KR102609748B1 - 리소그래피 시스템 내에 구성요소를 유지하기 위한 조립체 및 리소그래피 시스템 - Google Patents

리소그래피 시스템 내에 구성요소를 유지하기 위한 조립체 및 리소그래피 시스템 Download PDF

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KR102609748B1
KR102609748B1 KR1020177022895A KR20177022895A KR102609748B1 KR 102609748 B1 KR102609748 B1 KR 102609748B1 KR 1020177022895 A KR1020177022895 A KR 1020177022895A KR 20177022895 A KR20177022895 A KR 20177022895A KR 102609748 B1 KR102609748 B1 KR 102609748B1
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KR
South Korea
Prior art keywords
magnet
arrangement
force
coil
permanent
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KR1020177022895A
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English (en)
Korean (ko)
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KR20170105578A (ko
Inventor
야스퍼 베셀링흐
Original Assignee
칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electromagnets (AREA)
KR1020177022895A 2015-01-22 2016-01-15 리소그래피 시스템 내에 구성요소를 유지하기 위한 조립체 및 리소그래피 시스템 KR102609748B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015201096.1 2015-01-22
DE102015201096.1A DE102015201096A1 (de) 2015-01-22 2015-01-22 Anordnung zur Halterung eines Bauteils in einer Lithographieanlage sowie Lithographieanlage
PCT/EP2016/050812 WO2016116375A1 (de) 2015-01-22 2016-01-15 Anordnung zur halterung eines bauteils in einer lithographieanlage sowie lithographieanlage

Publications (2)

Publication Number Publication Date
KR20170105578A KR20170105578A (ko) 2017-09-19
KR102609748B1 true KR102609748B1 (ko) 2023-12-06

Family

ID=55168270

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177022895A KR102609748B1 (ko) 2015-01-22 2016-01-15 리소그래피 시스템 내에 구성요소를 유지하기 위한 조립체 및 리소그래피 시스템

Country Status (4)

Country Link
KR (1) KR102609748B1 (zh)
CN (1) CN107209462B (zh)
DE (1) DE102015201096A1 (zh)
WO (1) WO2016116375A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016226085A1 (de) 2016-12-22 2017-03-02 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
US20200251691A1 (en) * 2017-03-17 2020-08-06 Applied Materials, Inc. Apparatus for vacuum processing of a substrate, system for vacuum processing of a substrate, and method for transportation of a substrate carrier and a mask carrier in a vacuum chamber
DE102017212773A1 (de) * 2017-07-25 2019-01-31 Carl Zeiss Smt Gmbh Gewichtskraftkompensationseinrichtung
AT525939A2 (de) * 2022-02-16 2023-09-15 Univ Wien Tech Positioniervorrichtung und Verfahren zum Positionieren eines Gegenstandes

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102200689A (zh) * 2010-03-23 2011-09-28 上海微电子装备有限公司 一种混合磁浮式的重力补偿装置
JP2012511821A (ja) 2008-12-11 2012-05-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置内の光学素子のための重力補償器
JP2014507786A (ja) * 2010-12-20 2014-03-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070035602A (ko) * 2004-07-15 2007-03-30 가부시키가이샤 니콘 평면 모터 장치, 스테이지 장치, 노광 장치 및 디바이스의제조 방법
DE102011004607A1 (de) 2011-02-23 2012-01-12 Carl Zeiss Smt Gmbh Vorrichtung zur Gewichtskraftkompensation eines optischen Bauteils, Aktuator und Lithographievorrichtung
DE102013204317B4 (de) * 2013-03-13 2015-07-23 Carl Zeiss Smt Gmbh Baugruppe einer mikrolithographischen Projektionsbelichtungsanlage
DE102013209028A1 (de) 2013-05-15 2014-05-15 Carl Zeiss Smt Gmbh Baugruppe einer mikrolithographischen Projektionsbelichtungsanlage

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012511821A (ja) 2008-12-11 2012-05-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置内の光学素子のための重力補償器
CN102200689A (zh) * 2010-03-23 2011-09-28 上海微电子装备有限公司 一种混合磁浮式的重力补偿装置
JP2014507786A (ja) * 2010-12-20 2014-03-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を取り付ける配置構成

Also Published As

Publication number Publication date
KR20170105578A (ko) 2017-09-19
DE102015201096A1 (de) 2016-07-28
WO2016116375A1 (de) 2016-07-28
CN107209462B (zh) 2020-09-15
CN107209462A (zh) 2017-09-26

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