KR102447718B1 - Novel electroluminescent compound and organic electroluminescent device comprising same - Google Patents
Novel electroluminescent compound and organic electroluminescent device comprising same Download PDFInfo
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Abstract
본 발명의 유기 발광 화합물은 전하전달 특성이 우수하고, 동시에 높은 삼중항 에너지 및 높은 Tg를 가져, 유기발광소자에 적용시 낮은 구동전압, 고효율, 저소비전력, 장수명을 가지게 할 수 있다.The organic light emitting compound of the present invention has excellent charge transfer characteristics, and at the same time has high triplet energy and high Tg, so that it can have low driving voltage, high efficiency, low power consumption, and long life when applied to an organic light emitting device.
Description
본 발명은 신규한 발광 화합물 및 이를 포함하는 유기발광소자에 관한 것이다.The present invention relates to a novel light emitting compound and an organic light emitting device comprising the same.
최근, 자체 발광형으로 저전압 구동이 가능한 유기발광소자는, 평판 표시소자의 주류인 액정디스플레이(LCD, liquid crystal display)에 비해, 시야각, 대조비 등이 우수하고 백라이트가 불필요하여 경량 및 박형이 가능하며 소비전력 측면에서도 유리하고 색 재현 범위가 넓어, 차세대 표시소자로서 주목을 받고 있다.Recently, the organic light emitting device capable of low voltage driving as a self-luminous type has excellent viewing angle and contrast ratio, and does not require a backlight, compared to liquid crystal display (LCD), which is the mainstream of flat panel display devices. It is advantageous in terms of power consumption and has a wide color reproduction range, attracting attention as a next-generation display device.
유기발광소자에서 유기물 층으로 사용되는 재료는 크게 기능에 따라, 발광 재료, 정공주입 재료, 정공수송 재료, 전자수송 재료, 전자주입 재료 등으로 분류될 수 있다. 상기 발광 재료는 분자량에 따라 고분자과 저분자로 분류될 수 있고, 발광 메커니즘에 따라 전자의 일중항 여기상태로부터 유래되는 형광 재료와 전자의 삼중항 여기상태로부터 유래되는 인광 재료로 분류될 수 있으며, 발광 재료는 발광 색에 따라 청색, 녹색, 적색 발광 재료와 보다 나은 천연색을 구현하기 위해 필요한 노란색 및 주황색 발광 재료로 구분될 수 있다. 또한, 색순도의 증가와 에너지 전이를 통한 발광 효율을 증가시키기 위하여, 발광 물질로서 호스트/도판트 계를 사용할 수 있다. 그 원리는 발광층을 주로 구성하는 호스트보다 에너지 대역 간극이 작고 발광 효율이 우수한 도판트를 발광층에 소량 혼합하면, 호스트에서 발생한 엑시톤이 도판트로 수송되어 효율이 높은 빛을 내는 것이다. 이때 호스트의 파장이 도판트의 파장대로 이동하므로, 이용하는 도판트와 호스트의 종류에 따라 원하는 파장의 빛을 얻을 수 있다. Materials used as organic layers in organic light emitting devices may be classified into light emitting materials, hole injection materials, hole transport materials, electron transport materials, electron injection materials, and the like, according to their functions. The light emitting material can be classified into high molecular weight and low molecular weight according to the molecular weight, and can be classified into a fluorescent material derived from a singlet excited state of an electron and a phosphorescent material derived from a triplet excited state of an electron according to a light emitting mechanism. can be divided into blue, green, and red light emitting materials and yellow and orange light emitting materials necessary for realizing better natural colors according to the emission color. In addition, in order to increase color purity and increase luminous efficiency through energy transfer, a host/dopant system may be used as a light emitting material. The principle is that when a small amount of a dopant having a smaller energy band gap and excellent luminous efficiency than the host constituting the light emitting layer is mixed in the light emitting layer in a small amount, excitons generated from the host are transported to the dopant to emit light with high efficiency. At this time, since the wavelength of the host moves to the wavelength band of the dopant, light having a desired wavelength can be obtained according to the type of the dopant and the host used.
현재까지 이러한 유기발광소자에 사용되는 물질로서 다양한 화합물들이 알려져 있으나, 이제까지 알려진 물질을 이용한 유기발광소자의 경우 높은 구동전압, 낮은 효율 및 짧은 수명으로 인해 실용화하는 데에 많은 어려움이 있었다. 따라서, 우수한 특성을 갖는 물질을 이용하여 저전압 구동, 고휘도 및 장수명을 갖는 유기발광소자를 개발하려는 노력이 지속되어 왔다. To date, various compounds are known as materials used in such organic light emitting devices, but in the case of organic light emitting devices using known materials, there have been many difficulties in practical application due to high driving voltage, low efficiency and short lifespan. Accordingly, efforts have been made to develop an organic light emitting diode having low voltage driving, high luminance, and long lifespan using a material having excellent properties.
상기와 같은 문제점을 해결하기 위해, 본 발명은 전하전달 특성이 우수하고, 동시에 높은 삼중항 에너지 및 높은 Tg를 가져, 유기발광소자에 적용시 낮은 구동전압, 고효율, 저소비전력, 장수명을 가지게 할 수 있는 신규한 발광 화합물을 제공하는 것을 목적으로 한다.In order to solve the above problems, the present invention has excellent charge transfer characteristics, and at the same time has high triplet energy and high Tg, so that when applied to an organic light emitting device, it can have low driving voltage, high efficiency, low power consumption, and long life. An object of the present invention is to provide a novel light emitting compound.
본 발명은 또한 상기 화합물을 포함하여 낮은 구동전압, 고효율, 저소비전력, 장수명 구현이 가능한 유기발광소자를 제공하는 것을 목적으로 한다.Another object of the present invention is to provide an organic light emitting device capable of realizing a low driving voltage, high efficiency, low power consumption, and long life including the above compound.
상기 목적을 달성하기 위해 본 발명은 하기 화학식 1로 표시되는 발광 화합물을 제공한다:In order to achieve the above object, the present invention provides a light emitting compound represented by the following formula (1):
[화학식 1][Formula 1]
상기 식에서,In the above formula,
X는 각각 독립적으로 CR0 또는 N이며, 여기서 X중 적어도 하나는 N이며, R0는 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며,each X is independently CR 0 or N, wherein at least one of X is N and R 0 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group substituted or unsubstituted with deuterium, halogen, amino group, nitrile group, nitro group,
Y는 S, O, Se, Te 또는 -NAr1이며, 여기서 Ar1은 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,Y is S, O, Se, Te or -NAr 1 , wherein Ar 1 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group substituted or unsubstituted with deuterium, halogen, amino group, nitrile group, nitro group,
R1은 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,R 1 is deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 A C 6-50 aryl group unsubstituted or substituted with an aryloxy group, C 6-30 aryl group, or C 2-30 heteroaryl group; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl an oxy group, a C 6-30 aryl group, or a C 2-50 heteroaryl group that is unsubstituted or substituted with a C 2-30 heteroaryl group,
R2 및 R3은 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이다.R 2 and R 3 are each independently hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; or a C 2-50 heteroaryl group that is unsubstituted or substituted with deuterium, halogen, amino, nitrile, or nitro.
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 발광물질로서 유기물층에 포함하는 유기발광소자를 제공한다.In addition, the present invention provides an organic light emitting device comprising the compound represented by Formula 1 as a light emitting material in an organic material layer.
본 발명의 발광 화합물은 전하전달 특성이 우수하고, 동시에 높은 삼중항 에너지 및 높은 Tg를 가져, 유기발광소자에 적용시 낮은 구동전압, 고효율, 저소비전력, 장수명을 가지게 할 수 있다.The light emitting compound of the present invention has excellent charge transfer characteristics, and at the same time has high triplet energy and high Tg, so that it can have low driving voltage, high efficiency, low power consumption, and long life when applied to an organic light emitting device.
도 1은 본 발명의 일 실시예에 따른 OLED의 단면을 개략적으로 도시한 것이다.
도면의 부호
10 : 기판
11 : 양극
12 : 정공주입층
13 : 정공전달층
14 : 발광층
15 : 전자전달층
16: 음극1 schematically shows a cross-section of an OLED according to an embodiment of the present invention.
drawing sign
10: substrate
11: positive electrode
12: hole injection layer
13: hole transport layer
14: light emitting layer
15: electron transport layer
16: cathode
본 발명의 화합물은 하기 화학식 1로 표시되는 것을 특징으로 한다.The compound of the present invention is characterized in that it is represented by the following formula (1).
[화학식 1][Formula 1]
상기 식에서,In the above formula,
X는 각각 독립적으로 CR0 또는 N이며, 여기서 X중 적어도 하나는 N이며, R0는 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며,each X is independently CR 0 or N, wherein at least one of X is N and R 0 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group substituted or unsubstituted with deuterium, halogen, amino group, nitrile group, nitro group,
Y는 S, O, Se, Te 또는 -NAr1이며, 여기서 Ar1은 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,Y is S, O, Se, Te or -NAr 1 , wherein Ar 1 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group substituted or unsubstituted with deuterium, halogen, amino group, nitrile group, nitro group,
R1은 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고, R 1 is deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 A C 6-50 aryl group unsubstituted or substituted with an aryloxy group, C 6-30 aryl group, or C 2-30 heteroaryl group; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl an oxy group, a C 6-30 aryl group, or a C 2-50 heteroaryl group that is unsubstituted or substituted with a C 2-30 heteroaryl group,
R2 및 R3은 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이다.R 2 and R 3 are each independently hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; or a C 2-50 heteroaryl group that is unsubstituted or substituted with deuterium, halogen, amino, nitrile, or nitro.
본 발명에 있어서, 상기 화학식 1로 표시되는 화합물은 하기와 같은 구조일 수 있다.In the present invention, the compound represented by Formula 1 may have the following structure.
상기 구조들에서 X, Y는 상기 화학식 1에서 정의한 바와 같으며, In the above structures, X and Y are as defined in Formula 1,
Z는 CR6 또는 N이며, R6는 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고, Z is CR 6 or N, R 6 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-50 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group substituted or unsubstituted with deuterium, halogen, amino group, nitrile group, nitro group,
Ar은 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-38의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-38의 헤테로아릴기이며,Ar is deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 C 6-38 aryl group unsubstituted or substituted with an aryloxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl an oxy group, a C 6-30 aryl group, or a C 6-38 heteroaryl group that is unsubstituted or substituted with a C 2-30 heteroaryl group,
Y1은 S, O, Se, Te 또는 -NAr2이며, 여기서 Ar2는 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 헤테로아릴기이고, Y 1 is S, O, Se, Te or -NAr 2 , wherein Ar 2 is hydrogen; heavy hydrogen; a C 1-30 alkyl group substituted with or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkynyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; a C 1-30 alkoxy group substituted or unsubstituted with deuterium, a halogen, an amino group, a nitrile group, or a nitro group; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-30 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-30 heteroaryl group that is unsubstituted or substituted with a deuterium, halogen, amino group, nitrile group, or nitro group,
R4 및 R5는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, 로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기 로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 헤테로아릴기이며, R 4 and R 5 are each independently hydrogen; heavy hydrogen; Deuterium, halogen, amino group, nitrile group, nitro group substituted or unsubstituted C 1-30 alkyl group; C 2-30 alkenyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Deuterium, halogen, amino group, nitrile group, nitro group, or unsubstituted C 2-30 alkynyl group; a C 1-30 alkoxy group that is unsubstituted or substituted with deuterium, halogen, amino, nitrile, or nitro; C 6-30 aryloxy group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, or nitro group; C 6-30 aryl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-30 heteroaryl group that is unsubstituted or substituted with a deuterium, halogen, amino group, nitrile group, or nitro group,
n은 1 내지 6의 정수이며, n이 1인 경우 X 중 적어도 하나는 N이다.n is an integer from 1 to 6, and when n is 1, at least one of X is N.
본 발명에 있어서, 상기 화학식 1로 표시되는 화합물의 바람직한 예는 다음과 같다:In the present invention, preferred examples of the compound represented by Formula 1 are as follows:
본 발명에 따른 화학식 1의 화합물은 전하전달 특성이 우수하고, 동시에 높은 삼중항 에너지 및 높은 Tg를 가져, 유기발광소자에 적용시 낮은 구동전압, 고효율, 저소비전력, 장수명을 가지게 할 수 있다.The compound of Formula 1 according to the present invention has excellent charge transfer characteristics, and at the same time has high triplet energy and high Tg, so that it can have low driving voltage, high efficiency, low power consumption, and long life when applied to an organic light emitting device.
또한 본 발명은 하기 반응식 1과 같은 단계를 포함하여 제조될 수 있다:In addition, the present invention can be prepared by including the steps shown in Scheme 1:
[반응식 1][Scheme 1]
상기 반응식 1은 구체적인 일예로 하기 반응식 1-1일 수 있다.Scheme 1 may be the following Scheme 1-1 as a specific example.
[반응식 1-1][Scheme 1-1]
상기 반응식들에서 정의되지 않은 부분은 화학식 1에서 정의된 바와 같다. Parts not defined in the above Schemes are as defined in Formula 1.
또한, 본 발명은 발광물질로서 상기 화학식 1로 표시되는 화합물을 유기물층에 포함하는 유기발광소자를 제공한다. 이때, 본 발명의 화합물은 단독으로 사용되거나 공지의 유기발광 화합물과 함께 사용될 수 있다.In addition, the present invention provides an organic light emitting device comprising the compound represented by Formula 1 as a light emitting material in an organic material layer. In this case, the compound of the present invention may be used alone or in combination with a known organic light emitting compound.
또한 본 발명의 유기발광소자는 상기 화학식 1로 표시되는 화합물을 포함하는 1층 이상의 유기물층을 포함하는 바, 상기 유기발광소자의 제조방법을 설명하면 다음과 같다.In addition, since the organic light emitting device of the present invention includes one or more organic material layers including the compound represented by Formula 1, a method of manufacturing the organic light emitting device will be described as follows.
상기 유기발광소자는 애노드(anode)와 캐소드(cathod) 사이에 정공주입층(HIL), 정공수송층(HTL), 발광층(EML), 전자수송층(ETL), 전자주입층(EIL) 등의 유기물층을 1 개 이상 포함할 수 있다.The organic light emitting device includes an organic material layer such as a hole injection layer (HIL), a hole transport layer (HTL), a light emitting layer (EML), an electron transport layer (ETL), and an electron injection layer (EIL) between an anode and a cathode. It may contain more than one.
먼저, 기판 상부에 높은 일함수를 갖는 애노드 전극용 물질을 증착시켜 애노드를 형성한다. 이때, 상기 기판은 통상의 유기발광소자에서 사용되는 기판을 사용할 수 있으며, 특히 기계적 강도, 열적 안정성, 투명성, 표면평활성, 취급용이성, 및 방수성이 우수한 유리 기판 또는 투명 플라스틱 기판을 사용하는 것이 좋다. 또한, 애노드 전극용 물질로는 투명하고 전도성이 우수한 산화인듐주석(ITO), 산화인듐아연(IZO), 산화주석(SnO2), 산화아연(ZnO) 등을 사용할 수 있다. 상기 애노드 전극용 물질은 통상의 애노드 형성방법에 의해 증착할 수 있으며, 구체적으로 증착법 또는 스퍼터링법에 의해 증착할 수 있다.First, an anode is formed by depositing a material for an anode electrode having a high work function on a substrate. In this case, as the substrate, a substrate used in a conventional organic light emitting device may be used, and in particular, it is preferable to use a glass substrate or a transparent plastic substrate excellent in mechanical strength, thermal stability, transparency, surface smoothness, ease of handling, and water resistance. In addition, as the material for the anode electrode, indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO 2 ), zinc oxide (ZnO), etc., which are transparent and have excellent conductivity, may be used. The material for the anode electrode may be deposited by a conventional anode forming method, and specifically, may be deposited by a deposition method or a sputtering method.
그 다음, 상기 애노드 전극 상부에 정공주입층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB(Langmuir-Blodgett)법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 또한 핀정공이 발생하기 어렵다는 등의 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공주입층을 형성하는 경우 그 증착조건은 정공주입층의 재료로서 사용하는 화합물, 목적하는 정공주입층의 구조 및 열적특성 등에 따라 다르지만, 일반적으로 50-500 ℃의 증착온도, 10-8 내지 10-3 torr의 진공도, 0.01 내지 100 Å/sec의 증착속도, 10 Å 내지 5 ㎛의 층 두께 범위에서 적절히 선택하는 것이 바람직하다.Then, the hole injection layer material on the anode electrode can be formed by a method such as vacuum deposition, spin coating, casting, LB (Langmuir-Blodgett) method, etc., but it is easy to obtain a uniform film quality, and also It is preferable to form by the vacuum evaporation method from the point of being difficult to generate|occur|produce. In the case of forming the hole injection layer by the vacuum deposition method, the deposition conditions vary depending on the compound used as the material of the hole injection layer, the structure and thermal characteristics of the desired hole injection layer, etc., but in general, a deposition temperature of 50-500 ℃, It is preferable to appropriately select a vacuum degree of 10 -8 to 10 -3 torr, a deposition rate of 0.01 to 100 Å/sec, and a layer thickness of 10 Å to 5 μm.
상기 정공주입층 물질은 특별히 제한되지 않으며, 미국특허 제4,356,429호에 개시된 구리 프탈로시아닌 등의 프탈로시아닌 화합물 또는 스타버스트형 아민 유도체류인 TCTA(4,4',4"-트리(N-카바졸릴)트리페닐아민), m-MTDATA(4,4',4"-트리스(3-메틸페닐아미노)트리페닐아민), m-MTDAPB(4,4',4"-트리스(3-메틸페닐아미노)페녹시벤젠), HI-406(N1,N1'-(비페닐-4,4'-디일)비스(N1-(나프탈렌-1-일)-N4,N4-디페닐벤젠-1,4-디아민) 등을 정공주입층 물질로 사용할 수 있다.The hole injection layer material is not particularly limited, and TCTA (4,4',4"-tri(N-carbazolyl)tri, which is a phthalocyanine compound such as copper phthalocyanine or starburst-type amine derivatives disclosed in US Patent No. 4,356,429. phenylamine), m-MTDATA (4,4',4"-tris(3-methylphenylamino)triphenylamine), m-MTDAPB(4,4',4"-tris(3-methylphenylamino)phenoxybenzene ), HI-406(N 1 ,N 1 '-(biphenyl-4,4'-diyl)bis(N 1 -(naphthalen-1-yl)-N 4 ,N 4 -diphenylbenzene-1,4 -diamine) and the like may be used as the hole injection layer material.
다음으로 상기 정공주입층 상부에 정공수송층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공수송층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.Next, the hole transport layer material on the hole injection layer can be formed by a method such as vacuum deposition, spin coating, casting, LB method, etc., but it is easy to obtain a uniform film quality, It is preferable to form by vapor deposition. In the case of forming the hole transport layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, it is preferable to select within the same range of conditions as those for the formation of the hole injection layer.
또한, 상기 정공수송층 물질은 특별히 제한되지는 않으며, 정공수송층에 사용되고 있는 통상의 공지 물질 중에서 임의로 선택하여 사용할 수 있다. 구체적으로, 상기 정공수송층 물질은 N-페닐카바졸, 폴리비닐카바졸 등의 카바졸 유도체, N,N'-비스(3-메틸페닐)-N,N'-디페닐-[1,1-비페닐]-4,4'-디아민(TPD), N.N'-디(나프탈렌-1-일)-N,N'-디페닐 벤지딘(α-NPD) 등의 방향족 축합환을 가지는 통상의 아민 유도체 등이 사용될 수 있다.In addition, the hole transport layer material is not particularly limited, and may be arbitrarily selected from commonly known materials used for the hole transport layer. Specifically, the hole transport layer material is a carbazole derivative such as N-phenylcarbazole and polyvinylcarbazole, N,N'-bis(3-methylphenyl)-N,N'-diphenyl-[1,1-bi Ordinary amines having an aromatic condensed ring, such as phenyl]-4,4'-diamine (TPD), N.N'-di(naphthalen-1-yl)-N,N'-diphenyl benzidine (α-NPD), etc. derivatives and the like can be used.
그 후, 상기 정공수송층 상부에 발광층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 발광층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다. 또한, 상기 발광층 재료는 본 발명의 화학식 1로 표시되는 화합물을 호스트 또는 도펀트로 사용할 수 있다.Thereafter, the light emitting layer material on the hole transport layer can be formed by methods such as vacuum deposition, spin coating, casting, LB, etc., but it is easy to obtain a uniform film quality and it is difficult to generate pin holes. It is preferable to form by In the case of forming the light emitting layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, it is preferable to select it within the same range of conditions as those for the formation of the hole injection layer. In addition, as the light emitting layer material, the compound represented by Formula 1 of the present invention may be used as a host or a dopant.
상기 화학식 1로 표시되는 화합물을 발광 호스트로 사용하는 경우, 인광 또는 형광 도펀트를 함께 사용하여 발광층을 형성할 수 있다. 이때, 형광 도펀트로는 이데미츠사(Idemitsu사)에서 구입 가능한 IDE102 또는 IDE105, 또는 BD142(N6,N12-비스(3,4-디메틸페닐)-N6,N12-디메시틸크리센-6,12-디아민)를 사용할 수 있으며, 인광 도펀트로는 녹색 인광 도펀트 Ir(ppy)3(트리스(2-페닐피리딘) 이리듐), 청색 인광 도펀트인 F2Irpic(이리듐(Ⅲ) 비스[4,6-다이플루오로페닐)-피리디나토-N,C2'] 피콜린산염), UDC사의 적색 인광 도펀트 RD61 등이 공동 진공증착(도핑)될 수 있다. 도펀트의 도핑농도는 특별히 제한되지 않으나, 호스트 100 중량부 대비 도펀트가 0.01 내지 15 중량부로 도핑되는 것이 바람직하다. 만약 도펀트의 함량이 0.01 중량부 미만일 경우에는 도펀트량이 충분치 못하여 발색이 제대로 이루어지지 않는다는 문제점이 있으며, 15 중량부를 초과할 경우에는 농도 소광 현상으로 인해 효율이 급격히 감소된다는 문제점이 있다.When the compound represented by Formula 1 is used as a light emitting host, a phosphorescent or fluorescent dopant may be used together to form the light emitting layer. In this case, as a fluorescent dopant, IDE102 or IDE105, or BD142 (N 6 ,N 12 -bis(3,4-dimethylphenyl)-N 6 ,N 12 -dimethylchrysene-, available from Idemitsu) 6,12-diamine) can be used, and the phosphorescent dopant is a green phosphorescent dopant Ir(ppy) 3 (tris(2-phenylpyridine) iridium), and a blue phosphorescent dopant F2Irpic (iridium(III) bis[4,6- Difluorophenyl)-pyridinato-N,C2'] picolinic acid salt), UDC's red phosphorescent dopant RD61, etc. may be co-evacuated (doped). The doping concentration of the dopant is not particularly limited, but it is preferable that the dopant be doped in an amount of 0.01 to 15 parts by weight relative to 100 parts by weight of the host. If the dopant content is less than 0.01 parts by weight, there is a problem that the color development is not performed properly because the dopant amount is insufficient.
또한, 발광층에 인광 도펀트와 함께 사용할 경우에는 삼중항 여기자 또는 정공이 전자수송층으로 확산되는 현상을 방지하기 위하여 정공억제재료(HBL)를 추가로 진공증착법 또는 스핀코팅법에 의해 적층시키는 것이 바람직하다. 이때 사용할 수 있는 정공억제물질은 특별히 제한되지는 않으나, 정공억제재료로 사용되고 있는 공지의 것에서 임의의 것을 선택해서 이용할 수 있다. 예를 들면, 옥사디아졸 유도체나 트리아졸 유도체, 페난트롤린 유도체, 또는 일본특개평 11-329734(A1)에 기재되어 있는 정공억제재료 등을 들 수 있으며, 대표적으로 Balq(비스(8-하이드록시-2-메틸퀴놀리놀나토)-알루미늄 비페녹사이드), 페난트롤린(phenanthrolines)계 화합물(예: UDC사 BCP(바쏘쿠프로인)) 등을 사용할 수 있다.In addition, when used together with a phosphorescent dopant in the light emitting layer, in order to prevent a phenomenon in which triplet excitons or holes are diffused into the electron transport layer, it is preferable to further laminate a hole blocking material (HBL) by vacuum deposition or spin coating. At this time, the hole-blocking material that can be used is not particularly limited, and any one of known hole-blocking materials used as a hole-blocking material can be selected and used. For example, an oxadiazole derivative, a triazole derivative, a phenanthroline derivative, or a hole-inhibiting material described in Japanese Patent Application Laid-Open No. Hei 11-329734 (A1), etc. are mentioned. Representatively, Balq (bis(8-hyde) Roxy-2-methylquinolinol nato)-aluminum biphenoxide), phenanthrolines-based compounds (eg, UDC's BCP (vasocuproin)), etc. may be used.
상기와 같이 형성된 발광층 상부에는 전자수송층이 형성되는데, 이때 상기 전자수송층은 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.An electron transport layer is formed on the light emitting layer formed as described above. In this case, the electron transport layer is formed by a vacuum deposition method, a spin coating method, a casting method, etc., and is particularly preferably formed by a vacuum deposition method.
상기 전자수송층 재료는 전자주입전극으로부터 주입된 전자를 안정하게 수송하는 기능을 하는 것으로서 그 종류가 특별히 제한되지는 않으며, 예를 들어 퀴놀린 유도체, 특히 트리스(8-퀴놀리놀라토)알루미늄(Alq3), 또는 ET4(6,6'-(3,4-디메시틸-1,1-디메틸-1H-실올-2,5-디일)디-2,2'-비피리딘)을 사용할 수 있다. 또한, 전자수송층 상부에 캐소드로부터 전자의 주입을 용이하게 하는 기능을 가지는 물질인 전자주입층(EIL)이 적층될 수 있으며, 전자주입층 물질로는 LiF, NaCl, CsF, Li2O, BaO 등의 물질을 이용할 수 있다.The electron transport layer material functions to stably transport electrons injected from the electron injection electrode, and the type thereof is not particularly limited. For example, a quinoline derivative, particularly tris(8-quinolinolato)aluminum (Alq 3 ) ), or ET4 (6,6'-(3,4-dimethyl-1,1-dimethyl-1H-silol-2,5-diyl)di-2,2'-bipyridine) can be used. In addition, an electron injection layer (EIL), which is a material having a function of facilitating the injection of electrons from the cathode, may be stacked on the electron transport layer, and as the electron injection layer material, LiF, NaCl, CsF, Li 2 O, BaO, etc. material can be used.
또한, 상기 전자수송층의 증착조건은 사용하는 화합물에 따라 다르지만, 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.In addition, although the deposition conditions of the electron transport layer vary depending on the compound used, in general, it is preferable to select the electron transport layer within the same range of conditions as those for the formation of the hole injection layer.
그 뒤, 상기 전자수송층 상부에 전자주입층 물질을 형성할 수 있으며, 이때 상기 전자수송층은 통상의 전자주입층 물질을 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.Thereafter, an electron injection layer material may be formed on the electron transport layer, in which case the electron transport layer is formed by vacuum deposition, spin coating, casting, etc., of a conventional electron injection layer material, particularly in a vacuum deposition method. It is preferable to form by
마지막으로 전자주입층 상부에 캐소드 형성용 금속을 진공증착법이나 스퍼터링법 등의 방법에 의해 형성하고 캐소드로 사용한다. 여기서 캐소드 형성용 금속으로는 낮은 일함수를 가지는 금속, 합금, 전기전도성 화합물, 및 이들의 혼합물을 사용할 수 있다. 구체적인 예로는 리튬(Li), 마그네슘(Mg), 알루미늄(Al), 알루미늄-리튬(Al-Li), 칼슘(Ca), 마그네슘-인듐(Mg-In), 마그네슘-은(Mg-Ag) 등이 있다. 또한, 전면 발광소자를 얻기 위하여 ITO, IZO를 사용한 투과형 캐소드를 사용할 수도 있다.Finally, a metal for forming a cathode on the electron injection layer is formed by a method such as a vacuum deposition method or a sputtering method and used as a cathode. Here, as the metal for forming the cathode, a metal having a low work function, an alloy, an electrically conductive compound, and a mixture thereof may be used. Specific examples include lithium (Li), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), etc. There is this. In addition, in order to obtain a top light emitting device, a transmissive cathode using ITO or IZO may be used.
본 발명의 유기발광소자는 애노드, 정공주입층, 정공수송층, 발광층, 전자수송층, 전자주입층, 캐소드 구조의 유기발광소자 뿐만 아니라, 다양한 구조의 유기발광소자의 구조가 가능하며, 필요에 따라 1층 또는 2층의 중간층을 더 형성하는 것도 가능하다.The organic light emitting device of the present invention may have an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an organic light emitting device having a cathode structure, as well as a structure of an organic light emitting device of various structures is possible, if necessary, 1 It is also possible to further form a layer or an intermediate layer of two layers.
상기와 같이 본 발명에 따라 형성되는 각 유기물층의 두께는 요구되는 정도에 따라 조절할 수 있으며, 바람직하게는 10 내지 1,000 ㎚이며, 더욱 바람직하게는 20 내지 150 ㎚인 것이 좋다.As described above, the thickness of each organic material layer formed according to the present invention can be adjusted according to the required degree, preferably 10 to 1,000 nm, more preferably 20 to 150 nm.
또한 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기물층은 유기물층의 두께를 분자 단위로 조절할 수 있기 때문에 표면이 균일하며, 형태안정성이 뛰어난 장점이 있다.In the present invention, the organic material layer including the compound represented by Formula 1 has a uniform surface and excellent morphological stability because the thickness of the organic material layer can be adjusted in molecular units.
본 발명의 유기발광소자는 전하전달 특성이 우수하고, 동시에 높은 삼중항 에너지 및 높은 Tg를 가지는 화학식 1로 표시되는 화합물을 포함하여 낮은 구동전압, 고효율, 저소비전력, 장수명을 구현할 수 있다.The organic light emitting diode of the present invention has excellent charge transfer characteristics, and at the same time includes the compound represented by Formula 1 having high triplet energy and high Tg, thereby implementing low driving voltage, high efficiency, low power consumption, and long life.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, preferred examples are presented to help the understanding of the present invention, but the following examples are only illustrative of the present invention and the scope of the present invention is not limited to the following examples.
중간체 합성intermediate synthesis
하기 합성법에 따라 스즈키 반응 후 고리화하여 중간체를 합성한다.The intermediate is synthesized by cyclization after the Suzuki reaction according to the following synthesis method.
[중간체 01의 합성][Synthesis of Intermediate 01]
[중간체 1-1의 합성][Synthesis of Intermediate 1-1]
둥근바닥플라스크에 benzofuran-3-ylboronic acid 95.7 g, 2-bromo-3-nitropyridine 100 g을 톨루엔 1000 ml에 녹이고 K2CO3(2M) 730 ml와 Pd(PPh3)4 17.1 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 1-1 93.4 g (수율 79%)를 얻었다.Dissolve 95.7 g of benzofuran-3-ylboronic acid and 100 g of 2-bromo-3-nitropyridine in 1000 ml of toluene in a round-bottom flask, add 730 ml of K 2 CO 3 (2M) and 17.1 g of Pd(PPh 3 ) 4 , and reflux stirred. The reaction was confirmed by TLC, and the reaction was terminated after addition of water. The organic layer was extracted with EA, filtered under reduced pressure, and purified by column to obtain 93.4 g of Intermediate 1-1 (yield 79%).
[중간체 01의 합성][Synthesis of Intermediate 01]
상기 중간체 1-1 93 g을 1,2-dichlorobenzene 460 ml에 녹인 후 P(OEt)3 380 ml를 첨가하여 환류 교반하였다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 중간체 01 28.2 g (수율 35%)를 얻었다.93 g of Intermediate 1-1 was dissolved in 460 ml of 1,2-dichlorobenzene, 380 ml of P(OEt) 3 was added thereto, and the mixture was stirred under reflux. The organic layer was extracted with MC, filtered under reduced pressure, and column purified to obtain 28.2 g of Intermediate 01 (yield 35%).
[기타 중간체의 합성][Synthesis of other intermediates]
중간체 01의 합성과 같은 방법으로 benzofuran-3-ylboronic acid 대신 benzo[b]thiophen-3-ylboronic acid, (1-phenyl-1H-indol-3-yl)boronic acid, 3-bromofuro[3,2-b]pyridine, 3-bromofuro[2,3-b]pyridine, 3-bromofuro[2,3-c]pyridine, 3-bromofuro[3,2-c]pyridine, 7-bromofuro[3,2-d]pyrimidine, 5-bromofuro[2,3-d]pyrimidine, 7-bromofuro[2,3-b]pyrazine, 3-bromothieno[3,2-b]pyridine, 3-bromothieno[2,3-b]pyridine, 3-bromothieno[2,3-c]pyridine, 3-bromothieno[3,2-c]pyridine, 7-bromothieno[3,2-d]pyrimidine, 5-bromothieno[2,3-d]pyrimidine, 7-bromothieno[2,3-b]pyrazine을 사용하고, 2-bromo-3-nitropyridine 대신 3-bromo-2-nitropyridine, 4-bromo-3-nitropyridine, 3-bromo-4-nitropyridine, 4-bromo-5-nitropyrimidine, 5-bromo-4-nitropyrimidine, 2-bromo-3-nitropyrazine을 사용하여 하기 중간체 02 내지 135를 합성하였다.In the same way as in the synthesis of Intermediate 01, instead of benzofuran-3-ylboronic acid, benzo[b]thiophen-3-ylboronic acid, (1-phenyl-1H-indol-3-yl)boronic acid, 3-bromofuro[3,2- b]pyridine, 3-bromofuro[2,3-b]pyridine, 3-bromofuro[2,3-c]pyridine, 3-bromofuro[3,2-c]pyridine, 7-bromofuro[3,2-d] pyrimidine, 5-bromofuro[2,3-d]pyrimidine, 7-bromofuro[2,3-b]pyrazine, 3-bromothieno[3,2-b]pyridine, 3-bromothieno[2,3-b]pyridine, 3-bromothieno[2,3-c]pyridine, 3-bromothieno[3,2-c]pyridine, 7-bromothieno[3,2-d]pyrimidine, 5-bromothieno[2,3-d]pyrimidine, 7- Use bromothieno[2,3-b]pyrazine, 3-bromo-2-nitropyridine, 4-bromo-3-nitropyridine, 3-bromo-4-nitropyridine, 4-bromo-5 instead of 2-bromo-3-nitropyridine The following intermediates 02 to 135 were synthesized using -nitropyrimidine, 5-bromo-4-nitropyrimidine, and 2-bromo-3-nitropyrazine.
실시예 1: 화합물 1의 합성Example 1: Synthesis of compound 1
상기 중간체 01 2.0 g, 9-(3'-bromo-[1,1'-biphenyl]-3-yl)-9H-carbazole 4.6 g, t-BuONa 1.4 g, Pd2(dba)3 0.35 g, (t-Bu)3P 0.5 ml를 톨루엔 30 ml에 녹인 후 환류 교반하였다. TLC로 반응 종결을 확인한 후 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 화합물 1 1.77 g (수율 35%)를 얻었다.2.0 g of intermediate 01, 9-(3'-bromo-[1,1'-biphenyl]-3-yl)-9H-carbazole 4.6 g, t-BuONa 1.4 g, Pd 2 (dba) 3 0.35 g, ( t-Bu) 3 P 0.5 ml was dissolved in 30 ml of toluene and stirred under reflux. After confirming the completion of the reaction by TLC, the organic layer was extracted with MC, filtered under reduced pressure, and column purified to obtain 1.77 g of Compound 1 (yield 35%).
m/z: 525.18 (100.0%), 526.19 (40.3%), 527.19 (8.1%), 528.19 (1.2%), 526.18 (1.1%)m/z: 525.18 (100.0%), 526.19 (40.3%), 527.19 (8.1%), 528.19 (1.2%), 526.18 (1.1%)
실시예 2: 화합물 2의 합성Example 2: Synthesis of compound 2
상기 중간체 05를 사용한 것을 제외하고는 화합물 1과 같은 방법으로 화합물 2를 합성하였다.Compound 2 was synthesized in the same manner as in Compound 1, except that Intermediate 05 was used.
m/z: 526.18 (100.0%), 527.18 (40.5%), 528.19 (7.5%), 529.19 (1.0%)m/z: 526.18 (100.0%), 527.18 (40.5%), 528.19 (7.5%), 529.19 (1.0%)
실시예 3: 화합물 3의 합성Example 3: Synthesis of compound 3
상기 중간체 33을 사용한 것을 제외하고는 화합물 1과 같은 방법으로 화합물 3을 합성하였다.Compound 3 was synthesized in the same manner as in Compound 1, except that Intermediate 33 was used.
m/z: 542.16 (100.0%), 543.16 (40.0%), 544.16 (8.3%), 544.15 (4.5%), 545.16 (1.9%), 543.15 (1.5%)m/z: 542.16 (100.0%), 543.16 (40.0%), 544.16 (8.3%), 544.15 (4.5%), 545.16 (1.9%), 543.15 (1.5%)
실시예 4: 화합물 4의 합성Example 4: Synthesis of compound 4
상기 중간체 86을 사용한 것을 제외하고는 화합물 1과 같은 방법으로 화합물 4를 합성하였다.Compound 4 was synthesized in the same manner as in Compound 1, except that Intermediate 86 was used.
m/z: 542.16 (100.0%), 543.16 (40.0%), 544.16 (8.3%), 544.15 (4.5%), 545.16 (1.9%), 543.15 (1.5%)m/z: 542.16 (100.0%), 543.16 (40.0%), 544.16 (8.3%), 544.15 (4.5%), 545.16 (1.9%), 543.15 (1.5%)
실시예 5: 화합물 5의 합성Example 5: Synthesis of compound 5
상기 중간체 29 3.0 g, 3,3'-dibromo-1,1'-biphenyl 4.3 g, t-BuONa 2.1 g, Pd2(dba)3 0.53 g, (t-Bu)3P 0.3 ml를 톨루엔 45 ml에 녹인 후 환류 교반하였다. TLC로 반응 종결을 확인한 후 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 화합물 5 2.69 g (수율 33%)를 얻었다.Intermediate 29 3.0 g, 3,3'-dibromo-1,1'-biphenyl 4.3 g, t-BuONa 2.1 g, Pd 2 (dba) 3 0.53 g, (t-Bu) 3 P 0.3 ml 45 ml toluene After dissolving in the reflux was stirred. After confirming the completion of the reaction by TLC, the organic layer was extracted with MC, filtered under reduced pressure, and column purified to obtain 2.69 g of Compound 5 (yield 33%).
m/z: 598.13 (100.0%), 599.13 (44.4%), 600.12 (9.0%), 600.14 (8.3%), 601.13 (4.0%), 600.13 (1.3%), 601.14 (1.1%)m/z: 598.13 (100.0%), 599.13 (44.4%), 600.12 (9.0%), 600.14 (8.3%), 601.13 (4.0%), 600.13 (1.3%), 601.14 (1.1%)
실시예 6: 화합물 6의 합성Example 6: Synthesis of compound 6
상기 중간체 18을 사용한 것을 제외하고는 화합물 5와 같은 방법으로 화합물 6을 합성하였다.Compound 6 was synthesized in the same manner as in Compound 5, except that Intermediate 18 was used.
m/z: 716.27 (100.0%), 717.27 (56.3%), 718.28 (14.5%), 719.28 (2.5%), 718.27 (1.2%)m/z: 716.27 (100.0%), 717.27 (56.3%), 718.28 (14.5%), 719.28 (2.5%), 718.27 (1.2%)
실시예 7: 화합물 7의 합성Example 7: Synthesis of compound 7
상기 중간체 01 3.0 g, 2-bromodibenzo[b,d]thiophene 3.8 g, t-BuONa 1.7 g, Pd2(dba)3 0.44 g, (t-Bu)3P 0.6 ml를 톨루엔 40 ml에 녹인 후 환류 교반하였다. TLC로 반응 종결을 확인한 후 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 화합물 7 1.78g (수율 38%)를 얻었다.3.0 g of Intermediate 01, 3.8 g of 2-bromodibenzo[b,d]thiophene, 1.7 g of t-BuONa, 0.44 g of Pd 2 (dba) 3 , and 0.6 ml of (t-Bu) 3 P were dissolved in 40 ml of toluene and refluxed. stirred. After confirming the completion of the reaction by TLC, the organic layer was extracted with MC, filtered under reduced pressure, and column purified to obtain 1.78 g of Compound 7 (yield 38%).
m/z: 390.08 (100.0%), 391.09 (27.2%), 392.08 (4.7%), 392.09 (4.0%), 391.08 (1.5%), 393.08 (1.3%)m/z: 390.08 (100.0%), 391.09 (27.2%), 392.08 (4.7%), 392.09 (4.0%), 391.08 (1.5%), 393.08 (1.3%)
실시예 8: 화합물 8의 합성Example 8: Synthesis of compound 8
상기 중간체 30과 2-bromodibenzo[b,d]furan을 이용하여 화합물 7과 같은 방법으로 화합물 8을 합성하였다.Compound 8 was synthesized in the same manner as in Compound 7 using Intermediate 30 and 2-bromodibenzo[b,d]furan.
m/z: 390.08 (100.0%), 391.09 (27.2%), 392.08 (4.7%), 392.09 (4.0%), 391.08 (1.5%), 393.08 (1.3%)m/z: 390.08 (100.0%), 391.09 (27.2%), 392.08 (4.7%), 392.09 (4.0%), 391.08 (1.5%), 393.08 (1.3%)
실시예 9: 화합물 9의 합성Example 9: Synthesis of compound 9
상기 중간체 26과 2,8-dibromodibenzo[b,d]thiophene을 이용하여 화합물 7과 같은 방법으로 화합물 9를 합성하였다.Compound 9 was synthesized in the same manner as in Compound 7 using Intermediate 26 and 2,8-dibromodibenzo[b,d]thiophene.
m/z: 598.12 (100.0%), 599.12 (42.0%), 600.13 (7.9%), 600.12 (5.7%), 601.12 (2.0%), 601.13 (1.1%)m/z: 598.12 (100.0%), 599.12 (42.0%), 600.13 (7.9%), 600.12 (5.7%), 601.12 (2.0%), 601.13 (1.1%)
실시예 10: 화합물 10의 합성Example 10: Synthesis of
상기 중간체 04와 3-bromo-9-phenyl-9H-carbazole을 이용하여 화합물 7과 같은 방법으로 화합물 10을 합성하였다.
m/z: 449.15 (100.0%), 450.16 (33.8%), 451.16 (5.7%), 450.15 (1.1%)m/z: 449.15 (100.0%), 450.16 (33.8%), 451.16 (5.7%), 450.15 (1.1%)
실시예 11: 화합물 11의 합성Example 11: Synthesis of
상기 중간체 11과 3-bromo-9-phenyl-9H-carbazole을 이용하여 화합물 7과 같은 방법으로 화합물 11을 합성하였다.
m/z: 465.13 (100.0%), 466.13 (35.4%), 467.14 (5.5%), 467.13 (5.2%), 468.13 (1.6%)m/z: 465.13 (100.0%), 466.13 (35.4%), 467.14 (5.5%), 467.13 (5.2%), 468.13 (1.6%)
실시예 12: 화합물 12의 합성Example 12: Synthesis of
상기 중간체 01와 3,6-dibromo-9-phenyl-9H-carbazole을 이용하여 화합물 7과 같은 방법으로 화합물 12를 합성하였다.
m/z: 655.20 (100.0%), 656.20 (49.4%), 657.21 (11.7%), 658.21 (1.9%)m/z: 655.20 (100.0%), 656.20 (49.4%), 657.21 (11.7%), 658.21 (1.9%)
실시예 13: 화합물 13의 합성Example 13: Synthesis of
상기 중간체 01 3.0 g, NaH 0.41 g을 DMF 30 ml에 넣고 교반하였다. 여기에 2-chloro-4,6-diphenyl-1,3,5-triazine 4.7 g을 DMF 45 ml에 녹인 후 천천히 적가하였다. 상온에서 교반 후 TLC로 반응 종결을 확인하고 실리카 필터 후 재결정하여 화합물 13 3.36 g (수율 53%)를 얻었다.3.0 g of Intermediate 01 and 0.41 g of NaH were added to 30 ml of DMF and stirred. Here, 4.7 g of 2-chloro-4,6-diphenyl-1,3,5-triazine was dissolved in 45 ml of DMF, and then slowly added dropwise. After stirring at room temperature, the completion of the reaction was confirmed by TLC, and recrystallized after silica filter to obtain 3.36 g of compound 13 (yield 53%).
m/z: 439.14 (100.0%), 440.15 (30.5%), 441.15 (4.7%), 440.14 (1.8%)m/z: 439.14 (100.0%), 440.15 (30.5%), 441.15 (4.7%), 440.14 (1.8%)
실시예 14: 화합물 14의 합성Example 14: Synthesis of
상기 중간체 02를 사용한 것을 제외하고는 화합물 13과 같은 방법으로 화합물 14를 합성하였다.
m/z: 439.14 (100.0%), 440.15 (30.5%), 441.15 (4.7%), 440.14 (1.8%)m/z: 439.14 (100.0%), 440.15 (30.5%), 441.15 (4.7%), 440.14 (1.8%)
실시예 15: 화합물 15의 합성Example 15: Synthesis of
상기 중간체 08을 사용한 것을 제외하고는 화합물 13과 같은 방법으로 화합물 15를 합성하였다.
m/z: 455.12 (100.0%), 456.12 (32.9%), 457.12 (5.3%), 457.13 (4.5%), 458.12 (1.5%)m/z: 455.12 (100.0%), 456.12 (32.9%), 457.12 (5.3%), 457.13 (4.5%), 458.12 (1.5%)
실시예 16: 화합물 16의 합성Example 16: Synthesis of
상기 중간체 19를 사용한 것을 제외하고는 화합물 13과 같은 방법으로 화합물 16을 합성하였다.
m/z: 514.19 (100.0%), 515.19 (39.0%), 516.20 (6.7%)m/z: 514.19 (100.0%), 515.19 (39.0%), 516.20 (6.7%)
실시예 17: 화합물 17의 합성Example 17: Synthesis of compound 17
상기 중간체 01과 9-(4-chloro-6-phenyl-1,3,5-triazin-2-yl)-9H-carbazole을 이용하여 화합물 13과 같은 방법으로 화합물 17을 합성하였다.Compound 17 was synthesized in the same manner as in
m/z: 528.17 (100.0%), 529.17 (39.0%), 530.18 (6.7%), 530.17 (1.0%)m/z: 528.17 (100.0%), 529.17 (39.0%), 530.18 (6.7%), 530.17 (1.0%)
실시예 18: 화합물 18의 합성Example 18: Synthesis of compound 18
상기 중간체 01 2.5 g, 4-(3-bromophenyl)-2,6-diphenylpyrimidine 5.6 g, t-BuONa 1.7 g, Pd2(dba)3 0.45 g, (t-Bu)3P 0.6 ml를 톨루엔 40 ml에 녹인 후 환류 교반하였다. TLC로 반응 종결을 확인한 후 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 화합물 18 2.47 g (수율 40%)를 얻었다.Intermediate 01 2.5 g, 4-(3-bromophenyl)-2,6-diphenylpyrimidine 5.6 g, t-BuONa 1.7 g, Pd 2 (dba) 3 0.45 g, (t-Bu) 3 P 0.6 ml 40 ml toluene After dissolving in the reflux was stirred. After confirming the completion of the reaction by TLC, the organic layer was extracted with MC, filtered under reduced pressure, and column purified to obtain 2.47 g of Compound 18 (yield 40%).
m/z: 514.18 (100.0%), 515.18 (39.4%), 516.19 (7.1%)m/z: 514.18 (100.0%), 515.18 (39.4%), 516.19 (7.1%)
실시예 19: 화합물 19의 합성Example 19: Synthesis of compound 19
상기 중간체 01과 2-(3-bromophenyl)-4,6-diphenyl-1,3,5-triazine을 이용하여 화합물 18과 같은 방법으로 화합물 19를 합성하였다.Compound 19 was synthesized in the same manner as in Compound 18 using Intermediate 01 and 2-(3-bromophenyl)-4,6-diphenyl-1,3,5-triazine.
m/z: 515.17 (100.0%), 516.18 (37.1%), 517.18 (7.6%), 516.17 (1.8%)m/z: 515.17 (100.0%), 516.18 (37.1%), 517.18 (7.6%), 516.17 (1.8%)
실시예 20: 화합물 20의 합성Example 20: Synthesis of compound 20
상기 중간체 29와 2-(3-bromophenyl)-4,6-diphenyl-1,3,5-triazine을 이용하여 화합물 18과 같은 방법으로 화합물 20을 합성하였다.Compound 20 was synthesized in the same manner as in Compound 18 using Intermediate 29 and 2-(3-bromophenyl)-4,6-diphenyl-1,3,5-triazine.
m/z: 531.15 (100.0%), 532.16 (37.0%), 533.16 (6.7%), 533.15 (5.5%), 532.15 (2.6%), 534.15 (1.7%)m/z: 531.15 (100.0%), 532.16 (37.0%), 533.16 (6.7%), 533.15 (5.5%), 532.15 (2.6%), 534.15 (1.7%)
실시예 21: 화합물 21의 합성Example 21: Synthesis of compound 21
상기 중간체 05 2.0 g, 2-(3-bromophenyl)triphenylene 4.4 g, t-BuONa 1.4 g, Pd2(dba)3 0.35 g, (t-Bu)3P 0.5 ml를 톨루엔 30 ml에 녹인 후 환류 교반하였다. TLC로 반응 종결을 확인한 후 유기층을 MC로 추출하고 감압여과한 후 실리카 필터 후 재결정하여 화합물 21 2.1 g (수율 43%)를 얻었다.2.0 g of Intermediate 05, 4.4 g of 2-(3-bromophenyl)triphenylene, 4.4 g of t-BuONa, 0.35 g of Pd 2 (dba) 3 , and 0.5 ml of (t-Bu) 3 P were dissolved in 30 ml of toluene and stirred under reflux. did. After confirming the completion of the reaction by TLC, the organic layer was extracted with MC, filtered under reduced pressure, and recrystallized after silica filter to obtain 2.1 g of compound 21 (yield 43%).
m/z: 511.17 (100.0%), 512.17 (40.3%), 513.18 (7.5%), 514.18 (1.0%)m/z: 511.17 (100.0%), 512.17 (40.3%), 513.18 (7.5%), 514.18 (1.0%)
실시예 22: 화합물 22의 합성Example 22: Synthesis of compound 22
상기 중간체 12를 사용한 것을 제외하고는 화합물 21과 같은 방법으로 화합물 22를 합성하였다.Compound 22 was synthesized in the same manner as in Compound 21, except that
m/z: 527.15 (100.0%), 528.15 (40.0%), 529.15 (8.1%), 529.14 (4.5%), 530.14 (1.8%), 528.14 (1.1%)m/z: 527.15 (100.0%), 528.15 (40.0%), 529.15 (8.1%), 529.14 (4.5%), 530.14 (1.8%), 528.14 (1.1%)
실시예 23: 화합물 23의 합성Example 23: Synthesis of compound 23
상기 중간체 26을 사용한 것을 제외하고는 화합물 21과 같은 방법으로 화합물 23을 합성하였다.Compound 23 was synthesized in the same manner as in Compound 21, except that Intermediate 26 was used.
m/z: 511.17 (100.0%), 512.17 (40.3%), 513.18 (7.5%), 514.18 (1.0%)m/z: 511.17 (100.0%), 512.17 (40.3%), 513.18 (7.5%), 514.18 (1.0%)
실시예 24: 화합물 24의 합성Example 24: Synthesis of compound 24
상기 중간체 33을 사용한 것을 제외하고는 화합물 21과 같은 방법으로 화합물 24를 합성하였다.Compound 24 was synthesized in the same manner as in Compound 21, except that Intermediate 33 was used.
m/z: 527.15 (100.0%), 528.15 (40.0%), 529.15 (8.1%), 529.14 (4.5%), 530.14 (1.8%), 528.14 (1.1%)m/z: 527.15 (100.0%), 528.15 (40.0%), 529.15 (8.1%), 529.14 (4.5%), 530.14 (1.8%), 528.14 (1.1%)
실시예 25: 화합물 25의 합성Example 25: Synthesis of compound 25
상기 중간체 115를 사용한 것을 제외하고는 화합물 21과 같은 방법으로 화합물 25를 합성하였다.Compound 25 was synthesized in the same manner as in Compound 21, except that Intermediate 115 was used.
m/z: 528.14 (100.0%), 529.14 (40.1%), 530.15 (7.0%), 530.14 (5.4%), 531.14 (1.8%)m/z: 528.14 (100.0%), 529.14 (40.1%), 530.15 (7.0%), 530.14 (5.4%), 531.14 (1.8%)
유기발광소자의 제조Manufacture of organic light emitting device
도 1에 기재된 구조에 따라 유기발광소자를 제조하였다. 유기발광소자는 아래로부터 양극(정공주입전극(11))/정공주입층(12)/정공수송층(13)/발광층(14)/전자전달층(15)/음극(전자주입전극(16)) 순으로 적층시켰다.An organic light emitting diode was manufactured according to the structure shown in FIG. 1 . The organic light emitting device from the bottom anode (hole injection electrode 11) /
실시예 및 비교예의 정공주입층(12), 정공전달층(13), 발광층(14), 전자전달층(15)는 아래와 같은 물질을 사용하였다.The following materials were used for the
HI01, NPB, mCP HI01, NPB, mCP
CBP, 비교화합물1, CBP, Comparative compound 1,
비교화합물2, Firpic, Comparative compound 2, Firpic,
Ir(ppy)3, ET01, Liq Ir(ppy) 3, ET01, Liq
실시예 26Example 26
인듐틴옥사이드(ITO)가 1500 Å 두께가 박막 코팅된 유리 기판을 증류수 초음파로 세척하였다. 증류수 세척이 끝나면 이소프로필알코올, 아세톤, 메탄올 등의 용제로 초음파 세척을 하고 건조시킨 후 플라즈마 세정기로 이송시킨 다음 산소 플라즈마를 이용하여 상기 기판을 5분간 세정 한 후 ITO 기판 상부에 열 진공 증착기(thermal evaporator)를 이용하여 정공주입층 HT01 600 Å, 정공수송층으로 NPB 250 Å를 제막하였다. 다음으로 발광층으로 상기 화합물 1:Firpic 10%로 도핑하여 250 Å 제막하였다. 다음으로 전자전달층으로 ET01:Liq(1:1) 300 Å 제막한 후 LiF 10 Å, 알루미늄(Al) 1000 Å 제막하고, 이 소자를 글로브박스에서 밀봉(Encapsulation)함으로써 청색 유기발광소자를 제작하였다.A glass substrate coated with indium tin oxide (ITO) having a thickness of 1500 Å was washed with distilled water and ultrasonic waves. After cleaning with distilled water, ultrasonic cleaning is performed with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried, transferred to a plasma cleaner, and then the substrate is cleaned using oxygen plasma for 5 minutes. An evaporator) was used to form a hole injection layer HT01 600 Å and NPB 250 Å as a hole transport layer. Next, the light emitting layer was doped with the compound 1:Firpic 10% to form a film of 250 Å. Next, ET01:Liq (1:1) 300 Å was formed as an electron transport layer,
실시예 27 내지 실시예 37Examples 27-37
상기 실시예 26과 같은 방법으로 발광층 호스트로 각각 화합물 2 내지 12를 사용하여 제막한 청색 유기발광소자를 제작하였다.In the same manner as in Example 26, blue organic light emitting diodes were fabricated using compounds 2 to 12 as light emitting layer hosts, respectively.
실시예 38Example 38
인듐틴옥사이드(ITO)가 1500 Å 두께가 박막 코팅된 유리 기판을 증류수 초음파로 세척하였다. 증류수 세척이 끝나면 이소프로필알코올, 아세톤, 메탄올 등의 용제로 초음파 세척을 하고 건조시킨 후 플라즈마 세정기로 이송 시킨 다음 산소 플라즈마를 이용하여 상기 기판을 5분간 세정 한 후 ITO 기판 상부에 열 진공 증착기(thermal evaporator)를 이용하여 정공주입층 HT01 600 Å, 정공수송층으로 NPB 250 Å를 제막하였다. 다음으로 발광층으로 상기 화합물 13:Ir(ppy)3 10%로 도핑하여 250 Å 제막하였다. 다음으로 전자전달층으로 ET01:Liq(1:1) 300 Å 제막한 후 LiF 10 Å, 알루미늄(Al) 1000 Å 제막하고, 이 소자를 글로브박스에서 밀봉(Encapsulation)함으로써 녹색 유기발광소자를 제작하였다.A glass substrate coated with indium tin oxide (ITO) having a thickness of 1500 Å was washed with distilled water and ultrasonic waves. After washing with distilled water, ultrasonic cleaning is performed with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried, transferred to a plasma cleaner, and then the substrate is cleaned using oxygen plasma for 5 minutes. evaporator) was used to form a hole injection layer HT01 600 Å and NPB 250 Å as a hole transport layer. Next, the light emitting layer was doped with 10% of the compound 13: Ir(ppy) 3 to form a film of 250 Å. Next, ET01:Liq (1:1) 300 Å was formed as an electron transport layer,
실시예 39 내지 실시예 50Examples 39 to 50
실시예 38과 같은 방법으로 발광층 호스트로 각각 화합물 14 내지 25를 사용하여 제막한 녹색 유기발광소자를 제작하였다.In the same manner as in Example 38, green organic light emitting diodes were fabricated using
비교예 1 Comparative Example 1
상기 실시예 1의 발광층 호스트로 화합물 1을 대신하여 mCP로 사용한 것을 제외하고는 동일한 방법으로 청색 유기발광소자를 제작하였다.A blue organic light emitting diode was manufactured in the same manner as in Example 1, except that mCP was used instead of Compound 1 as the light emitting layer host.
비교예 2 Comparative Example 2
상기 실시예 1의 발광층 호스트로 화합물 1을 대신하여 비교화합물 1로 사용한 것을 제외하고는 동일한 방법으로 청색 유기발광소자를 제작하였다.A blue organic light emitting diode was manufactured in the same manner as in Example 1, except that Comparative Compound 1 was used instead of Compound 1 as a host for the emission layer of Example 1.
비교예 3 Comparative Example 3
상기 실시예 13의 발광층 호스트로 화합물 13을 대신하여 CBP로 사용한 것을 제외하고는 동일한 방법으로 녹색 유기발광소자를 제작하였다.A green organic light emitting device was manufactured in the same manner as in Example 13, except that CBP was used instead of
비교예 4 Comparative Example 4
상기 실시예 13의 발광층 호스트로 화합물 13을 대신하여 비교화합물 1로 사용한 것을 제외하고는 동일한 방법으로 녹색 유기발광소자를 제작하였다.A green organic light emitting diode was manufactured in the same manner as in Example 13, except that Comparative Compound 1 was used instead of
유기발광소자의 성능평가Performance evaluation of organic light emitting devices
키슬리 2400 소스 메져먼트 유닛(Kiethley 2400 source measurement unit) 으로 전압을 인가하여 전자 및 정공을 주입하고 코니카 미놀타(Konica Minolta) 분광복사계(CS-2000)를 이용하여 빛이 방출될 때의 휘도를 측정함으로써, 실시예 및 비교예의 유기발광소자의 성능을 인가전압에 대한 전류 밀도 및 휘도를 대기압 조건하에 측정하여 평가하였으며, 그 결과를 표 1에 나타내었다.Electrons and holes are injected by applying voltage with a Kiethley 2400 source measurement unit, and the luminance when light is emitted is measured using a Konica Minolta spectroradiometer (CS-2000). By doing so, the performances of the organic light emitting devices of Examples and Comparative Examples were evaluated by measuring current density and luminance with respect to applied voltage under atmospheric pressure conditions, and the results are shown in Table 1.
1000nitlife span@
1000nits
상기 표 1에 나타나는 바와 같이 본 발명의 실시예들은 비교예 1 내지 4에 비하여 유기발광소자의 모든 면에서 물성이 우수함을 확인할 수 있다. 특히 비교화합물 2 및 4의 경우 청색인광소자에 적용하였을 경우 청색 도판트보다 낮은 삼중항 에너지로 발광 효율이 낮음을 확인할 수 있었으며, 이는 본 발명의 화합물이 청색 및 녹색인광소자 적용에 있어 높은 삼중항 에너지로 인한 발광효율이 개선됨을 알 수 있다.As shown in Table 1, it can be confirmed that the Examples of the present invention have superior physical properties in all aspects of the organic light emitting device compared to Comparative Examples 1 to 4. In particular, in the case of Comparative Compounds 2 and 4, when applied to a blue phosphorescent device, it was confirmed that the luminous efficiency was low with a triplet energy lower than that of the blue dopant. It can be seen that the luminous efficiency due to the energy is improved.
Claims (3)
.A luminescent compound, characterized in that it is represented by any one of the following formulas:
.
상기 유기물층이 제1항의 화합물을 발광 호스트 또는 도펀트로서 함유하는 것을 특징으로 하는 유기발광소자.3. The method of claim 2,
The organic light emitting device, characterized in that the organic layer contains the compound of claim 1 as a light emitting host or dopant.
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