KR102468462B1 - Unit cell of flexible and thin metamaterial absorber and metamaterial absorber including the same - Google Patents

Abstract

A unit cell of a metamaterial absorber comprises: an intermediate layer having a predetermined dielectric constant and having a square shape; a first metal layer disposed on one surface of the intermediate layer and including a conductor pattern composed of a combination of a plurality of square sub-conductor patterns, a plurality of U-shaped sub-conductor patterns, and a plurality of connection sub-conductor patterns; and a second metal layer disposed on the other side of the intermediate layer. Between the adjacent square sub-conductor patterns, the U-shaped sub-conductor pattern is spaced apart from the square sub-conductor patterns by a predetermined distance. The U-shaped sub-conductor pattern includes two straight lines extending parallel to each other and a curved line connecting one ends of the two straight lines to each other. The other end of the straight line is connected to the square sub-conductor pattern by the connection sub-conductor pattern. The curved line of the U-shaped sub-conductor pattern is disposed toward an inside of the first metal layer. A curved line of any one among the plurality of U-shaped sub-conductor patterns is disposed to face a curved line of the other one among the plurality of U-shaped sub-conductor patterns at a predetermined interval. The unit cell of a metamaterial absorber maintains constant electromagnetic wave absorption even when an incident angle of incident electromagnetic wave is changed.

Description

Unit cell of flexible and thin metamaterial absorber and metamaterial absorber including the same

The present invention relates to a metamaterial absorber, and more particularly, to a unit cell of a metamaterial absorber that maintains a constant electromagnetic wave absorptivity even when the incident angle of an incident electromagnetic wave is changed, and has a flexible and thin characteristic, and a metamaterial absorber including the same. it's about

Conventional electromagnetic wave absorbers are devices that greatly reduce reflected or transmitted electromagnetic waves by absorbing electromagnetic waves incident on the surface and consuming them as heat, and are used for purposes such as blocking electromagnetic waves. In general, electromagnetic wave absorbers are mainly based on mixed materials such as ferrite materials, but these electromagnetic wave absorbers have disadvantages in that they are bulky, heavy, and expensive. Therefore, recently, an electromagnetic wave absorber using a metamaterial has been proposed.

Metamaterials are artificially designed materials that include both electric and magnetic elements to have properties not found in nature, and have properties that facilitate electromagnetic wave absorption. That is, the metamaterial absorber is implemented by using a metamaterial having a high electromagnetic wave absorption rate.

However, the conventional metamaterial absorber has a high absorptance for electromagnetic waves incident vertically, while the absorptivity decreases for electromagnetic waves incident at different angles, and when the electromagnetic waves are incident at a large inclination angle, the absorptivity decreases. .

In addition, conventional metamaterial absorbers have limitations in that they are not flexible, have a large thickness, and have relatively high manufacturing costs.

An object of the present invention is to provide a unit cell of a metamaterial absorber and a metamaterial absorber including the same, which maintains a constant electromagnetic wave absorptivity even when the incident angle of the incident electromagnetic wave is changed.

Another object of the present invention is to provide a unit cell of a silver metamaterial absorber that is flexible, thin, and has a relatively low manufacturing cost, and a metamaterial absorber including the unit cell.

However, the object of the present invention is not limited to the above-mentioned objects, and may be expanded in various ways without departing from the spirit and scope of the present invention.

The unit cell of the metamaterial absorber according to an embodiment for realizing the object of the present invention described above is an intermediate layer having a predetermined dielectric constant and having a square shape, disposed on one side of the intermediate layer, a plurality of square sub-conductor patterns, A first metal layer including a conductor pattern composed of a combination of a plurality of U-shaped sub-conductor patterns and a plurality of connection sub-conductor patterns, and a second metal layer disposed on the other surface of the intermediate layer. The U-shaped sub-conductor patterns may be spaced apart from the square sub-conductor patterns by a predetermined distance between the adjacent square sub-conductor patterns. The U-shaped sub-conductor pattern may include two straight lines extending parallel to each other and a curved part connecting one end of the two straight lines to each other. The other end of the straight line portion may be connected to the square sub-conductor pattern by the connecting sub-conductor pattern. The curved portion of the U-shaped sub-conductor pattern may be disposed toward the inside of the first metal layer. The curved part of any one of the plurality of U-shaped sub-conductor patterns may be arranged to face the curved part of any other one of the plurality of U-shaped sub-conductor patterns at a predetermined interval. The intermediate layer may be exposed at least between the square sub-conductor pattern and the U-shaped sub-conductor pattern, between the two straight portions included in the U-shaped sub-conductor pattern, and between the curved portions disposed to face each other. can

In an embodiment, the conductor pattern may include a combination of first to fourth square sub-conductor patterns, first to fourth U-shaped sub-conductor patterns, and first to eighth connection sub-conductor patterns. have. The first U-shaped sub-conductor pattern may be disposed between the first square sub-conductor pattern and the second square sub-conductor pattern adjacent to each other in a horizontal direction, with a curved portion pointing downward. The first square sub-conductor pattern and the first U-shaped sub-conductor pattern may be connected through the first connection sub-conductor pattern. The second square sub-conductor pattern and the first U-shaped sub-conductor pattern may be connected through the second connection sub-conductor pattern.

In one embodiment, the second U-shaped sub-conductor pattern with a curved portion directed to the left may be disposed between the second square sub-conductor pattern and the third square sub-conductor pattern adjacent to each other in a vertical direction. The second square sub-conductor pattern and the second U-shaped sub-conductor pattern may be connected through the third connection sub-conductor pattern. The third square sub-conductor pattern and the second U-shaped sub-conductor pattern may be connected through the fourth connection sub-conductor pattern.

In one embodiment, the third U-shaped sub-conductor pattern with a curved portion facing upward may be disposed between the third square sub-conductor pattern and the fourth square sub-conductor pattern adjacent in a horizontal direction. The third square sub-conductor pattern and the third U-shaped sub-conductor pattern may be connected through the fifth connection sub-conductor pattern. The fourth square sub-conductor pattern and the third U-shaped sub-conductor pattern may be connected through the sixth connection sub-conductor pattern.

In one embodiment, the fourth U-shaped sub-conductor pattern with a curved portion directed to the right may be disposed between the fourth square sub-conductor pattern and the first square sub-conductor pattern adjacent to each other in a vertical direction. The fourth square sub-conductor pattern and the fourth U-shaped sub-conductor pattern may be connected through the seventh connection sub-conductor pattern. The first square sub-conductor pattern and the fourth U-shaped sub-conductor pattern may be connected by the eighth connection sub-conductor pattern.

In one embodiment, the first metal layer is left-right symmetric with respect to a first intermediate line dividing the conductor pattern into two in a horizontal direction, and vertically symmetrical with respect to a second intermediate line dividing the conductor pattern into two equal parts in a vertical direction. can be symmetrical.

In one embodiment, the intermediate layer may be composed of polyimide.

In one embodiment, the length of one side of the intermediate layer may be 5.4mm to 6.6mm.

In one embodiment, each of the plurality of U-shaped sub-conductor patterns may have a length of 1.50 mm to 1.80 mm from the other end of the straight portion to the curved portion, and a thickness of the intermediate layer of 0.34 mm to 0.40 mm. have.

In one embodiment, the length of one side of the intermediate layer may be 3.6 mm to 4.4 mm.

In one embodiment, each of the plurality of U-shaped sub-conductor patterns may have a length of 0.63 mm to 0.77 mm from the other end of the straight portion to the curved portion, and a thickness of the intermediate layer of 0.18 mm to 0.22 mm. have.

A metamaterial absorber according to an embodiment for realizing the above object of the present invention may include a plurality of unit cells having a square shape. The plurality of unit cells may be arranged on the same plane to form a flat plate structure. Each of the plurality of unit cells has a predetermined permittivity and an intermediate layer having a square shape, disposed on one surface of the intermediate layer, a plurality of square sub-conductor patterns, a plurality of U-shaped sub-conductor patterns, and a plurality of connection sub-conductor patterns. It may include a first metal layer including a conductor pattern composed of a combination of conductor patterns, and a second metal layer disposed on the other surface of the intermediate layer. The U-shaped sub-conductor patterns may be spaced apart from the square sub-conductor patterns by a predetermined distance between the adjacent square sub-conductor patterns. The U-shaped sub-conductor pattern may include two straight lines extending parallel to each other and a curved part connecting one end of the two straight lines to each other. The other end of the straight line portion may be connected to the square sub-conductor pattern by the connection sub-conductor pattern. The curved portion of the U-shaped sub-conductor pattern may be disposed toward the inside of the first metal layer. The curved part of any one of the plurality of U-shaped sub-conductor patterns may be arranged to face the curved part of any other one of the plurality of U-shaped sub-conductor patterns at a predetermined interval. The intermediate layer may be exposed at least between the square sub-conductor pattern and the U-shaped sub-conductor pattern, between the two straight portions included in the U-shaped sub-conductor pattern, and between the curved portions disposed to face each other. can

The unit cell of the metamaterial absorber and the metamaterial absorber according to the present invention can maintain constant electromagnetic wave absorptivity even when the incident angle of the incident electromagnetic wave is changed. In addition, the unit cell and metamaterial absorber of the metamaterial absorber according to the present invention may be flexible, thin, and have relatively low manufacturing cost. Therefore, the unit cell of the metamaterial absorber and the metamaterial absorber can maximize electromagnetic wave absorption efficiency.

For example, when the unit cell and metamaterial absorber of the metamaterial absorber according to the present invention are used in an automatic toll collection system such as a high-pass in a 5.8 GHz band, multiple reflections from ceilings, pillars, etc. of buildings around the automatic toll collection system Since performance degradation and malfunction of information communication devices due to signals are minimized, smooth passage of the automatic toll collection system can be secured.

For example, when the unit cell and metamaterial absorber of the metamaterial absorber according to the present invention are used in a naval vessel in the 10 GHz band, the false target of the radar due to the reflected wave by the mast or pier around the naval vessel is reduced, Radar performance of naval ships could be improved.

However, the effects of the present invention are not limited to the above-described effects, and may be variously extended within a range that does not deviate from the spirit and scope of the present invention.

1 is a front view of a unit cell of a metamaterial absorber of the present invention.
2 is a cross-sectional view of a unit cell of the metamaterial absorber of FIG. 1;
3 is a perspective view of a unit cell of the metamaterial absorber of FIG. 1;
FIG. 4 is a view showing the first metal layer separated from the perspective view of FIG. 3 .
FIG. 5 is a view showing an intermediate layer separated from the perspective view of FIG. 3 .
FIG. 6 is a view showing the second metal layer separated from the perspective view of FIG. 3 .
7 is a view showing an example of a metamaterial absorber in which unit cells of the metamaterial absorber of FIG. 1 are arranged on the same plane.
8 is a flowchart illustrating an operation of absorbing electromagnetic waves by the metamaterial absorber of FIG. 7 .
9a is a perspective view showing a unit cell of a metamaterial absorber for a 5.8 GHz band according to an embodiment of the present invention.
FIG. 9B is a graph showing a change in electromagnetic wave absorption according to a change in a first metal layer pattern of a unit cell of the metamaterial absorber of FIG. 9A.
FIG. 9C is a graph showing a change in electromagnetic wave absorbance according to a change in thickness of an intermediate layer of a unit cell of the metamaterial absorber of FIG. 9A.
FIG. 9D is a graph showing an electromagnetic wave absorbance according to an incident angle when an electromagnetic wave polarized in a TE mode is incident on a unit cell of the metamaterial absorber of FIG. 9A.
FIG. 9E is a graph showing an electromagnetic wave absorbance according to an incident angle when an electromagnetic wave polarized in a TM mode is incident on a unit cell of the metamaterial absorber of FIG. 9A.
10A is a perspective view showing a unit cell of a metamaterial absorber for a 10 GHz band according to an embodiment of the present invention.
FIG. 10B is a graph showing a change in electromagnetic wave absorption according to a change in a first metal layer pattern of a unit cell of the metamaterial absorber of FIG. 10A.
FIG. 10C is a graph showing a change in electromagnetic wave absorption according to a change in thickness of an intermediate layer of a unit cell of the metamaterial absorber of FIG. 10A.
FIG. 10D is a graph showing an electromagnetic wave absorptivity according to an incident angle when an electromagnetic wave polarized in a TE mode is incident on a unit cell of the metamaterial absorber of FIG. 10A.
FIG. 10E is a graph showing an electromagnetic wave absorption rate according to an incident angle when an electromagnetic wave polarized in a TM mode is incident on a unit cell of the metamaterial absorber of FIG. 10A.

Hereinafter, various embodiments of this document will be described with reference to the accompanying drawings.

Examples and terms used therein are not intended to limit the technology described in this document to specific embodiments, and should be understood to include various modifications, equivalents, and/or substitutes of the embodiments.

In the following description of various embodiments, if it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the invention, the detailed description will be omitted.

In addition, terms to be described below are terms defined in consideration of functions in various embodiments, and may vary according to intentions or customs of users or operators. Therefore, the definition should be made based on the contents throughout this specification.

In connection with the description of the drawings, like reference numerals may be used for like elements.

Singular expressions may include plural expressions unless the context clearly dictates otherwise.

In this document, expressions such as "A or B" or "at least one of A and/or B" may include all possible combinations of the items listed together.

Expressions such as "first," "second," "first," or "second," may modify the corresponding components regardless of order or importance, and are used to distinguish one component from another. It is used only and does not limit the corresponding components.

When a (e.g., first) element is referred to as being "(functionally or communicatively) coupled to" or "connected to" another (e.g., second) element, that element refers to the other (e.g., second) element. It may be directly connected to the component or connected through another component (eg, a third component).

In this specification, "configured to (or configured to)" means "suitable for," "having the ability to," "changed to" depending on the situation, for example, hardware or software ," can be used interchangeably with "made to," "capable of," or "designed to."

In some contexts, the expression "device configured to" can mean that the device is "capable of" in conjunction with other devices or components.

For example, the phrase "a processor configured (or configured) to perform A, B, and C" may include a dedicated processor (eg, embedded processor) to perform the operation, or by executing one or more software programs stored in a memory device. , may mean a general-purpose processor (eg, CPU or application processor) capable of performing corresponding operations.

Also, the term 'or' means 'inclusive or' rather than 'exclusive or'.

That is, unless otherwise stated or clear from the context, the expression 'x employs a or b' means any one of the natural inclusive permutations.

Terms such as '..unit' and '..group' used below refer to a unit that processes at least one function or operation, and may be implemented by hardware or software, or a combination of hardware and software.

1 is a front view of a unit cell 10 of the metamaterial absorber of the present invention, FIG. 2 is a cross-sectional view of the unit cell 10 of the metamaterial absorber of FIG. 1, and FIG. 3 is a unit cell of the metamaterial absorber of FIG. 1 It is a perspective view of (10), FIG. 4 is a view showing the first metal layer 200 separated from the perspective view of FIG. 3, FIG. 5 is a view showing the intermediate layer 100 separated from the perspective view of FIG. 3, FIG. In the perspective view of FIG. 3 , the second metal layer 300 is separated and shown.

1 to 3, the unit cell 10 of the metamaterial absorber according to the present invention may include an intermediate layer 100, a first metal layer 200, and a second metal layer 300. The first metal layer 200 may be disposed on one surface of the intermediate layer 100 and the second metal layer 300 may be disposed on the other surface of the intermediate layer 100 .

Specifically, the unit cell 10 of the metamaterial absorber includes an intermediate layer 100 having a predetermined permittivity, a first metal layer 200 including a conductor pattern composed of a combination of a plurality of sub-conductor patterns, and a second metal layer. (300). Each of the intermediate layer 100 , the first metal layer 200 , and the second metal layer 300 may have a square shape. For example, the second metal layer 300 may be a square having the same size as the intermediate layer 100 , and the first metal layer 200 may have a square having a smaller size than the intermediate layer 100 .

The first metal layer 200 includes a conductor pattern composed of a combination of a plurality of square sub-conductor patterns 210, a plurality of U-shaped sub-conductor patterns 220, and a plurality of connection sub-conductor patterns 230. can do. Between the adjacent square sub-conductor patterns 210 , the U-shaped sub-conductor patterns 220 may be spaced apart from the square sub-conductor patterns 210 by a predetermined distance. The square sub-conductor pattern 210 may be connected to the square sub-conductor pattern 210 by the connection sub-conductor pattern 230 .

For example, the U-shaped sub-conductor pattern 220 may include two straight lines extending parallel to each other and a curved part connecting one end of the two straight lines to each other. The other end of the straight line portion may be connected to the square sub-conductor pattern 210 by the connection sub-conductor pattern 230 . The curved portion of the U-shaped sub-conductor pattern 220 may be disposed toward the inside of the first metal layer 200 . The curved part of any one of the plurality of U-shaped sub-conductor patterns 220 may be arranged to face the curved part of any other one of the plurality of U-shaped sub-conductor patterns 220 at a predetermined interval. .

As shown in FIG. 1, at least between the square sub-conductor pattern 210 and the U-shaped sub-conductor pattern 220, between the two straight lines included in the U-shaped sub-conductor pattern 220, the The intermediate layer 100 may be exposed between the curved portions disposed to face each other.

As shown in FIG. 3, the first metal layer 200, the intermediate layer 100, and the second metal layer 300 may be sequentially stacked to form a unit cell of a metamaterial absorber. Here, Z(K) may represent a traveling direction of electromagnetic waves, Y(E) may represent an electric field direction, and X(H) may represent a magnetic field direction. The direction of the electric field may be parallel to the longitudinal direction of the unit cell 10 of the metamaterial absorber, the direction of the magnetic field may be parallel to the transverse direction of the unit cell 10 of the metamaterial absorber, and the direction of the incident electromagnetic wave may be It may be perpendicular to one side of the unit cell 10 of the metamaterial absorber.

On the other hand, the unit cell 10 of the metamaterial absorber according to the present invention may include a conductor pattern optimized to keep the electromagnetic wave absorptivity constant even when the incident angle of the incident electromagnetic wave is changed. In addition, the unit cell 10 of the metamaterial absorber according to the present invention may include an intermediate layer 100 formed of an optimal material and an optimal thickness to have a flexible and thin characteristic. Hereinafter, the first metal layer 200, the intermediate layer 100, and the second metal layer 300 will be described in detail with reference to FIGS. 4 to 6 .

S/m이고, 두께(TC1)가 0.035mm인 구리로 구성될 수 있으나, 본 발명의 제1 금속층(200)의 소재 및 두께는 이에 한정되지 않는다.Referring to FIG. 4 , the first metal layer 200 may be formed of a conductor through which current may flow. The first metal layer 200 may be made of a conductive metal. For example, the first metal layer 200 is conductive.

S/m, and may be made of copper having a thickness TC1 of 0.035 mm, but the material and thickness of the first metal layer 200 of the present invention are not limited thereto.

The first metal layer 200 may include a conductor pattern optimized to maintain a constant electromagnetic wave absorbance even when the incident angle of the incident electromagnetic wave is changed. The conductor pattern may be composed of a combination of a plurality of square sub-conductor patterns 210, a plurality of U-shaped sub-conductor patterns 220, and a plurality of connection sub-conductor patterns 230. Here, the U-shaped sub-conductor pattern 220 is disposed between the adjacent square sub-conductor patterns 210, and the square sub-conductor pattern 210 and the U-shaped sub-conductor pattern 220 are It may be connected to the connection sub-conductor pattern 230 .

Specifically, as shown in FIG. 4, the conductor patterns include first to fourth square sub-conductor patterns 210a, 210b, 210c, and 210d, and first to fourth U-shaped sub-conductor patterns 220a, 220b, and 220c. , 220d), and the first to eighth connection sub-conductor patterns 230a, 230b, 230c, 230d, 230e, 230f, 230g, and 230h.

For example, between the first square sub-conductor pattern 210a and the second square sub-conductor pattern 210b adjacent in the horizontal direction, the first U-shaped sub-conductor pattern 220a has a curved portion pointing downward. ) can be placed. The first square sub-conductor pattern 210a and the first U-shaped sub-conductor pattern 220a may be connected through the first connection sub-conductor pattern 230a. The second square sub-conductor pattern 210b and the first U-shaped sub-conductor pattern 220a may be connected through the second connection sub-conductor pattern 230b.

For example, between the second square sub-conductor pattern 210b and the third square sub-conductor pattern 210c adjacent to each other in the vertical direction, a curved portion is directed to the left, the second U-shaped sub-conductor pattern 220b ) can be placed. The second square sub-conductor pattern 210b and the second U-shaped sub-conductor pattern 220b may be connected through the third connection sub-conductor pattern 230c. The third square sub-conductor pattern 210c and the second U-shaped sub-conductor pattern 220b may be connected through the fourth connection sub-conductor pattern 230d.

For example, between the third square sub-conductor pattern 210c and the fourth square sub-conductor pattern 210d adjacent to each other in the horizontal direction, a curved portion of the third U-shaped sub-conductor pattern 220c faces upward. ) can be placed. The third square sub-conductor pattern 210c and the third U-shaped sub-conductor pattern 220c may be connected through the fifth connection sub-conductor pattern 230e. The fourth square sub-conductor pattern 210d and the third U-shaped sub-conductor pattern 220c may be connected through the sixth connection sub-conductor pattern 230f.

For example, between the fourth square sub-conductor pattern 210d and the first square sub-conductor pattern 210a adjacent to each other in the vertical direction, the fourth U-shaped sub-conductor pattern 220d has a curved portion pointing to the right. ) can be placed. The fourth square sub-conductor pattern 210d and the fourth U-shaped sub-conductor pattern 220d may be connected through the seventh connection sub-conductor pattern 230g. The first square sub-conductor pattern 210a and the fourth U-shaped sub-conductor pattern 220d may be connected through the eighth connection sub-conductor pattern 230h.

In one embodiment, the size and shape of the plurality of square sub-conductor patterns 210a, 210b, 210c, and 210d constituting the conductor pattern may be the same. The plurality of U-shaped sub-conductor patterns 220a, 220b, 220c, and 220d constituting the conductor pattern may have the same size and shape. The plurality of connection sub-conductor patterns 230a, 230b, 230c, 230d, 230e, 230f, 230g, and 230h constituting the conductor pattern may have the same size and shape. According to such characteristics, the first metal layer 200 may have symmetry. For example, the first metal layer 200 may be left-right symmetric with respect to a first intermediate line dividing the conductor pattern into two parts in the horizontal direction. For example, the first metal layer 200 may be vertically symmetric with respect to a second intermediate line dividing the conductor pattern into two equal parts in the vertical direction.

The unit cell 10 of the metamaterial absorber of the present invention can have an optimal conductor pattern that maximizes electromagnetic wave absorption by changing the detailed length of each sub-conductor pattern included in the first metal layer 200. For example, the first metal layer 200 is the length (I) of one side of the conductor pattern, the length (A) of one side of the square sub-conductor pattern 210, and the straight portion of the U-shaped sub-conductor pattern 220. The length (M) from the other end to the curved portion, the width (W) of the U-shaped sub-conductor pattern 220, and the interval (G) of two straight portions of the U-shaped sub-conductor pattern 220 are changed. Accordingly, even when the incident angle of the incident electromagnetic wave is changed, the electromagnetic wave absorptivity is kept constant and the electromagnetic wave absorptivity is maximized.

Referring to FIG. 5 , the intermediate layer 100 may have a predetermined permittivity, have a square shape, and be made of an elastic material. Here, the intermediate layer 100 may be a region in which an induced magnetic field is formed. The intermediate layer 100 may have a length (P) of one side, a thickness (TP), permittivity, and magnetic permeability that may be changed in order to sufficiently absorb electromagnetic waves. For example, the intermediate layer 100 may be composed of polyimide, have a dielectric constant of 3.5, and have a dielectric loss tangent of 0.0027, but of the intermediate layer 100 of the present invention. Materials and properties are not limited thereto.

The first metal layer 200 may be disposed on one surface of the intermediate layer 100 and the second metal layer 300 may be disposed on the other surface. According to this arrangement structure, the intermediate layer 100 may be exposed between the square sub-conductor pattern 210 and the U-shaped sub-conductor pattern 220 of the first metal layer 200 . In addition, the intermediate layer 100 may be exposed between the two straight lines included in the U-shaped sub-conductor pattern 220 of the first metal layer 200 . In addition, the intermediate layer 100 may be exposed between the curved portions of the first metal layer 200 disposed to face each other.

S/m이고, 두께(TC2)가 0.035mm인 구리로 구성되며, 한 변의 길이가 중간층(100)의 한 변의 길이(P)와 동일한 정사각형 형상으로 구성될 수 있으나, 본 발명의 제2 금속층(300)의 소재, 두께 및 크기는 이에 한정되지 않는다.Referring to FIG. 6 , the second metal layer 300 may serve to prevent electromagnetic waves incident on the unit cell 10 of the metamaterial absorber from escaping. When an electromagnetic wave is incident, the second metal layer 300 may form an induced current simultaneously with the first metal layer 100 . The second metal layer 300 may be formed of a conductor through which current may flow. The first metal layer may be made of a conductive metal. The size and shape of the second metal layer 300 may be the same as that of the intermediate layer 100 . For example, the second metal layer 300 is conductive.

S / m, and is composed of copper having a thickness (TC2) of 0.035 mm, and may be composed of a square shape in which the length of one side is equal to the length (P) of one side of the intermediate layer 100, but the second metal layer of the present invention ( 300) is not limited thereto.

7 is a view showing an example of a metamaterial absorber in which unit cells 10 of the metamaterial absorber of FIG. 1 are arranged on the same plane, and FIG. 8 shows an operation of the metamaterial absorber of FIG. 7 absorbing electromagnetic waves. It is a flow chart.

Referring to FIGS. 3, 7, and 8 , the metamaterial absorber 1000 may include a plurality of unit cells 10 having a square shape. The plurality of unit cells 10 may be arranged on the same plane to form a flat plate structure to constitute the metamaterial absorber 1000. For example, each of the plurality of unit cells 10 constituting the metamaterial absorber 1000 may have the same shape and size. For another example, at least one of the plurality of unit cells 10 constituting the metamaterial absorber 1000 may have a different shape and size from neighboring unit cells 10 . As each of the plurality of unit cells 10 absorbs electromagnetic waves, the metamaterial absorber 1000 can absorb incident electromagnetic waves in a wide range.

As shown in FIG. 8, the metamaterial absorber 1000 according to the present invention forms an induced current (S200), forms a magnetic field (S300), and absorbs electromagnetic waves (S400) when electromagnetic waves are incident (S100). can Here, the meaning of absorbing electromagnetic waves may mean that the metamaterial absorber 1000 absorbs energy included in electromagnetic waves. In addition, the absorption of electromagnetic waves by the metamaterial absorber 1000 is not an active operation of the metamaterial absorber 1000 for absorbing electromagnetic waves, but a passive effect according to the physical components and electromagnetic characteristics of the metamaterial absorber 1000. can

Specifically, electromagnetic waves of a broadband frequency may be incident at various incident angles to the metamaterial absorber 1000 (S100). When incident on the metamaterial absorber 1000, an induced current may be simultaneously formed in the first metal layer 200 and the second metal layer 300 (S200). An induced magnetic field may be formed in the middle layer 100 region by the induced current of the first metal layer 200 and the induced current of the second metal layer 300 (S300). Electromagnetic waves incident to the metamaterial absorber 1000 and the induced magnetic field may magnetically resonate by impedance matching. As energy of the electromagnetic wave incident to the metamaterial absorber 1000 is absorbed by magnetic resonance, the metamaterial absorber 1000 may absorb the electromagnetic wave (S400). Here, the resonance frequency of the meta-material absorber 1000 may be determined according to the size and shape of the plurality of unit cells 10 constituting the meta-material absorber 1000. Since the magnitude of the induced magnetic field is maximized at the resonant frequency, the metamaterial absorber 1000 can absorb electromagnetic waves at the resonant frequency to the maximum.

9A is a perspective view showing a unit cell 10a of a metamaterial absorber for a 5.8 GHz band according to an embodiment of the present invention, and FIG. 9B is a first metal layer 200a of the unit cell 10a of the metamaterial absorber of FIG. 9A. ) is a graph showing the change in the electromagnetic wave absorption rate according to the pattern change, and FIG. 9c is a graph showing the change in the electromagnetic wave absorption rate according to the change in thickness of the intermediate layer 100a of the unit cell 10a of the metamaterial absorber of FIG. 9a, and FIG. When an electromagnetic wave polarized in TE mode is incident on the unit cell 10a of the metamaterial absorber of FIG. 9a, it is a graph showing the electromagnetic wave absorptivity according to the incident angle. FIG. It is a graph showing the electromagnetic wave absorptivity according to the incident angle when a mode-polarized electromagnetic wave is incident.

9a to 9e, since the size, shape, and conductor pattern of the unit cell 10a of the metamaterial absorber of the present invention are optimized, the electromagnetic wave absorption rate of the unit cell 10a of the metamaterial absorber is maximized at 5.8 GHz. It can be.

In one embodiment, the length P1 of one side of the intermediate layer 100a may be 5.4 mm to 6.6 mm. The thickness TP1 of the intermediate layer 100a may be 0.34 mm to 0.40 mm. A length M1 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200a to the curved portion may range from 1.50 mm to 1.80 mm. The length P1 of one side of the intermediate layer 100 is 5.4 mm to 6.6 mm, the thickness TP1 of the intermediate layer 100 a is 0.34 mm to 0.40 mm, and the U-shaped sub-conductor pattern of the first metal layer 200 a ( 220), when the length M1 from the other end of the straight portion to the curved portion is 1.50 mm to 1.80 mm, the electromagnetic wave absorption rate of the unit cell 10a of the metamaterial absorber is maximized at 5.8 GHz, and the incident angle is changed. A change in the electromagnetic wave absorption rate according to can be minimized.

)이고, 중간층(100)의 두께(TP1)가 0.37mm이며, 제1 금속층(200a)의 U자형 서브-도체패턴(220)의 상기 직선부의 상기 타 단으로부터 상기 곡선부까지의 길이(M1)는 1.65mm일 수 있다. 또한, 메타물질 흡수체의 단위셀(10a)은 제1 금속층(200)의 한 변의 길이(I1)가 5.7mm이고, 정사각형 서브-도체패턴(210)의 한 변의 길이(A1)가 2.1mm이며, U자형 서브-도체패턴(220)의 폭(W1)이 0.3mm이고, U자형 서브-도체패턴(220)의 두 개의 직선부의 간격(G1)이 0.3mm일 수 있다.Specifically, in the unit cell 10a of the metamaterial absorber according to the present invention, the length P1 of one side of the intermediate layer 100a is 6.0 mm (ie, the size of the intermediate layer 100a is

), the thickness TP1 of the intermediate layer 100 is 0.37 mm, and the length M1 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200a to the curved portion may be 1.65 mm. In addition, in the unit cell 10a of the metamaterial absorber, the length I1 of one side of the first metal layer 200 is 5.7 mm, and the length A1 of one side of the square sub-conductor pattern 210 is 2.1 mm, The width W1 of the U-shaped sub-conductor pattern 220 may be 0.3 mm, and the interval G1 of two straight portions of the U-shaped sub-conductor pattern 220 may be 0.3 mm.

As shown in FIG. 9B, in the unit cell 10a of the metamaterial absorber, the length P1 of one side of the intermediate layer 100a is 6.0 mm, and the length P1 of one side of the U-shaped sub-conductor pattern 220 When the length M1 to the curved portion is 1.65 mm, it may have an electromagnetic wave absorption rate of 99.7% at 5.8 GHz. On the other hand, when the length M1 from the other end of the straight portion to the curved portion of the U-shaped sub-conductor pattern 220 is 1.45 mm or 1.25 mm, the band of electromagnetic waves absorbed is greater than 6 GHz, and electromagnetic waves The absorption rates can be reduced to 98.5% and 96%, respectively. That is, the unit cell 10a of the metamaterial absorber has the maximum electromagnetic wave at 5.8 GHz when the length M1 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 to the curved portion is 1.65 mm. may have absorption.

As shown in FIG. 9C, in the unit cell 10a of the metamaterial absorber, when the length P1 of one side of the intermediate layer 100a is 6.0 mm and the thickness TP1 of the intermediate layer 100 is 0.37 mm, at 5.8 GHz It may have an electromagnetic wave absorption rate of 99.7%. On the other hand, when the thickness TP1 of the intermediate layer 100 is 0.27 mm, the band of electromagnetic waves absorbed becomes smaller than 5.8 GHz, and the electromagnetic wave absorption rate may decrease to 90.5%. In addition, when the thickness TP1 of the intermediate layer 100a is 0.47 mm, the band of electromagnetic waves absorbed becomes larger than 5.8 GHz, and the electromagnetic wave absorption rate may decrease to 90.7%. That is, when the thickness TP1 of the intermediate layer 100a is 0.37 mm, the unit cell 10a of the metamaterial absorber may have maximum electromagnetic wave absorption at 5.8 GHz.

The length P1 of one side of the intermediate layer 100a is 6.0 mm, the thickness TP1 of the intermediate layer 100 is 0.37 mm, and the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200a is When the length M1 from the other end to the curved portion is 1.65 mm, a change in electromagnetic wave absorption rate of the unit cell 10a of the metamaterial absorber according to a change in the incident angle can be minimized.

When an electromagnetic wave polarized in a transverse-electric mode (TE mode) is incident on the unit cell 10a of the metamaterial absorber, a change in the band of the absorbed electromagnetic wave and a change in the absorbance of the electromagnetic wave may be very small according to a change in the angle of incidence. For example, as shown in FIG. 9D, comparing the case where the angle of incidence of the electromagnetic wave is changed to 15°/ 30°/ 45° and the case where the angle of incidence of the electromagnetic wave is perpendicular (90°), the band of the electromagnetic wave that is absorbed is the maximum. It can be seen that there is only a slight difference of an increase of 0.01 GHz and a maximum decrease of 1.8% in electromagnetic wave absorption rate, and there is little change in the band of electromagnetic waves absorbed in the TE mode and little change in electromagnetic wave absorption rate.

When an electromagnetic wave polarized in a transverse-magnetic mode (TM mode) is incident on the unit cell 10a of the metamaterial absorber, a change in the band of the absorbed electromagnetic wave and a change in the absorbance of the electromagnetic wave may be very small according to a change in the angle of incidence. For example, as shown in FIG. 9E, comparing the case where the angle of incidence of the electromagnetic wave is changed to 15°/ 30°/ 45° and the case where the angle of incidence of the electromagnetic wave is perpendicular (90°), the band of the electromagnetic wave that is absorbed is the maximum. It can be seen that there is only a slight difference of an increase of 0.03 GHz and a maximum decrease of 0.2% in the electromagnetic wave absorption rate, and there is little change in the band of electromagnetic waves absorbed in the TM mode and little change in the electromagnetic wave absorption rate.

As such, the unit cell 10a of the metamaterial absorber and the metamaterial absorber according to the present invention can maintain constant electromagnetic wave absorption in the 5.8 GHz band even when the incident angle of the incident electromagnetic wave is changed. In addition, the unit cell 10a of the metamaterial absorber and the metamaterial absorber according to the present invention may be flexible, thin, and have relatively low manufacturing cost. Accordingly, the unit cell 10a of the metamaterial absorber and the metamaterial absorber can maximize electromagnetic wave absorption efficiency in the 5.8 GHz band. For example, when the unit cell 10a of the metamaterial absorber and the metamaterial absorber according to the present invention are used in a 5.8 GHz band automatic toll collection system such as high-pass, the ceiling of a building around the automatic toll collection system, a pillar, etc. Since performance degradation and malfunction of information and communication devices due to multiple reflected signals are minimized, smooth passage of the automatic toll collection system can be secured.

10A is a perspective view showing a unit cell 10b of a metamaterial absorber for a 10 GHz band according to an embodiment of the present invention, and FIG. 10B is a first metal layer 200b of the unit cell 10b of the metamaterial absorber of FIG. 10A. FIG. 10c is a graph showing the change in electromagnetic wave absorbance according to the change in pattern, and FIG. 10c is a graph showing the change in the absorbance of electromagnetic wave according to the change in the thickness of the intermediate layer 100b of the unit cell 10b of the metamaterial absorber of FIG. 10a, and FIG. 10d is FIG. When an electromagnetic wave polarized in TE mode is incident on the unit cell 10b of the metamaterial absorber of , it is a graph showing the electromagnetic wave absorption rate according to the incident angle, and FIG. It is a graph showing the electromagnetic wave absorptivity according to the incident angle when the polarized electromagnetic wave is incident.

10a to 10e, since the size, shape, and conductor pattern of the unit cell 10b of the metamaterial absorber of the present invention are optimized, the electromagnetic wave absorption rate of the unit cell 10b of the metamaterial absorber at 10 GHz can be maximized. can

In one embodiment, the length P2 of one side of the intermediate layer 100b may be 3.6 mm to 4.4 mm. The thickness TP2 of the intermediate layer 100b may be 0.18 mm to 0.22 mm. A length M2 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200b to the curved portion may range from 0.63 mm to 0.77 mm. The length P2 of one side of the intermediate layer 100b is 3.6 mm to 4.4 mm, the thickness TP2 of the intermediate layer 100 b is 0.18 mm to 0.22 mm, and the U-shaped sub-conductor pattern of the first metal layer 200 b ( 220), when the length M2 from the other end of the straight portion to the curved portion is 0.63 mm to 0.77 mm, the electromagnetic wave absorption rate of the unit cell 10b of the metamaterial absorber is maximized at 10 GHz, and the change in the incident angle A change in the electromagnetic wave absorption rate according to the change may be minimized.

)이고, 중간층(100b)의 두께(TP2)가 0.20mm이며, 제1 금속층(200b)의 U자형 서브-도체패턴(220)의 상기 직선부의 상기 타 단으로부터 상기 곡선부까지의 길이(M2)는 0.70mm일 수 있다. 또한, 메타물질 흡수체의 단위셀(10b)은 제1 금속층(200b)의 한 변의 길이(I2)가 3.8mm이고, 정사각형 서브-도체패턴(210)의 한 변의 길이(A2)가 1.1mm이며, U자형 서브-도체패턴(220)의 폭(W2)이 0.3mm이고, U자형 서브-도체패턴(220)의 두 개의 직선부의 간격(G2)이 0.3mm일 수 있다.Specifically, in the unit cell 10b of the metamaterial absorber according to the present invention, the length P2 of one side of the intermediate layer 100b is 4.0 mm (ie, the size of the intermediate layer 100b is

), the thickness TP2 of the intermediate layer 100b is 0.20 mm, the length M2 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200b to the curved portion may be 0.70 mm. In addition, in the unit cell 10b of the metamaterial absorber, the length I2 of one side of the first metal layer 200b is 3.8 mm, and the length A2 of one side of the square sub-conductor pattern 210 is 1.1 mm, The width W2 of the U-shaped sub-conductor pattern 220 may be 0.3 mm, and the interval G2 of two straight portions of the U-shaped sub-conductor pattern 220 may be 0.3 mm.

As shown in FIG. 10B, in the unit cell 10b of the metamaterial absorber, the length P2 of one side of the intermediate layer 100b is 4.0 mm, and the length P2 of one side of the U-shaped sub-conductor pattern 220 When the length M2 to the curved portion is 0.70 mm, it may have an electromagnetic wave absorption rate of 99.5% at 10 GHz. On the other hand, when the length M2 from the other end of the straight portion to the curved portion of the U-shaped sub-conductor pattern 220 is 0.60 mm or 0.50 mm, the band of electromagnetic waves absorbed is greater than 10 GHz, and electromagnetic waves The absorption rates can be reduced to 98.3% and 96.1%, respectively. That is, the unit cell 10b of the metamaterial absorber has the maximum electromagnetic wave absorption at 10 GHz when the length M2 from the other end of the straight portion of the U-shaped sub-conductor pattern 220 to the curved portion is 0.70 mm. can have

As shown in FIG. 10c, in the unit cell 10b of the metamaterial absorber, when the length (P2) of one side of the intermediate layer (100b) is 4.0 mm and the thickness (TP2) of the intermediate layer (100b) is 0.20 mm, 99.5 at 10 GHz. % of electromagnetic wave absorption. On the other hand, when the thickness TP2 of the intermediate layer 100b is 0.15 mm, the band of electromagnetic waves absorbed becomes smaller than 10 GHz, and the electromagnetic wave absorption rate may decrease to 94.3%. In addition, when the thickness TP2 of the intermediate layer 100b is 0.25 mm, the band of electromagnetic waves absorbed becomes larger than 10 GHz, and the electromagnetic wave absorption rate may decrease to 91.7%. That is, when the thickness TP2 of the intermediate layer 100b is 0.20 mm, the unit cell 10b of the metamaterial absorber may have maximum electromagnetic wave absorption at 10 GHz.

The length P2 of one side of the intermediate layer 100b is 4.0 mm, the thickness TP2 of the intermediate layer 100b is 0.20 mm, and the straight portion of the U-shaped sub-conductor pattern 220 of the first metal layer 200b is When the length M2 from the other end to the curved portion is 0.70 mm, a change in electromagnetic wave absorption rate of the unit cell 10b of the metamaterial absorber according to a change in the incident angle can be minimized.

When an electromagnetic wave polarized in a transverse-electric mode (TE mode) is incident on the unit cell 10b of the metamaterial absorber, a change in the band of the absorbed electromagnetic wave and a change in the absorbance of the electromagnetic wave may be very small according to a change in the angle of incidence. For example, as shown in FIG. 10D, comparing the case where the angle of incidence of the electromagnetic wave is changed to 15°/ 30°/ 45° and the case where the angle of incidence of the electromagnetic wave is perpendicular (90°), the band of the electromagnetic wave that is absorbed is the maximum. It can be seen that there is only a slight difference of an increase of 0.02 GHz and a maximum decrease of 1.2% in the electromagnetic wave absorption rate, and there is little change in the band of the electromagnetic wave absorbed in the TE mode and no change in the electromagnetic wave absorption rate.

When an electromagnetic wave polarized in a transverse-magnetic mode (TM mode) is incident on the unit cell 10b of the metamaterial absorber, a change in the band of the absorbed electromagnetic wave and a change in the absorbance of the electromagnetic wave may be very small according to a change in the angle of incidence. For example, as shown in FIG. 10E, comparing the case where the angle of incidence of the electromagnetic wave is changed to 15°/ 30°/ 45° and the case where the angle of incidence of the electromagnetic wave is perpendicular (90°), the band of the electromagnetic wave that is absorbed is the maximum. It can be seen that there is only a slight difference, such as an increase of 0.01 GHz and a maximum decrease of 0.1% in the electromagnetic wave absorption rate, and there is little change in the band of electromagnetic waves absorbed in the TM mode and little change in the electromagnetic wave absorption rate.

As such, the unit cell 10b of the metamaterial absorber and the metamaterial absorber according to the present invention can maintain constant electromagnetic wave absorption in the 10 GHz band even when the incident angle of the incident electromagnetic wave is changed. In addition, the unit cell 10b of the metamaterial absorber and the metamaterial absorber according to the present invention may be flexible, thin, and have relatively low manufacturing cost. Therefore, the unit cell 10b of the metamaterial absorber and the metamaterial absorber can maximize electromagnetic wave absorption efficiency in the 10GHz band. For example, when the unit cell 10b of the metamaterial absorber and the metamaterial absorber according to the present invention are used in a naval ship radar in the 10 GHz band, the false target of the radar due to the reflected wave by the mast or pier around the naval ship Since this is reduced, radar performance of naval ships can be improved.

As described above, although the embodiments have been described with limited drawings, those skilled in the art can make various modifications and variations from the above description. For example, the described techniques may be performed in an order different from the method described, and/or components of the described system, structure, device, circuit, etc. may be combined or combined in a different form than the method described, or other components may be used. Or even if it is replaced or substituted by equivalents, appropriate results can be achieved.

Therefore, other implementations, other embodiments, and equivalents of the claims are within the scope of the following claims.

10: unit cell of metamaterial absorber 100: intermediate layer
200: first metal layer 210: square sub-conductor pattern
220: U-shaped sub-conductor pattern 230: Connection sub-conductor pattern
300: second metal layer 1000: metamaterial absorber

Claims (12)

an intermediate layer having a predetermined permittivity and having a square shape;
a first metal layer disposed on one side of the intermediate layer and including a conductor pattern composed of a combination of a plurality of square sub-conductor patterns, a plurality of U-shaped sub-conductor patterns, and a plurality of connection sub-conductor patterns; and
And a second metal layer disposed on the other surface of the intermediate layer,
The U-shaped sub-conductor patterns are spaced apart from the square sub-conductor patterns by a predetermined distance between the adjacent square sub-conductor patterns, and
The U-shaped sub-conductor pattern includes two straight lines extending parallel to each other and a curved part connecting one end of the two straight lines,
The other end of the straight line portion is connected to the square sub-conductor pattern by the connecting sub-conductor pattern;
The curved portion of the U-shaped sub-conductor pattern is disposed toward the inside of the first metal layer,
The curved part of any one of the plurality of U-shaped sub-conductor patterns is disposed to face the curved part of any other one of the plurality of U-shaped sub-conductor patterns at a predetermined distance apart;
The intermediate layer is exposed at least between the square sub-conductor pattern and the U-shaped sub-conductor pattern, between the two straight portions included in the U-shaped sub-conductor pattern, and between the curved portions disposed to face each other. characterized by
Unit cell of metamaterial absorber. According to claim 1,
the conductor pattern is composed of a combination of first to fourth square sub-conductor patterns, first to fourth U-shaped sub-conductor patterns, and first to eighth connection sub-conductor patterns;
The first U-shaped sub-conductor pattern with the curved part facing downward is disposed between the first square sub-conductor pattern and the second square sub-conductor pattern adjacent in the horizontal direction;
The first square sub-conductor pattern and the first U-shaped sub-conductor pattern are connected by the first connection sub-conductor pattern;
The second square sub-conductor pattern and the first U-shaped sub-conductor pattern are connected to the second connection sub-conductor pattern.
Unit cell of metamaterial absorber. According to claim 2,
The second U-shaped sub-conductor pattern with the curved portion facing left is disposed between the second square sub-conductor pattern and the third square sub-conductor pattern adjacent to each other in a vertical direction;
The second square sub-conductor pattern and the second U-shaped sub-conductor pattern are connected to the third connection sub-conductor pattern;
The third square sub-conductor pattern and the second U-shaped sub-conductor pattern are connected to the fourth connection sub-conductor pattern.
Unit cell of metamaterial absorber. According to claim 3,
The third U-shaped sub-conductor pattern with the curved part facing upward is disposed between the third square sub-conductor pattern and the fourth square sub-conductor pattern adjacent to each other in a horizontal direction;
The third square sub-conductor pattern and the third U-shaped sub-conductor pattern are connected to the fifth connection sub-conductor pattern;
The fourth square sub-conductor pattern and the third U-shaped sub-conductor pattern are connected to the sixth connection sub-conductor pattern.
Unit cell of metamaterial absorber. According to claim 4,
The fourth U-shaped sub-conductor pattern with the curved part facing right is disposed between the fourth square sub-conductor pattern and the first square sub-conductor pattern adjacent in a vertical direction;
The fourth square sub-conductor pattern and the fourth U-shaped sub-conductor pattern are connected to the seventh connection sub-conductor pattern;
The first square sub-conductor pattern and the fourth U-shaped sub-conductor pattern are connected to the eighth connection sub-conductor pattern.
Unit cell of metamaterial absorber. According to claim 5,
The first metal layer,
It is left-right symmetric with respect to a first intermediate line dividing the conductor pattern into two parts in the horizontal direction,
Characterized in that it is vertically symmetrical with respect to the second intermediate line dividing the conductor pattern into two equal parts in the vertical direction
Unit cell of metamaterial absorber. According to claim 5,
The intermediate layer is a unit cell of the metamaterial absorber, characterized in that composed of polyimide (Polyimide). According to claim 5,
Characterized in that the length of one side of the intermediate layer is 5.4 mm to 6.6 mm
Unit cell of metamaterial absorber. According to claim 8,
Each of the plurality of U-shaped sub-conductor patterns has a length from the other end of the straight portion to the curved portion of 1.50 mm to 1.80 mm,
Characterized in that the thickness of the intermediate layer is 0.34 mm to 0.40 mm
Unit cell of metamaterial absorber. According to claim 5,
Characterized in that the length of one side of the intermediate layer is 3.6 mm to 4.4 mm
Unit cell of metamaterial absorber. According to claim 10,
Each of the plurality of U-shaped sub-conductor patterns has a length from the other end of the straight portion to the curved portion of 0.63 mm to 0.77 mm,
Characterized in that the thickness of the intermediate layer is 0.18 mm to 0.22 mm
Unit cell of metamaterial absorber. Including a plurality of unit cells having a square shape,
The plurality of unit cells are arranged on the same plane to form a flat structure,
Each of the plurality of unit cells,
an intermediate layer having a predetermined permittivity and having a square shape;
a first metal layer disposed on one side of the intermediate layer and including a conductor pattern composed of a combination of a plurality of square sub-conductor patterns, a plurality of U-shaped sub-conductor patterns, and a plurality of connection sub-conductor patterns; and
And a second metal layer disposed on the other surface of the intermediate layer,
The U-shaped sub-conductor patterns are spaced apart from the square sub-conductor patterns by a predetermined distance between the adjacent square sub-conductor patterns, and
The U-shaped sub-conductor pattern includes two straight lines extending parallel to each other and a curved part connecting one end of the two straight lines,
The other end of the straight line portion is connected to the square sub-conductor pattern by the connecting sub-conductor pattern;
The curved portion of the U-shaped sub-conductor pattern is disposed toward the inside of the first metal layer,
The curved part of any one of the plurality of U-shaped sub-conductor patterns is disposed to face the curved part of any other one of the plurality of U-shaped sub-conductor patterns at a predetermined distance apart;
The intermediate layer is exposed at least between the square sub-conductor pattern and the U-shaped sub-conductor pattern, between the two straight portions included in the U-shaped sub-conductor pattern, and between the curved portions disposed to face each other. characterized by
metamaterial absorber.

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