KR102143088B9 - 레지스트 박리액 조성물 - Google Patents

레지스트 박리액 조성물

Info

Publication number
KR102143088B9
KR102143088B9 KR1020190041486A KR20190041486A KR102143088B9 KR 102143088 B9 KR102143088 B9 KR 102143088B9 KR 1020190041486 A KR1020190041486 A KR 1020190041486A KR 20190041486 A KR20190041486 A KR 20190041486A KR 102143088 B9 KR102143088 B9 KR 102143088B9
Authority
KR
South Korea
Prior art keywords
composiotion
resist stripper
stripper
resist
stripper composiotion
Prior art date
Application number
KR1020190041486A
Other languages
English (en)
Other versions
KR102143088B1 (ko
KR20190040165A (ko
Inventor
김정현
김성식
이유진
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020150110595A external-priority patent/KR101970039B1/ko
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020190041486A priority Critical patent/KR102143088B1/ko
Publication of KR20190040165A publication Critical patent/KR20190040165A/ko
Application granted granted Critical
Publication of KR102143088B1 publication Critical patent/KR102143088B1/ko
Publication of KR102143088B9 publication Critical patent/KR102143088B9/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020190041486A 2015-08-05 2019-04-09 레지스트 박리액 조성물 KR102143088B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020190041486A KR102143088B1 (ko) 2015-08-05 2019-04-09 레지스트 박리액 조성물

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020150110595A KR101970039B1 (ko) 2015-01-22 2015-08-05 레지스트 박리액 조성물
KR1020190041486A KR102143088B1 (ko) 2015-08-05 2019-04-09 레지스트 박리액 조성물

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020150110595A Division KR101970039B1 (ko) 2015-01-22 2015-08-05 레지스트 박리액 조성물

Publications (3)

Publication Number Publication Date
KR20190040165A KR20190040165A (ko) 2019-04-17
KR102143088B1 KR102143088B1 (ko) 2020-08-10
KR102143088B9 true KR102143088B9 (ko) 2022-06-24

Family

ID=82220013

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190041486A KR102143088B1 (ko) 2015-08-05 2019-04-09 레지스트 박리액 조성물

Country Status (1)

Country Link
KR (1) KR102143088B1 (ko)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100846057B1 (ko) 2005-05-13 2008-07-11 주식회사 엘지화학 포토레지스트용 스트리퍼 조성물
KR20090121650A (ko) * 2008-05-22 2009-11-26 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 레지스트의박리방법
KR101880303B1 (ko) * 2011-11-04 2018-07-20 동우 화인켐 주식회사 포토레지스트 박리액 조성물
KR101880308B1 (ko) * 2012-05-24 2018-07-19 동우 화인켐 주식회사 Ｔｆｔ 제조용 레지스트 박리제 조성물 및 이를 이용한 ｔｆｔ의 제조방법
KR101434284B1 (ko) * 2014-01-28 2014-08-26 재원산업 주식회사 포토레지스트 박리액 조성물

Also Published As

Publication number Publication date
KR102143088B1 (ko) 2020-08-10
KR20190040165A (ko) 2019-04-17

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Legal Events

Date Code Title Description
A107 Divisional application of patent
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
Z072 Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301]
Z131 Decision taken on request for patent cancellation [new post grant opposition system as of 20170301]
Z072 Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301]