KR102196514B1 - System and method capable of maintaining steadily vaporization and preliminary purge - Google Patents

Abstract

According to an embodiment of the present invention, the canister (B100), the first line (L11) providing a path through which fluid can move to the inlet of the canister, and the material flowing out from the outlet of the canister (B100) can move to the treatment facility. A second line (L12) providing a path that is located, as a branch line (L13) branching from the first line (L11) and joining the second line (L12), at least the fluid that moves through the first line (L11). A control valve that is located in the branch line L13 and the branch line L13 providing a path through which a portion of the second line L12 can move, and controls the amount of fluid moved through the branch line L13 ( CV100), and a component located in the first line (L11), wherein the component is any one of a valve that regulates the flow of the fluid and a fluid load that resists the flow of the fluid, a carburetor system is disclosed. do.

Description

A vaporization system and vaporization method capable of preliminary purge while maintaining a constant vaporization amount {SYSTEM AND METHOD CAPABLE OF MAINTAINING STEADILY VAPORIZATION AND PRELIMINARY PURGE}

The present invention relates to a vaporization system and a vaporization method, and to a vaporization system and vaporization method capable of preliminary purge while maintaining a constant vaporization amount.

Various raw materials (sources) used in processing facilities such as chemical vapor deposition equipment (CVD) or atomic layer deposition equipment (ALD), which coat a thin film essential in the manufacturing process of electronic materials such as semiconductors, displays, and light emitting diodes, are gases, liquids, or It is supplied in solid form.

In the case of raw materials in the form of gas, it is used as a method that can supply a certain amount by controlling the pressure, but in the case of liquids or solids, since their own pressure is very low, most of them are put in ampoules called canisters and A method of evaporating through vaporization through bubbling or heating and then supplying it to the reaction chamber is used.

Various techniques are known for a method of using a raw material in a liquid form into a canister and then vaporizing it in a certain amount, and various techniques are also known to vaporize the raw material in a solid form. For example, as one of the prior art for vaporizing a solid raw material, Korean Patent Laid-Open Publication No. 10-2010-0137016 (2010. 12. 29) ("Carburetor, vaporizer method, vaporizer method, container, vaporizer unit, and There are techniques disclosed in "Method of generating steam for semiconductor process chamber") or US Patent Registration No. 6,296,025 (10. 2, 2001) ("Chemical Delivery system having purge system utilizing multiple purge techniques").

Typically, the canister is provided with a channel filled with a source, and the carrier gas moves over the source to promote vaporization of the source. The source filled in the flow path is vaporized at a predetermined pressure and temperature, and vaporization of the source is promoted by contacting the carrier gas.

On the other hand, the amount of vaporization provided to the treatment facility should be constant, but it is not easy to keep the amount of vaporization constant due to various factors. For example, the amount of vaporization may vary according to the level of the source stored in the canister, and the amount of vaporization may vary because the temperature is slightly lowered by the vaporization heat of the source according to the number of processes.

According to an embodiment of the present invention, a vaporization system and a vaporization method capable of preliminary purging while maintaining a constant vaporization amount are provided.

According to an embodiment of the present invention, a vaporization system and a vaporization method capable of maintaining a constant vaporization amount by controlling an amount of a carrier gas injected into a canister in a vaporization mode are provided.

According to an embodiment of the present invention, a vaporization system and a vaporization method capable of performing a purge operation while maintaining a constant vaporization amount in a vaporization mode are provided.

According to an embodiment of the present invention

A canister having a cylindrical shape capable of storing a source and having an inlet through which a fluid is introduced from the outside and an outlet through which the vaporized gas can be flowed out; A first line providing a path through which fluid can move to the inlet of the canister; A second line providing a path through which the material discharged from the outlet of the canister can move to the treatment facility; A branch line branching from the first line and joining the second line, the branch line providing a path through which at least a portion of the fluid moving through the first line can move to the second line; A control valve located on the branch line and capable of adjusting an amount of fluid that is moved through the branch line; And a component positioned on the first line, wherein the component is positioned between the inlet from a branch point at which the branch line is branched. Including, wherein the component is any one of a valve that controls the flow of the fluid and a fluid load that resists the flow of the fluid, a vaporizer system may be provided.

According to another embodiment of the present invention

Vaporizing the source by performing a vaporization mode by the vaporizer system according to claim 8; Measuring an amount of fluid flowing in the second line by a mass flow meter in the vaporization mode; And controlling the control valve such that the amount of vaporized vaporized as a result of performing the vaporizing step is constant based on the measured value and the set value measured by the mass flow meter. Including, by performing the step of controlling the control valve, a part of the fluid flowing on the first line flows to the confluence point through the branch line, the vaporization method may be provided.

According to one or more embodiments of the present invention, by flowing a part of the carrier gas to the branch line in the vaporization mode, the amount of vaporization can be controlled by controlling the amount of the carrier gas injected into the canister, and at the same time, the purge operation is performed in the vaporization mode. There is an effect that can be performed.

1 to 3 are views for explaining a first embodiment of the present invention.
4 to 6 are views for explaining a second embodiment of the present invention.
7 is a diagram for describing a setting value according to an embodiment of the present invention.
8 is a diagram for explaining a vaporization method according to an embodiment of the present invention.

The above objects, other objects, features, and advantages of the present invention will be easily understood through the following preferred embodiments related to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosed content may be thorough and complete, and the spirit of the present invention may be sufficiently conveyed to those skilled in the art.

In the drawings of the present specification, the thickness of the components is exaggerated or reduced for effective description of technical content.

In various embodiments of the present specification, terms such as first and second are used to describe various elements, but these elements should not be limited by these terms. These terms are only used to distinguish one component from another component. The embodiments described and illustrated herein also include complementary embodiments thereof.

The terms used in the present specification are for describing exemplary embodiments and are not intended to limit the present invention. In this specification, the singular form also includes the plural form unless specifically stated in the phrase. As used in the specification, "comprises" and/or "comprising" does not exclude the presence or addition of one or more other elements.

Definition of Terms

In the specification of the present application, the'flow path' means a space in which gas can be moved.

In the present specification, the term'regulating flow' is a concept including blocking flow, allowing flow, or controlling the amount of flow. For example, a component capable of controlling the flow of a fluid is a component that blocks the flow of the fluid, allows the flow of the fluid, or controls the amount of the flowing fluid, and may include a valve or a fluid load.

In the present specification,'valve' is a component capable of controlling the flow of fluid, and means a component capable of blocking the flow of fluid, allowing the flow of fluid, or controlling the amount of flowing fluid, for example, on- It may be devices such as off valves and control valves.

In the present specification, the'on-off valve' means a valve that blocks the flow of fluid or allows the flow of the fluid, and the'control valve' blocks the flow of the fluid, allows the flow of the fluid, or controls the amount of fluid flowing. It means a valve that can be adjusted.

In the present specification,'upstream' and'downstream' are terms for indicating positions in a line ('flow path') through which a fluid flows, and that component A is positioned upstream of component B means that the fluid is component A. It means that at least some of the fluids that reach component A and reach component A reach component B first. Further, that the component A is located downstream of the component B means that the fluid reaches the component B first and at least some of the fluids that reach the component B reach the component A.

According to an embodiment of the present invention, the amount of vaporization is kept constant by controlling the amount of carrier gas injected into the canister in the vaporization mode. Specifically, the amount of the carrier gas injected into the canister is controlled by allowing a part of the carrier gas to flow through the branch line. In this way, a preliminary purge operation can be performed by allowing a part of the carrier gas to flow to the branch line in the vaporization mode.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the drawings.

1 to 3 are views for explaining a first embodiment of the present invention.

The vaporization system according to the first embodiment of the present invention is an apparatus that vaporizes a source and provides it to a processing facility.

Here, the processing equipment may be, for example, a chemical vapor deposition (CVD) device or a process chamber of a semiconductor processing equipment such as an ion implanter.

Referring to FIG. 1, the vaporization system according to the first embodiment of the present invention has a cylindrical shape capable of storing a source, and includes an inlet through which a fluid can be introduced and an outlet through which the vaporized gas can be discharged to the outside. Excitation canister (B100), lines providing a path through which fluid can move, components for controlling the flow of fluids flowing through the lines, mass flow controller (MFC'), mass flow meter (MASS FLOW METER: hereinafter'MFM'), and may include a control module.

Here, the source may be a solid source or a liquid source, for example boron (B: boron), phosphorous (P: phosphorous), copper (Cu: copper), gallium (Ga: gallium), arsenic (As: arsenic) , Ruthenium (Ru: ruthenium), indium (In: indium), antimony (Sb: antimony), lanthanum (La: lanthanum), tantalum (Ta: tantalum), iridium (Ir: iridium), decaborane (B10H14: decaborane) , Hafnium tetrachloride (HfCl4), zirconium tetrachloride (ZrCl4), indium trichloride (InCl3), metal organic β-diketonate complex, cyclopentadienyl cyclo Heptatriethyl titanium (CpTiChT: cyclopentadienyl cycloheptatrienyl titanium), aluminum trichloride (AlCl3: aluminum trichloride), titanium iodide (TixIy:titanium iodide), cyclooctatetraene Cyclopentadienyl titanium ((Cot)(Cp)Ti: cyclooctatetraene cyclopentadienyltitanium), bis(cyclopentadienyl)titanium diazide [bis(cyclopentadienyl)titanium diazide], tungsten carbonyl (Wx(CO)y: tungsten carbonyl) (where x and y are natural numbers), bis(cyclopentadiene Neil) ruthenium (II) [Ru(Cp)2: bis(cyclopentadienyl)ruthenium (II)], ruthenium trichloride (RuCl3: ruthenium trichloride), and/or tungsten chloride (WxCly) (where x and y are natural numbers). It may be a containing material. Those skilled in the art should know that the above-described sources are exemplary and the present invention is not limited to such sources.

The vaporization system according to the first embodiment may further include a heater (not shown), and the heater may apply heat to the canister B100 to vaporize a source stored in the canister B100.

The inlet includes an inlet for injecting fluid. The injection hole may be formed on the canister B100.

The inlet may further include a valve V105. The valve V015 may be, for example, an on-off valve coupled to an injection port to block or allow a flow of a fluid injected into the injection port.

The outlet includes an outlet for discharging the material. Here, the outlet may be formed on the upper portion of the canister B100.

The outlet may further include a valve V106. The valve V106 may be, for example, an on-off valve coupled to the outlet to block or allow the flow of fluid discharged to the outlet.

According to the first embodiment, lines providing a path through which a fluid can move may include a first line L11, a second line L12, and a branch line L13.

The first line L11 may provide a path through which fluid can move to the inlet of the canister B100.

In the first embodiment, the mass flow controller MFC and the valve V101 may be positioned in the first line L11. Here, the mass flow controller MFC is located upstream of the valve V101. The valve V101 is a component positioned between the inlet from the branch point P11 where the branch line L13 is branched. Meanwhile, the valve V101 may be implemented as an on-off valve or a control valve.

As an alternative, a mass flow controller MFC and a fluid load may be positioned in the first line L11. Here, the mass flow controller (MFC) is located upstream of the fluid load. The fluid load is a component located between the inlet from the branch point P11 where the branch line L13 is branched. The fluid load may be a component that impedes the flow of fluid, for example an orifice. As another example of the fluid load, the flow path may be a valve narrower than the first line.

Alternatively, a mass flow controller MFC, a valve V101, and a fluid load may be located in the first line L11. The fluid load and the valve V101 are components positioned between the inlet from the branch point P11 where the branch line L13 is branched. Here, the mass flow controller MFC is located upstream of the fluid load and the valve V101, and the fluid load is located upstream of the valve V101.

The mass flow rate controller MFC is located in the first line L11 before the branch point P11 where the branch line L13 is branched, and may constantly adjust the amount of fluid flowing in the first line L11.

The second line L12 may provide a path through which fluid can move from the outlet of the canister B100 to the treatment facility.

A mass flow meter MFM and a valve V104 are positioned in the second line L12. The valve V104 may be an on-off valve or a control valve.

According to the first embodiment, the mass flow meter MFM is located downstream of the valve V104. For example, the mass flow meter (MFM) may be located downstream of the junction P12 where the branch line (L13) and the second line (L12) merge, and measures the amount of fluid flowing in the second line (L12). can do. In the second line L12 downstream from the confluence point P12, the fluid flowing in the branch line L13 and the source vaporized in the canister B100 are combined, so the fluid measured by the mass flow meter MFM is the branch line ( The fluid flowing in L13) and the vaporized source are combined.

As an alternative, a mass flow meter MFM may be located between the confluence point P12 and the outlet. Alternatively, the mass flow meter MFM may be located between the valve V104 and the outlet. According to these alternatives, the mass flow meter MFM may measure the amount of gas discharged from the canister B100.

The branch line L13 is a line branching from the first line and joining the second line, and provides a path through which at least a portion of the fluid moving through the first line can move to the second line.

A control valve CV100 capable of controlling the fluid flowing through the branch line L13 is positioned in the branch line L13. In the first embodiment, the control valve CV100 may adjust the amount of fluid flowing in the branch line L13 under the control of the control module.

A valve V103 may be additionally positioned in the branch line L13, and the valve V103 is positioned downstream of the control valve CV100. For example, the valve V103 is located between the control valve CV100 and the confluence point P12. The valve V103 may be an on-off valve or a control valve.

The vaporization system according to the first embodiment may additionally include couplers C101 and C102. The coupler C101 has a structure that can be separated and coupled, and is positioned in the first line to connect the inlet and the valve V101. In addition, the coupler C102 may also have a structure that can be separated and coupled, and may be located in the second line to connect the outlet and the valve V104.

The control module may control the control valve CV100 based on the set value and the amount of fluid measured by the mass flow meter MFM. The control valve CV100 may adjust the amount of fluid flowing in the branch line L13 by control of the control module.

In this embodiment, the control module uses the measured value of the mass flow meter (MFM) to keep the amount of the vaporized source constant. The control module adjusts the amount of carrier gas provided to the canister B100 according to the degree of change of the measured value of the mass flow meter MFM. The carrier gas can be, for example, a fluid such as N2, Ar, and/or He.

Specifically, the control module adjusts the amount of carrier gas provided to the canister B100 by adjusting the amount of the carrier gas flowing through the branch line L13. In this embodiment, the control module controls the proportional integral derivative control (PID) to the branch line L13 by controlling the control valve CV located on the branch line L13 according to the degree of change of the measured value of the mass flow meter (MFM). Adjust the amount of carrier gas flowing.

The control module uses the set value to know the degree of change of the measured value of the mass flow meter (MFM). The SET value is a kind of reference value, and the control module may know the degree of change in the amount of vaporization based on the difference between the measured value of the mass flow meter MFM and the set value.

For example, when the measured value measured by the mass flow meter (MFM) becomes larger than the set value, the control module increases the amount of fluid (for example, carrier gas) flowing to the branch line L13 (that is, injected into the inlet). The operation of the control valve CV100 is controlled so that the amount of fluid (for example, a carrier gas) is reduced.

Meanwhile, when the measured value measured by the mass flow meter (MFM) becomes smaller than the set value, the control module reduces the amount of fluid (for example, carrier gas) flowing to the branch line L13 (that is, the fluid injected into the inlet). The operation of the control valve CV100 is controlled (for example, so that the amount of the carrier gas is increased).

In embodiments according to the present invention, the setting value is the following formula

ZERO value <setting value <SPAN value

The method of determining the ZERO value and the SPAN value will be described later in detail with reference to FIG. 10.

The first embodiment may include an operation mode such as a vaporization mode and a purge mode. Hereinafter, operation modes will be sequentially described with reference to FIGS. 2 and 3.

Vaporization mode

Referring to FIG. 2, the vaporization mode is a mode in which an operation in which a source stored in the canister B100 is vaporized is performed, and heat for vaporization of the source is provided to the canister B100 by a heater (not shown).

In the vaporization mode, the valve V101 and the valve V105 positioned on the first line L11 are open to the first line L11 so that the carrier gas flows to the canister B100, and the branch line L13 is The positioned control valve CV100 is open so that a part of the carrier gas flows in the branch line L13, and the valve V103 is open so that the carrier gas flowing in the branch line L13 flows to the confluence point P12. , The valve V104 is in an open state so that the source vaporized in the canister B100 flows toward the treatment facility.

The mass flow rate controller MFC operates so that a certain amount of carrier gas flows through the first line L11. Since the amount of the carrier gas provided by the mass flow controller MFC is kept constant, the amount of the carrier gas provided to the canister B100 can be adjusted by adjusting the amount of the carrier gas flowing through the branch line L13.

For example, when the amount of the carrier gas flowing in the branch line L13 is decreased, the carrier gas provided to the canister B100 is increased. When the carrier gas provided to the canister B100 increases, the amount of the vaporized source increases. On the other hand, when the amount of the carrier gas flowing through the branch line L13 is increased, the carrier gas provided to the canister B100 is decreased. When the carrier gas provided to the canister B100 is reduced in this way, the amount of the vaporized source (that is, the amount of vaporization) is reduced. That is, in order to provide a constant amount of vaporization to the treatment facility, the amount of the carrier gas provided to the canister B100 is adjusted.

Part of the carrier gas passed through the mass flow controller MFC is provided to the canister B100 through the inlet, and the remaining carrier gas flows to the branch line L13. The carrier gas flowing through the branch line L13 merges with the vaporized gas (that is, the source is vaporized) at the junction P12 where the second line L12 and the branch line L13 join to form the second line L12. ) Will flow. A mass flow meter (MFM) located downstream of the confluence point (P12) measures the amount of fluid flowing in the second line (L12). The fluid measured here is a carrier gas (carrier gas injected into the inlet + carrier gas flowing through a branch line) and a gas in which the source is vaporized.

Meanwhile, the amount of the carrier gas flowing through the branch line L13 is controlled by the control valve CV100, and the operation of the control valve CV100 is controlled by the control module.

The measured value of the mass flowmeter (MFM) is provided to the control module, and the control module controls the operation of the control valve (CV100) by comparing the set value with the value measured by the mass flowmeter (MFM). For example, the control module compares the SET value with the value measured by the mass flow meter (MFM), and increases the amount of carrier gas flowing in the branch line L13 when it is determined that the vaporization amount of the source is high or low. Performs a lower or lower operation. That is, the control module controls the operation of the control valve CV100, and the control valve CV100 adjusts the amount of carrier gas flowing in the branch line L13 according to the control of the control module.

According to the present exemplary embodiment, since a part of the carrier gas flows to the branch line P13 in the vaporization mode, it is possible to remove the fluid remaining in the valves. That is, before the purge mode is performed, the purge operation is preliminarily performed even in the vaporization mode.

Fudge mode

Referring to FIG. 3, the purge mode is a mode in which an operation for cleaning the lines L11, L12, and L13 connected to the canister B100 and valves is performed.

In the purge mode, all of the carrier gases flow to the branch line L13.

In the purge mode, the valves V101 and V104 are in a closed state and the control valve CV100 and the valve V103 are in an open state. Accordingly, the purge gas is discharged to the outside through the branch line.

4 to 6 are views for explaining a second embodiment of the present invention.

The vaporization system according to the second embodiment of the present invention has a cylindrical shape capable of storing a source, and a canister (B200) having an inlet through which a fluid can be introduced from the outside and an outlet through which the vaporized gas can be flowed out, Lines providing a path through which the fluid can move, components for controlling fluids flowing through the lines, a mass flow controller (MFC), a mass flow meter (MFM), and a control module may be included.

The vaporization system according to the second embodiment may further include a heater (not shown), and the heater may apply heat to the canister B200 in order to vaporize the source stored in the canis B200.

When comparing the first and second embodiments, the second embodiment differs from the first embodiment only in that it does not include the valves V103 and V104. That is, in the second embodiment, there is no valve corresponding to the valve V103 of the first embodiment in the branch line L23, and there is no valve corresponding to the valve V104 of the first embodiment in the second line L22. .

Since common elements of the first and second embodiments perform the same function, duplicate descriptions will be omitted.

Now, the operation of the second embodiment will be described with reference to FIGS. 5 and 6. The second embodiment may also include an operation mode such as a vaporization mode and a purge mode.

Vaporization mode

Referring to FIG. 5, the vaporization mode is a mode in which an operation in which a source stored in the canister B200 is vaporized is performed, and heat for vaporization of the source is provided to the canister B200 by a heater (not shown).

In the vaporization mode, the valve V201 and the valve V205 located on the first line L21 are open to the first line L21 so that the carrier gas flows to the canister B200, and the branch line L23 is opened. The positioned control valve CV200 is opened so that a part of the carrier gas flows through the branch line L23.

The mass flow controller MFC operates so that a certain amount of carrier gas flows through the first line L21. Since the amount of carrier gas provided by the mass flow controller MFC is kept constant, the amount of carrier gas provided to the canister B200 can be adjusted by adjusting the amount of carrier gas flowing through the branch line L23. Like the first embodiment, the second embodiment controls the amount of carrier gas provided to the canister B200 in order to provide a constant amount of vaporization to the treatment facility.

Part of the carrier gas passed through the mass flow controller MFC is provided to the canister B200 through the inlet, and the remaining carrier gas flows to the branch line L23. The carrier gas flowing through the branch line L23 merges with the vaporized gas at the junction P12 where the second line L22 and the branch line L23 join, and flows through the second line L22. A mass flow meter (MFM) located downstream of the confluence point (P22) measures the amount of fluid flowing in the second line (L22).

The fluid measured here is a carrier gas (carrier gas injected into the inlet + carrier gas flowing through the branch line) adjusted to flow in the first line L21 by the mass flow controller MFC and a vaporized source.

Meanwhile, the amount of the carrier gas flowing through the branch line L23 is controlled by the control valve CV200, and the operation of the control valve CV100 is controlled by the control module.

The measured value of the mass flowmeter (MFM) is provided to the control module, and the control module controls the operation of the control valve CV200 by comparing the set value with the measured value of the mass flowmeter (MFM). For example, the control module compares the set (SET) value with the measured value of the mass flow meter (MFM), and increases the amount of carrier gas flowing through the branch line (L23) when it is determined that the vaporization amount of the source is higher or lower than the standard. Performs a lower or lower operation. That is, the control module controls the operation of the control valve CV200, and the control valve CV200 adjusts the amount of the carrier gas flowing in the branch line L23 according to the control of the control module.

According to the present embodiment, since a part of the carrier gas flows to the branch line P23 in the vaporization mode, the fluid remaining in the valves can be removed. That is, before the purge mode is performed, the purge operation is preliminarily performed even in the vaporization mode.

Fuzzy mode

Referring to FIG. 6, the purge mode is a mode in which an operation for cleaning the lines L21, L22, and L23 connected to the canister B200 and valves is performed.

In the purge mode, all of the carrier gases flow to the branch line L23.

In the purge mode, the valve V201 is in a closed state and the control valve CV200 is in an open state. The purge gas is discharged to the outside through the branch line.

7 is a diagram for describing a setting value according to an embodiment of the present invention.

A method of determining a set value according to an embodiment of the present invention includes a step of measuring a ZERO value (S101), a step of measuring a SPAN value (S103), and a step of setting a set (SET) value (S105). Can include.

The ZERO value is a value measured when the source is vaporized without injecting the carrier gas into the canister, and the SPAN value does not send the carrier gas to the branch line (i.e., the control valve operates to prevent the carrier gas from flowing through the branch line). State) This value is measured when the source is vaporized while all carrier gases are injected into the canister. That is, a certain amount of carrier gas is provided to the first line by the mass flow controller (MFC), and the value measured when all the provided carrier gas is supplied to the canister is the SPAN value, and the carrier gas is not supplied to the canister at all. The value measured at is the ZERO value.

Hereinafter, it is assumed that a method for determining a set value according to an embodiment of the present invention is applied to the vaporizer described with reference to FIGS. 1 to 3, and the present method will be described.

In the step of measuring the zero value (S101), in the vaporization mode, the fluid flowing in the second line L12 (the vaporized source is included) in the state where the valve V101 or the valve V105 is closed is measured by a mass flow meter. (MFM) is a measurement step.

In the step of measuring the SPAN value (S103), in the vaporization mode, the valve V101 and the valve V105 are fully open, the control valve CV100 is completely closed, and the valve V104 and the valve V106 are In the fully open state, the mass flowmeter (MFM) measures the fluid flowing through the second line (L12) (a vaporized source is included).

The step of setting the SET value (S105) is the following formula

ZERO value <SET value <SPAN value

This is the step of determining the SET value to satisfy As described above, the SET value determined in step S105 is stored in the control module.

8 is a diagram for explaining a vaporization method according to an embodiment of the present invention.

In the vaporization method, the vaporizer system according to embodiments of the present invention vaporizes a source by performing a vaporization mode, and in the vaporization mode, a mass flow meter measures the amount of fluid flowing downstream from the confluence of the branch line and the second line. (S201), the control module determines whether the amount of vaporization has changed based on the measured value and the set (SET) value of the mass flow meter (S203), and driving (ie, controlling) the control valve according to the determination result (S205) ) Can be included.

The method of determining whether the amount of vaporization by the control module has changed in step S203 may be performed by checking whether there is a difference between the measured value of the mass flow meter and the set value.

In step S205, an operation of controlling the control valve is performed according to the degree of the difference between the measured value of the mass flow meter and the set value.

The above-described vaporization method can be applied when the mass flow meter (MFM) is located downstream from the junction of the branch line and the second line.

Meanwhile, in the case of an alternative embodiment in which the mass flow meter MFM is located between the confluence point P12 and the outlet, the vaporization method according to another embodiment of the present invention may be performed in the following manner.

That is, the carburetor system performs the vaporization mode to vaporize the source, in the vaporization mode, the mass flow meter measures the amount of fluid flowing between the confluence point (P12) and the outlet, and the control module measures the measurement value and setting of the mass flow meter (SET ) Determining whether the vaporization amount has changed based on the value, and driving (ie, controlling) the control valve according to the determination result.

In the case of alternative embodiments in which the mass flow meter (MFM) is located between the confluence point (P12) and the outlet, or the mass flow meter (MFM) is located between the valve (V104) and the outlet, the vaporization method according to the present invention is as follows. It can be done in a way.

That is, the carburetor system performs the vaporization mode to vaporize the source, in the vaporization mode, the mass flow meter measures the amount of fluid flowing between the confluence point (P12) and the outlet, and the control module measures the measurement value and setting of the mass flow meter (SET ) Determining whether the vaporization amount has changed based on the value, and driving (ie, controlling) the control valve according to the determination result.

As described above, the present invention is not limited to the described embodiments, and it is obvious to those of ordinary skill in the art that various modifications and variations can be made without departing from the spirit and scope of the present invention. Therefore, such modifications or variations will have to belong to the scope of the claims of the present invention.

Canister: B100, B200
Valve: V101, V102, V103, V104. V105
Coupler: C101, C102
Line: L11, L12, L13

Claims (14)

delete delete delete delete delete delete delete delete delete delete In the vaporization method in the vaporizer system,
The carburetor system
A canister having a cylindrical shape capable of storing a source and having an inlet through which a fluid is introduced from the outside and an outlet through which the vaporized gas can be flowed out;
A first line providing a path through which fluid can move to the inlet of the canister;
A second line providing a path through which substances flowing out of the outlet of the canister can move to a treatment facility;
A branch line branching from the first line and joining the second line, the branch line providing a path through which at least a portion of the fluid moving through the first line can move to the second line;
A control valve located on the branch line and capable of adjusting an amount of fluid that is moved through the branch line; And
A component positioned on a first line, the component positioned between the inlet from a branch point at which the branch line is branched; Including,
The fluid is a carrier gas, and the component is any one of a valve that regulates the flow of the fluid and a fluid load that resists the flow of the fluid,
The vaporization method is
Vaporizing the source by the vaporizer system performing a vaporization mode;
Measuring an amount of fluid flowing through a second line by a mass flow meter (MFM) in the vaporization mode; And
Controlling the control valve such that an amount of vaporized vaporized as a result of performing the vaporizing step is constant based on a measured value and a set value measured by the mass flow meter (MFM); Including,
By performing the step of controlling the control valve, a part of the fluid flowing on the first line flows to the confluence point through the branch line,
A mass flow rate controller (MFC) is positioned on the first line before the branch point where the branch line is branched, so that the amount of fluid flowing in the first line before the branch point is constantly adjusted. The method of claim 11,
The above setting value is
ZERO value <setting value <SPAN value
Satisfying
When the carburetor system is operating in the vaporization mode,
The zero value is a value measured by a mass flow meter of the amount of fluid flowing in the second line when the source is vaporized without injecting a carrier gas into the canister,
The SPAN value is a value measured by a mass flow meter of the amount of fluid flowing in the second line when the source is vaporized while the carrier gas is not sent to the branch line and all of the carrier gas is injected into the canister. The method of claim 11,
The mass flow meter is positioned between the outlet of the canister and the junction of the branch line and the second line. The method of claim 11,
The mass flow meter is positioned downstream of the junction of the branch line and the second line.

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