KR102531573B1 - 특히 마이크로리소그래픽 투영 노광 장치의 광학 시스템의 조립체 - Google Patents

특히 마이크로리소그래픽 투영 노광 장치의 광학 시스템의 조립체 Download PDF

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Publication number
KR102531573B1
KR102531573B1 KR1020177025763A KR20177025763A KR102531573B1 KR 102531573 B1 KR102531573 B1 KR 102531573B1 KR 1020177025763 A KR1020177025763 A KR 1020177025763A KR 20177025763 A KR20177025763 A KR 20177025763A KR 102531573 B1 KR102531573 B1 KR 102531573B1
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KR
South Korea
Prior art keywords
mirror
assembly
data
transmission
mirror elements
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KR1020177025763A
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English (en)
Korean (ko)
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KR20170118142A (ko
Inventor
얀 호른
모스타파 졸라이만
벤야민 지겔
베네딕트 크나우프
슈테판 크로네
외르크 슈페흐트
마르쿠스 홀츠
자샤 블라이디스텔
플로리안 바르트
Original Assignee
칼 짜이스 에스엠테 게엠베하
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Publication of KR20170118142A publication Critical patent/KR20170118142A/ko
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Publication of KR102531573B1 publication Critical patent/KR102531573B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H04B5/0081—
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B5/00—Near-field transmission systems, e.g. inductive or capacitive transmission systems
    • H04B5/20—Near-field transmission systems, e.g. inductive or capacitive transmission systems characterised by the transmission technique; characterised by the transmission medium
    • H04B5/24—Inductive coupling
    • H04B5/26—Inductive coupling using coils

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020177025763A 2015-02-17 2016-02-15 특히 마이크로리소그래픽 투영 노광 장치의 광학 시스템의 조립체 KR102531573B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015202800.3A DE102015202800A1 (de) 2015-02-17 2015-02-17 Baugruppe eines optischen Systems, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102015202800.3 2015-02-17
PCT/EP2016/053139 WO2016131758A1 (de) 2015-02-17 2016-02-15 Baugruppe eines optischen systems, insbesondere einer mikrolithographischen projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
KR20170118142A KR20170118142A (ko) 2017-10-24
KR102531573B1 true KR102531573B1 (ko) 2023-05-12

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177025763A KR102531573B1 (ko) 2015-02-17 2016-02-15 특히 마이크로리소그래픽 투영 노광 장치의 광학 시스템의 조립체

Country Status (4)

Country Link
KR (1) KR102531573B1 (zh)
CN (1) CN107407891A (zh)
DE (1) DE102015202800A1 (zh)
WO (1) WO2016131758A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016216188A1 (de) * 2016-08-29 2018-03-01 Carl Zeiss Smt Gmbh Steuereinrichtung
WO2018141382A1 (de) * 2017-02-01 2018-08-09 Carl Zeiss Smt Gmbh Anlage und verfahren zum betreiben einer anlage
CN112485978A (zh) * 2020-12-24 2021-03-12 清华大学 用于光刻设备的真空释气装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002353105A (ja) 2001-05-24 2002-12-06 Nikon Corp 照明光学装置，該照明光学装置を備えた露光装置，およびマイクロデバイスの製造方法
JP2012504329A (ja) * 2008-09-30 2012-02-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体部品を製造するためのマイクロリソグラフィ用の投影露光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1500982A1 (en) * 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101159867B1 (ko) * 2003-09-12 2012-06-26 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 노출 장치용 조명 시스템
US7190437B2 (en) 2003-12-30 2007-03-13 Asml Netherlands B.V. Wireless signaling in a lithographic apparatus
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102010039930A1 (de) * 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage
DE102013204316B4 (de) * 2013-03-13 2015-07-23 Carl Zeiss Smt Gmbh Projektionsanordnung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002353105A (ja) 2001-05-24 2002-12-06 Nikon Corp 照明光学装置，該照明光学装置を備えた露光装置，およびマイクロデバイスの製造方法
JP2012504329A (ja) * 2008-09-30 2012-02-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 半導体部品を製造するためのマイクロリソグラフィ用の投影露光装置

Also Published As

Publication number Publication date
WO2016131758A1 (de) 2016-08-25
CN107407891A (zh) 2017-11-28
DE102015202800A1 (de) 2016-08-18
KR20170118142A (ko) 2017-10-24

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