KR102602466B1 - Polyamic acid, polyimide formed thereof, and polyimide film - Google Patents
Polyamic acid, polyimide formed thereof, and polyimide film Download PDFInfo
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- KR102602466B1 KR102602466B1 KR1020210081045A KR20210081045A KR102602466B1 KR 102602466 B1 KR102602466 B1 KR 102602466B1 KR 1020210081045 A KR1020210081045 A KR 1020210081045A KR 20210081045 A KR20210081045 A KR 20210081045A KR 102602466 B1 KR102602466 B1 KR 102602466B1
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- polyamic acid
- polyimide
- formula
- polyimide film
- repeating unit
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 81
- 229920005575 poly(amic acid) Polymers 0.000 title claims abstract description 76
- 239000004642 Polyimide Substances 0.000 title claims abstract description 34
- 230000007423 decrease Effects 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 64
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 29
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 27
- 230000000052 comparative effect Effects 0.000 description 26
- 238000002360 preparation method Methods 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 18
- 238000003756 stirring Methods 0.000 description 17
- 239000012299 nitrogen atmosphere Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 14
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 12
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 10
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 9
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 9
- 229940018564 m-phenylenediamine Drugs 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 8
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- 239000012153 distilled water Substances 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000002411 thermogravimetry Methods 0.000 description 4
- YIWGJFPJRAEKMK-UHFFFAOYSA-N 1-(2H-benzotriazol-5-yl)-3-methyl-8-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carbonyl]-1,3,8-triazaspiro[4.5]decane-2,4-dione Chemical compound CN1C(=O)N(c2ccc3n[nH]nc3c2)C2(CCN(CC2)C(=O)c2cnc(NCc3cccc(OC(F)(F)F)c3)nc2)C1=O YIWGJFPJRAEKMK-UHFFFAOYSA-N 0.000 description 3
- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 3
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- -1 2-methylcyclohexyl acrylate ester Chemical class 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- KIJJAQMJSXOBIE-UHFFFAOYSA-N (2-methylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC1CCCCC1OC(=O)C(C)=C KIJJAQMJSXOBIE-UHFFFAOYSA-N 0.000 description 1
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- PHPRWKJDGHSJMI-UHFFFAOYSA-N 1-adamantyl prop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C=C)C3 PHPRWKJDGHSJMI-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- RXBOCDZLKBPILN-UHFFFAOYSA-N 2-propylheptyl prop-2-enoate Chemical compound CCCCCC(CCC)COC(=O)C=C RXBOCDZLKBPILN-UHFFFAOYSA-N 0.000 description 1
- LLQHSBBZNDXTIV-UHFFFAOYSA-N 6-[5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-4,5-dihydro-1,2-oxazol-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC1CC(=NO1)C1=CC2=C(NC(O2)=O)C=C1 LLQHSBBZNDXTIV-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- LSRGXLRLWFDKNR-UHFFFAOYSA-N FC(F)(F)[S] Chemical compound FC(F)(F)[S] LSRGXLRLWFDKNR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- DCTLJGWMHPGCOS-UHFFFAOYSA-N Osajin Chemical compound C1=2C=CC(C)(C)OC=2C(CC=C(C)C)=C(O)C(C2=O)=C1OC=C2C1=CC=C(O)C=C1 DCTLJGWMHPGCOS-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000011825 aerospace material Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 239000012973 diazabicyclooctane Substances 0.000 description 1
- AQNSVANSEBPSMK-UHFFFAOYSA-N dicyclopentenyl methacrylate Chemical compound C12CC=CC2C2CC(OC(=O)C(=C)C)C1C2.C12C=CCC2C2CC(OC(=O)C(=C)C)C1C2 AQNSVANSEBPSMK-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- FKIRSCKRJJUCNI-UHFFFAOYSA-N ethyl 7-bromo-1h-indole-2-carboxylate Chemical compound C1=CC(Br)=C2NC(C(=O)OCC)=CC2=C1 FKIRSCKRJJUCNI-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 235000019988 mead Nutrition 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- LUCXVPAZUDVVBT-UHFFFAOYSA-N methyl-[3-(2-methylphenoxy)-3-phenylpropyl]azanium;chloride Chemical compound Cl.C=1C=CC=CC=1C(CCNC)OC1=CC=CC=C1C LUCXVPAZUDVVBT-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
- C08G73/121—Preparatory processes from unsaturated precursors and polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
- C08G73/123—Unsaturated polyimide precursors the unsaturated precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
- C08G73/124—Unsaturated polyimide precursors the unsaturated precursors containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
본 발명은 하기 화학식 1로 표시되는 제1반복단위와, 하기 화학식 2로 표시되는 제2반복단위를 포함하는 폴리아믹산, 이로부터 형성된 폴리이미드 및 폴리이미드 필름이 제시된다.
[화학식 1]
[화학식 2]
화학식 1 및 화학식 2 중, m과 n, R1 내지 R4, Ar1 및 Ar2는 상세한 설명에서 정의된 바와 같다.The present invention provides a polyamic acid containing a first repeating unit represented by the following formula (1) and a second repeating unit represented by the following formula (2), and a polyimide and polyimide film formed therefrom.
[Formula 1]
[Formula 2]
In Formulas 1 and 2, m and n, R 1 to R 4 , Ar 1 and Ar 2 are as defined in the detailed description.
Description
본 발명은 폴리아믹산, 이로부터 형성된 폴리이미드 및 상기 폴리이미드를 포함하는 폴리이미드 필름에 관한 것으로, 더욱 상세하게는 내열성이 뛰어나면서도 저 유전율을 갖는 신규한 폴리아믹산, 이로부터 형성된 폴리이미드 및 폴리이미드 필름에 관한 것이다.The present invention relates to a polyamic acid, a polyimide formed therefrom, and a polyimide film containing the polyimide. More specifically, it relates to a novel polyamic acid having excellent heat resistance and low dielectric constant, a polyimide formed therefrom, and a polyimide film. It's about film.
폴리이미드는 주쇄에 이미드 결합을 포함하는 고분자로서 이미드의 화학적 안정성으로부터 유래하는 내열성, 내약품성을 가진다. 특히 방향족 폴리이미드는 그 강직한 주쇄 구조에 의해 뛰어난 기계적 물성과 전기 절연성 등에 우수한 특성으로 인해 일상 생활 용품뿐만 아니라, 자동차 소재, 우주항공 소재 등 고강도 고내열 용도로 사용되고 있다. 또한, 각종 전자 소재 분야에서 반도체 및 금속 배선의 층간 물질 등 반도체용 절연막에 널리 이용되며, 소자 집적도가 고도화 되면서 저유전 특성이 기대되고 있다.Polyimide is a polymer containing imide bonds in the main chain and has heat resistance and chemical resistance derived from the chemical stability of imide. In particular, aromatic polyimide is used for high-strength, high-heat resistance purposes such as automobile materials and aerospace materials as well as daily necessities due to its excellent mechanical properties and electrical insulation properties due to its rigid main chain structure. In addition, it is widely used in various electronic materials fields as an insulating film for semiconductors, such as interlayer materials for semiconductors and metal wiring, and as device integration becomes more advanced, low dielectric properties are expected.
특히, 광경화 가능한 폴리이미드는 반도체의 유기박막 트랜지스터에 전극의 패턴을 형성하는 포토리소그래피 공정에서 포토레지스트를 대체할 수 있어 공정을 단순화시킬 수 있다는 장점을 가진다. 폴리이미드가 절연 특성을 가지므로 반도체 등 전자소재 분야에서 광경화 가능한 폴리이미드 필름을 이용하여 층간물질로 널리 이용될 수 있다.In particular, photocurable polyimide has the advantage of being able to replace photoresist in the photolithography process of forming electrode patterns in semiconductor organic thin-film transistors, thereby simplifying the process. Since polyimide has insulating properties, it can be widely used as an interlayer material in the field of electronic materials such as semiconductors using photocurable polyimide films.
한편, 최근 무기 나노입자를 이용한 고분자 복합재료가 개발되고, 이들은 2 이하의 유전율을 나타내지만, 상기 고분자 복합재료는 화학적 안정성이 낮으며 제조 공정이 복잡한 단점을 가진다.Meanwhile, polymer composite materials using inorganic nanoparticles have recently been developed, and although they exhibit a dielectric constant of 2 or less, these polymer composite materials have the disadvantage of low chemical stability and a complicated manufacturing process.
이에 따라, 종래 기술들은 고도화된 집적 소자에 적용될 만큼 우수한 폴리이미드 필름을 제공하지 못하고 있으며, 종래 폴리이미드 필름 이상의 기계적 내구성, 내열성 및 제조 공정상에서의 용이성을 나타내면서도 유전율이 개선되어 반도체 기판 등에 이용할 수 있는 광경화성 폴리이미드 필름의 개발이 절실히 요구되고 있다. Accordingly, prior technologies do not provide polyimide films excellent enough to be applied to advanced integrated devices, and while exhibiting mechanical durability, heat resistance, and ease of manufacturing process compared to conventional polyimide films, the dielectric constant has been improved so that they can be used for semiconductor substrates, etc. There is an urgent need for the development of photocurable polyimide films.
일 측면에 따라 플루오린계 디아민을 이용하여 제조된 신규한 폴리아믹산을 제공하는 것이다.According to one aspect, a novel polyamic acid manufactured using fluorine-based diamine is provided.
다른 측면에 따라 상술한 폴리아믹산으로부터 형성된 폴리이미드를 제공하는 것이다.According to another aspect, there is provided a polyimide formed from the above-described polyamic acid.
또 다른 측면에 따라 상술한 폴리이미드를 함유하여 우수한 내열성, 저 유전율을 갖는 폴리이미드 필름을 제공하는 것이다.According to another aspect, there is provided a polyimide film containing the above-described polyimide and having excellent heat resistance and low dielectric constant.
한 측면에 따라 하기 화학식 1로 표시되는 제1반복단위와, 하기 화학식 2로 표시되는 제2반복단위를 포함하는 폴리아믹산이 제공된다.According to one aspect, a polyamic acid is provided including a first repeating unit represented by the following formula (1) and a second repeating unit represented by the following formula (2).
[화학식 1][Formula 1]
[화학식 2][Formula 2]
화학식 1및 화학식 2 중, m과 n은 몰분율로서 0<m<1, 0<n<1, m과 n의 합은 1이며,In Formula 1 and Formula 2, m and n are mole fractions, 0<m<1, 0<n<1, the sum of m and n is 1,
R1 내지 R4는 중합성 작용기이며, 서로 독립적으로 비닐기, 아크릴레이트기 및 메타크릴레이트기 중에서 선택된 하나 이상이며, R 1 to R 4 are polymerizable functional groups and are independently one or more selected from a vinyl group, an acrylate group, and a methacrylate group,
Ar1 및 Ar2는 서로 상이하게 선택되며, 하기 화학식 1-1 내지 1-3으로 이루어지는 그룹으로부터 선택되며, Ar 1 and Ar 2 are selected differently from each other and are selected from the group consisting of the following formulas 1-1 to 1-3,
[화학식 1-1] [화학식 1-2] [화학식 1-2] [Formula 1-1] [Formula 1-2] [Formula 1-2]
,, , ,
화학식 1-1 내지 1-3 중 *는 결합 위치를 나타내며,In Formulas 1-1 to 1-3, * represents the bonding position,
R5 및 R6은 서로 독립적으로 수소, C1 내지 C30의 알킬기 또는 트리플루오르메틸(CF3)기로 이루어지는 그룹으로부터 선택된다. R 5 and R 6 are independently selected from the group consisting of hydrogen, a C1 to C30 alkyl group, or a trifluoromethyl (CF 3 ) group.
다른 측면에 따라 상술한 폴리아믹산의 이미드화 반응 생성물인 폴리이미드가 제공된다.According to another aspect, polyimide, which is an imidization reaction product of the above-described polyamic acid, is provided.
또 다른 측면에 따라 상술한 폴리이미드를 함유한 폴리이미드 필름이 제공된다.According to another aspect, a polyimide film containing the above-described polyimide is provided.
본 발명의 폴리아믹산 및 이로부터 형성된 폴리이미드는 분자 내에 유연한 16주기 원소로 방향족이 연결되는 구조를 가지고, 그 결과 폴리아믹산 및 폴리이미드는 결정성이 낮아지며 분자 내 이방성이 감소하게 되어 유리 전이 온도가 높을 수 있으며 또한 복굴절률 또한 낮게 유지될 수 있다. 그 결과 폴리이미드 필름은 뛰어난 내열성 및 화학적/기계적 내구성을 구현한다.The polyamic acid of the present invention and the polyimide formed therefrom have a structure in which aromatics are linked to flexible 16-period elements within the molecule. As a result, the polyamic acid and polyimide have a lower crystallinity and anisotropy within the molecule is reduced, resulting in a glass transition temperature. It can be high and the birefringence can also be kept low. As a result, polyimide film realizes excellent heat resistance and chemical/mechanical durability.
이하, 본 발명의 폴리아믹산, 이로부터 형성된 폴리이미드 및 폴리이미드를 함유한 폴리이미드 필름에 대하여 보다 상세하게 설명하기로 한다.Hereinafter, the polyamic acid of the present invention, the polyimide formed therefrom, and the polyimide film containing the polyimide will be described in more detail.
하기 화학식 1로 표시되는 제1반복단위와, 하기 화학식 2로 표시되는 제2반복단위를 포함하는 폴리아믹산이 제공된다.A polyamic acid comprising a first repeating unit represented by the following formula (1) and a second repeating unit represented by the following formula (2) is provided.
[화학식 1][Formula 1]
[화학식 2][Formula 2]
화학식 1및 화학식 2 중, m과 n은 몰분율로서 0<m<1, 0<n<1, m과 n의 합은 1이며,In Formula 1 and Formula 2, m and n are mole fractions, 0<m<1, 0<n<1, the sum of m and n is 1,
R1 내지 R4는 중합성 작용기이며, 서로 독립적으로 비닐기, 아크릴레이트기 및 메타크릴레이트기 중에서 선택된 하나 이상이며, R 1 to R 4 are polymerizable functional groups and are independently one or more selected from a vinyl group, an acrylate group, and a methacrylate group,
Ar1 및 Ar2는 서로 상이하게 선택되며, 하기 화학식 1-1 내지 1-3으로 이루어지는 그룹으로부터 선택되며, Ar 1 and Ar 2 are selected differently from each other and are selected from the group consisting of the following formulas 1-1 to 1-3,
[화학식 1-1] [화학식 1-2] [화학식 1-2] [Formula 1-1] [Formula 1-2] [Formula 1-2]
,, , ,
화학식 1-1 내지 1-3 중 *는 결합 위치를 나타내며,In Formulas 1-1 to 1-3, * represents the bonding position,
R5 및 R6은 서로 독립적으로 수소, C1 내지 C30의 알킬기 또는 트리플루오르메틸(CF3)기로 이루어지는 그룹으로부터 선택된다. R 5 and R 6 are independently selected from the group consisting of hydrogen, a C1 to C30 alkyl group, or a trifluoromethyl (CF 3 ) group.
상기 폴리아믹산에서 m과 n은 각각 제1반복단와 제2반복단위의 몰분율을 나타내며, 0.1 내지 0.9, 0.3 내지 0.7, 또는 0.4 내지 0.6이다.In the polyamic acid, m and n represent the mole fraction of the first repeating unit and the second repeating unit, respectively, and are 0.1 to 0.9, 0.3 to 0.7, or 0.4 to 0.6.
상기 중합성 작용기는 -C(=O)O-CH2CH2OC(=O)C(=CH2)CH3, -C(=O)O-CH2OC(=O)C(=CH2)CH3, -C(=O)O-CH2CH2CH2OC(=O)C(=CH2)CH3, -C(=O)O-CH2CH2OC(=O)CH(=CH2), -C(=O)O-CH2OC(=O)CH(=CH2)CH3, 또는 -C(=O)O-CH2CH2CH2OC(=O)CH(=CH2)이다.The polymerizable functional group is -C(=O)O-CH 2 CH 2 OC(=O)C(=CH 2 )CH 3 , -C(=O)O-CH 2 OC(=O)C(=CH 2 )CH 3 , -C(=O)O-CH 2 CH 2 CH 2 OC(=O)C(=CH 2 )CH 3 , -C(=O)O-CH 2 CH 2 OC(=O) CH(=CH 2 ), -C(=O)O-CH 2 OC(=O)CH(=CH 2 )CH 3 , or -C(=O)O-CH 2 CH 2 CH 2 OC(=O )CH(=CH 2 ).
삭제delete
상기 폴리아믹산은 하기 화학식 1로 표시되는 다이안하이드라이드와 화학식 2a 내지 2c로 표시되는 디아민 중에서 선택된 하나 이상과 중합성 작용기 함유 화합물의 반응을 통하여 제조할 수 있다. The polyamic acid can be prepared through the reaction of a polymerizable functional group-containing compound with at least one selected from dianhydride represented by the following formula (1) and diamine represented by formulas (2a) to (2c).
[화학식 1] [Formula 1]
[화학식 2a] [화학식 2b] [화학식 2c][Formula 2a] [Formula 2b] [Formula 2c]
상기 화학식 2a 내지 2c에서 R5 또는 R6은 각각 독립적으로 수소, C1 내지 C30의 알킬기 또는 트리플루오르메틸(CF3)로 이루어지는 그룹으로부터 선택된다. In Formulas 2a to 2c, R 5 or R 6 is each independently selected from the group consisting of hydrogen, a C1 to C30 alkyl group, or trifluoromethyl (CF 3 ).
중합성 작용기 함유 화합물로는 하이드록시에틸 메타크릴레이트, 메틸메타크릴레이트, 에틸메타크릴레이트, n-부틸메타크릴레이트, 2-프로필헵틸아크릴레이트, sec-부틸메타크릴레이트, tert-부틸메타크릴레이트, 메틸아크릴레이트, 이소프로필아크릴레이트, 사이클로헥실메타크릴레이트, 2-메틸시클로헥실메타크릴레이트, 다이사이클로펜테닐아크릴레이트, 다이사이클로펜타닐아크릴레이트, 다이사이클로펜테닐메타크릴레이트, 다이사이클로펜타닐메타크릴레이트, 1-아다만틸 아크릴레이트, 1-아다만틸 메타크릴레이트, 다이사이클로펜타닐옥시에틸메타크릴레이트, 이소보로닐메타크릴레이트, 다이사이클로헥실아크릴레이트, 2-메틸시클로헥실아크릴레이트, 다이사이클로펜타닐옥시에틸아크릴레이트, 이소보로닐아크릴레이트, 페닐메타크릴레이트, 페닐아크릴레이트, 벤질아크릴레이트, 2-하이드록시에틸메타크릴레이트, 및 1,6-헥산다이올다이아크릴레이트 등을 이용한다.Compounds containing polymerizable functional groups include hydroxyethyl methacrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, 2-propylheptyl acrylate, sec-butyl methacrylate, and tert-butyl methacrylate. Latex, methyl acrylate, isopropyl acrylate, cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, dicyclopentenyl acrylate, dicyclopentanyl acrylate, dicyclopentenyl methacrylate, dicyclofentanyl Methacrylate, 1-adamantyl acrylate, 1-adamantyl methacrylate, dicyclofentanyloxyethyl methacrylate, isoboronyl methacrylate, dicyclohexyl acrylate, 2-methylcyclohexyl acrylate ester, dicyclofentanyloxyethyl acrylate, isoboronyl acrylate, phenyl methacrylate, phenyl acrylate, benzyl acrylate, 2-hydroxyethyl methacrylate, and 1,6-hexanedioldiacrylate. Use the back.
일 구현예에 따른 폴리아믹산은 벤젠고리 내에 산소(O), 황트리플루오로메틸(CF3) 등과 같이 전기 음성도가 강한 원소를 다수 포함하고, 이들은 분자 내 π전자들의 이동을 저하시킬 수 있어서 가시광선 영역의 빛을 흡수하는 것을 줄일 수 있다. 또한 폴리아믹산이트리플루오로메틸(CF3) 구조를 함유하는 경우,이 구조의 함유로 분자 반경이 큰 다수의 플루오르 원자를 가지므로, 고분자 주쇄 간의 상호 작용을 최소화하는 효과를 보여 높은 방향족 고리 밀도를 낮출 수 있다. 이에 따라, 트리플루오로메틸(CF3)기를 포함하는 디아민을 사용하여 제조된 중합체들 및 폴리이미드 필름은 낮은 굴절률 및 유전율을 보일 수 있다. 그리고 상기 디아민에 포함된 탄소-불소 결합은 결합 에너지가 높아 구조적으로 매우 안정하며, 화학적 안정성이 뛰어나다. 그리고 디아민의트리플루오로메틸(CF3) 구조는 분자 반경이 큰 다수의 플루오르 원자를 가지므로, 고분자 주쇄 간의 상호 작용을 최소화하는 효과를 보여 높은 방향족 고리 밀도를 낮출 수 있다. The polyamic acid according to one embodiment contains a large number of highly electronegative elements, such as oxygen (O) and trifluoromethyl sulfur (CF 3 ), in the benzene ring, and these can reduce the movement of π electrons within the molecule. It can reduce the absorption of light in the visible light range. In addition, when polyamic acid contains a ditrifluoromethyl (CF 3 ) structure, it has a large number of fluorine atoms with a large molecular radius due to the inclusion of this structure, which has the effect of minimizing interactions between the polymer main chains, resulting in a high aromatic ring density. can be lowered. Accordingly, polymers and polyimide films manufactured using diamine containing a trifluoromethyl (CF 3 ) group may exhibit low refractive index and dielectric constant. In addition, the carbon-fluorine bond contained in the diamine has a high bonding energy, so it is structurally very stable and has excellent chemical stability. And since the trifluoromethyl (CF 3 ) structure of diamine has a large number of fluorine atoms with a large molecular radius, it has the effect of minimizing interactions between the polymer main chains, thereby reducing the high aromatic ring density.
본 발명의 폴리아믹산의 중량평균분자량이 3,000 내지 30,000g/mol이고, 다분산 지수는 1.5 내지 2이다. 그리고 상기 폴리아믹산의중합도는 상술한 중량평균분자량을 얻을 수 있도록 제어되며, 예를 들어 1 내지 100, 구체적으로 1 내지 10의 정수의 범위로 제어된다.The polyamic acid of the present invention has a weight average molecular weight of 3,000 to 30,000 g/mol and a polydispersity index of 1.5 to 2. And the degree of polymerization of the polyamic acid is controlled to obtain the above-described weight average molecular weight, for example, in the range of 1 to 100, specifically 1 to 10.
폴리아믹산은하기 화학식으로 표시되는 고분자이다.Polyamic acid is a polymer represented by the following chemical formula.
[화학식 5-1] [Formula 5-1]
상기 화학식 5-1에서 R1 내지 R4는 중합 가능한 작용기로서, 예를 들어, 탄소수 1 내지 10의 치환되거나 치환되지 않은 비닐기, 아크릴레이트기, 메타아크릴레이트기 등으로부터 선택될 수 있다. Ar1 및 Ar2, m 및 n은 상술한 바와 같다.In Formula 5-1, R 1 to R 4 are polymerizable functional groups, and may be selected from, for example, a substituted or unsubstituted vinyl group having 1 to 10 carbon atoms, an acrylate group, or a methacrylate group. Ar1 and Ar2, m and n are as described above.
상기 화학식 5-1에서 m:n은 9:1 내지 1:9 몰비이며, 9:1 내지 5:5 또는 7:3 내지 5:5몰비이다. 상기 화학식 5-1의 폴리아믹산의 중합도는 1 내지 100, 예를 들어 1 내지 10이다.In Formula 5-1, m:n is a molar ratio of 9:1 to 1:9, 9:1 to 5:5, or 7:3 to 5:5. The degree of polymerization of the polyamic acid of Formula 5-1 is 1 to 100, for example, 1 to 10.
상기 폴리아믹산에서 제1반복단위는 하기 화학식 3으로 표시되는 반복단위 또는 화학식 4로 표시되는 제1반복단위를 포함하며, 제2반복단위는 하기 화학식 5로 표시되는 제2반복단위이다.In the polyamic acid, the first repeating unit includes a repeating unit represented by the following formula (3) or a first repeating unit represented by the formula (4), and the second repeating unit is a second repeating unit represented by the following formula (5).
<화학식 3><Formula 3>
<화학식 4><Formula 4>
<화학식 5><Formula 5>
상기 화학식 3 내지 5에서 m과 n은 몰분율로서 0<m<1, 0<n<1이다.In Formulas 3 to 5, m and n are mole fractions of 0<m<1 and 0<n<1.
상기 화학식 3 내지 5에서 제1반복단위와 제2반복단위의 혼합몰비는 9:1 내지 1:9이며, 9:1 내지 5:5 또는 7:3 내지 5:5이다. 상기 화학식 3 내지 5에서 폴리아믹산의 중합도는 1 내지 100, 예를 들어 1 내지 10이다.In Formulas 3 to 5, the mixing molar ratio of the first repeating unit and the second repeating unit is 9:1 to 1:9, 9:1 to 5:5, or 7:3 to 5:5. In Formulas 3 to 5, the degree of polymerization of the polyamic acid is 1 to 100, for example, 1 to 10.
상기 폴리아믹산은 구체적인 예를 들어 상기 화학식 3으로 표시되는 반복단위와 상기 화학식 5로 표시되는 반복단위를 포함하는 고분자이다.For example, the polyamic acid is a polymer containing a repeating unit represented by Formula 3 and a repeating unit represented by Formula 5.
폴리아믹산은 예를 들어 하기 화학식 5-2로 표시되는 고분자이다.Polyamic acid is a polymer represented, for example, by the following formula 5-2.
[화학식 5-2][Formula 5-2]
상기 화학식 5-2에서 m:n은 9:1 내지 1:9 몰비이며, 9:1 내지 5:5 또는 7:3 내지 5:5몰비이다. In Formula 5-2, m:n is a molar ratio of 9:1 to 1:9, 9:1 to 5:5, or 7:3 to 5:5.
상기 화학식 5-2의 폴리아믹산의 중합도는 1 내지 100, 예를 들어 1 내지 10이다.The degree of polymerization of the polyamic acid of Formula 5-2 is 1 to 100, for example, 1 to 10.
다른 측면에 따라 상술한 폴리아믹산을 이미드화하여 제조된 폴리이미드가 제공된다. 폴리이미드는 폴리아믹산의 이미드화 반응 생성물이다.According to another aspect, a polyimide prepared by imidizing the above-described polyamic acid is provided. Polyimide is an imidization reaction product of polyamic acid.
예시적인 구현예에서, 상기 폴리이미드는 하기 화학식 6으로 표시되는 제1반복단위와 하기 화학식 7로 표시되는 제2반복단위를 포함한다.In an exemplary embodiment, the polyimide includes a first repeating unit represented by Formula 6 below and a second repeating unit represented by Formula 7 below.
[화학식 6][Formula 6]
[화학식7][Formula 7]
화학식 6 및 화학식 7 중, m과 n은 몰분율로서 m과 n의 합은 1이고, 0<m<1, 0<n<1, Ar1 및 Ar2는 서로 상이하게 선택되며, 하기 화학식 1-1 내지 1-3으로 이루어지는 그룹으로부터 선택되며, In Formulas 6 and 7, m and n are mole fractions, and the sum of m and n is 1, 0<m<1, 0<n<1, Ar 1 and Ar 2 are selected differently from each other, and the formula 1- is selected from the group consisting of 1 to 1-3,
[화학식 1-1] [화학식 1-2] [화학식 1-3][Formula 1-1] [Formula 1-2] [Formula 1-3]
,, , ,
화학식 1-1 내지 1-3 중 *는 결합 위치를 나타내며, R5 및 R6은 서로 독립적으로 수소, C1 내지 C30의 알킬기 또는 트리플루오르메틸(CF3)로 이루어지는 그룹으로부터 선택된다. In Formulas 1-1 to 1-3, * represents a bonding position, and R 5 and R 6 are independently selected from the group consisting of hydrogen, a C1 to C30 alkyl group, or trifluoromethyl (CF 3 ).
상기 화학식 6 및 7에서 m:n은 9:1 내지 1:9 몰비이며, 9:1 내지 5:5 또는 7:3 내지 5:5 몰비이다. 상기 화학식 6 및 7의 폴리이미드의 중합도는 1 내지 100, 예를 들어 1 내지 10이다.In Formulas 6 and 7, m:n is a molar ratio of 9:1 to 1:9, 9:1 to 5:5, or 7:3 to 5:5. The degree of polymerization of the polyimides of Formulas 6 and 7 is 1 to 100, for example, 1 to 10.
상기 폴리이미드는 예를 들어 하기 화학식 9로 표시되는 제1반복단위와 하기 화학식 10으로 표시되는 제2반복단위를 포함한다.For example, the polyimide includes a first repeating unit represented by the following formula (9) and a second repeating unit represented by the following formula (10).
<화학식9><Formula 9>
화학식 9 중, m은0.1 내지 0.9이고,In Formula 9, m is 0.1 to 0.9,
<화학식10><Formula 10>
화학식 10 중, n은 0.1 내지 0.9이다.In Formula 10, n is 0.1 to 0.9.
상기 화학식 9 및 10에서 m:n은 9:1 내지 1:9 몰비이며, 9:1 내지 5:5 또는 7:3 내지 5:5 몰비이다.In Formulas 9 and 10, m:n is a molar ratio of 9:1 to 1:9, 9:1 to 5:5, or 7:3 to 5:5.
상기 화학식 9 및 10의 폴리이미드의 중합도는 1 내지 100, 예를 들어 1 내지 10이다.The degree of polymerization of the polyimides of Formulas 9 and 10 is 1 to 100, for example, 1 to 10.
또 다른 측면에 따라 상술한 폴리이미드를 함유한 폴리이미드 필름이 제공된다. 상기 폴리이미드 필름은 유리, 실리콘 웨이퍼 등의 기판에 캐스팅하여 제조할 수 있다.According to another aspect, a polyimide film containing the above-described polyimide is provided. The polyimide film can be manufactured by casting on a substrate such as glass or silicon wafer.
상기 코팅 방법으로서는 당업계에서 통용되는 스핀 코팅법, 닥터 블레이드법, 플로우코팅법, 스프레이 코팅법 등이 선택되어 이용될 수 있고, 상기 폴리아믹산을 코팅하여 폴리이미드 필름을 제조할 수 있는 공정이라면 자유롭게 선택될 수 있으며, 본 발명은 이러한 캐스팅 방법에 의해서 한정되지 않는다.As the coating method, spin coating method, doctor blade method, flow coating method, spray coating method, etc. commonly used in the industry can be selected and used, and any process that can produce a polyimide film by coating the polyamic acid can be freely used. may be selected, and the present invention is not limited by this casting method.
본 발명의 폴리이미드 필름은 우수한 내열성 및 화학적, 기계적 내구성을 가질 수 있다.폴리이미드 필름은 상온에서의 상기 폴리이미드 필름의 총 중량에 비하여 약 410℃ 내지 500℃ 사이의 온도에서 상기 폴리이미드 필름의 총 중량이 90%로 감소할 수 있다. 그리고 본 발명의 폴리이미드 필름은 낮은 굴절률과 유전율을 보일 수 있다.The polyimide film of the present invention can have excellent heat resistance and chemical and mechanical durability. The polyimide film has a temperature of about 410°C to 500°C compared to the total weight of the polyimide film at room temperature. Total weight can be reduced by 90%. And the polyimide film of the present invention can exhibit low refractive index and dielectric constant.
상기 폴리이미드 필름은 약 1.62 내지 1.66 사이의 굴절률을 보일 수 있다.The polyimide film may exhibit a refractive index between about 1.62 and 1.66.
또한, 본 발명의 일 구현예에 따라서, 상기 다이안하이드라이드와 디아민 단량체는 분자 내에 분자 내에 유연한 16주기 원소로 방향족이 연결되는 구조를 가지고, 이로 인해 이를 이용해 제조된 중합체들 및 폴리이미드 필름은 결정성이 감소하며 분자 내 이방성이 감소하게 되어 유리 전이 온도가 높을 수 있다.In addition, according to one embodiment of the present invention, the dianhydride and diamine monomers have a structure in which aromatics are linked to a flexible 16-period element within the molecule, and as a result, polymers and polyimide films prepared using them have crystals. As the property decreases, the anisotropy within the molecule decreases, so the glass transition temperature may be high.
이하, 실시예를 통하여 본 발명을 더욱 상세히 설명하고자 한다. 이들 실시예는 오로지 본 발명을 예시하기 위한 것으로, 본 발명의 범위가 이들 실시예들에 의해 제한되는 것으로 해석되지 않는 것은 당업계에서 통상의 지식을 가진 자에 있어서 자명할 것이다.Hereinafter, the present invention will be described in more detail through examples. These examples are only for illustrating the present invention, and it will be obvious to those skilled in the art that the scope of the present invention should not be construed as limited by these examples.
(폴리아믹산의 제조)(Manufacture of polyamic acid)
비교제조예 1Comparative Manufacturing Example 1
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45 oC에서 1시간 동안 교반을 진행하였다. 반응기를 25 oC로 냉각시킨 후, m-톨리딘1.8 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45 oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45 oC에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다. In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45 o C under a nitrogen atmosphere. After cooling the reactor to 25 o C, 1.8 g of m-tolidine and 5 g of N-methyl-2-pyrrolidone (NMP) were added and stirred at 45 o C for 2 hours and 30 minutes under a nitrogen atmosphere. Cooled to o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45 o C for 20 hours to form a polyamic acid solution. was manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid.
비교제조예 2Comparative Manufacturing Example 2
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45 oC에서 1시간 동안 교반을 진행하였다. 반응기를 25 oC로 냉각시킨 후, m-톨리딘1.62 g, m-페닐렌디아민(m-PDA) 0.09 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45 oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45 oC에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다.In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45 o C under a nitrogen atmosphere. After cooling the reactor to 25 o C, 1.62 g of m-tolidine, 0.09 g of m-phenylenediamine (m-PDA), and 5 g of N-methyl-2-pyrrolidone (NMP) were added and stirred under nitrogen atmosphere. After stirring at 45 o C for 2 hours and 30 minutes, it was cooled to 25 o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45 o C for 20 hours to form a polyamic acid solution. was manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid.
비교제조예 3Comparative Manufacturing Example 3
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45 oC에서 1시간 동안 교반을 진행하였다. 반응기를 25 oC로 냉각시킨 후, m-톨리딘1.26 g, m-페닐렌디아민(m-PDA) 0.28 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45 oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45 oC에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다.In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45 o C under a nitrogen atmosphere. After cooling the reactor to 25 o C, 1.26 g of m-tolidine, 0.28 g of m-phenylenediamine (m-PDA), and 5 g of N-methyl-2-pyrrolidone (NMP) were added and stirred under nitrogen atmosphere. After stirring at 45 o C for 2 hours and 30 minutes, it was cooled to 25 o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45 o C for 20 hours to form a polyamic acid solution. was manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid.
비교제조예 4Comparative Manufacturing Example 4
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45oC에서 1시간 동안 교반을 진행하였다. 반응기를 25 oC로 냉각시킨 후, m-톨리딘 0.9 g, m-페닐렌디아민(m-PDA) 0.46 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45℃에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다.In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45 o C under a nitrogen atmosphere. After cooling the reactor to 25 o C, 0.9 g of m-tolidine, 0.46 g of m-phenylenediamine (m-PDA), and 5 g of N-methyl-2-pyrrolidone (NMP) were added and reacted under nitrogen atmosphere. After stirring at 45 o C for 2 hours and 30 minutes, it was cooled to 25 o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45°C for 20 hours to prepare a polyamic acid solution. Manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid.
제조예 1Manufacturing Example 1
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 2-하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45℃에서 1시간 동안 교반을 진행하였다. In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of 2-hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane ( After adding 0.23 g of DABCO) and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45°C under a nitrogen atmosphere.
반응기를 25 oC로 냉각시킨 후, m-톨리딘1.62 g, 2,2'-비스(트리플루오로메틸)벤지딘(TFMB) 0.27 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45 oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45 oC에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다.After cooling the reactor to 25 o C, 1.62 g of m-tolidine, 0.27 g of 2,2'-bis(trifluoromethyl)benzidine (TFMB), 5 g of N-methyl-2-pyrrolidone (NMP) was added and stirred at 45 o C for 2 hours and 30 minutes under a nitrogen atmosphere, and then cooled to 25 o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45 o C for 20 hours to form a polyamic acid solution. was manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid.
상기 폴리아믹산은 하기 화학식 5-2로 표시되는 고분자이고 폴리아믹산의 중량평균분자량은 약 10,500이다.The polyamic acid is a polymer represented by the following Chemical Formula 5-2, and the weight average molecular weight of the polyamic acid is about 10,500.
[화학식 5-2][Formula 5-2]
상기 화학식 5-2에서 m과 n은 0.9 및 0.1이다.In Formula 5-2, m and n are 0.9 and 0.1.
제조예 2Production example 2
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45℃에서 1시간 동안 교반을 진행하였다. 반응기를 25℃로 냉각시킨 후, m-톨리딘1.26 g, 2,2'-비스(트리플루오로메틸)벤지딘(TFMB) 0.81 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45 oC에서 2시간 30분 동안 교반한 후 25 oC까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45℃에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다. 이 폴리아믹산은 제조예 1의 폴리아믹산과 비교하여 화학식 5-2로 표시되는 고분자이며 m과 n이 0.7 내지 0.3이다.In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed at 45°C for 1 hour under a nitrogen atmosphere. After cooling the reactor to 25°C, 1.26 g of m-tolidine, 0.81 g of 2,2'-bis(trifluoromethyl)benzidine (TFMB), and 5 g of N-methyl-2-pyrrolidone (NMP) were added. Added and stirred at 45 o C for 2 hours and 30 minutes under a nitrogen atmosphere, then cooled to 25 o C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45°C for 20 hours to prepare a polyamic acid solution. Manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid. Compared to the polyamic acid of Preparation Example 1, this polyamic acid is a polymer represented by Chemical Formula 5-2, and m and n are 0.7 to 0.3.
상기 폴리아믹산은 하기 화학식 5-2로 표시되는 고분자이고 폴리아믹산의 중량평균분자량은 약 8,800이다.The polyamic acid is a polymer represented by the following Chemical Formula 5-2, and the weight average molecular weight of the polyamic acid is about 8,800.
[화학식 5-2][Formula 5-2]
상기 화학식 5-2에서 m과 n은 0.7 및 0.3이다.In Formula 5-2, m and n are 0.7 and 0.3.
제조예 3Production example 3
100ml 둥근 플라스크에 4,4'-옥시디프탈릭 안하이드라이드(ODPA) 3.1 g, 하이드록시에틸 메타크릴레이트(HEMA) 0.243 ml, 1,4-다이아자바이사이클로[2.2.2]옥테인(DABCO) 0.23 g, N-메틸-2-피롤리돈(NMP) 12.5 g을 첨가한 후, 질소 분위기 하에 45 oC에서 1시간 동안 교반을 진행하였다. 반응기를 25 oC로 냉각시킨 후, m-톨리딘0.9 g, 2,2'-비스(트리플루오로메틸)벤지딘(TFMB) 1.36 g, N-메틸-2-피롤리돈(NMP) 5 g을 첨가하고 질소 분위기 하에 45℃에서 2시간 30분 동안 교반한 후 25℃까지 냉각하였다. 이 용액에 트리플루오로아세틱 안하이드라이드 2.6 ml를 첨가한 후, 20분 교반한 뒤, 하이드록시에틸 메타크릴레이트(HEMA) 2.48 ml를 첨가하여 45 oC에서 20시간 동안 반응하여 폴리아믹산 용액을 제조하였다. 이 반응 용액을 증류수에 적하한 뒤 침전물을 건조함으로써 고형화된 밝은 노란색 고체인 폴리아믹산을 수득하였다. 이 폴리아믹산은 제조예 1의 폴리아믹산과 비교하여 화학식 5-2로 표시되는 고분자이며 m과 n이 각각 0.5 및 0.5이다.In a 100ml round flask, 3.1 g of 4,4'-oxydiphthalic anhydride (ODPA), 0.243 ml of hydroxyethyl methacrylate (HEMA), and 1,4-diazabicyclo[2.2.2]octane (DABCO). After adding 0.23 g and 12.5 g of N-methyl-2-pyrrolidone (NMP), stirring was performed for 1 hour at 45 o C under a nitrogen atmosphere. After cooling the reactor to 25 o C, 0.9 g of m-tolidine, 1.36 g of 2,2'-bis(trifluoromethyl)benzidine (TFMB), and 5 g of N-methyl-2-pyrrolidone (NMP) were added. was added and stirred at 45°C for 2 hours and 30 minutes under a nitrogen atmosphere, and then cooled to 25°C. After adding 2.6 ml of trifluoroacetic anhydride to this solution and stirring for 20 minutes, 2.48 ml of hydroxyethyl methacrylate (HEMA) was added and reacted at 45 o C for 20 hours to form a polyamic acid solution. was manufactured. This reaction solution was added dropwise to distilled water and the precipitate was dried to obtain solidified polyamic acid as a bright yellow solid. Compared to the polyamic acid of Preparation Example 1, this polyamic acid is a polymer represented by Chemical Formula 5-2, and m and n are 0.5 and 0.5, respectively.
상기 폴리아믹산은 하기 화학식 5-2로 표시되는 고분자이고 폴리아믹산의 중량평균분자량은 약 9,100이다.The polyamic acid is a polymer represented by the following Chemical Formula 5-2, and the weight average molecular weight of the polyamic acid is about 9,100.
[화학식 5-2][Formula 5-2]
상기 화학식 5-2에서 m과 n은 0.5 및 0.5이다.In Formula 5-2, m and n are 0.5 and 0.5.
(폴리이미드 및 폴리이미드 필름의 제조)(Manufacture of polyimide and polyimide film)
실시예 1Example 1
N-메틸-2-피롤리돈(NMP)에 상기 제조예 1의 폴리아믹산을 고형분 함량 30 wt%로 용해시킨 용액을 실리콘 기판 위에 스핀 코팅한 후, 90℃에서 2시간, 375℃에서 1시간 동안 열처리하여 폴리이미드를 함유한 폴리이미드 필름을 제조하였다.A solution of the polyamic acid of Preparation Example 1 with a solid content of 30 wt% dissolved in N-methyl-2-pyrrolidone (NMP) was spin-coated on a silicon substrate, followed by 2 hours at 90°C and 1 hour at 375°C. A polyimide film containing polyimide was prepared by heat treatment for a while.
실시예 2-3Example 2-3
제조예 1의 폴리아믹산 대신 제조예 2의 폴리아믹산 및 제조예 3의 폴리아믹산을 각각 이용한 것을 제외하고는, 실시예 1과 동일하게 실시하여 폴리이미드를 함유한 폴리이미드 필름을 제조하였다.A polyimide film containing polyimide was manufactured in the same manner as in Example 1, except that the polyamic acid of Preparation Example 2 and the polyamic acid of Preparation Example 3 were used instead of the polyamic acid of Preparation Example 1.
실시예 4Example 4
N-메틸-2-피롤리돈(NMP)에 상기 제조예 1의 폴리아믹산을 고형분 함량 30 wt%로 용해시키고, 광개시제인(1-페닐-1,2-프로판다이온-2-(O-에톡시카복시)옥심) 및 가교제인 테트라에틸렌글리콜 디메타크릴레이트를 첨가한 용액을 실리콘 기판 위에 스핀 코팅한 후, 95℃에서 2분, 110oC에서 2분 동안 열처리하여 자외선 경화를 실시하여 폴리이미드 및 폴리이미드 함유 폴리이미드 필름을 얻을 수 있다.The polyamic acid of Preparation Example 1 was dissolved in N-methyl-2-pyrrolidone (NMP) at a solid content of 30 wt%, and the photoinitiator (1-phenyl-1,2-propanedione-2-( O - A solution containing ethoxycarboxy)oxime) and tetraethylene glycol dimethacrylate, a crosslinking agent, was spin-coated on a silicon substrate, followed by heat treatment at 95°C for 2 minutes and ultraviolet curing at 110 ° C for 2 minutes to produce polyethylene glycol. A polyimide film containing mead and polyimide can be obtained.
실시예 5-6Example 5-6
제조예 1의폴리아믹산 대신 제조예 2의 폴리아믹산 및 제조예 3의 폴리아믹산을 각각 이용한 것을 제외하고는, 실시예 4와 동일하게 실시하여 폴리이미드를 함유한 폴리이미드 필름을 제조하였다.A polyimide film containing polyimide was manufactured in the same manner as in Example 4, except that the polyamic acid of Preparation Example 2 and the polyamic acid of Preparation Example 3 were used instead of the polyamic acid of Preparation Example 1.
비교예 1-4Comparative Example 1-4
제조예 1의 폴리아믹산 대신 비교제조예 1 내지 4의 폴리아믹산을 각각 이용한 것을 제외하고는,실시예 1과 동일하게 실시하여 폴리이미드를 함유한 폴리이미드 필름을 제조하였다.A polyimide film containing polyimide was manufactured in the same manner as in Example 1, except that the polyamic acids of Comparative Preparation Examples 1 to 4 were used instead of the polyamic acid of Preparation Example 1.
비교예 5-8Comparative Example 5-8
제조예 1의 폴리아믹산 대신 비교제조예 1 내지 4의 폴리아믹산을 각각 이용한 것을 제외하고는,실시예 4와 동일하게 실시하여 폴리이미드를 함유한 폴리이미드 필름을 제조하였다.A polyimide film containing polyimide was manufactured in the same manner as in Example 4, except that the polyamic acids of Comparative Preparation Examples 1 to 4 were used instead of the polyamic acid of Preparation Example 1.
평가예 1: 겔 투과 크로마토그래피(Gel permeation chromatography, GPC) 분석Evaluation Example 1: Gel permeation chromatography (GPC) analysis
겔 투과 크로마토그래피(Gel permeation chromatography, GPC)법을 사용하여, 본 발명의 제조예 1 내지 3 및 비교제조예 1 내지 4에 따라 제조된 폴리아믹산의중량평균 분자량 및 수평균 분자량, 다분산 지수를 구했다. 4 mg의 폴리아믹산에 대하여 용제 디메틸포름아미드(DMF) 1 ml의 용액을 사용하여 측정하였으며, 분석 결과를 표 1에 나타내었다.Using gel permeation chromatography (GPC), the weight average molecular weight, number average molecular weight, and polydispersity index of the polyamic acid prepared according to Preparation Examples 1 to 3 and Comparative Preparation Examples 1 to 4 of the present invention were measured. Saved. 4 mg of polyamic acid was measured using 1 ml of solvent dimethylformamide (DMF) solution, and the analysis results are shown in Table 1.
상기 제조예 1 내지 3에 따른 폴리아믹산의 중량평균분자량은 약 5,000 내지 11,000 g/mol, 수평균 분자량은 약 3,000 내지 6,000 g/mol, 다분산 지수는 1.5 내지 2를 나타냄을 확인하였다.It was confirmed that the polyamic acid according to Preparation Examples 1 to 3 had a weight average molecular weight of about 5,000 to 11,000 g/mol, a number average molecular weight of about 3,000 to 6,000 g/mol, and a polydispersity index of 1.5 to 2.
평가예 2: 폴리이미드 필름의 굴절률, 복굴절률 및 유전율Evaluation Example 2: Refractive index, birefringence and dielectric constant of polyimide film
프리즘 커플러를 이용하여 실시예 1 내지 3 및 비교예 1 내지 4에 따른 실리콘 기판에 코팅된 폴리이미드 필름의 굴절률을 분석하였다. 또한, 637 nm 파장에서의 평균 굴절률을 이용하여 폴리이미드 필름의 유전율을 계산하였으며, 그 결과를 표 2에 기재하였다.The refractive index of the polyimide film coated on the silicon substrate according to Examples 1 to 3 and Comparative Examples 1 to 4 was analyzed using a prism coupler. In addition, the dielectric constant of the polyimide film was calculated using the average refractive index at a wavelength of 637 nm, and the results are listed in Table 2.
상기 표 2에 나타난 바와 같이, 실시예 1 내지 3에 따른 폴리아믹산을 이용하여 제조된 폴리이미드 필름은 트리플루오로메틸(CF3)을 포함하며 트리플루오로메틸(CF3)을 포함하는 디아민의 함량이 증가함에 따라 그렇지 않은 경우(비교예 1 내지 4)와 비교하여 낮은 굴절률, 복굴절율 및 유전율을 갖는다는 것을 확인할 수 있었다. As shown in Table 2, the polyimide film manufactured using the polyamic acid according to Examples 1 to 3 contains trifluoromethyl (CF 3 ) and diamine containing trifluoromethyl (CF 3 ). It was confirmed that as the content increased, it had a lower refractive index, birefringence, and dielectric constant compared to the other cases (Comparative Examples 1 to 4).
또한 실시예 4-6 및 비교예 5-8에 따라 제조된 폴리이미드 필름의 굴절률, 복굴절률 및 유전율을 상기 실시예 1의 폴리이미드의 굴절률, 복굴절률 및 유전율 평가방법과 동일하게 실시하였다.In addition, the refractive index, birefringence, and dielectric constant of the polyimide films prepared in Examples 4-6 and Comparative Examples 5-8 were evaluated in the same manner as the refractive index, birefringence, and dielectric constant evaluation methods of the polyimide in Example 1.
상술한 평가 결과, 실시예 4-6 및 비교예 8에 따라 제조된 폴리이미드 필름의 굴절률, 복굴절률 및 유전율은 실시예 1의 폴리이미드 필름의 굴절률, 복굴절률 및 유전율과 동등한 수준을 나타냈다. As a result of the above-mentioned evaluation, the refractive index, birefringence, and dielectric constant of the polyimide film prepared according to Examples 4-6 and Comparative Example 8 were at the same level as those of the polyimide film of Example 1.
평가예 3: 폴리이미드 필름의 DSC및 TGA 분석Evaluation Example 3: DSC and TGA analysis of polyimide film
제조예 1 내지 3 및 비교제조예 1 내지 4에 따른 폴리아믹산 용액을 이용하여 제조된 총 8개의 폴리이미드 필름에 대하여 DSC 분석을 통해 유리전이온도를 확인하였으며, TGA 분석을 통해 내열성을 측정하였고 그 결과를 하기 표 3에 기재하였다. 또한, DSC 분석 결과를 도 1에 나타내었으며, TGA 분석 결과를 하기 표 1에 나타내었다.The glass transition temperature was confirmed through DSC analysis for a total of eight polyimide films manufactured using the polyamic acid solutions according to Preparation Examples 1 to 3 and Comparative Preparation Examples 1 to 4, and heat resistance was measured through TGA analysis. The results are shown in Table 3 below. Additionally, the DSC analysis results are shown in Figure 1, and the TGA analysis results are shown in Table 1 below.
DSC 분석은 TA Instruments사의 Q20을 이용하였고, 이는 질소 분위기 하에서 분당 5의 승온 속도로 측정하였으며 상온에서부터 300oC까지 열을 가하며 확인하였다. 그리고 TGA 분석은 TA Instruments사의 Q50을 이용하였고 질소 분위기 하에서 분당 10의 승온 속도로 측정하였으며 상온에서부터 800℃까지 열을 가하며 확인하였다.DSC analysis was performed using TA Instruments' Q20, which was measured at a temperature increase rate of 5 per minute under a nitrogen atmosphere and confirmed by heating from room temperature to 300 o C. And TGA analysis was performed using TA Instruments' Q50, measured at a temperature increase rate of 10 per minute under a nitrogen atmosphere, and confirmed by heating from room temperature to 800°C.
상기 표 3에서 10% 중량 감소온도를 나타내며, 필름의 총 중량이 상온에서의 상기 필름 혹은 화합물의 총 중량의 90%로 감소 할 때의 온도를 의미한다. 즉, 상온에서의 총 중량에 비해 중량이 10% 감소 할 때의 온도를 의미한다.In Table 3 above, the 10% weight reduction temperature is indicated, meaning the temperature when the total weight of the film is reduced to 90% of the total weight of the film or compound at room temperature. In other words, it means the temperature when the weight decreases by 10% compared to the total weight at room temperature.
상기 표 3에 나타낸 것과 같이, 실시예 1 내지 3에 따른 폴리아믹산 용액을 이용하여 제조된 폴리이미드 필름은 모두 400oC 이상의 온도에서 10%의 중량이 감소하여 내열성이 우수함을 확인할 수 있었다.As shown in Table 3, the polyimide films manufactured using the polyamic acid solutions according to Examples 1 to 3 all lost 10% of their weight at a temperature of 400 o C or higher, confirming that they had excellent heat resistance.
앞에서 설명된 본 발명의 실시예는 본 발명의 기술적 사상을 한정하는 것으로 해석되어서는 안 된다. 본 발명의 보호범위는 청구범위에 기재된 사항에 의하여만 제한되고, 본 발명의 기술 분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상을 다양한 형태로 개량 변경하는 것이 가능하다. 따라서, 이러한 개량 및 변경은 통상의 지식을 가진 자에게 자명한 것인 한 본 발명의 보호범위에 속하게 될 것이다.The embodiments of the present invention described above should not be construed as limiting the technical idea of the present invention. The scope of protection of the present invention is limited only by the matters stated in the claims, and those skilled in the art can improve and change the technical idea of the present invention into various forms. Accordingly, such improvements and changes will fall within the scope of protection of the present invention as long as they are obvious to those skilled in the art.
Claims (13)
[화학식 5-2]
상기 화학식 5-2에서 m은 0.5 내지 0.9이고, n은 0.1 내지 0.5이다.A polyamic acid represented by the following formula 5-2, having a weight average molecular weight of 3,000 to 30,000 g/mol, and a polydispersity index of 1.5 to 2:
[Formula 5-2]
In Formula 5-2, m is 0.5 to 0.9, and n is 0.1 to 0.5.
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