펜타데실)(1,2,3,4,5,6,이타)-(메틸에틸)-벤젠]철(II)헥사플루오로포스포네이트(Ciba-Geigy AG제 IRGACURE 261 등), 비스(y5-시클로펜타디에닐)비스[2,6-디플루오로-3-(1H-피리-1-일)페닐]티타늄(Ciba-Geigy AG제 CGI-784 등) 등을 들 수 있다.Borate-based photopolymerization initiators include NK-3876 and NK-3881 manufactured by Japanese Research Institute for Photosensitizing Dyes Co., Ltd. Other photoacid generators include 9-phenylacridine and 2,2'-bis. (o-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2-biimidazole (biimidazole manufactured by KUROGANE KASEI Co., Ltd., etc.), 2,2-azobis (2 -Amino-propane) dihydrochloride (V50, etc. manufactured by Wako Pure Chemical Industries, Ltd.), 2,2-azobis[2-(imidazoline-2yl) propane] dihydrochloride (Wako Pure Chemical Industries, Ltd. .VA044, etc.), [Ita-5-2-4-(cyclopentadecyl)(1,2,3,4,5,6,Ita)-(methylethyl)-benzene]Iron(II)hexafluoro Phosphonate (IRGACURE 261, etc. manufactured by Ciba-Geigy AG), bis(y5-cyclopentadienyl)bis[2,6-difluoro-3-(1H-pyri-1-yl)phenyl]titanium (Ciba- CGI-784 manufactured by Geigy AG, etc.).
이 외 아조비스이소부티로니트릴 등의 아조계 개시제, 과산화벤조일 등의 열에 감응하는 과산화물계 라디칼형 개시제 등을 함께 사용해도 좋다. 또한, 라디칼계와 양이온계의 쌍방의 광중합 개시제를 함께 사용해도 좋다. 광중합 개시제는 1종류를 단독으로 사용할 수도 있고, 2종류 이상을 함께 사용할 수도 있다.In addition, azo-based initiators such as azobisisobutyronitrile and heat-sensitive peroxide-based radical-type initiators such as benzoyl peroxide may be used together. Additionally, both radical and cationic photopolymerization initiators may be used together. One type of photopolymerization initiator may be used individually, or two or more types may be used together.
이들 중 본 발명의 반응성 폴리카르복실산 수지 혼합물의 특성을 고려하면 라디칼형 광중합 개시제가 특히 바람직하다.Among these, considering the characteristics of the reactive polycarboxylic acid resin mixture of the present invention, a radical-type photopolymerization initiator is particularly preferable.
또한, 본 발명의 활성 에너지선 경화형 수지 조성물은 체질 안료를 포함할 수도 있다. 체질 안료로서는, 예를 들면 탤크, 황산 바륨, 탄산 칼슘, 탄산 마그네슘, 티탄산 바륨, 수산화알루미늄, 실리카, 클레이 등을 들 수 있다.Additionally, the active energy ray-curable resin composition of the present invention may contain an extender pigment. Examples of extender pigments include talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, aluminum hydroxide, silica, and clay.
또한, 본 발명의 활성 에너지선 경화형 수지 조성물은 필요에 따라 그 외의 첨가제를 포함할 수 있다. 그 외의 첨가제로서는, 예를 들면 멜라민 등의 열경화 촉매, 에어로실 등의 틱소트로피 부여제, 실리콘계, 불소계의 레벨링제나 소포제, 하이드로퀴논, 하이드로퀴논모노메틸에테르 등의 중합 금지제, 안정제, 산화 방지제 등을 사용할 수 있다.Additionally, the active energy ray-curable resin composition of the present invention may contain other additives as needed. Other additives include, for example, heat curing catalysts such as melamine, thixotropy imparting agents such as Aerosil, silicone-based and fluorine-based leveling agents and anti-foaming agents, polymerization inhibitors such as hydroquinone and hydroquinone monomethyl ether, stabilizers, and antioxidants. etc. can be used.
이 외에 활성 에너지선에 반응성을 나타내지 않는 수지류(소위 이너트 폴리머)로서, 예를 들면 그 외의 에폭시 수지, 페놀 수지, 우레탄 수지, 폴리에스테르 수지, 케톤포름알데히드 수지, 크레졸 수지, 크실렌 수지, 디아릴프탈레이트 수지, 스티렌 수지, 구아나민 수지, 천연 및 합성 고무, 아크릴 수지, 폴리올레핀 수지,및 이들의 변성물을 사용할 수도 있다. 이들은 수지 조성물 중에 40질량부까지의 범위에 있어서 사용하는 것이 바람직하다.In addition, resins that do not show reactivity to active energy rays (so-called inner polymers) include, for example, other epoxy resins, phenol resins, urethane resins, polyester resins, ketone formaldehyde resins, cresol resins, xylene resins, and dia. Relyl phthalate resin, styrene resin, guanamine resin, natural and synthetic rubber, acrylic resin, polyolefin resin, and their modified products can also be used. These are preferably used in an amount of up to 40 parts by mass in the resin composition.
특히, 솔더 레지스트 용도로 반응성 폴리카르복실산 수지를 사용하고자 할 경우에는 활성 에너지선에 반응성을 나타내지 않는 수지류로서 공지 일반의 에폭시 수지를 사용하는 것이 바람직하다. 이것은 활성 에너지선에 의해 반응, 경화시킨 후에도 반응성 폴리카르복실산 수지로부터 유래되는 카르복시기가 잔류해 버리고, 결과적으로 그 경화물은 내수성이나 가수 분해성이 뒤떨어져 버린다. 따라서, 에폭시 수지를 사용함으로써 잔류하는 카르복시기를 더 카르복실레이트화하고, 또한 강고한 가교 구조를 형성시킨다. 상기 공지 일반의 에폭시 수지는 상기 양이온 반응형 단량체를 사용할 수 있다.In particular, when it is desired to use a reactive polycarboxylic acid resin for soldering resist purposes, it is preferable to use a known general epoxy resin as a resin that does not show reactivity to active energy rays. Even after reacting and curing with active energy rays, the carboxyl group derived from the reactive polycarboxylic acid resin remains, and as a result, the cured product has poor water resistance and hydrolysis properties. Therefore, by using an epoxy resin, the remaining carboxyl groups are further carboxylated and a strong crosslinked structure is formed. The known general epoxy resin may use the cation reactive monomer.
또한, 사용 목적에 따라 점도를 조정하는 목적으로 수지 조성물 중에 50질량부, 더 바람직하게는 35질량부까지의 범위에 있어서 휘발성 용제를 첨가할 수도 있다.Additionally, for the purpose of adjusting the viscosity depending on the intended use, a volatile solvent may be added to the resin composition in the range of 50 parts by mass, more preferably up to 35 parts by mass.
본 발명의 활성 에너지선 경화형 수지 조성물은 활성 에너지선에 의해 용이하게 경화된다. 여기에서 활성 에너지선의 구체예로서는 자외선, 가시광선, 적외선, X선, 감마선, 레이저 광선 등의 전자파, 알파선, 베타선, 전자선 등의 입자선 등을 들 수 있다. 본 발명의 적합한 용도를 고려하면 이들 중 자외선, 레이저 광선, 가시광선 또는 전자선이 바람직하다.The active energy ray-curable resin composition of the present invention is easily cured by active energy rays. Here, specific examples of active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays, and laser rays, and particle rays such as alpha rays, beta rays, and electron rays. Considering the suitable use of the present invention, among these, ultraviolet rays, laser rays, visible rays or electron rays are preferred.
본 발명의 활성 에너지선 경화형 수지 조성물은 점탄성 측정 장치에 의한 유리 전이 온도가 150~250℃인 것이 바람직하고, 160~180℃인 것이 더 바람직하다. 유리 전이 온도가 상기 범위에 있음으로써 내열성, 현상성이 양호해진다.The active energy ray-curable resin composition of the present invention preferably has a glass transition temperature of 150 to 250°C, as determined by a viscoelasticity measuring device, and more preferably 160 to 180°C. When the glass transition temperature is in the above range, heat resistance and developability become good.
본 발명에 있어서 성형용 재료란 미경화의 조성물을 몰드에 넣거나 또는 몰드를 압박하여 물체를 성형한 후 활성 에너지선에 의해 경화 반응을 일으켜서 성형시키는 것, 또는 미경화의 조성물에 레이저 등의 초점광 등을 조사하여 경화 반응을 일으켜서 성형시키는 용도로 사용되는 재료를 가리킨다.In the present invention, the material for molding refers to an object that is molded by placing an uncured composition in a mold or pressing the mold and causing a curing reaction using active energy rays, or a focused light such as a laser is applied to the uncured composition. It refers to a material used for molding by causing a hardening reaction through irradiation.
구체적인 용도로서는 평면형상으로 성형한 시트, 소자를 보호하기 위한 밀봉재, 미경화의 조성물에 미세 가공된 「몰드」를 압박하여 미세한 성형을 행하는, 소위 나노임프린트 재료, 또한 특히 열적인 요구가 엄격한 발광 다이오드, 광전 변환 소자 등의 주변 밀봉 재료 등이 적합한 용도로서 들 수 있다.Specific uses include sheets molded into a flat shape, sealants to protect elements, so-called nanoimprint materials in which fine molding is performed by pressing a “mold” finely processed into an uncured composition, and light emitting diodes with particularly stringent thermal requirements. , peripheral sealing materials for photoelectric conversion elements, etc. can be cited as suitable uses.
본 발명에 있어서 피막 형성용 재료란 기재 표면을 피복하는 것을 목적으로 하여 이용되는 것이다. 구체적인 용도로서는 그라비어 잉크, 플렉소 잉크, 실크 스크린 잉크, 오프셋 잉크 등의 잉크 재료, 하드 코트, 톱 코트, 오버 프린트 니스, 클리어 코트 등의 도공 재료, 래미네이트용, 광디스크용 외 각종 접착제, 점착제 등의 접착 재료, 솔더 레지스트, 에칭 레지스트, 마이크로 머신용 레지스트 등의 레지스트 재료 등이 이에 해당한다. 또한, 피막 형성용 재료를 일시적으로 박리성 기재에 도공하여 필름화한 후 본래 목적으로 하는 기재에 접합하여 피막을 형성시키는, 소위 드라이 필름도 피막 형성용 재료에 해당한다.In the present invention, the film forming material is used for the purpose of coating the surface of the substrate. Specific uses include ink materials such as gravure ink, flexo ink, silk screen ink, and offset ink, coating materials such as hard coat, top coat, overprint varnish, and clear coat, and various adhesives and adhesives for laminating and optical disks, etc. These include resist materials such as adhesive materials, solder resist, etching resist, and micro machine resist. In addition, a so-called dry film in which a film-forming material is temporarily applied to a peelable substrate to form a film and then bonded to the intended substrate to form a film also corresponds to a film-forming material.
본 발명에는 상기 경화형 수지 조성물에 활성 에너지선을 조사하여 얻어지는 경화물도 포함되고, 또한 상기 경화물의 층을 갖는 다층 재료도 포함된다.The present invention includes a cured product obtained by irradiating the curable resin composition with active energy rays, and also includes a multilayer material having layers of the cured product.
이들 중 반응성 폴리카르복실산 수지의 카르복시기의 도입에 의해 기재로의 밀착성이 높아지기 때문에 플라스틱 기재 또는 금속 기재를 피복하기 위한 용도로서 사용하는 것이 바람직하다.Among these, the introduction of the carboxyl group of the reactive polycarboxylic acid resin increases adhesion to the substrate, so it is preferable to use it for coating a plastic substrate or a metal substrate.
또한, 미반응의 반응성 폴리카르복실산 수지가 알칼리 수용액에 가용성이 되는 특징을 살려 알칼리수 현상형 레지스트 재료 조성물로서 사용하는 것도 바람직하다.Additionally, it is also preferable to use the unreacted reactive polycarboxylic acid resin as an alkaline water-developable resist material composition, taking advantage of the characteristic of being soluble in aqueous alkaline solutions.
본 발명에 있어서 레지스트 재료 조성물이란 기재 상에 상기 조성물의 피막층을 형성시키고, 그 후 자외선 등의 활성 에너지선을 부분적으로 조사하고, 조사부, 미조사부의 물성적인 차이를 이용하여 묘화하고자 하는 활성 에너지선 감응형의 조성물을 가리킨다. 구체적으로는 조사부 또는 미조사부를 어떠한 방법, 예를 들면 용제 등이나 알칼리 용액 등으로 용해시키는 등 해서 제거하고, 묘화를 행하는 것을 목적으로 하여 사용되는 조성물이다.In the present invention, the resist material composition refers to forming a film layer of the composition on a substrate, then partially irradiating active energy rays such as ultraviolet rays, and using the difference in physical properties of the irradiated area and the unradiated area to draw the active energy ray. Refers to a sensitive composition. Specifically, it is a composition used for the purpose of removing irradiated or unradiated areas by any method, such as dissolving them with a solvent or an alkaline solution, and performing drawing.
본 발명의 레지스트 재료 조성물인 활성 에너지선 경화형 수지 조성물은 패터닝이 가능한 다양한 재료에 적응할 수 있고, 예를 들면 특히 솔더 레지스트 재료, 빌드업 공법용의 층간 절연재에 유용하며, 또한 광도파로로서 프린트 배선판, 광전자 기판이나 광기판과 같은 전기·전자·광기재 등에도 이용된다.The active energy ray-curable resin composition, which is the resist material composition of the present invention, can be adapted to a variety of materials capable of patterning, and is particularly useful for solder resist materials and interlayer insulating materials for build-up methods, and is also useful as an optical waveguide for printed wiring boards, It is also used in electrical, electronic, and optical materials such as optoelectronic boards and optical boards.
특히, 적합한 용도로서는 내열성이나 현상성이 양호한 특성을 살려 감광성 필름, 지지체가 부착된 감광성 필름, 프리프레그 등의 절연 수지 시트, 회로 기판(적층판 용도, 다층 프린트 배선판 용도 등), 솔더 레지스트, 언더필재, 다이 본딩재, 반도체 밀봉재, 구멍 메꿈 수지, 부품 매입 수지 등 수지 조성물이 필요하게 되는 용도의 광범위에 사용할 수 있다. 그 중에서도 높은 안료 농도에 있어서도 양호한 현상성을 발휘할 수 있는 점에서 컬러 레지스트, 컬러 필터용의 레지스트 재료, 특히 블랙 매트릭스 재료 등에도 적합하게 사용할 수 있다.In particular, suitable applications include photosensitive films with good heat resistance and developability, photosensitive films with supports, insulating resin sheets such as prepreg, circuit boards (laminated boards, multilayer printed wiring boards, etc.), solder resists, and underfill materials. It can be used in a wide range of applications that require a resin composition, such as die bonding material, semiconductor sealing material, hole filling resin, and component filling resin. In particular, since it can exhibit good developing properties even at high pigment concentrations, it can be suitably used for color resists, resist materials for color filters, and especially black matrix materials.
또한, 다층 프린트 배선판의 절연층용 수지 조성물(감광성 수지 조성물의 경화물을 절연층으로 한 다층 프린트 배선판), 층간 절연층용 수지 조성물(감광성 수지 조성물의 경화물을 층간 절연층으로 한 다층 프린트 배선판), 도금 형성용 수지 조성물(감광성 수지 조성물의 경화물 상에 도금이 형성된 다층 프린트 배선판) 등에도 적합하게 사용할 수 있다.In addition, a resin composition for an insulating layer of a multilayer printed wiring board (a multilayer printed wiring board using a cured product of a photosensitive resin composition as an insulating layer), a resin composition for an interlayer insulating layer (a multilayer printed wiring board using a cured product of a photosensitive resin composition as an interlayer insulating layer), It can also be suitably used in a resin composition for forming plating (a multilayer printed wiring board in which plating is formed on a cured product of a photosensitive resin composition).
본 발명의 활성 에너지선 경화형 수지 조성물을 사용한 패터닝은, 예를 들면 다음과 같이 하여 행할 수 있다. 기판 상에 스크린 인쇄법, 스프레이법, 롤 코팅법, 정전 도장법, 커튼 코팅법, 스핀 코팅법 등의 방법으로 0.1~200㎛의 막 두께로 본 발명의 경화형 수지 조성물을 도포하고, 도막을 통상 50~110℃, 바람직하게는 60~100℃의 온도에서 건조시킴으로써 도막을 형성할 수 있다. 그 후 노광 패턴을 형성한 포토마스크를 통해서 도막에 직접 또는 간접적으로 자외선 등의 고에너지선을 통상 10~2000mJ/㎠ 정도의 강도로 조사하고, 후술하는 현상액을 사용하여, 예를 들면 스프레이, 진동 침지, 패들, 브러싱 등에 의해 소망의 패턴을 얻을 수 있다.Patterning using the active energy ray-curable resin composition of the present invention can be performed, for example, as follows. The curable resin composition of the present invention is applied to a substrate with a film thickness of 0.1 to 200 ㎛ by a method such as screen printing, spraying, roll coating, electrostatic coating, curtain coating, spin coating, etc., and the coating film is usually 50 μm thick. A coating film can be formed by drying at a temperature of ~110°C, preferably 60~100°C. Afterwards, high-energy rays such as ultraviolet rays are irradiated directly or indirectly to the coating film through a photomask on which an exposure pattern is formed, usually at an intensity of about 10 to 2000 mJ/cm2, using a developer described later, for example, spray or vibration. The desired pattern can be obtained by dipping, paddling, brushing, etc.
상기 현상에 사용되는 알칼리 수용액으로서는 수산화칼륨, 수산화나트륨, 탄산 나트륨, 탄산 칼륨, 탄산 수소나트륨, 탄산 수소칼륨, 인산 나트륨, 인산 칼륨 등의 무기 알칼리 수용액이나 테트라메틸암모늄하이드로옥사이드, 테트라에틸암모늄하이드로옥사이드, 테트라부틸암모늄하이드로옥사이드, 모노에탄올아민, 디에탄올아민, 트리에탄올아민 등의 유기 알칼리 수용액을 사용할 수 있다. 이 수용액에는 추가로 유기 용제, 완충제, 착화제, 염료 또는 안료를 포함시킬 수 있다.Alkaline aqueous solutions used in the above phenomenon include inorganic alkaline aqueous solutions such as potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium phosphate, and potassium phosphate, or tetramethylammonium hydroxide and tetraethylammonium hydroxide. Organic alkali aqueous solutions such as tetrabutylammonium hydroxide, monoethanolamine, diethanolamine, and triethanolamine can be used. This aqueous solution may further contain organic solvents, buffers, complexing agents, dyes or pigments.
그 외 활성 에너지선에 의한 경화 반응 전의 기계적 강도가 요구되는 드라이 필름 용도로서 특히 적합하게 사용된다. 즉, 본 발명에서 사용되는 에폭시 수지의 수산기, 에폭시기의 밸런스가 특정 범위에 있기 때문에 본 발명의 반응성 폴리카르복실산 수지 혼합물이 양호한 현상성을 발휘시킬 수 있다.In addition, it is particularly suitably used for dry film applications that require mechanical strength before curing reaction by active energy rays. That is, since the balance of hydroxyl groups and epoxy groups in the epoxy resin used in the present invention is within a specific range, the reactive polycarboxylic acid resin mixture of the present invention can exhibit good developability.
피막 형성시키는 방법으로서는 특별히 제한은 없지만 그라비어 등의 오목판 인쇄 방식, 플렉소 등의 볼록판 인쇄 방식, 실크 스크린 등의 공판 인쇄 방식, 오프셋 등의 평판 인쇄 방식, 롤 코터, 나이프 코터, 다이 코터, 커튼 코터, 스핀 코터 등의 각종 도공 방식을 임의로 채용할 수 있다.There are no particular restrictions on the method of forming the film, but it includes intaglio printing methods such as gravure, raised plate printing methods such as flexo, stencil printing methods such as silk screen, flat printing methods such as offset, roll coater, knife coater, die coater, and curtain coater. , various coating methods such as spin coater can be arbitrarily adopted.
본 발명의 활성 에너지선 경화형 수지 조성물의 경화물이란 본 발명의 활성 에너지선 경화형 수지 조성물에 활성 에너지선을 조사하여 경화시킨 것을 가리킨다.The cured product of the active energy ray-curable resin composition of the present invention refers to the product cured by irradiating active energy rays to the active energy ray-curable resin composition of the present invention.
(실시예)(Example)
이하, 본 발명을 실시예에 의해 더 상세하게 설명하지만 본 발명은 이들 실시예에 의해 한정되는 것은 아니다. 또한, 실시예 중 특별히 언급이 없는 한 %는 질량%를 나타낸다.Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples. In addition, unless otherwise specified in the examples, % represents mass%.
연화점, 에폭시 당량, 산가는 이하의 조건에서 측정했다.The softening point, epoxy equivalent, and acid value were measured under the following conditions.
1) 에폭시 당량: JISK7236: 2001에 준한 방법으로 측정했다.1) Epoxy equivalent weight: measured by a method according to JISK7236: 2001.
2) 연화점: JISK7234: 1986에 준한 방법으로 측정했다.2) Softening point: Measured by a method according to JISK7234: 1986.
3) 산가: JISK0070: 1992에 준한 방법으로 측정했다.3) Acid value: Measured by a method according to JISK0070: 1992.
4) GPC의 측정 조건은 이하와 같다.4) GPC measurement conditions are as follows.
기종: TOSOH HLC-8320GPCModel: TOSOH HLC-8320GPC
칼럼: Super HZM-NColumn: Super HZM-N
용리액: THF(테트라히드로푸란); 0.35㎖/분, 40℃Eluent: THF (tetrahydrofuran); 0.35ml/min, 40℃
검출기: RI(시차 굴절계)Detector: RI (differential refractometer)
분자량 표준: 폴리스티렌Molecular Weight Standard: Polystyrene
(실시예 1, 참고예 1, 비교예 1): 반응성 에폭시카르복실레이트 수지의 합성(Example 1, Reference Example 1, Comparative Example 1): Synthesis of reactive epoxycarboxylate resin
성분 (a)로서 XD-1000(Nippon Kayaku Co., Ltd.제, 연화점 74℃, 에폭시 당량 252g/eq.), 성분 (a'-1)로서 EPPN-201(Nippon Kayaku Co., Ltd.제, 연화점 70℃, 에폭시 당량 193g/eq.), 성분 (a'-2)로서 EPPN-503(Nippon Kayaku Co., Ltd.제, 연화점 94℃, 에폭시 당량 185g/eq.), 성분 (a'-3)으로서 NC-3500(Nippon Kayaku Co., Ltd.제, 연화점 70℃, 에폭시 당량 206g/eq.), 성분 (a'-4)로서 NC-6000(Nippon Kayaku Co., Ltd.제, 연화점 60℃, 에폭시 당량 208g/eq.), 성분 (b)로서 아크릴산(AA) 또는 메타크릴산(MAA)을 표 1 중 기재량, 성분 (c)로서 디메틸올프로피온산(이하, 「DMPA」라고 약기한다)을 표 1 중 기재량 첨가했다. 촉매로서 트리페닐포스핀 3g, 용제로서 프로필렌글리콜모노메틸에테르모노아세테이트를 고형분 함유율 80질량%가 되도록 첨가하고, 100℃에서 24시간 반응시켜서 반응성 에폭시카르복실레이트 수지 혼합물의 용액을 얻었다.As component (a), , softening point 70°C, epoxy equivalent weight 193 g/eq.), EPPN-503 (manufactured by Nippon Kayaku Co., Ltd., softening point 94°C, epoxy equivalent weight 185 g/eq.) as component (a'-2), component (a' -3) as NC-3500 (manufactured by Nippon Kayaku Co., Ltd., softening point 70°C, epoxy equivalent weight 206 g/eq.), and as component (a'-4), NC-6000 (manufactured by Nippon Kayaku Co., Ltd., Softening point 60°C, epoxy equivalent weight 208 g/eq.), acrylic acid (AA) or methacrylic acid (MAA) as component (b) in the amounts listed in Table 1, and dimethylolpropionic acid (hereinafter referred to as “DMPA”) as component (c). (abbreviated) was added in the amount listed in Table 1. 3 g of triphenylphosphine as a catalyst and propylene glycol monomethyl ether monoacetate as a solvent were added so that the solid content was 80% by mass, and the mixture was reacted at 100°C for 24 hours to obtain a solution of a reactive epoxycarboxylate resin mixture.
(실시예 2, 참고예 2, 비교예 2): 하드 코트용 조성물의 조제(Example 2, Reference Example 2, Comparative Example 2): Preparation of composition for hard coat
실시예 1, 참고예 1, 및 비교예 1에 있어서 합성한 각 반응성 에폭시카르복실레이트 수지 혼합물 용액 20g 각각에 대해서 라디칼 경화형의 반응성 화합물인 디펜타에리스리톨헥사아크릴레이트 4g, 자외선 반응형 광중합 개시제로서 IRGACURE 184를 1.5g 가열 용해했다.For each 20 g of each reactive epoxycarboxylate resin mixture solution synthesized in Example 1, Reference Example 1, and Comparative Example 1, 4 g of dipentaerythritol hexaacrylate, a radically curable reactive compound, and IRGACURE as an ultraviolet-reactive photopolymerization initiator. 1.5 g of 184 was dissolved by heating.
이어서, 건조 시의 막 두께 20미크론이 되도록 핸드 애플리케이터에 의해 폴리카보네이트판 상에 도공하고, 80℃, 30분간 전기 오븐에 의해 용제 건조를 실시했다. 건조 후 고압 수은 램프를 구비한 자외선 수직 노광 장치(ORC Manufacturing Co., Ltd.제)에 의해 조사선량 1000mJ의 자외선을 조사, 경화시켜 피막 형성물을 얻었다.Next, it was applied on a polycarbonate plate using a hand applicator so that the film thickness at the time of drying was 20 microns, and solvent dried in an electric oven at 80°C for 30 minutes. After drying, the film was cured by irradiating it with ultraviolet rays at an irradiation dose of 1000 mJ using an ultraviolet vertical exposure device (manufactured by ORC Manufacturing Co., Ltd.) equipped with a high-pressure mercury lamp to obtain a film-forming product.
이 형성물의 도막의 경도를 JISK5600-5-4: 1999에 의해 측정하고, 또한 내냉열 충격성의 시험을 JISK5600-7-4: 1999에 의해 측정했다. 결과를 표 2에 나타낸다. 표 2에 나타내는 각 기호의 의미는 하기와 같다.The hardness of the coating film of this formation was measured according to JISK5600-5-4: 1999, and the cold and heat shock resistance test was also measured according to JISK5600-7-4: 1999. The results are shown in Table 2. The meaning of each symbol shown in Table 2 is as follows.
○: 스크래치, 박리 없음○: No scratches or peeling
△: 약간 스크래치 있음△: Slight scratches
×: 박리됨×: peeled off
표 2의 결과로부터 명백한 바와 같이 실시예 2-1~실시예 2-4는 내냉열 충격성이 우수한 것을 확인했다.As is clear from the results in Table 2, it was confirmed that Examples 2-1 to 2-4 had excellent cold and heat shock resistance.
(실시예 3, 참고예 3, 비교예 3): 반응성 폴리카르복실산 수지의 합성(Example 3, Reference Example 3, Comparative Example 3): Synthesis of reactive polycarboxylic acid resin
실시예 1, 참고예 1, 및 비교예 1에서 얻어진 각 반응성 에폭시카르복실레이트 수지 혼합물 용액 200g 각각에 대해서 성분 (d)로서 THPA(1,2,3,6-테트라히드로무수프탈산, New Japan Chemical Co., Ltd.제)를 30.9(g) 및 용제로서 고형분 함유율 65%가 되도록 프로필렌글리콜모노메틸에테르모노아세테이트를 첨가하고, 100℃로 가열한 후 산 부가 반응시켜서 반응성 폴리카르복실산 수지 혼합물의 용액을 얻었다. 얻어진 반응성 폴리카르복실산 수지 혼합물의 고형분 산가(㎎KOH/g)를 표 3 중에 기재했다. 고형분 산가(AV: ㎎KOH/g) 측정은 용액으로서 측정을 행하여 고형분에서의 값으로 환산했다.THPA (1,2,3,6-tetrahydrophthalic anhydride, New Japan Chemical) as component (d) for 200 g of each reactive epoxycarboxylate resin mixture solution obtained in Example 1, Reference Example 1, and Comparative Example 1. Co., Ltd.) to 30.9 (g) and propylene glycol monomethyl ether monoacetate as a solvent to a solid content of 65%, heated to 100°C, and then subjected to acid addition reaction to form a reactive polycarboxylic acid resin mixture. A solution was obtained. The solid acid value (mgKOH/g) of the obtained reactive polycarboxylic acid resin mixture is shown in Table 3. The solid content acid value (AV: mgKOH/g) was measured as a solution and converted to the solid content value.
(합성예 1~합성예 5): 반응성 폴리카르복실산 수지의 합성(Synthesis Examples 1 to 5): Synthesis of reactive polycarboxylic acid resin
성분 (a), 성분 (a'-1), 성분 (a'-2), 성분 (a'-3), 성분 (a'-5)(EOCN-104S, Nippon Kayaku Co., Ltd.제, 연화점 92℃, 에폭시 당량 218g/eq.), 성분 (b)로서 아크릴산(AA), 성분 (c)로서 디메틸올프로피온산(DMPA)을 표 4 중 기재량 첨가했다. 촉매로서 트리페닐포스핀 3g, 용제로서 프로필렌글리콜모노메틸에테르모노아세테이트를 고형분 함유율 80질량%가 되도록 첨가하고, 100℃에서 24시간 반응시켜서 반응성 에폭시카르복실레이트 수지 용액을 얻었다. 얻어진 반응성 에폭시카르복실레이트 수지 용액에 성분 (d)로서 THPA를 표 4에 기재된 양(g) 및 용제로서 고형분 함유율 65%가 되도록 프로필렌글리콜모노메틸에테르모노아세테이트를 첨가하고, 100℃로 가열한 후 산 부가 반응시켜서 반응성 폴리카르복실산 수지 용액을 얻었다. 얻어진 반응성 폴리카르복실산 수지의 고형분 산가(AV: ㎎KOH/g)를 표 4 중에 기재했다. 고형분 산가(㎎KOH/g) 측정은 용액으로서 측정을 행하여 고형분에서의 값으로 환산했다.Component (a), component (a'-1), component (a'-2), component (a'-3), component (a'-5) (EOCN-104S, manufactured by Nippon Kayaku Co., Ltd., Softening point 92°C, epoxy equivalent weight 218 g/eq.), acrylic acid (AA) as component (b), and dimethylolpropionic acid (DMPA) as component (c) were added in the amounts listed in Table 4. 3 g of triphenylphosphine as a catalyst and propylene glycol monomethyl ether monoacetate as a solvent were added so that the solid content was 80% by mass, and the mixture was reacted at 100°C for 24 hours to obtain a reactive epoxycarboxylate resin solution. To the obtained reactive epoxycarboxylate resin solution, THPA as component (d) in the amount (g) shown in Table 4 and propylene glycol monomethyl ether monoacetate as a solvent were added to a solid content of 65%, and heated to 100°C. An acid addition reaction was performed to obtain a reactive polycarboxylic acid resin solution. The solid acid value (AV: mgKOH/g) of the obtained reactive polycarboxylic acid resin is shown in Table 4. The solid content acid value (mgKOH/g) was measured as a solution and converted to the solid content value.
(실시예 4, 참고예 4): 반응성 폴리카르복실산 수지의 배합(Example 4, Reference Example 4): Formulation of reactive polycarboxylic acid resin
합성예 1~합성예 5에 의해 합성한 반응성 폴리카르복실산 수지 용액을 표 5의 중량비로 배합해서 반응성 폴리카르복실산 용액의 혼합물을 얻었다.The reactive polycarboxylic acid resin solutions synthesized in Synthesis Examples 1 to 5 were mixed in the weight ratio shown in Table 5 to obtain a mixture of reactive polycarboxylic acid solutions.
(비교예 4): 반응성 폴리카르복실산 수지의 배합(Comparative Example 4): Formulation of reactive polycarboxylic acid resin
합성예 1, 합성예 3에 의해 합성한 반응성 폴리카르복실산 수지 용액, 그 외의 반응성 폴리카르복실산 수지를 표 6의 중량비로 배합해서 비교예인 반응성 폴리카르복실산 혼합물 용액을 얻었다.The reactive polycarboxylic acid resin solution synthesized in Synthesis Example 1, Synthesis Example 3, and other reactive polycarboxylic acid resins were mixed in the weight ratio shown in Table 6 to obtain a reactive polycarboxylic acid mixture solution as a comparative example.
KAYARAD ZAR-2001H; 비스페놀A형 반응성 폴리카르복실산 수지(Nippon Kayaku Co., Ltd.제)KAYARAD ZAR-2001H; Bisphenol A type reactive polycarboxylic acid resin (manufactured by Nippon Kayaku Co., Ltd.)
KAYARAD ZFR-1554H; 비스페놀F형 반응성 폴리카르복실산 수지(Nippon Kayaku Co., Ltd.제)KAYARAD ZFR-1554H; Bisphenol F type reactive polycarboxylic acid resin (manufactured by Nippon Kayaku Co., Ltd.)
KAYARAD ZCR-1761H; 비페닐아랄킬형 반응성 폴리카르복실산 수지(Nippon Kayaku Co., Ltd.제, 식 (4)로 나타내어지고, Ar이 식 (6)인 구조를 갖는다)KAYARAD ZCR-1761H; Biphenyl aralkyl type reactive polycarboxylic acid resin (manufactured by Nippon Kayaku Co., Ltd., has a structure represented by formula (4) and Ar is formula (6))
KAYARAD UXE-3024H; 카르복실산 변성 비스페놀A/우레탄형 에폭시아크릴레이트(Nippon Kayaku Co., Ltd.제)KAYARAD UXE-3024H; Carboxylic acid-modified bisphenol A/urethane type epoxy acrylate (manufactured by Nippon Kayaku Co., Ltd.)
(실시예 5, 참고예 5, 비교예 5): 드라이 필름형 레지스트 조성물(Example 5, Reference Example 5, Comparative Example 5): Dry film type resist composition
실시예 3, 실시예 4, 참고예 3, 참고예 4, 및 비교예 4에서 얻어진 각 반응성 폴리카르복실산 수지 혼합물 용액 56.73g 각각에 대해서 그 외 반응성 화합물 (C)로서 DPCA-60(상품명: Nippon Kayaku Co., Ltd.제 다관능 아크릴레이트) 5.67g, 광중합 개시제로서 IRGACURE 907(BASF Japan Ltd.제)을 2.92g 및 KAYACURE DETX-S(Nippon Kayaku Co., Ltd.제)를 0.58g, 경화 성분으로서 NC-3000H(Nippon Kayaku Co., Ltd.제)를 17.54g, 열경화 촉매로서 멜라민을 0.73g 및 농도 조정 용제로서 프로필렌글리콜모노메틸에테르모노아세테이트를 5.67g 첨가하고, 비드밀에 의해 혼련하여 균일하게 분산시키켜 레지스트 수지 조성물을 얻었다.For each of 56.73 g of each reactive polycarboxylic acid resin mixture solution obtained in Example 3, Example 4, Reference Example 3, Reference Example 4, and Comparative Example 4, DPCA-60 (Product name: 5.67 g of multifunctional acrylate (manufactured by Nippon Kayaku Co., Ltd.), 2.92 g of IRGACURE 907 (manufactured by BASF Japan Ltd.) and 0.58 g of KAYACURE DETX-S (manufactured by Nippon Kayaku Co., Ltd.) as a photopolymerization initiator, 17.54 g of NC-3000H (manufactured by Nippon Kayaku Co., Ltd.) was added as a curing component, 0.73 g of melamine was added as a heat curing catalyst, and 5.67 g of propylene glycol monomethyl ether monoacetate was added as a concentration adjusting solvent, and then added by a bead mill. It was kneaded and dispersed uniformly to obtain a resist resin composition.
얻어진 조성물을 와이어 바 코터 #20을 사용하여 지지 필름이 되는 폴리에틸렌테레프탈레이트 필름에 균일하게 도포하고, 온도 70℃의 열풍 건조로를 통과시켜 두께 20㎛의 수지층을 형성한 후 이 수지층 상에 보호 필름이 되는 폴리에틸렌 필름을 부착하여 드라이 필름을 얻었다. 얻어진 드라이 필름을 폴리이미드 프린트 기판(구리 회로 두께: 12㎛, 폴리이미드 필름 두께: 25㎛)에 온도 80℃의 가열 롤을 사용하여 보호 필름을 박리하면서 수지층을 기판 전체면에 부착했다.The obtained composition was uniformly applied to a polyethylene terephthalate film as a support film using wire bar coater #20, passed through a hot air drying furnace at a temperature of 70°C to form a 20㎛ thick resin layer, and then protected on this resin layer. A dry film was obtained by attaching a polyethylene film to be used as a film. The obtained dry film was applied to a polyimide printed circuit board (copper circuit thickness: 12 µm, polyimide film thickness: 25 µm) using a heating roll at a temperature of 80°C to peel off the protective film while attaching the resin layer to the entire surface of the substrate.
이어서, 자외선 노광 장치(ORC Manufacturing Co., Ltd., 형식 HMW-680GW)를 사용하여 회로 패턴이 묘화된 마스크 및 감도를 어림잡기 위해서 Kodak Japan Ltd.제 스텝 태블릿 No.2를 통해서 500mJ/㎠의 자외선을 조사했다. 그 후 드라이 필름 상의 필름을 박리하여 박리 상태를 확인했다. 그 후 1% 탄산 나트륨 수용액으로 스프레이 현상을 행하여 자외선 미조사부의 수지를 제거했다. 수세 건조한 후 프린트 기판을 150℃의 열풍 건조기에 의해 60분 가열 경화 반응시켜서 경화막을 얻었다.Next, using an ultraviolet exposure device (ORC Manufacturing Co., Ltd., model HMW-680GW), a mask on which the circuit pattern was drawn was used, and in order to estimate the sensitivity, 500 mJ/cm2 was applied through step tablet No. 2 manufactured by Kodak Japan Ltd. Ultraviolet rays were irradiated. Afterwards, the film on the dry film was peeled off to check the peeling state. After that, spray development was performed with a 1% sodium carbonate aqueous solution to remove the resin in the ultraviolet irradiated area. After washing with water and drying, the printed circuit board was heat-cured for 60 minutes using a hot air dryer at 150°C to obtain a cured film.
[절연 신뢰성에 관한 평가][Evaluation of insulation reliability]
기판(폴리이미드 필름) 상에 형성된 빗살형 전극(재질: 구리, 패턴 피치: 18㎛, L/S=100㎛/100㎛) 상에 작성한 레지스트 수지 조성물을 20㎛의 막 두께로 도포하여 80℃에서 30분 프리베이크를 행한 후 500mJ/㎠로 노광, 150℃에서 1시간 가열 경화시켜서 시험편을 얻었다. 가열 후의 시험편을 130℃ 및 습도 85%의 조(ETAC PLAMOUBT HAST CHAMBER PM220 Kusumoto Chemicals, Ltd.)에 넣고, 마이그레이션 테스터(ETAC SIR-13mini Kusumoto Chemicals, Ltd.)를 사용하여 전극 간에 100V의 직류 전압을 인가하고, 전극 간의 저항을 측정했다. 절연 신뢰성을 이하의 기준으로 판정했다. ○, △의 판정 기준의 경우에 절연 신뢰성은 합격이라고 판단되고, 실사용에 지장이 없는 절연성 유지성이 있으며, 절연 신뢰성이 우수하다.The prepared resist resin composition was applied to a film thickness of 20 ㎛ on a comb-shaped electrode (material: copper, pattern pitch: 18 ㎛, L/S = 100 ㎛/100 ㎛) formed on a substrate (polyimide film) and incubated at 80°C. After performing a prebake for 30 minutes, it was exposed to 500 mJ/cm2 and heat-cured at 150°C for 1 hour to obtain a test piece. The heated test piece was placed in a tank (ETAC PLAMOUBT HAST CHAMBER PM220 Kusumoto Chemicals, Ltd.) at 130°C and 85% humidity, and a direct current voltage of 100V was applied between the electrodes using a migration tester (ETAC SIR-13mini Kusumoto Chemicals, Ltd.). was applied, and the resistance between the electrodes was measured. Insulation reliability was judged based on the following standards. In the case of the judgment criteria of ○ and △, the insulation reliability is judged to be acceptable, and there is insulation maintenance without any problem in actual use, and the insulation reliability is excellent.
[절연 신뢰성의 판정 기준][Judgment criteria for insulation reliability]
○: 저항이 1×109Ω 이상이며, 100시간 이상 지속되어 절연성이 매우 양호○: Resistance is more than 1×10 9 Ω, lasts for more than 100 hours, and has very good insulation properties.
△: 저항이 1×108Ω 이상, 1×109Ω 미만이며, 100시간 이상 지속되어 절연성이 양호△: Resistance is more than 1×10 8 Ω and less than 1×10 9 Ω, and lasts for more than 100 hours, so the insulation is good.
×: 100시간 미만이며, 저항이 1×108Ω 미만으로 저하되어 절연 불량이라고 간주된다×: Less than 100 hours, the resistance decreases to less than 1×10 8 Ω and is considered to be an insulation defect.
[감도 평가][Sensitivity evaluation]
감도는 스텝 태블릿을 투과한 노광부에 몇 단째의 농도 부분까지가 현상 시에 잔존했는지에 의해 판정했다. 단 수(값)가 큰 쪽이 태블릿의 농부(濃部)이며, 고감도라고 판정된다(단위: 단).Sensitivity was determined by what level of density portion remained in the exposed area that passed through the step tablet at the time of development. The larger the number (value) of the tablet, the smaller the tablet, and is judged to have higher sensitivity (unit: unit).
[현상성 평가][Development evaluation]
현상성은 패턴 마스크를 투과한 노광부를 현상할 때에 패턴 형상부가 완전히 현상 완료될 때까지의 시간, 소위 브레이크 타임을 갖고 현상성의 평가라고 했다(단위: 초).Developability was evaluated using the so-called break time, which is the time until the pattern shape part is completely developed when developing the exposed part that passed through the pattern mask (unit: seconds).
[내열성의 평가][Evaluation of heat resistance]
레지스트 수지 조성물을 폴리이미드 필름에 균일하게 도포하고, 온도 80℃의 열풍 건조로를 통과시켜 두께 20㎛의 수지층을 형성한 후 자외선 노광 장치(ORC Manufacturing Co., Ltd., 형식 HMW-680GW)로 노광하고, 경화물을 얻었다. 제작한 경화물을 폭 5㎜로 잘라낸다. 그 후 TA Instruments, Inc.제 점탄성 측정 장치 RSA-G2에 셋팅하고, 공기 분위기 중 주파수 10㎐, 승온 속도 2℃/min.으로 tanδ를 측정하고, tanδ의 최대값에 있어서의 온도를 Tg라고 했다.The resist resin composition was uniformly applied to the polyimide film, passed through a hot air drying furnace at a temperature of 80°C to form a 20㎛ thick resin layer, and then dried using an ultraviolet ray exposure device (ORC Manufacturing Co., Ltd., model HMW-680GW). It was exposed to light and a cured product was obtained. Cut the produced cured product into 5 mm wide pieces. Afterwards, the viscoelasticity measuring device RSA-G2 manufactured by TA Instruments, Inc. was set to measure tanδ in an air atmosphere at a frequency of 10 Hz and a temperature increase rate of 2°C/min, and the temperature at the maximum value of tanδ was designated as Tg. .
상기 결과로부터 본 발명의 반응성 폴리카르복실산 수지 혼합물을 사용한 레지스트 재료 조성물은 각각 비교용의 반응성 폴리카르복실산 수지의 혼합물을 사용한 조성물에 비해서 양호한 레지스트 물성을 갖고 있는 것이 확인되었다.From the above results, it was confirmed that the resist material composition using the reactive polycarboxylic acid resin mixture of the present invention had better resist physical properties compared to the composition using the comparative reactive polycarboxylic acid resin mixture.
(실시예 6, 참고예 6, 비교예 6): 안료 분산성에 관한 평가(Example 6, Reference Example 6, Comparative Example 6): Evaluation of pigment dispersibility
실시예 3, 참고예 3, 및 비교예 4에서 얻어진 각 반응성 폴리카르복실산 수지 혼합물 등 20g 각각에 대해서 성분 (C)로서 DPHA(상품명: Nippon Kayaku Co., Ltd.제 아크릴레이트 단량체) 5.0g, 유기 용제로서 프로필렌글리콜모노메틸에테르아세테이트 10g, 착색 안료로서 MITSUBISHI 카본 블랙 MA-100을 15g 또는 10g 첨가하여 교반했다. 또한, 35g의 유리 구슬을 넣고 페인트 셰이커에 의해 1시간 분산을 행했다. 분산 종료 후의 분산액을 와이어 바 코터 #2로 폴리에틸렌테레프탈레이트 필름 상에 도공하고, 80℃의 온풍 건조기로 10분간 건조를 행했다. 건조 종료 후의 도막 표면의 광택을 60° 반사 글로스계(HORIBA, Ltd. IG-331 광택계)를 사용하여 측정하고, 카본 블랙의 분산성을 평가했다. 표 8에 결과를 나타낸다. 광택의 값이 높을수록 안료 분산성은 양호하다.5.0 g of DPHA (brand name: acrylate monomer manufactured by Nippon Kayaku Co., Ltd.) as component (C) for each 20 g of each reactive polycarboxylic acid resin mixture obtained in Example 3, Reference Example 3, and Comparative Example 4. , 10 g of propylene glycol monomethyl ether acetate as an organic solvent, and 15 g or 10 g of MITSUBISHI carbon black MA-100 as a coloring pigment were added and stirred. Additionally, 35 g of glass beads were added and dispersed using a paint shaker for 1 hour. The dispersion liquid after completion of dispersion was coated on a polyethylene terephthalate film using wire bar coater #2, and dried in a warm air dryer at 80°C for 10 minutes. The gloss of the surface of the coating film after completion of drying was measured using a 60° reflection gloss meter (HORIBA, Ltd. IG-331 gloss meter), and the dispersibility of the carbon black was evaluated. Table 8 shows the results. The higher the gloss value, the better the pigment dispersibility.
상기 결과로부터 실시예 3에서 얻어진 반응성 폴리카르복실산 수지 혼합물을 포함하는 수지 조성물로부터 얻어지는 도막은 착색 안료의 함유량이 많을 경우이어도 광택의 값에 변화가 없었다. 본 발명의 반응성 폴리카르복실산 수지 혼합물의 안료 분산성은 현상성, 내열성이 향상됨에도 불구하고 착색 안료의 함유량에 의존하는 일 없이 우수한 것을 확인할 수 있었다.From the above results, the coating film obtained from the resin composition containing the reactive polycarboxylic acid resin mixture obtained in Example 3 showed no change in gloss value even when the content of the coloring pigment was high. It was confirmed that the pigment dispersibility of the reactive polycarboxylic acid resin mixture of the present invention was excellent without being dependent on the content of the color pigment, despite improved developability and heat resistance.
이상으로부터 본 발명의 반응성 폴리카르복실산 수지 혼합물을 사용한 활성 에너지선 경화형 수지 조성물의 경화물은 내열성이 우수하고, 미세하게 알칼리 현상 가능하며, 또한 절연 신뢰성이 양호한 점에서 성형용 재료, 피막 형성용 재료, 레지스트 재료, 층간 절연 재료에 적합하다. 특히, 높은 안료 농도에 있어서도 양호한 현상성을 발휘하는 점에서 컬러 레지스트, 컬러 필터용의 레지스트 재료, 특히 블랙 매트릭스 재료, 블랙 칼럼 스페이서 재료 등에 적합하다.From the above, the cured product of the active energy ray-curable resin composition using the reactive polycarboxylic acid resin mixture of the present invention has excellent heat resistance, is capable of fine alkali development, and has good insulation reliability, so it can be used as a molding material and film formation. Suitable for materials, resist materials, and interlayer insulation materials. In particular, since it exhibits good developability even at high pigment concentrations, it is suitable for color resists, resist materials for color filters, especially black matrix materials, black column spacer materials, etc.
본 출원은 2018년 9월 18일 출원된 일본 특허출원(특허출원 2018-173665) 및 2018년 10월 11일 출원된 일본 특허출원(특허출원 2018-192527)에 의거하는 것이며, 그들의 내용은 여기에 참조로서 원용된다.This application is based on the Japanese patent application (patent application 2018-173665) filed on September 18, 2018 and the Japanese patent application (patent application 2018-192527) filed on October 11, 2018, the contents of which are provided here. It is incorporated by reference.
Claims (12)
상기 에폭시 수지 (a')가 하기 식 (2)~식 (4) 중 어느 것으로 나타내어지는 에폭시 수지인 반응성 폴리카르복실산 수지를 포함하는 반응성 폴리카르복실산 수지 혼합물.
(식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화 수소기를 나타내고, n은 1~10의 정수를 나타낸다)
(식 (2) 중 p는 0~2의 정수를 나타낸다)
(식 (3) 중 m은 0~30의 정수를 나타낸다)
(식 (4) 중 Ar은 각각 독립적으로 식 (5) 또는 식 (6) 중 어느 것이며, 식 (5)와 식 (6)의 몰비율은 식 (5)/식 (6)=1~3이다. q는 반복수이며, 0~5의 정수이다. r은 가수를 나타내고, 1 또는 2이다)A mixture of an epoxy resin (a) represented by the following formula (1) and an epoxy resin (a') different from the epoxy resin (a), a compound (b) having both a polymerizable ethylenically unsaturated group and a carboxyl group in one molecule, and A reactive epoxycarboxylate resin mixture, which is a reactant obtained by reacting a compound (c) having both a hydroxyl group and a carboxyl group in one molecule as necessary, and a reactive polycarboxylic acid resin mixture, which is a reactant of a polybasic acid anhydride (d),
A reactive polycarboxylic acid resin mixture containing a reactive polycarboxylic acid resin wherein the epoxy resin (a') is an epoxy resin represented by any of the following formulas (2) to (4).
(R 1 in formula (1) may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10.)
(In equation (2), p represents an integer from 0 to 2)
(In equation (3), m represents an integer from 0 to 30)
(Ar in equation (4) is each independently either equation (5) or equation (6), and the molar ratio of equations (5) and (6) is equation (5) / equation (6) = 1~3 q is the number of repetitions, and r represents the mantissa and is 1 or 2.
반응성 화합물 (C)를 더 포함하고,
상기 반응성 화합물 (C)가 라디칼 반응형의 아크릴레이트류, 양이온 반응형의 에폭시 화합물류, 이들 쌍방에 감응하는 비닐 화합물류 또는 활성 에너지선에 감응 가능한 관능기를 갖는 반응성 올리고머류인 활성 에너지선 경화형 수지 조성물.According to claim 3,
further comprising a reactive compound (C),
An active energy ray-curable resin composition in which the reactive compound (C) is a radical-reactive acrylate, a cation-reactive epoxy compound, a vinyl compound sensitive to both, or a reactive oligomer having a functional group capable of being sensitive to active energy rays. .
광중합 개시제를 더 포함하는 활성 에너지선 경화형 수지 조성물.According to claim 3 or 4,
An active energy ray-curable resin composition further comprising a photopolymerization initiator.
착색 안료를 더 포함하는 활성 에너지선 경화형 수지 조성물.According to claim 3 or 4,
An active energy ray-curable resin composition further comprising a coloring pigment.
성형용 재료인 활성 에너지선 경화형 수지 조성물.According to claim 3 or 4,
Active energy ray-curable resin composition as a molding material.
피막 형성용 재료인 활성 에너지선 경화형 수지 조성물.According to claim 3 or 4,
An active energy ray-curable resin composition that is a material for forming a film.
레지스트 재료 조성물인 활성 에너지선 경화형 수지 조성물.According to claim 3 or 4,
An active energy ray-curable resin composition that is a resist material composition.
(식 (1) 중 R1은 동일해도 상이해도 좋고, 수소 원자, 할로겐 원자 또는 탄소수 1~4개의 탄화 수소기를 나타내고, n은 1~10의 정수를 나타낸다)
(식 (2) 중 p는 0~2의 정수를 나타낸다)
(식 (3) 중 m은 0~30의 정수를 나타낸다)
(식 (4) 중 Ar은 각각 독립적으로 식 (5) 또는 식 (6) 중 어느 것이며, 식 (5)와 식 (6)의 몰비율은 식 (5)/식 (6)=1~3이다. q는 반복수이며, 0~5의 정수이다. r은 가수를 나타내고, 1 또는 2이다)A mixture of an epoxy resin (a) represented by the following formula (1) and one or more epoxy resins selected from the group of epoxy resins represented by the following formulas (2) to (4), an ethylenic polymer that can be polymerized in one molecule. A reactive epoxycarboxylate resin mixture that is a reactant obtained by reacting a compound (b) having both an unsaturated group and a carboxyl group with a compound (c) having both a hydroxyl group and a carboxyl group in one molecule as needed.
(R 1 in formula (1) may be the same or different, and represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 4 carbon atoms, and n represents an integer of 1 to 10.)
(In equation (2), p represents an integer from 0 to 2)
(In equation (3), m represents an integer from 0 to 30)
(Ar in equation (4) is each independently either equation (5) or equation (6), and the molar ratio of equations (5) and (6) is equation (5) / equation (6) = 1~3 q is the number of repetitions, and r represents the mantissa and is 1 or 2.
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