KR102237572B9 - Euv 리소그래피용 마스크 및 그 제조 방법 - Google Patents

Euv 리소그래피용 마스크 및 그 제조 방법

Info

Publication number
KR102237572B9
KR102237572B9 KR20190050819A KR20190050819A KR102237572B9 KR 102237572 B9 KR102237572 B9 KR 102237572B9 KR 20190050819 A KR20190050819 A KR 20190050819A KR 20190050819 A KR20190050819 A KR 20190050819A KR 102237572 B9 KR102237572 B9 KR 102237572B9
Authority
KR
South Korea
Prior art keywords
euv
same
fabricating method
lithography mask
euv lithography
Prior art date
Application number
KR20190050819A
Other languages
English (en)
Other versions
KR102237572B1 (ko
KR20190126725A (ko
Inventor
안진호
김정식
정동민
Original Assignee
한양대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한양대학교 산학협력단 filed Critical 한양대학교 산학협력단
Publication of KR20190126725A publication Critical patent/KR20190126725A/ko
Application granted granted Critical
Publication of KR102237572B1 publication Critical patent/KR102237572B1/ko
Publication of KR102237572B9 publication Critical patent/KR102237572B9/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020190050819A 2018-05-02 2019-04-30 Euv 리소그래피용 마스크 및 그 제조 방법 KR102237572B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20180050618 2018-05-02
KR1020180050618 2018-05-02

Publications (3)

Publication Number Publication Date
KR20190126725A KR20190126725A (ko) 2019-11-12
KR102237572B1 KR102237572B1 (ko) 2021-04-07
KR102237572B9 true KR102237572B9 (ko) 2021-04-07

Family

ID=68577589

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190050819A KR102237572B1 (ko) 2018-05-02 2019-04-30 Euv 리소그래피용 마스크 및 그 제조 방법

Country Status (1)

Country Link
KR (1) KR102237572B1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI730139B (zh) 2016-07-27 2021-06-11 美商應用材料股份有限公司 具多層吸收劑的極紫外遮罩坯料及製造方法
TW202131087A (zh) 2020-01-27 2021-08-16 美商應用材料股份有限公司 極紫外光遮罩吸收劑材料
TW202141165A (zh) * 2020-03-27 2021-11-01 美商應用材料股份有限公司 極紫外光遮罩吸收材料
TWI836207B (zh) 2020-04-17 2024-03-21 美商應用材料股份有限公司 極紫外光遮罩吸收材料
TW202202641A (zh) 2020-07-13 2022-01-16 美商應用材料股份有限公司 極紫外線遮罩吸收劑材料
US11609490B2 (en) 2020-10-06 2023-03-21 Applied Materials, Inc. Extreme ultraviolet mask absorber materials
US11592738B2 (en) 2021-01-28 2023-02-28 Applied Materials, Inc. Extreme ultraviolet mask absorber materials

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003077151A (ja) * 2001-09-03 2003-03-14 Sony Corp 光ピックアップ及び光ディスク装置
US9285673B2 (en) * 2014-07-10 2016-03-15 Taiwan Semiconductor Manufacturing Company, Ltd. Assist feature for a photolithographic process
JP6855190B2 (ja) * 2016-08-26 2021-04-07 Hoya株式会社 反射型マスク、並びに反射型マスクブランク及び半導体装置の製造方法

Also Published As

Publication number Publication date
KR102237572B1 (ko) 2021-04-07
KR20190126725A (ko) 2019-11-12

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Publication of correction
G170 Publication of correction