KR102290501B1 - container for circle type sputtering target - Google Patents

Abstract

The present invention relates to a container for a cylindrical sputtering target, and more specifically, to a container for a cylindrical sputtering target, which is capable of protecting the cylindrical sputtering target against shock applied from the outside when the cylindrical sputtering target is being transported, stably transporting cylindrical sputtering targets even with different lengths, and vertically lifting a cylindrical sputtering target without damage to the same, such that the cylindrical sputtering target can be easily installed on a deposition chamber. To this end, the present invention relates to a container for a cylindrical sputtering target, which is used to form a thin metal film on a substrate by sputtering in a process of manufacturing organic light emitting diode (OLED), liquid crystal display (LCD) or plasma display panel (PDP) flat panel displays. The container for a cylindrical sputtering target is characterized by comprising: a main body including a bottom surface and a side wall extending vertically from a periphery of the bottom surface; a plurality of mounts provided inside the main body and configured to fix a cylindrical sputtering target; and a cover which opens and closes an opened upper portion of the main body.

Description

Container for circle type sputtering target}

The present invention relates to a container for a cylindrical sputtering target, and more particularly, when transporting a cylindrical sputtering target, it can be protected from external impact as well as can be stably transported even if the length of the cylindrical sputtering target is different. , It relates to a container for a cylindrical sputtering target that can be lifted in a vertical direction without damage and can be easily installed in a deposition chamber.

Flat panel displays such as OLED (Organic Light Emitting Diodes), LCD (Liquid Crystal Display) and PDP (Plasma Display Panel) are chemical vapor deposition (CVD) method on a glass substrate, physical vapor deposition (Physical Vapor Deposition, PVD) is manufactured through various processes such as thin film deposition and etching. The sputtering method, which is a representative method of physical vapor deposition, uses an inert gas such as argon (Ar) in a vacuum chamber. When a voltage is applied to the sputtering target, the electrons emitted from the target collide with argon gas atoms to ionize argon, and energy is released from the ionized argon, and it becomes a plasma state in which ions and electrons revolve. In this state, cations (Ar+) of argon are accelerated toward the target and collide with the surface of the target, and neutral target atoms are ejected to form a thin film on the glass substrate.

Recently, glass substrates used in LCD or OLED manufacturing are getting larger according to the demands of consumers who require large screens, and accordingly, sputtering targets used for vacuum deposition of glass substrates are also gradually increasing in size. These sputtering targets are largely divided into flat and cylindrical types according to their shapes.

Here, the cylindrical sputtering target is manufactured at the target manufacturing plant, put in a container or a wood box, and transferred to the LCD or OLED manufacturing plant. Since a high-purity vacuum-deposited film cannot be obtained, considerable care is required for handling. Furthermore, after being transported to an LCD or OLED manufacturing plant, handling should be easy at the manufacturing plant, and if small foreign substances are discharged from the packaging box, it may adversely affect the entire LCD substrate manufacturing process.

As a technology related to the conventional flat-type sputtering target container, there is Japanese Patent No. 03887253 "transport box for sputtering target", specifically, as shown in FIG. 1, the inner box 11 and the outer box (1) As a transport box consisting of 12), a cushioning material 13 for the inner box as a cushioning material between the target and the lid 3 for the outer box, and a cushioning material 21 for cushioning the impact of the inner box 11 are disposed below the inner box 11, there is.

This prior art is not a structure that can store and transport a cylindrical sputtering target as a structure suitable for transporting a flat sputtering target.

Furthermore, conventionally, when a cylindrical sputtering target manufacturer stores the target in a container and supplies it to the LCD manufacturer, the LCD manufacturer moves the target from the container to the cart and then moves it to the vacuum chamber. Such a cylindrical sputtering target weighs several hundred. kg, not only requires additional time and effort in the process of transferring from the container to the carrier, but also has a problem in that the carrier and the container are separately manufactured, increasing the production cost.

Japanese Patent No. 03887253

The present invention has been devised in order to solve the above problems, and an object of the present invention is first, it consists of a main body and a mount provided inside the main body to fix a cylindrical sputtering target, so that it is stable without damage to the cylindrical sputtering target when transported to a long distance. In addition to enabling transport, the mounting base is provided on the movable cart movable along the rail provided inside the body, thereby adjusting the position according to the length of the cylindrical sputtering target to fix the cylindrical sputtering target of various sizes. It is to provide a container for a cylindrical sputtering target that can do it.

Second, the present invention can be easily moved to the deposition chamber after unloading by providing a caster at the lower part of the main body in which the cylindrical sputtering target is accommodated.

Third, the present invention is provided so that the last seating stand to which the end of the cylindrical sputtering target is fixed is rotatable at a predetermined angle on the upper part of the moving cart, and by providing a separation preventing member at the rear, one side of the cylindrical sputtering target can be lifted through a crane In this case, it is to provide a container for a cylindrical sputtering target so that the end of the cylindrical sputtering target is supported without slipping so that it can be lifted in a state where it is easy to be fixed in the deposition chamber.

The present invention for solving these problems;

In the container for a cylindrical sputtering target used to form a metal thin film by sputtering on a substrate in the organic light emitting diode (OLED), liquid crystal display (LCD) or plasma display panel (PDP) flat panel display manufacturing process, the bottom surface And a main body having a side wall extending vertically from the outer edge of the bottom surface, a plurality of mounting rods provided inside the main body to fix a cylindrical sputtering target, and a cover for opening and closing the open upper part of the main body It is made, and at least one pair of rails are installed on the bottom surface along the longitudinal direction, the rail is provided with a moving cart, and the seating table is installed on the moving cart.

At this time, the seating table consists of a 'U'-shaped seating body in which a seating part on which the cylindrical sputtering target is mounted, and a seating lid covering the open upper part of the seating body, and the seating part is provided with an impact generated during transportation. It is characterized in that a shock-absorbing member for alleviating is provided.

In addition, rotating brackets are installed on both sides of the moving bogie located at one end of the rail, and the mounting base is rotatably installed on a rotating shaft provided on the upper portion of the rotating bracket, and the rotating bracket passes through the lower portion of the rotating shaft It is characterized in that it is provided with an anti-rotation pin that is detachably attached to the mounting base.

Here, a separation preventing member is installed on one side of the seating table to be located inside the rotating bracket, an opening is formed on one side of the separation preventing member to communicate with the seating portion, and a cylindrical sputtering target is formed on the other side. A separation sill on which one end of the tube is supported is formed, so that when the other end of the cylindrical sputtering target is lifted, even if the seating table rotates with respect to the rotation axis, the departure preventing sill supports one end of the cylindrical sputtering target so that it does not slip. do it with

On the other hand, the lower part of the main body is provided with casters at regular intervals, a lower loading fixture is installed between the casters, and an upper loading fixture is installed on the side wall or the upper part of the cover to correspond to the lower loading fixture. , The lower loading fixture is formed to be lower than the height of the caster, and the stacked height of the upper loading fixture and the lower loading fixture is formed to be higher than the height of the caster.

According to the present invention of the above configuration, it is made of a main body and a mount provided inside the main body to fix a cylindrical sputtering target, so that it can be stably transported without damage to the cylindrical sputtering target when transported to a long distance, and the mount is By being provided on the upper portion of the moving cart movable along the rail provided in the body, there is an effect that can fix the cylindrical sputtering target of various sizes by adjusting the position according to the length of the cylindrical sputtering target.

In addition, the present invention has the effect of being able to easily move to the deposition chamber after unloading by providing a caster at the lower part of the main body in which the cylindrical sputtering target is accommodated.

In addition, the present invention is provided so that the last seating stand to which the end of the cylindrical sputtering target is fixed is rotatable at a certain angle on the upper part of the moving cart, and by providing a departure preventing member at the rear, one side of the cylindrical sputtering target can be lifted through a crane In this case, there is an effect of allowing the end of the cylindrical sputtering target to be supported without slipping so that it can be lifted in a state that is easy to fix in the deposition chamber.

1 is an exploded perspective view of a conventional container for a sputtering target.
2 is a side view of a container for a cylindrical sputtering target according to the present invention.
Figure 3 is a plan view of the open state of the cover of the container for a cylindrical sputtering target according to the present invention.
4 is a longitudinal cross-sectional view of a container for a cylindrical sputtering target according to the present invention.
5 is a front view of the mounting base of the container for a cylindrical sputtering target according to the present invention.
Figure 6 is a front view of the mounting base located at the end of the rail of the container for a cylindrical sputtering target according to the present invention.
7 is a side view of the mounting base positioned at the end of the rail.
8 is a perspective view of the separation preventing member of the container for a cylindrical sputtering target according to the present invention.
9 is a state diagram showing a state in which one end is lifted to take out a cylindrical sputtering target from a container for a cylindrical sputtering target according to the present invention.

Hereinafter, preferred embodiments of the present invention will be described in more detail with reference to the accompanying drawings. The same reference numerals are used for the same components in the drawings, and repeated descriptions of the same components are omitted. And, it should be understood that the present invention may be implemented in many different forms and is not limited to the described embodiments.

Figure 2 is a side view of a container for a cylindrical sputtering target according to the present invention, Figure 3 is a plan view of a container for a cylindrical sputtering target according to the present invention in an open state, Figure 4 is a container for a cylindrical sputtering target according to the present invention is a longitudinal cross-sectional view of, Figure 5 is a front view of the mounting base of the container for a cylindrical sputtering target according to the present invention, Figure 6 is a front view of the mounting base located at the end of the rail of the container for a cylindrical sputtering target according to the present invention, Figure 7 is a side view of the mounting base located at the end of the rail, Figure 8 is a perspective view of the separation preventing member of the container for a cylindrical sputtering target according to the present invention, Figure 9 is a cylindrical sputtering target from the container for a cylindrical sputtering target according to the present invention. It is a state diagram showing a state in which one end is lifted to do so.

The present invention relates to a container for a cylindrical sputtering target used to form a metal thin film by sputtering on a substrate in a manufacturing process of OLED (Organic Light Emitting Diodes), LCD (Liquid Crystal Display) or PDP (Plasma DisplayPanel) flat panel display. As shown in FIGS. 2 to 8 , the configuration includes a main body 100 having a flat bottom surface 110 and a side wall 120 extending vertically from the periphery of the bottom surface 110 and the main body. It is provided on the inside of 100 and comprises a plurality of mounting plates 200 for fixing a cylindrical sputtering target and a cover 150 for opening and closing the opened upper part of the main body 100 .

Here, the support jaws 122 are formed in the upper inner side of the sidewalls 120 formed on both sides of the body 100 in the longitudinal direction as shown in FIG. 4 so that the cover 150 is stably seated.

In this case, the main body 100 may form sidewalls 120 on all four sides of the edge, or both ends in the longitudinal direction of the main body 100 may be opened and opened and closed by providing a partition (not shown).

Therefore, by fixing the cylindrical sputtering target to the plurality of seating tables 200 provided in the interior of the main body 100, the impact applied from the outside during transport is prevented from being transmitted to the cylindrical sputtering target, so that it can be transported without damage. can

In addition, the rail 180 is formed along the longitudinal direction on the bottom surface 110 constituting the body 100, and only one pair of the rail 180 may be formed, or a plurality of pairs may be formed.

Here, the pair of rails 180 is provided with a moving bogie 230 , and rollers 232 are provided on both lower sides of the moving bogie 230 to be inserted into the rail 180 to move along the rail. .

In addition, the mounting table 200 is installed on the upper portion of the moving cart 230 so that the position of the mounting table 200 can be appropriately adjusted according to the length of the cylindrical sputtering target accommodated in the body 100, so that various Long cylindrical sputtering targets can be accommodated using one container.

At this time, although not shown in the drawing, a wire (not shown) is provided on the side of the moving bogie 230, and a ring ( (not shown) to fix the position of each moving bogie 230 , it is possible to prevent the moving bogie 230 from arbitrarily moving along the rail 180 even during transportation.

In addition, the seating table 200 includes a seating body 210 in which a seating portion 212 on which a cylindrical sputtering target is mounted, and a seating lid 220 covering the open upper portion of the seating body 210 .

Here, the seating body 210 and the seating lid 220 are coupled by a hinge coupling on one side and a locking device on the other side, so that the cylindrical sputtering target accommodated therein can be firmly fixed and easily withdrawn. there is.

At this time, the seating portion 212 formed on the seating body 210 is formed in a 'U' shape, and on the inner surface of the seating portion 212 and the lower surface of the seating lid 220, a shock-absorbing member made of a sponge or the like. 214 is installed to prevent scratches, etc. from occurring on the surface of the cylindrical sputtering target fixed to the mounting base 200, as well as to cushion the impact generated during transportation can be transported without damage.

That is, the cylindrical sputtering target is used in the vacuum deposition process. The cylindrical sputtering target 300 is a target material such as Mo, Al, Cu, Ag alloy, Ti, ITO, IZO, MoTi, etc. on the surface of the backing tube 310 . As being provided with 320 , when they collide with each other, damage may occur to the target material or the cooling flow path formed inside the backing tube 310 , and in the worst case, the cooling flow path formed inside the backing tube 310 . If damage occurs, the cylindrical sputtering target cannot be used in the deposition process.

Therefore, it is necessary to avoid applying shock as much as possible during transportation, so even if not only vertical vibrations generated during transportation using the cylindrical sputtering target container of the present invention but also lateral tilting occurs, an external impact is applied to a plurality of sputtering targets or They can be prevented from collided with each other, so they can be safely transported without damage.

Of course, since the diameter of the cylindrical sputtering target can also be formed in various ways, the size of the seating part 212 forming the seating table 200 is also formed in various sizes, and is installed on the upper part of the moving cart 230 as needed. .

On the other hand, the seat 200 may be fixedly installed on the upper portion of the moving bogie 230 as shown in FIG. 5 , or may be rotatably installed on the upper portion of the moving bogie 230 as shown in FIG. may be

Here, the pair of rails 180 is provided with a plurality of mounting brackets 200 along the longitudinal direction, and only one mounting table 200 among both ends is rotatably installed, and the rest of the mounting tables 200 are movable. It is installed in a fixed state on the upper portion of the bogie 230 .

At this time, a plate-shaped rotation bracket 240 is installed on both sides of the moving cart 230 provided at one end of the rail 180 to protrude upward, and the upper portion of the rotation bracket 240 is led to the inside. A rotating shaft 242 is installed through, and the mounting base 200 is rotatably installed on the rotating shaft 242 to be located inside the rotating bracket 240 .

And, the upper and lower center of the seat 200, that is, both sides of the seat body 210, the rotating shaft 242 is inserted so that the seat 200 is rotatably installed based on the rotating shaft 242, A rotation preventing pin 248 is detachably provided on the rotation bracket 240 to be located below the rotation shaft 242 .

Here, fixing holes 246 passing through left and right are formed in the rotation bracket 240 to be positioned under the rotation shaft 242 , and the fixing holes 246 are formed on both sides of the seating body 210 forming the seating table 200 . A fixing groove 218 is formed to correspond to the ball 246 , and the anti-rotation pin 248 is inserted into the fixing groove 218 through the fixing hole 246 .

Therefore, when the cylindrical sputtering target is transported in a state accommodated inside the main body 100, the rotation prevention pin 248 is inserted to transport the mounting base 200 so that it does not rotate, and the cylindrical sputtering target is transported in the main body. In the case of withdrawing at 100, after removing the rotation preventing pin 248, the mounting base 200 is rotatable so that it can be easily withdrawn.

On the other hand, a separation preventing member 250 as shown in FIG. 8 is installed on one side of the mounting base 200 located at the end of the rail 180, and the separation preventing member 250 is a rotating bracket 240 ) is installed to be located inside the pedestal 240 and rotates with respect to the rotation shaft 242 .

Here, the separation preventing member 250 is formed in a rectangular parallelepiped box shape, the upper part is opened, and an opening 252 is formed on one side to communicate with the seating part 212 formed in the seating body 210, and the other On the side of the side of the backing tube 310 constituting the cylindrical sputtering target 300, one end of the backing tube 310 is supported is formed, and on the side of the opening 252, a fastening part 254 is formed and a bolt or rivet is formed. Alternatively, the separation preventing member 250 is fixedly installed on one side of the seating body 210 by using a method such as welding.

At this time, a bracket 312 for fixed installation in the deposition chamber may be installed at the end of the cylindrical sputtering target 300, precisely at the end of the backing tube 310, and a mounting groove ( 258) is formed, the bracket 312 formed with a smaller diameter than the backing tube 310 is seated, and the flange 313 formed at the end of the bracket 312 is supported by the departure preventing protrusion 256.

And, when withdrawing the cylindrical sputtering target from the container for a cylindrical sputtering target according to the present invention, the seating lid 220 of all seating tables 200 except for the rotatable seating table 200 provided at one end of the rail 180. After separation, a crane is connected to the other end of the cylindrical sputtering target and lifted upwards.

Here, the mounting base 200 to which one end of the cylindrical sputtering target is fixed is rotated based on the rotation shaft 242, and accordingly, the load of the cylindrical sputtering target is concentrated on the end and slid. ), the end of the cylindrical sputtering target is supported by the departure preventing protrusion 256 that forms to prevent slipping.

That is, when installing the cylindrical sputtering target 300 in the deposition chamber, since most are installed in an upright state, a crane is placed on one end of the cylindrical sputtering target 300 to lift it upright even when withdrawing from the main body 100 . Connect it and lift it to the top.

At this time, as described above, the mounting base 200 provided at the end of the rail 180 is rotatably installed by the rotation bracket 240 installed on the moving cart 230, so that the cylindrical sputtering target 300 is rotatably installed by a crane. When one end is lifted, as shown in FIG. 9 , the other end is rotated together with the seating table 200 in a state supported by the departure preventing sill 256 .

Therefore, even if only one end of the cylindrical sputtering target 300 is lifted upward using a crane, it is possible to prevent the other end from sliding and colliding with the bottom surface 110 of the body 100 and being damaged, and the cylindrical sputtering target As one end of the 300 is moved upward, the moving bogie 230 moves in the direction of one end along the rail to lift the cylindrical sputtering target 300 in a vertically standing state, so that it can be easily installed in the deposition chamber. can

On the other hand, on both sides of the seating body 210 constituting the seating table 200, guide grooves 216 are formed in an arc shape to be positioned between the rotation shaft 242 and the fixing groove 218, and the rotation bracket ( A guide pin 244 is formed on the inner surface of the 240 to be drawn inward to correspond to the guide groove 216 .

At this time, the guide groove 216 is formed only in one direction from the center of the thickness direction of the seating body 210, and when the seating table 200 rotates based on the rotation shaft 242, the cylindrical sputtering target 300 ) can be rotated only in the lifting direction and cannot be rotated to the other side.

Therefore, even if the rotation prevention pin 248 is separated in order to take out the cylindrical sputtering target 300, it is possible to prevent the mounting table 200 from arbitrarily rotating.

And, in the lower portion of the main body 100, casters 130 at regular intervals can be transported in a state in which the cylindrical sputtering target 300 is accommodated inside the container, and a stop bar 170 is located between the casters 130. This is provided so that when receiving or withdrawing the cylindrical sputtering target 300 into the container, the main body 100 is fixed so as not to move.

In addition, a lower loading fixture 140 is installed between the casters 130 to be positioned on the side of the stop bar 170 , and the lower loading fixture 140 is positioned on the upper portion of the side wall 120 . To correspond to the upper loading fixture 160 is installed.

Here, the lower loading fixture 140 is formed lower than the height of the caster 130 , and the stacked height of the upper loading fixture 160 and the lower loading fixture 140 is higher than the height of the caster 130 . do.

Therefore, when stacking a plurality of cylindrical sputtering target containers, it can be stacked regardless of the caster 130, so that a plurality of containers can be loaded and transported in a vehicle.

On the other hand, handles 124 are formed on both ends in the longitudinal direction of the main body 100 to transport the container of the present invention using the casters 130 , and the upper loading fixture 160 is not only the side wall 120 . Instead, it may be formed on the upper surface of the cover 150 .

Although preferred embodiments of the present invention have been described above, the scope of the present invention is not limited thereto, and the scope of the present invention extends to those substantially equivalent to the embodiments of the present invention. Various modifications are possible by those of ordinary skill in the art to which the invention pertains without departing from the scope of the invention.

The present invention relates to a container for a cylindrical sputtering target, and more particularly, when transporting a cylindrical sputtering target, it can be protected from external impact as well as can be stably transported even if the length of the cylindrical sputtering target is different. , It relates to a container for a cylindrical sputtering target that can be lifted in a vertical direction without damage and can be easily installed in a deposition chamber.

100: body 110: bottom surface
120: side wall 130: caster
140: lower loading fixture 150: cover
160: upper loading fixture 170: stop bar
180: rail 200: mounting base
210: seating body 220: seating lid
230: moving bogie 240: rotating bracket
250: separation preventing member 300: cylindrical sputtering target
310: backing tube 320: target material

Claims (5)

In the container for a cylindrical sputtering target, which is used to form a metal thin film on a substrate by sputtering in the OLED (Organic Light Emitting Diodes), LCD (Liquid Crystal Display) or PDP (Plasma DisplayPanel) flat panel display manufacturing process,
A main body having a bottom surface and a side wall extending vertically from the periphery of the bottom surface;
A plurality of seating stands provided on the inside of the main body for fixing the cylindrical sputtering target,
and a cover for opening and closing the opened upper part of the main body,
One or more pairs of rails are installed on the bottom surface along the longitudinal direction,
The rail is provided with a moving cart,
The seating table is installed on the moving cart,
The seating table consists of a 'U'-shaped seating body in which a seating part on which a cylindrical sputtering target is mounted, and a seating lid covering the open upper part of the seating body,
The seating portion is provided with a shock-absorbing member for alleviating the shock generated during transportation,
Rotating brackets are installed on both sides of the moving bogie located at one end of the rail,
The mounting base is rotatably installed on a rotating shaft provided on the upper portion of the rotating bracket,
Cylindrical sputtering target container, characterized in that the lower portion of the rotation shaft is provided with a rotation-preventing pin that penetrates the rotation bracket and is detachable from the mounting table.
delete delete According to claim 1,
A separation preventing member is installed on one side of the mounting table so as to be located inside the rotating bracket,
An opening is formed on one side of the separation preventing member so as to communicate with the seating portion, and on the other side is formed a separation preventing sill on which one end of the backing tube constituting the cylindrical sputtering target is supported,
When the other end of the cylindrical sputtering target is lifted, even if the seat is rotated with respect to the rotation axis, the departure preventing sill supports one end of the cylindrical sputtering target so that one end does not slip. A container for a cylindrical sputtering target.
According to claim 1,
The lower part of the main body is provided with casters at regular intervals,
A lower loading fixture is installed between the casters,
An upper loading fixture is installed on the side wall or the upper portion of the cover to correspond to the lower loading fixture,
The lower loading fixture is formed lower than the height of the caster, the stacked height of the upper loading fixture and the lower loading fixture is a cylindrical sputtering target container, characterized in that formed higher than the height of the caster.

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