CN110484862A - Composite coating Logo and preparation method thereof with include its ceramic cover plate and electronic equipment - Google Patents
Composite coating Logo and preparation method thereof with include its ceramic cover plate and electronic equipment Download PDFInfo
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- CN110484862A CN110484862A CN201810465057.7A CN201810465057A CN110484862A CN 110484862 A CN110484862 A CN 110484862A CN 201810465057 A CN201810465057 A CN 201810465057A CN 110484862 A CN110484862 A CN 110484862A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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Abstract
The present invention provides a kind of composite coating Logo and preparation method thereof with comprising its ceramic cover plate and electronic equipment, is related to ceramic panel technical field.Composite coating Logo includes chromium metal layer for contacting with ceramic substrate and the optical layer for being set to the chromium layer on surface of metal, the optical layer is the combination of silicon oxide layer and silicon nitride layer, can be alleviated using composite coating Logo lack in the prior art it is a kind of have can colored Logo in conjunction with ceramic matrix the technical issues of, reach different clients to the technical effect of Logo color individual demand.
Description
Technical field
The present invention relates to ceramic panel technical fields, more particularly, to a kind of composite coating Logo and preparation method thereof and packet
Containing its ceramic cover plate and electronic equipment.
Background technique
With universal, appearance requirement of the consumer to electronic product of smart electronics product such as mobile phone, computer, TV etc.
It is higher and higher.It takes the mobile phone as an example, the cell phone rear cover of non-metallic material has become most electronic product manufacturers middle and high end machine at present
One of the design direction that type is pursued, the coming years, smart phone rear cover will gradually from metal material become with ceramics, glass,
Jewel is the non-metallic material of main representative.
Since ceramics belong to transparent materials, unlike glass can be in product back side silk-screen different colours logo, then by just
Face shows different colours to reach client to the individual demand of logo, thus causes the Logo on current ceramic cover plate most
For metal patterns such as single black or white, there is no the Logo of personalized multicolour pattern.
In view of this, the present invention is specifically proposed.
Summary of the invention
The first object of the present invention is to provide a kind of composite coating Logo, lacks one kind in the prior art to alleviate and has
Can colored Logo in conjunction with ceramic matrix the technical issues of.
The second object of the present invention is to provide the preparation method of composite coating Logo a kind of, can made pottery using this method
A kind of Logo of porcelain substrate surface is prepared when front observation to be when silver color and side are observed be bluish-green colour system.
The third object of the present invention is to provide a kind of ceramic cover plate, and the fourth object of the present invention is to provide a kind of electronics
Equipment, to meet requirement of the different clients to Logo color personalization.
In order to realize above-mentioned purpose of the invention, the following technical scheme is adopted:
A kind of composite coating Logo including the chromium metal layer for contacting with ceramic substrate and is set to the chromium metal layer
The optical layer on surface, the optical layer are the combination of silicon oxide layer and silicon nitride layer.
Further, it is equipped between the chromium metal layer and the optical layer for increasing the chromium metal layer and the light
Learn the transition zone of layer binding force；
Preferably, the transition zone is chromium metallic compound；
Preferably, the chromium metallic compound is chromium nitride；
Preferably, the transition zone with a thickness of 0.1-200nm, preferably 10-200nm.
Further, the optical layer includes the first optical layer and the second optical layer, and first optical layer includes alternating
The silicon oxide layer and silicon nitride layer of setting, second optical layer are silicon oxide layer, the silicon oxide layer in first optical layer
It is contacted with the chromium metal layer or transition zone；
Preferably, the number of plies of silicon oxide layer and silicon nitride layer is respectively 1~4 layer in first optical layer, and the oxygen
SiClx layer is identical with the number of plies of the silicon nitride layer；
Preferably, in first optical layer mono-layer oxidized silicon layer with a thickness of 70~90nm, preferably 75~85nm, it is single
Layer silicon nitride layer with a thickness of 50~100nm, preferably 60~90nm；
Preferably, in second optical layer silicon oxide layer with a thickness of 60~85nm, preferably 65~80nm.
Further, the chromium metal layer with a thickness of 30~70nm, preferably 40~60nm.
A kind of preparation method of above-mentioned composite coating Logo, provides ceramic substrate, in the ceramic base plate surface successively shape
At (a) chromium metal layer, (b) optionally transition zone, and (c) optical layer obtains the composite coating Logo.
Further, chromium metal layer and optionally transition zone are prepared in ceramic base plate surface using magnetically controlled sputter method,
Optical layer is prepared in the chromium metal layer or transition layer surface using magnetically controlled sputter method again, obtains the composite coating Logo.
Further, chromium target is selected to deposit chromium metal layer, chromium metal layer on ceramic matrix surface using magnetically controlled sputter method
Magnetron sputtering technique parameter include: chromium 6000~7000W of target power output, 80~120sccm of argon flow, deposition rate 0.03~
0.3nm/s；
Preferably, select chromium target using magnetically controlled sputter method in chromium layer on surface of metal sedimenting chromium chloride transition zone, chromium nitride
The magnetron sputtering technique parameter of transition zone includes: chromium target power output 6000~7000W, RF 1500~3000W of power, argon flow 0
~150sccm, 40~80sccm of nitrogen flow, 0.1~0.4nm/s of deposition rate；
Preferably, select silicon target using magnetically controlled sputter method in chromium metal layer or transition layer surface alternating deposit silicon oxide layer
And silicon nitride layer；
The magnetron sputtering technique parameter of silicon oxide layer includes: silicon target power 6000~8000W, RF 1000~3000W of power,
0~150sccm of argon flow, 120~150sccm of oxygen flow, 0.2~0.4nm/s of deposition rate；
The magnetron sputtering technique parameter of silicon nitride layer includes: silicon target power 6000~8000W, RF 1000~3000W of power,
0~150sccm of argon flow, stream of nitrogen gas 30~80sccm of amount, 0.2~0.4nm/s of deposition rate.
Further, the pierced pattern of Logo, then benefit are first formed in the ceramic base plate surface using protective film or ink
Composite coating Logo is prepared with the magnetically controlled sputter method；
Preferably, by surface be formed with pierced pattern ceramic substrate carry out plasma surface treatment after recycle described in
Magnetically controlled sputter method prepares composite coating Logo；
Preferably, the technological parameter of plasma surface treatment includes: background vacuum 3.0~4.0 × 10-4Pa, RF function
2000~3000W of rate, 80~300sccm of argon flow, 80~300sccm of oxygen flow handle 180~1200s of time.
A kind of ceramic cover plate, including ceramic substrate and be set to the ceramic base plate surface above-mentioned composite coating Logo or
The composite coating Logo obtained using above-mentioned preparation method.
A kind of electronic equipment, including above-mentioned ceramic cover plate.
Compared with the prior art, the invention has the following beneficial effects:
Composite coating Logo provided by the invention includes chromium metal layer and optical layer, wherein chromium metal layer is used for and ceramics
Substrate contact, since crome metal shows silver color, silver color is shown when composite coating Logo of the invention is in terms of front；Meanwhile
One layer of optical layer being combined by silicon oxide layer and silicon nitride layer is covered in chromium layer on surface of metal, is somebody's turn to do when in different side observations
When composite coating Logo, since the projection, refraction and reflex of light can show different colors.By changing optical layer
The available different colors a variety of from blue-green to green etc. of the built-up sequence and thickness of middle silicon oxide layer and silicon nitride layer.
In addition, since the binding force of crome metal and ceramic matrix is relatively high, Logo and ceramic base provided by the invention
The adhesive force of body is higher；Meanwhile the present invention can be improved by selecting the combination of silicon oxide layer and silicon nitride layer as optical layer
The adhesion strength of Logo.
Detailed description of the invention
It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution in the prior art
Embodiment or attached drawing needed to be used in the description of the prior art be briefly described, it should be apparent that, it is described below
Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor
It puts, is also possible to obtain other drawings based on these drawings.
Fig. 1 is the structural schematic diagram for the composite coating Logo that the embodiment of the present invention 1 provides；
Fig. 2 is the overlooking structure diagram of the ceramic cover plate in the embodiment of the present invention 2；
Fig. 3 is the schematic diagram of the section structure of the ceramic cover plate in the embodiment of the present invention 2；
Fig. 4 is the structural schematic diagram for the composite coating Logo that the embodiment of the present invention 3 provides；
Fig. 5 is the schematic diagram of the section structure of the ceramic cover plate in the embodiment of the present invention 4.
Icon: 10- ceramic substrate；20-Logo；21- chromium metal layer；22- silicon oxide layer；23- silicon nitride layer；24- nitridation
Chromium transition zone.
Specific embodiment
Technical solution of the present invention is clearly and completely described below in conjunction with attached drawing, it is clear that described implementation
Example is a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill
Personnel's every other embodiment obtained without making creative work, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that term " center ", "upper", "lower", "left", "right", "vertical",
The orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" be based on the orientation or positional relationship shown in the drawings, merely to
Convenient for description the present invention and simplify description, rather than the device or element of indication or suggestion meaning must have a particular orientation,
It is constructed and operated in a specific orientation, therefore is not considered as limiting the invention.In addition, term " first ", " second " are only
For descriptive purposes, it is not understood to indicate or imply relative importance.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be mechanical connection, it is also possible to be electrically connected；It can be directly connected, can also can be indirectly connected through an intermediary
Connection inside two elements.For the ordinary skill in the art, above-mentioned term can be understood as the case may be
Concrete meaning in the present invention.
One aspect of the present invention provides a kind of composite coating Logo, including the chromium metal for contacting with ceramic substrate
Layer and the optical layer for being set to the chromium layer on surface of metal, the optical layer are the combination of silicon oxide layer and silicon nitride layer.
Composite coating Logo provided by the invention includes chromium metal layer and optical layer, wherein chromium metal layer is used for and ceramics
Substrate contact, since crome metal shows silver color, silver color is shown when composite coating Logo of the invention is in terms of front；Meanwhile
One layer of optical layer being combined by silicon oxide layer and silicon nitride layer is covered in chromium layer on surface of metal, is somebody's turn to do when in different side observations
When composite coating Logo, since the projection, refraction and reflex of light can show different colors.By changing optical layer
The available different colors a variety of from blue-green to green etc. of the built-up sequence and thickness of middle silicon oxide layer and silicon nitride layer.
In addition, since the binding force of crome metal and ceramic matrix is relatively high, Logo and ceramic base provided by the invention
The adhesive force of body is higher；Meanwhile the present invention can be improved by selecting the combination of silicon oxide layer and silicon nitride layer as optical layer
The adhesion strength of Logo.
It should be noted that the chromium metal layer in the present invention is for showing metallochrome, silicon oxide layer and silicon nitride layer composition
Optical layer for transmiting, reflect and reflect light source.When optical layer is with a thickness of nanoscale, when viewed from the front, chromium metal
The color of layer can be perceived as silver color through optical layer；And when viewing from the side, due to the presence of optical layer, light is in optics
Transmission, refraction occur in layer and reflects so as to be shown as the different colours between blue-green to green.
In the present invention, the optical layer only need to include silicon oxide layer and silicon nitride layer, and the present invention is not to optics
Silicon oxide layer and silicon nitride layer are made specific combination and are limited in layer, by adjusting the built-up sequence of silicon oxide layer and silicon nitride layer
By adjusting silicon oxide layer and silicon nitride layer thickness or adjust built-up sequence simultaneously and Logo that thickness can make exists
Different colors is shown between blue-green and green.
For example, the structure of optical layer includes but is not limited to: 1) being set in turn in the oxidation of chromium metal layer or transition layer surface
Silicon layer and silicon nitride layer；2) be set in turn in the silicon oxide layer of chromium metal layer or transition layer surface, silicon nitride layer, silicon oxide layer and
Silicon nitride layer；3) silicon oxide layer, silicon nitride layer, silicon oxide layer, the silicon nitride of chromium metal layer or transition layer surface are set in turn in
Layer and silicon oxide layer；4) silicon nitride layer and silicon oxide layer of chromium metal layer or transition layer surface are set in turn in；5) it sets gradually
In chromium metal layer or the silicon nitride layer of transition layer surface, silicon oxide layer, silicon nitride layer and silicon oxide layer；6) it is set in turn in chromium gold
Belong to layer or silicon nitride layer, silicon oxide layer, silicon nitride layer, silicon oxide layer and the silicon nitride layer of transition layer surface etc..
In certain embodiments of the present invention, it is equipped between the chromium metal layer and the optical layer described for increasing
The transition zone of chromium metal layer and the optical layer binding force.Transition is optionally set between chromium metal layer and optical layer
Layer, can be improved the adhesive force between chromium metal layer and optical layer.
Composite coating Logo in the present invention can be the combination of chromium metal layer and optical layer, be also possible to set gradually
The combination of chromium metal layer, transition zone and optical layer.
In certain embodiments of the present invention, the transition zone is chromium metallic compound.Optionally, the chromium metallization
Conjunction object is chromium nitride.Chromium nitride is selected while improving binding force between chromium metal layer and optical layer, may be used also as transition zone
To play the role of reducing the brightness of chromium metal layer, the color of chromium metal layer is made to seem softer.
In certain embodiments of the present invention, the transition zone with a thickness of 0.1-200nm, preferably 10-200nm.
In the above-described embodiment, the thickness of transition zone for example can be with are as follows: 0.1nm, 10nm, 50nm, 100nm, 150nm or
200nm。
In certain embodiments of the present invention, the optical layer includes the first optical layer and the second optical layer, and described the
One optical layer includes the silicon oxide layer and silicon nitride layer being arranged alternately, and second optical layer is silicon oxide layer, first light
The silicon oxide layer learned in layer is contacted with the chromium metal layer or transition zone；Optionally, in first optical layer silicon oxide layer and
The number of plies of silicon nitride layer is respectively 1~4 layer, and the silicon oxide layer is identical with the number of plies of the silicon nitride layer.Using above-mentioned knot
The optical layer of structure is available to be presented glaucous Logo from the side.
In the above-described embodiment, mono-layer oxidized silicon layer with a thickness of 70~90nm is preferably 75 in first optical layer
~85nm, silicon nitride layer with a thickness of 50~100nm, preferably 60~90nm；Optionally, silica in second optical layer
Layer with a thickness of 60~85nm, preferably 65~80nm；Optionally, the chromium metal layer with a thickness of 30~70nm, preferably
40~60nm.
The second aspect of the invention provides the preparation method of composite coating Logo a kind of, provides ceramic substrate, in institute
It states ceramic base plate surface and sequentially forms (a) chromium metal layer, (b) optionally transition zone, and (c) optical layer, obtain described compound
Coating Logo.
There are all advantages of above-mentioned composite coating Logo using the Logo that preparation method provided by the invention obtains, herein
It repeats no more.
In certain embodiments of the present invention, use magnetically controlled sputter method ceramic base plate surface prepare chromium metal layer with
And optionally transition zone, then optical layer is prepared in the chromium metal layer or transition layer surface using magnetically controlled sputter method, obtain institute
State composite coating Logo.Chromium metal layer, optical layer and optional transition zone are prepared using magnetically controlled sputter method, can be improved each
Bond strength between layer, and then improve the scratch resistance capability of Logo.
In certain embodiments of the present invention, chromium target is selected to deposit chromium on ceramic matrix surface using magnetically controlled sputter method
Metal layer, the magnetron sputtering technique parameter of chromium metal layer include: chromium 6000~7000W of target power output, and argon flow 80~
120sccm, 0.03~0.3nm/s of deposition rate；
Optionally, select chromium target using magnetically controlled sputter method in chromium layer on surface of metal sedimenting chromium chloride transition zone, chromium nitride
The magnetron sputtering technique parameter of transition zone includes: chromium target power output 6000~7000W, RF 1500~3000W of power, argon flow 0
~150sccm, 40~80sccm of nitrogen flow, 0.1~0.4nm/s of deposition rate.
In certain embodiments of the present invention, select silicon target using magnetically controlled sputter method in chromium metal layer or transition zone table
Face alternating deposit silicon oxide layer and silicon nitride layer；
The magnetron sputtering technique parameter of silicon oxide layer includes: silicon target power 6000~8000W, RF 1000~3000W of power,
0~150sccm of argon flow, 120~150sccm of oxygen flow, 0.2~0.4nm/s of deposition rate；
The magnetron sputtering technique parameter of silicon nitride layer includes: silicon target power 6000~8000W, RF 1000~3000W of power,
0~150sccm of argon flow, stream of nitrogen gas 30~80sccm of amount, 0.2~0.4nm/s of deposition rate.
In certain embodiments of the present invention, Logo first is formed in the ceramic base plate surface using protective film or ink
Pierced pattern, recycle the magnetically controlled sputter method to prepare composite coating Logo.
Ultrasonic cleaning first is carried out to ceramic matrix before pasting protective film or ink for screen printing, to remove ceramic matrix surface
It is dirty, then obtain Logo pattern on ceramic matrix surface using protective film or ink, after after carrying out preheating and drying processing
Magnetically controlled sputter method is recycled to prepare Logo.Such as can use magnetron sputtering coater and carry out preheating and drying processing, preheating is dry
Dry treatment conditions are as follows: vacuum degree 8 × 10-3Pa, 90~100 DEG C of tengsten lamp baking temperature, 12~18min of drying time.
In certain embodiments of the present invention, the ceramic substrate that surface is formed with pierced pattern is subjected to plasma body surface
The magnetically controlled sputter method is recycled to prepare composite coating Logo after surface treatment.Optionally, the technique of plasma surface treatment
Parameter includes: background vacuum 3.0~4.0 × 10-4Pa, RF 2000~3000W of power, 80~300sccm of argon flow, oxygen
80~300sccm of flow handles 180~1200s of time.
Using plasma process of surface treatment handles the ceramic matrix of Logo pattern, can remove ceramic matrix
The defect and impurity on surface further increases the binding force between ceramic matrix and chromium metal layer.
The third aspect of the invention provides a kind of ceramic cover plate, including ceramic substrate and is set to the ceramic substrate
The composite coating Logo on the surface or composite coating Logo obtained using above-mentioned preparation method.
The fourth aspect of the invention provides a kind of electronic equipment, including above-mentioned ceramic cover plate.
Below in conjunction with embodiment, the present invention will be further described in detail.
Embodiment 1
As shown in Figure 1, the present embodiment is a kind of composite coating Logo, including for the chromium metal layer in conjunction with ceramic substrate
21 and be bonded with chromium metal layer 21 setting optical layer, optical layer be the silicon oxide layer 22 set gradually, silicon nitride layer 23, oxidation
Silicon layer 22, silicon nitride layer 23 and silicon oxide layer 22.The thickness value of specific each layer is listed in table 1.
Composite coating Logo thicknesses of layers table in 1 embodiment 1 of table
With the composite coating Logo of above structure in the present embodiment, silver color is shown when viewed from the front, from side
When show blue-green.
Embodiment 2
As shown in Figures 2 and 3, the present embodiment is a kind of ceramic cover plate, including ceramic substrate 10 and is set to ceramic substrate
The Logo 20 that embodiment 1 on 10 provides, the preparation method of the ceramic cover plate in the present embodiment, comprising the following steps:
Step a): prepare bloom and throw bright ceramic product, cleaned using full-automatic 12 groove ultrasonic cleaning machine；
Step b): the production of hollow out Logo pattern is carried out by size tolerance requirements ink for screen printing, then detects whether to meet letter
Patience test request；
Step c): by the ceramic substrate for making hollow out Logo pattern be put into the transition chamber thereof of magnetron sputtering coater into
Row preheating and drying, the technological parameter of the process are as follows: be evacuated to 8.0 × 10-3Pa, while being added using the tengsten lamp baking in cavity
Hot 15min, 90 DEG C of baking temperature；
Step d): send the plated film to magnetron sputtering coater intracavitary ceramic substrate after the completion of preheating and drying, to ceramic base
Plate carries out plated film after carrying out plasma clean again, and the intracavitary background vacuum of plated film is in plasma clean and coating process
4.0×10-4Pa；Plasma cleaning process parameter is listed in table 2, and the coating process parameter of every tunic layer is listed in table 3；
2 plasma cleaning process parameter of table
| RF power (w) | Ar/sccm | O2/sccm | Time/s |
| 3000 | 120 | 100 | 300 |
The coating process parameter of the every tunic layer of table 3
Step e): the ceramic substrate for completing plated film is carried out to take off plating ink processing, and uses full-automatic 12 groove ultrasonic
Ceramic cover plate is obtained after cleaning machine cleaning.
Embodiment 3
As shown in figure 4, the present embodiment is a kind of composite coating Logo, including for the chromium metal layer in conjunction with ceramic substrate
21,21 surface of chromium metal layer is successively arranged chromium nitride transition zone 24 and optical layer, optical layer be the silicon oxide layer 22 set gradually,
Silicon nitride layer 23, silicon oxide layer 22, silicon nitride layer 23 and silicon oxide layer 22.The thickness value of specific each layer is listed in table 4.
Composite coating Logo thicknesses of layers table in 4 embodiment 3 of table
With the composite coating Logo of above structure in the present embodiment, silver color is shown when viewed from the front, from side
When show blue-green.Compared with the Logo in embodiment 1, brightness when showing silver color is lower.
Embodiment 4
As shown in figure 5, the present embodiment is a kind of ceramic cover plate, including ceramic substrate 10 and the reality being set on ceramic substrate
The Logo 20 of the offer of example 3, the preparation method of the ceramic cover plate in the present embodiment are provided, comprising the following steps:
Step a): prepare bloom and throw bright ceramic product, cleaned using full-automatic 12 groove ultrasonic cleaning machine；
Step b): the production of hollow out Logo pattern is carried out by size tolerance requirements ink for screen printing, then detects whether to meet letter
Patience test request；
Step c): by the ceramic substrate for making hollow out Logo pattern be put into the transition chamber thereof of magnetron sputtering coater into
Row preheating and drying, the technological parameter of the process are as follows: be evacuated to 8.0 × 10-3Pa, while being added using the tengsten lamp baking in cavity
Hot 15min, 90 DEG C of baking temperature；
Step d): send the plated film to magnetron sputtering coater intracavitary ceramic substrate after the completion of preheating and drying, to ceramic base
Plate carries out plated film after carrying out plasma clean again, and the intracavitary background vacuum of plated film is in plasma clean and coating process
4.0×10-4Pa；Plasma cleaning process parameter is listed in table 5, and the coating process parameter of every tunic layer is listed in table 6；
5 plasma cleaning process parameter of table
| RF power (w) | Ar/sccm | O2/sccm | Time/s |
| 3000 | 120 | 100 | 300 |
The coating process parameter of the every tunic layer of table 6
Step e): the ceramic substrate for completing plated film is carried out to take off plating ink processing, and uses full-automatic 12 groove ultrasonic
Ceramic cover plate is obtained after cleaning machine cleaning.
The Logo in ceramic cover plate provided respectively embodiment 2 and embodiment 4 is tested for the property, and is tested with colour photometer
Then the coloration of Logo again tests the pencil hardness of Logo, boiling performance, thermal cycle and thermal impact, test knot
Structure is listed in table 7.
7 test result of table
Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme.
Claims (10)
1. a kind of composite coating Logo, which is characterized in that including the chromium metal layer for contacting with ceramic substrate and be set to institute
The optical layer of chromium layer on surface of metal is stated, the optical layer is the combination of silicon oxide layer and silicon nitride layer.
2. composite coating Logo according to claim 1, which is characterized in that between the chromium metal layer and the optical layer
Equipped with the transition zone for increasing the chromium metal layer Yu the optical layer binding force；
Preferably, the transition zone is chromium metallic compound；
Preferably, the chromium metallic compound is chromium nitride；
Preferably, the transition zone with a thickness of 0.1-200nm, preferably 10-200nm.
3. composite coating Logo according to claim 1 or 2, which is characterized in that the optical layer includes the first optical layer
With the second optical layer, first optical layer includes the silicon oxide layer and silicon nitride layer being arranged alternately, and second optical layer is
Silicon oxide layer, the silicon oxide layer in first optical layer are contacted with the chromium metal layer or transition zone；
Preferably, the number of plies of silicon oxide layer and silicon nitride layer is respectively 1~4 layer in first optical layer, and the silica
Layer is identical with the number of plies of the silicon nitride layer；
Preferably, in first optical layer mono-layer oxidized silicon layer with a thickness of 70~90nm, preferably 75~85nm, single layer nitrogen
SiClx layer with a thickness of 50~100nm, preferably 60~90nm；
Preferably, in second optical layer silicon oxide layer with a thickness of 60~85nm, preferably 65~80nm.
4. composite coating Logo according to claim 1 or 2, which is characterized in that the chromium metal layer with a thickness of 30~
70nm, preferably 40~60nm.
5. a kind of preparation method of the described in any item composite coating Logo of claim 1-4, which is characterized in that provide ceramic base
Plate sequentially forms (a) chromium metal layer in the ceramic base plate surface, and (b) optionally transition zone, and (c) optical layer, obtains institute
State composite coating Logo.
6. preparation method according to claim 5, which is characterized in that using magnetically controlled sputter method in ceramic base plate surface system
Standby chromium metal layer and optionally transition zone, then light is prepared in the chromium metal layer or transition layer surface using magnetically controlled sputter method
Layer is learned, the composite coating Logo is obtained.
7. preparation method according to claim 6, which is characterized in that select chromium target using magnetically controlled sputter method in ceramic base
Body surface face deposits chromium metal layer, and the magnetron sputtering technique parameter of chromium metal layer includes: chromium 6000~7000W of target power output, argon gas stream
Measure 80~120sccm, 0.03~0.3nm/s of deposition rate；
Preferably, select chromium target using magnetically controlled sputter method in chromium layer on surface of metal sedimenting chromium chloride transition zone, chromium nitride transition
The magnetron sputtering technique parameter of layer includes: chromium target power output 6000~7000W, RF 1500~3000W of power, and argon flow 0~
150sccm, 40~80sccm of nitrogen flow, 0.1~0.4nm/s of deposition rate；
Preferably, select silicon target using magnetically controlled sputter method in chromium metal layer or transition layer surface alternating deposit silicon oxide layer and nitrogen
SiClx layer；
The magnetron sputtering technique parameter of silicon oxide layer includes: silicon target power 6000~8000W, RF 1000~3000W of power, argon gas
0~150sccm of flow, 120~150sccm of oxygen flow, 0.2~0.4nm/s of deposition rate；
The magnetron sputtering technique parameter of silicon nitride layer includes: silicon target power 6000~8000W, RF 1000~3000W of power, argon gas
0~150sccm of flow, stream of nitrogen gas 30~80sccm of amount, 0.2~0.4nm/s of deposition rate.
8. according to the described in any item preparation methods of claim 5-7, which is characterized in that first using protective film or ink described
Ceramic base plate surface forms the pierced pattern of Logo, and the magnetically controlled sputter method is recycled to prepare composite coating Logo；
Preferably, the magnetic control is recycled after the ceramic substrate that surface is formed with pierced pattern being carried out plasma surface treatment
Sputtering method prepares composite coating Logo；
Preferably, the technological parameter of plasma surface treatment includes: background vacuum 3.0~4.0 × 10-4Pa, RF power
2000~3000W, 80~300sccm of argon flow, 80~300sccm of oxygen flow handle 180~1200s of time.
9. a kind of ceramic cover plate, which is characterized in that including ceramic substrate and the claim for being set to the ceramic base plate surface
Compound painting 1-4 described in any item composite coating Logo or obtained using the described in any item preparation methods of claim 5-8
Layer Logo.
10. a kind of electronic equipment, which is characterized in that including ceramic cover plate as claimed in claim 9.
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|---|---|---|---|
| CN201810465057.7A CN110484862B (en) | 2018-05-15 | 2018-05-15 | Composite coating Logo, preparation method thereof, ceramic cover plate comprising composite coating Logo and electronic equipment comprising composite coating Logo |
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| CN201810465057.7A CN110484862B (en) | 2018-05-15 | 2018-05-15 | Composite coating Logo, preparation method thereof, ceramic cover plate comprising composite coating Logo and electronic equipment comprising composite coating Logo |
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| CN113549872A (en) * | 2020-04-07 | 2021-10-26 | 纳峰真空镀膜（上海）有限公司 | Black coating |
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| CN110484862B (en) | 2022-04-12 |
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