KR102343709B1 - Composition for light shielding partition, light shielding partition using the same and display device including the light shielding partition - Google Patents
Composition for light shielding partition, light shielding partition using the same and display device including the light shielding partition Download PDFInfo
- Publication number
- KR102343709B1 KR102343709B1 KR1020190047930A KR20190047930A KR102343709B1 KR 102343709 B1 KR102343709 B1 KR 102343709B1 KR 1020190047930 A KR1020190047930 A KR 1020190047930A KR 20190047930 A KR20190047930 A KR 20190047930A KR 102343709 B1 KR102343709 B1 KR 102343709B1
- Authority
- KR
- South Korea
- Prior art keywords
- light
- pigment
- barrier rib
- composition
- light blocking
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 77
- 238000005192 partition Methods 0.000 title 3
- 230000004888 barrier function Effects 0.000 claims abstract description 105
- 239000000654 additive Substances 0.000 claims abstract description 37
- 230000000996 additive effect Effects 0.000 claims abstract description 32
- 239000005871 repellent Substances 0.000 claims abstract description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 230000002940 repellent Effects 0.000 claims abstract description 27
- 239000011347 resin Substances 0.000 claims abstract description 21
- 229920005989 resin Polymers 0.000 claims abstract description 21
- 239000011230 binding agent Substances 0.000 claims abstract description 17
- 239000000178 monomer Substances 0.000 claims abstract description 17
- 239000002904 solvent Substances 0.000 claims abstract description 17
- 239000002981 blocking agent Substances 0.000 claims abstract description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000049 pigment Substances 0.000 claims description 68
- 230000000903 blocking effect Effects 0.000 claims description 36
- 239000003795 chemical substances by application Substances 0.000 claims description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 28
- 239000002096 quantum dot Substances 0.000 claims description 26
- 239000001055 blue pigment Substances 0.000 claims description 23
- 239000001054 red pigment Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 17
- 239000004094 surface-active agent Substances 0.000 claims description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 7
- 239000007822 coupling agent Substances 0.000 claims description 7
- 229910000077 silane Inorganic materials 0.000 claims description 7
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 5
- 239000001053 orange pigment Substances 0.000 claims description 4
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 claims description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 3
- 239000001056 green pigment Substances 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 abstract description 13
- 125000001153 fluoro group Chemical group F* 0.000 abstract description 10
- 239000003999 initiator Substances 0.000 abstract description 10
- 150000001875 compounds Chemical class 0.000 description 26
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 23
- 239000000126 substance Substances 0.000 description 17
- -1 phenol anhydride compounds Chemical class 0.000 description 16
- 239000002270 dispersing agent Substances 0.000 description 14
- 239000000976 ink Substances 0.000 description 11
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 238000011161 development Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000005907 alkyl ester group Chemical group 0.000 description 6
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- 229940022663 acetate Drugs 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 229910017053 inorganic salt Inorganic materials 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- GPSDUZXPYCFOSQ-UHFFFAOYSA-N m-toluic acid Chemical compound CC1=CC=CC(C(O)=O)=C1 GPSDUZXPYCFOSQ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 150000002923 oximes Chemical class 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012661 block copolymerization Methods 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- LPYQDDHAJRABQA-DYESRHJHSA-N (3r)-3-[(13r)-13-hydroxy-10-oxotetradecyl]-5,7-dimethoxy-3h-2-benzofuran-1-one Chemical compound COC1=CC(OC)=CC2=C1C(=O)O[C@@H]2CCCCCCCCCC(=O)CC[C@@H](C)O LPYQDDHAJRABQA-DYESRHJHSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 1
- VQYUAFDBUVMFKD-UHFFFAOYSA-N 1-(4-phenylsulfanylphenyl)octane-1,2-dione Chemical compound C1=CC(C(=O)C(=O)CCCCCC)=CC=C1SC1=CC=CC=C1 VQYUAFDBUVMFKD-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- ODRLUQGNINLIRR-UHFFFAOYSA-N 1-propylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCC ODRLUQGNINLIRR-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- DQMOHZLFVGYNAN-UHFFFAOYSA-N 2-(2-phenylethenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2C=CC=CC=2)=N1 DQMOHZLFVGYNAN-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-UHFFFAOYSA-N 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-UHFFFAOYSA-N 0.000 description 1
- LCSAOPVSVLGDLE-UHFFFAOYSA-N 2-[[4-[9-[4-(oxiran-2-ylmethoxy)phenyl]fluoren-9-yl]phenoxy]methyl]oxirane Chemical compound C1OC1COC(C=C1)=CC=C1C1(C2=CC=CC=C2C2=CC=CC=C21)C(C=C1)=CC=C1OCC1CO1 LCSAOPVSVLGDLE-UHFFFAOYSA-N 0.000 description 1
- FGTYTUFKXYPTML-UHFFFAOYSA-N 2-benzoylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 FGTYTUFKXYPTML-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- AAXRSWGYLGOFQP-UHFFFAOYSA-N 2-butoxy-1-(2-butoxyphenyl)ethanone Chemical compound CCCCOCC(=O)C1=CC=CC=C1OCCCC AAXRSWGYLGOFQP-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- MRDMGGOYEBRLPD-UHFFFAOYSA-N 2-ethoxy-1-(2-ethoxyphenyl)ethanone Chemical compound CCOCC(=O)C1=CC=CC=C1OCC MRDMGGOYEBRLPD-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- BKBZFJRHYSCZQA-UHFFFAOYSA-N 2-methoxy-2-methylpropanoic acid Chemical compound COC(C)(C)C(O)=O BKBZFJRHYSCZQA-UHFFFAOYSA-N 0.000 description 1
- ICPWFHKNYYRBSZ-UHFFFAOYSA-M 2-methoxypropanoate Chemical compound COC(C)C([O-])=O ICPWFHKNYYRBSZ-UHFFFAOYSA-M 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- WYYQKWASBLTRIW-UHFFFAOYSA-N 2-trimethoxysilylbenzoic acid Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1C(O)=O WYYQKWASBLTRIW-UHFFFAOYSA-N 0.000 description 1
- VKPLPDIMEREJJF-UHFFFAOYSA-N 3-methoxybenzamide Chemical compound COC1=CC=CC(C(N)=O)=C1 VKPLPDIMEREJJF-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- UNDXPKDBFOOQFC-UHFFFAOYSA-N 4-[2-nitro-4-(trifluoromethyl)phenyl]morpholine Chemical compound [O-][N+](=O)C1=CC(C(F)(F)F)=CC=C1N1CCOCC1 UNDXPKDBFOOQFC-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- VZJCLNWCJGKJOI-UHFFFAOYSA-N 4-ethoxybutanoic acid Chemical compound CCOCCCC(O)=O VZJCLNWCJGKJOI-UHFFFAOYSA-N 0.000 description 1
- VRRCYIFZBSJBAT-UHFFFAOYSA-N 4-methoxybutanoic acid Chemical compound COCCCC(O)=O VRRCYIFZBSJBAT-UHFFFAOYSA-N 0.000 description 1
- PFVOFZIGWQSALT-UHFFFAOYSA-N 5-ethoxypentanoic acid Chemical compound CCOCCCCC(O)=O PFVOFZIGWQSALT-UHFFFAOYSA-N 0.000 description 1
- FECCQKBXUJUGSF-UHFFFAOYSA-N 5-methoxypentanoic acid Chemical compound COCCCCC(O)=O FECCQKBXUJUGSF-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PSBPNWBGNOWCCU-UHFFFAOYSA-N OB(O)O.S.S.S Chemical compound OB(O)O.S.S.S PSBPNWBGNOWCCU-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229910005965 SO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- HTMMMSIQFWMMIJ-UHFFFAOYSA-N [3-[2,2-dimethyl-3-(6-prop-2-enoyloxyhexanoyloxy)propanoyl]oxy-2,2-dimethylpropyl] 6-prop-2-enoyloxyhexanoate Chemical compound C=CC(=O)OCCCCCC(=O)OCC(C)(C)COC(=O)C(C)(C)COC(=O)CCCCCOC(=O)C=C HTMMMSIQFWMMIJ-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- YNTQTLGBCMXNFX-UHFFFAOYSA-N [5-ethyl-2-(2-methyl-1-prop-2-enoyloxypropan-2-yl)-1,3-dioxan-5-yl]methyl prop-2-enoate Chemical compound C=CC(=O)OCC1(CC)COC(C(C)(C)COC(=O)C=C)OC1 YNTQTLGBCMXNFX-UHFFFAOYSA-N 0.000 description 1
- VTIBEXNGFOHUNW-UHFFFAOYSA-N [[3-cyclopentyl-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]propylidene]amino] acetate Chemical compound C(C)(=O)ON=C(CCC1CCCC1)C=1C=CC=2N(C3=CC=C(C=C3C=2C=1)C(C1=C(C=CC=C1)C)=O)CC VTIBEXNGFOHUNW-UHFFFAOYSA-N 0.000 description 1
- OFUWNULILNEATR-UHFFFAOYSA-N [[3-cyclopentyl-1-oxo-1-(4-phenylsulfanylphenyl)propan-2-ylidene]amino] benzoate Chemical compound O=C(ON=C(CC1CCCC1)C(=O)C1=CC=C(SC2=CC=CC=C2)C=C1)C1=CC=CC=C1 OFUWNULILNEATR-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- IWPATTDMSUYMJV-UHFFFAOYSA-N butyl 2-methoxyacetate Chemical compound CCCCOC(=O)COC IWPATTDMSUYMJV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- IPHJYJHJDIGARM-UHFFFAOYSA-M copper phthalocyaninesulfonic acid, dioctadecyldimethylammonium salt Chemical compound [Cu+2].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC.C=1C(S(=O)(=O)[O-])=CC=C(C(=NC2=NC(C3=CC=CC=C32)=N2)[N-]3)C=1C3=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 IPHJYJHJDIGARM-UHFFFAOYSA-M 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- WDAXFOBOLVPGLV-UHFFFAOYSA-N ethyl isobutyrate Chemical compound CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 125000005549 heteroarylene group Chemical group 0.000 description 1
- 125000004366 heterocycloalkenyl group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- 125000005638 hydrazono group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- PPFNAOBWGRMDLL-UHFFFAOYSA-N methyl 2-ethoxyacetate Chemical compound CCOCC(=O)OC PPFNAOBWGRMDLL-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- GVXVZOSSRRPQRZ-UHFFFAOYSA-N propane-1,2-diol;propan-2-yl acetate Chemical compound CC(O)CO.CC(C)OC(C)=O GVXVZOSSRRPQRZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- C08F2/00—Processes of polymerisation
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/017—Structures with periodic or quasi periodic potential variation, e.g. superlattices, quantum wells
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Abstract
(A) 카도계 바인더 수지, (B) 아크릴계 광중합성 단량체, (C) 광중합 개시제, (D) 차광제, (E) 주쇄에 플루오린 원자(F)를 포함하는 발수성 첨가제 및 (F) 용매를 포함하는 차광용 격벽 조성물, 이를 이용하여 제조된 차광용 격벽 및 상기 차광용 격벽을 포함하는 디스플레이 장치가 제공된다.(A) a cardo-based binder resin, (B) an acrylic photopolymerizable monomer, (C) a photopolymerization initiator, (D) a light blocking agent, (E) a water repellent additive containing a fluorine atom (F) in the main chain, and (F) a solvent Provided are a light-shielding barrier rib composition comprising: a light-shielding barrier rib manufactured using the same, and a display device including the light-shielding barrier rib.
Description
본 기재는 차광용 격벽 조성물, 이를 이용하여 제조된 차광용 격벽 및 상기 차광용 격벽을 포함하는 디스플레이 장치에 관한 것이다.The present disclosure relates to a light-shielding barrier rib composition, a light-blocking barrier rib manufactured using the same, and a display device including the light-shielding barrier rib.
디스플레이 소자는 고해상도와 고휘도를 구현하기 위해 패널 구조의 변화가 지속적으로 이뤄지고 있다. 이러한 변화 중 패널 특성을 향상시키기 위해 OLED와 양자점을 적용한 고기술화로 디바이스를 개선하려는 움직임이 있다. 그리고 각각의 기술이 가지고 있는 한계를 극복하여 더 나은 특성을 구현하기 위해 OLED와 양자점을 동시에 적용하고자 하는 기술 개발이 활발히 이뤄지고 있다.In order to realize high-resolution and high-brightness display elements, the panel structure is constantly being changed. Among these changes, there is a movement to improve devices by applying high-tech OLED and quantum dots to improve panel characteristics. In addition, to overcome the limitations of each technology and realize better characteristics, technology development to simultaneously apply OLED and quantum dots is being actively carried out.
OLED와 양자점을 동시에 적용하기 위해서는 OLED를 광원으로 사용하고, 양자점을 이용해 색을 구현해야 하는데, 양자점 함유 조성물을 잉크젯(ink jetting) 방식으로 도포하기 위해서는, 양자점 함유 잉크가 서로 섞이지 않도록 하기 위해 차광용 격벽이 필요하다. 구체적으로, 양자점 함유 잉크가 서로 섞이지 않도록 하기 위해서는 양자점 함유 잉크를 차광용 격벽 패턴 내부로 충진해야 하므로, 상기 차광용 격벽 패턴 표면(격벽의 위 표면)은 소수성 또는 발수성(발액성)의 성질을 가져야하고, 격벽을 이루는 패턴 내부(격벽의 side wall)는 친수성(친액성)의 성질을 가져야 한다. 즉, 두 개의 성질을 하나의 패턴에 구현해야 하는데, 종래에는 서로 상응하지 않는 두 개의 성질(발수성 및 친수성)을 하나의 패턴에 구현하는 데 어려움이 있었다. 또한, 종래에는 차광성 조성물의 광학밀도를 높이기 위해 카본블랙을 사용하였으나, 이 경우 노광 공정 시 패턴의 하단까지 빛이 조사되지 않아, 막의 하부는 광경화가 이루어지지 않아 현상 공정 진행 후, 언더컷 현상이 심하게 유발하게 되며 공정마진에 취약한 단점도 있었다. 잉크젯용 격벽(차광용 격벽) 재료의 경우 요구되는 막의 두께가 4㎛ 이상으로 높기 때문에, 노광 및 현상 공정 진행 후, 막의 표면만 경화되고, 하부의 광경화율이 떨어지며, 접착 특성도 나빠지게 되는 것이다.In order to apply OLED and quantum dots at the same time, OLED should be used as a light source and color should be realized using quantum dots. bulkheads are needed Specifically, in order to prevent the quantum dot-containing ink from mixing with each other, the quantum dot-containing ink must be filled into the light-shielding barrier rib pattern. and the inside of the pattern constituting the barrier rib (the side wall of the barrier rib) should have hydrophilic (lyophilic) properties. That is, two properties should be implemented in one pattern. In the prior art, it was difficult to implement two properties (water repellency and hydrophilicity) that do not correspond to each other in one pattern. In addition, in the prior art, carbon black was used to increase the optical density of the light-shielding composition, but in this case, light was not irradiated to the lower end of the pattern during the exposure process, and the lower part of the film was not photocured. There was also the disadvantage of being severely induced and vulnerable to process margins. In the case of an inkjet barrier rib (light-shielding barrier) material, since the required film thickness is as high as 4 μm or more, after the exposure and development process, only the surface of the film is cured, the photocurability of the lower part is lowered, and the adhesive properties are also deteriorated. .
따라서, 상기와 같은 문제점을 해결할 수 있는 차광용 격벽 조성물 및 이를 이용한 차광용 격벽을 개발하려는 연구가 계속되고 있다.Therefore, research to develop a light-shielding barrier rib composition capable of solving the above problems and a light-shielding barrier rib using the same is continued.
일 구현예는 잉크 젯팅(ink-jetting) 시 잉크 간 혼색이 일어나는 것을 방지할 수 있는 차광용 격벽 조성물을 제공하기 위한 것이다.One embodiment is to provide a barrier rib composition for blocking light that can prevent color mixing between inks during ink-jetting.
다른 일 구현예는 상기 차광용 격벽 조성물을 이용하여 제조된 차광용 격벽을 제공하기 위한 것이다. Another embodiment is to provide a light-shielding barrier rib manufactured using the light-shielding barrier rib composition.
또 다른 일 구현예는 상기 차광용 격벽을 포함하는 디스플레이 장치를 제공하기 위한 것이다.Another embodiment is to provide a display device including the light blocking barrier rib.
일 구현예는 (A) 카도계 바인더 수지, (B) 아크릴계 광중합성 단량체, (C) 광중합 개시제, (D) 차광제, (E) 주쇄에 플루오린 원자(F)를 포함하는 발수성 첨가제 및 (F) 용매를 포함하는 차광용 격벽 조성물을 제공한다.In one embodiment, (A) a cardo-based binder resin, (B) an acrylic photopolymerizable monomer, (C) a photopolymerization initiator, (D) a light blocking agent, (E) a water repellent additive comprising a fluorine atom (F) in the main chain, and ( F) Provided is a light-shielding barrier rib composition comprising a solvent.
상기 발수성 첨가제의 주쇄는 하기 화학식 1로 표시되는 구조단위를 포함할 수 있다.The main chain of the water repellent additive may include a structural unit represented by Formula 1 below.
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
m 및 n은 각각 독립적으로 0 이상의 정수이되, 단 5 < m+n < 100 이다.m and n are each independently an integer greater than or equal to 0, provided that 5 < m+n < 100.
상기 발수성 첨가제는 말단에 (메타)아크릴레이트기를 포함할 수 있다.The water repellent additive may include a (meth)acrylate group at the end.
상기 발수성 첨가제는 5000 g/mol 내지 100000 g/mol의 중량평균분자량을 가질 수 있다.The water repellent additive may have a weight average molecular weight of 5000 g/mol to 100000 g/mol.
상기 발수성 첨가제는 상기 차광용 격벽 조성물 총량에 대해 0.1 중량% 내지 2 중량%로 포함될 수 있다.The water repellent additive may be included in an amount of 0.1 wt% to 2 wt% based on the total amount of the light-shielding barrier rib composition.
상기 차광제는 무기흑색안료 또는 유기흑색안료를 포함할 수 있다.The light blocking agent may include an inorganic black pigment or an organic black pigment.
상기 차광제는 적색안료, 청색안료, 바이올렛안료, 녹색안료 및 오렌지안료로 이루어진 군에서 선택된 3 이상의 안료의 혼합물을 포함할 수 있다.The light blocking agent may include a mixture of three or more pigments selected from the group consisting of a red pigment, a blue pigment, a violet pigment, a green pigment, and an orange pigment.
상기 차광제는 적색안료, 청색안료 및 바이올렛안료의 혼합물을 포함하고, 상기 적색안료, 청색안료 및 바이올렛안료는 각각 3 내지 4 : 2.5 내지 3.5 : 1의 중량비로 혼합되어 있을 수 있다.The light blocking agent may include a mixture of a red pigment, a blue pigment, and a violet pigment, and the red pigment, the blue pigment and the violet pigment may be mixed in a weight ratio of 3 to 4: 2.5 to 3.5:1, respectively.
상기 차광용 격벽 조성물은 확산제를 더 포함할 수 있다.The barrier rib composition for light blocking may further include a diffusing agent.
상기 확산제는 황산바륨, 탄산칼슘, 이산화티타늄, 지르코니아 또는 이들의 조합을 포함할 수 있다.The dispersing agent may include barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.
상기 차광용 격벽 조성물은 말론산, 3-아미노-1,2-프로판디올, 실란계 커플링제, 레벨링제, 계면활성제 또는 이들의 조합을 더 포함할 수 있다.The light blocking barrier composition may further include malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof.
다른 일 구현예는 상기 차광용 격벽 조성물을 이용하여 제조된 차광용 격벽을 제공한다.Another embodiment provides a light-shielding barrier rib manufactured by using the light-shielding barrier rib composition.
상기 차광용 격벽은 10 dyne/cm 내지 25 dyne/cm의 표면에너지를 가질 수 있다.The light blocking barrier rib may have a surface energy of 10 dyne/cm to 25 dyne/cm.
또 다른 일 구현예는 상기 차광용 격벽을 포함하는 디스플레이 장치를 제공한다.Another embodiment provides a display device including the light blocking barrier rib.
상기 디스플레이 장치는 광원 및 오버코트층을 더 포함하고, 상기 차광용 격벽 사이에 양자점이 위치할 수 있다.The display device may further include a light source and an overcoat layer, and quantum dots may be positioned between the light blocking barrier ribs.
상기 광원은 유기발광다이오드(OLED)일 수 있다.The light source may be an organic light emitting diode (OLED).
상기 유기발광다이오드(OLED)는 청색 유기발광다이오드(OLED)일 수 있다.The organic light emitting diode (OLED) may be a blue organic light emitting diode (OLED).
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.The specific details of other aspects of the invention are included in the detailed description below.
일 구현예는 종래 차광용 격벽보다 표면에너지를 낮출 수 있는 차광용 격벽 조성물을 제공할 수있고, 상기 차광용 격벽 조성물을 이용하여 제조된 낮은 표면에너지를 가지는 차광용 격벽은 잉크젯팅 시 잉크끼리의 혼색을 사전에 차단할 수 있어, 궁극적으로 상기 차광용 격벽을 포함하는 디스플레이 장치의 발광 효율을 높일 수 있다.One embodiment may provide a light-shielding barrier rib composition capable of lowering the surface energy than the conventional light-shielding barrier rib composition, and the light-shielding barrier rib having a low surface energy manufactured by using the light-shielding barrier rib composition is a barrier between inks during inkjetting. It is possible to block color mixture in advance, and ultimately, it is possible to increase the luminous efficiency of the display device including the light-shielding barrier rib.
도 1 내지 도 3은 각각 독립적으로 일 구현예에 따른 디스플레이 소자를 나타낸 모식도이다.1 to 3 are schematic views each independently showing a display device according to an embodiment.
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다. Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "알킬기"란 C1 내지 C20 알킬기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, "사이클로알케닐기"란 C3 내지 C20 사이클로알케닐기를 의미하고, "헤테로사이클로알케닐기"란 C3 내지 C20 헤테로사이클로알케닐기를 의미하고, "아릴기"란 C6 내지 C20 아릴기를 의미하고, "아릴알킬기"란 C6 내지 C20 아릴알킬기를 의미하며, "알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, "아릴렌기"란 C6 내지 C20 아릴렌기를 의미하고, "알킬아릴렌기"란 C6 내지 C20 알킬아릴렌기를 의미하고, "헤테로아릴렌기"란 C3 내지 C20 헤테로아릴렌기를 의미하고, "알콕실렌기"란 C1 내지 C20 알콕실렌기를 의미한다.Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, "cycloalkenyl group" means a C3 to C20 cycloalkenyl group, , "heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C6 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It means an arylene group, and "alkoxyylene group" means a C1 to C20 alkoxyylene group.
본 명세서에서 특별한 언급이 없는 한, "치환"이란 적어도 하나의 수소 원자가 할로겐원자(F, Cl, Br, I), 히드록시기, C1 내지 C20 알콕시기, 니트로기, 시아노기, 아민기, 이미노기, 아지도기, 아미디노기, 히드라지노기, 히드라조노기, 카르보닐기, 카르바밀기, 티올기, 에스테르기, 에테르기, 카르복실기 또는 그것의 염, 술폰산기 또는 그것의 염, 인산이나 그것의 염, C1 내지 C20 알킬기, C2 내지 C20 알케닐기, C2 내지 C20 알키닐기, C6 내지 C20 아릴기, C3 내지 C20 사이클로알킬기, C3 내지 C20 사이클로알케닐기, C3 내지 C20 사이클로알키닐기, C2 내지 C20 헤테로사이클로알킬기, C2 내지 C20 헤테로사이클로알케닐기, C2 내지 C20 헤테로사이클로알키닐기, C3 내지 C20 헤테로아릴기 또는 이들의 조합의 치환기로 치환된 것을 의미한다.Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxyl group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or a salt thereof, sulfonic acid group or a salt thereof, phosphoric acid or a salt thereof, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof means substituted with a substituent.
또한 본 명세서에서 특별한 언급이 없는 한, "헤테로"란, 화학식 내에 N, O, S 및 P 중 적어도 하나의 헤테로 원자가 적어도 하나 포함된 것을 의미한다.In addition, unless otherwise specified in the present specification, "hetero" means that at least one hetero atom among N, O, S and P is included in the formula.
또한 본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, "(메타)아크릴산"은 "아크릴산"과 "메타크릴산" 둘 다 가능함을 의미한다. In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" is "acrylic acid" and "methacrylic acid" “It means that both are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 혼합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고, "공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다.Unless otherwise defined herein, "combination" means mixing or copolymerization. Also, "copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymerization or random copolymerization.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formulas in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.
본 명세서에서 카도계 수지란, 하기 화학식 2-1 내지 화학식 2-11로 이루어진 군에서 선택된 하나 이상의 관능기가 수지 내 주골격(backbone)에 포함되는 수지를 의미한다.As used herein, the cardo-based resin refers to a resin in which one or more functional groups selected from the group consisting of the following Chemical Formulas 2-1 to 2-11 are included in the backbone of the resin.
본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자(수소원자 포함) 또는 화학식과 연결되는 부분을 의미한다.Unless otherwise defined herein, "*" means the same or different atom (including a hydrogen atom) or a portion connected to a chemical formula.
일 구현예에 따른 차광용 격벽 조성물은 (A) 카도계 바인더 수지, (B) 아크릴계 광중합성 단량체, (C) 광중합 개시제, (D) 차광제, (E) 발수성 첨가제 및 (F) 용매를 포함하며, 상기 발수성 첨가제는 측쇄가 아닌 주쇄에 플루오린 원자(F)를 포함하기 때문에, 일 구현예에 따른 차광용 격벽 조성물을 이용하여 제조된 차광용 격벽은 종래 차광용 격벽과 비교하여 표면에너지가 크게 낮아, 이를 포함하는 디스플레이 장치의 발광효율을 향상시킬 수 있다. The barrier rib composition for light blocking according to an embodiment includes (A) a cardo-based binder resin, (B) an acrylic photopolymerizable monomer, (C) a photopolymerization initiator, (D) a light blocking agent, (E) a water repellent additive, and (F) a solvent And, since the water repellent additive contains a fluorine atom (F) in the main chain, not the side chain, the light-shielding barrier rib manufactured using the light-shielding barrier rib composition according to an embodiment has a higher surface energy compared to the conventional light-shielding barrier rib. Since it is significantly lower, it is possible to improve the luminous efficiency of a display device including the same.
구체적으로, 일 구현예에 따른 차광용 격벽 조성물을 이용하여 제조된 차광용 격벽은 2 이상의 격벽 사이에 양자점을 포함하는 잉크를 가두는 역할을 수행한다. 즉, 잉크젯 공정을 통해 상기 2 이상의 차광용 격벽 사이에 양자점 함유 잉크를 분사시키는데, 이 때 상기 분사된 잉크끼리 섞일 경우(혼색 발생), 상기 차광용 격벽을 포함하는 디스플레이 장치의 발광효율이 저하되는 문제가 발생할 수 있다. 상기 혼색이 일어날 경우 잉크 내 양자점의 양자효율 저하가 발생될 수 있기 때문이다. 따라서, 차광용 격벽의 표면에너지를 낮추어 상기 양자점 함유 잉크를 잘 가두어 혼색이 일어나지 않도록 하는 것이 중요하다. 또한, 해상도를 높이기 위해 차광용 격벽은 90˚에 가까운 테이퍼 각도를 필요로 하며, 차광특성을 가져야 하기 때문에 차광용 격벽 조성물은 카본블랙 등의 무기흑색안료, 확산제, 유기흑색안료 등과 같은 차광성 물질을 반드시 포함해야 한다.Specifically, the light-shielding barrier rib manufactured using the light-shielding barrier rib composition according to an embodiment serves to confine ink including quantum dots between two or more barrier ribs. That is, the ink containing quantum dots is injected between the two or more light-blocking barrier ribs through an inkjet process. At this time, when the ejected inks are mixed (color mixing), the luminous efficiency of the display device including the light-shielding barrier rib is lowered. Problems can arise. This is because, when the color mixing occurs, the quantum efficiency of the quantum dots in the ink may decrease. Therefore, it is important to lower the surface energy of the light-shielding barrier rib to well trap the quantum dot-containing ink so that color mixing does not occur. In addition, in order to increase the resolution, the light-shielding barrier rib requires a taper angle close to 90˚ and must have light-shielding properties. material must be included.
이하에서 각 성분에 대하여 구체적으로 설명한다.Hereinafter, each component will be described in detail.
(E) 발수성 첨가제(E) water repellent additive
일 구현예에 따른 차광용 격벽 조성물은 발수성 첨가제를 포함하는데, 상기 발수성 첨가제는 측쇄가 아닌 주쇄에 플루오린 원자(F)를 포함한다. 종래에는 주쇄가 아닌 측쇄에 플루오린 원자(F) 또는 실리콘 원자(Si)가 치환된 아크릴계 수지를 발수성 첨가제로 사용하였다. 하지만 이러한 종래 발수성 첨가제를 포함하는 차광용 격벽 조성물은 노광 및 현상 공정을 거치면서 막 표면이 씻겨나가기 대문에 경화 후 충분한 발액 특성을 유지하기 어려운 문제점이 있었다. The barrier rib composition for light blocking according to an exemplary embodiment includes a water repellent additive, wherein the water repellent additive includes a fluorine atom (F) in a main chain rather than a side chain. Conventionally, an acrylic resin in which a fluorine atom (F) or a silicon atom (Si) is substituted in a side chain other than the main chain was used as a water repellent additive. However, the conventional light-shielding barrier rib composition including the water-repellent additive has a problem in that it is difficult to maintain sufficient liquid-repellent properties after curing because the surface of the film is washed away during exposure and development processes.
그러나, 일 구현예에 따르면 상기 발수성 첨가제로 측쇄가 아닌 주쇄에 플루오린 원자(F)가 치환된 수지를 사용함으로써 전술한 문제점을 해결할 수 있다.However, according to one embodiment, by using a resin in which a fluorine atom (F) is substituted in the main chain, not the side chain, as the water repellent additive, the above-described problem can be solved.
예컨대, 상기 발수성 첨가제의 주쇄는 하기 화학식 1로 표시되는 구조단위를 포함할 수 있다.For example, the main chain of the water repellent additive may include a structural unit represented by Formula 1 below.
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
m 및 n은 각각 독립적으로 0 이상의 정수이되, 단 5 < m+n < 100 이다.m and n are each independently an integer greater than or equal to 0, provided that 5 < m+n < 100.
예컨대, 상기 발수성 첨가제는 말단에 (메타)아크릴레이트기를 포함할 수 있다. 상기 발수성 첨가제가 말단에 (메타)아크릴레이트기를 포함함으로써, 노광 공정 시 상기 카도계 바인더 수지 및 광중합성 단량체와 반응하여, 현상액에 의한 씻김 현상을 더욱 개선시킬 수 있다.For example, the water repellent additive may include a (meth)acrylate group at the end. Since the water repellent additive includes a (meth)acrylate group at the end, it reacts with the cardo-based binder resin and the photopolymerizable monomer during the exposure process, thereby further improving the washout phenomenon by the developer.
예컨대, 상기 발수성 첨가제는 2개 내지 6개의 말단을 가질 수 있으며, 이에 의하면 상기 발수성 첨가제는 2개 내지 6개의 (메타)아크릴레이트기를 말단에 포함할 수 있다.For example, the water repellent additive may have 2 to 6 ends, and according to this, the water repellent additive may include 2 to 6 (meth)acrylate groups at the ends.
상기 발수성 첨가제는 5000 g/mol 내지 100000 g/mol의 중량평균분자량을 가질 수 있다. 상기 발수성 첨가제가 상기 범위의 중량평균분자량을 가질 경우, 코팅 후 표면 균일특성이 향상됨과 동시에 발액 특성 또한 우수해질 수 있다.The water repellent additive may have a weight average molecular weight of 5000 g/mol to 100000 g/mol. When the water repellent additive has a weight average molecular weight within the above range, the surface uniformity characteristics after coating may be improved and liquid repellency characteristics may also be improved.
예컨대, 상기 발수성 첨가제는 상기 차광용 격벽 조성물 총량에 대해 0.01 중량% 내지 2 중량%, 예컨대 0.01 중량% 내지 1.9 중량%, 예컨대 0.01 중량% 내지 1.8 중량%, 예컨대 0.01 중량% 내지 1.7 중량%, 예컨대 0.02 중량% 내지 2 중량%, 예컨대 0.02 중량% 내지 1.9 중량%, 예컨대 0.02 중량% 내지 1.8 중량%, 예컨대 0.02 중량% 내지 1.7 중량%로 포함될 수 있다. 상기 발수성 첨가제가 상기 함량범위로 포함될 경우 차광용 격벽 내부가 아닌, 차광용 격벽 위 표면의 표면에너지 값만을 낮추어 격벽의 위 표면만 발액성을 갖도록 조절하는 것이 보다 용이할 수 있다.For example, the water repellent additive is 0.01 wt% to 2 wt%, such as 0.01 wt% to 1.9 wt%, such as 0.01 wt% to 1.8 wt%, such as 0.01 wt% to 1.7 wt%, based on the total amount of the light-shielding barrier rib composition 0.02% to 2% by weight, such as 0.02% to 1.9% by weight, such as 0.02% to 1.8% by weight, such as 0.02% to 1.7% by weight. When the water-repellent additive is included in the above content range, it may be easier to adjust only the upper surface of the barrier rib to have liquid repellency by lowering only the surface energy value of the surface of the light-shielding barrier rib, not the inside of the light-shielding barrier rib.
(A) 카도계 바인더 수지(A) Cardo-based binder resin
상기 카도계 바인더 수지는 하기 화학식 2로 표시될 수 있다.The cardo-based binder resin may be represented by the following formula (2).
[화학식 2][Formula 2]
상기 화학식 2에서,In Formula 2,
R51 및 R52은 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 (메타)아크릴로일록시 알킬기이고,R 51 and R 52 are each independently a hydrogen atom or a substituted or unsubstituted (meth)acryloyloxy alkyl group,
R53 및 R54는 각각 독립적으로 수소 원자, 할로겐 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고, R 53 and R 54 are each independently a hydrogen atom, a halogen atom, or a substituted or unsubstituted C1 to C20 alkyl group,
Z1은 단일결합, O, CO, SO2, CR55R56, SiR57R58(여기서, R55 내지 R58은 각각 독립적으로 수소 원자, 또는 치환 또는 비치환된 C1 내지 C20 알킬기임) 또는 하기 화학식 2-1 내지 화학식 2-11로 표시되는 연결기 중 어느 하나이고,Z 1 is a single bond, O, CO, SO 2 , CR 55 R 56 , SiR 57 R 58 (wherein R 55 to R 58 are each independently a hydrogen atom, or a substituted or unsubstituted C1 to C20 alkyl group) or Any one of the linking groups represented by the following Chemical Formulas 2-1 to 2-11,
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
[화학식 2-3][Formula 2-3]
[화학식 2-4][Formula 2-4]
[화학식 2-5][Formula 2-5]
(상기 화학식 2-5에서,(In Formula 2-5,
Ra는 수소 원자, 에틸기, C2H4Cl, C2H4OH, CH2CH=CH2 또는 페닐기이다.)R a is a hydrogen atom, an ethyl group, C 2 H 4 Cl, C 2 H 4 OH, CH 2 CH=CH 2 or a phenyl group.)
[화학식 2-6][Formula 2-6]
[화학식 2-7][Formula 2-7]
[화학식 2-8][Formula 2-8]
[화학식 2-9][Formula 2-9]
[화학식 2-10][Formula 2-10]
[화학식 2-11][Formula 2-11]
Z2는 산이무수물 잔기이고,Z 2 is an acid dianhydride residue,
n1 및 n2는 각각 독립적으로 0 내지 4의 정수이다.n1 and n2 are each independently an integer of 0 to 4.
상기 카도계 바인더 수지의 중량평균 분자량은 500 g/mol 내지 50,000 g/mol, 예컨대 1,000 g/mol 내지 30,000 g/mol일 수 있다. 상기 카도계 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우 차광용 격벽 제조 시 잔사 없이 패턴 형성이 잘되며, 현상 시 막두께의 손실이 없고, 양호한 패턴을 얻을 수 있다.The weight average molecular weight of the cardo-based binder resin may be 500 g/mol to 50,000 g/mol, for example, 1,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the cardo-based binder resin is within the above range, a pattern can be formed without a residue when manufacturing the light-shielding barrier rib, and there is no loss of film thickness during development, and a good pattern can be obtained.
상기 카도계 바인더 수지는 양 말단 중 적어도 하나에 하기 화학식 3으로 표시되는 관능기를 포함할 수 있다.The cardo-based binder resin may include a functional group represented by the following Chemical Formula 3 at at least one of both ends.
[화학식 3][Formula 3]
상기 화학식 3에서,In Formula 3,
Z3은 하기 화학식 3-1 내지 화학식 3-7로 표시될 수 있다.Z 3 may be represented by the following Chemical Formulas 3-1 to 3-7.
[화학식 3-1][Formula 3-1]
(상기 화학식 3-1에서, Rb 및 Rc는 각각 독립적으로, 수소 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 에스테르기 또는 에테르기이다.)(In Formula 3-1, R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group.)
[화학식 3-2][Formula 3-2]
[화학식 3-3][Formula 3-3]
[화학식 3-4][Formula 3-4]
[화학식 3-5][Formula 3-5]
(상기 화학식 3-5에서, Rd는 O, S, NH, 치환 또는 비치환된 C1 내지 C20 알킬렌기, C1 내지 C20 알킬아민기 또는 C2 내지 C20 알릴아민기이다.)(In Formula 3-5, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, C1 to C20 alkylamine group, or C2 to C20 allylamine group.)
[화학식 3-6][Formula 3-6]
[화학식 3-7][Formula 3-7]
상기 카도계 바인더 수지는 예컨대, 9,9-비스(4-옥시라닐메톡시페닐)플루오렌 등의 플루오렌 함유 화합물; 벤젠테트라카르복실산 디무수물, 나프탈렌테트라카르복실산 디무수물, 비페닐테트라카르복실산 디무수물, 벤조페논테트라카르복실산 디무수물, 피로멜리틱 디무수물, 사이클로부탄테트라카르복실산 디무수물, 페릴렌테트라카르복실산 디무수물, 테트라히드로푸란테트라카르복실산 디무수물, 테트라하이드로프탈산 무수물 등의 무수물 화합물; 에틸렌글리콜, 프로필렌글리콜, 폴리에틸렌글리콜 등의 글리콜 화합물; 메탄올, 에탄올, 프로판올, n-부탄올, 사이클로헥산올, 벤질알코올 등의 알코올 화합물; 프로필렌글리콜 메틸에틸아세테이트, N-메틸피롤리돈 등의 용매류 화합물; 트리페닐포스핀 등의 인 화합물; 및 테트라메틸암모늄 클로라이드, 테트라에틸암모늄 브로마이드, 벤질디에틸아민, 트리에틸아민, 트리부틸아민, 벤질트리에틸암모늄 클로라이드 등의 아민 또는 암모늄염 화합물 중에서 둘 이상을 혼합하여 제조할 수 있다.The cardo-based binder resin may include, for example, a fluorene-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; Benzenetetracarboxylic acid dianhydride, naphthalenetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, benzophenonetetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic acid dianhydride, phenol anhydride compounds such as rylenetetracarboxylic acid dianhydride, tetrahydrofurantetracarboxylic acid dianhydride, and tetrahydrophthalic anhydride; glycol compounds such as ethylene glycol, propylene glycol, and polyethylene glycol; alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds such as propylene glycol methylethyl acetate and N-methylpyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.
상기 카도계 바인더 수지는 상기 차광용 격벽 조성물 총량 대비 10 중량% 내지 30 중량% 예컨대 15 중량% 내지 25 중량%로 포함될 수 있다. 상기 카도계 바인더 수지가 상기 범위 내로 포함될 경우, 제조된 차광용 격벽의 감도, 현상성, 해상도 및 패턴성이 우수해질 수 있다.The cardo-based binder resin may be included in an amount of 10 wt% to 30 wt%, for example, 15 wt% to 25 wt%, based on the total amount of the light-shielding barrier rib composition. When the cardo-based binder resin is included within the above range, the sensitivity, developability, resolution, and patternability of the manufactured light-shielding barrier rib may be improved.
(B) 아크릴계 광중합성 단량체(B) acrylic photopolymerizable monomer
상기 아크릴계 광중합성 단량체는 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.The acrylic photopolymerizable monomer may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.
상기 아크릴계 광중합성 단량체는 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광 시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the acrylic photopolymerizable monomer has the ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure in the pattern forming process.
상기 광중합성 단량체의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트 등을 들 수 있다. Specific examples of the photopolymerizable monomer include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol di (meth) acrylate, dipentaerythritol tri (meth) Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane tri ( and meth)acrylate, tris(meth)acryloyloxyethyl phosphate, and novolac epoxy (meth)acrylate.
상기 광중합성 단량체의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 화학공업(주)社의 아로닉스 M-101®, 아로닉스 M-111®, 아로닉스 M-114® 등; 일본화학(주)社의 KAYARAD TC-110S®, KAYARAD TC-120S® 등; 오사카 유끼 화학공업(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 화학공업(주)社의 아로닉스 M-210®, 아로닉스 M-240®, 아로닉스 M-6200® 등; 일본화학(주)社의 KAYARAD HDDA®, KAYARAD HX-220®, KAYARAD R-604® 등; 오사카 유끼 화학공업(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 화학공업(주)社의 아로닉스 M-309®, 아로닉스 M-400®, 아로닉스 M-405®, 아로닉스 M-450®, 아로닉스 M-710®, 아로닉스 M-8030®, 아로닉스 M-8060® 등; 일본화학(주)社의 KAYARAD TMPTA®, KAYARAD DPCA-20®, KAYARAD-30®, KAYARAD-60®, KAYARAD-120® 등; 오사카 유끼 화학공업(주)社의 V-295®, V-300®, V-360®, V-GPT®, V-3PA®, V-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.Examples of commercially available products of the photopolymerizable monomer are as follows. Examples of the monofunctional ester of (meth)acrylic acid, Toagosei Chemical Industry Co., Ltd. Aronix M-101 ® , Aronix M-111 ® , Aronix M-114 ® and the like; Nippon Chemical Co., Ltd. KAYARAD TC-110S ® , KAYARAD TC-120S ®, etc.; V-158 ® of Osaka Yuki Chemical Industry Co., Ltd., V-2311 ®, etc. are mentioned. Examples of the bifunctional ester of (meth)acrylic acid, Toagosei Chemical Industry Co., Ltd. Aronix M-210 ® , Aronix M-240 ® , Aronix M-6200 ® and the like; Nippon Chemical Co., Ltd. KAYARAD HDDA ® , KAYARAD HX-220 ® , KAYARAD R-604 ®, etc.; Osaka Yuki Chemical Industry Co., Ltd. V-260 ® , V-312 ® , V-335 HP ® etc. are mentioned. Examples of the trifunctional ester of (meth)acrylic acid, Toagosei Chemical Industry Co., Ltd. Aronix M-309 ® , Aronix M-400 ® , Aronix M-405 ® , Aronix M-450 ® , Aronix M-710 ® , Aronix M-8030 ® , Aronix M-8060 ® etc.; Nippon Chemical Co., Ltd. KAYARAD TMPTA ® , KAYARAD DPCA-20 ® , KAYARAD-30 ® , KAYARAD-60 ® , KAYARAD-120 ®, etc.; V-295 ® , V-300 ® , V-360 ® , V-GPT ® , V-3PA ® , V-400 ® of Osaka Yuki Chemical Industry Co., Ltd. may be mentioned. These products may be used alone or in combination of two or more.
상기 광중합성 단량체는 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.The photopolymerizable monomer may be used after treatment with an acid anhydride in order to provide better developability.
상기 광중합성 단량체는 상기 차광용 격벽 조성물 총량 대비 5 중량% 내지 15 중량%, 예컨대 5 중량% 내지 10 중량%로 포함될 수 있다. 상기 광중합성 단량체가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다.The photopolymerizable monomer may be included in an amount of 5 wt% to 15 wt%, for example, 5 wt% to 10 wt%, based on the total amount of the light-shielding barrier rib composition. When the photopolymerizable monomer is included within the above range, curing occurs sufficiently during exposure in the pattern forming process to provide excellent reliability and excellent developability in an alkali developer.
(C) 광중합 개시제(C) photoinitiator
상기 광중합 개시제는 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물 또는 이들의 조합 등을 사용할 수 있다.As the photopolymerization initiator, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof may be used.
상기 아세토페논계 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholino propane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸 아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논,4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethyl amino) benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-클로로티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤 등을 들 수 있다.Examples of the thioxanthone-based compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diiso A propyl thioxanthone etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3',4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine; 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine; 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho1-yl)-4,6 -Bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloro and romethyl)-6-piperonyl-s-triazine and 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine.
상기 옥심계 화합물의 예로는 O-아실옥심계화합물, 2-(O-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(O-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온, 1-(3-사이클로펜틸-1-(9-에틸-6-(2-메틸벤조일)-9H-카바졸-3-일)프로필리덴아미노옥시)에탄온, 2-(벤조일옥시이미노)-3-사이클로펜틸-1-(4-(페닐티오)페닐)프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온-2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온-2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 사용할 수 있다. Examples of the oxime-based compound include O-acyloxime-based compound, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one; 1-(3-cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl)propylideneaminooxy)ethanone, 2-(benzoyloxyimino)-3 -cyclopentyl-1-(4-(phenylthio)phenyl)propan-1-one and the like can be used. Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime- O-acetate etc. can be used.
예컨대, 일 구현예에 따른 차광용 격벽 조성물은 상기 광중합 개시제로 서로 다른 2종의 옥심계 화합물의 혼합물을 사용할 수 있다. 예컨대, 상기 혼합물은 서로 다른 2종의 옥심계 화합물이 각각 1:1의 중량비로 혼합된 혼합물일 수 있다.For example, in the barrier rib composition for light blocking according to an embodiment, a mixture of two different oxime-based compounds may be used as the photopolymerization initiator. For example, the mixture may be a mixture in which two different oxime-based compounds are each mixed in a weight ratio of 1:1.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물, 플루오렌계 화합물 등을 사용할 수 있다.As the photopolymerization initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound may be used in addition to the above compound.
상기 광중합 개시제는 상기 차광용 격벽 조성물 총량 대비 1 중량% 내지 10 중량%, 예컨대 1 중량% 내지 5 중량%로 포함될 수 있다. 상기 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광 시 광중합이 충분히 일어나게 되어, 제조된 차광용 격벽의 감도가 우수해지게 된다.The photopolymerization initiator may be included in an amount of 1 wt% to 10 wt%, for example, 1 wt% to 5 wt%, based on the total amount of the light-shielding barrier rib composition. When the photopolymerization initiator is included within the above range, photopolymerization occurs sufficiently during exposure in the pattern forming process, and thus the manufactured light blocking barrier rib has excellent sensitivity.
(D) 차광제(D) shading agent
차광성을 높여 흑색을 용이하게 구현하기 위해, 상기 차광제는 '무기흑색안료', '유기흑색안료', '적색안료, 청색안료, 바이올렛안료, 녹색안료 및 오렌지안료로 이루어진 군에서 선택된 3 이상의 안료의 혼합물' 또는 '이들의 조합'을 포함할 수 있다.In order to easily implement black by increasing light blocking properties, the light blocking agent is at least three selected from the group consisting of 'inorganic black pigment', 'organic black pigment', 'red pigment, blue pigment, violet pigment, green pigment and orange pigment. It may include a 'mixture of pigments' or 'a combination of these'.
일반적으로 차광성을 향상시키기 위해 무기흑색안료인 카본블랙, 티탄블랙 등을 단독 차광제로서 사용하는데, 카본블랙 등의 무기흑색안료만을 단독으로 사용할 경우 광학밀도는 우수하나, 전기적 특성 등 광학밀도 외의 다른 특성이 저하될 수 있는 바, 일 구현예에 따른 차광용 격벽 조성물의 경우 무기흑색안료를 단독으로 사용하지 않는 바람직할 수 있다.In general, inorganic black pigments such as carbon black, titanium black, etc. are used as a single light-shielding agent to improve light-shielding properties. When only inorganic black pigments such as carbon black are used alone, the optical density is excellent, but electrical properties other than the optical density Since other properties may be deteriorated, in the case of the barrier rib composition for light blocking according to an embodiment, it may be preferable not to use the inorganic black pigment alone.
한편, 무기흑색안료를 단독 차광제로서 사용하는 경우의 상기 문제점을 해결하기 위해 유기흑색안료를 단독 차광제로서 사용할 수 있으며, 이 경우 무기흑색안료를 단독 차광제로 사용하는 경우에 비해 상대적으로 차광성은 약간 떨어질 수 있으나, 여전히 충분한 차광 성능을 가짐과 동시에 전기적 특성 등 다른 특성의 저하를 방지할 수 있다.On the other hand, in order to solve the above problem in the case of using the inorganic black pigment as the sole shading agent, the organic black pigment can be used as the sole shading agent. may decrease slightly, but it is possible to prevent deterioration of other characteristics such as electrical characteristics while still having sufficient light blocking performance.
또한, RGB 블랙 등의 칼라혼색을 통한 흑색 안료도 차광제로서의 기능을 가지는 바, 일부 흑색 조성물에서 사용되기도 하는데, 일 구현예에 따른 차광용 격벽 조성물은 적색안료, 청색안료, 바이올렛안료, 녹색안료 및 오렌지안료로 이루어진 군에서 선택된 3 이상의 안료의 혼합물을 차광제로 사용할 수 있다. 보다 구체적으로, 상기 차광제는 적색안료, 청색안료 및 바이올렛안료의 혼합물을 포함하고, 상기 적색안료, 청색안료 및 바이올렛안료는 각각 3 내지 4 : 2.5 내지 3.5 : 1의 중량비로 혼합되어 있을 수 있다. 즉, 상기 적색안료는 상기 바이올렛안료 함량의 3배 내지 4배의 함량으로 포함되고, 상기 청색안료는 상기 바이올렛안료 함량의 2.5배 내지 3.5배의 함량으로 포함될 경우, 상기와 같은 함량비율을 가지지 않는 경우에 비해 우수한 감광특성을 유지하면서 동시에 내열성 및 광학특성을 달성할 수 있다.In addition, black pigments through color mixing such as RGB black also have a function as a light blocking agent, and are also used in some black compositions. And a mixture of three or more pigments selected from the group consisting of an orange pigment may be used as a light blocking agent. More specifically, the light-shielding agent includes a mixture of a red pigment, a blue pigment, and a violet pigment, and the red pigment, the blue pigment and the violet pigment may be mixed in a weight ratio of 3 to 4: 2.5 to 3.5: 1, respectively. . That is, when the red pigment is contained in an amount of 3 to 4 times the content of the violet pigment, and the blue pigment is contained in an amount of 2.5 to 3.5 times the content of the violet pigment, the content ratio is not as described above. It is possible to achieve heat resistance and optical properties while maintaining superior photosensitivity properties compared to other cases.
한편, 상기 적색안료, 청색안료 및 바이올렛안료의 혼합물은 상기 적색안료, 청색안료 및 바이올렛안료외에 카본블랙 등의 무기흑색안료를 포함하지 않을 수 있다. 즉, 상기 차광제로 적색안료, 청색안료 및 바이올렛안료의 혼합물을 사용할 경우 다른 무기흑색안료를 추가로 사용하지 않을 수 있다. 카본블랙 등의 무기흑색안료가 함께 사용될 경우, 노광, 현상 및 경화 공정 진행 시 막의 하부만 광경화가 이루어지지 않아 언더컷이 심하게 유발되어 바람직하지 않을 수 있다. Meanwhile, the mixture of the red pigment, the blue pigment and the violet pigment may not contain an inorganic black pigment such as carbon black in addition to the red pigment, the blue pigment and the violet pigment. That is, when a mixture of a red pigment, a blue pigment and a violet pigment is used as the light-shielding agent, other inorganic black pigments may not be additionally used. When an inorganic black pigment such as carbon black is used together, only the lower portion of the film is not photocured during exposure, development, and curing processes, which may cause severe undercutting, which may be undesirable.
상기 적색 안료의 예로는 C.I. 적색 안료 254, C.I. 적색 안료 255, C.I. 적색 안료 264, C.I. 적색 안료 270, C.I. 적색 안료 272, C.I. 적색 안료 177, C.I. 적색 안료 179, C.I. 적색 안료 89 등을 들 수 있다. 상기 바이올렛 안료의 예로는, C.I. 바이올렛 안료 1, C.I. 바이올렛 안료 19, C.I. 바이올렛 안료 23, C.I. 바이올렛 안료 27, C.I. 바이올렛 안료 29, C.I. 바이올렛 안료 30, C.I. 바이올렛 안료 32, C.I. 바이올렛 안료 37, C.I. 바이올렛 안료 40, C.I. 바이올렛 안료 42, C.I. 바이올렛 안료 50 등을 들 수 있다. 상기 청색 안료의 예로는 C.I. 청색 안료 15:6, C.I. 청색 안료 15, C.I. 청색 안료 15:1, C.I. 청색 안료 15:2, C.I. 청색 안료 15:3, C.I. 청색 안료 15:4, C.I. 청색 안료 15:5, C.I. 청색 안료 16 등과 같은 프탈로시아닌계 안료 등을 들 수 있다. 다만, 상기 적색 안료, 바이올렛 안료 및 청색 안료의 종류가 이들에 한정되는 것은 아니다.Examples of the red pigment include C.I. Red pigment 254, C.I. Red pigment 255, C.I. Red pigment 264, C.I. Red pigment 270, C.I. Red pigment 272, C.I. Red pigment 177, C.I. Red pigment 179, C.I. Red pigment 89 etc. are mentioned. Examples of the violet pigment include C.I. Violet Pigment 1, C.I. Violet Pigment 19, C.I. Violet Pigment 23, C.I. Violet pigment 27, C.I. Violet Pigment 29, C.I. Violet Pigment 30, C.I. Violet pigment 32, C.I. Violet pigment 37, C.I. Violet Pigment 40, C.I. Violet pigment 42, C.I. Violet pigment 50 etc. are mentioned. Examples of the blue pigment include C.I. Blue pigment 15:6, C.I. Blue pigment 15, C.I. Blue pigment 15:1, C.I. Blue pigment 15:2, C.I. Blue pigment 15:3, C.I. Blue pigment 15:4, C.I. Blue pigment 15:5, C.I. and phthalocyanine pigments such as blue pigment 16 and the like. However, the types of the red pigment, the violet pigment and the blue pigment are not limited thereto.
상기 차광제는 이를 구성하는 단독 또는 각각의 안료를 분산시키기 위해 분산제를 함께 사용할 수 있다. 구체적으로는, 상기 단독 또는 각각의 안료를 분산제로 미리 표면처리하여 사용하거나, 조성물 제조 시 안료와 함께 분산제를 첨가하여 사용할 수 있다. The light blocking agent may be used alone or together with a dispersing agent to disperse each pigment constituting the light blocking agent. Specifically, the single or each pigment may be surface-treated in advance with a dispersant, or a dispersant may be added and used together with the pigment when preparing the composition.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리 알킬렌 글리콜 및 이의 에스테르, 폴리 옥시 알킬렌, 다가 알코올 에스테르 알킬렌 옥사이드 부가물, 알코올 알킬렌 옥사이드 부가물, 술폰산에스테르, 술폰산염, 카르복실산 에스테르, 카르복실산염, 알킬 아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. may be used. Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonate, carboxylic acid ester, carboxylate , alkyl amides, alkylene oxides, and alkyl amines, and these may be used alone or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의 EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711, PB821 등이 있다.Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. from EFKA Chemicals; Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc. from Zeneka; Or Ajinomoto's PB711, PB821, and the like.
상기 분산제는 상기 차광용 격벽 조성물 총량 대비 0.1 중량% 내지 15 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 조성물의 분산성이 우수함에 따라 차광용 격벽 제조 시 안정성, 현상성 및 패턴성이 우수하다. The dispersant may be included in an amount of 0.1 wt% to 15 wt% based on the total amount of the light-shielding barrier rib composition. When the dispersing agent is included within the above range, the composition has excellent dispersibility and thus has excellent stability, developability, and patternability when manufacturing a light-shielding barrier rib.
상기 안료는 수용성 무기염 및 습윤제를 이용하여 전처리하여 사용할 수도 있다. 안료를 상기 전처리하여 사용할 경우 안료의 평균입경을 미세화할 수 있다.The pigment may be used after pre-treatment using a water-soluble inorganic salt and a wetting agent. When the pigment is pre-treated and used, the average particle diameter of the pigment can be refined.
상기 전처리는 상기 안료를 수용성 무기염 및 습윤제와 함께 니딩(kneading)하는 단계, 그리고 상기 니딩단계에서 얻어진 안료를 여과 및 수세하는 단계를 거쳐 수행될 수 있다.The pretreatment may be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained in the kneading step.
상기 니딩은 40℃ 내지 100℃의 온도에서 수행될 수 있고, 상기 여과 및 수세는 물 등을 사용하여 무기염을 수세한 후 여과하여 수행될 수 있다.The kneading may be performed at a temperature of 40° C. to 100° C., and the filtration and washing may be performed by filtration after washing the inorganic salt with water or the like.
상기 수용성 무기염의 예로는 염화나트륨, 염화칼륨 등을 들 수 있으나, 이에 한정되는 것은 아니다. 상기 습윤제는 상기 안료 및 상기 수용성 무기염이 균일하게 섞여 안료가 용이하게 분쇄될 수 있는 매개체 역할을 하며, 그 예로는 에틸렌 글리콜 모노에틸에테르, 프로필렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노메틸에테르 등과 같은 알킬렌 글리콜 모노알킬에테르; 에탄올, 이소프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 디에틸렌글리콜, 폴리에틸렌글리콜, 글리세린폴리에틸렌글리콜 등과 같은 알코올 등을 들 수 있으며, 이들을 단독 또는 둘 이상 혼합하여 사용할 수 있다.Examples of the water-soluble inorganic salt include, but are not limited to, sodium chloride and potassium chloride. The wetting agent serves as a medium through which the pigment and the water-soluble inorganic salt are uniformly mixed and the pigment can be easily pulverized, for example, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. alkylene glycol monoalkyl ethers; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerin polyethylene glycol, and the like, and these may be used alone or in combination of two or more.
상기 니딩 단계를 거친 안료는 5 nm 내지 200 nm, 예컨대 5 nm 내지 150 nm의 평균 입경을 가질 수 있다. 안료의 평균 입경이 상기 범위 내인 경우, 안료 분산액에서의 안정성이 우수하고, 픽셀의 해상성 저하의 우려가 없다. The pigment that has undergone the kneading step may have an average particle diameter of 5 nm to 200 nm, for example 5 nm to 150 nm. When the average particle diameter of the pigment is within the above range, the stability in the pigment dispersion is excellent, and there is no fear of a decrease in the resolution of the pixel.
구체적으로, 상기 안료는 상기 분산제 및 PGMEA 등의 용매를 포함하는 안료분산액의 형태로 사용될 수 있고, 상기 안료분산액은 고형분의 안료, 분산제 및 용매를 포함할 수 있다. 상기 고형분의 안료는 상기 안료분산액 총량에 대해 15 중량% 내지 40 중량%, 예컨대 20 중량% 내지 30 중량%로 포함될 수 있다.Specifically, the pigment may be used in the form of a pigment dispersion including the dispersant and a solvent such as PGMEA, and the pigment dispersion may include a solid pigment, a dispersant, and a solvent. The solid content of the pigment may be included in an amount of 15 wt% to 40 wt%, for example, 20 wt% to 30 wt%, based on the total amount of the pigment dispersion.
상기 차광제는 상기 차광용 격벽 조성물 총량 대비 10 중량% 내지 30 중량%, 예컨대 15중량% 내지 25 중량%로 포함될 수 있다. 상기 차광제가 상기 범위 내로 포함될 경우, 흑색 구현 효과 및 현상 성능이 우수해지게 된다.The light-shielding agent may be included in an amount of 10 wt% to 30 wt%, for example 15 wt% to 25 wt%, based on the total amount of the light-shielding barrier rib composition. When the light-shielding agent is included within the above range, the black realization effect and the developing performance are excellent.
(F) 용매(F) solvent
상기 용매는 상기 주쇄에 플루오린 원자(F)를 포함하는 발수성 첨가제, 카도계 바인더 수지, 아크릴계 광중합성 단량체, 광중합 개시제, 차광제 및 후술하는 광확산제 등과의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.The solvent is a water-repellent additive containing a fluorine atom (F) in the main chain, a cardo-based binder resin, an acrylic photopolymerizable monomer, a photopolymerization initiator, a light blocking agent, and a light diffusing agent to be described later. can be used
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸에테르, n-부틸에테르, 디이소아밀에테르, 메틸페닐에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜디메틸에테르 등의 글리콜에테르류; 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 디에틸셀로솔브아세테이트 등의 셀로솔브아세테이트류; 메틸에틸카르비톨, 디에틸카르비톨, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜에틸메틸에테르, 디에틸렌글리콜디에틸에테르 등의 카르비톨류; 프로필렌글리콜메틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트 등의 프로필렌글리콜알킬에테르아세테이트류; 톨루엔, 크실렌 등의 방향족탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산에틸, 초산-n-부틸, 초산이소부틸 등의 포화 지방족 모노카르복실산알킬에스테르류; 젖산메틸, 젖산에틸 등의 젖산에스테르류; 옥시초산메틸, 옥시초산에틸, 옥시초산부틸 등의 옥시초산알킬에스테르류; 메톡시초산메틸, 메톡시초산에틸, 메톡시초산부틸, 에톡시초산메틸, 에톡시초산에틸 등의 알콕시초산알킬에스테르류; 3-옥시프로피온산메틸, 3-옥시프로피온산에틸 등의 3-옥시프로피온산알킬에스테르류; 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산에틸, 3-에톡시프로피온산메틸 등의 3-알콕시프로피온산알킬에스테르류; 2-옥시프로피온산메틸, 2-옥시프로피온산에틸, 2-옥시프로피온산프로필 등의 2-옥시프로피온산알킬에스테르류; 2-메톡시프로피온산메틸, 2-메톡시프로피온산에틸, 2-에톡시프로피온산에틸, 2-에톡시프로피온산메틸 등의 2-알콕시프로피온산알킬에스테르류; 2-옥시-2-메틸프로피온산메틸, 2-옥시-2-메틸프로피온산에틸 등의2-옥시-2-메틸프로피온산에스테르류, 2-메톡시-2-메틸프로피온산메틸, 2-에톡시-2-메틸프로피온산에틸 등의 2-알콕시-2-메틸프로피온산알킬류의 모노옥시모노카르복실산알킬에스테르류; 2-히드록시프로피온산에틸, 2-히드록시-2-메틸프로피온산에틸, 히드록시초산에틸, 2-히드록시-3-메틸부탄산메틸 등의 에스테르류; 피루빈산에틸 등의 케톤산에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산벤질, 안식향산에틸, 옥살산디에틸, 말레인산디에틸, γ-부티로락톤, 3-메틸벤조산, 3-메톡시부틸아세테이트, 탄산에틸렌, 탄산프로필렌, 페닐셀로솔브아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol dimethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; alkoxy acetate alkyl esters such as methyl methoxy acetate, ethyl methoxy acetate, butyl methoxy acetate, methyl ethoxy acetate, and ethyl ethoxy acetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as 3-methoxymethylpropionate, 3-methoxyethylpropionate, 3-ethoxyethylpropionate, and 3-ethoxymethylpropionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-oxy-2-methylpropionic acid esters such as 2-oxy-2-methylpropionate and 2-oxy-2-methylpropionate ethyl, 2-methoxy-2-methylpropionate, 2-ethoxy-2- monooxymonocarboxylic acid alkyl esters of 2-alkoxy-2-methylpropionate alkyls such as ethyl methylpropionate; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutanoate; Ketonic acid esters such as ethyl pyruvate, and the like, and N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, and N,N-dimethylacetamide. , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid and high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, 3-methylbenzoic acid, 3-methoxybutyl acetate, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 사이클로헥사논 등의 케톤류; 에틸렌글리콜모노에틸에테르, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 디에틸렌글리콜에틸메틸에테르 등의 글리콜에테르류; 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류; 2-히드록시프로피온산에틸 등의 에스테르류; 디에틸렌글리콜모노메틸에테르 등의 카르비톨류; 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트 등의 프로필렌글리콜알킬에테르아세테이트류, 3-메틸벤조산, 3-메톡시부틸아세테이트 등이 사용될 수 있다.Among these, preferably, in consideration of compatibility and reactivity, ketones such as cyclohexanone; glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, and diethylene glycol ethyl methyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates, such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate, 3-methylbenzoic acid, 3-methoxybutyl acetate, etc. can be used.
상기 용매는 상기 차광용 격벽 조성물 총량 대비 잔부량, 예컨대 40 중량% 내지 75 중량%, 예컨대 45 중량% 내지 70 중량%, 예컨대 50 중량% 내지 65 중량%로 포함될 수 있다. 상기 용매가 상기 범위 내로 포함될 경우 차광용 격벽 조성물이 적절한 점도를 가짐에 따라 격벽 제조 시 공정성이 우수하다.The solvent may be included in a balance, for example, 40 wt% to 75 wt%, such as 45 wt% to 70 wt%, such as 50 wt% to 65 wt%, based on the total amount of the light-shielding barrier rib composition. When the solvent is included within the above range, since the light-shielding barrier rib composition has an appropriate viscosity, processability in manufacturing the barrier rib is excellent.
확산제 (또는 확산제 분산액)Diffuser (or Diffuser Dispersion)
일 구현예에 따른 차광용 격벽 조성물은 확산제를 더 포함할 수 있다.The barrier rib composition for light blocking according to an embodiment may further include a diffusing agent.
예컨대, 상기 확산제는 황산바륨(BaSO4), 탄산칼슘(CaCO3), 이산화티타늄(TiO2), 지르코니아(ZrO2) 또는 이들의 조합을 포함할 수 있다.For example, the diffusing agent may include barium sulfate (BaSO 4 ), calcium carbonate (CaCO 3 ), titanium dioxide (TiO 2 ), zirconia (ZrO 2 ), or a combination thereof.
상기 확산제는 전술한 잉크 내에 포함되어 있는 양자점에 흡수되지 않은 광을 반사시키고, 상기 반사된 광을 양자점이 다시 흡수할 수 있도록 한다. 즉, 상기 확산제는 양자점에 흡수되는 광의 양을 증가시켜, 차광용 격벽 조성물을 이용하여 제조된 차광용 격벽 함유 디스플레이 장치의 발광 효율을 증가시킬 수 있다.The diffusing agent reflects light not absorbed by the quantum dots included in the aforementioned ink, and enables the quantum dots to absorb the reflected light again. That is, the diffusion agent increases the amount of light absorbed by the quantum dots, thereby increasing the luminous efficiency of the light-shielding barrier rib-containing display device manufactured using the light-shielding barrier rib composition.
상기 확산제는 평균 입경(D50)이 150nm 내지 250nm 일 수 있으며, 구체적으로는 180nm 내지 230nm일 수 있다. 상기 확산제의 평균 입경이 상기 범위 내일 경우, 보다 우수한 광확산 효과를 가질 수 있으며, 상기 디스플레이 장치의 발광 효율을 증가시킬 수 있다.The diffusing agent may have an average particle diameter (D 50 ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the diffusing agent is within the above range, a more excellent light diffusion effect may be obtained, and luminous efficiency of the display device may be increased.
상기 확산제는 상기 차광용 격벽 조성물 총량 대비 0.1 중량% 내지 20 중량%, 예컨대 0.1 중량% 내지 5 중량%로 포함될 수 있다. 상기 확산제가 상기 차광용 격벽 조성물 총량에 대해 0.1 중량% 미만으로 포함될 경우, 확산제를 사용함에 따른 발광 효율 향상 효과를 기대하기가 어렵고, 20 중량%를 초과하여 포함할 경우에는 패턴특성이 저하될 우려가 있다The diffusing agent may be included in an amount of 0.1 wt% to 20 wt%, for example, 0.1 wt% to 5 wt%, based on the total amount of the light blocking barrier composition. When the diffusion agent is included in an amount of less than 0.1% by weight based on the total amount of the light-shielding barrier rib composition, it is difficult to expect an effect of improving luminous efficiency by using the diffusion agent, and when it is included in an amount exceeding 20% by weight, the pattern characteristics may be deteriorated. there is concern
기타 첨가제other additives
한편, 상기 차광용 격벽 조성물은 말론산, 3-아미노-1,2-프로판디올, 실란계 커플링제, 레벨링제, 계면활성제 또는 이들의 조합의 첨가제를 더 포함할 수 있다.Meanwhile, the light blocking barrier composition may further include an additive of malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof.
상기 실란계 커플링제는 기판과의 밀착성 등을 개선하기 위해 비닐기, 카르복실기, 메타크릴옥시기, 이소시아네이트기, 에폭시기 등의 반응성 치환기를 가질 수 있다. The silane-based coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.
상기 실란계 커플링제의 예로는, 트리메톡시실릴벤조산, γ-메타크릴옥시프로필트리메톡시실란, 비닐트리아세톡시실란, 비닐트리메톡시실란, γ-이소시아네이트프로필트리에톡시실란, γ-글리시독시프로필트리메톡시실란, β-(3,4-에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the silane-based coupling agent include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycan Cydoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.
상기 실란계 커플링제는 상기 차광용 격벽 조성물 총량 대비 0.01 중량부 내지 10 중량부로 포함될 수 있다. 상기 실란계 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The silane-based coupling agent may be included in an amount of 0.01 to 10 parts by weight based on the total amount of the light-shielding barrier rib composition. When the silane-based coupling agent is included within the above range, adhesion and storage properties are excellent.
또한 상기 차광용 격벽 조성물은 필요에 따라 코팅성 향상 및 결점생성 방지효과를 위해 계면활성제, 예컨대 불소계 계면활성제 및/또는 실리콘계 계면활성제를 더 포함할 수 있다. In addition, the light-shielding barrier rib composition may further include a surfactant, such as a fluorine-based surfactant and/or a silicone-based surfactant, to improve coating properties and prevent defect formation, if necessary.
상기 불소계 계면활성제로는, BM Chemie社의 BM-1000®, BM-1100®등; 다이닛폰잉키가가꾸고교(주)社의 메카팩 F 142D®, 메카팩 F 172®, 메카팩 F 173®, 메카팩 F 183®, 메카팩 F 554® 등; 스미토모스리엠(주)社의 프로라드 FC-135®, 프로라드 FC-170C®, 프로라드 FC-430®, 프로라드 FC-431® 등; 아사히그라스(주)社의 사프론 S-112®, 사프론 S-113®, 사프론 S-131®, 사프론 S-141®, 사프론 S-145®등; 도레이실리콘(주)社의 SH-28PA®, SH-190®, SH-193®, SZ-6032®, SF-8428® 등의 명칭으로 시판되고 있는 것을 사용할 수 있다.As the fluorine-based surfactant, BM-1000 ® of BM Chemie, BM-1100 ®, etc.; Mechapack F 142D ® , Mechapack F 172 ® , Mechapack F 173 ® , Mechapack F 183 ® , Mechapack F 554 ® and the like of Dai Nippon Inki Chemical Co., Ltd.; Prorad FC-135 ® , Prorad FC-170C ® , Prorad FC-430 ® , Prorad FC-431 ®, etc. from Sumitomo Re.M.; Asahi Grass Co., Ltd.'s Saffron S-112 ® , Saffron S-113 ® , Saffron S-131 ® , Saffron S-141 ® , Saffron S-145 ®, etc.; Toray Silicon Co., Ltd.'s SH-28PA ® , SH-190 ® , SH-193 ® , SZ-6032 ® , SF-8428 ®, etc. can be used.
상기 실리콘계 계면활성제로는 BYK Chem社의 BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, BYK-325등의 명칭으로 시판되고 있는 것을 사용할 수 있다.As the silicone-based surfactant, BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, What is marketed under the name of BYK-325 etc. can be used.
상기 계면활성제는 상기 차광용 격벽 조성물 총량 대비 0.001 중량부 내지 5 중량부로 사용될 수 있다. 상기 계면활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, IZO 기판 또는 유리기판에 대한 습윤성(wetting)이 우수하다.The surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on the total amount of the light-shielding barrier rib composition. When the surfactant is included within the above range, coating uniformity is ensured, stains do not occur, and wettability to IZO substrates or glass substrates is excellent.
또한 상기 차광용 격벽 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다. In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the barrier rib composition for light blocking within a range that does not impair physical properties.
일 구현예에 따른 차광용 격벽 조성물은 포지티브형일 수도 있고, 네가티브형일 수도 있으나, 차광성을 가지는 조성물의 노광 및 현상 후 패턴이 노출되는 영역의 잔기(residue)를 보다 완벽하게 제거하기 위해서는 네가티브형인 것이 보다 바람직하다.The barrier rib composition for light blocking according to an embodiment may be of a positive type or a negative type, but after exposure and development of the composition having light blocking properties, in order to more completely remove residues in the region where the pattern is exposed, the negative type is preferred. more preferably.
다른 일 구현예는 전술한 차광용 격벽 조성물을 노광, 현상 및 경화하여 제조된 격벽을 제공한다. Another embodiment provides a barrier rib prepared by exposing, developing, and curing the above-described barrier rib composition for light blocking.
상기 차광용 격벽 제조방법은 다음과 같다.The manufacturing method of the barrier rib for light blocking is as follows.
(1) 도포 및 도막 형성 단계(1) Application and coating film formation step
차광용 격벽 조성물을 소정의 전처리를 한 유리 기판 또는 ITO 기판 등의 기판 상에 스핀 또는 슬릿 코트법, 롤 코트법, 스크린 인쇄법, 어플리케이터법 등의 방법을 사용하여 원하는 두께로 도포한 후, 70℃ 내지 110℃에서 1분 내지 10분 동안 가열(프리베이킹)하여 용제를 제거함으로써 도막을 형성한다.After applying the light-shielding barrier composition to a desired thickness using a method such as a spin or slit coating method, a roll coating method, a screen printing method, or an applicator method on a substrate such as a glass substrate or an ITO substrate that has been subjected to a predetermined pretreatment, 70 A coating film is formed by heating (pre-baking) at °C to 110 °C for 1 minute to 10 minutes to remove the solvent.
(2) 노광 단계(2) exposure step
상기 얻어진 도막에 필요한 패턴 형성을 위해 마스크를 개재한 뒤, 200 nm 내지 500 nm의 활성선을 조사하여 노광을 진행한다. 조사에 사용되는 광원으로는 저압 수은등, 고압 수은등, 초고압 수은등, 금속 할로겐화물 램프, 아르곤 가스 레이저 등을 사용할 수 있으며, 경우에 따라 X선, 전자선 등도 이용할 수 있다.After interposing a mask to form a pattern required for the obtained coating film, exposure is performed by irradiating actinic rays of 200 nm to 500 nm. As a light source used for irradiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. may be used, and in some cases, an X-ray, an electron beam, etc. may be used.
노광량은 조성물 각 성분의 종류, 배합량 및 건조 막 두께에 따라 다르지만, 고압 수은등을 사용하는 경우에는 500 mJ/cm2(365 nm 센서에 의함) 이하이다.Although the exposure amount varies depending on the type of each component of the composition, the compounding amount and the dry film thickness, when a high-pressure mercury lamp is used, it is 500 mJ/cm 2 (by a 365 nm sensor) or less.
(3) 현상 단계(3) development step
알칼리성 수용액을 현상액으로 이용하여 불필요한 부분을 용해, 제거함으로써 노광 부분만을 잔존시켜 패턴을 형성시킨다. By dissolving and removing unnecessary parts using an alkaline aqueous solution as a developer, only the exposed parts remain to form a pattern.
(4) 후처리 단계(4) post-processing step
현상에 의해 수득된 화상 패턴을 내열성, 밀착성, 내화학성 등의 측면에서 우수한 패턴을 얻기 위한 후가열 공정이 있다. 예컨대, 현상 후 250℃의 컨벡션 오븐에 현상에 의해 수득된 화상 패턴을 넣은 후 1시간 동안 가열(포스트베이킹)할 수 있다.There is a post-heating process for the image pattern obtained by development to obtain an excellent pattern in terms of heat resistance, adhesion, chemical resistance, and the like. For example, after development, an image pattern obtained by development may be placed in a convection oven at 250° C., followed by heating (post-baking) for 1 hour.
상기 차광용 격벽은 10 dyne/cm 내지 25 dyne/cm의 표면에너지, 예컨대 18 dyne/cm 내지 23 dyne/cm의 표면에너지를 가질 수 있다. 상기 차광용 격벽, 구체적으로는 상기 차광용 격벽의 위 표면이 상기 범위의 표면에너지를 가짐으로써, 발액성이 우수해짐으로 인해 잉크끼리의 혼색이 일어나는 것을 효과적으로 방지할 수 있다.The light blocking barrier rib may have a surface energy of 10 dyne/cm to 25 dyne/cm, for example, a surface energy of 18 dyne/cm to 23 dyne/cm. Since the light-shielding barrier rib, specifically, the surface of the upper surface of the light-shielding barrier rib has a surface energy within the above range, it is possible to effectively prevent color mixing between inks due to excellent liquid repellency.
또 다른 일 구현예는 상기 차광용 격벽을 포함하는 디스플레이 장치를 제공한다. Another embodiment provides a display device including the light blocking barrier rib.
상기 디스플레이 장치는 광원 및 오버코트층을 더 포함하고, 상기 차광용 격벽 사이에 양자점이 위치할 수 있다.The display device may further include a light source and an overcoat layer, and quantum dots may be positioned between the light blocking barrier ribs.
상기 광원은 유기발광다이오드, 예컨대 청색 유기발광다이오드일 수 있다. 상기 격벽 사이에 위치하는 양자점은 조성물의 형태로 존재하며, 상기 양자점 함유 조성물이 경화되어 양자점 함유층을 구성할 수 있다. 즉, 상기 격벽 사이에는 양자점 함유층이 위치할 수 있다. 예컨대, 상기 디스플레이 장치는 유기발광다이오드(광원) 상에 양자점 함유층이 존재하고, 상기 양자점 함유층 양쪽에 차광용 격벽이 위치하고, 상기 광원 및 양자점 함유층 사이에 오버코트층이 위치할 수 있다. 또한, 상기 디스플레이 장치는 유기발광다이오드(광원) 상에 양자점 함유층이 존재하고, 상기 양자점 함유층 양쪽에 차광용 격벽이 위치하고, 상기 양자점 함유층 상에 오버코트층이 위치할 수 있다. (도 1 내지 도 3 참조)The light source may be an organic light emitting diode, for example, a blue organic light emitting diode. The quantum dots positioned between the barrier ribs exist in the form of a composition, and the quantum dot-containing composition may be cured to constitute a quantum dot-containing layer. That is, a quantum dot-containing layer may be positioned between the barrier ribs. For example, in the display device, a quantum dot-containing layer may be present on an organic light emitting diode (light source), a light blocking barrier may be positioned on both sides of the quantum dot-containing layer, and an overcoat layer may be positioned between the light source and the quantum dot-containing layer. In addition, in the display device, a quantum dot-containing layer may be present on an organic light emitting diode (light source), light-shielding barrier ribs may be positioned on both sides of the quantum dot-containing layer, and an overcoat layer may be positioned on the quantum dot-containing layer. (See FIGS. 1 to 3)
이하, 본 발명의 바람직한 실시예를 기재한다. 다만, 하기의 실시예는 본 발명의 바람직한 일실시예일 뿐, 본 발명이 하기 실시예에 의해 한정되는 것은 아니다.Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.
(감광성 수지 조성물 제조)(Preparation of photosensitive resin composition)
하기 표 1에 기재된 조성으로, 실시예 1 내지 실시예 6 및 비교예 1 내지 비교예 4에 따른 차광용 격벽 조성물을 제조하였다. 구체적으로, 용매에 광중합 개시제를 용해시킨 후 2시간 동안 상온에서 교반하였다. 여기에, 발수성 첨가제, 카도계 바인더 수지 및 아크릴계 광중합성 단량체를 첨가하고, 2시간 동안 상온에서 교반하였다. 그리고, 차광제를 첨가한 후, 1시간 동안 상온에서 교반하고, 기타 첨가제(계면활성제)를 첨가하고 1시간 동안 상온에서 교반하였다. 상기 용액에 대하여 3회에 걸친 여과를 행하여 불순물을 제거하여 차광용 격벽 조성물을 제조하였다. With the composition shown in Table 1 below, light-shielding barrier rib compositions according to Examples 1 to 6 and Comparative Examples 1 to 4 were prepared. Specifically, the photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours. Here, a water repellent additive, a cardo-based binder resin, and an acrylic photopolymerizable monomer were added and stirred at room temperature for 2 hours. Then, after the light-shielding agent was added, the mixture was stirred at room temperature for 1 hour, and other additives (surfactants) were added and stirred at room temperature for 1 hour. The solution was filtered three times to remove impurities to prepare a light-shielding barrier rib composition.
(A) 카도계 바인더 수지(A) Cardo-based binder resin
KBR-101 (경인社) KBR-101 (Kyungin Corporation)
(B) 아크릴계 광중합성 단량체(B) acrylic photopolymerizable monomer
디펜타에리트리톨 헥사(메타)아크릴레이트 (DPHA, sartomer社)Dipentaerythritol hexa(meth)acrylate (DPHA, sartomer)
(C) 광중합 개시제(C) photoinitiator
(C-1) PBG-304 (Tronly)(C-1) PBG-304 (Tronly)
(C-2) PBG-305 (Tronly)(C-2) PBG-305 (Tronly)
(D) 차광제(D) shading agent
Organic black pigment (CIM-126) 분산액 (SAKATA社; 유기흑색안료 고형분 21 중량%) Organic black pigment (CIM-126) dispersion (SAKATA company; organic black pigment solid content 21% by weight)
(E) 발수성 첨가제(E) water repellent additive
(E-1) AD-1700 (solvay社) (주쇄에 플루오린 원자를 포함)(E-1) AD-1700 (solvay) (including a fluorine atom in the main chain)
(E-2) MD-700 (solvay社) (주쇄에 플루오린 원자를 포함)(E-2) MD-700 (solvay) (including a fluorine atom in the main chain)
(E-3) F-570 (DIC社) (주쇄가 아닌 측쇄에만 플루오린 원자를 포함)(E-3) F-570 (DIC Corporation) (contains a fluorine atom only in the side chain, not the main chain)
(F) 용매(F) solvent
(F-1) 프로필렌 글리콜 모노메틸에테르 아세테이트 (PGMEA, Sigma-aldrich社)(F-1) propylene glycol monomethyl ether acetate (PGMEA, Sigma-aldrich)
(F-2) 3-메톡시부틸 아세테이트 (3-MBA, Sigma-aldrich社)(F-2) 3-methoxybutyl acetate (3-MBA, Sigma-aldrich)
기타 첨가제other additives
계면활성제 (DIC社, F-554(10% 희석액 사용))Surfactant (DIC, F-554 (10% dilution used))
(평가)(evaluation)
표면에너지 평가Surface energy evaluation
실시예 1 내지 실시예 6 및 비교예 1 내지 비교예 4에 따른 차광용 격벽 조성물을 10cm*10cm bare 글래스에 도포하여, 100℃의 핫플레이트에서, 1 분간 proxy type으로 가열하고, 다시 1분간 contact type으로 가열하여 10 ㎛ 두께의 도막을 형성하였다. 상기 도막이 코팅된 기판을 다양한 크기의 패턴이 새겨진 마스크를 사용하여 Ushio社의 UX-1200SM-AKS02로 노광량의 변화를 주어가며 노광한 후, 상온에서 2.38%의 TMAH용액으로 현상하여 노광부를 용해시켜 제거한 후, 순수로 50초간 세척하고, 접촉각 측정기(KRUSS社 DSA100)로 DIW 1.0uL ~ 3.0uL 및 Ethylene Glycol(EG) 1.0uL ~ 3.0uL를 dropping 하여 각각의 접촉각을 측정한 후, DIW/EG의 접촉각을 KRUSS 표면에너지 측정 방법으로 표면에너지를 계산하여, 그 결과를 하기 표 2에 나타내었다. (접촉각 측정법: ASTM D 5946 / 표면에너지 계산법: ASTM D 7490) 차광용 격벽 표면이 발액성을 갖기 위해서는 표면에너지 값이 28 dyne/cm 이하로 구현되어야 한다.The light blocking barrier composition according to Examples 1 to 6 and Comparative Examples 1 to 4 was applied to 10 cm * 10 cm bare glass, heated on a hot plate at 100 ° C. for 1 minute in a proxy type, and contacted again for 1 minute Type was heated to form a coating film with a thickness of 10 μm. The substrate coated with the coating film was exposed using a mask engraved with patterns of various sizes with Ushio's UX-1200SM-AKS02 at varying exposure doses, and then developed with a 2.38% TMAH solution at room temperature to dissolve and remove the exposed parts. Then, wash with pure water for 50 seconds, drop DIW 1.0uL ~ 3.0uL and Ethylene Glycol (EG) 1.0uL ~ 3.0uL with a contact angle measuring instrument (KRUSS DSA100) to measure each contact angle, and then measure the contact angle of DIW/EG The surface energy was calculated by the KRUSS surface energy measurement method, and the results are shown in Table 2 below. (Contact angle measurement method: ASTM D 5946 / Surface energy calculation method: ASTM D 7490) In order for the light-shielding barrier rib surface to have liquid repellency, the surface energy value must be 28 dyne/cm or less.
상기 표 2로부터, 일 구현예에 따른 차광용 격벽 (위) 표면은 표면에너지가 28 dyne/cm 이하, 보다 구체적으로 23 dyne/cm 이하로 구현되는 바, 발액성이 매우 우수함을 확인할 수 있다.From Table 2, it can be seen that the surface energy of the light-shielding barrier rib (above) according to an embodiment is 28 dyne/cm or less, and more specifically, 23 dyne/cm or less, which is implemented as a bar, and has very excellent liquid repellency.
본 발명은 상기 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 제조될 수 있으며, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상이나 필수적인 특징을 변경하지 않고서 다른 구체적인 형태로 실시될 수 있다는 것을 이해할 수 있을 것이다. 그러므로 이상에서 기술한 실시예들은 모든 면에서 예시적인 것이며 한정적이 아닌 것으로 이해해야만 한다.The present invention is not limited to the above embodiments, but can be manufactured in various different forms, and those of ordinary skill in the art to which the present invention pertains can take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented as Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.
Claims (15)
(B) 아크릴계 광중합성 단량체,
(C) 광중합 개시제,
(D) 차광제,
(E) 주쇄에 하기 화학식 1로 표시되는 구조단위를 포함하는 발수성 첨가제 및
(F) 용매
를 포함하고,
상기 발수성 첨가제는 차광용 격벽 조성물 총량에 대해 0.1 중량% 내지 2 중량%로 포함되는 차광용 격벽 조성물:
[화학식 1]
상기 화학식 1에서,
m 및 n은 각각 독립적으로 0 이상의 정수이되, 단 5 < m+n < 100 이다.
(A) cardo-based binder resin,
(B) an acrylic photopolymerizable monomer;
(C) a photoinitiator;
(D) a shading agent;
(E) a water repellent additive comprising a structural unit represented by the following formula (1) in the main chain, and
(F) solvent
including,
The water-repellent additive is included in an amount of 0.1 wt% to 2 wt% based on the total amount of the light-shielding barrier rib composition:
[Formula 1]
In Formula 1,
m and n are each independently an integer greater than or equal to 0, provided that 5 < m+n < 100.
상기 발수성 첨가제는 말단에 (메타)아크릴레이트기를 포함하는 차광용 격벽 조성물.
According to claim 1,
The water repellent additive is a light blocking barrier composition comprising a (meth) acrylate group at the terminal.
상기 발수성 첨가제는 5000 g/mol 내지 100000 g/mol의 중량평균분자량을 가지는 차광용 격벽 조성물.
According to claim 1,
The water repellent additive is a light-shielding barrier rib composition having a weight average molecular weight of 5000 g/mol to 100000 g/mol.
상기 차광제는 무기흑색안료 또는 유기흑색안료를 포함하는 차광용 격벽 조성물.
According to claim 1,
The light blocking agent is a light blocking barrier composition comprising an inorganic black pigment or an organic black pigment.
상기 차광제는 적색안료, 청색안료, 바이올렛안료, 녹색안료 및 오렌지안료로 이루어진 군에서 선택된 3 이상의 안료의 혼합물을 포함하는 차광용 격벽 조성물.
According to claim 1,
The light blocking agent is a light blocking barrier composition comprising a mixture of three or more pigments selected from the group consisting of a red pigment, a blue pigment, a violet pigment, a green pigment and an orange pigment.
상기 차광제는 적색안료, 청색안료 및 바이올렛안료의 혼합물을 포함하고,
상기 적색안료, 청색안료 및 바이올렛안료는 각각 3 내지 4 : 2.5 내지 3.5 : 1의 중량비로 혼합되어 있는 차광용 격벽 조성물.
8. The method of claim 7,
The light-shielding agent includes a mixture of a red pigment, a blue pigment and a violet pigment,
The red pigment, the blue pigment and the violet pigment are each mixed in a weight ratio of 3 to 4: 2.5 to 3.5: 1 for blocking light.
상기 차광용 격벽 조성물은 확산제를 더 포함하는 차광용 격벽 조성물.
According to claim 1,
The light-shielding barrier rib composition further comprises a diffusing agent.
상기 확산제는 황산바륨, 탄산칼슘, 이산화티타늄, 지르코니아 또는 이들의 조합을 포함하는 차광용 격벽 조성물.
10. The method of claim 9,
The light-shielding barrier rib composition comprising the diffusing agent barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.
상기 차광용 격벽 조성물은 말론산, 3-아미노-1,2-프로판디올, 실란계 커플링제, 레벨링제, 계면활성제 또는 이들의 조합을 더 포함하는 차광용 격벽 조성물.
According to claim 1,
The light blocking barrier composition further comprises malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof.
A light blocking barrier rib manufactured using the light blocking barrier rib composition of any one of claims 1, 3, 4, and 6 to 11.
상기 차광용 격벽은 10 dyne/cm 내지 25 dyne/cm의 표면에너지를 가지는 차광용 격벽.
13. The method of claim 12,
The light blocking barrier rib has a surface energy of 10 dyne/cm to 25 dyne/cm.
A display device comprising the barrier rib of claim 12 .
상기 디스플레이 장치는 광원 및 오버코트층을 더 포함하고, 상기 차광용 격벽 사이에 양자점이 위치하는 디스플레이 장치.15. The method of claim 14,
The display device further includes a light source and an overcoat layer, wherein quantum dots are positioned between the light blocking barrier ribs.
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PCT/KR2019/008205 WO2020218676A1 (en) | 2019-04-24 | 2019-07-04 | Light-shielding barrier rib composition, light-shielding barrier rib manufactured using same, and display device |
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JP5246369B2 (en) * | 2011-08-12 | 2013-07-24 | ダイキン工業株式会社 | Liquid repellent curable ink composition |
KR101797062B1 (en) * | 2017-04-12 | 2017-11-14 | 서경수 | Quantum Dots Optical Films and Devices using the Same |
KR101804259B1 (en) * | 2015-03-24 | 2017-12-04 | 삼성에스디아이 주식회사 | Photosensitive resin composition, black column spacerusing the same and color filter |
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JP6574608B2 (en) * | 2014-12-26 | 2019-09-11 | 中国塗料株式会社 | Photocurable resin composition, cured film formed from the composition and substrate with film, and method for producing cured film and substrate with film |
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JP5246369B2 (en) * | 2011-08-12 | 2013-07-24 | ダイキン工業株式会社 | Liquid repellent curable ink composition |
KR101804259B1 (en) * | 2015-03-24 | 2017-12-04 | 삼성에스디아이 주식회사 | Photosensitive resin composition, black column spacerusing the same and color filter |
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