KR102311491B1 - Composition for double layer partition wall, double layer partition wall using the same and display device including the double layer partition wall - Google Patents

Abstract

An upper layer composition comprising a fluorine-based compound, a photopolymerization monomer, a photopolymerization initiator, and a first solvent, and a lower layer composition comprising a binder resin, a photopolymerization monomer, a light blocking agent, a photoinitiator, and a second solvent, wherein the first solvent is diisoamyl ether, 2-methyl-1-propanol, 3-methyl-2-pentanol, 4-methyl-2-pentanol, or a combination thereof; A double-layer barrier rib composition in which the first solvent and the second solvent are not mixed with each other, a double-layer barrier rib manufactured using the same, and a display device including the double-layer barrier rib are provided.

Description

Double-layered barrier rib composition, double-layered barrier rib using the same, and a display device comprising double-layered barrier rib

The present disclosure relates to a double-layer barrier rib composition, a double-layer barrier rib manufactured using the same, and a display device including the double-layer barrier rib.

In order to realize high-resolution and high-brightness display devices, the panel structure is constantly being changed. Among these changes, there is a movement to improve devices by applying high-tech OLED and quantum dots to improve panel characteristics. And in order to overcome the limitations of each technology and realize better characteristics, technology development to simultaneously apply OLED and quantum dots is being actively carried out.

In order to simultaneously apply OLED and quantum dots, OLED should be used as a light source and color should be realized using quantum dots. I need this. Specifically, in order to prevent the quantum dot-containing ink from mixing with each other, the quantum dot-containing ink must be filled into the barrier rib pattern, so the surface of the barrier rib must have hydrophobic or water repellent properties, and the interior of the pattern forming the barrier rib must have hydrophilicity. That is, two properties should be implemented in one pattern, and in the prior art, it was difficult to implement two properties (water repellency and hydrophilicity) that do not correspond to each other in one pattern. In addition, conventionally, carbon black is used to increase the optical density of the light-shielding composition, but in this case, light is not irradiated to the lower end of the pattern during the exposure process, and photocuring is not performed on the lower part of the film. There was also the disadvantage of being severely induced and vulnerable to process margins. In the case of a barrier rib material for inkjet, since the required film thickness is as high as 4 μm or more, only the surface of the film is cured after the exposure and development process, and the photocurability of the lower portion is lowered, and the adhesive properties are also deteriorated.

Therefore, research to develop a barrier rib material for inkjet that can solve the above problems is continuing.

One embodiment is to provide a double-layer barrier rib having both water repellency and hydrophilicity with only one exposure and development process.

Another embodiment is to provide a double-layer barrier rib composition capable of providing a double-layer barrier rib having both water repellency and hydrophilicity with only one exposure and development process.

Another embodiment is to provide a display device including the double-layer barrier rib.

One embodiment is composed of an upper layer composition comprising a fluorine-based compound, a photopolymerization monomer, a photopolymerization initiator and a first solvent, and a lower layer composition comprising a binder resin, a photopolymerization monomer, a light blocking agent, a photopolymerization initiator and a second solvent, and the first solvent contains diisoamyl ether, 2-methyl-1-propanol, 3-methyl-2-pentanol, 4-methyl-2-pentanol, or a combination thereof, wherein the first solvent and the second solvent are mixed with each other To provide a double-layered barrier rib composition that does not

The second solvent may include propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, or a combination thereof.

The first solvent includes a mixture of 'diisoamyl ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol', and the 'diisoamyl Ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol' may be included in a weight ratio of 10:90 to 40:60.

The fluorine-based compound may be a fluorine-based binder resin or a fluorine-based oligomer.

The fluorine-based binder resin may have a weight average molecular weight of 3,000 g/mol to 10,000 g/mol, and the fluorine-based oligomer may have a weight average molecular weight of 2,000 g/mol.

The binder resin may be a cardo-based binder resin.

The light blocking agent may include a red pigment, a blue pigment, and a violet pigment.

The photopolymerization initiator may include an acetophenone-based compound and an oxime-based compound.

Another embodiment is composed of an upper layer comprising a fluorine-based compound, a photopolymerization monomer and a photopolymerization initiator, and a lower layer comprising a binder resin, a photopolymerization monomer, a light blocking agent, and a photopolymerization initiator, and the surface energy of the upper layer is lower than the surface energy of the lower layer A double-layer bulkhead is provided.

The surface energy of the upper layer may be 20 dyne/cm or less.

Another embodiment provides a display device including a quantum dot-containing layer positioned between the double-layer barrier ribs.

The display device may further include a light source and an overcoat layer.

The light source may be an organic light emitting diode (OLED).

The organic light emitting diode (OLED) may be a blue organic light emitting diode (OLED).

The specific details of other aspects of the invention are included in the detailed description below.

One embodiment provides a double-layer barrier rib composition capable of unifying the exposure/development process, excluding the coating process.

Another embodiment provides a double-layer barrier rib capable of unifying the exposure/development process, excluding the coating process.

Another embodiment provides a display device including the double-layer barrier rib.

1 to 3 are schematic views each independently showing a display device according to an embodiment.
4 is an optical micrograph (X50) showing the pattern (exposure dose: 40 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 5. FIG.}
5 is an optical micrograph (X50) showing the pattern (exposure dose: 50 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 5. FIG.}
6 is an optical micrograph (X50) showing the pattern (exposure dose: 60 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 5. FIG.}
7 is an optical micrograph (X50) showing the pattern (exposure dose: 70 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 5. FIG.}
8 is an optical micrograph (X50) showing the pattern (exposure dose: 20 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 10. FIG.}
9 is an optical micrograph (X50) showing the pattern (exposure dose: 30 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 10. FIG.}
10 is an optical micrograph (X50) showing the pattern (exposure dose: 40 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 10. FIG.}
11 is an optical micrograph (X50) showing the pattern (exposure dose: 50 mJ/cm ^{2 ) of the double-layer barrier rib composition of Example 10. FIG.}

Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, and "cycloalkenyl group" means a C3 to C20 cycloalkenyl group, , "heterocycloalkenyl group" means a C2 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C7 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C7 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It refers to an arylene group, and "alkoxyylene group" refers to a C1 to C20 alkoxyylene group.

Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amino group, an imino group, an azi earthenware, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1- C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to It means substituted with a substituent of a C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.

In addition, unless otherwise specified in the present specification, "hetero" means that at least one hetero atom among N, O, S and P is included in the formula.

In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" is "acrylic acid" and "methacrylic acid" “It means that both are possible.

Unless otherwise defined herein, "combination" means mixing or copolymerization. Also, "copolymerization" means block copolymerization, alternating copolymerization, or random copolymerization, and "copolymer" means block copolymer, alternating copolymer, or random copolymer.

Unless otherwise defined in the chemical formulas in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.

As used herein, the cardo-based resin refers to a resin in which one or more functional groups selected from the group consisting of the following Chemical Formulas 1-1 to 1-11 are included in the backbone of the resin.

Unless otherwise defined herein, "*" means the same or different atom (including a hydrogen atom) or a portion connected to a chemical formula.

One embodiment is composed of an upper layer composition comprising a fluorine-based compound, a photopolymerization monomer, a photoinitiator and a first solvent, and a lower layer composition comprising a binder resin, a photopolymerization monomer, a light blocking agent, a photoinitiator, and a second solvent, wherein the first solvent is di isoamyl ether, 2-methyl-1-propanol, 3-methyl-2-pentanol, 4-methyl-2-pentanol, or a combination thereof, wherein the first solvent and the second solvent are immiscible with each other. A double-layered barrier rib composition is provided.

The upper layer composition includes a first solvent, and the lower layer composition includes a second solvent. Since the first solvent and the second solvent are not mixed with each other, a double layer may be formed without intermixing.

For example, the first solvent may be formed of diisoamyl ether, 2-methyl-1-propanol, 3-methyl-2-pentanol, 4-methyl-2-pentanol, or a combination thereof.

For example, the second solvent may include propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, or a combination thereof.

For example, the first solvent includes a mixture of 'diisoamyl ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol', in this case, The 'diisoamyl ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol' may be included in a weight ratio of 10:90 to 40:60. When the first solvent has such a composition, intermixing with propylene glycol monomethyl ether acetate, which is the main solvent (second solvent) constituting the lower layer, can be significantly reduced, and the surface energy of the upper layer can be further lowered.

The first solvent and the second solvent may be included in a balance, for example, 25 wt% to 80 wt%, such as 25 wt% to 70 wt%, respectively, based on the total amount of the upper layer composition and the lower layer composition, respectively. When the first solvent and the second solvent are included within the above range, respectively, the composition may have an appropriate viscosity, and thus processability may be excellent in manufacturing the barrier rib.

The fluorine-based compound may be a fluorine-based binder resin or a fluorine-based oligomer.

For example, the fluorine-based binder resin and the fluorine-based oligomer may each independently be a copolymer of fluorinated monomers or a copolymer of the fluorinated monomer and other monomers. As the fluorinated monomer, chlorotrifluoroethylene (CTFE), tetrafluoroethylene (TFE), hexafluoropropylene (HFP), vinylidene fluoride (VdF), vinyl fluoride (VF), perfluoroalkyl vinyl ether (PAVE) and the like, but is not necessarily limited thereto.

For example, the fluorine-based binder resin may have a weight average molecular weight of 3,000 g/mol to 10,000 g/mol, and the fluorine-based oligomer may have a weight average molecular weight of 2,000 g/mol to 2,900 g/mol, such as 2,000 g/mol.

The binder resin may be, for example, a cardo-based binder resin.

For example, the cardo-based binder resin may be represented by the following formula (1).

[Formula 1]

In Formula 1,

R ⁵¹ and R ⁵² are each independently a hydrogen atom or a substituted or unsubstituted (meth)acryloyloxy alkyl group,

R ⁵³ and R ⁵⁴ are each independently a hydrogen atom, a halogen atom, or a substituted or unsubstituted C1 to C20 alkyl group,

Z ¹ is a single bond, O, CO, SO ₂ , CR ⁵⁵ R ⁵⁶ , SiR ⁵⁷ R ⁵⁸ (wherein R ⁵⁵ to R ⁵⁸ are each independently a hydrogen atom, or a substituted or unsubstituted C1 to C20 alkyl group) or Any one of the linking groups represented by the following Chemical Formulas 1-1 to 1-11,

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

(In Formula 1-5,

R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ or a phenyl group.)

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

[Formula 1-10]

[Formula 1-11]

Z ² is an acid dianhydride residue,

n1 and n2 are each independently an integer of 0 to 4.

The weight average molecular weight of the cardo-based binder resin may be 500 g/mol to 50,000 g/mol, for example, 1,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the cardo-based binder resin is within the above range, a pattern can be formed without a residue when manufacturing the light shielding layer, there is no loss of film thickness during development, and a good pattern can be obtained.

The cardo-based binder resin may include a functional group represented by the following Chemical Formula 2 at at least one of both ends.

[Formula 2]

In Formula 2,

Z ³ may be represented by the following Chemical Formulas 2-1 to 2-7.

[Formula 2-1]

(In Formula 2-1, R ^b and R ^c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group, or an ether group.)

[Formula 2-2]

[Formula 2-3]

[Formula 2-4]

[Formula 2-5]

(In Formula 2-5, R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, C1 to C20 alkylamine group, or C2 to C20 allylamine group.)

[Formula 2-6]

[Formula 2-7]

The cardo-based binder resin may include, for example, a fluorene-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; Benzenetetracarboxylic acid dianhydride, naphthalenetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, benzophenonetetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic acid dianhydride, phenol anhydride compounds such as rylenetetracarboxylic acid dianhydride, tetrahydrofurantetracarboxylic acid dianhydride, and tetrahydrophthalic acid anhydride; glycol compounds such as ethylene glycol, propylene glycol and polyethylene glycol; alcohol compounds such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; solvent compounds such as propylene glycol methyl ethyl acetate and N-methyl pyrrolidone; phosphorus compounds such as triphenylphosphine; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.

The light blocking agent may include a mixed pigment of a red pigment, a blue pigment, and a violet pigment.

For example, the red pigment, the blue pigment and the violet pigment may be mixed in a weight ratio of 3 to 4: 2 to 3:1, respectively. That is, the red pigment may be included in an amount of 3 to 4 times the content of the violet pigment, and the blue pigment may be included in an amount of 2 to 3 times the content of the violet pigment, in this case, excellent photosensitive properties It is possible to achieve heat resistance and optical properties while maintaining it.

The mixed pigment may be composed of the red pigment, the blue pigment and the violet pigment, and may not include an inorganic black pigment such as carbon black. When inorganic black pigments such as carbon black are included, only the lower portion of the film is not photocured during exposure, development, and curing processes, which may cause severe undercutting, which may be undesirable.

For example, the red pigment may be included in an amount greater than that of the blue pigment. When the red pigment is included in an amount greater than that of the blue pigment, photosensitive properties, heat resistance and optical properties may be further improved.

For example, the double layer barrier rib may have a thickness of 6 μm to 15 μm.

Examples of the red pigment include C.I. Red pigment 254, C.I. Red pigment 255, C.I. Red pigment 264, C.I. Red pigment 270, C.I. Red pigment 272, C.I. Red pigment 177, C.I. Red pigment 179, C.I. Red pigment 89 etc. are mentioned. Examples of the violet pigment include C.I. Violet pigment 1, C.I. Violet Pigment 19, C.I. Violet Pigment 23, C.I. Violet pigment 27, C.I. Violet Pigment 29, C.I. Violet Pigment 30, C.I. Violet pigment 32, C.I. Violet pigment 37, C.I. Violet Pigment 40, C.I. Violet pigment 42, C.I. Violet pigment 50 etc. are mentioned. Examples of the blue pigment include C.I. Blue pigment 15:6, C.I. Blue pigment 15, C.I. Blue pigment 15:1, C.I. Blue pigment 15:2, C.I. blue pigment 15:3, C.I. Blue pigment 15:4, C.I. Blue pigment 15:5, C.I. and phthalocyanine pigments such as blue pigment 16 and the like. However, the types of the red pigment, the violet pigment and the blue pigment are not limited thereto.

In the mixed pigment, a dispersing agent may be used together to disperse each pigment constituting the mixed pigment. Specifically, each of the pigments may be surface-treated in advance with a dispersant and used, or a dispersant may be added together with the pigment when preparing the composition.

As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, and the like may be used. Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonate, carboxylic acid ester, carboxylate , alkyl amides, alkylene oxides, and alkyl amines, and these may be used alone or in combination of two or more.

Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. from EFKA Chemicals; Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc. from Zeneka; or Ajinomoto's PB711 and PB821.

The pigment may be used after pretreatment using a water-soluble inorganic salt and a wetting agent. When the pigment is pre-treated and used, the average particle diameter of the pigment can be refined.

The pretreatment may be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained in the kneading step.

The kneading may be performed at a temperature of 40° C. to 100° C., and the filtration and washing may be performed by washing the inorganic salt with water and then filtration.

Examples of the water-soluble inorganic salt include, but are not limited to, sodium chloride and potassium chloride. The wetting agent serves as a medium through which the pigment and the water-soluble inorganic salt are uniformly mixed and the pigment can be easily pulverized, for example, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. alkylene glycol monoalkyl ethers; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerin polyethylene glycol, and the like, and these may be used alone or in a mixture of two or more.

The pigment that has undergone the kneading step may have an average particle diameter of 5 nm to 200 nm, for example, 5 nm to 150 nm. When the average particle diameter of the pigment is within the above range, stability in the pigment dispersion may be excellent, and there may be no risk of deterioration of pixel resolution.

Specifically, the pigment may be used in the form of a pigment dispersion including the dispersant and a solvent such as PGMEA, and the pigment dispersion may include a solid pigment, a dispersant, and a solvent. The solid pigment may be included in an amount of 5 wt% to 40 wt%, for example 8 wt% to 30 wt%, based on the total amount of the pigment dispersion.

The photopolymerization monomer may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.

Since the photopolymerization monomer has the ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure to light in the pattern forming process.

Specific examples of the photopolymerization monomer include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di (meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylic rate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane tri (meth) ) acrylate, tris (meth) acryloyloxyethyl phosphate, and novolac epoxy (meth) acrylate.

Examples of commercially available products of the photopolymerization monomer are as follows. Examples of the monofunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-101 ^® , Aronix M-111 ^® , Aronix M-114 ^® and the like; Nihon Kayaku Co., Ltd.'s KAYARAD TC-110S ^® , KAYARAD TC-120S ^®, etc.; ^{V-158 ®} and V-2311 ^{® of} Osaka Yuki Chemical High School Co., Ltd. are mentioned. Examples of the bifunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-210 ^® , Aronix M-240 ^® , Aronix M-6200 ^® and the like; Nihon Kayaku Co., Ltd.'s KAYARAD HDDA ^® , KAYARAD HX-220 ^® , KAYARAD R-604 ^®, etc.; ^{and V-260 ®} , V-312 ^® , V-335 HP ^{® of} Osaka Yuki Chemical High School Co., Ltd. and the like. Examples of the trifunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-309 ^® , Aronix M-400 ^® , Aronix M-405 ^® , Aronix M-450 ^® , Aronix M-710 ^® , Aronix M-8030 ^® , Aronix M-8060 ^® etc.; Nihon Kayaku Co., Ltd. KAYARAD TMPTA ^® , KAYARAD DPCA-20 ^® , KAYARAD-30 ^® , KAYARAD-60 ^® , KAYARAD-120 ^®, etc.; ^{V-295 ®} , V-300 ^® , V-360 ^® , V-GPT ^® , V-3PA ^® , V-400 ^{® of} Osaka Yuki Kayaku Kogyo Co., Ltd. may be mentioned. These products may be used alone or in combination of two or more.

The photopolymerization monomer may be used after treatment with an acid anhydride in order to provide better developability.

The photopolymerization monomer may be included in an amount of 5 wt% to 20 wt%, for example 5 wt% to 15 wt%, based on the total amount of the upper layer composition and the lower layer composition, respectively. When the photopolymerization monomer is included within the above range, curing occurs sufficiently during exposure in the pattern forming process, thereby providing excellent reliability and excellent developability in an alkali developer.

The photopolymerization initiator may include two different compounds. For example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof may be used as the photopolymerization initiator. For example, the photopolymerization initiator may include an acetophenone-based compound and an oxime-based compound.

Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.

Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethyl amino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.

Examples of the thioxanthone-based compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diiso A propyl thioxanthone etc. are mentioned.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho1-yl)-4,6 -bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloro and romethyl)-6-piperonyl-s-triazine and 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine.

Examples of the oxime-based compound include O-acyloxime-based compound, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. can be used Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane -1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2- Dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime -O-acetate　 etc. can be used.

As the photopolymerization initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound may be used in addition to the above compound.

The photopolymerization initiator may be included in an amount of 0.1 wt% to 5 wt%, for example, 0.1 wt% to 3 wt%, based on the total amount of the upper layer composition and the lower layer composition, respectively. When the photopolymerization initiator is included within the above range, photopolymerization occurs sufficiently during exposure in the pattern forming process, so that the sensitivity is excellent and the transmittance can be improved.

On the other hand, the upper layer composition and the lower layer composition constituting the double-layer barrier rib composition according to an embodiment are each independently malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof. It may further include additives in combination.

The silane-based coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, and an epoxy group in order to improve adhesion to the substrate.

Examples of the silane coupling agent include trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatepropyltriethoxysilane, γ-glycan Cydoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.

The silane-based coupling agent may be included in an amount of 0.01 wt% to 10 wt% based on the total amount of the upper layer composition and the lower layer composition, respectively. When the silane-based coupling agent is included within the above range, adhesion and storage properties may be excellent.

In addition, the surfactant may be a fluorine-based surfactant or a silicone-based surfactant.

Examples of the fluorine-based surfactant include BM-1000 ^® , BM-1100 ^® and the like by BM Chemie; ^{Mechapack F 142D ®} , Mechapack F 172 ^® , Mechapack F 173 ^® , Mechapack F 183 ^® , Mechapack F 554 ^® and the like of Dai Nippon Inki Chemical Co., Ltd.; ^{Prorad FC-135 ®} , Prorad FC-170C ^® , Prorad FC-430 ^® , Prorad FC-431 ^®, etc. from Sumitomos Reem Co., Ltd.; Asahi Grass Co., Ltd. Saffron S-112 ^® , Saffron S-113 ^® , Saffron S-131 ^® , Saffron S-141 ^® , Saffron S-145 ^®, etc.; Toray Silicone Co., Ltd.'s SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® , SF-8428 ^®, etc. may be used.

The silicone-based surfactants include BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, What is marketed under the name of BYK-325 etc. can be used.

The surfactant may be used in an amount of 0.001 wt% to 5 wt% based on the total amount of the upper layer composition and the lower layer composition, respectively. When the surfactant is included within the above range, coating uniformity is secured, stains do not occur, and wettability to an IZO substrate or a glass substrate may be excellent.

In addition, the upper layer composition and the lower layer composition may each independently contain a certain amount of other additives such as antioxidants, stabilizers, and light diffusing agents within a range that does not inhibit physical properties.

For example, the light diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconia (ZrO ₂ ), or a combination thereof.

The light diffusing agent reflects light not absorbed by the quantum dots, and enables the quantum dots to absorb the reflected light again. That is, the light diffusing agent may increase the amount of light absorbed by the quantum dots, thereby increasing the light conversion efficiency of the quantum dot-containing composition.

The light diffusing agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the light diffusing agent is within the above range, a more excellent light diffusing effect may be obtained, and light conversion efficiency may be increased.

For example, the upper layer composition may include 5 wt% to 30 wt% of the fluorine-based compound, 2 wt% to 15 wt% of the photopolymerization monomer, and 0.1 wt% to 5 wt% of the photoinitiator with respect to the total amount of the upper layer composition.

For example, the lower layer composition may include 10 wt% to 20 wt% of the binder resin, 2 wt% to 10 wt% of the photopolymerization monomer, 30 wt% to 55 wt% of the light blocking agent, and 0.1 wt% of the photoinitiator with respect to the total amount of the lower layer composition to 5% by weight.

The double-layer barrier rib composition may be a positive photosensitive resin composition or a negative photosensitive resin composition, but after exposure and development of the lower layer composition having light-shielding properties, a residue in the area where the pattern is exposed is more completely removed In order to do so, it may be more preferable that it is a negative photosensitive resin composition.

The double-layer barrier rib according to another embodiment is composed of an upper layer including a fluorine-based compound, a photopolymerization monomer and a photopolymerization initiator, and a lower layer including a binder resin, a photopolymerization monomer, a light blocking agent, and a photoinitiator, and the surface energy of the upper layer is the lower layer lower than the surface energy of

The double-layer barrier rib according to another embodiment is a light-shielding barrier rib material used as a panel material for a liquid crystal display device or a display device, wherein an organic light emitting material (light source) is deposited on a lower plate of the display element, and a quantum dot composition is formed on the lower plate or upper plate has the characteristic of being formed by an inkjet process. That is, a quantum dot composition, such as a quantum dot ink, is filled between the double-layered barrier ribs by an inkjet process, so that the quantum dot ink can be filled in a desired area. Conventionally, it is difficult to provide a barrier rib having both water repellency and hydrophilicity, and the quantum dot ink overflows beyond the barrier rib after the quantum dot ink is filled. and the inside of the pattern forming the partition should have hydrophilicity, but it was difficult to implement water repellency and hydrophilicity in one pattern) The barrier rib has a double-layer structure that implements a water-repellent material and a hydrophilic material, respectively, so that the exposure/development process excluding the coating can be unified, and only the upper layer constituting the double layer has water repellency. By designing the double layer barrier rib so that the surface energy is lower than the surface energy of the lower layer, the effect of preventing the quantum dot ink from mixing with each other even after filling the quantum dot ink can be sufficiently realized. That is, the lower portion of the barrier rib according to another embodiment has excellent contact with the quantum dot ink, and the surface of the upper end of the barrier rib has hydrophobicity so that the ejected quantum dot ink does not cross the barrier rib. In addition, when the upper layer composition and the lower layer composition are coated, they do not mix with each other, and the lower layer composition has a taper angle close to 90° and has excellent resolution, and further includes a light blocking agent such as organic black and has a light blocking property.

The double-layer barrier rib according to another embodiment is divided into an upper layer and a lower layer, wherein the upper layer has a water repellency characteristic, and the lower layer has a hydrophilic characteristic. A black matrix (BM) having hydrophilicity, patterning is possible and high optical density is used as the lower layer, and the upper layer is designed in a double-layer structure to have water repellency, so that optical patterning can be performed at once. However, intermixing between the lower layer and the upper layer may occur. In order to solve this problem, conflicting solvents are used. And since the upper layer should have a surface water repellent property for quantum dot ink, the surface energy is lower than the surface energy of the lower layer after pre-baking, exposure, development, and post-baking processes are performed.

For example, the surface energy of the upper layer may be 20 dyne/cm or less.

The method for manufacturing the double-layer barrier rib is as follows.

(1) Application and coating film formation step

After applying the lower layer (photosensitive resin) composition to a desired thickness using a method such as a spin or slit coat method, a roll coat method, a screen printing method, or an applicator method, on a substrate such as a glass substrate or an ITO substrate that has been subjected to a predetermined pretreatment , to form a photosensitive resin film by heating at 70°C to 110°C for 1 minute to 10 minutes to remove the solvent. Next, a double-layered photosensitive resin film is formed by applying the upper layer (photosensitive resin) composition in the same manner and removing the solvent.

(2) exposure step

After interposing a mask to form a pattern required for the obtained double-layer photosensitive resin film, 200 nm to 500 nm of actinic rays are irradiated. As a light source used for irradiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an argon gas laser, etc. may be used, and in some cases, an X-ray, an electron beam, etc. may be used.

The exposure amount varies depending on the type of each component of the composition, the compounding amount and the dry film thickness, but is 500 mJ/cm ² (by 365 nm sensor) or less when a high-pressure mercury lamp is used.

(3) development step

In the developing method, following the exposure step, an alkaline aqueous solution is used as a developer to dissolve and remove unnecessary portions, thereby leaving only the exposed portion to form a pattern.

(4) post-processing step

In the above process, there is a post-heating process for obtaining a pattern excellent in heat resistance, light resistance, adhesion, crack resistance, high strength and storage stability of the image pattern obtained by development. For example, after development, it may be heated in a convection oven at 250° C. for 1 hour.

Another embodiment provides a display device including the double-layer barrier rib, specifically, a display device including the double-layer barrier rib and a quantum dot-containing layer positioned between the double-layer barrier rib.

The display device may further include a light source and an overcoat layer, and a coloring composition containing quantum dots may be positioned between the barrier ribs.

The light source may be an organic light emitting diode, for example, a blue organic light emitting diode. The quantum dots positioned between the double-layered barrier ribs may be present in the form of a composition. That is, the quantum dot-containing composition is positioned between the double-layered barrier ribs. For example, the display device may include a colored composition containing quantum dots on an organic light emitting diode (light source) and a colored layer in which a double-layered barrier rib is positioned on both sides of the coloring composition, and an overcoat layer may be disposed between the light source and the colored layer. . In addition, the display device may have a colored layer on the organic light emitting diode (light source), and an overcoat layer on the colored layer. (See FIGS. 1 to 3)

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.

(Preparation of photosensitive resin composition)

The lower layer (photosensitive resin) composition was prepared with the composition shown in Table 1, and the upper layer (photosensitive resin) composition was prepared with the composition shown in Table 2 below. Specifically, the photopolymerization initiator was dissolved in the second solvent and stirred at room temperature for 2 hours. Herein, a binder resin and a photopolymerization monomer were added, and the mixture was stirred at room temperature for 2 hours. Then, after the light-shielding agent was added, the mixture was stirred at room temperature for 1 hour, and other additives (surfactants) were added and stirred at room temperature for 1 hour. The solution was filtered three times to remove impurities to prepare a lower layer (photosensitive resin) composition. In addition, after dissolving the photopolymerization initiator in the first solvent, the mixture was stirred at room temperature for 2 hours. Here, a fluorine-based compound and a photopolymerizable monomer were added, stirred at room temperature for 2 hours, and filtered three times to remove impurities to prepare an upper layer (photosensitive resin) composition.

(Unit: g) Preparation Example 1 (A) binder resin 14 (B) photopolymerization monomer 6 (C) photoinitiator (C-1) 0.6 (C-2) 0.4 (D) shading agent (D-1) 2 (D-2) 6 (D-3) 15 (E) solvent (E-1) 24 (E-2) 10 (F) other additives 0.03

(A) binder resin

Cardo-based binder resin (KBR-101, Kyungin Chemical)

(B) photopolymerization monomer

Dipentaerythritol hexa(meth)acrylate (DPHA, Nippon Kayaku Co.)

(C) photoinitiator

(C-1) NCI831 (adeka)

(C-2) IRG369 (basf company)

(D) shading agent

(D-1) Red pigment (Red mill base, CI-IM-R179, SAKATA company, TSC 15% @PGMEA)

(D-2) Violet pigment (Violet mill base, CI-IM-V29, SAKATA, TSC 15% @PGMEA)

(D-3) Blue pigment (Blue mill base, CI-IM-B156, SAKATA, TSC 15% @PGMEA)

(E) solvent

(E-1) propylene glycol monomethyl ether acetate (PGMEA, Sigma-aldrich)

(E-2) 3-methoxybutyl acetate (3-MBA, Sigma-aldrich)

(F) other additives

Fluorine-based surfactant (F-554, DIC)

(Unit: g) manufacturing example 2 3 4 5 6 7 8 9 10 11 12 13 (A') fluorine-based compound (A'-1) 10 10 10 10 10 - - - - - 10 - (A'-2) - - - - - 10 10 10 10 10 - 10 (B) photopolymerization monomer 6 6 6 6 6 6 6 6 6 6 6 6 (C) photoinitiator (C-1) 0.6 0.6 0.6 0.6 0.6 0.6 0.6 0.6 0.6 0.6 0.6 0.6 (C-2) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 (E' or E) solvent (E'-1) 34 - - - 10 34 - - - 10 - - (E'-2) - 34 - - - - 34 - - - - - (E'-3) - - 34 - - - - 34 - - - - (E'-4) - - - 34 24 - - - 34 24 - - (E-1) - - - - - - - - - - 24 24 (E-2) - - - - - - - - - - 10 10

(A') fluorine-based compound

(A'-1) Fluorine-based binder resin (RS-75, DIC Corporation)

(A'-2) Fluorine-based oligomer (F-570, DIC Corporation)

(B') photopolymerization monomer

Dipentaerythritol hexa(meth)acrylate (DPHA, Nippon Kayaku Co.)

(C') photopolymerization initiator

(C'-1) NCI831 (adeka)

(C'-2) IRG369 (basf)

(E', E) solvent

(E'-1) diisoamyl ether (Sigma-aldrich)

(E'-2) 2-methyl-1-propanol (Sigma-aldrich)

(E'-3) 3-methyl-2-pentanol (Sigma-aldrich)

(E'-4) 4-methyl-2-pentanol (Sigma-aldrich)

(E-1) propylene glycol monomethyl ether acetate (PGMEA, Sigma-aldrich)

(E-2) 3-methoxybutyl acetate (3-MBA, Sigma-aldrich)

(Manufacture of double-layer bulkhead)

Example 1

The composition of Preparation Example 1 was coated on 10 cm * 10 cm ITO glass (resistance 30 Ω), heated on a hot plate at 100 ° C. in a proxy type for 1 minute, and heated again in a contact type for 1 minute to have a thickness of 7 μm to 9 μm. It forms a car coating film. Thereafter, the composition of Preparation Example 2 is applied on the first coating film, and then heated in the same manner to form a second coating film having a thickness of 1 μm to 3 μm. Thereafter, pattern exposure is performed using a mask with different exposure doses. By dissolving and removing unnecessary parts using an alkaline aqueous solution as a developer, only the exposed parts remain to form a pattern.

Example 2

It was the same as in Example 1, except that the composition of Preparation Example 3 was used instead of the composition of Preparation Example 2.

Example 3

It was the same as in Example 1, except that the composition of Preparation Example 4 was used instead of the composition of Preparation Example 2.

Example 4

It was the same as in Example 1, except that the composition of Preparation Example 5 was used instead of the composition of Preparation Example 2.

Example 5

It was the same as in Example 1, except that the composition of Preparation Example 6 was used instead of the composition of Preparation Example 2.

Example 6

It was the same as in Example 1 except that the composition of Preparation Example 7 was used instead of the composition of Preparation Example 2.

Example 7

It was the same as in Example 1, except that the composition of Preparation Example 8 was used instead of the composition of Preparation Example 2.

Example 8

It was the same as in Example 1, except that the composition of Preparation Example 9 was used instead of the composition of Preparation Example 2.

Example 9

It was the same as in Example 1, except that the composition of Preparation Example 10 was used instead of the composition of Preparation Example 2.

Example 10

It was the same as in Example 1, except that the composition of Preparation Example 11 was used instead of the composition of Preparation Example 2.

Comparative Example 1

The composition of Preparation Example 1 was coated on 10 cm * 10 cm ITO glass (resistance 30 Ω), heated on a hot plate at 100 ° C. in a proxy type for 1 minute, and heated again in a contact type for 1 minute to have a thickness of 7 μm to 9 μm. It forms a car coating film. Thereafter, the composition of Preparation Example 1 is applied once more on the primary coating film, and then heated in the same manner to form a secondary coating film having a thickness of 1 μm to 3 μm. Thereafter, pattern exposure is performed using a mask with different exposure doses. By dissolving and removing unnecessary parts using an alkaline aqueous solution as a developer, only the exposed parts remain to form a pattern.

Comparative Example 2

It was the same as in Example 1, except that the composition of Preparation Example 12 was used instead of the composition of Preparation Example 2.

Comparative Example 3

It was the same as in Example 1, except that the composition of Preparation Example 13 was used instead of the composition of Preparation Example 2.

(evaluation)

Evaluation 1: Measure the degree of intermixing

In the double layer partition wall according to Examples 1 to 10, Comparative Example 1 and Comparative Example 2, the value obtained by subtracting the total thickness of the double layer in which the upper layer is coated on the lower layer from the sum of the thicknesses of the lower layer and the upper layer The degree of intermixing was measured using As for the thickness, a scratch of about 1 mm in width was artificially made on the coated film quality using a razor blade, and the thickness was measured three times using Alpha step (Tencor) equipment, and then the average value was calculated. The measurement results are shown in Table 3 below.

Evaluation 2: Surface energy measurement

After measuring each contact angle by dropping DIW 1.0uL ~ 3.0uL and Ethylene Glycol (EG) 1.0uL ~ 3.0uL using a contact angle measuring instrument (KRUSS DSA100), the applied film quality was measured, and then the contact angle of DIW/EG was measured on the KRUSS surface. The surface energy was calculated by the energy measurement method, and the results are shown in Table 3 below. (Contact angle measurement method: ASTM D 5946 / Surface energy calculation method: ASTM D 7490)

Example comparative example One 2 3 4 5 6 7 8 9 10 One 2 3 Intermixing degree (㎛) 0 -0.5 -0.3 0 0 0 -0.8 -0.5 0 0 -3.5 -3.5 -3.4 Upper layer surface energy (dyne/cm) 15.6 15.7 15.7 15.5 15.9 16.4 16.7 17.0 16.2 16.5 31.8
(single floor) 15.7 16.7 Lower layer surface energy (dyne/cm) 31.8 31.8 31.8 31.8 31.8 31.8 31.8 31.8 31.8 31.8 31.8 31.8

From Table 3, it was confirmed that the double layer barrier rib composition of the present invention had excellent intermixing control effect and water repellency properties.

Evaluation 3: Patternness measurement

For the patterns according to Examples 5 and 10, the minimum remaining pattern size was measured, and the results are shown in Tables 4, 5 and 4 to 11 below. The evaluation results of Example 5 are shown in Table 4 and FIGS. 4 to 7 below, and the evaluation results of Example 10 are shown in Table 5 and FIGS. 8 to 11 below.

Exposure dose (mJ/cm ² ) 40 50 60 70 Pattern size (㎛) 15 18 20 23

Exposure dose (mJ/cm ² ) 20 30 40 50 Pattern size (㎛) 16 17 19 20

From Table 4, Table 5, and FIGS. 4 to 11, it was confirmed that the double-layer barrier ribs according to Examples 5 and 10 of the present invention had excellent patternability.

The present invention is not limited to the above embodiments, but can be manufactured in a variety of different forms, and those of ordinary skill in the art to which the present invention pertains can take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented as Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

Claims (12)

an upper layer composition comprising a fluorine-based compound, a photopolymerization monomer, a photopolymerization initiator, and a first solvent; and
Consists of a lower layer composition comprising a binder resin, a photopolymerization monomer, a light blocking agent, a photoinitiator, and a second solvent,
The first solvent comprises diisoamyl ether, 2-methyl-1-propanol, 3-methyl-2-pentanol, 4-methyl-2-pentanol, or a combination thereof;
the second solvent comprises propylene glycol monomethylether acetate, 3-methoxybutyl acetate, or a combination thereof;
A double-layer barrier rib composition in which the first solvent and the second solvent are not mixed with each other.
delete According to claim 1,
The first solvent includes a mixture of 'diisoamyl ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol', and the 'diisoamyl 'Ether' and '2-methyl-1-propanol, 3-methyl-2-pentanol or 4-methyl-2-pentanol' are included in a weight ratio of 10:90 to 40:60.
According to claim 1,
The fluorine-based compound is a fluorine-based binder resin or a fluorine-based oligomer.
5. The method of claim 4,
The fluorine-based binder resin has a weight average molecular weight of 3,000 g/mol to 10,000 g/mol, and the fluorine-based oligomer has a weight average molecular weight of 2,000 g/mol.
According to claim 1,
The binder resin is a cardo-based binder resin double-layer barrier rib composition.
According to claim 1,
The light-shielding agent is a double-layered barrier rib composition comprising a red pigment, a blue pigment and a violet pigment.
According to claim 1,
The photopolymerization initiator is a double-layer barrier rib composition comprising an acetophenone-based compound and an oxime-based compound.
A double-layered bulkhead composed of an upper layer and a lower layer made from the double-layered bulkhead composition according to any one of claims 1 to 8.
10. The method of claim 9,
A double layer barrier rib having a surface energy of the upper layer lower than that of the lower layer, and a surface energy of the upper layer being 20 dyne/cm or less.
The double layer bulkhead of claim 9 or 10, and
A display device comprising a quantum dot-containing layer positioned between the double-layer barrier ribs.
12. The method of claim 11,
The display device further comprises a light source and an overcoat layer.

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