KR102235607B9 - Device treating substrate - Google Patents

Device treating substrate

Info

Publication number
KR102235607B9
KR102235607B9 KR20140025223A KR20140025223A KR102235607B9 KR 102235607 B9 KR102235607 B9 KR 102235607B9 KR 20140025223 A KR20140025223 A KR 20140025223A KR 20140025223 A KR20140025223 A KR 20140025223A KR 102235607 B9 KR102235607 B9 KR 102235607B9
Authority
KR
South Korea
Prior art keywords
treating substrate
device treating
substrate
treating
Prior art date
Application number
KR20140025223A
Other languages
Korean (ko)
Other versions
KR102235607B1 (en
KR20150103603A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR1020140025223A priority Critical patent/KR102235607B1/en
Publication of KR20150103603A publication Critical patent/KR20150103603A/en
Application granted granted Critical
Publication of KR102235607B1 publication Critical patent/KR102235607B1/en
Publication of KR102235607B9 publication Critical patent/KR102235607B9/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020140025223A 2014-03-03 2014-03-03 Device treating substrate KR102235607B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020140025223A KR102235607B1 (en) 2014-03-03 2014-03-03 Device treating substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140025223A KR102235607B1 (en) 2014-03-03 2014-03-03 Device treating substrate

Publications (3)

Publication Number Publication Date
KR20150103603A KR20150103603A (en) 2015-09-11
KR102235607B1 KR102235607B1 (en) 2021-04-05
KR102235607B9 true KR102235607B9 (en) 2021-09-17

Family

ID=54243770

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140025223A KR102235607B1 (en) 2014-03-03 2014-03-03 Device treating substrate

Country Status (1)

Country Link
KR (1) KR102235607B1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100864868B1 (en) * 2006-10-25 2008-10-23 주식회사 아이피에스 Apparatus for depositing thin film on a wafer
KR101334643B1 (en) * 2009-07-02 2013-12-02 주식회사 원익아이피에스 Reactor for depositing thin film on wafer
KR101374300B1 (en) * 2010-12-30 2014-03-14 세메스 주식회사 Exhaust member, apparatus and method for processing substrate
KR101829665B1 (en) * 2011-12-21 2018-02-19 주식회사 원익아이피에스 Apparatus for processing substrate
KR20130086806A (en) * 2012-01-26 2013-08-05 삼성전자주식회사 Thin film deposition apparatus
KR101804125B1 (en) * 2012-04-20 2017-12-05 주식회사 원익아이피에스 Substrate processing apparatus
KR20140100764A (en) * 2013-02-07 2014-08-18 주식회사 원익아이피에스 Substrate process apparatus

Also Published As

Publication number Publication date
KR102235607B1 (en) 2021-04-05
KR20150103603A (en) 2015-09-11

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Legal Events

Date Code Title Description
AMND Amendment
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant
G170 Publication of correction