KR102666429B1 - Display device - Google Patents

Abstract

Board; a thin film transistor disposed on the substrate; an insulating layer located over the thin film transistor and having a contact hole exposing the thin film transistor; and a first reflective pattern disposed on the insulating layer and connected to the thin film transistor through the contact hole.

Description

Display device {DISPLAY DEVICE}

The present invention relates to a reflective display device, and more specifically, to a reflective display device that improves luminance by increasing reflectance.

Recently, display devices such as liquid crystal displays and electrophoretic displays have been widely used to replace existing cathode ray tubes. The display device is a light-receiving device and requires a separate light source. Accordingly, the display device is divided into a transmissive display device that displays an image using a built-in backlight as a light source and a reflective display device that displays an image using natural light as a light source without using a backlight.

Recently, reflective display devices form openings in color filters to improve brightness. External light reflected from the reflective layer is emitted through the opening of the color filter, contributing to improving luminance. However, when an opening is formed in a color filter for the purpose of improving brightness, there are problems in that the color reproduction rate is lowered, light leakage occurs near the opening, and liquid crystal control is lowered.

The present invention seeks to propose a reflective display device that increases luminance while maintaining the same color gamut.

One embodiment of the present invention includes a substrate; a thin film transistor disposed on the substrate; an insulating layer located over the thin film transistor and having a contact hole exposing the thin film transistor; and a first reflection pattern disposed on the insulating layer and connected to the thin film transistor through the contact hole.

According to one embodiment of the present invention, the first reflection pattern may be connected to the drain electrode of the thin film transistor through the contact hole.

According to an embodiment of the present invention, the display device may include a plurality of pixels having a pixel electrode area and a connection electrode area, and the first reflection pattern may be disposed in the pixel electrode area and the connection electrode area.

According to an embodiment of the present invention, the device includes a plurality of pixels having a pixel electrode region and a connection electrode region, wherein the first reflection pattern is disposed in the connection electrode region and is spaced apart from the first reflection pattern to form the pixel electrode. It may further include a second reflection pattern disposed in the area.

According to one embodiment of the present invention, the second reflection pattern may extend between the pixel electrode areas.

According to one embodiment of the present invention, it may further include an insulating pattern disposed in the contact hole.

According to one embodiment of the present invention, the first reflective pattern may be disposed on the insulating pattern.

According to one embodiment of the present invention, the insulating layer and the insulating pattern may be made of the same material.

According to one embodiment of the present invention, the insulating pattern may have an area smaller than the area of the contact hole on a plane.

According to one embodiment of the present invention, the insulating pattern may have a pillar shape.

According to one embodiment of the present invention, it may further include a color filter disposed on the first reflection pattern.

According to one embodiment of the present invention, the color filter may be disposed within the contact hole.

According to one embodiment of the present invention, a white material disposed in the contact hole may be further included.

According to one embodiment of the present invention, the color filter includes a white filter, and the white material may be made of the same material as the white filter.

According to one embodiment of the present invention, it may further include a pixel electrode disposed on the first reflective pattern and connected to the first reflective pattern.

According to one embodiment of the present invention, a color filter disposed between the first reflection pattern and the pixel electrode may be further included.

According to one embodiment of the present invention, the first reflective pattern and the color filter may be disposed within the contact hole.

According to one embodiment of the present invention, it may further include an insulating pattern disposed in the contact hole, and the first reflective pattern may be disposed on the insulating pattern.

According to one embodiment of the present invention, the insulating layer and the insulating pattern may be made of the same material.

According to one embodiment of the present invention, the insulating pattern may have an area smaller than the area of the contact hole on a plane.

The present invention can increase the reflectance of external light and increase the brightness of the display device by disposing the first reflection pattern in the contact hole exposing the thin film transistor.

In addition, the present invention can increase the color gamut by placing a color filter in the contact hole and prevent light leakage by removing the opening of the color filter.

Additionally, the present invention improves liquid crystal control at the contact hole location by disposing the insulating pattern in the contact hole.

1 is a plan view schematically showing a plurality of pixels according to Embodiment 1 of the present invention.
Figure 2 is a cross-sectional view taken along line II' of Figure 1.
Figure 3 is a plan view schematically showing the reflection pattern of Figure 1.
Figure 4 is a cross-sectional view showing a display device according to Example 2 of the present invention.
Figure 5 is a plan view schematically showing area A.
Figure 6 is a cross-sectional view of a display device according to Embodiment 3 of the present invention.
Figure 7 is a plan view schematically showing a first reflection pattern according to Example 4 of the present invention.
Figure 8 is a plan view schematically showing a reflection pattern according to Example 5 of the present invention.

The advantages and features of the present invention and methods for achieving them will become clear by referring to the embodiments described in detail below along with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below and will be implemented in various different forms. The present embodiments only serve to ensure that the disclosure of the present invention is complete and that common knowledge in the technical field to which the present invention pertains is not limited. It is provided to fully inform those who have the scope of the invention, and the present invention is only defined by the scope of the claims. Accordingly, in some embodiments, well-known process steps, well-known device structures, and well-known techniques are not specifically described to avoid ambiguous interpretation of the present invention. Like reference numerals refer to like elements throughout the specification.

Spatially relative terms such as “below”, “beneath”, “lower”, “above”, “upper”, etc. are used as a single term as shown in the drawing. It can be used to easily describe the correlation between elements or components and other elements or components. Spatially relative terms should be understood as terms that include different directions of the element during use or operation in addition to the direction shown in the drawings. For example, if an element shown in the drawings is turned over, an element described as “below” or “beneath” another element may be placed “above” the other element. Accordingly, the illustrative term “down” may include both downward and upward directions. Elements can also be oriented in other directions, so spatially relative terms can be interpreted according to orientation.

The terminology used herein is for describing embodiments and is not intended to limit the invention. As used herein, singular forms also include plural forms, unless specifically stated otherwise in the context. As used herein, “comprises” and/or “comprising” refers to the presence of one or more other components, steps, operations and/or elements. or does not rule out addition.

Unless otherwise defined, all terms (including technical and scientific terms) used in this specification may be used with meanings that can be commonly understood by those skilled in the art to which the present invention pertains. Additionally, terms defined in commonly used dictionaries are not interpreted ideally or excessively unless clearly specifically defined.

First, a display device according to Embodiment 1 of the present invention will be described with reference to FIGS. 1 to 3. Unless otherwise specified, it is assumed that the liquid crystal display device in Example 1 is a reflective liquid crystal display device. In a reflective liquid crystal display device, incident natural or external light is reflected by the reflection pattern 130, passes through the liquid crystal layer 3, and displays an image.

1 is a plan view schematically showing a plurality of pixels according to Embodiment 1 of the present invention. Figure 2 is a cross-sectional view taken along line II' of Figure 1. Figure 3 is a plan view schematically showing the reflection pattern of Figure 1.

1 to 3, the liquid crystal display device according to the first embodiment of the present invention includes a plurality of pixels (R, G, B, W). The plurality of pixels (R, G, B, W) include a red pixel (R), a green pixel (G), a blue pixel (B), and a white pixel (W). The gate line 121 and data line 171 are arranged in a matrix form to define a plurality of pixels (R, G, B, W). For example, as shown in Figure 1, red pixels (R), green pixels (G), blue pixels (B), and white pixels (W) are arranged in a 1 x 4 matrix and form one pixel group. . In Figure 1, for convenience of explanation, only one pixel group is displayed, but in reality, the pixel group is arranged in a matrix form with a plurality of columns and a plurality of rows. Since pixel groups have the same structure, hereinafter, for convenience of explanation, only one pixel group will be described as an example. Here, the pixel group is shown as a 1 x 4 matrix, but it is not limited to this. The shape of the pixel group can be modified in various ways, such as a line shape, V-shape, or Z-shape.

The first substrate 110 includes a pixel electrode region 10, a connection electrode region 20, and a transistor region 30. A plurality of pixels (R, G, B, W) are disposed in the pixel electrode area 10, the connection electrode area 20, and the transistor area 30. As shown in FIG. 1, the pixel electrode area 10 is an area where the pixel electrode 191 is disposed and is an area where an image is displayed. The connection electrode area 20 is an area where the connection electrode 199 extending from the pixel electrode 191 is disposed and is an area where an image is displayed. The transistor area 30 is an area where a thin film transistor (TFT) is placed and is a non-display area.

Meanwhile, for convenience of explanation, a red pixel (R) in which a red color filter (230R) is disposed will be described as an example. The plurality of pixels (R, G, B, and W) shown in FIG. 1 have the same configuration except for the arrangement of the color filters (230R, 230G, 230B, and 230W).

Each component of the liquid crystal display device will be described in detail as follows.

The liquid crystal display device includes a lower display panel 100 and an upper display panel 200 facing each other, and a liquid crystal layer 3 located between the two display panels 100 and 200.

First, the lower display panel 100 will be described.

A plurality of gate lines 121 are formed on the first substrate 110.

The gate line 121 transmits the gate signal and extends mainly in the horizontal direction. Each gate line 121 includes a plurality of gate electrodes 124.

A gate insulating layer 140 is formed on the gate line 121. The gate insulating film 140 may be made of an inorganic insulating material such as silicon nitride (SiNx) or silicon oxide (SiOx).

A plurality of semiconductors 154 are formed on the gate insulating film 140. The semiconductor 154 includes a protrusion extending along the gate electrode 124 . In addition, the semiconductor 154 may be disposed only on the gate electrode 124.

The semiconductor 154 may include amorphous silicon, polycrystalline silicon, or an oxide semiconductor. The oxide semiconductor may include at least one selected from the group consisting of zinc (Zn), gallium (Ga), indium (In), and tin (Sn).

For example, oxide semiconductors include oxides based on zinc (Zn), gallium (Ga), tin (Sn), or indium (In), or complex oxides such as zinc oxide (ZnO), indium-gallium-zinc oxide (InGaZnO4), It can be made using oxide semiconductor materials such as indium-zinc oxide (In-Zn-O), zinc-tin oxide (Zn-Sn-O), etc.

Specifically, the oxide semiconductor may include an IGZO-based oxide containing indium (In), gallium (Ga), zinc (Zn), and oxygen (O). In addition, oxide semiconductors include In-Sn-Zn-O-based metal oxides, In-Al-Zn-O-based metal oxides, Sn-Ga-Zn-O-based metal oxides, Al-Ga-Zn-O-based metal oxides, and Sn- Al-Zn-O based metal oxide, In-Zn-O based metal oxide, Sn-Zn-O based metal oxide, Al-Zn-O based metal oxide, In-O based metal oxide, Sn-O based metal oxide, and Zn-O-based metal oxide.

A plurality of ohmic contacts 161, 163, and 165 are formed on the semiconductor 154 and the semiconductor protrusion. The ohmic contact members 161, 163, and 165 are arranged on the semiconductor 154 in pairs, facing each other around the gate electrode 124.

The ohmic contact members 161, 163, and 165 may be made of a material such as n+ hydrogenated amorphous silicon doped with a high concentration of n-type impurities such as phosphorus, or may be made of silicide.

A data conductor including a plurality of data lines 171 and a plurality of drain electrodes 175 is formed on the ohmic contact members 161, 163, and 165.

The data line 171 transmits data signals and mainly extends vertically and intersects the gate line 121. Each data line 171 includes a plurality of source electrodes 173 extending toward the gate electrode 124.

The drain electrode 175 faces the source electrode 173 with the gate electrode 124 as the center.

The gate electrode 124, source electrode 173, and drain electrode 175 together with the semiconductor 154 form a thin film transistor (TFT), which is a switching element. The semiconductor 154 may have substantially the same planar shape as the data line 171, the drain electrode 175, and the ohmic contact members 161, 163, and 165 below them.

A protective film 180 is positioned on the data conductors 171 and 175 and the exposed semiconductor 154, and the protective film 180 may be made of an organic insulating material or an inorganic insulating material. The protective film 180 has an opening that exposes a thin film transistor (TFT). Meanwhile, the protective film 180 may be omitted.

An insulating layer 190 is formed on the protective film 180. The insulating layer 190 may be made of an organic material. The insulating layer 190 is located on the gate line 121, the data line 171, and the thin film transistor (TFT). The insulating layer 190 has a contact hole 185 exposing a thin film transistor (TFT). For example, the insulating layer 190 exposes the drain electrode 175 of the thin film transistor (TFT).

The reflective pattern 130 is disposed on the insulating layer 190 to reflect external light. The reflective pattern 130 may be made of a reflective metal such as aluminum, silver, chromium, or an alloy thereof. The reflective layer 130 may have irregularities (not shown) formed on its surface to increase the reflection efficiency of light incident from the outside.

Specifically, the reflective pattern 130 includes a first reflective pattern 131 and a second reflective pattern 132.

The first reflective pattern 131 is disposed on the insulating layer 190 and connected to the thin film transistor (TFT) through the contact hole 185. For example, the first reflection pattern 131 is disposed in the contact hole 185 and connected to the drain electrode 175. Additionally, the first reflection pattern 131 is connected to the connection electrode 199 of the pixel electrode 191, which will be described later. Accordingly, the first reflection pattern 131 electrically connects the drain electrode 175 and the pixel electrode 191.

The first reflection pattern 131 is disposed in each pixel (R, G, B, W). That is, the first reflection pattern 131 is disposed for each pixel (R, G, B, W) arranged in a matrix form. For example, as shown in FIG. 3, the first reflection pattern 131 is disposed in the contact hole 185 and is disposed in the connection electrode area 20 to be connected to the drain electrode 175. Additionally, the first reflection pattern 131 is also disposed in the transistor region 30 to increase external light reflection efficiency.

The second reflective pattern 132 is spaced apart from the first reflective pattern 131 and is disposed in the pixel electrode area 10 . As shown in FIG. 3 , the second reflective pattern 132 extends between the pixel electrode regions 10 . That is, the second reflection pattern 132 is arranged to extend in a line shape for each row of the plurality of pixels (R, G, B, W) arranged in a matrix form.

Meanwhile, the second reflection pattern 132 is not connected to a signal line such as the gate line 121 or the data line 171 and only serves to reflect light incident from the outside.

As the first reflection pattern 131 is disposed within the contact hole 185, the reflection efficiency of external light can be increased and the brightness of the display device can be increased.

Color filters 230R, 230G, 230B, and 230W are disposed on the reflective pattern 130 and the insulating layer 190. Color filters 230R, 230G, 230B, and 230W are disposed within the contact hole 185.

The color filters (230R, 230G, 230B, 230W) are a red color filter (230R), a green color filter (230G), a blue color filter (230B), and a white color filter that overlap each pixel (R, G, B, W). (230W) included. The color filter (230R, 230G, 230B, 230W) can uniquely display one of the primary colors. Examples of primary colors include the three primary colors such as red, green, and blue, or yellow and cyan. , magenta, etc. The color filters 230R, 230G, and 230B are made of organic materials. Meanwhile, the white color filter (230W) may be omitted.

In this way, by placing the color filters (230R, 230G, 230B, 230W) within the contact hole 185, the color reproduction rate can be increased, and by removing the openings of the color filters (230R, 230G, 230B, 230W), the light leakage phenomenon can be prevented. It can be prevented.

A pixel electrode 191 and a connection electrode 199 are disposed on the color filters 230R, 230G, 230B, and 230W, the insulating layer 190, and the reflection pattern 130. The pixel electrode 191 is disposed on the second reflection pattern 132 and connected to the first reflection pattern 131 through the connection electrode 199. Since the first reflection pattern 131 is electrically connected to the drain electrode 175 through the contact hole 185, the pixel electrode 191 receives the data voltage through the first reflection pattern 131. The pixel electrode 191 to which the data voltage is applied generates an electric field in the liquid crystal layer 3 together with the common electrode 270 to which the common voltage is applied. The pixel electrode 191 is disposed in each pixel electrode area 10.

A connection electrode 199 is disposed in the connection electrode area 20 and connected to the pixel electrode 191. The connection electrode 199 may extend from the pixel electrode 191 or may be formed separately from the pixel electrode 191. When the connection electrode 199 is formed spaced apart from the pixel electrode 191, it must be connected to the pixel electrode 191 through a bridge method or the like. Color filters 230R, 230G, 230B, and 230W are disposed in the areas 10 and 20 where the pixel electrode 191 and the connection electrode 199 are disposed. The color filters 230R, 230G, 230B, and 230W are disposed between the first reflection pattern 131 and the pixel electrode 191. Accordingly, the pixel electrode area 10 and the connection electrode area 20 function as a display area.

The pixel electrode 191 and the connection electrode 199 may be made of a transparent conductive material such as ITO or IZO.

Next, the upper display panel 200 will be described.

A light blocking member 220 called a black matrix is formed on the second substrate 210 in a portion corresponding to the gate line 121, data line 171, and transistor region 30. The light blocking member 220 prevents light leakage. The light blocking member 220 faces the pixel electrode 191 and has a plurality of openings that have substantially the same shape as the pixel electrode 191. However, the light blocking member 220 may be composed of a portion corresponding to the gate line 121 and the data line 171 and a portion corresponding to the transistor region 30. An overcoat 250 is formed on the light blocking member 220. The overcoat 250 prevents the light blocking member 220 from being exposed and provides a flat surface, and can be omitted.

A common electrode 270 is formed on the overcoat 250. The common electrode 270 may be made of a transparent conductive material such as ITO or IZO. The common electrode 270 may be planar and formed as a solid plate on the entire surface of the second substrate 210 .

An alignment layer (not shown) is formed on the inner surfaces of the two display panels 100 and 200, respectively. Polarizers (not shown) are provided on the outer surfaces of the display panels 100 and 200, and the polarization axes of the two polarizers are perpendicular or parallel. In the case of a reflective liquid crystal display device, one of the two polarizers may be omitted.

The liquid crystal layer 3 contained between the lower display panel 100 and the upper display panel 200 includes liquid crystal molecules (not shown), and the long axis of the liquid crystal molecules is similar to that of the two display panels 100 and 200 in the absence of an electric field. It may be oriented horizontally with respect to the surface.

The liquid crystal layer 3 may have positive dielectric anisotropy or negative dielectric anisotropy. The liquid crystal molecules of the liquid crystal layer 3 may be oriented to have a pretilt in a certain direction, and the pretilt direction of the liquid crystal molecules may change depending on the dielectric anisotropy of the liquid crystal layer 3.

The pixel electrode 191 to which the data voltage is applied determines the direction of the liquid crystal molecules of the liquid crystal layer 3 by generating an electric field in the liquid crystal layer 3 together with the common electrode 270 to which the common voltage is applied and displays the corresponding image. do.

Below, a liquid crystal display device according to Example 2 of the present invention will be described with reference to FIGS. 4 and 5. For convenience of explanation, description of the same configuration as Example 1 is omitted.

Figure 4 is a cross-sectional view showing a display device according to Example 2 of the present invention. Figure 5 is a plan view schematically showing area A.

Referring to FIGS. 4 and 5 , the display device according to the second embodiment of the present invention further includes an insulating pattern 192 disposed within the contact hole 185 .

The insulating pattern 192 is formed at the same time as the insulating layer 190 and is made of the same material. The insulating pattern 192 has a pillar shape and has an area smaller than the area of the contact hole 185 on a plane. That is, a plurality of insulating patterns 192 are arranged within the contact hole 185 as shown in FIG. 5 . Meanwhile, the first reflective pattern 131 and color filters 230R, 230B, 230G, and 230W (shown in FIG. 1) are sequentially disposed on the insulating pattern 192.

By disposing the insulating pattern 192 within the contact hole 185 in this way, the step is compensated and liquid crystal control near the contact hole 185 is improved.

Below, liquid crystal display devices according to Examples 3 to 5 of the present invention will be described with reference to FIGS. 6 to 8. For convenience of explanation, description of the same configuration as Example 1 is omitted.

Figure 6 is a cross-sectional view of a display device according to Embodiment 3 of the present invention. Figure 7 is a plan view schematically showing a first reflection pattern according to Example 4 of the present invention. Figure 8 is a plan view schematically showing a reflection pattern according to Example 5 of the present invention.

Referring to FIGS. 1 and 6 , in the display device according to the third embodiment of the present invention, a white material 240 is disposed within the contact hole 185. The white material 240 is a transparent material and may be, for example, a white photoresist material. The white material 240 may be made of the same material as the white filter 230W. That is, unlike Example 1, the red color filter 230R, green color filter 230G, and blue color filter 230B are not disposed near the contact hole 185, but the white material 240 is disposed near the contact hole 185. ) can compensate for nearby steps. Accordingly, liquid crystal control near the contact hole 185 can be improved.

Referring to FIGS. 1 and 7 , the first reflective pattern 131 according to the fourth embodiment of the present invention is disposed in each pixel (R, G, B, and W). Specifically, unlike Example 1, the first reflection pattern 131 is disposed in all of the pixel electrode region 10, the connection electrode region 20, and the transistor region 30, and the second reflection pattern 132 is removed. Additionally, the first reflective patterns 131 are spaced apart from each other and do not extend between the pixel electrode regions 10 . That is, the first reflective patterns 131 according to the fourth embodiment are arranged in the same number as the number of pixels (R, G, B, W) corresponding to each pixel (R, G, B, W). Even by disposing the first reflection pattern 131 in this way, the luminance of the display device can be increased in the same way as in Example 1.

Referring to FIGS. 1 and 8 , the second reflective pattern 132 according to the fifth embodiment of the present invention does not extend between the pixel electrode regions 10 . That is, the second reflective patterns 132 are spaced apart from each other and disposed in each pixel electrode area 10 . Even by disposing the second reflection pattern 132 in this way, the luminance of the display device can be increased in the same way as in Example 1.

The embodiments of the display device of the present invention described above are merely illustrative, and the scope of protection of the present invention may include various modifications and equivalent examples thereof to those skilled in the art.

3: Liquid crystal layer 100: Lower display panel
110: first substrate 121: gate line
124: gate electrode 130: reflection pattern
131: first reflection pattern 132: second reflection pattern
140: gate insulating film 154: semiconductor
161, 163, 165: member of resistive contact
171: data line 173: source electrode
175: drain electrode 180: protective film
185: contact hole 190: insulating layer
191: pixel electrode 199: connection electrode
200: upper display panel 210: second substrate
220: Light blocking member 230R, 230G, 230B: Color filter
250: cover film 270: common electrode

Claims (16)

A substrate including a pixel electrode region 10, a connection electrode region 20, and a transistor region 30;
a thin film transistor including a semiconductor layer disposed in the transistor region and a drain electrode disposed in the transistor region and the connection electrode region;
an insulating layer located in the pixel electrode region, the connection electrode region, and the transistor region;
a first reflective pattern disposed on the insulating layer in the connection electrode area; and
A pixel electrode disposed in the pixel electrode area and connected to the first reflection pattern in the connection electrode area,
The insulating layer is located on the thin film transistor, and the insulating layer has a contact hole exposing a portion of the drain electrode located in the connection electrode region,
The first reflection pattern is connected to the drain electrode through the contact hole,
The first reflection pattern overlaps the semiconductor layer,
A display device further comprising an insulating pattern, wherein the first reflective pattern is disposed on the insulating pattern, and the insulating pattern is disposed in the contact hole. According to claim 1,
The first reflection pattern is disposed in the pixel electrode area and the connection electrode area. According to claim 1,
The first reflective pattern is disposed in the connection electrode area,
The display device further includes a second reflection pattern disposed in the pixel electrode area and spaced apart from the first reflection pattern. According to clause 3,
The second reflection pattern extends across the plurality of pixel electrode regions. delete A substrate including a pixel electrode region 10, a connection electrode region 20, and a transistor region 30;
a thin film transistor including a semiconductor layer disposed in the transistor region and a drain electrode disposed in the transistor region and the connection electrode region;
an insulating layer located in the pixel electrode region, the connection electrode region, and the transistor region;
a first reflective pattern disposed on the insulating layer in the connection electrode area; and
A pixel electrode disposed in the pixel electrode area and connected to the first reflection pattern in the connection electrode area,
The insulating layer is located on the thin film transistor, and the insulating layer has a contact hole exposing a portion of the drain electrode located in the connection electrode region,
The first reflection pattern is connected to the drain electrode through the contact hole,
A display device further comprising an insulating pattern, wherein the first reflective pattern is disposed on the insulating pattern, and the insulating pattern is disposed in the contact hole. According to clause 6,
The display device wherein the insulating layer and the insulating pattern are made of the same material. According to clause 6,
A display device wherein the insulating pattern has an area smaller than the area of the contact hole on a plane. According to clause 6,
A display device wherein the insulating pattern has a pillar shape. According to claim 1,
A display device further comprising a color filter disposed on the first reflection pattern. According to claim 10,
The color filter is disposed in the contact hole. According to claim 11,
The display device further comprising a white material disposed within the contact hole. According to claim 12,
A display device wherein the color filter includes a white filter, and the white material is made of the same material as the white filter. According to claim 10,
The color filter is disposed between the first reflection pattern and the pixel electrode. According to claim 1,
A display device in which an area of the contact hole in a plan view is smaller than an area of a drain electrode located in the connection electrode area. According to claim 15,
The display device wherein the insulating layer overlaps a side of a drain electrode located in the connection electrode area.