KR102492803B9 - 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법 - Google Patents

조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법

Info

Publication number
KR102492803B9
KR102492803B9 KR1020220048486A KR20220048486A KR102492803B9 KR 102492803 B9 KR102492803 B9 KR 102492803B9 KR 1020220048486 A KR1020220048486 A KR 1020220048486A KR 20220048486 A KR20220048486 A KR 20220048486A KR 102492803 B9 KR102492803 B9 KR 102492803B9
Authority
KR
South Korea
Prior art keywords
aperture
incidence
adjusting
angle
analysis apparatus
Prior art date
Application number
KR1020220048486A
Other languages
English (en)
Other versions
KR102492803B1 (ko
Inventor
박미타
이재준
Original Assignee
(주)오로스테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)오로스테크놀로지 filed Critical (주)오로스테크놀로지
Priority to KR1020220048486A priority Critical patent/KR102492803B1/ko
Priority to PCT/KR2022/012755 priority patent/WO2023204359A1/ko
Application granted granted Critical
Publication of KR102492803B1 publication Critical patent/KR102492803B1/ko
Priority to US18/227,723 priority patent/US12066331B2/en
Publication of KR102492803B9 publication Critical patent/KR102492803B9/ko

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/214—Variangle incidence arrangement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
KR1020220048486A 2022-04-19 2022-04-19 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법 KR102492803B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020220048486A KR102492803B1 (ko) 2022-04-19 2022-04-19 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법
PCT/KR2022/012755 WO2023204359A1 (ko) 2022-04-19 2022-08-25 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법
US18/227,723 US12066331B2 (en) 2022-04-19 2023-07-28 Polarization analysis apparatus and method for adjusting angle of incidence or numerical aperture using aperture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020220048486A KR102492803B1 (ko) 2022-04-19 2022-04-19 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법

Publications (2)

Publication Number Publication Date
KR102492803B1 KR102492803B1 (ko) 2023-01-31
KR102492803B9 true KR102492803B9 (ko) 2024-01-11

Family

ID=85109023

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220048486A KR102492803B1 (ko) 2022-04-19 2022-04-19 조리개를 이용하여 입사 각도 또는 개구수를 조절하는 편광 분석 장치 및 방법

Country Status (3)

Country Link
US (1) US12066331B2 (ko)
KR (1) KR102492803B1 (ko)
WO (1) WO2023204359A1 (ko)

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2905448B2 (ja) * 1996-06-27 1999-06-14 理学電機工業株式会社 Ｘ線分析における試料台の位置設定方法および装置
US5979244A (en) 1998-03-04 1999-11-09 Siemens Aktiengesellschaft Method and apparatus for evaluating internal film stress at high lateral resolution
US8139232B2 (en) * 2006-07-27 2012-03-20 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
JP2008139613A (ja) * 2006-12-04 2008-06-19 Keyence Corp 光学顕微鏡
KR20080114331A (ko) * 2007-06-27 2008-12-31 한국산업기술대학교산학협력단 휴대용 분광 분석기
JP4950813B2 (ja) * 2007-08-30 2012-06-13 大日本スクリーン製造株式会社 分光エリプソメータ、膜厚測定装置および分光エリプソメータのフォーカス調整方法
JP2009068937A (ja) * 2007-09-12 2009-04-02 Dainippon Screen Mfg Co Ltd 分光エリプソメータおよび膜厚測定装置
US8441639B2 (en) 2009-09-03 2013-05-14 Kla-Tencor Corp. Metrology systems and methods
JP6271896B2 (ja) * 2013-07-22 2018-01-31 キヤノン株式会社 干渉計測装置、リソグラフィ装置および物品の製造方法
WO2015039031A1 (en) 2013-09-16 2015-03-19 Kla-Tencor Corporation Multiple angles of incidence semiconductor metrology systems and methods
US10215693B2 (en) * 2016-09-29 2019-02-26 Kla-Tencor Corporation Infrared spectroscopic reflectometer for measurement of high aspect ratio structures
EP3580546A1 (en) * 2017-02-08 2019-12-18 Yissum Research Development Company of The Hebrew University of Jerusalem Ltd. System and method for use in high spatial resolution ellipsometry
GB201711886D0 (en) * 2017-07-24 2017-09-06 Univ College Cardiff Consultants Ltd Analysing nano - objects
EP3629086A1 (en) * 2018-09-25 2020-04-01 ASML Netherlands B.V. Method and apparatus for determining a radiation beam intensity profile
US11162897B2 (en) * 2019-05-15 2021-11-02 Onto Innovation Inc. Optical metrology device using numerical aperture reduction

Also Published As

Publication number Publication date
US12066331B2 (en) 2024-08-20
WO2023204359A1 (ko) 2023-10-26
KR102492803B1 (ko) 2023-01-31
US20230375411A1 (en) 2023-11-23

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GRNT Written decision to grant
G170 Re-publication after modification of scope of protection [patent]