KR102486339B1 - Reflective gas injection nozzle installed in sputtering device - Google Patents

Abstract

The present invention relates to a reflective gas injection nozzle installed in a sputtering device, and more particularly to the reflective gas injection nozzle that is installed inside the sputtering device, wherein gas can be sprayed uniformly and evenly in a gas dispensing assembly, which increases a discharge work efficiency, in a plasma process. The reflective gas injection nozzle installed in a sputtering device includes a lower cover part, a distribution part, a transfer part, a diffusion part, a spraying part, and an upper cover part.

Description

Reflective gas injection nozzle installed in sputtering device}

The present invention relates to a reflective gas spray nozzle installed in a sputtering device, and more particularly, is installed inside the sputtering device, and can uniformly and evenly spray gas in a gas spray assembly during plasma discharge. It relates to a reflective gas spray nozzle installed in a sputtering device that increases discharge work efficiency.

Various methods such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) are used to form a thin film on a substrate. The sputter method is an example of a PVD method and is a technique widely used to form a thin film on a substrate. The sputter method is a technique of forming a thin film on a substrate by depositing a material scattered from the target by colliding positive ions in plasma with a target.

In general, a sputter device is composed of a load-lock chamber, a process chamber, and an unload-lock chamber which are inlined for productivity improvement and convenience of a deposition process. A substrate is introduced into the load-lock chamber, a deposition process is performed in the process chamber, and the unload-lock chamber performs a function of taking out the deposited substrate to the outside.

In order to prevent damage to the substrate due to heat generated from the substrate during the deposition process in the process chamber, a lot of research has been conducted on a substrate movable sputter device that moves the substrate. In the case of the existing substrate movable sputtering apparatus, it has an advantage of minimizing thermal damage to the substrate due to continuous sputtering.

However, in the case of the conventional substrate moving sputtering device, the distance between the substrate and the target changes during the substrate movement process, so that the deposition rate of the thin film deposited on the substrate changes.

Therefore, there is a problem in that it is difficult to deposit a thin film having desired uniformity on a substrate. In order to solve this problem, conventional substrate movable sputter devices utilize a cathode having a narrow width to maintain deposition uniformity, but in this case, the deposition rate is lowered.

In addition, since the substrate transfer method of the conventional sputtering equipment moves the substrate in a state in which the substrate and the substrate support are in close contact, back scratches may occur on the contact surface of the substrate and the substrate support, that is, the rear surface of the substrate, or cracking may occur. There was a problem.

In particular, in the process of loading or unloading a substrate into a chamber in a vacuum state, when passing through an area where vacuum and atmosphere are exchanged, the front surface of the glass substrate does not move constantly due to unstable airflow, which may cause damage to the substrate. it gets very big

Republic of Korea Patent Registration No. 10-1773668

The present invention has been made to solve the above conventional problems,

It is installed inside the sputtering device, and the purpose is to provide a reflective gas spray nozzle installed in the sputtering device that can uniformly and evenly spray gas in the gas spray assembly during plasma discharge, increasing the efficiency of the discharge operation. there is.

In order to achieve the above object, the present invention is an internal reflection type gas spray nozzle that mixes and evenly sprays gases installed inside a sputtering device,

a lower cover for sealing the lower part;

A distribution unit that is stacked on the upper part of the lower lid, has a plurality of inlets formed at one end so that two or more types of gas flow from the outside, and a distribution port connected to the inlet to distribute the gas introduced through the inlet. Wow;

a transfer unit stacked on top of the distribution unit and having a plurality of transfer holes communicated with the distribution opening on one end surface to transfer gas in the distribution opening upward;

a diffusion part stacked on top of the conveying part and communicating with a plurality of conveying holes on one end surface and having a diffusion hole formed thereon to mix and diffuse the gas transferred through the plurality of conveying holes;

a spraying part stacked on top of the diffusion part and having a spraying hole at the other end which communicates with the diffusion hole of the diffusion part to diffuse the gas transported from the diffusion hole once more and then sprays it to the front;

an upper cover portion stacked on top of the spraying unit to seal the spraying unit;

It relates to a reflective gas injection nozzle installed in a sputtering device, characterized in that it comprises a.

In addition, the lower cover part, the distribution part, the conveying part, the diffusion part, the spraying part, and the upper cover part of the present invention are formed in a rectangular plate shape and sequentially stacked with each other, and fixing members are penetrated and bound at both ends so that the whole is tightly adhered and fixed. It relates to a reflective gas injection nozzle installed in a sputtering device, characterized in that.

In addition, the distribution port of the distribution unit of the present invention is formed inside the distribution unit, and is formed to be divided into both sides at the end of the inlet to distribute the gas introduced through the inlet to both sides,

The end of the distribution hole is bent in the direction of the inlet, so that the gas distributed from the distribution hole is distributed in a reverse direction from the end of the distribution hole.

In addition, the distribution part of the present invention is formed to be 5 to 10 times thicker than the thickness of the lower cover part, the conveying part, the diffusion part, the spraying part, and the upper cover part, so that the gas introduced through the inlet can be confined at the distribution hole for a certain period of time and then transferred It relates to a reflective gas spray nozzle installed in a sputtering device, characterized in that.

In addition, the plurality of transfer holes of the transfer unit of the present invention are formed on the same vertical line as the bent end of the distribution port, so that the gas distributed in the reverse direction penetrates and is delivered to the diffusion unit. It relates to a type gas injection nozzle.

In addition, the diffusion hole of the diffusion part of the present invention is formed in a "ㅗ" or "TT" shape so that a protrusion protrudes from the center of the horizontal portion. The protrusion of the diffusion hole is formed on the same vertical line as the transfer hole of the transfer unit, and the transfer unit It relates to a reflective gas spray nozzle installed in a sputtering device, characterized in that the gas transported to the protruding portion through the hole is diffused linearly to the left and right of the horizontal portion of the diffusion hole.

In addition, the injection hole of the injection part of the present invention is formed through the injection part from the inside of the injection part to the front surface of the injection part. It relates to a type gas injection nozzle.

In addition, a sputtering device characterized in that a blocking protrusion is protruded from the inner surface of the ejection port of the present invention so that gas does not flow into the ejection hole through the central protrusion of the diffusion port, and a plurality of the blocking protrusions are protruded to match the protrusion of the diffusion port. It relates to a reflective gas injection nozzle installed in.

As described above, the reflective gas injection nozzle installed in the sputtering device of the present invention is installed inside the sputtering device, and can uniformly and evenly inject gas in the gas injection assembly during plasma discharge. There is an effect of increasing the discharge work efficiency.

1 is a perspective view showing the front (a) and the rear (b) of a gas injection nozzle according to an embodiment of the present invention;
2 is a comprehensive view showing a perspective view and a plan view of a lower cover and an upper cover according to an embodiment of the present invention;
3 is a comprehensive view showing a perspective view and a plan view of a distribution unit according to an embodiment of the present invention;
4 is a comprehensive view showing a perspective view and a plan view of a transfer unit according to an embodiment of the present invention;
5 is a comprehensive view showing a perspective view and a plan view of a diffusion unit according to an embodiment of the present invention;
6 is a comprehensive view showing a perspective view and a plan view of an injection unit according to an embodiment of the present invention;
7 is a schematic diagram showing a sputtering device in which gas injection nozzles are installed according to an embodiment of the present invention.

The present invention having such characteristics will be more clearly explained through the preferred embodiments thereof.

Before describing various embodiments of the present invention in detail with reference to the accompanying drawings, it will be appreciated that the application is not limited to the details of the configuration and arrangement of components described in the following detailed description or shown in the drawings. will be. The invention is capable of being implemented and practiced in other embodiments and of being carried out in various ways. Also, device or element orientation (e.g., "front", "back", "up", "down", "top", "bottom") The expressions and predicates used herein with respect to terms such as ", "left", "right", "lateral", etc. are only used to simplify the description of the present invention and related devices. Or it will be appreciated that it does not indicate or imply that an element simply must have a particular orientation. Also, terms such as “first” and “second” are used herein and in the appended claims for descriptive purposes and are not intended to indicate or imply relative importance or significance.

Therefore, since the embodiments described in this specification and the configurations shown in the drawings are only one of the most preferred embodiments of the present invention and do not represent all of the technical ideas of the present invention, various alternatives may be used at the time of this application. It should be understood that there may be equivalents and variations.

1 is a perspective view showing the front (a) and the rear (b) of a gas injection nozzle according to an embodiment of the present invention, and FIG. 2 is a perspective view and a plan view of a lower cover part and an upper cover part according to an embodiment of the present invention. 3 is a comprehensive view showing a perspective view and a plan view of a distribution unit according to an embodiment of the present invention, Figure 4 is a comprehensive view showing a perspective view and a plan view of a transfer unit according to an embodiment of the present invention, 5 is a comprehensive view showing a perspective view and a plan view of a diffusion unit according to an embodiment of the present invention, FIG. 6 is a comprehensive view showing a perspective view and a plan view of a spray unit according to an embodiment of the present invention, and FIG. It is a schematic diagram showing a sputtering device in which a gas injection nozzle according to an embodiment is installed.

As shown in FIGS. 1 to 7, the reflective gas spray nozzle 100 installed in the sputtering device of the present invention includes a lower cover part 10, a distribution part 20, a transfer part 30, a diffusion part 40 ), a spraying part 50 and an upper cover part 60. At this time, the lower cover part 10, the distribution part 20, the transfer part 30, the diffusion part 40, the spraying part 50, and the upper cover part 60 are formed in a rectangular plate shape of the same size, The cover part 10 - the distribution part 20 - the conveying part 30 - the diffusion part 40 - the spraying part 50 - the upper cover part 60 are sequentially stacked with each other in the order, and both ends of the stacked The through holes 70 are located on the same vertical line so that a fixing member (not shown) such as a bolt or piece is penetrated and fixed so that the whole is tightly fixed. In this way, the gas spray nozzle 100 in which the lower cover part 10, the distribution part 20, the transfer part 30, the diffusion part 40, the spraying part 50, and the upper cover part 60 are combined is a rectangular bar. formed in the form

As shown in FIGS. 1 and 2 , the lower cover part 10 is a cover that seals the lower part of the gas injection nozzle 100, and the thickness of the lower cover part 10 is 2T and 2 mm, but depending on circumstances It can vary.

As shown in FIGS. 1 and 3, the distribution unit 20 is stacked on top of the lower lid 10, and at one end (rear side) of the distribution unit 20, two or more types of gas are supplied from the outside. A plurality of inlets 21 are formed to flow in, respectively, and a distribution port 22 is formed that is connected to the inlets 21 and distributes the gas introduced through the inlets 21 . At this time, the gas includes all mixed gases such as Ar, O2 or Ar, N2 or Ar, O2, N2.

Here, two or more inlets 21 are formed on the rear surface of the distribution unit 20 to pass through the inside of the distribution unit 20, and the distribution opening 22 is formed inside the distribution unit 20. , It is formed to be divided into both sides at the end of the inlet 21 to distribute the gas introduced through the inlet 21 to both sides. That is, the inlet 21 and the distribution port 22 are formed in a “T” shape on a plane.

Further, the end of the distribution hole 22 is bent in the direction of the inlet 21 so that the gas distributed from the distribution hole 22 is distributed in the opposite direction from the end of the distribution hole 22 .

In addition, the inlet 21 and the distribution port 22 are formed to pass through the upper and lower portions of the distribution unit 20, the lower portion is blocked by the lower cover portion 10, and the upper portion communicates with the transfer unit 30. It will be.

In addition, the distribution unit 20 is formed to be 5 to 10 times thicker than the thickness of the lower cover unit 10, the transfer unit 30, the diffusion unit 40, the spray unit 50, and the upper cover unit 60, The gas introduced through the inlet 21 may be confined in the distribution port 22 for a certain period of time before being transported. At this time, the thickness of the distribution unit 20 is 10T, which corresponds to 10 mm, but may vary depending on circumstances.

On the other hand, the gas includes metals, oxides, nitrides, and multiple compounds (collectively referred to as double compounds or more) formed by applying various mixed gases such as Ar or Ar, O2 or Ar, N2 or Ar, O2, N2.

As shown in FIGS. 1 and 4, the transfer unit 30 is stacked on top of the distribution unit 20, and communicates with the distribution port 22 on one end surface to transfer the gas in the distribution port 22 to the top. A plurality of transfer holes 31 are formed.

Here, the plurality of transfer holes 31 of the transfer unit 30 are formed on the same vertical line as the bent end of the distribution port 22, and the gas distributed in the reverse direction penetrates and is delivered to the diffusion unit 40 Since the transfer hole 31 is formed through the upper and lower portions of the transfer unit 30, the gas distributed from the distribution port 22 can be delivered to the diffusion unit.

In addition, the thickness of the conveying part 30 is 2 mm at 2T, but may vary depending on circumstances.

As shown in FIGS. 1 and 5, the diffusion part 40 is stacked on top of the transfer part 30, and communicates with a plurality of transfer holes 31 on one end surface through the plurality of transfer holes 31. Diffusion holes 41 are formed to mix and diffuse the transferred gases.

Here, the diffusion hole 41 of the diffusion part 40 is formed in a “ㅗ” or “TT” shape so that a protrusion protrudes from the center of the horizontal part, and the protrusion of the diffusion hole 41 is transported by the transfer part 30. It is formed on the same vertical line as the hole 31, and the gas transferred to the protruding part through the transfer hole 31 of the transfer part 30 is diffused in the left and right linear lines of the horizontal part of the diffusion hole 41.

In addition, since the diffusion hole 41 is formed through the top and bottom of the diffusion part 40, the gas diffused in the horizontal part of the diffusion hole 41 can be delivered to the spray hole 51, and the diffusion part The thickness of (40) is 2T, which is 2mm, but may vary depending on circumstances.

As shown in FIGS. 1 and 6, the spray hole 51 is stacked on top of the diffusion part 40, and the other end communicates with the diffusion hole 41 of the diffusion part 40 to form a diffusion hole 41. An injection port 51 is formed to diffuse the gas transported from the gas transported once more and then inject it to the front.

Here, the spray hole 51 of the spraying part 50 is formed through the inside of the spraying part 50 to the front of the spraying part 50, and the spraying hole 51 is formed on the front side of the spraying part 50. It is formed long in the longitudinal direction of (50), and uniform and even gas injection is possible.

In addition, a blocking protrusion 52 is protruded from the inner surface of the spray hole 51 so that gas does not flow into the spray hole 51 through the central protrusion of the diffusion hole 41, and the blocking protrusion 52 is the diffusion hole. According to the protrusion of (41), a plurality of protrusions are formed.

In addition, since the injection hole 51 penetrates the upper and lower parts of the injection part 50, the gas diffused and transported from the horizontal part of the diffusion hole 41 is injected to the outside through the injection hole 51. The thickness of the injection unit 50 is 1T, which is 1 mm, but may vary depending on circumstances.

As shown in FIGS. 1 and 2 , the upper cover part 60 is stacked on top of the spraying part 50 to seal the upper part of the spraying hole 51 of the spraying part 50, and the upper cover part 60 ) is 2T, which is 2mm thick, but may vary depending on circumstances.

This invention is a study conducted with the support of the 4th Industrial Revolution Core Technology Development Project of Gyeongsangbuk-do and Gyeongbuk Science and Technology Promotion Center in 2021 (SF320004A).

10: lower cover part 20: distribution part
21: inlet 22: distribution port
30: transfer unit 31: transfer hole
40: diffusion part 41: conversion sphere
50: injection part 51: injection hole
52: blocking protrusion
60: upper cover 70: through hole
100: gas injection nozzle

Claims (8)

In the reflective gas injection nozzle 100 that mixes and evenly sprays the gas installed inside the sputtering device,
a lower cover part 10 for sealing the lower part;
It is stacked on the upper part of the lower cover part 10, and at one end, a plurality of inlets 21 are formed so that two or more types of gas flow from the outside, respectively, and are connected to the inlets 21 through the inlets 21. a distribution unit 20 in which distribution ports 22 for distributing the introduced gas are formed;
A transfer unit 30 stacked on top of the distribution unit 20 and having a plurality of transfer holes 31 communicating with the distribution opening 22 on one end surface to transfer the gas in the distribution opening 22 upward; and ;
It is stacked on the upper part of the transfer part 30, and at one end is formed a diffusion hole 41 that communicates with a plurality of transfer holes 31 and mixes and diffuses the gas transferred through the plurality of transfer holes 31 a diffusion unit 40;
A spray hole stacked on top of the diffusion part 40 and communicating with the diffusion hole 41 of the diffusion part 40 at the other end to diffuse the gas transported from the diffusion hole 41 once again and then spray it to the front. a spraying part 50 in which 51 is formed;
It is configured to include; an upper cover portion 60 stacked on top of the spraying unit 50 to seal the spraying unit 50,
The distribution port 22 of the distribution unit 20 is formed on the inside of the distribution unit 20, and is formed to be divided into both sides at the end of the inlet 21 to pass the gas introduced through the inlet 21 to both sides. distributed as
The end of the distribution hole 22 is bent in the direction of the inlet 21 so that the gas distributed from the distribution hole 22 is distributed in the opposite direction from the end of the distribution hole 22,
The distribution part 20 is formed to be 5 to 10 times thicker than the thickness of the lower cover part 10, the conveying part 30, the diffusion part 40, the spraying part 50, and the upper cover part 60, so that the inlet ( A reflective gas spray nozzle installed in a sputtering device characterized in that the gas introduced through 21) can be confined in the distribution port 22 for a certain period of time before being transported.
According to claim 1,
The lower cover part 10, the distribution part 20, the transfer part 30, the diffusion part 40, the spraying part 50, and the upper cover part 60 are formed in a rectangular plate shape and sequentially stacked with each other. , A reflective gas spray nozzle installed in a sputtering device, characterized in that a fixing member is penetrating and fastened to both ends so that the entire thing is closely attached and fixed.
delete delete According to claim 1,
The plurality of transfer holes 31 of the transfer unit 30 are formed on the same vertical line as the bent end of the distribution port 22, and the gas distributed in the reverse direction penetrates and is delivered to the diffusion unit 40. A reflective gas injection nozzle installed in a sputtering device to be.
According to claim 1,
The diffusion hole 41 of the diffusion part 40 is formed in a "ㅗ" or "TT" shape so that a protrusion protrudes from the center of the horizontal part. The protrusion of the diffusion hole 41 is a transfer hole ( 31) is formed on the same vertical line, and the gas transferred to the protruding part through the transfer hole 31 of the transfer part 30 is diffused in a linear left and right horizontal part of the diffusion hole 41 A reflective gas injection nozzle installed in a sputtering device that
According to claim 6,
The spraying hole 51 of the spraying part 50 is formed penetrating from the inside of the spraying part 50 to the front of the spraying part 50, in the longitudinal direction of the spraying part 50 on the front of the spraying part 50. A reflective gas injection nozzle installed in a sputtering device characterized in that it is formed long and enables uniform gas injection.
According to claim 7,
A blocking protrusion 52 protrudes from the inner surface of the spray hole 51 so that gas does not flow into the spray hole 51 through the central protrusion of the diffusion hole 41. ) Reflective gas injection nozzles installed in a sputtering device, characterized in that a plurality of protrusions are formed according to the protrusions of the.

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