KR102605033B1 - A method of preparing 5-alkyltetrazole - Google Patents
A method of preparing 5-alkyltetrazole Download PDFInfo
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- KR102605033B1 KR102605033B1 KR1020160079220A KR20160079220A KR102605033B1 KR 102605033 B1 KR102605033 B1 KR 102605033B1 KR 1020160079220 A KR1020160079220 A KR 1020160079220A KR 20160079220 A KR20160079220 A KR 20160079220A KR 102605033 B1 KR102605033 B1 KR 102605033B1
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- South Korea
- Prior art keywords
- formula
- alkyltetrazole
- acid
- producing
- reacting
- Prior art date
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- 238000000034 method Methods 0.000 title description 5
- -1 alkyl imidate Chemical compound 0.000 claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 239000002253 acid Substances 0.000 claims abstract description 12
- 239000011541 reaction mixture Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000002585 base Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 3
- 239000003377 acid catalyst Substances 0.000 claims description 3
- 239000000908 ammonium hydroxide Substances 0.000 claims description 3
- 239000003586 protic polar solvent Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000007810 chemical reaction solvent Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 10
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000011259 mixed solution Substances 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- XZGLNCKSNVGDNX-UHFFFAOYSA-N 5-methyl-2h-tetrazole Chemical compound CC=1N=NNN=1 XZGLNCKSNVGDNX-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- JMIAPORGEDIDLT-UHFFFAOYSA-N ethyl ethanimidate Chemical compound CCOC(C)=N JMIAPORGEDIDLT-UHFFFAOYSA-N 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 3
- 239000012346 acetyl chloride Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical compound C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- QDFXRVAOBHEBGJ-UHFFFAOYSA-N 3-(cyclononen-1-yl)-4,5,6,7,8,9-hexahydro-1h-diazonine Chemical compound C1CCCCCCC=C1C1=NNCCCCCC1 QDFXRVAOBHEBGJ-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- NTSLROIKFLNUIJ-UHFFFAOYSA-N 5-Ethyl-2-methylpyridine Chemical compound CCC1=CC=C(C)N=C1 NTSLROIKFLNUIJ-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-WFGJKAKNSA-N acetone d6 Chemical compound [2H]C([2H])([2H])C(=O)C([2H])([2H])[2H] CSCPPACGZOOCGX-WFGJKAKNSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 159000000009 barium salts Chemical class 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 159000000007 calcium salts Chemical class 0.000 description 2
- 239000012973 diazabicyclooctane Substances 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine hydrate Chemical compound O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- 159000000003 magnesium salts Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000001272 nitrous oxide Substances 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N nitrous oxide Inorganic materials [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 150000003378 silver Chemical class 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 150000003751 zinc Chemical class 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007805 chemical reaction reactant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D257/00—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
- C07D257/02—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D257/04—Five-membered rings
-
- C11D11/0047—
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3769—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines
- C11D3/3776—Heterocyclic compounds, e.g. lactam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
본 발명은 5-알킬테트라졸의 제조방법에 관한 것으로서, a) 화학식 1의 알킬이미데이트를, a1) 히드라진과 반응시켜 화학식 2의 화합물을 얻고, 화학식 2의 화합물을 아질산화합물 및 산과 반응시키거나, a2) 아지드화합물 및 산과 반응시킴으로써 반응 혼합물을 얻는 단계; 및 b) 상기 반응 혼합물과 염기를 반응시켜 화학식 3의 5-알킬테트라졸을 얻는 단계를 포함하는 5-알킬테트라졸의 제조방법에 관한 것이다.The present invention relates to a method for producing 5-alkyltetrazole, which includes a) reacting an alkyl imidate of Formula 1 with a1) hydrazine to obtain a compound of Formula 2, and reacting the compound of Formula 2 with a nitrous acid compound and an acid. , a2) obtaining a reaction mixture by reacting with an azide compound and an acid; and b) reacting the reaction mixture with a base to obtain 5-alkyltetrazole of Chemical Formula 3.
Description
본 발명은 적은 비용으로도 제조가 가능한 5-알킬테트라졸의 제조방법에 관한 것이다.The present invention relates to a method for producing 5-alkyltetrazole, which can be produced at low cost.
액정표시장치 또는 반도체소자의 미세 회로 제조 공정은 기판상에 형성된 구리, 구리 합금막 등의 도전성 금속막 또는 실리콘 산화막, 실리콘 질화막 등의 절연막에 포토레지스트를 균일하게 도포하고, 이것을 선택적으로 노광 및 현상 처리하여 포토레지스트 패턴을 형성한 다음, 패턴화된 포토레지스트막을 마스크로 하여 상기 도전성 금속막이나 절연막을 습식 또는 건식으로 식각하여 미세 회로 패턴을 포토레지스트 하부층에 전사한 후 불필요해진 포토레지스트층을 박리액으로 제거하는 공정으로 진행된다. The microcircuit manufacturing process for liquid crystal displays or semiconductor devices involves uniformly applying photoresist to a conductive metal film such as copper or copper alloy film or an insulating film such as silicon oxide or silicon nitride film formed on a substrate, and selectively exposing and developing the photoresist. After processing to form a photoresist pattern, the conductive metal film or insulating film is wet or dry etched using the patterned photoresist film as a mask to transfer the fine circuit pattern to the photoresist lower layer, and then peeling off the unnecessary photoresist layer. It proceeds with a process of removing it with a liquid.
이 때, 금속막이나 절연막을 식각할 때 필요로 하는 식각액 조성물에는 식각 속도를 조절하고 패턴의 시디로스(CD Loss)를 줄여 공정상의 마진을 높이기 위한 식각 억제의 역할을 하는 성분으로 고리형 아민 화합물이 포함된다. 이 때, 상기 역할을 수행하며 식각 반응 초기 경사각이 처리매수가 누적되어도 증가되지 않고 일정하도록 제어하는 효과를 훌륭히 수행하는 측면에서 5-알킬테트라졸계 화합물인 5-메틸테트라졸이 주로 사용되고 있다.At this time, the etchant composition required when etching a metal film or insulating film is a cyclic amine compound that controls the etching speed and plays an etching inhibitory role in reducing pattern CD loss to increase process margins. This is included. At this time, 5-methyltetrazole, a 5-alkyltetrazole compound, is mainly used because it performs the above role and has the effect of controlling the initial inclination angle of the etching reaction to be constant without increasing even as the number of treated sheets is accumulated.
상기 5-메틸테트라졸의 제조방법으로는 출발물질로 아세토니트릴을 사용하는 방법[Applied Organometallic Chemistry, vol.29, nb.11, p.730-735; Synthesis(Germany), vol. 46, nb. 15, p. 2065-2070; Journal of Organic Chemistry, vol.76, nb. 21, p. 9090-9095; Synthesis(Germany), nb. 13, p. 2175-2178; Chemical Communications, vol. 50, nb. 85, p. 12847-12850; Tetrahedron Letters, vol. 54, nb. 1, p. 106-109; Synthesis(Germany), vol. 46, nb. 6, p. 781-786; Canadian Journal of Chemistry, vol. 65, p. 166-169; Journal of Materials Chemistry, vol. 22, nb. 33, p. 17227-17235; RSC Advances, vol. 5, nb. 124, p. 102134-102142; Journal of Organic Chemistry, vol. 75, nb. 19, p. 6468-6476; Journal of Organic Chemistry, vol. 15, p. 1082-1092; Synthesis(Germany), vol. 47, nb. 4, p. 507-510]과 출발물질로 티오아세트아마이드를 사용하는 방법[독일 특허 제1954-00014582호]이 공지되어 있지만, 상기 방법들은 반응 온도가 높아 고압반응기의 사용이 필수적이므로 제조 단가가 상승하는 문제가 있다.The method for producing 5-methyltetrazole includes using acetonitrile as a starting material [Applied Organometallic Chemistry, vol.29, nb.11, p.730-735; Synthesis (Germany), vol. 46, nb. 15, p. 2065-2070; Journal of Organic Chemistry, vol.76, nb. 21, p. 9090-9095; Synthesis (Germany), nb. 13, p. 2175-2178; Chemical Communications, vol. 50, nb. 85, p. 12847-12850; Tetrahedron Letters, vol. 54, nb. 1, p. 106-109; Synthesis (Germany), vol. 46, nb. 6, p. 781-786; Canadian Journal of Chemistry, vol. 65, p. 166-169; Journal of Materials Chemistry, vol. 22, nb. 33, p. 17227-17235; RSC Advances, vol. 5, nb. 124, p. 102134-102142; Journal of Organic Chemistry, vol. 75, nb. 19, p. 6468-6476; Journal of Organic Chemistry, vol. 15, p. 1082-1092; Synthesis (Germany), vol. 47, nb. 4, p. 507-510] and a method using thioacetamide as a starting material [German Patent No. 1954-00014582] are known, but these methods have a high reaction temperature and require the use of a high-pressure reactor, leading to the problem of increased manufacturing costs. there is.
본 발명은 상기와 같은 문제를 해결하기 위한 것으로서, 5-알킬테트라졸의 제조 단가를 감소시킬 수 있는 제조 방법을 제공하는 데 그 목적이 있다.The present invention is intended to solve the above problems, and its purpose is to provide a production method that can reduce the production cost of 5-alkyltetrazole.
상기 목적을 달성하기 위한 본 발명에 따른 5-알킬테트라졸의 제조방법은 The method for producing 5-alkyltetrazole according to the present invention to achieve the above object is
a) 하기 화학식 1의 알킬이미데이트를,a) an alkyl imidate of the formula 1 below,
a1) 히드라진과 반응시켜 하기 화학식 2의 화합물을 얻고, 하기 화학식 2의 화합물을 아질산화합물 및 산과 반응시키거나,a1) react with hydrazine to obtain a compound of formula 2 below, and react the compound of formula 2 with a nitrite compound and acid, or
a2) 아지드화합물 및 산과 반응시킴으로써 반응 혼합물을 얻는 단계; 및a2) obtaining a reaction mixture by reacting with an azide compound and an acid; and
b) 상기 반응 혼합물과 염기를 반응시켜 하기 화학식 3의 5-알킬테트라졸을 얻는 단계를 포함하는 것을 특징으로 한다.b) reacting the reaction mixture with a base to obtain 5-alkyltetrazole of the following formula (3).
[화학식 1] [Formula 1]
(상기 화학식 1에서,(In Formula 1 above,
R1은 C1 내지 C4의 알킬기이고,R 1 is a C1 to C4 alkyl group,
R2은 C1 내지 C5의 알킬기이다.)R 2 is an alkyl group of C1 to C5.)
[화학식 2] [Formula 2]
(상기 화학식 2에서,(In Formula 2 above,
R1은 상기 화학식 1에서와 같다.)R 1 is the same as in Formula 1 above.)
[화학식 3][Formula 3]
(상기 화학식 3에서,(In Formula 3 above,
R1은 상기 화학식 1에서와 같다.)R 1 is the same as in Formula 1 above.)
본 발명에 따른 5-알킬테트라졸의 제조방법은 제조 단가를 감소시킬 수 있는 효과가 있다.The method for producing 5-alkyltetrazole according to the present invention has the effect of reducing the manufacturing cost.
본 발명에서 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.In the present invention, when a part "includes" a certain component, this means that it may further include other components rather than excluding other components, unless specifically stated to the contrary.
이하, 본 발명의 바람직한 실시 양태를 상세히 설명하기로 한다.Hereinafter, preferred embodiments of the present invention will be described in detail.
본 발명의 한 양태에 따른 5-알킬테트라졸의 제조방법은 반응 출발물질로 하기 화학식 1의 알킬이미데이트를 포함하며, 하기와 같은 반응 단계를 포함한다.The method for producing 5-alkyltetrazole according to one aspect of the present invention includes an alkyl imidate of the following formula (1) as a reaction starting material, and includes the following reaction steps.
a) 하기 화학식 1의 알킬이미데이트를,a) an alkyl imidate of the formula 1 below,
a1) 히드라진과 반응시켜 하기 화학식 2의 화합물을 얻고, 하기 화학식 2의 화합물을 아질산화합물 및 산과 반응시키거나,a1) react with hydrazine to obtain a compound of formula 2 below, and react the compound of formula 2 with a nitrite compound and acid, or
a2) 아지드화합물 및 산과 반응시킴으로써 반응 혼합물을 얻는 단계;a2) obtaining a reaction mixture by reacting with an azide compound and an acid;
b) 상기 반응 혼합물과 염기를 반응시켜 하기 화학식 3의 5-알킬테트라졸을 얻는 단계를 포함한다.b) reacting the reaction mixture with a base to obtain 5-alkyltetrazole of the following formula (3).
[화학식 1] [Formula 1]
(상기 화학식 1에서,(In Formula 1 above,
R1은 C1 내지 C4의 알킬기이고,R 1 is a C1 to C4 alkyl group,
R2은 C1 내지 C5의 알킬기이다.)R 2 is an alkyl group of C1 to C5.)
[화학식 2] [Formula 2]
(상기 화학식 2에서,(In Formula 2 above,
R1은 상기 화학식 1에서와 같다.)R 1 is the same as in Formula 1 above.)
[화학식 3][Formula 3]
(상기 화학식 3에서,(In Formula 3 above,
R1은 상기 화학식 1에서와 같다.)R 1 is the same as in Formula 1 above.)
상기와 같은 반응 단계를 거쳐 생성된 5-알킬테트라졸은 저온 반응이 가능하여 고압반응기를 사용하지 않음으로써 생산 단가를 낮출 수 있는 효과가 있다.5-alkyltetrazole produced through the above reaction steps is capable of low-temperature reaction, which has the effect of lowering the production cost by not using a high-pressure reactor.
상기 알킬기는 탄소 및 수소 원자로만 이루어지며, 불포화도가 없고, 단일결합에 의해 분자의 나머지에 결합되는 직쇄 또는 측쇄형의 탄화수소 라디칼을 의미한다. 구체적으로 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, 이소부틸기, sec-부틸기, t-부틸기 등을 들 수 있다.The alkyl group refers to a straight-chain or branched-chain hydrocarbon radical that consists only of carbon and hydrogen atoms, has no degree of unsaturation, and is bonded to the rest of the molecule by a single bond. Specifically, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, etc.
상기 (a)단계의 알킬이미데이트는 본 기술분야에 공지된 합성법을 이용하여 제조할 수 있으며, 예컨대 (ⅰ) C1 내지 C5의 알코올 및 산 촉매제를 혼합하여 혼합물을 형성하는 단계 및 (ⅱ) 상기 혼합물에 C1 내지 C4의 알킬니트릴을 반응시켜 상기 화학식 1의 알킬이미데이트를 얻는 단계를 포함하여 제조할 수 있다. 상기 알코올은 구체적으로 메탄올, 에탄올, 프로판올, 부탄올 등을 들 수 있다. 상기 산 촉매제는 당 업계에서 사용되는 것이라면 특별히 한정되지 않지만, 구체적으로 아세틸 클로라이드, 염산, 티오닐클로라이드 등을 들 수 있다. 상기 알킬니트릴은 구체적으로 아세토 니트릴, 프로피오니트릴, 부티로니트릴, 발레로니트릴 등을 들 수 있다.The alkyl imidate in step (a) can be prepared using synthetic methods known in the art, such as (i) mixing C1 to C5 alcohol and an acid catalyst to form a mixture, and (ii) It can be prepared by reacting a C1 to C4 alkylnitrile with the mixture to obtain an alkylimidate of the formula (1). The alcohol may specifically include methanol, ethanol, propanol, butanol, etc. The acid catalyst is not particularly limited as long as it is used in the art, and specific examples include acetyl chloride, hydrochloric acid, and thionyl chloride. The alkylnitrile specifically includes acetonitrile, propionitrile, butyronitrile, and valeronitrile.
상기 (a1)단계는 상기 화학식 1의 알킬이미데이트와 히드라진을 반응시켜 상기 화학식 2의 화합물을 얻는 단계를 포함한다. 이 때, 상기 반응은 예컨대 -10 내지 -15℃의 환경하에서, 1 내지 2시간의 반응시간 동안 수행될 수 있다. 또한 상기 (a1)단계는 상기 화학식 2의 화합물을 산의 존재하에서, 아질산화합물과 반응시켜 반응 혼합물을 얻는 단계를 포함한다. 이 때, 상기 반응은 예컨대 5℃ 이하의 환경 하에서, 30분 내지 1시간의 반응시간 동안 수행될 수 있다. 상기 아질산화합물은 산의 존재하에서, 상기 화학식 2의 화합물과 반응하며, 구체적으로 나트륨염, 칼륨염 등의 알칼리 금속염; 마그네슘염, 칼슘염, 바륨염 등의 알칼리 토금속염; 은염, 알루미늄염, 아연염 및 그 밖의 금속염 등의 염을 포함할 수 있으나, 이에 한정되는 것은 아니다. 제조 단가를 절감하는 관점에서, 알칼리 금속염을 포함하는 것이 바람직하다. Step (a1) includes reacting the alkyl imidate of Formula 1 with hydrazine to obtain the compound of Formula 2. At this time, the reaction may be performed, for example, in an environment of -10 to -15°C for a reaction time of 1 to 2 hours. Additionally, step (a1) includes reacting the compound of Formula 2 with a nitrous oxide compound in the presence of an acid to obtain a reaction mixture. At this time, the reaction may be performed, for example, under an environment of 5°C or lower for a reaction time of 30 minutes to 1 hour. The nitrous oxide compound reacts with the compound of Formula 2 in the presence of acid, and specifically, alkali metal salts such as sodium salt and potassium salt; Alkaline earth metal salts such as magnesium salts, calcium salts, and barium salts; It may include salts such as silver salts, aluminum salts, zinc salts, and other metal salts, but is not limited thereto. From the viewpoint of reducing manufacturing costs, it is preferable to include an alkali metal salt.
상기 (a2)단계에서는 상기 화학식 1의 알킬이미데이트를 산의 존재하에서, 아지드화합물과 반응시킨다. 이 때, 상기 반응은 예컨대, 5℃ 내지 상온의 온도하에서, 1 내지 2시간의 반응시간 동안 수행될 수 있다. 상기 아지드화합물은 나트륨염, 칼륨염 등의 알칼리 금속염; 마그네슘염, 칼슘염, 바륨염 등의 알칼리 토금속염; 은염, 알루미늄염, 아연염 및 그 밖의 금속염 등의 염을 포함할 수 있으나, 이에 한정되는 것은 아니다. 제조 단가를 절감하는 관점에서 알칼리 금속염을 포함하는 것이 바람직하다.In step (a2), the alkyl imidate of Formula 1 is reacted with an azide compound in the presence of acid. At this time, the reaction may be performed, for example, at a temperature of 5°C to room temperature for a reaction time of 1 to 2 hours. The azide compound includes alkali metal salts such as sodium salts and potassium salts; Alkaline earth metal salts such as magnesium salts, calcium salts, and barium salts; It may include salts such as silver salts, aluminum salts, zinc salts, and other metal salts, but is not limited thereto. From the viewpoint of reducing manufacturing costs, it is preferable to include an alkali metal salt.
상기 (a1) 및 (a2)단계에서 사용되는 산은 반응단계에서 pH 조절을 위해 사용하며, 당 업계에서 사용되는 것이라면 특별히 제한되지 않는다. 예를 들면, 염산, 황산, 질산, 인산, 아세트산, 시트르산, 옥살산, 벤젠술폰산 등을 사용할 수 있으며, 바람직하게는 염산을 사용하는 것이 바람직하다. The acid used in steps (a1) and (a2) is used to adjust pH in the reaction step, and is not particularly limited as long as it is used in the industry. For example, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, citric acid, oxalic acid, benzenesulfonic acid, etc. can be used, and hydrochloric acid is preferably used.
상기 (b)단계에서는 상기 (a1) 내지 (a2)단계에서 생성된 반응 혼합물을 염기와 반응시켜 상기 화학식 3의 5-알킬테트라졸을 얻는다. 이 때, 상기 반응은 예컨대, 공기가 환류되는 환경하에서, 1 내지 2시간의 반응시간 동안 수행될 수 있다. 사용되는 염기는 반응과정 중 생성된 5-알킬테트라졸의 정제를 용이하게 하기 위해서 첨가된다. 상기 염기는 유기 및 무기 염기로 당 업계에서 통상적으로 사용되는 것일 수 있다. 구체적으로, 암모늄 히드록시드, 알칼리 금속 또는 알칼리 토금속의 히드록시드, 알콜레이트, 아세테이트, 플루오라이드, 포스페이트, 카보네이트 및 히드로겐카보네이트로 이루어진 군으로부터 선택될 수 있고 또한, 트리메틸아민, 트리에틸아민, 트리부틸아민, N,N-디메틸아닐린, N,N-디메틸벤질아민, 피리딘과 같은 3차 아민, 2-메틸-5-에틸피리딘과 같은 알킬피리딘, N-메틸 피페리딘, N-메틸 피롤리돈, N,N-디메틸아미노피리딘, 디아자비시클로옥탄(DABCO), 디아자비시클로노넨(DBN) 및 디아자비시클로운데센(DBU) 및 그들의 혼합물로 이루어진 군으로부터 선택될 수 있으나 이에 한정되는 것은 아니다. 바람직하게는 암모늄 히드록시드를 사용하는 것이 바람직하다.In step (b), the reaction mixture produced in steps (a1) to (a2) is reacted with a base to obtain 5-alkyltetrazole of Formula 3. At this time, the reaction may be performed, for example, in an environment where air is refluxed, for a reaction time of 1 to 2 hours. The base used is added to facilitate purification of 5-alkyltetrazole produced during the reaction process. The base may be an organic or inorganic base commonly used in the art. Specifically, it may be selected from the group consisting of ammonium hydroxide, alkali metal or alkaline earth metal hydroxide, alcoholate, acetate, fluoride, phosphate, carbonate, and hydrogen carbonate, and may also include trimethylamine, triethylamine, Tributylamine, N,N-dimethylaniline, N,N-dimethylbenzylamine, tertiary amines such as pyridine, alkylpyridines such as 2-methyl-5-ethylpyridine, N-methyl piperidine, N-methyl p. It may be selected from the group consisting of rolidone, N,N-dimethylaminopyridine, diazabicyclooctane (DABCO), diazabicyclononene (DBN), and diazabicycloundecene (DBU), and mixtures thereof, but is not limited thereto. no. It is preferred to use ammonium hydroxide.
본 발명에서 사용되는 양성자성 극성용매는 당 업계에서 사용되는 것이라면 특별히 제한되지 않으나, 상기 반응이 이루어지는 온도 조건이 80℃ 이상인 것을 고려하여, 끓는점이 80 내지 100℃인 것을 사용할 수 있으며, 바람직하게는 에탄올, 부탄올, 펜탄올, 에틸렌글리콜 등의 알코올성 용제 내지 물을 사용하는 것이 바람직하고, 보다 바람직하게는 물을 사용하는 것이 보다 바람직하다. 끓는 점이 100℃인 물을 용매로 사용할 경우, 상기 반응이 이루어지는 온도조건 하에서도 쉬이 증발하지 않고 남아있어 반응이 진행되는 동안 용매로서의 역할을 충분히 해낼 수 있는 이점이 있다.The protic polar solvent used in the present invention is not particularly limited as long as it is used in the art, but considering that the temperature condition in which the reaction occurs is 80°C or higher, one with a boiling point of 80 to 100°C can be used, preferably It is preferable to use an alcoholic solvent such as ethanol, butanol, pentanol, ethylene glycol, or water, and more preferably, it is more preferable to use water. When water with a boiling point of 100°C is used as a solvent, it has the advantage of remaining in the water without evaporating easily even under the temperature conditions under which the reaction takes place, thereby fully functioning as a solvent during the reaction.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범주 및 기술사상 범위 내에서 다양한 변경 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다. 이하의 실시예 및 비교예에서 함량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, preferred embodiments are presented to aid understanding of the present invention. However, the following examples are merely illustrative of the present invention, and it is clear to those skilled in the art that various changes and modifications are possible within the scope and spirit of the present invention. It is natural that such variations and modifications fall within the scope of the attached patent claims. In the following examples and comparative examples, “%” and “part” indicating content are based on weight, unless otherwise specified.
실시예Example 1 내지 1 to 2: 52: 5 -- 메틸테트라졸의of methyltetrazole 합성 synthesis
실시예 1.Example 1.
질소 분위기하에서, 100mL 3구 둥근 플라스크에 무수에탄올 58.4mL(1.0몰)를 투입하고, 5℃로 냉각한 뒤 아세틸클로라이드 35.6mL(0.5몰)를 천천히 적가하고 동일 온도에서 30분 간 교반시켜 혼합액을 제조한다. 상기 혼합액에 아세토니트릴 13.06mL(0.25몰)를 투입하고, 35℃에서 16시간 동안 교반한다. 그 후, 무수에탄올 14.59mL(0.25몰)를 추가 투입하고 혼합액의 온도를 -10℃ 내지 -15℃로 냉각시켜 에틸 아세트이미데이트를 합성한다. Under a nitrogen atmosphere, 58.4 mL (1.0 mol) of anhydrous ethanol was added to a 100 mL three-necked round flask, cooled to 5°C, and then 35.6 mL (0.5 mol) of acetyl chloride was slowly added dropwise and stirred at the same temperature for 30 minutes to form a mixed solution. manufacture. Add 13.06 mL (0.25 mole) of acetonitrile to the mixed solution and stir at 35°C for 16 hours. Afterwards, 14.59 mL (0.25 mol) of anhydrous ethanol is added and the temperature of the mixed solution is cooled to -10°C to -15°C to synthesize ethyl acetimidate.
상기 냉각된 에틸 아세트이미데이트에 하이드라진 모노하이드레이트 80% 15.65g을 천천히 적가하고, -10℃ 내지 -15℃ 온도에서 1 내지 2시간 동안 교반시킨 후 NaNO2 21.57g을 물 50mL에 녹인 수용액을 천천히 적가한다. 5℃ 이하에서 30분 간 교반시킨 후, 반응완결 여부를 고속 액체 크로마토그래피(HPLC)로 확인하고, 용액의 pH가 4.5 내지 5.5가 되도록 NaOH 수용액으로 조정하고 2시간 동안 환류시켜 혼합액을 제조한다. 상기 혼합액에서 진공으로 용매인 에탄올과 물을 모두 제거하고, 아세톤 100mL를 투입하여 30분 간 교반한 뒤 여과한다. 이 때, 생성된 여과액을 다시 진공으로 제거하여 5-메틸테트라졸 15.8g을 얻는다. 5-메틸테트라졸의 생성결과는 1H-NMR을 통해 확인하였다.15.65 g of hydrazine monohydrate 80% was slowly added dropwise to the cooled ethyl acetimidate, stirred at -10°C to -15°C for 1 to 2 hours, and then an aqueous solution of 21.57g of NaNO 2 dissolved in 50 mL of water was slowly added dropwise. do. After stirring for 30 minutes at 5°C or lower, completion of the reaction is confirmed by high-performance liquid chromatography (HPLC), and the pH of the solution is adjusted to 4.5 to 5.5 with an aqueous NaOH solution and refluxed for 2 hours to prepare a mixed solution. All of the solvents, ethanol and water, are removed from the mixed solution under vacuum, 100 mL of acetone is added, stirred for 30 minutes, and then filtered. At this time, the resulting filtrate is removed again under vacuum to obtain 15.8 g of 5-methyltetrazole. The production result of 5-methyltetrazole was confirmed through 1 H-NMR.
1H-NMR (δ) (Acetone-d6) ; 2.60(s, CH3), 10.3(NH) 1 H-NMR (δ) (Acetone-d 6 ) ; 2.60(s, CH 3 ), 10.3(NH)
실시예 2.Example 2.
질소 분위기하에서, 100mL 3구 둥근 플라스크에 무수에탄올 29.5mL(0.5몰)를 투입하고, 5℃로 냉각한 뒤 아세틸클로라이드 17.8mL(0.25몰)를 천천히 적가하고 동일 온도에서 30분간 교반시켜 혼합액을 제조한다. 상기 혼합액에 아세토니트릴 13.06mL(0.25몰)를 투입하고, 35℃에서 16시간 동안 교반하여 에틸 아세트이미데이트를 합성한다.Under a nitrogen atmosphere, add 29.5 mL (0.5 mol) of anhydrous ethanol to a 100 mL three-necked round flask, cool to 5°C, slowly add 17.8 mL (0.25 mol) of acetyl chloride dropwise, and stir at the same temperature for 30 minutes to prepare a mixed solution. do. Add 13.06 mL (0.25 mole) of acetonitrile to the mixed solution and stir at 35°C for 16 hours to synthesize ethyl acetimidate.
상기 에틸 아세트이미데이트를 5℃ 이하로 냉각시키고, NaN3 20.32g(0.25몰)을 물 35mL에 녹인 수용액을 천천히 적가한 후, 온도를 상온으로 올려 1시간 동안 교반하고 2시간 동안 환류한다. 반응완결 여부를 고속 액체 크로마토그래피(HPLC)로 확인하고, 용액의 pH가 4.5 내지 5.5가 되도록 NaOH 수용액으로 조정하고, 2시간 동안 환류시켜 혼합액을 제조한다. 상기 혼합액에서 진공으로 에탄올과 물을 모두 제거하고 아세톤 100mL를 투입하여 30분간 교반하고 여과한다. 이 때, 생성된 여과액을 다시 진공으로 제거하여 5-메틸테트라졸 14.3g을 얻는다. 5-메틸테트라졸의 생성결과는 1H-NMR을 통해 확인하였다.The ethyl acetimidate was cooled to 5°C or lower, and an aqueous solution of 20.32 g (0.25 mol) of NaN 3 dissolved in 35 mL of water was slowly added dropwise, the temperature was raised to room temperature, stirred for 1 hour, and refluxed for 2 hours. Completion of the reaction is confirmed by high-performance liquid chromatography (HPLC), the pH of the solution is adjusted to 4.5 to 5.5 with NaOH aqueous solution, and refluxed for 2 hours to prepare a mixed solution. All ethanol and water are removed from the mixed solution by vacuum, and 100 mL of acetone is added, stirred for 30 minutes, and filtered. At this time, the resulting filtrate is removed again under vacuum to obtain 14.3 g of 5-methyltetrazole. The production result of 5-methyltetrazole was confirmed through 1 H-NMR.
1H-NMR (δ) (Acetone-d6) ; 2.60(s, CH3), 10.3(NH) 1 H-NMR (δ) (Acetone-d 6 ) ; 2.60(s, CH 3 ), 10.3(NH)
Claims (8)
a2) 아지드화합물 및 산과 반응시킴으로써 반응 혼합물을 얻는 단계; 및
b) 상기 반응 혼합물과 염기를 반응시켜 하기 화학식 3의 5-알킬테트라졸을 얻는 단계를 포함하는, 5-알킬테트라졸의 제조방법.
[화학식 1]
(상기 화학식 1에서,
R1은 C1 내지 C4의 알킬기이고,
R2은 C1 내지 C5의 알킬기이다.)
[화학식 3]
(상기 화학식 3에서,
R1은 상기 화학식 1에서와 같다.)a) an alkyl imidate of the formula 1 below,
a2) obtaining a reaction mixture by reacting with an azide compound and an acid; and
b) A method for producing 5-alkyltetrazole, comprising the step of reacting the reaction mixture with a base to obtain 5-alkyltetrazole of the following formula (3).
[Formula 1]
(In Formula 1 above,
R 1 is a C1 to C4 alkyl group,
R 2 is an alkyl group of C1 to C5.)
[Formula 3]
(In Formula 3 above,
R 1 is the same as in Formula 1 above.)
상기 화학식 1의 알킬이미데이트는
ⅰ) C1 내지 C5의 알코올 및 산 촉매제를 혼합하여 혼합물을 형성하는 단계; 및
ⅱ) 상기 혼합물에 C1 내지 C4의 알킬니트릴을 반응시켜 상기 화학식 1의 알킬이미데이트를 얻는 단계;를 포함하여 제조되는 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to paragraph 1,
The alkyl imidate of Formula 1 is
i) mixing C1 to C5 alcohol and an acid catalyst to form a mixture; and
ii) reacting the mixture with a C1 to C4 alkylnitrile to obtain an alkylimidate of the formula (1).
상기 아지드화합물은 아지드화 알칼리금속염을 포함하는 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to paragraph 1,
A method for producing 5-alkyltetrazole, wherein the azide compound includes an alkali metal azide salt.
상기 5-알킬테트라졸의 제조방법은 반응용매로 양성자성 극성용매를 포함하는 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to paragraph 1,
The method for producing 5-alkyltetrazole is characterized in that it includes a protic polar solvent as a reaction solvent.
상기 양성자성 극성용매는 물인 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to clause 5,
A method for producing 5-alkyltetrazole, wherein the protic polar solvent is water.
상기 산은 염산을 포함하는 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to paragraph 1,
A method for producing 5-alkyltetrazole, wherein the acid contains hydrochloric acid.
상기 염기는 수산화 암모늄을 포함하는 것을 특징으로 하는 5-알킬테트라졸의 제조방법.According to paragraph 1,
A method for producing 5-alkyltetrazole, wherein the base contains ammonium hydroxide.
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