KR102364068B1 - Liquid crystal display device - Google Patents

Abstract

A liquid crystal display is provided. The liquid crystal display includes a first substrate including a first pixel region including a first transmissive region and a first non-transmissive region, and a second pixel region including a second transmissive region and a second non-transmissive region, wherein the first substrate is disposed on the first substrate. a first pixel electrode disposed in a first pixel region, and a second pixel electrode disposed in the second pixel region on the first substrate, wherein an area of the first pixel electrode in the first transmission region includes: An area of the second pixel electrode in the second transmissive region is larger than an area of the first pixel electrode in the first non-transmissive region is smaller than an area of the second pixel electrode in the second non-transmissive region.

Description

Liquid crystal display device {LIQUID CRYSTAL DISPLAY DEVICE}

The present invention relates to a liquid crystal display device.

Liquid crystal displays have a wide range of applications ranging from notebook computers, monitors, spacecraft, aircraft, and the like, due to their low operating voltage, low power consumption, and being portable. A liquid crystal display device includes a lower substrate, an upper substrate, and a liquid crystal layer formed between the two substrates, and the arrangement of the liquid crystal layer is adjusted depending on whether or not an electric field is applied, and the transmittance of light is adjusted accordingly to display an image. .

In the liquid crystal display, red (R), green (G), and blue (B) color filter layers for realizing colors may be positioned between the lower substrate and the liquid crystal layer. Light passing through the color filter layer may have different light transmission characteristics according to colors. Red light, green light, and blue light may have different maximum transmittances according to a cell gap that is a distance from the upper surface of the lower substrate to the lower surface of the upper substrate. In consideration of these points, a multi-cell gap structure in which the height of the color filter layer is formed differently for each color has been conventionally proposed.

However, in such a multi-cell gap structure, liquid crystal capacitance values are formed differently for each R, G, and B pixel, and thus display quality may be deteriorated.

Accordingly, an object of the present invention is to provide a liquid crystal display having a multi-cell gap structure that can equally provide liquid crystal capacitance values of each pixel.

The problems of the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

According to an exemplary embodiment of the present invention, there is provided a liquid crystal display device to solve the above problems, a first pixel area including a first transmissive area and a first non-transmissive area and a second pixel area including a second transmissive area and a second non-transmissive area A first substrate including a pixel region, a first pixel electrode disposed in the first pixel region on the first substrate, and a second pixel electrode disposed in the second pixel region on the first substrate, wherein An area of the first pixel electrode in the first transmissive region is larger than an area of the second pixel electrode in the second transmissive region, and an area of the first pixel electrode in the first non-transmissive region is equal to the first 2 It is smaller than the area of the second pixel electrode in the non-transmissive area.

The display device may further include a common electrode disposed on the first substrate and disposed below or above the first pixel electrode and the second pixel electrode, wherein the first pixel electrode and the common electrode in the first non-transmissive region An overlapping area of the electrodes may be smaller than an overlapping area of the second pixel electrode and the common electrode in the second non-transmissive region.

An overlapping area of the first pixel electrode and the common electrode in the first pixel area may be the same as an overlapping area of the second pixel electrode and the common electrode in the second pixel area.

The display device may further include a common electrode disposed on the first substrate, wherein an area of the common electrode in the first non-transmissive region may be smaller than an area of the common electrode in the second non-transmissive region.

In addition, a distance between the first pixel electrode and the common electrode in the first pixel area may be the same as a distance between the second pixel electrode and the common electrode in the second pixel area.

The first pixel electrode further includes a first protruding electrode protruding from the first transmissive region to the first non-transmissive region, and the second pixel electrode protrudes from the second transmissive region to the second non-transmissive region. and a second protruding electrode, wherein an area of the second protruding electrode may be larger than an area of the first protruding electrode.

In addition, the method further includes a first thin film transistor disposed in the first non-transmissive region on the first insulating substrate and a second thin film transistor disposed in the second non-transmissive region on the first insulating substrate, wherein the first and second A thin film transistor may be disposed under the first and second pixel electrodes, the first protruding electrode may overlap the first thin film transistor, and the second protruding electrode may overlap the second thin film transistor.

In addition, the first pixel electrode includes a plurality of branch electrodes and a plurality of openings formed between the plurality of branch electrodes, and the second pixel electrode includes a plurality of branch electrodes formed between the plurality of branch electrodes and the plurality of branch electrodes. of the plurality of branch electrodes of the first pixel electrode, wherein a width of the plurality of branch electrodes of the first pixel electrode may be wider than a waterfall of the plurality of branch electrodes of the second pixel electrode.

The display device may further include a first color filter disposed in the first transmissive region and a second color filter disposed in the second transmissive region, wherein the first color filter is disposed between the first substrate and the first pixel electrode. The second color filter may be disposed between the first substrate and the second pixel electrode, and a thickness of the first color filter may be smaller than a thickness of the second color filter.

In addition, the first substrate further includes a third pixel region disposed side by side with the second pixel region and including a third transmissive region and a third non-transmissive region, and a third pixel electrode disposed in the third pixel region, An area of the third pixel electrode in the third transmissive region is smaller than an area of the first and second pixel electrodes in the first and second transmissive regions, and the third pixel in the third non-transmissive region An area of the electrode may be larger than an area of the first and second pixel electrodes in the first and second non-transmissive regions.

The apparatus may further include a third color filter disposed in the third transmissive region, wherein the third color filter is disposed between the first substrate and the third pixel electrode, and a thickness of the third color filter may include: It may be greater than the thickness of the first and second color filters.

In addition, the first to third color filters may be red, green, and blue color filters, respectively.

In addition, the method further includes a first thin film transistor disposed in the first non-transmissive region on the first insulating substrate and a second thin film transistor disposed in the second non-transmissive region on the first insulating substrate, wherein the first and second A thin film transistor is disposed under the first and second pixel electrodes, the first pixel electrode and the first thin film transistor are connected through a first contact hole disposed in the first non-transmissive area, and the second pixel The electrode and the second thin film transistor are connected through a second contact hole disposed in the second non-transmissive region, and the first pixel electrode is formed to overlap the first contact hole for connection with the first thin film transistor. An area of may be smaller than an area of the second pixel electrode formed to overlap the second contact hole for connection with the second thin film transistor.

A liquid crystal display device according to another embodiment of the present invention for solving the above problems includes a first pixel area including a first transmissive area and a first non-transmissive area, and a second pixel area including a second transmissive area and a second non-transmissive area. A first substrate including a pixel region, a first pixel electrode disposed in the first pixel region on the first substrate, and a second pixel electrode disposed in the second pixel region on the first substrate, wherein A length from the first substrate to the first pixel electrode in the first transmissive region is smaller than a length from the first substrate to the second pixel electrode in the second transmissive region, and in the first non-transmissive region An area of the first pixel electrode may be smaller than an area of the second pixel electrode in the second non-transmissive region.

The display device may further include a common electrode disposed on the first substrate and disposed below or above the first pixel electrode and the second pixel electrode, wherein the first pixel electrode and the common electrode in the first non-transmissive region An overlapping area of the electrodes may be smaller than an overlapping area of the second pixel electrode and the common electrode in the second non-transmissive region.

An overlapping area of the first pixel electrode and the common electrode in the first pixel area may be the same as an overlapping area of the second pixel electrode and the common electrode in the second pixel area.

The display device may further include a common electrode disposed on the first substrate, wherein an area of the common electrode in the first non-transmissive region may be smaller than an area of the common electrode in the second non-transmissive region.

In addition, a distance between the first pixel electrode and the common electrode in the first pixel area may be the same as a distance between the second pixel electrode and the common electrode in the second pixel area.

The display device may further include a first color filter disposed in the first transmissive region and a second color filter disposed in the second transmissive region, wherein the first color filter is disposed between the first substrate and the first pixel electrode. The second color filter may be disposed between the first substrate and the second pixel electrode, and a thickness of the first color filter may be smaller than a thickness of the second color filter.

The first pixel electrode further includes a first protruding electrode protruding from the first transmissive region to the first non-transmissive region, and the second pixel electrode protrudes from the second transmissive region to the second non-transmissive region. and a second protruding electrode, wherein an area of the second protruding electrode may be larger than an area of the first protruding electrode.

Details of other embodiments are included in the detailed description and drawings.

According to embodiments of the present invention,

High light transmittance can be provided.

In addition, since a constant liquid crystal capacitance is formed for each pixel, display quality may be improved.

Effects according to the embodiments of the present invention are not limited by the contents exemplified above, and more various effects are included in the present specification.

1 is an exploded perspective view of a liquid crystal display according to an exemplary embodiment.
2 is a schematic plan view of a first display substrate according to an exemplary embodiment.
3 is an enlarged plan view of the DP of FIG. 2 .
4 is a cross-sectional view taken along line AA′ of FIG. 3 .
FIG. 5 is a cross-sectional view taken along line BB′ of FIG. 3 .
6 is a cross-sectional view taken along line C1-C1′ of FIG. 3 .
7 is a cross-sectional view taken along line C2-C2' of FIG.
FIG. 8 is a cross-sectional view taken along line C3-C3' of FIG. 3;
9A to 9E are cross-sectional views sequentially illustrating a process for forming a pixel electrode on a second insulating layer.
10 is a plan view of a first display substrate according to another exemplary embodiment.
11 is a cross-sectional view taken along DD′ of FIG. 10 .

Advantages and features of the present invention and methods of achieving them will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in a variety of different forms, and only these embodiments allow the disclosure of the present invention to be complete, and common knowledge in the technical field to which the present invention belongs It is provided to fully inform the possessor of the scope of the invention, and the present invention is only defined by the scope of the claims.

Reference to an element or layer “on” of another element or layer includes any intervening layer or other element directly on or in the middle of the other element or layer. Like reference numerals refer to like elements throughout.

Although the first, second, etc. are used to describe various elements, these elements are not limited by these terms, of course. These terms are only used to distinguish one component from another. Accordingly, it goes without saying that the first component mentioned below may be the second component within the spirit of the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.

1 is an exploded perspective view of a liquid crystal display according to an exemplary embodiment. Referring to FIG. 1 , a liquid crystal display 10 according to an exemplary embodiment may include a liquid crystal display panel Pa, a backlight assembly, a top chassis 300 , and a bottom chassis 400 .

The liquid crystal display panel Pa may include a display area in which an image is displayed and a non-display area in which an image is not displayed. In addition, the liquid crystal display panel Pa includes a first display substrate 100 , a second display substrate 200 facing the first display substrate 100 , and the first display substrate 100 and the second display substrate 200 . ) may include a liquid crystal layer (not shown) interposed therebetween.

The first display substrate 100 and the second display substrate 200 may have a rectangular parallelepiped shape. In FIG. 1 , the shapes of the first display substrate 100 and the second display substrate 200 are illustrated as cuboids for convenience of explanation, but the present invention is not limited thereto, and the first display according to the shape of the liquid crystal display panel Pa The substrate 100 and the second display substrate 200 may be manufactured in various shapes. A liquid crystal layer may be interposed between the first display substrate 100 and the second display substrate 200 . Also, between the first display substrate 100 and the second display substrate 200 , a sealing member is disposed along edges of the first display substrate 100 and the second display substrate 200 to form the first display substrate 100 . ) and the second display substrate 200 may be bonded to each other and sealed. Although not shown in FIG. 2 , the liquid crystal display panel Pa may further include a driver attached to the first display substrate 100 and a flexible circuit board. The driver may apply various signals such as a driving signal required to display an image in the display area to the first display substrate 100 . The flexible circuit board may output various signals to the driver. The first display substrate 100 may be a first display substrate that electrically controls the arrangement of the liquid crystal layers.

The backlight assembly may be disposed under the liquid crystal display panel Pa. The backlight assembly may provide light to the liquid crystal display panel Pa. In the present specification, the light source unit 800 will be mainly described with respect to the edge type backlight assembly positioned on the side surface of the light guide plate 700 , but the present invention is not limited thereto. Embodiments of the invention are applicable. The backlight assembly may include a mold frame 500 , an optical sheet 600 , a light guide plate 700 , a light source unit 800 , and a reflection plate 900 .

The light source unit 800 may generate light, and may irradiate the generated light to the light guide plate 700 . The light source unit 800 may be disposed on one side of the light guide plate 700 , that is, the light incident surface. In an exemplary embodiment, the light source unit 800 may be disposed to correspond to one long side of the light guide plate 700 , but is not limited thereto, and may be disposed to correspond to one short side of the light guide plate 700 . The light source unit 800 may include a circuit board 810 and a plurality of light sources 820 disposed on the circuit board 810 .

The light guide plate 700 may be positioned on the side of the light source unit 800 . That is, the light guide plate 700 may be positioned on substantially the same plane as the light source unit 800 . The light guide plate 700 may guide the light irradiated from the light source unit 800 and transmit it to the display panel Pa.

The optical sheet 600 may be disposed on the light guide plate 700 . The optical sheet 600 may modulate optical characteristics of light emitted to the light exit surface of the light guide plate 700 . There may be a plurality of optical sheets 600 , and the plurality of optical sheets 600 may be stacked to overlap each other to complement each other. In an exemplary embodiment, the plurality of optical sheets 600 may include at least one prism sheet or a diffusion sheet.

The reflective plate 900 may be disposed below the light guide plate 700 . The reflection plate 900 may change the path of light emitted from the light source unit 800 and traveling downward of the light guide plate 700 . The reflective plate 900 may be made of a reflective material, for example, a metal.

The mold frame 500 may be disposed between the liquid crystal display panel Pa and the optical sheet 600 . The mold frame 500 may be engaged with the bottom chassis 900 to fix the light source 800 , the light guide plate 700 , the optical sheet 600 , and the reflection plate 900 . Also, the mold frame 500 may be in contact with the edge portion of the liquid crystal display panel Pa to support and fix the liquid crystal display panel Pa.

The top chassis 800 may cover the edge of the liquid crystal display panel Pa and surround the side surfaces of the liquid crystal display panel Pa and the backlight assembly. The bottom chassis 900 may accommodate the backlight assembly. The top chassis 800 and the bottom chassis 900 may be engaged with each other to surround the liquid crystal display panel Pa and the backlight assembly. The top chassis 800 and the bottom chassis 900 may be formed of a conductive material, for example, a metal.

Hereinafter, the first display substrate 100 of the above-described liquid crystal display 10 will be described in detail.

FIG. 2 is a schematic plan view of a first display substrate according to an embodiment of the present invention, FIG. 3 is an enlarged plan view of DP of FIG. 2 , and FIG. 4 is a cross-sectional view taken along line AA′ of FIG. 3 , FIG. 5 is a cross-sectional view taken along BB′ of FIG. 3 , FIG. 6 is a cross-sectional view taken along C1-C1′ of FIG. 3 , FIG. 7 is a cross-sectional view taken along C2-C2′ of FIG. 3 , and FIG. 8 is a cross-sectional view taken along C3-C3' of FIG. 3 .

2 to 8 , the first display substrate 100 includes a first substrate 110 , a plurality of thin film transistors TR, a color filter CF, a first insulating layer 120 , and a common electrode 130 . ), a second insulating layer 140 , and a plurality of pixel electrodes 150 . The first display substrate 100 according to the present embodiment may be a lower substrate of the liquid crystal display. The first display substrate 100 may include a configuration for adjusting the amount of light transmitted from below.

The first substrate 110 may be formed of a material having excellent transmittance, heat resistance, chemical resistance, and the like. Illustratively, the first substrate 110 may be formed of at least one of glass, polyethylene naphthalate, polyethylene terephthalate, and polyacrylic having excellent light transmittance. The first substrate 110 may include a plurality of pixel areas PX. Each pixel area PX may be divided into areas controlled by different data voltages at different timings. Each pixel area PX may be a region independently operated according to the connected gate line SL and data line DL, and is a region surrounded by the plurality of gate lines SL and the plurality of data lines DL. may be formed as However, in some embodiments, the present disclosure is not limited thereto, and a plurality of pixel areas PX may be formed in one area surrounded by the plurality of gate lines SL and the plurality of data lines DL.

The plurality of gate lines SL may be formed on the first substrate 110 , and a gate insulating layer 160 may be formed to cover the plurality of gate lines SL. The plurality of data lines DL may be formed on the gate insulating layer 160 . The plurality of gate lines SL and the plurality of data lines DL may be disposed to cross each other with the gate insulating layer 160 interposed therebetween. The plurality of gate lines SL are formed of an aluminum-based metal such as aluminum (Al) or an aluminum alloy, a silver-based metal such as silver (Ag) or a silver alloy, a copper-based metal such as copper (Cu) or a copper alloy, and molybdenum (Mo) or molybdenum. It may be formed of a molybdenum-based metal such as an alloy, chromium (Cr), tantalum (Ta), titanium (Ti), or the like. The gate insulating layer 160 may be made of silicon nitride (SiNx) or silicon oxide (SiOx), and may have a multilayer structure including at least two insulating layers having different physical properties. The plurality of data lines DL are preferably made of a refractory metal such as molybdenum, chromium, tantalum and titanium or an alloy thereof, and a refractory metal layer (not shown) and a low-resistance conductive layer (not shown). ) may have a multilayer structure including Examples of the multilayer structure include a double film of a chromium or molybdenum (alloy) lower film and an aluminum (alloy) upper film, and a triple film of a molybdenum (alloy) lower film, an aluminum (alloy) interlayer and a molybdenum (alloy) upper film. The plurality of gate lines SL may supply a scan signal from a gate driver (not shown), and the plurality of data lines DL may supply a data voltage from a data driver (not shown).

Each of the plurality of pixel areas PX may include transparent areas T1 , T2 , and T3 and non-transmissive areas NT1 , NT2 , and NT3 . The transmissive regions T1 , T2 , and T3 may be regions in which the color filter CF is positioned, and the non-transmissive regions NT1 , NT2 and NT3 may be regions in which the thin film transistor TR is positioned. In the transmissive regions T1 , T2 , and T3 and the non-transmissive regions NT1 , NT2 , and NT3 , the light transmitted through the lower portion of the first substrate 110 passes through the region to be transmitted to the upper portion of the first substrate 110 . It may be an area separated by whether or not it is possible. A black matrix BM may be positioned in an area corresponding to the non-transmissive areas NT1 , NT2 , and NT3 , and light transmitted through the lower portion of the first substrate 110 is shielded by the black matrix BM to form the first It may not be transferred to the upper part of the substrate 110 . The color filter CF may be positioned on the first substrate 110 to correspond to the transmission areas T1 , T2 , and T3 of each pixel area PX. The plurality of thin film transistors TR may be positioned on the first substrate 110 to correspond to the non-transmissive areas NT1 , NT2 , and NT3 of each pixel area PX. The plurality of thin film transistors TR may charge the data voltage of the data line DL to the pixel electrode 150 in response to the scan signal of the gate line SL. Each thin film transistor TR includes a gate electrode GE formed to protrude from the gate line SL, a source electrode SE connected to the data line DL, a drain electrode DE connected to the pixel electrode 150 , and The semiconductor active layer Ba may include a gate line SL overlapping with the gate insulating layer 160 interposed therebetween to form a channel between the source electrode SE and the drain electrode DE. In addition, each thin film transistor TR may further include an ohmic contact member (not shown) interposed between the semiconductor active layer Ba, the source electrode SE, and the drain electrode DE. The ohmic contact member may be made of an n+ hydrogenated amorphous silicon material doped with an n-type impurity such as phosphorus in a high concentration, or may be made of silicide. In addition, a passivation layer (not shown) may be disposed on each thin film transistor TR to protect the semiconductor active layer Ba exposed to the outside.

The color filter CF may be formed in a dot shape in each of the transmission regions T1 , T2 , and T3 . The color filter CF may transmit a component of a specific wavelength band of incident light and block a component of the remaining wavelength band so that the emitted light is viewed as a specific color. For example, the color filter CF is a red color filter R that transmits light in a wavelength band corresponding to red light, a green color filter G that transmits light in a wavelength band corresponding to green light, and corresponds to blue light. It may include a blue color filter (B) that transmits the light of the wavelength band. In this case, the red color filter (R) transmits light in a wavelength range of about 580 nm to 780 nm and reflects light in a wavelength band other than that, and the green color filter (G) transmits light in a wavelength range of about 450 nm to 650 nm and the It may reflect light in a wavelength band other than that, and the blue color filter (B) may transmit light in a wavelength band of about 380 nm to 560 nm and reflect light in a wavelength band other than that.

As illustrated in FIG. 3 , the transmissive area T1 of the first pixel area PX1 , the transmissive area T2 of the second pixel area PX2 , and the transmissive area of the third pixel area PX3 are sequentially arranged. A red color filter (R), a green color filter (G), and a blue color filter (B) may be positioned at T3 , respectively. The first to third pixel areas PX1 , PX2 , and PX3 may be one unit pixel area DP. The first pixel area PX1 may be a red sub-pixel, the second pixel area PX2 may be a green sub-pixel, and the third pixel area PX3 may be a blue sub-pixel. The plurality of pixel areas PX may have a form in which a plurality of unit pixel areas are arranged in a matrix.

The following descriptions of the first to third pixel areas PX1 , PX2 , and PX3 may be equally applied to other pixels of the plurality of pixel areas PX. In addition, the above description regarding the color and arrangement position of the color filter CF may be an example, and is not limited thereto. For example, the color filter CF may be formed to transmit light in all wavelength bands to be transparent.

4 , the color filter CF may be formed on the gate insulating layer 160 . As the color filter CF is formed on the first display substrate 10 , problems such as light leakage or decrease in the aperture ratio due to misalignment with the upper substrate may be prevented. The red color filter R may be formed on the gate insulating layer 160 corresponding to the transmission area P1 of the first pixel area PX1 to emit red light. The green color filter G may be formed on the gate insulating layer 160 corresponding to the transmission area P2 of the second pixel area PX2 to emit green light. The blue color filter B may be formed on the gate insulating layer 160 corresponding to the transmission region P3 of the third pixel area PX3 to emit blue light. The color filter CF is formed to overlap the color filter CF of an adjacent color on the data line DL. The red color filter R and the green color filter G may overlap each other on the data line DL adjacent to each other, and the green color filter G and the red color filter B may overlap the data line DL adjacent to each other. can be nested on top. Here, the red light emitted from the red color filter (R), the green light emitted from the green color filter (G), and the blue light emitted from the blue color filter (B) are lights of different wavelengths as described above, They exhibit different permeation characteristics. The maximum transmittance may be different from each other according to the distance that the emitted light travels. Blue light may have a maximum transmittance at a shorter moving distance than green light, and red light may have a maximum transmittance at a longer moving distance than green light. The distance that the emitted light travels may correspond to a distance from the top surface of the first display substrate 100 to the upper substrate covering the first display substrate 100, ie, a cell gap of the display device. Accordingly, the red color filter R, the green color filter G, and the blue color filter B of the color filter CF of the first display substrate 100 according to the present exemplary embodiment take into account the above-described maximum transmittance of light. , may be formed with different thicknesses. The red color filter R may be formed to have a thickness smaller than that of the green color filter G, and the blue color filter B may be formed to have a greater thickness than the green color filter G. The red color filter (R), the green color filter (G), and the blue color filter (B) may be positioned side by side to form a step, and the red color filter (R), the green color filter (G), and the blue color filter (B) ) may also form a step corresponding to the color filter CF. The first display substrate 100 of the present embodiment may have a multi-cell gap structure that provides high light transmittance by forming different cell gaps according to the colors of the upper substrate and the color filter positioned to face each other.

The first insulating layer 120 may be formed on the color filter CF and the thin film transistor TR. The first insulating layer 120 may be an organic insulating layer formed of an organic material, and may block color mixing of the color filter CF and contact with the thin film transistor TR in a different configuration. In addition, the first insulating layer 120 may prevent the pigment of the color filter CF from flowing into other components. The first insulating layer 120 formed on the color filter CF may have a step corresponding to the thickness of the color filter CF.

A common electrode 130 may be formed on the first insulating layer 120 . The common electrode 130 may also have a step corresponding to the step of the first insulating layer 120 . The common electrode 130 may be a transparent conductive layer, and may interact with the pixel electrode 150 to form a fringe field. The common electrode is planar, and may be formed as a plate on the entire surface of the first insulating layer 120 , and may include openings formed in some regions of the non-transmissive regions NT1 , NT2 , and NT3 . The common electrode 130 may overlap the transmission areas T1 , T2 , and T3 of each pixel area PX. Also, the common electrode 130 may overlap a partial area of the non-transmissive areas NT1 , NT2 , and NT3 of each pixel area PX. A second insulating layer 140 may be formed on the common electrode 130 , and a plurality of pixel electrodes 150 may be formed on the second insulating layer 140 .

In this case, the second insulating layer 140 may be formed of an inorganic insulating material, and may have the same thickness in each pixel area PX. Accordingly, the distance between the common electrode 130 and the pixel electrode 150 in each pixel area PX may be maintained to be the same.

The plurality of pixel electrodes 150 may be respectively positioned to correspond to the plurality of pixel areas PX. Each pixel electrode 150 may overlap the transmissive regions T1 , T2 , and T3 of each pixel region PX, and each pixel electrode 150 includes the non-transmissive regions NT1 , NT2 and T3 of each pixel region PX. NT3) may overlap with some regions. The pixel electrode 150 may be connected to the thin film transistor TR in the non-transmissive regions NT1 , NT2 , and NT3 . The first insulating layer 120 and the second insulating layer 140 may include contact holes at positions corresponding to the non-transmissive regions NT1 , NT2 , NT3 of each pixel region PX, and the pixel electrode 150 . The silver may be connected to the drain electrode DE of the thin film transistor TR through the contact hole, and may receive a data voltage transmitted through the drain electrode DE. The pixel electrode 150 includes the plurality of branch electrodes 151 and at least one slit 152 corresponding to an opening between the plurality of branch electrodes 151 , and interacts with the common electrode 130 to form a fringe electric field ( Fringe Field) can be formed.

Meanwhile, the liquid crystal capacitance formed by the common electrode 130 and the pixel electrode 150 may be proportional to an area where the common electrode 130 and the pixel electrode 150 overlap. That is, the pixel electrode 150 of the first display substrate 102 according to the present embodiment may include the pixel electrode 150 formed to correspond to the thickness of the corresponding color filter CF, and thus each Liquid crystal capacitances in the transmission region of the pixel region may be different from each other.

It is not limited to the structure of the present invention that the liquid crystal capacitance is formed differently in the transmission areas T1, T2, and T3 of each of the pixel areas PX1, PX2, and PX3 according to the color filter CF having the step difference. No, the same may occur in a structure in which the common electrode 130 is positioned on the upper substrate.

In this case, in the first display substrate 100 according to the exemplary embodiment of the present invention, the overlapping area of the pixel electrode 150 and the common electrode 130 in areas other than the transmission regions T1 , T2 , and T3 are respectively defined. By forming differently according to the pixel areas PX1 , PX2 , and PX3 , the liquid crystal capacitance difference in the above-described transmissive areas T1 , T2 , and T3 may be compensated. The pixel electrode 150 may overlap the common electrode 130 even in the non-transmissive areas NT1 , NT2 , and NT3 where the color filter CF does not overlap, and the pixel electrode 150 and the common electrode 130 are formed in the non-transmissive area. The overlapping areas in NT1 , NT2 , and NT3 may be proportional to the thickness of each pixel electrode 150 and the corresponding color filter CF. Even if the thickness of the color filter CF is increased, the liquid crystal capacitance may not decrease by increasing the overlapping area of the pixel electrode 150 and the common electrode 130 in the non-transmissive regions NT1 , NT2 , and NT3 .

Specifically, the pixel electrode of the first pixel area PX1, the pixel electrode of the second pixel area PX2, and the pixel electrode of the third pixel area PX3 have an area for connection with the drain electrode DE. may be different. That is, the area of the pixel electrode connected to the drain electrode DE of the second pixel area PX2 may be larger than the area of the pixel electrode connected to the drain electrode DE of the first pixel area PX1 . An area of the pixel electrode connected to the drain electrode DE of the third pixel area PX2 may be larger than an area of the pixel electrode connected to the drain electrode DE of the first pixel area PX1 . As illustrated in FIG. 5 , which is a cross-sectional view of each pixel area taken along the first direction d1 , the cross-sectional area of each pixel electrode connected to the drain electrode DE is the third pixel area in the first pixel area PX1 . (PX3) can be larger. The cross-sectional area CW2 of the pixel electrode 130 of the second pixel area PX2 may be greater than the cross-sectional area CW1 of the pixel electrode 130 of the first pixel area PX1, and The cross-sectional area CW3 of the pixel electrode 130 of the third pixel area PX3 may be larger than the cross-sectional area CW2 of the pixel electrode 130 . In addition, the cross-sectional area of each pixel electrode 130 cut along the second direction d2 perpendicular to the first direction d1 is also larger than that of the first pixel area PX1 in the second pixel area PX2 and The third pixel area PX3 may be larger than the second pixel area PX2 . That is, in the pixel electrode 150 according to the present exemplary embodiment, the thickness of the corresponding color filter CF and the overlapping area of the common electrode 130 and the pixel electrode 150 in the non-transmissive regions NT1, NT2, and NT3 are proportional to each other. can do.

Also, the common electrode 130 may have a larger area in the non-transmissive area NT2 of the second pixel area PX2 than in the non-transmissive area NT1 of the first pixel area PX1 . That is, as shown in FIGS. 6 to 8 , in the non-transmissive regions NT1 , NT2 , and NT3 of each of the pixel regions PX1 , PX2 , and PX3 , the pixel electrode 150 and the drain electrode DE are connected to each other. The common electrode 130 formed adjacent to may be formed to occupy a larger area in the second pixel area PX2 than in the first pixel area PX1 . Furthermore, the common electrode 130 may be formed to occupy a larger area in the third pixel area PX3 than the second pixel area PX2 .

Accordingly, the overlapping area of the pixel electrode 150 connected to the drain electrode DE and the common electrode 130 is larger in the second pixel area PX2 than the first pixel area PX1, and the second pixel The third pixel area PX3 may be wider than the area PX2 . The overlapping area between the pixel electrode 150 and the common electrode 130 of the third pixel area PX3 in the non-transmissive areas NT1 , NT2 and NT3 is the pixel electrode 150 and the common electrode of the second pixel area PX2 . 150 may be larger than an overlapping area in the non-transmissive regions NT1 , NT2 , and NT3 . In addition, the overlapping area of the pixel electrode 150 and the common electrode 150 of the second pixel area PX2 in the non-transmissive areas NT1 , NT2 and NT3 is the pixel electrode 150 of the first pixel area PX1 and The common electrode 150 may be larger than an overlapping area in the non-transmissive regions NT1 , NT2 , and NT3 .

Accordingly, as the area occupied by the common electrode 130 in each of the pixel areas PX1 , PX2 , and PX3 increases, the overlapping area with the pixel electrode 150 increases, so that the pixel electrode positioned above the common electrode 130 . By forming an electric field with (150), the liquid crystal capacitance value can be increased. Accordingly, a difference in liquid crystal capacitance values in the transmission regions T1 , T2 , and T3 of each of the pixel regions PX1 , PX2 , and PX3 may be compensated for.

In the first display substrate 100 according to the present exemplary embodiment, a region where the pixel electrode 130 and the common electrode 150 overlap in a region connected to the drain electrode DE is formed according to the thickness of the corresponding color filter CF. can be formed Accordingly, it is possible to prevent a change in liquid crystal capacitance due to different thicknesses of the color filters CF, thereby preventing display quality from being deteriorated.

Hereinafter, an exemplary method of forming the pixel electrode of the above-described first display device will be described.

9A to 9E are cross-sectional views sequentially illustrating a process for forming a pixel electrode on a second insulating layer.

First, as shown in FIG. 9A , a conductive material layer 210 is formed on the surface of the second insulating layer 140 . The conductive material layer 210 may be formed of a transparent conductive material. For example, the conductive material layer 210 is transparent, such as indium tin oxide (ITO), indium zinc oxide (IZO), fluorine doped tin oxide (FTO), etc. It may be formed of a conductive oxide.

Next, as shown in FIG. 9B , a photoresist layer 220 is formed. For the photoresist layer, either a positive type in which a region irradiated with ultraviolet (UV) light is removed, or a negative type in which a region irradiated with ultraviolet (UV) remains after curing may be applied. In this embodiment, a case in which the positive type photoresist layer 220 is applied is exemplified. In each type, since a portion of the photoresist layer is not removed in a development step to be described later, a portion of the conductive material layer 210 formed thereunder may be protected.

On the other hand, the color filter CF under the photoresist layer 220 causes a step difference, and accordingly, the photoresist layer 220 stacked thereon may not have a uniform thickness and may have a different thickness for each region. This may be caused by a step difference between the lower components of the photoresist layer 220 . Specifically, as described above, the thickness of the color filter CF increases in the order of the red color filter R, the green color filter G, and the blue color filter B. As shown in FIG. Accordingly, the height from the surface of the first substrate 110 to the surface of the color filter increases in the order of the red color filter (R), the green color filter (G), and the blue color filter (B).

Although the first insulating layer 120 on the color filter CF may have some planarization function, it may not completely and uniformly planarize the surface height, and may partially reflect the step difference caused by the color filter CF. That is, the first insulating layer 120 is the thickest in the first pixel area PX1 where the red color filter R is formed, the second pixel area PX2 where the green color filter G is formed, and the blue color filter Although the thickness decreases toward the third pixel area PX3 on (B), the height from the surface of the first substrate 110 is still the first pixel area PX1 , the second pixel area PX2 and the third The pixel area PX3 may increase in order. Accordingly, the surface of the first insulating layer 120 has a step difference.

Similarly, the common electrode 130 and the second insulating layer 140 on the first insulating layer 120 may also have a surface step that reflects the difference in the surface of the lower first insulating layer 120 . The reflection rate of the surface step differs depending on the degree of planarization characteristics. For example, when an organic material is thickly coated, planarization characteristics are increased to reduce surface step reflection rate, and when an inorganic material is deposited in a thin thickness, planarization characteristics are low because it is deposited conformally to the lower profile, and the lower surface Step differences can be faithfully reflected. Since an inorganic material is used for the common electrode 130 and the second insulating layer 140 , the surface step difference of the first insulating layer 120 may be almost directly reflected. For the same reason, the conductive material layer 210 deposited on the second insulating layer 140 also faithfully reflects the step difference on the surface of the first insulating layer 120 to include a step having a different height for each area.

On the other hand, since the photoresist layer 220 is an organic material, in general, it has excellent planarization characteristics. Accordingly, the formed photoresist layer 220 has the thickest thickness h1 in the first pixel region PX1 having a relatively low height from the substrate surface and a third pixel region having a relatively high height from the substrate surface. The thickness h3 may be the thinnest. However, the excellent planarization characteristics do not necessarily mean that the surface is formed to be flat, and the surface of the formed photoresist layer 220 may also have a certain level of step.

Next, as shown in FIG. 9C , the photoresist layer 220 is selectively exposed using a photomask MS.

The photomask MS may be disposed to have the same distance from the first substrate 110 in all of the first to third pixel areas PX1 , PX2 , and PX3 .

At this time, due to the difference in the distance between the photoresist layer 220 and the photomask MS for each area, the first pixel area PX1 is relatively weakly irradiated with ultraviolet light, and the third pixel area PX3 is Ultraviolet (UV) light may be relatively weakly irradiated. That is, since the distance md3 between the photoresist layer and the photomask in the third pixel region is smaller than the distance md1 between the photoresist layer and the photomask in the first pixel region, thereby, each pixel region PX1 , PX2, PX3), there may be differences in the degree of exposure of the photoresist layer 220 .

In addition, even when the same level of UV rays are irradiated to the first to third pixel areas PX1 , PX2 , and PX3 , as described above, the thickness of the photoresist layer 220 of the first pixel area PX1 is increased. Since the thickness of the photoresist layer 220 of the third pixel area PX3 is relatively greater than the thickness of the photoresist layer 220 of the first pixel area PX1 , the lower area of the photoresist layer 220 of the third pixel area PX3 is The lower region of the resist layer 220 may be relatively less affected by ultraviolet (UV) light than the lower region of the resist layer 220 .

As a result, the photoresist layer 220 and the conductive material layer 210 are caused by the difference in the distance between the photoresist layer 220 and the photomask MS for each region and the difference in the thickness of the photoresist layer 220 for each region. ) may be different from each other at the boundary between the patterns of the photoresist layer (pw1, pw2, pw3). That is, at the boundary between the photoresist layer 220 and the conductive material layer 210 , the distances pw1 , pw2 , and pw3 for each pattern of the photoresist layer are the smallest in the first pixel area PX1 and the third pixel It may be the largest in the area PX3 .

In addition, after irradiating ultraviolet (UV) light to the photoresist layer 220 , a developing process of removing the exposed area 221 of the photoresist layer may be performed, and in this case, the exposed area 221 of the photoresist layer may be performed. ) can be removed. However, a shape in which a part of the photoresist layer 220 is removed may be partially different from the illustrated embodiment depending on a method and material used in the development process, but even in this case, the first to third pixel areas PX1 and PX2 , PX3), a difference in the degree of removal of the photoresist layer 220 may occur.

Next, as shown in FIG. 9( d ), etching may be performed to remove a portion 211 of the conductive material layer overlapping the exposed region 221 of the photoresist layer. In this case, the region 211 indicated by hatching of the conductive material layer may be removed. Even when etching is performed, a shape in which the conductive material is removed may be partially different from the illustrated embodiment depending on a method and a material used therefor, but even in this case, the first to third pixel areas PX1 , PX2 , and PX3 There may be differences in the degree of removal of the conductive material layer for each.

Next, as shown in FIG. 9(e), the remaining photoresist layer 220 may be removed, and when the remaining photoresist layer 220 is removed, the pixel electrode ( 150) may be formed.

That is, the width W1 of the branch electrode 151 of the first pixel area PX1 corresponding to the thin red color filter R is the second pixel area PX2 corresponding to the green color filter R. may be greater than the width W2 of the branch electrode 151 of . In addition, the width W3 of the branch electrode 151 of the third pixel area PX3 corresponding to the thick blue color filter G is the second pixel area PX2 corresponding to the green color filter G. may be greater than the width W2 of the branch electrode 151 of . That is, the width of the branch electrode 151 of each pixel electrode 150 may be inversely proportional to the thickness of the corresponding color filter CF.

Since the above-described process has been described using cross-sectional views, the width of the branch electrode of each pixel electrode has been described as the main variable. As a result, as shown in FIG. 3 , a difference may occur in an area occupied by the pixel electrode in the transmission regions T1 , T2 , and T3 of the pixel regions PX1 , PX2 , and PX3 , respectively.

The liquid crystal display 10 according to the present invention adjusts the overlapping area of the pixel electrode 150 and the common electrode 130 in the non-transmissive regions NT1, NT2, and NT3 as described above, thereby providing the pixel regions PX1 and PX1, respectively. In the transmission regions T1 , T2 , and T3 of the PX2 and PX3 , the effect of the difference in the area occupied by the pixel electrode 150 may be minimized.

Next, a first display substrate according to another exemplary embodiment of the present invention will be described.

10 is a plan view of a first display substrate according to another exemplary embodiment, and FIG. 11 is a cross-sectional view taken along line D-D′ of FIG. 10 . In the following embodiments, the same components as those already described are referred to by the same reference numerals, and duplicate descriptions will be omitted or simplified.

10 and 11 , the first pixel area PX1 , the second pixel area PX2 , and the third pixel area PX3 sequentially arranged in the first display substrate 101 according to the present exemplary embodiment are Each of the red color filter (R), the green color filter (G), and the blue color filter (B) may overlap. The first to third pixel areas PX1 , PX2 , and PX3 may be one unit pixel area DP. The first pixel area PX1 may be a red sub-pixel, the second pixel area PX2 may be a green sub-pixel, and the third pixel area PX3 may be a blue sub-pixel. The red color filter R may be formed to have a thickness smaller than that of the green color filter G, and the blue color filter B may be formed to have a greater thickness than the green color filter G. The red color filter (R), the green color filter (G), and the blue color filter (B) may be positioned side by side to form a step, and the red color filter (R), the green color filter (G), and the blue color filter (B) ) may also form a step corresponding to the color filter CF. The first display substrate 101 of the present embodiment may have a multi-cell gap structure that provides high light transmittance by forming different cell gaps depending on the color of the color filter and the upper substrate positioned to face each other. The liquid crystal capacitance of each of the sub-pixel areas PX1 , PX2 , and PX3 may be formed differently according to the color filter CF having the stepped difference. However, in the first display substrate 101 according to the present exemplary embodiment, the overlapping area of the pixel electrode 150 and the common electrode 130 in regions other than the transparent regions T1 , T2 , and T3 is determined according to each pixel region. By forming it differently, the above-described liquid crystal capacitance difference can be compensated.

The common electrode 130 and the pixel electrode 150 may be formed in partial regions of the transmissive regions T1 , T2 , and T3 and the non-transmissive regions NT1 , NT2 , and NT3 of each pixel region. For connection with the drain electrode DE of the thin film transistor TR, the thin film transistor TR may be formed to overlap a portion of the non-transmissive regions NT1 , NT2 , and NT3 . The common electrode 150 may be formed in the non-transmissive regions NT1 , NT2 , and NT3 to overlap at least an upper portion of the thin film transistor TR.

The pixel electrode 150 of the first display substrate 101 according to the present exemplary embodiment may include a protruding electrode 153 protruding into the non-transmissive regions NT1 , NT2 , and NT3 of each pixel region. The protrusion electrode 153 may overlap an upper portion of the thin film transistor TR in the non-transmissive region, and may form an electric field with the common electrode 130 formed on the thin film transistor TR. The area of the protruding electrode 153 may correspond to the thickness of the corresponding color filter CF. That is, when the thickness of the color filter CF corresponding to the pixel electrode 150 is thin, the protrusion electrode 153 may be formed in a small area, and the thickness of the color filter CF corresponding to the pixel electrode 150 is small. In the case where is thick, the protruding electrode 153 may be formed to have a large area. In addition, when it is assumed that liquid crystal capacitances of other pixel areas PX2 and PX3 are compensated for with respect to the first pixel area PX1 , the protrusion electrode 153 may not be formed in the first pixel area PX1 . That is, in consideration of the liquid crystal capacitance compensation value, the pixel electrode 150 of the second pixel area PX2 and the pixel electrode 150 of the third pixel area PX3 have a predetermined area that may overlap the common electrode 130 . Each of the protrusion electrodes 153 may be included, and the protrusion electrode 153 of the third pixel area PX3 may have a larger area than the protrusion electrode 153 of the second pixel area PX2 .

In the first display substrate 101 according to the present exemplary embodiment, the protrusion electrode 153 overlapping the upper portion of the thin film transistor TR corresponds to the thickness of the corresponding color filter CF in each pixel area PX1 , PX2 , and PX3 . Each can be formed in a different area. That is, the area of the protruding electrode 153 may be proportional to the thickness of the color filter CF. Accordingly, it is possible to prevent a change in liquid crystal capacitance due to different thicknesses of the color filters CF, thereby preventing display quality from being deteriorated. Other descriptions of the first display substrate 101 are omitted because they are substantially the same as those of the first display substrate 100 of FIGS. 2 to 10 having the same name.

Although the embodiments of the present invention have been described above with reference to the accompanying drawings, those of ordinary skill in the art to which the present invention pertains may be embodied in other specific forms without changing the technical spirit or essential features of the present invention. you will be able to understand Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

10: liquid crystal display device
100: first display substrate
110: first substrate
120: first insulating layer
130: common electrode
140: second insulating layer
150: pixel electrode
160: gate insulating film
CF: color filter
PX: pixel area

Claims (20)

a first substrate including a first pixel region including a first transmissive region and a first non-transmissive region and a second pixel region including a second transmissive region and a second non-transmissive region;
a first pixel electrode disposed in the first pixel area on the first substrate; and
a second pixel electrode disposed in the second pixel area on the first substrate;
an area of the first pixel electrode in the first transmissive region is larger than an area of the second pixel electrode in the second transmissive region;
An area of the first pixel electrode in the first non-transmissive region is smaller than an area of the second pixel electrode in the second non-transmissive region. According to claim 1,
a common electrode disposed on the first substrate and disposed below or above the first pixel electrode and the second pixel electrode;
An overlapping area of the first pixel electrode and the common electrode in the first non-transmissive area is smaller than an overlapping area of the second pixel electrode and the common electrode in the second non-transmissive area. 3. The method of claim 2,
An overlapping area of the first pixel electrode and the common electrode in the first pixel area is the same as an overlapping area of the second pixel electrode and the common electrode in the second pixel area. 3. The method of claim 2,
Further comprising a common electrode disposed on the first substrate,
An area of the common electrode in the first non-transmissive region is smaller than an area of the common electrode in the second non-transmissive region. 3. The method of claim 2,
A distance between the first pixel electrode and the common electrode in the first pixel region is the same as a distance between the second pixel electrode and the common electrode in the second pixel region. According to claim 1,
the first pixel electrode further includes a first protruding electrode protruding from the first transmissive region to the first non-transmissive region;
The second pixel electrode further includes a second protruding electrode protruding from the second transmissive region to the second non-transmissive region;
An area of the second protruding electrode is larger than an area of the first protruding electrode. 7. The method of claim 6,
Further comprising: a first thin film transistor disposed in the first non-transmissive region on the first substrate and a second thin film transistor disposed in the second non-transmissive region on the first substrate;
the first and second thin film transistors are disposed under the first and second pixel electrodes;
the first protruding electrode overlaps the first thin film transistor;
and the second protruding electrode overlaps the second thin film transistor. According to claim 1,
the first pixel electrode includes a plurality of branch electrodes and a plurality of openings formed between the plurality of branch electrodes;
The second pixel electrode includes a plurality of branch electrodes and a plurality of openings formed between the plurality of branch electrodes,
A width of the plurality of branch electrodes of the first pixel electrode is wider than a waterfall of the plurality of branch electrodes of the second pixel electrode. According to claim 1,
Further comprising a first color filter disposed in the first transmission region and a second color filter disposed in the second transmission region,
the first color filter is disposed between the first substrate and the first pixel electrode;
the second color filter is disposed between the first substrate and the second pixel electrode;
A thickness of the first color filter is smaller than a thickness of the second color filter. According to claim 1,
The first substrate further includes a third pixel region disposed side by side with the second pixel region and including a third transmissive region and a third non-transmissive region, and a third pixel electrode disposed in the third pixel region;
an area of the third pixel electrode in the third transmissive region is smaller than an area of the first and second pixel electrodes in the first and second transmissive regions;
An area of the third pixel electrode in the third non-transmissive region is larger than an area of the first and second pixel electrodes in the first and second non-transmissive regions. 11. The method of claim 10,
Further comprising a third color filter disposed in the third transmission region,
the third color filter is disposed between the first substrate and the third pixel electrode;
A thickness of the third color filter is greater than a thickness of the first and second color filters. 12. The method of claim 11,
The first to third color filters are red, green, and blue color filters, respectively. According to claim 1,
Further comprising: a first thin film transistor disposed in the first non-transmissive region on the first substrate and a second thin film transistor disposed in the second non-transmissive region on the first substrate;
the first and second thin film transistors are disposed under the first and second pixel electrodes;
the first pixel electrode and the first thin film transistor are connected through a first contact hole disposed in the first non-transmissive region;
the second pixel electrode and the second thin film transistor are connected through a second contact hole disposed in the second non-transmissive region;
An area of the first pixel electrode overlapping the first contact hole for connection with the first thin film transistor is formed to overlap with the second contact hole for connection with the second thin film transistor A liquid crystal display device having a smaller area than that of the second pixel electrode. a first substrate including a first pixel region including a first transmissive region and a first non-transmissive region and a second pixel region including a second transmissive region and a second non-transmissive region;
a first pixel electrode disposed in the first pixel area on the first substrate; and
a second pixel electrode disposed in the second pixel area on the first substrate;
a length from the first substrate to the first pixel electrode in the first transmissive region is smaller than a length from the first substrate to the second pixel electrode in the second transmissive region;
An area of the first pixel electrode in the first non-transmissive region is smaller than an area of the second pixel electrode in the second non-transmissive region. 15. The method of claim 14,
a common electrode disposed on the first substrate and disposed below or above the first pixel electrode and the second pixel electrode;
An overlapping area of the first pixel electrode and the common electrode in the first non-transmissive area is smaller than an overlapping area of the second pixel electrode and the common electrode in the second non-transmissive area. 16. The method of claim 15,
An overlapping area of the first pixel electrode and the common electrode in the first pixel area is the same as an overlapping area of the second pixel electrode and the common electrode in the second pixel area. 16. The method of claim 15,
Further comprising a common electrode disposed on the first substrate,
An area of the common electrode in the first non-transmissive region is smaller than an area of the common electrode in the second non-transmissive region. 16. The method of claim 15,
A distance between the first pixel electrode and the common electrode in the first pixel region is the same as a distance between the second pixel electrode and the common electrode in the second pixel region. 15. The method of claim 14,
Further comprising a first color filter disposed in the first transmission region and a second color filter disposed in the second transmission region,
the first color filter is disposed between the first substrate and the first pixel electrode;
the second color filter is disposed between the first substrate and the second pixel electrode;
A thickness of the first color filter is smaller than a thickness of the second color filter. 15. The method of claim 14,
the first pixel electrode further includes a first protruding electrode protruding from the first transmissive region to the first non-transmissive region;
The second pixel electrode further includes a second protruding electrode protruding from the second transmissive region to the second non-transmissive region;
An area of the second protruding electrode is larger than an area of the first protruding electrode.

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