KR102112020B1 - Apparatus for removing harmful material in material to be treated by using a plurality of plasma electrodes - Google Patents

Abstract

The present invention relates to an apparatus for removing harmful materials from materials to be processed generated from industrial sites and environmental processing facilities. The apparatus for removing harmful materials from materials to be processed comprises: a filter chamber in which materials to be processed are introduced; and a housing into which the materials to be processed having passed through the filter chamber are introduced, wherein the filter chamber includes an inlet into which the materials to be processed are introduced, a chamber main body connected to the inlet and including a receiving space, and an outlet connected to the chamber main body. The chamber main body includes plasma filters spaced apart from each other in multiple layers, and the plasma filters have plasma electrodes installed therein, wherein as plasma generated by the plasma electrodes generates ozone, harmful materials can be removed from the materials to be processed. The plasma filter comprises a square ring-shaped support unit; a first conducting wire interconnected in a longitudinal direction and spaced apart from each other on both sides inside the support unit, a plurality of first conducting wire connectors connected and spaced apart from each other in a longitudinal direction from the first conducting wire, and the plasma electrode detachably connected to the first conducting wire connectors. According to the above configuration, the present invention may provide an apparatus for removing harmful materials from materials to be processed by using a plasma filter, which may be used even when a disconnection occurs due to sparks or the like; shows excellent heat dissipation; and can improve discharging efficiency.

Description

Apparatus for removing harmful material in material to be treated by using a plurality of plasma electrodes}

The present invention relates to an apparatus for removing harmful substances from materials to be treated in industrial sites and environmental treatment facilities.

Hazardous substances that adversely affect human health or the environment include wastewater treatment facilities, manure treatment facilities, food waste treatment facilities, food processing plants, composting plants, petrochemical plants, tire plants, paint manufacturing plants, and coating plants. It occurs in the field and in environmental treatment facilities.

Typical harmful substances include odors such as ammonia (NH3), methyl mercaptan (MM), hydrogen sulfide (H2S), methyl sulfide (DMS), methyl disulfide (DMDS), trimethylamine (TMA), acetaldehyde, and styrene. Substances such as benzene, toluene, xylene, dichlorobenzene, dichloromethane, etc. may destroy volatile organic substances (VOCs) that destroy the atmospheric ozone layer or are harmful to the human body. Emissions of these hazardous substances are strongly regulated at the national level, and substances subject to regulation are gradually expanding.

As a method for removing harmful substances, various technologies such as a method using a microorganism such as a catalyst, ultraviolet light, ozone, plasma oxidation method, bio filter, biological treatment are used from physical methods including absorption, adsorption, and combustion.

Ozone has a strong oxidizing power after fluorine (F ₂ ), and is widely used for sterilization of waste water and water, decolorization, and oxidation of organic substances. In addition, when removing harmful substances by ozone, there is almost no maintenance cost other than the power cost, and there is an advantage that it is easy to manage and has a high processing speed due to oxidative decomposition in a short time in the air.

Accordingly, recently, a method of removing harmful substances with ozone generated in a plasma process has been used.

1 is a view showing a filter cartridge including a conventional plasma filter. FIG. 2 is a diagram showing the plasma filter of FIG. 1.

The filter cartridge includes an upper case 11 and a lower case 12 that are fastened to each other to have a receiving space therein, and a biofilter and a plasma filter 20 stacked in the receiving space. The filter cartridge is configured such that the upper case 11 and the lower case 12 are fastened in a state where the plasma filter 20 is accommodated therein, so that exchange or movement is easy.

The plasma filter 20 includes a support 21 having a plurality of openings and a plasma generating electrode module 22 that is flexible and is bent and fixed to the support 21 as a whole. The support 21 is provided with a fixing portion 21a for fixing the plasma generating electrode module 22.

When electricity is applied to the plasma filter 20, plasma is generated, and accordingly ozone is generated to decompose harmful substances.

In the conventional filter cartridge, several biofilters are located inside the receiving space formed by the upper case 11 and the lower case 12, and the plasma filter 20 is located in the center of the biofilter, thereby providing a plasma filter ( It has a structure in which heat generated in 20) is difficult to dissipate well.

In addition, the moisture, oil, tar, etc. contained in the harmful substances are not well discharged, so they are distributed around the plasma filter 20, and such moisture has a problem of lowering plasma discharge efficiency.

In addition, when oil, tar, etc. contained in harmful substances are burned in the discharge process, sparks are generated, and there is a possibility of disconnection of the plasma generating electrode module 22.

When the plasma generating electrode modules 22 are connected in series and disconnected, ozone is not generated, and thus, it is impossible to remove harmful substances.

Particularly, a filter cartridge having such a structure can be used in low-concentration hazardous substances with a low degree of contamination, but has a problem in that it is difficult to use it due to a decrease in discharge efficiency in high-concentration hazardous substances having a large amount of moisture, oil, and tar.

Accordingly, there is a need for a device for removing harmful substances having a plasma filter that can be used even if a disconnection occurs due to sparks or the like and has excellent heat dissipation and can improve discharge efficiency.

Republic of Korea Registered Patent No. 10-1811752 Republic of Korea Registered Patent No. 10-1810926

Accordingly, an object of the present invention is to provide a device for removing harmful substances from a material to be treated by using a plasma filter that can be used even if a disconnection occurs due to sparks, etc., and has excellent heat dissipation and can improve discharge efficiency. There is this.

An apparatus for removing harmful substances from a substance to be treated according to the present invention for realizing the object as described above includes: a filter chamber through which the substance to be treated flows; A housing through which the material to be treated passes through the filter chamber; A first cleaning unit for cleaning the material to be treated by filling the inner bottom of the housing with water; A primary filter unit which is located above the primary washing unit and uniformly disperses the material to be treated; A second cleaning unit that is located on the upper portion of the primary filter to spray the cleaning liquid to clean the material to be treated; A secondary filter unit positioned on the secondary cleaning unit and uniformly dispersing the material to be treated again; A third washing unit that is located at the upper portion of the second filter unit to spray the washing liquid to clean the material to be treated; The filter chamber includes an inlet through which a material to be treated is introduced, a chamber body connected to the inlet and having an accommodation space, and an outlet connected to the chamber body, wherein the plasma filter includes a multi-stage plasma filter. Placing apart from each other, a plasma electrode is installed in the plasma filter, and ozone is generated by the plasma generated by the plasma electrode to remove harmful substances from the material to be treated.

In addition, the plasma filter has a rectangular ring-shaped support, a first conductor connected longitudinally to each other on both sides of the support, and a plurality of first conductor interconnects connected to the first conductor in the longitudinal direction. And, including the plasma electrode is detachably connected to the first conductor connection, it is possible to adjust the number of the plasma electrode connected to the first conductor connection according to the degree of contamination of the material to be treated.

According to another embodiment of the present invention, a filter chamber into which a material to be treated for removing harmful substances is introduced includes an inlet through which a material to be treated is introduced; A chamber body connected to the inlet and having a receiving space; An outlet connected to the chamber body; A plasma filter spaced apart in multiple stages from the chamber body; A plasma electrode is installed in the plasma filter, and ozone is generated by the plasma generated by the plasma electrode to remove harmful substances from the material to be treated.

According to the present invention, it is possible to provide a device for removing harmful substances from a material to be treated by using a plasma filter that can be used even if a disconnection occurs due to sparks or the like and has excellent heat dissipation and can improve discharge efficiency. .

1 is a view showing a filter cartridge including a conventional plasma filter.
FIG. 2 is a diagram showing the plasma filter of FIG. 1.
3 is a view showing the configuration of a hazardous substance removal device according to an embodiment of the present invention.
4A is a cross-sectional view of the primary and secondary filter parts of the present invention, and (b) is a plan view of the primary and secondary filter parts.
5A is a cross-sectional view of the tertiary filter part of the present invention, and (b) is a plan view of the tertiary filter part.
6 is a view showing the configuration of a filter chamber according to an embodiment of the present invention.
FIG. 7 is a view showing a method of mounting the plasma filter in the filter chamber in FIG. 6.
8 is a diagram showing the configuration of the plasma filter of FIG. 6.
9 is a diagram illustrating a method of connecting a plasma electrode to a plasma filter in FIG. 8.
10 is a view showing another embodiment of the plasma filter of FIG. 6.
11 is a view showing the configuration of a filter chamber according to another embodiment of the present invention.
12 is a view showing the configuration of the baffle in FIG. 11.

Hereinafter, the configuration and operation of the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. Here, when adding reference numerals to the components of each drawing, it should be noted that the same components are denoted by the same reference numerals as much as possible even though they are displayed on different drawings.

3 is a view showing the configuration of a hazardous substance removal device according to an embodiment of the present invention. 4A is a cross-sectional view of the primary and secondary filter parts of the present invention, and (b) is a plan view of the primary and secondary filter parts. 5A is a cross-sectional view of the tertiary filter part of the present invention, and (b) is a plan view of the tertiary filter part. 6 is a view showing the configuration of a filter chamber according to an embodiment of the present invention. FIG. 7 is a view showing a method of mounting the plasma filter in the filter chamber in FIG. 6. 8 is a diagram showing the configuration of the plasma filter of FIG. 6. 9 is a diagram illustrating a method of connecting a plasma electrode to a plasma filter in FIG. 8. 10 is a view showing another embodiment of the plasma filter of FIG. 6.

3 to 6, an apparatus (hereinafter, a device) for removing harmful substances from a material to be treated according to the present invention includes a filter chamber 200, a housing 110, a first washing unit 130, and a first filter Includes a unit 140, a secondary washing unit 150, a secondary filtering unit 160, a tertiary washing unit 170, a tertiary filtering unit 180, a fourth washing unit 190 and a blower 120. .

The filter chamber 200 includes an inlet 211 through which a material to be treated flows, a chamber body 210 connected to the inlet 211 and having an accommodation space, and an outlet 212 connected to the chamber body 210. It includes.

The filter chamber 200 is made of a material having excellent corrosion resistance and durability (SUS) and preventing gas from leaking. The material to be treated may be introduced into the filter chamber 200 by the suction force provided by the blower 120.

The chamber body 210 includes a moisture removal filter 220 for removing moisture contained in the material to be treated, a plasma filter 230 having a plasma electrode, and an ozone removal filter 240 for removing ozone from the material to be treated ).

The plasma filter 230 is detachably mounted to the chamber body 210. The material to be treated flowing through the inlet 211 passes through the plurality of plasma filters 230 in turn and is discharged through the outlet 212.

The plasma filter 230 decomposes harmful substances by generating ozone while generating plasma at the plasma electrode. The configuration of the plasma filter 230 will be described later.

The housing 110 is made of a cylindrical container having a hollow inside, and an inlet 111 through which the material to be treated is introduced is formed on the lower side, and the material to be treated with odor removed is collected and discharged at the upper end. The outlet 112 is formed.

The outlet 212 of the filter chamber 200 is connected to the inlet 111 of the housing 110 through the inlet pipe 101 to supply the material to be treated discharged from the filter chamber 200 into the housing 110 do.

The housing 110 is made of a synthetic resin material such as FRP and plastic and a material having excellent corrosion resistance and durability (SUS) so as not to be corroded or damaged by water, acidic or alkaline cleaning solutions, and the primary washing ( 130), the first filter unit 140, the second washing unit 150, the second filtering unit 160, the third washing unit 170, the third filtering unit 180, and the fourth washing unit 190 are sequentially installed. do.

The primary cleaning unit 130 is located below the interior of the housing 110, and stores a certain amount of water or water mixed with a cleaning solution so that the material to be treated flowing into the interior of the housing 110 passes through the inlet 111. It consists of a water tank. On the side of the housing 110, a pipe (without a drawing symbol) for receiving and transferring water overflowing from the water tank forming the primary washing unit 130 is installed, and this pipe is provided with a separate washing water storage tank 131. By being connected, the height of the water stored in the housing 110 is always kept constant.

 The primary filter unit 140 is positioned above the primary cleaning unit 130 to remove the contaminants by passing the material to be treated through the primary cleaning unit 130. The primary filter unit 140 is made of polypropylene (PP, polypropylene) or polyethylene (PE, polyethylene) material as shown in Figure 4 (a), (b) is installed and the primary filter unit 140 A filling material (polling, media, etc.) is installed on the upper side to effectively remove contaminants from the material to be treated, and at the same time, the material to be treated flows uniformly through the entire filter.

In addition, the primary filter unit 140 does not moisturize because the filter is made of polypropylene or polyethylene, whereby moisture removed from the material to be passed through the primary filter unit 140 is located at the lower side. It can be easily dropped to the primary tax government 130.

The secondary cleaning unit 150 includes a first injection device 151 having a plurality of injection nozzles while being positioned above the primary filter unit 140. The first injection device 151 includes a cleaning solution supply pipe 152 for supplying a cleaning solution to the first injection device 151, as shown in FIG. The washing liquid stored in the washing water storage tank 131 is supplied to the first injection device 151 through the washing liquid supply pipe 152. The cleaning liquid supply pipe 152 is provided with a control valve (V1) for adjusting the supply amount of the cleaning liquid.

The secondary filter unit 160 is installed on the first injection device 151. The secondary filter unit 160 is made of a polypropylene or polyethylene (PE, polyethylene) material, like the primary filter unit 140, and is installed with fillings (polling, media, etc.) on top of the secondary filter unit 160. By doing so, the contaminants in the material to be treated are effectively removed, and the material to be treated flows uniformly throughout the filter.

Since the secondary filter unit 160 is made of polypropylene or polyethylene, it is not damaged by the cleaning liquid without moistening the moisture or the cleaning liquid, and the moisture removed from the material to be treated by the filter is easily dropped to the lower side to the primary cleaning. It may be stored in 130.

The third cleaning unit 170 includes a second injection device 171 having a plurality of injection nozzles while being positioned on the second filter unit 160. The second injection device 171 includes a cleaning solution supply pipe 172 for supplying a cleaning solution to the second injection device 171, as shown in FIG. The washing liquid stored in the washing water storage tank 131 is supplied to the second injection device 171 through the washing liquid supply pipe 172. The cleaning liquid supply pipe 172 is provided with a control valve V2 for adjusting the supply amount of the cleaning liquid.

Unlike the primary and secondary filter units 140 and 160, the tertiary filter unit 180 is disposed between the honeycomb filters 181 made of polypropylene in the horizontal direction as shown in FIGS. 5 (a) and 5 (b). The mesh-type polyurethane (PU, polyurethane) matrix filter 182 is alternately positioned, and the honeycomb filter 181 is filled with a filler 183 such as activated carbon or zeolite.

The tertiary filter unit 180 is prevented from generating excessive differential pressure before and after the filter because the matrix filter 182 is present between the honeycomb filters 181, and is coated by treating nanometals on a porous material such as activated carbon or zeolite or It has a structure to be filled. In addition, the remaining acidic or alkaline cleaning liquid and chemical liquid odors, such as chlorine odor, which are generated when the chemical liquid concentration is high, are effectively collected and mist that is scattered to the top is easily collected.

On the other hand, when collecting or removing odors or contaminants in the material to be treated by coating or filling nano-metal-treated porous activated carbon or zeolite, etc., they are formed on activated carbon or zeolite over time. In order to reduce pollutants, a device for spraying water or air is installed on the upper part of the tertiary filter part 180 to periodically backwash the tertiary filter part 180 provided with a filler such as activated carbon or zeolite. It is preferable to regenerate activated carbon or zeolite so that it can be used for a long time.

The third filter unit 180 is silver (Ag), aluminum (Al), iron (Fe), manganese (Mn) on the surface of the composite filter 182, as shown in Figure 5 (a), (b) , A coating portion 182 coated with an adsorbent such as activated carbon, zeolite, kaolin, and bentonite containing one or more nanometals of 30 nm or less, such as magnesium (Mg), copper (Cu), or zinc (Zn), is formed. Due to the arrangement and structure of the tertiary filter unit 180, the residual harmful substances contained in the treated material are removed once again and microorganisms are removed before the treated material is discharged to the outside through the outlet 112 of the housing 110. It will sterilize the back.

The fourth cleaning unit 190 includes a third injection device 191 having a plurality of injection nozzles while being positioned on the upper portion of the third filter unit 180. The third injection device 191 includes a cleaning solution supply pipe 192 for supplying a cleaning solution to the third injection device 191 as shown in FIG. 3. The washing liquid stored in the washing water storage tank 131 is supplied to the third injection device 191 through the washing liquid supply pipe 192. The cleaning liquid supply pipe 192 is provided with a control valve (V3) for adjusting the supply amount of the cleaning liquid.

The cleaning liquid supply and operation of the valves V1, V2, V3, etc. are controlled by a controller (not shown) attached to the side of the housing.

Hereinafter, the configuration of the filter chamber 200 and the plasma filter 230 will be described with reference to FIGS. 6 to 10.

6 and 7, the filter chamber 200 includes an inlet 211, a chamber body 210, and an outlet 212. A filter mounting portion 215 for detachably mounting the plasma filter 230 is formed on the chamber body 210.

The filter mounting unit 215 is provided with a power supply unit, and when the plasma filter 230 is mounted on the filter mounting unit 215, the filter mounting unit 215 is electrically connected to the power supply unit to supply power to the plasma filter 230.

8 and 9, the plasma filter 230 includes a square ring-shaped support portion 231 and first conductors 232 connected longitudinally to each other on both inner sides of the support portion 231, A plurality of first conductor connecting portions 232a connected to the first conductor 232 to be spaced apart in the longitudinal direction and plasma electrodes (or first plasma electrodes) 235 detachably connected to the first conductor connecting portion 232a ).

The plasma electrode 235 may include a cylindrical internal electrode, a cylindrical dielectric formed to surround the internal electrode, and a cylindrical external electrode formed to surround the dielectric.

The plasma electrode 235 is discharged at atmospheric pressure to generate plasma, and ozone is generated when the plasma is generated. Ozone generated from the plasma electrode 235 is in contact with the material to be treated so that harmful substances are decomposed.

The plasma electrode 235 that is detachably connected to the first conductor connection portion 232a is connected in parallel to the power supply, so that even if a break occurs in any one of the plasma electrodes 235 due to sparks, the rest of the plasma electrodes 235 It is possible to use the plasma filter 230. In addition, since the plasma electrode 235 in which a disconnection has occurred is removed from the first conductor connection portion 232a, a new plasma electrode 235 may be connected to facilitate maintenance.

Since the plasma electrodes 235 are spaced at predetermined intervals, the heat dissipation through the space between the plasma electrodes 235 is excellent.

In addition, since the number of plasma electrodes 235 connected to the first conductor connection portion 232a can be appropriately adjusted according to the degree of contamination of the material to be treated, electricity can be efficiently used.

In addition, since the moisture removal filter 220 disposed at the front end of the plasma filter 230 first removes moisture contained in the material to be treated, it prevents the discharge efficiency from being lowered due to moisture in the plasma filter 230.

The plasma filter 230 of the present invention is capable of removing contaminants while sufficiently maintaining discharge efficiency even in a high-concentration to-be-treated material having a large amount of moisture, oil, and tar.

Referring to FIG. 10, the plasma filter 230 is orthogonal to the first conductor 232 and is connected to the second conductor 233 spaced apart from each other on both inner sides of the support 231 and the second conductor ( 233) further includes a plurality of second conductor connecting portions 233a that are horizontally spaced apart from each other, and a plasma electrode (or second plasma electrode) 235 detachably connected to the second conductor connecting portion 233a. .

The first conductor 232 and the second conductor 233 are not electrically connected to each other. When the plasma filter 230 is mounted on the filter mounting portion 215, the first lead wire 232 and the second lead wire 233 are electrically connected to the power source to supply electricity to the plasma electrode 235.

In this embodiment, the plasma electrode 235 is connected to the support 231 in the longitudinal and transverse directions spaced apart from each other, while improving the concentration of ozone generated compared to the area of the plasma filter 230, excellent heat dissipation, and to be treated Efficient use of electricity is possible by increasing or decreasing the number of plasma electrodes 235 according to the degree of contamination of the material.

The ozone removal filter 240 is used to remove residual ozone after ozone generated in the plasma filter 230 is used for decomposing harmful gases (see FIG. 6). Residual ozone should be removed as much as possible because it is harmful to the human body when it is released without being removed.

The ozone removal filter 240 is composed of a filter matrix, an adsorbent attached to the filter matrix, and a nanometal-containing material, and may be configured by further filling an adsorption filler in the filter matrix. The filter matrix may include a porous matrix layer made of polypropylene and a polyurethane matrix layer.

In the filter matrix, the porous matrix layer and the polyurethane matrix layer can be stacked, and in this case, the deformation of the filter form can be prevented, and the harmful substances are more efficiently due to the different structures between the stacked matrix layers. Can be removed.

The ozone removal filter 240 is produced by preparing a coating slurry using activated carbon, zeolite, nanometal, etc., coating the coating slurry with a filter matrix, drying it, and then filling the filter matrix with an adsorption filler. Adsorption fillers are prepared by adding nanometals (Ag, Fe, Cu, Ni, Al, Mg, Ca, TiO2) to activated carbon, zeolite, and inorganic adsorbents, and filling and applying the porous matrix layer.

By applying the plasma filter 230 of the present invention, compared with the conventional plasma filter shown in FIG. 2, the removal efficiency of harmful substances was confirmed.

Prior art The present invention Power consumption (φ4mm) 100 W / m 70 W / m Ozone production 10kV, 0.31A, 50 ~ 70ppm / m 10kV, 0.24A, 70 ~ 100ppm / m

As can be seen from the above, the present invention has increased power consumption while reducing the amount of ozone generated.

At the same site, five sensory tests were performed using the treated material flowing into the filter chamber 200 of the present invention and the treated material flowing out. Here, the dilution factor means that a person dilutes to the extent that the odor is not felt.

Item (Number of measurements) Complex odor (inflow): diluted multiple Complex odor (spill): Dilution multiple One 100,000 1,000 2 44,814 448 3 66,943 448 4 30,000 128 5 100,000 144

As a result of the sensory test, it was confirmed that the treated substance flowing out compared to the treated substance flowing into the filter chamber 200 of the present invention has a dilution factor of about 100 times, and thus has an excellent effect of removing contaminants.

11 is a view showing the configuration of a filter chamber according to another embodiment of the present invention. 12 is a view showing the configuration of the baffle in FIG. 11.

The filter chamber 200 includes an inlet 211, a chamber body 210, and an outlet 212. The plasma filter 230 is spaced apart and mounted detachably on the chamber body 210, and a baffle 237 extending by a predetermined length is disposed in a zigzag form between the plasma filters 230.

The baffle 237 has a thin plate shape in which a plurality of openings 237a are spaced apart.

As the material to be treated flowing into the filter chamber 200 passes through the baffle 237, dispersion and residence time are increased to increase the efficiency of removing harmful substances by flowing into the plasma filter 230.

The baffle 237 extends with respect to a portion of the accommodation space of the chamber body 210, and a material to be treated passes through the portion where the baffle 237 is not formed and flows into the plasma filter 230. When the baffle 237 is formed over the entire area of the chamber body 210, pressure is increased and stagnation of the material to be treated may occur.

The material to be treated flowing into the chamber body 210 may pass through the baffle 237 and the plasma filter 230 through the outlet 212 as shown in the direction of the arrow.

In this embodiment, the baffle 237 is formed in a zigzag form between the plasma filters 230 to improve the efficiency of removing harmful substances by dispersing the material to be treated and increasing the residence time.

The present invention is not limited to the above embodiments and can be implemented in various modifications or variations without departing from the technical gist of the present invention, which is apparent to those skilled in the art to which the present invention pertains. will be.

11: upper case
12: lower case
20: plasma filter
110: housing
130: primary cleaning unit
140: primary filter unit
150: secondary cleaning unit
160: secondary filter unit
170: 3rd cleaning unit
180: 3rd filter unit
190: 4th cleaning unit
200: filter chamber
210: chamber body
211: inlet
212: outlet
215: filter mounting portion
220: moisture removal filter
230: plasma filter
231: support
232: first conductor
232a: first conductor connection
233: second conductor
233a: second conductor connection
235: plasma electrode
237: baffle
240: ozone removal filter

Claims (5)

In the device for removing harmful substances from the material to be treated,
A filter chamber through which the material to be treated flows;
A housing through which the material to be treated passes through the filter chamber;
A first cleaning unit for cleaning the material to be treated by filling the inner bottom of the housing with water;
A primary filter unit which is located above the primary washing unit and uniformly disperses the material to be treated;
A second cleaning unit that is located on the upper portion of the primary filter to spray the cleaning liquid to clean the material to be treated;
A secondary filter unit positioned on the secondary cleaning unit and uniformly dispersing the material to be treated again;
A third washing unit that is located at the upper portion of the second filter unit to spray the washing liquid to clean the material to be treated;
Including,
The filter chamber includes an inlet through which the material to be treated flows, a chamber body connected to the inlet and having an accommodation space, and an outlet connected to the chamber body,
Plasma filters are spaced apart in multiple stages in the chamber body,
The plasma filter includes a square ring-shaped support, a first conductor connected longitudinally spaced apart from each other on both sides of the support, and a plurality of first conductor interconnects connected longitudinally apart from the first conductor, A first plasma electrode detachably connected to the first conductor connection part, a second conductor orthogonal to the first conductor while being horizontally spaced apart from each other on both sides of the support part, and in the transverse direction to the second conductor And a plurality of second conductor connecting portions spaced apart and a second plasma electrode detachably connected to the second conductor connecting portions,
Ozone is generated by the plasma generated by the first plasma electrode and the second plasma electrode to remove harmful substances from the material to be treated,
Harmful substances in the material to be treated that can control the number of the first plasma electrodes connected to the first conductor connection and the number of the second plasma electrodes connected to the second conductor connection according to the degree of contamination of the material to be treated Device for removing it. delete According to claim 1,
A filter mounting portion for detachably mounting the plasma filter is formed in the filter chamber,
The filter mounting portion is provided with a power supply unit, and when the plasma filter is mounted on the filter mounting unit, a device for removing harmful substances from a material to be electrically connected to the power supply unit. delete delete

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