KR102184092B1 - Transparent electrode having mesh metal layer and manufacturing method for the same - Google Patents

Abstract

A method of manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted according to an embodiment of the present invention includes a substrate, a first amorphous oxide layer including a conductive transparent substrate formed on the substrate, and an upper portion of the first amorphous oxide layer. A metal layer formed on and a second amorphous oxide layer including a conductive transparent substrate formed on the metal layer, and the metal layer may be formed in a metal pattern having a mesh structure by crossing a plurality of metal pieces.

Description

A transparent electrode with a mesh-structured metal layer inserted therein and its manufacturing method {TRANSPARENT ELECTRODE HAVING MESH METAL LAYER AND MANUFACTURING METHOD FOR THE SAME}

The present invention relates to a transparent electrode in which a metal layer of a mesh structure is inserted, and more particularly, to a transparent electrode in which a metal layer of a mesh structure is inserted for preventing deterioration due to external influences, high stability, and mechanical flexibility, and a manufacturing method thereof. will be.

A transparent electrode is a component basically necessary for a resistive or electrostatic induction type touch screen in addition to a display electrode applied to LCD, OLED, etc. In addition, transparent electrodes are used not only in the field of organic solar cells, but also in light-receiving devices and light-emitting devices, and are used as large-area transparent electrodes in smart windows, which are electrochromic glass. In addition, the use of a transparent film that requires an electromagnetic shielding function, a transparent glass to which a transparent film is applied, and the like, has been widely increasing.

A typical transparent electrode that has been commercialized to date is Indium Tin Oxide (ITO), which is thinly coated on an optical glass. Usually ITO transparent electrode is sputtered

It is manufactured by forming an electrode material including ITO powder particles in the form of a thin film on a glass substrate through processes such as ring and digital printing. This ITO transparent electrode has the advantage of satisfying the performance requirements as a transparent electrode in most electric products such as a touch screen.

However, problems such as increased material cost due to the increase in the price of the main raw material, indium, market instability and depletion, device deterioration due to the diffusion of indium, high reducibility under hydrogen plasma, and bending instability such as cracks in flexible substrates. Is being raised.

Accordingly, there is a need for research on the development of a transparent electrode capable of having higher stability and mechanical flexibility.

Republic of Korea Patent Publication No. 10-1445478 (2014.09.22)

In an embodiment of the present invention, a metal layer having a mesh structure is inserted between the upper and lower amorphous oxide layers when manufacturing the transparent electrode, thereby preventing deterioration due to external influences, and inserting a metal layer having a mesh structure for high stability and mechanical flexibility. Provides a manufacturing method.

The problem to be solved by the present invention is not limited to the problem(s) mentioned above, and another problem(s) not mentioned will be clearly understood by those skilled in the art from the following description.

The transparent electrode into which the metal layer of the mesh structure is inserted according to an embodiment of the present invention includes a substrate, a first amorphous oxide layer including a conductive transparent substrate formed on the substrate, and a metal layer formed on the first amorphous oxide layer. And a second amorphous oxide layer including a conductive transparent substrate formed on the metal layer, wherein the metal layer may be formed in a metal pattern having a mesh structure by crossing a plurality of metal pieces.

In addition, the substrate according to an embodiment of the present invention is polyimide (PI), polyamide (PA), polyamide-imide, polyurethane (polyurethane, PU), polyurethane Acrylate (PUA), polyacrylamide (PA), polyethylene terephthalate (PET), polyether sulfone (PES), polyethylene naphthalate (PEN), polycarbonate , PC), polymethylmethacrylate (PMMA), polyetherimide (PEI), polydimethylsiloxane (PDMS), polyethylene (PE), polyvinyl alcohol (PVA) ), polystyrene (PS), biaxially oriented PS (BOPS), acrylic resin, silicone resin, fluorine resin, modified epoxy resin, glass or tempered glass.

In addition, the first amorphous oxide layer and the second amorphous oxide layer according to an embodiment of the present invention may have a light transmittance of 60 to 80% or more.

In addition, the first amorphous oxide layer and the second amorphous oxide layer according to an embodiment of the present invention are Ti, Ga, Al, Ge, As, Cu, Mn, Zr, Nb, Ru, Hf, Zn, Sr, Amorphous oxide composed of one single substance selected from Ba, Fe, Ag, In, Re, Cr, Ni, Mo, V, W, Mg, Si, Sn, and Ta, or amorphous oxide in which two or more substances are mixed It may include.

In addition, the thicknesses of the first amorphous oxide layer and the second amorphous oxide layer according to an embodiment of the present invention may be 10 to 1000 nm, respectively.

In addition, the metal layer according to an embodiment of the present invention may include one single metal or two or more alloys selected from Ag, Au, Ti, Ni, Mo, Cu, and Al.

In addition, the thickness of the metal layer according to an embodiment of the present invention may be 10 to 200 nm.

In addition, the line width of the metal pattern according to an embodiment of the present invention may be 1 to 10 μm.

In addition, the outside of the transparent electrode into which the metal layer of the mesh structure is inserted according to an embodiment of the present invention may be implemented by being surrounded by a cover part made of a glass material.

In addition, a method of manufacturing a transparent electrode in which a metal layer of a mesh structure is inserted according to an embodiment of the present invention includes providing a substrate, forming a first amorphous oxide layer including a conductive transparent substrate on the substrate. , Forming a metal layer on the top of the first amorphous oxide layer, and forming a second amorphous oxide layer including a conductive transparent substrate on the top of the metal layer, wherein the metal layer includes a plurality of metal pieces It may be formed as a metal pattern having a mesh structure by crossing.

In addition, after performing the step of forming a second amorphous oxide layer on the top of the metal layer according to an embodiment of the present invention, it may further include heat treatment at 50 to 900°C.

Details of other embodiments are included in the detailed description and accompanying drawings.

According to the embodiments of the present invention, by implementing a transparent electrode having a mesh structure between the upper and lower amorphous oxide layers, it is possible to prevent deterioration due to external influences, high stability, and mechanical flexibility.

In addition, according to embodiments of the present invention, due to the low surface roughness of the upper and lower amorphous oxide layers, performance degradation due to the contact surface of the metal layer of the mesh structure and the peeling phenomenon of each layer are reduced, thereby reducing the decrease in electrical properties compared to the conventional transparent electrode Can be reduced.

1 is a perspective view of a transparent electrode into which a metal layer having a mesh structure is inserted according to an embodiment of the present invention.
2 is a cross-sectional view of the transparent electrode of FIG. 1 cut in the thickness direction.
3 is a plan view showing a metal layer having a mesh structure according to an embodiment of the present invention.
4 is a perspective view of a transparent electrode into which a metal layer having a mesh structure is inserted according to another embodiment of the present invention.
5 is a flowchart illustrating a method of manufacturing a transparent electrode into which a metal layer having a mesh structure is inserted according to an embodiment of the present invention.
6 is a flowchart illustrating a method of manufacturing a transparent electrode into which a metal layer having a mesh structure is inserted using a deposition process according to an embodiment of the present invention.

Advantages and/or features of the present invention, and a method of achieving them will become apparent with reference to the embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in a variety of different forms, only these embodiments make the disclosure of the present invention complete, and common knowledge in the art to which the present invention pertains It is provided to completely inform the scope of the invention to those who have, and the invention is only defined by the scope of the claims. The same reference numerals refer to the same elements throughout the specification.

1 is a perspective view of a transparent electrode in which a metal layer of a mesh structure is inserted according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of the transparent electrode of FIG. 1 cut in the thickness direction, and FIG. 3 is an embodiment of the present invention. It is a plan view showing the metal layer of a mesh structure.

1 and 2, the transparent electrode 10 into which the metal layer of the mesh structure is inserted according to an embodiment of the present invention is a substrate 100, a first amorphous oxide layer formed on the substrate 100 (200), a metal layer 300 formed on the first amorphous oxide layer 200 and a second amorphous oxide layer 400 formed on the metal layer 300 may be included.

In this case, the metal layer 300 may be formed as a metal pattern 350 having a mesh structure by crossing a plurality of metal pieces.

The transparent electrode 10 into which the metal layer 300 of such a mesh structure is inserted is a basic component necessary for a resistive or electrostatic induction type touch screen in addition to a display electrode applied to LCD, OLED, and the like. In addition, transparent electrodes are used not only in the field of organic solar cells, but also in light-receiving devices and light-emitting devices, and are used as large-area transparent electrodes in smart windows, which are electrochromic glass. In addition, the use of a transparent film that requires an electromagnetic shielding function, a transparent glass to which a transparent film is applied, and the like, is widely increasing.

The transparent electrode into which the metal layer 300 of the mesh structure of the present invention is inserted may have a structure in which the substrate, the first amorphous oxide layer 200, the metal layer 300, and the second amorphous oxide layer 400 are sequentially disposed. .

That is, the amorphous oxide layers 200 and 400 may be disposed above and below the metal layer 300 with the metal layer 300 interposed therebetween to form a multilayer structure of oxide/metal/oxide. For example, a first amorphous oxide layer 200 may be formed under the metal layer 300, and a second amorphous oxide layer 400 may be formed over the metal layer 300.

The substrate 100 is characterized in that it is a transparent substrate made of glass or plastic.

Specifically, the plastic material is made of a material having excellent flexibility according to physical deformation, for example, polyimide (PI), polyamide (PA), polyamide-imide, polyurethane (polyurethane, PU), polyurethane acrylate (PUA), polyacrylamide (PA), polyethylene terephthalate (PET), polyether sulfone (PES), polyethylene naphthalate , PEN), polycarbonate (PC), polymethylmethacrylate (PMMA), polyetherimide (PEI), polydimethylsiloxane (PDMS), polyethylene (PE), Plastic film layers such as polyvinyl alcohol (PVA), polystyrene (PS), biaxially oriented PS (BOPS), acrylic resin, silicone resin, fluorine resin, modified epoxy resin, etc. It may be made of a sheet, and the glass material may include tempered glass or semi-tempered glass used for a display.

In addition, the substrate 100 is excellent in light transmittance to visible light, for example, preferably has a light transmittance of 80% or more.

The first amorphous oxide layer 200 and the second amorphous oxide layer 400 are oxide layers including a conductive transparent substrate, and may include an amorphous oxide made of a single material or a mixed material. Specifically, each of the oxide layers 200 and 400 may be formed by oxidation of a single metal or two or more alloys.

For example, the first amorphous oxide layer 200 and the second amorphous oxide layer 400 are Ti, Ga, Al, Ge, As, Cu, Mn, Zr, Nb, Ru, Hf, Zn, Sr, Ba, Contains an amorphous oxide composed of one single material selected from Fe, Ag, In, Re, Cr, Ni, Mo, V, W, Mg, Si, Sn, and Ta, or an amorphous oxide in which two or more materials are mixed It can be done by doing.

Next, the metal layer 300 is a layer that determines the electrical properties and calorific value of the transparent electrode. Ag, Au, Ti, Ni, Mo between the first amorphous oxide layer 200 and the second amorphous oxide layer 400 , Cu and Al may be made including one single metal or two or more alloys selected from.

The thickness of the first amorphous oxide layer 200, the second amorphous oxide layer 400, and the metal layer 300 may be implemented from several tens to several hundred nm, specifically, the first amorphous oxide layer 200 and The thickness of the second amorphous oxide layer 400 is 10 to 1000 nm, respectively, and the thickness of the metal layer 300 is 10 to 200 nm.

At this time, the thickness of the metal layer 300 affects the electrical properties and light transmittance of the transparent electrode, and may be optimized at a thickness of 10 to 200 nm. In particular, when the thickness is different, the wavelength range of light that is highly transmitted by 80% or more is also different, so the thickness of the metal layer 300 may be selectively determined in consideration of the wavelength of light within the above-described range.

However, since the thickness of the metal layer 300 is not necessarily limited to the above-described range, it may be formed in various thicknesses according to a material, an oxide layer, and the like.

In addition, the first amorphous oxide layer 200 and the second amorphous oxide layer 400 basically reduce the reflection and refractive index of light by the metal layer 300 to improve light transmittance and can be easily oxidized. It serves to protect the existing metal layer 300. In particular, each thickness affects the light transmittance like the metal layer 300. In order to secure the optimal light transmittance, the thickness is preferably 10 to 1000 nm.

However, the thickness is not necessarily limited thereto, and may be variously selected in consideration of the material and thickness of the first amorphous oxide layer 200, the metal layer 300, and the second amorphous oxide layer 400, and usage conditions. . For example, the thicknesses of the first amorphous oxide layer 200 and the second amorphous oxide layer 400 may be the same or different from each other.

Meanwhile, the first amorphous oxide layer 200 and the second amorphous oxide layer 400 are characterized in that they are transparent oxides having a band gap of 3 eV or more. The first amorphous oxide layer 200 and the second amorphous oxide layer 400 are materials for the transparent electrode 10 and have a light transmittance of about 80% in the visible light region (400 nm to 700 nm) and have a light transmittance of ~10^3/ohm centi. It should be a material with high electrical conductivity of. Since the optical bandwidth is about 3.5eV, it is necessary to transmit all ultraviolet rays and have high reflectance in the infrared region and appropriate etching characteristics.

In addition, the metal layer 300 is characterized in that it can have a plasmon phenomenon at the interface between the first amorphous oxide layer 200 and the second amorphous oxide layer 400, the interfacial plasmon phenomenon occurs on the surface of the metal thin film or nanoparticles. It is a collective vibration phenomenon of surface free electrons. Due to the collective vibration of free electrons, light passes through the metal particles and appears transparent, and as a result, the light transmittance in a specific wavelength region can be improved. Specifically, the light transmittance of the transparent electrode 10 of the present invention may be 80 to 90%.

Meanwhile, the metal layer 300 of the present invention may be formed as a metal pattern 350 in which a plurality of metal pieces are uniformly arranged.

Specifically, the metal pattern 350 may be implemented with a mesh structure by crossing a plurality of metal pieces, and the line width l of the metal pattern 350 is 1 to 10 μm.

For reference, since the line width l of the metal pattern 350 is not necessarily limited to the above-described range, it may be variously formed according to a material, an oxide layer, and the like.

As shown in FIG. 3, the metal layer 300 has a mesh structure in the form of a mesh and crosses each other with metal pieces, which are conductive materials, so that the metal layer 300 may have a plurality of through holes like holes in the mesh. .

In addition, the shape of the metal pattern 350 is not particularly limited as long as it has an open portion as a plurality of through holes. For example, the metal pattern 350 may be implemented in a shape with periodicity such as a square, a rectangle, and a hexagon.

4 is a perspective view of a transparent electrode 10 into which a metal layer having a mesh structure is inserted according to another embodiment of the present invention.

Referring to FIG. 4, a transparent electrode 10 into which a metal layer having a mesh structure is inserted according to another embodiment of the present invention includes a substrate 100, a first amorphous oxide layer 200 formed on the substrate 100, and 1 It may include a metal layer 300 formed on the amorphous oxide layer 200, a second amorphous oxide layer 400 formed on the metal layer 300, and the cover part 1.

In this embodiment, the substrate 100, the first amorphous oxide layer 200, the metal layer 300, and the second amorphous oxide layer 400 are transparent electrodes in which a metal layer having a mesh structure according to an embodiment of the present invention is inserted. It is the same as the substrate 100, the first amorphous oxide layer 200, the metal layer 300, and the second amorphous oxide layer 400 of (10), and has a difference in further including the cover unit 1.

The cover part 1 is a frame surrounding the outside of the transparent electrode 10 into which the metal layer 300 having a mesh structure is inserted, and is formed of a glass material.

Specifically, in the present embodiment, after forming the transparent electrode 1 in which the metal layer 300 having a mesh structure is inserted on a member made of glass, heat is applied to another member of glass material, and the transparent electrode 1 You can implement a single frame that can be inserted.

Accordingly, according to embodiments of the present invention, by implementing the transparent electrode 10 in which the metal layer 300 having a mesh structure is inserted between the upper and lower amorphous oxide layers 200 and 400, it is possible to prevent deterioration due to external influences, and provide high stability and mechanical properties. You can expect flexibility.

In addition, according to embodiments of the present invention, due to the low surface roughness of the upper and lower amorphous oxide layers 200 and 400, performance degradation due to the contact surface of the metal layer 300 having a mesh structure and the peeling phenomenon of each layer are reduced. In comparison, it is possible to reduce the deterioration of electrical properties.

5 is a flowchart illustrating a method of manufacturing a transparent electrode in which a metal layer of a mesh structure is inserted according to an embodiment of the present invention, and FIG. 6 is a mesh structure using a deposition process according to an embodiment of the present invention. It is a flow chart illustrating a method of manufacturing a transparent electrode in which a metal layer is inserted.

Referring to FIGS. 5 and 6, first, an apparatus for manufacturing a transparent electrode into which a metal layer having a mesh structure is inserted may place a substrate made of a transparent material of glass or plastic (S110).

Next, the apparatus for manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted may form a first amorphous oxide layer including a conductive transparent substrate on a substrate (S120).

Next, the apparatus for manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted may form a metal layer on the first amorphous oxide layer (S120).

Next, the apparatus for manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted may form a second amorphous oxide layer including a conductive transparent substrate on the metal layer (S130).

In the method of manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted according to the present invention, a step of heat-treating at 50 to 900°C may be performed after additionally forming a second amorphous oxide layer.

For example, it includes a process of heat treatment at 50 to 900°C for 20 to 60 minutes in an argon (Ar) gas atmosphere, and through this, the sheet resistance of the transparent electrode may be reduced.

The metal layer in the present invention is any one of various process methods such as Pulsed Laser Deposition (PLD), Thermal deposition, Electron beam deposition, Physical Vapor Deposition (PVD) process such as sputtering, and Solution process process such as Printing and Wet solution. Can be formed by

For example, after patterning the metal layer using a photoresist and a mask, a metal pattern is formed using an etching and lift-off method, or a metal pattern having a mesh structure is formed through a solution process and a printing process, and then laser , UV and heat can be applied to harden.

The first amorphous oxide layer and the second amorphous oxide layer in the present invention are Chemical Vapor Deposition (CVD) such as Atmospheric Pressure Chemical Vapor Deposition (APCVD), Low Pressure Chemical Vapor Deposition (LPCVD), and Plasma Enhanced Chemical Vapor Deposition (PECVD). It can be formed by any one of various process methods such as a process or a physical vapor deposition (PVD) process such as pulsed laser deposition (PLD), thermal deposition, electron beam deposition, and sputtering, and a solution process process such as printing and wet solution. have.

For reference, the process methods of the first amorphous oxide layer, the second amorphous oxide layer, and the metal layer are not limited to the above-described methods, and various process methods may be used.

Meanwhile, after sequentially forming the substrate, the first amorphous oxide layer, the metal layer, and the second amorphous oxide layer, a cover part made of a glass material may be additionally formed.

Specifically, after forming a material in which a substrate, a first amorphous oxide layer, a metal layer, and a second amorphous oxide layer are sequentially stacked on a member made of glass, as described above, by applying heat with another member of glass material, A cover part may be implemented as one frame into which the laminated material may be inserted.

Until now, specific embodiments according to the present invention have been described, but, of course, various modifications may be made without departing from the scope of the present invention. Therefore, the scope of the present invention should not be defined by being limited to the described embodiments, and should be defined not only by the claims to be described later, but also by the claims and their equivalents.

As described above, although the present invention has been described by the limited embodiments and drawings, the present invention is not limited to the above embodiments, which is various modifications and variations from these descriptions to those of ordinary skill in the field to which the present invention belongs. Transformation is possible. Therefore, the idea of the present invention should be grasped only by the claims set forth below, and all equivalent or equivalent modifications thereof will be said to belong to the scope of the inventive idea.

1: cover
10: transparent electrode
100: substrate
200: first amorphous oxide layer
300: metal layer
350: metal pattern
400: second amorphous oxide layer

Claims (11)

Board;
A first amorphous oxide layer including a conductive transparent substrate formed on the substrate;
A metal layer formed on the first amorphous oxide layer; And
Including a second amorphous oxide layer including a conductive transparent substrate formed on the metal layer,
The metal layer is formed in a metal pattern having a mesh structure by crossing a plurality of metal pieces,
The outside of the transparent electrode into which the metal layer of the mesh structure is inserted is implemented by being surrounded by a cover part made of glass,
The first amorphous oxide layer and the second amorphous oxide layer have a band gap of 3 eV or more.
The method of claim 1,
The substrate is polyimide (PI), polyamide (PA), polyamide-imide, polyurethane (polyurethane, PU), polyurethane acrylate (polyurethaneacrylate, PUA), polyacrylic Amide (polyacrylamide, PA), polyethylene terephthalate (PET), polyether sulfone (PES), polyethylene naphthalate (PEN), polycarbonate (PC), polymethyl methacrylate ( polymethylmethacrylate, PMMA), polyetherimide (PEI), polydimethylsiloxane (PDMS), polyethylene (PE), polyvinyl alcohol (PVA), polystyrene (PS), biaxial A transparent electrode in which a metal layer of a mesh structure is inserted, comprising: biaxially oriented PS (BOPS), acrylic resin, silicone resin, fluorine resin, modified epoxy resin, glass or tempered glass.
The method of claim 1,
The first amorphous oxide layer and the second amorphous oxide layer have a light transmittance of 60 to 80% or more.
The method of claim 3,
The first amorphous oxide layer and the second amorphous oxide layer are Ti, Ga, Al, Ge, As, Cu, Mn, Zr, Nb, Ru, Hf, Zn, Sr, Ba, Fe, Ag, In, Re, A mesh structure comprising an amorphous oxide composed of one single material selected from Cr, Ni, Mo, V, W, Mg, Si, Sn, and Ta, or a mixture of two or more materials. A transparent electrode with a metal layer inserted therein.
The method of claim 1,
Each of the first amorphous oxide layer and the second amorphous oxide layer have a thickness of 10 to 1000 nm, respectively.
The method of claim 1,
The metal layer is a transparent electrode in which a metal layer having a mesh structure is inserted, characterized in that it contains one single metal or two or more alloys selected from Ag, Au, Ti, Ni, Mo, Cu, and Al.
The method of claim 1,
The transparent electrode in which the metal layer having a mesh structure is inserted, wherein the metal layer has a thickness of 10 to 200 nm.
The method of claim 7,
The transparent electrode in which the metal layer of the mesh structure is inserted, characterized in that the line width of the metal pattern is 1 to 10 μm.
delete Providing a substrate;
Forming a first amorphous oxide layer including a conductive transparent substrate on the substrate;
Forming a metal layer over the first amorphous oxide layer; And
Including the step of forming a second amorphous oxide layer including a conductive transparent substrate on the top of the metal layer,
The metal layer is formed in a metal pattern having a mesh structure by crossing a plurality of metal pieces,
After forming a material in which a substrate, the first amorphous oxide layer, the metal layer, and the second amorphous oxide layer are sequentially stacked on a first member made of a glass material, heat is applied to a second member made of glass to implement a cover part. A method of manufacturing a transparent electrode in which a metal layer having a mesh structure is inserted, further comprising a step.
The method of claim 10,
After performing the step of forming a second amorphous oxide layer on the metal layer, the method of manufacturing a transparent electrode with a metal layer having a mesh structure, characterized in that it further comprises the step of heat-treating at 50 to 900 ℃.

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