KR102422023B1 - 구조물을 측정하는 계측 장치, 리소그래피 시스템 및 방법 - Google Patents

구조물을 측정하는 계측 장치, 리소그래피 시스템 및 방법 Download PDF

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Publication number
KR102422023B1
KR102422023B1 KR1020207010976A KR20207010976A KR102422023B1 KR 102422023 B1 KR102422023 B1 KR 102422023B1 KR 1020207010976 A KR1020207010976 A KR 1020207010976A KR 20207010976 A KR20207010976 A KR 20207010976A KR 102422023 B1 KR102422023 B1 KR 102422023B1
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KR
South Korea
Prior art keywords
radiation
different
field distribution
pupil plane
plane field
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KR1020207010976A
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English (en)
Korean (ko)
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KR20200053589A (ko
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야네크 라벤스버젠
두이구 아크불루트
니테쉬 판데이
진 리안
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에이에스엠엘 네델란즈 비.브이.
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Publication of KR20200053589A publication Critical patent/KR20200053589A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020207010976A 2017-10-16 2018-10-09 구조물을 측정하는 계측 장치, 리소그래피 시스템 및 방법 KR102422023B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP17196670.8 2017-10-16
EP17196670.8A EP3470926A1 (en) 2017-10-16 2017-10-16 Metrology apparatus, lithographic system, and method of measuring a structure
PCT/EP2018/077506 WO2019076690A1 (en) 2017-10-16 2018-10-09 METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM, AND METHOD FOR MEASURING A STRUCTURE

Publications (2)

Publication Number Publication Date
KR20200053589A KR20200053589A (ko) 2020-05-18
KR102422023B1 true KR102422023B1 (ko) 2022-07-18

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ID=60117598

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207010976A KR102422023B1 (ko) 2017-10-16 2018-10-09 구조물을 측정하는 계측 장치, 리소그래피 시스템 및 방법

Country Status (8)

Country Link
US (2) US10444640B2 (zh)
EP (1) EP3470926A1 (zh)
JP (1) JP6975324B2 (zh)
KR (1) KR102422023B1 (zh)
CN (1) CN111226174B (zh)
IL (1) IL273647B2 (zh)
TW (1) TWI709001B (zh)
WO (1) WO2019076690A1 (zh)

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US10422700B1 (en) * 2017-04-24 2019-09-24 Apre Instruments, Inc. Optical alignment based on spectrally-controlled interferometry
KR102328438B1 (ko) * 2017-06-02 2021-11-17 에이에스엠엘 네델란즈 비.브이. 계측 장치
US10642031B2 (en) * 2018-05-03 2020-05-05 Texas Instruments Incorporated Expanding a pupil using replication via beam splitter feeding a waveguide
EP3783436A1 (en) * 2019-08-19 2021-02-24 ASML Netherlands B.V. Illumination and detection apparatus for a metrology apparatus
US20230213871A1 (en) * 2020-05-26 2023-07-06 Asml Netherlands B.V. Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method
KR20230003886A (ko) * 2021-06-30 2023-01-06 삼성전자주식회사 광학 계측 설비, 그를 이용한 광학 계측 방법 및 그를 이용한 반도체 장치의 제조 방법
CN113588216B (zh) * 2021-08-02 2023-09-19 中国科学院光电技术研究所 一种偏振片光学零位快速高精度定标装置和方法

Citations (3)

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US20080266561A1 (en) * 2007-04-26 2008-10-30 Kla-Tencor Corporation Optical gain approach for enhancement of overlay and alignment systems performance
US20110032535A1 (en) 2009-08-04 2011-02-10 Zygo Corporation Interferometer for determining overlay errors
JP2015535089A (ja) * 2012-10-19 2015-12-07 シャンハイ マイクロ エレクトロニクス イクイプメント カンパニー リミティド 軸外アライメントシステム及びアライメント方法

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US9052494B2 (en) * 2007-10-02 2015-06-09 Kla-Tencor Technologies Corporation Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
NL1036245A1 (nl) * 2007-12-17 2009-06-18 Asml Netherlands Bv Diffraction based overlay metrology tool and method of diffraction based overlay metrology.
NL1036468A1 (nl) * 2008-02-27 2009-08-31 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
CN103201682B (zh) * 2010-11-12 2015-06-17 Asml荷兰有限公司 量测方法和设备、光刻系统和器件制造方法
US8582114B2 (en) * 2011-08-15 2013-11-12 Kla-Tencor Corporation Overlay metrology by pupil phase analysis
NL2009294A (en) * 2011-08-30 2013-03-04 Asml Netherlands Bv Method and apparatus for determining an overlay error.
US9490182B2 (en) * 2013-12-23 2016-11-08 Kla-Tencor Corporation Measurement of multiple patterning parameters
CN106462076B (zh) * 2014-06-02 2018-06-22 Asml荷兰有限公司 设计度量目标的方法、具有度量目标的衬底、测量重叠的方法、以及器件制造方法
WO2016005167A1 (en) * 2014-07-09 2016-01-14 Asml Netherlands B.V. Inspection apparatus, inspection method and device manufacturing method
WO2016078862A1 (en) * 2014-11-21 2016-05-26 Asml Netherlands B.V. Metrology method and apparatus
KR101982694B1 (ko) 2014-12-15 2019-05-27 에이에스엠엘 홀딩 엔.브이. 광학적 퓨필 대칭화를 위한 방법 및 장치
NL2017300A (en) * 2015-08-27 2017-03-01 Asml Netherlands Bv Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
CN108139682B (zh) * 2015-10-02 2020-12-25 Asml荷兰有限公司 量测方法和设备、计算机程序及光刻系统

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080266561A1 (en) * 2007-04-26 2008-10-30 Kla-Tencor Corporation Optical gain approach for enhancement of overlay and alignment systems performance
US20110032535A1 (en) 2009-08-04 2011-02-10 Zygo Corporation Interferometer for determining overlay errors
JP2015535089A (ja) * 2012-10-19 2015-12-07 シャンハイ マイクロ エレクトロニクス イクイプメント カンパニー リミティド 軸外アライメントシステム及びアライメント方法

Also Published As

Publication number Publication date
TWI709001B (zh) 2020-11-01
JP2021501309A (ja) 2021-01-14
JP6975324B2 (ja) 2021-12-01
US10444640B2 (en) 2019-10-15
CN111226174B (zh) 2022-01-21
KR20200053589A (ko) 2020-05-18
IL273647A (en) 2020-05-31
IL273647B2 (en) 2023-05-01
EP3470926A1 (en) 2019-04-17
WO2019076690A1 (en) 2019-04-25
US20190113852A1 (en) 2019-04-18
IL273647B1 (en) 2023-01-01
TW201931017A (zh) 2019-08-01
US10908514B2 (en) 2021-02-02
CN111226174A (zh) 2020-06-02
US20200004165A1 (en) 2020-01-02

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