KR102160429B1 - Non-Conductive Semi-Transparent Metallic Color Film and Manufacturing Method thereof - Google Patents

Abstract

The present invention relates to a non-conductive semi-transparent metallic color thin film and a method for manufacturing the same. According to the present invention, a substrate preparation step of preparing a glass substrate having transmittance to light; A color layer forming step of forming a color layer on at least a portion of one side of the glass substrate prepared in the substrate preparation step; And a translucent layer forming step of forming a translucent layer on at least a portion of one side of the color layer formed in the color layer forming step, wherein the translucent layer formed in the translucent layer forming step is in one direction from the other side of the glass substrate. Since the transmittance of the light incident and proceeding is 5% to 20%, it supports correct switching of the touch sensor by having a high sheet resistance value, can provide the required metallic color, and can provide a thin film with translucency. Therefore, a technology related to a non-conductive semi-transparent metallic color thin film that can improve various operating functions and external design of home appliances such as refrigerators is disclosed.

Description

Non-Conductive Semi-Transparent Metallic Color Film and Manufacturing Method thereof {Non-Conductive Semi-Transparent Metallic Color Film and Manufacturing Method thereof}

The present invention relates to a non-conductive semi-transparent metallic colored thin film and a method for manufacturing the same, and more particularly, to a non-conductive semi-transparent metallic colored thin film applied to home appliances such as refrigerators, and a method for manufacturing the same.

Home appliances that are widely used in real life, such as refrigerators, are developing not only with basic functions, but also with the development of product design and technology that can support them.

Recently, the door of a refrigerator is installed so that the door is rotatable in front of the refrigerator, and the refrigerator door is mainly exposed to the user when the storage compartment is closed. Accordingly, in order to give users the beauty of a refrigerator, the design and material of the front of the refrigerator door is becoming important, and consumers' preference for a refrigerator door giving a feeling of steel is increasing day by day.

In order to meet the preferences of such consumers, research is being conducted to form the refrigerator door of a steel material, and a technology capable of controlling the operation of the refrigerator by touch without having to open the refrigerator door through the refrigerator door is required. Research is also ongoing.

The refrigerator should be able to control the operation of the refrigerator by touch and translucency that can check the interior of the refrigerator when necessary through the door of the refrigerator, and it should be able to match the metallic color of the refrigerator outer case.

Accordingly, there has been a demand for a non-conductive semi-transparent metallic color thin film technology that has non-conductive properties and can implement metallic colors to enable touch sensor operation and has semi-transparent properties.

Korean Patent Registration 10-1748996

An object of the present invention is to solve the above-described conventional problems, it is possible to implement a metallic color with a non-conductive property to operate a touch sensor, and a non-conductive translucent metallic color thin film with semi-transparent properties and manufacturing thereof In providing a way.

The non-conductive translucent metallic color thin film according to an embodiment of the present invention for achieving the above object comprises: a substrate preparation step of preparing a glass substrate having transmittance to light; A color layer forming step of forming a color layer on at least a portion of one side of the glass substrate prepared in the substrate preparation step; And a semi-transparent layer forming step of forming a semi-transparent layer on at least a portion of one side of the color layer formed in the color layer forming step, wherein the semi-transparent layer formed in the semi-transparent layer forming step comprises: One characteristic may be that the transmittance of light incident and proceeding from the other side of the glass substrate is 5% to 20%.

Here, it may be another feature that the light absorption rate of the translucent layer formed in the translucent layer forming step is 60% to 80%.

Further, in the translucent layer forming step, by controlling the thickness at which the translucent layer is deposited, the translucent layer may selectively determine the transmittance or absorbance of light.

Furthermore, the translucent layer formed in the translucent layer forming step may be formed of a compound of copper and oxygen as another feature.

(mega ohm per square) 에 해당되는 것을 또 하나의 특징으로 할 수도 있다. Here, the sheet resistance value of the translucent layer formed through the translucent layer forming step is 8 to 50

Another feature is that it corresponds to (mega ohm per square).

Here, at least some of the compounds of copper and oxygen in the translucent layer may have another characteristic in that the combination ratio of copper and oxygen is 4:2.9 to 4:3.1.

Here, it may be another feature that the ratio of the copper-oxygen compound having a combination ratio of copper and oxygen of 4:2.9 to 4:3.1 in the translucent layer is 80% to 100%.

In addition, in the color layer forming step, the color layer may be formed so that the refractive index of the color layer with respect to light incident and proceeding from the glass substrate side has a value between 2.0 and 2.5.

Further, it may be another feature of selectively determining the refractive index of the color layer by controlling a thickness formed by depositing the color layer in the color layer forming step.

Furthermore, the color layer formed in the color layer forming step may be formed of a compound of Zr and N as another feature.

Further, as another feature, the color of the color layer formed through the color layer forming step is determined by the thickness of the color layer formed by depositing Zr and N on at least a portion of one side of the glass substrate. You may.

Here, at least some of the compounds of Zr and N in the color layer may have another characteristic in that the bonding ratio of Zr and N is 1:0.9 to 1:1.

Here, the combination ratio of Zr and N is 1:0.9 to 1:1, the ratio of the compound of Zr and N in the color layer is 80% to 100% may be another feature.

In addition, a resin layer forming step of forming a resin layer having transmittance to light on at least a portion of one side of the translucent layer formed in the translucent layer forming step; may further include.

The non-conductive translucent metallic color thin film according to an embodiment of the present invention for achieving the above and steel is a glass substrate; A color layer formed on at least a portion of one side of the glass substrate to have a predetermined thickness; And a semi-transparent layer formed with a predetermined thickness on at least a portion of one side of the color layer, wherein the translucent layer may have a light absorption rate of 60% to 80%.

Here, the translucent layer may be formed of a compound of copper and oxygen as another feature.

(mega ohm per square) 에 해당되는 것을 또 하나의 특징으로 할 수도 있다. Furthermore, the sheet resistance value of the translucent layer is 8 to 50

Another feature is that it corresponds to (mega ohm per square).

Here, at least some of the compounds of copper and oxygen in the translucent layer may have another characteristic in that the combination ratio of copper and oxygen is 4:2.9 to 4:3.1.

Further, it may be another feature that the ratio of the copper-oxygen compound having a combination ratio of copper and oxygen of 4:2.9 to 4:3.1 in the translucent layer is 80% to 100%.

In addition, the color layer may have another feature in that the refractive index of the light incident from the glass substrate side and proceeds has a value between 2.0 and 2.5.

Here, the color layer may be formed of a compound of Zr and N as another feature.

Here, at least some of the compounds of Zr and N in the color layer may have another characteristic in that the bonding ratio of Zr and N is 1:0.9 to 1:1.

Here, the combination ratio of Zr and N is 1:0.9 to 1:1, the ratio of the compound of Zr and N in the color layer is 80% to 100% may be another feature.

In addition, it is possible to further include a resin layer having a predetermined thickness on at least a portion of one side of the translucent layer and having transmittance to light.

The non-conductive semi-transparent metallic colored thin film and its manufacturing method according to the present invention assists the correct switching of the touch sensor by having a high sheet resistance value, can provide the required metallic color, and can provide a thin film with semi-transparent properties. There is an effect that can improve various operation functions and external design of home appliances such as refrigerators.

1 is a cross-sectional view schematically showing a side cross-section of a non-conductive translucent metallic color thin film according to an embodiment of the present invention.
2 is a flow chart schematically showing a method of manufacturing a non-conductive translucent methylic color thin film according to an embodiment of the present invention.
3 is a conceptual diagram schematically showing the formation of a non-conductive translucent metallic colored thin film by sputtering in a method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention.
4 is an image schematically showing a difference in color according to the thickness of a color layer ZrN in a non-conductive translucent metallic color thin film manufactured by a method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention.
5 is a graph schematically showing the XRD analysis results of the translucent layer in the method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention.

Hereinafter, a preferred embodiment will be described with reference to the accompanying drawings so that the present invention may be more specifically understood.

1 is a cross-sectional view schematically showing a side cross-section of a non-conductive translucent metallic color thin film according to an embodiment of the present invention.

Referring to FIG. 1, a non-conductive translucent metallic colored thin film 10 according to an embodiment of the present invention includes a glass substrate 100, a color layer 200, and a translucent layer 300, and is not shown. It may be formed to further include a resin layer.

It is preferable that the glass substrate 100 has transmittance to light. In addition, it is desirable to have high hardness in consideration of being applied to home appliances such as refrigerators. Therefore, it is also preferable that the glass substrate 100 is a tempered glass.

A color layer 200 is provided on at least a portion of one side of the glass substrate 100 to have a predetermined thickness. The color layer 200 is preferably capable of displaying a specific color, and a metallic color, which is a metallic color, is also preferable.

In addition, the color layer 200 preferably has a refractive index of 2.0 or more for light incident from the glass substrate 100 side and proceeding, and preferably has a value between 2.0 and 2.5 if the range of the refractive index is limited.

The color layer 200 is preferably made of Zr (zirconium) and N (nitrogen) so as to faithfully implement metallic colors. More preferably, in the color layer 200 formed of a compound of Zr and N, at least some of the compounds of Zr and N preferably have a combination ratio of Zr and N of 1:0.9 to 1:1.

In particular, it is more preferable if the ratio of the compound of Zr and N in the color layer 200 having a bonding ratio of 1:0.9 to 1:1 is 80% to 100%.

A translucent layer 300 is formed on at least a portion of one side of the color layer 200 to a predetermined thickness. Therefore, it may be said that the color layer 200 is provided between the translucent layer 300 and the glass substrate 100.

The translucent layer 300 preferably has a transmittance of 5% to 20% for light incident and proceeding from the other side of the glass substrate 100 in one direction, and light for light incident and proceeding from the glass substrate 100 It is also preferred that the water absorption is 60% to 80%.

(mega ohm per square) 이상의 값을 갖는 것이 바람직하며, 반투명층(300)의 면저항값의 범위를 굳이 한정하자면 내지 50

에 해당되는 것이 바람직하다. The sheet resistance of the translucent layer 300 is 8

It is preferable to have a value of (mega ohm per square) or more, and to limit the range of the sheet resistance value of the translucent layer 300 to 50

It is preferable to correspond to.

The translucent layer 300 may be formed of a compound of copper and oxygen. In addition, it is preferable that at least some of the compounds of copper and oxygen in the translucent layer 300 have a combination ratio of copper and oxygen of 4:2.9 to 4:3.1.

It is more preferable that the ratio of the copper-oxygen compound having a copper-oxygen combination ratio of 4:2.9 to 4:3.1 in the translucent layer is 80% to 100%.

It is also preferable that a resin layer is further formed on such a non-conductive translucent metallic colored thin film. It is also preferable that there is transmittance to light and that a resin layer is formed with a predetermined thickness on at least a portion of one side of the translucent layer 300.

As described above, in a home appliance such as a refrigerator to which a non-conductive translucent metallic color thin film is applied according to an embodiment of the present invention, when one side of the glass substrate 100 is an indoor space side of a home appliance such as a refrigerator, one side direction of the glass substrate When the light is turned on, light is incident on the translucent layer 300, passes through the color layer 200, and is transmitted to the other side of the glass substrate 100. Accordingly, a user or the like can visually check the state of an internal space of an electronic product such as a refrigerator from the outside.

Conversely, when the interior lighting of the refrigerator, which is one side of the glass substrate 100, is turned off, the interior space becomes dark and the interior space is not visible from the outside.

A method of manufacturing such a non-conductive translucent metallic color thin film will be described with further reference to FIGS. 2 and 3.

2 is a flow chart schematically showing a method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention, and FIG. 3 is a vision by sputtering in the method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention. As a conceptual diagram schematically showing the formation of a conductive translucent metallic colored thin film, it is a diagram schematically showing the inner space of a sputter.

1 to 3, a method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention comprises a substrate preparation step, a color layer forming step, and a semi-transparent layer forming step, more preferably resin It may be made by further including a layer forming step.

<< S110>>

The substrate preparation step (S110) is a step of preparing a glass substrate 100 that transmits light.

Here, it is also preferable to use tempered glass as the glass substrate 100.

<< S120>>

The color layer forming step S120 is a step of forming a color layer 200 on at least a portion of one side of the glass substrate 100 prepared in the substrate preparation step S110.

Here, one side may be understood as a direction from the outside to the inside of the refrigerator when the non-conductive metallic colored thin film is applied to a home appliance such as a refrigerator.

In FIG. 2, a color layer 200 is formed on one side of the glass substrate 100 as shown in FIG. 2 as one side is an upper side in the drawing.

The color layer 200 is a layer exhibiting a specific color, and forms the color layer 200 to exhibit a metallic color, which is a metal color to be implemented.

As a method of forming the color layer 200, various methods may be possible, and preferably, it may be formed by sputtering.

As a more specific example, after inserting the glass substrate 100 into the sputter to form the color layer 200 having a metallic color to be implemented, the glass substrate ( 100) The color layer 200 may be implemented by sputtering a target material on at least a portion of one side.

In FIG. 3, gas supplied for sputtering is introduced from the outside through a gas supply pipe 20. Here, argon, nitrogen, or the like may be used as the supply gas. The supply gas is injected into the deposition space in the sputter through a gas hole formed in the gas supply pipe.

Then, in a plasma environment, the planar cathode target material is sputtered toward the glass substrate 100 to be deposited. In FIG. 3, reference numeral 33 denotes a deposition direction from the planar cathode target material to the substrate side, and reference numeral 27 denotes a gas flow.

It is preferable to form the color layer 200 so that the refractive index of the color layer 200 with respect to light incident from the glass substrate 100 side has a value between 2.0 and 2.5.

It is preferable to selectively determine the refractive index of the color layer 200 by controlling the thickness formed by depositing the color layer 200.

The color layer 200 formed in the color layer forming step S120 is preferably formed of a compound of Zr and N.

Here, various materials may be possible as a target material for sputtering, but it is preferable to use Zr (zirconium) as a cathode target matter in order to implement metallic color.

And it is preferable to form the sputter by sputtering in an atmosphere of argon and nitrogen. In addition, it is preferable to use Zr as a material for a planar cathode target.

The color of the color layer 200 formed through the color layer forming step S120 may be determined by the thickness of the color layer 200 formed by depositing Zr and N on at least a portion of one side of the glass substrate 100.

In the color layer 200 formed in the color layer forming step (S120), it is preferable that at least some of the compounds of Zr and N have a combination ratio of Zr and N of 1:0.9 to 1:1. Here, more preferably, the combination ratio of Zr and N is 1:0.9 to 1:1, and the ratio of the compound of Zr and N in the color layer is 80% to 100%.

Table 1 shows the thickness of the ZrN layer, which is the color layer 200 formed by sputtering zirconium, and colors implemented according to the thickness of the ZrN layer.

metallic color thickness gold 10 to 30 nm pink 40 to 60 nm blue 70 to 90 nm green 100 to 120 nm red 130 to 150 nm

As shown in Table 1, it is preferable that the thickness of the color layer 200 has a value between 10 and 150 nm. In addition, as shown in Table 1, images implemented in different metallic colors according to the deposition thickness of ZrN formed as the color layer 200 are shown in FIG. 4.

In this way, the thickness at which ZrN is deposited can be selectively set, and accordingly, a metal color to be realized, that is, a metallic color, can be realized by depositing.

<< S130 >>

The translucent layer forming step S130 is a step of forming the translucent layer 300 on at least a portion of one side of the color layer 200 formed in the color layer forming step S120.

It is preferable that the translucent layer 300 formed in the translucent layer forming step S130 has a transmittance of 5% to 20% for light incident and proceeding from the other side of the glass substrate 100 in one direction.

In addition, it is preferable that the light absorption rate of the translucent layer 300 is 60% to 80%.

The translucent layer 300 may be formed by using a sputter having a structure as shown in FIG. 3. In addition, while forming the translucent layer 300, by controlling the thickness at which the translucent layer 300 is deposited, the transmittance or light absorption of the translucent layer 300 may be selectively determined.

The translucent layer 300 is preferably formed of a compound of copper and oxygen. In order to form the translucent layer 300, it is also preferable to use copper as a flat negative electrode target material and supply oxygen into the sputter to form the translucent layer 300.

For example, the translucent layer 300 may be deposited under conditions of supplying plasma DC power of 3 kilowatts and supplying 50 sccm of argon and 10 to 20 sccm/kW of oxygen under a vacuum pressure of 1 to 10 mtorr.

In addition, in the semitransparent layer 300 formed of a compound of copper and oxygen through the translucent layer forming step (S130), at least some of the compounds of copper and oxygen preferably have a combination ratio of copper and oxygen of 4:2.9 to 4:3.1 Do.

More preferably, a copper-oxygen compound having a combination ratio of copper and oxygen of 4:2.9 to 4:3.1 is formed so that the proportion of the compound of copper and oxygen in the translucent layer 300 is 80% to 100%.

가 형성된 것을 확인할 수 있다.An XRD analysis graph for the translucent layer 300 formed as described above is shown in FIG. 5,

It can be seen that is formed.

It is preferable that the translucent layer 300 containing copper and oxygen has a thickness of 200 to 400 nanometers.

(mega ohm per square) 에 해당되는 것이 바람직하다. And, the sheet resistance value of the translucent layer 300 formed through the translucent layer forming step (S130) is 8 to 50

It is preferable to correspond to (mega ohm per square).

The semi-transparent layer 300 preferably has a large sheet resistance value so that a correct switching operation can be performed when the touch sensor is attached.

As described above, the non-conductive translucent metallic color thin film 10 can be formed through the substrate preparation step (S110), the color layer forming step (S120), and the translucent layer forming step (S130). It is also preferable to further include a forming step (S140).

<< S140 >>

The resin layer forming step (S140) is a step of forming a resin layer on at least a portion of one side of the translucent layer 300 formed in the translucent layer forming step (S130).

It is preferable that the resin layer (not shown) formed in the resin layer forming step S140 has transmittance to light. If necessary, it is also preferable to form a black resin layer instead of the transparent resin layer.

As mentioned above, a touch sensor may be disposed on one side of the resin layer thus formed.

As described above with reference to FIGS. 1 to 5, a non-conductive translucent metallic color thin film can be manufactured according to the method of manufacturing a non-conductive translucent metallic color thin film according to an embodiment of the present invention.

As described above, the non-conductive translucent metallic color thin film and its manufacturing method according to the present invention have a high sheet resistance value so that the correct switching operation of the touch panel is possible, and when the indoor light of the refrigerator is turned on, it can be confirmed by seeing through the interior space. In addition, when the indoor lighting of the refrigerator is turned off, a thin film capable of implementing a metallic color is provided so that the color of the exterior material can be matched.

As described above, a detailed description of the present invention has been made by the embodiments with reference to the accompanying drawings, but the above-described embodiments are only described with reference to preferred embodiments of the present invention, so that the present invention is described above. It should not be construed as being limited to the embodiments, and the scope of the present invention should be understood as the following claims and equivalent concepts.

10: Non-conductive translucent metallic color thin film
100: glass substrate
200: color layer
300: translucent layer

Claims (24)

A substrate preparation step of preparing a glass substrate having transmittance to light;
A color layer forming step of forming a color layer on at least a portion of one side of the glass substrate prepared in the substrate preparation step; And
Including a semi-transparent layer forming step of forming a semi-transparent layer on at least a portion of one side of the color layer formed in the color layer forming step;
The translucent layer formed in the translucent layer forming step,
It is characterized in that the transmittance of light incident and proceeding from the other side of the glass substrate in one direction is 5% to 20%,
The light absorption rate of the translucent layer formed in the translucent layer forming step is 60% to 80%, and by controlling the thickness at which the translucent layer is deposited, the transmittance or light absorption of the translucent layer is selectively determined,
The translucent layer formed in the translucent layer forming step is characterized in that it is formed of a compound of copper and oxygen,
Non-conductive translucent metallic color thin film manufacturing method.
delete delete delete The method of claim 1,
The sheet resistance value of the translucent layer formed through the translucent layer forming step is 8 to 50

Characterized in that corresponding to (mega ohm per square),
Non-conductive translucent metallic color thin film manufacturing method.
The method of claim 1,
At least some of the compounds of copper and oxygen in the translucent layer,
Characterized in that the bonding ratio of copper and oxygen is 4:2.9 to 4:3.1,
Non-conductive translucent metallic color thin film manufacturing method.
delete The method of claim 1,
In the color layer forming step,
The color layer is formed so that the refractive index of the color layer with respect to light incident and proceeding from the glass substrate side has a value between 2.0 and 2.5,
Non-conductive translucent metallic color thin film manufacturing method.
The method of claim 8,
In the color layer forming step,
Characterized in that the refractive index of the color layer is selectively determined by controlling the thickness formed by depositing the color layer,
Non-conductive translucent metallic colored thin film manufacturing method.
The method of claim 9,
The color layer formed in the color layer forming step is characterized in that it is formed of a compound of Zr and N,
Non-conductive translucent metallic colored thin film manufacturing method.
The method of claim 10,
The color of the color layer formed through the color layer forming step,
It characterized in that it is determined by the thickness of the color layer formed by depositing Zr and N on at least a portion of one side of the glass substrate,
Non-conductive translucent metallic color thin film manufacturing method.
The method of claim 10,
At least some of the compounds of Zr and N in the color layer,
Characterized in that the bonding ratio of Zr and N is 1: 0.9 to 1: 1,
Non-conductive translucent metallic color thin film manufacturing method.
delete The method of claim 1,
A resin layer forming step of forming a resin layer having transmittance to light on at least a portion of one side of the translucent layer formed in the translucent layer forming step; characterized in that it further comprises,
Non-conductive translucent metallic color thin film manufacturing method.
Glass substrate;
A color layer formed on at least a portion of one side of the glass substrate to have a predetermined thickness; And
Including; a semi-transparent layer formed with a predetermined thickness on at least a portion of one side of the color layer,
The translucent layer has a light absorption rate of 60% to 80%,
The translucent layer is characterized in that formed of a compound of copper and oxygen,
Non-conductive translucent metallic colored thin film.
delete The method of claim 15,
The sheet resistance value of the translucent layer is 8 to 50

Characterized in that corresponding to (mega ohm per square),
Non-conductive translucent metallic colored thin film.
The method of claim 15,
At least some of the compounds of copper and oxygen in the translucent layer,
Characterized in that the bonding ratio of copper and oxygen is 4:2.9 to 4:3.1,
Non-conductive translucent metallic colored thin film.
delete The method of claim 15,
The color layer,
Characterized in that the refractive index of the light incident from the glass substrate side to proceed has a value between 2.0 to 2.5,
Non-conductive translucent metallic colored thin film.
The method of claim 20,
The color layer is characterized in that formed of a compound of Zr and N,
Non-conductive translucent metallic colored thin film.
The method of claim 21,
At least some of the compounds of Zr and N in the color layer,
Characterized in that the bonding ratio of Zr and N is 1: 0.9 to 1: 1,
Non-conductive translucent metallic colored thin film.
delete The method of claim 15,
It characterized in that it further comprises; a resin layer that has transmittance to light and is formed at least a portion of the translucent layer to have a predetermined thickness,
Non-conductive translucent metallic colored thin film.

Images