KR102106724B1 - X-ray generator and method, and sample measurement system - Google Patents

Abstract

Provided is an X-ray generating apparatus and method capable of selectively generating a point or line X-ray beam with a very simple device configuration, and a sample measurement system. In the electron generator 24 and the rotating counter electrode 26 provided in the X-ray generator 10, the electron source 32 and the circumferential surface portion 38 face each other, and the rotating shaft 36 is in the first direction. It is fixedly arranged in a positional relationship inclined with respect to the (Z direction) and the second direction (X direction).

Description

X-ray generator and method, and sample measurement system

The present invention relates to an X-ray generating apparatus and an X-ray generating method for generating X-rays using a so-called rotating counter-cathode method, and a sample measurement system comprising the X-ray generating apparatus.

Conventionally, in the measurement field, a method of selectively generating a linear or pointed X-ray beam by irradiating an electron beam on an outer circumferential surface of a rotating counter electrode to form a long focal length in a circumferential direction or a width direction is known ( Patent Document 1).

Japanese Patent Application Publication No. Hei 6-020629 (Fig. 1, Fig. 6, etc.)

In terms of ease of use at the time of measurement, it is desired that a device that selectively generates a linear or pointed X-ray beam achieves an improvement in output performance and an improvement in work efficiency by a simple device configuration.

The present invention has been made in view of the above-described problems, and an object of the present invention is to provide an X-ray generating apparatus and method capable of selectively generating an X-ray beam in a linear or dot shape, and a sample measurement system.

The "X-ray generator" according to the first aspect of the present invention is an electron source that emits a linear electron beam and an extension direction of the electron source while fixing the center position of the electron source in the first direction And an electron generator having a switching mechanism for switching to one of the second directions orthogonal to the first direction, and a circumferential surface portion for emitting an X-ray beam by colliding the electron beam from the electron source, and further comprising a rotation axis. A device having a circular or circumferential rotating counter electrode configured to be rotatable about, wherein the electron generator and the rotating counter electrode have the electron source and the circumferential surface facing each other, and the rotation axis The first direction and the second direction are fixedly arranged in a positional relationship inclined.

In this way, while fixing the center position of the electron source, a switching mechanism is formed to switch the extending direction of the electron source to either one of the first direction and the second direction orthogonal to the first direction, and the electron source and the circumference. Since the electron generator and the rotating counter electrode are fixedly arranged in a positional relationship where the surface portions face each other, the linear or dotted X is simply switched by simply changing the extension direction of the electron source without changing the position and orientation of the electron generator and the rotating counter electrode at all. The sun beam can be selectively generated.

Moreover, since the rotating countercatalyst is in a positional relationship in which its axis of rotation is inclined with respect to the first direction and the second direction, with respect to two focal points formed by the emission of electron beams from the first direction and the second direction, The amount of separation of the focal length traversing in the circumferential direction becomes small compared with the case where the rotating shaft is not inclined. In short, instead of lowering the output efficiency of the highest side, by increasing the output efficiency of the lowest side, the maximum amount that can be commonly output with both X-ray beams (in other words, the limit output of the X-rays) is raised.

This makes it possible to selectively generate a linear or dot X-ray beam with a very simple device configuration, and improve the output performance of the entire device.

Moreover, it is preferable that the rotation axis is inclined within the range of 30 to 60 degrees with respect to the first direction. Thereby, the amount of deviation of the focal length traversing in the circumferential direction, and more specifically, the ratio of the focal length can be suppressed to be substantially less than 2 times, and the difference in output performance between the two becomes smaller.

In addition, it is preferable that the rotation axis is inclined 45 degrees with respect to the first direction. Since the focal lengths traversed in the circumferential direction are the same, the limit output amount common to both X-ray beams is maximized.

The "X-ray generation method" according to the first aspect of the present invention includes an electron generator having an electron source that emits an electron beam on a line, and a circumferential surface portion that emits an X-ray beam by colliding the electron beam from the electron source. A method of using an X-ray generator having a disk-shaped or columnar rotating cathode configured to be rotatable about a rotation axis, wherein the electron source and the circumferential surface portions face each other, and A step in which the electron generator and the rotating counter electrode are fixedly arranged under a positional relationship in which the axis of rotation is inclined with respect to the first direction and the second direction orthogonal to the first direction, and the electrons while fixing the center position of the electron source And a step of switching the extending direction of the circle to either the first direction or the second direction.

The "sample measurement system" according to the first aspect of the present invention is an X-ray detector that detects an X-ray beam generated from any of the X-ray generators and the X-ray generator described above and transmitted or reflected through a sample. An apparatus and measurement means for measuring the physical quantity of the sample based on the detection amount of the X-ray beam detected by the X-ray detection apparatus are provided.

In addition, the "X-ray generator" according to the second aspect of the present invention is an X-ray beam by colliding an electron generator comprising an electron source emitting a linear electron beam and the electron beam from the electron source. A rotating counter electrode comprising a circumferential surface portion for exiting, and a chamber accommodating the electron source and the rotating counter electrode, wherein the electron generator and the rotating counter electrode have the electron source and the peripheral surface portion of each other. The electron generator is fixedly disposed in the chamber under an opposing positional relationship, and the electron generator is air-tightly inserted into the chamber with the support for supporting the electron source, and according to operation from outside the chamber. It further has a rotation introduction mechanism that rotates the support.

As described above, since the rotation introduction mechanism is formed to rotate the support for supporting the electron source according to the operation from the outside of the chamber, the replacement operation of the electron generator or the rotating counter electrode becomes unnecessary, and the electrons are maintained while maintaining the vacuum in the chamber. The direction of extension of the circle can be changed. This makes it possible to selectively generate a linear or dotted X-ray beam with a very simple device configuration, and suppress a decrease in work efficiency accompanying this selection.

Moreover, it is preferable that the said rotation introduction mechanism has the handle part arrange | positioned so that rotation is possible outside the said chamber, and it is preferable to rotate the said support according to the rotation operation of the said handle part. The operator can easily change the extending direction of the electron source by performing an operation to rotate the handle portion.

Moreover, it is preferable that the said rotation introduction mechanism further has the indication means which instructs the rotation state of the said handle part visually from the outside of the said chamber. The operator can at first glance and grasp the rotational state of the handle portion and the direction in which the electron source extends by acknowledging the position indicated by the pointing means from outside the chamber.

Moreover, it is preferable that the said rotation introduction mechanism further has rotation regulation means which regulates the rotation range of the said handle part. Thereby, it is possible to prevent the driving component of the electron source from being excessively twisted and broken.

Further, the rotation introduction mechanism is capable of changing the extension position of the electron source in a first direction and a second direction orthogonal to the first direction by the rotation operation of the support, and the rotation axis of the rotating countercathode is: It is preferable to incline with respect to the first direction and the second direction. With respect to the two focal points formed by the emission of the electron beams from the first direction and the second direction, the amount of separation in the focal length traversing in the circumferential direction becomes smaller compared to the case where the rotation axis is not inclined. In short, instead of lowering the output efficiency of the highest side, by increasing the output efficiency of the lowest side, the maximum amount that can be commonly output with both X-ray beams (in other words, the limit output of the X-rays) is raised.

The "sample measurement system" according to the second aspect of the present invention is an X-ray detection device that detects an X-ray beam generated from any of the X-ray generators described above and the X-ray generator device and transmitted or reflected through a sample. An apparatus and measurement means for measuring the physical quantity of the sample based on the detection amount of the X-ray beam detected by the X-ray detection apparatus are provided.

According to the X-ray generating apparatus and method and the sample measurement system according to the present invention, it is possible to improve the output performance or working efficiency of the entire apparatus while selectively generating a linear or dotted X-ray beam with a very simple apparatus configuration. have.

1 is a perspective view of an X-ray generator according to this embodiment.
2 is a cross-sectional view taken along line II-II of FIG. 1.
3 is a cross-sectional view taken along line III-III of FIG. 1.
4 is a schematic view showing the shape of an X-ray beam according to switching operations in the first direction and the second direction.
It is a schematic diagram which shows the formation position of a focal point at an inclination angle of 0 degrees.
6 is a schematic view showing a focal position at an inclination angle of 45 degrees.
7 is a graph showing the relationship between the inclination angle and the focal length in the circumferential direction.
8 is an overall configuration diagram of a sample measurement system equipped with the X-ray generator of FIG. 1.
9 is a perspective view of the X-ray generator according to the second embodiment.
10 is a cross-sectional view taken along line II-II of FIG. 9.
11 is a side view of the X-ray generator shown in FIG. 9.
12 is a cross-sectional view taken along line IV-IV in FIG. 9.
13 is a schematic view showing the shape of an X-ray beam according to switching operations in the first direction and the second direction.
14 is a graph showing the relationship between the inclination angle and the focal length in the circumferential direction.
15 is an overall configuration diagram of a sample measurement system equipped with the X-ray generator of FIG. 9.

Hereinafter, the X-ray generator according to the present invention will be described with reference to the accompanying drawings, with reference to the accompanying drawings, preferred embodiments in relation to the X-ray generation method and the sample measurement system.

<First Embodiment>

[Configuration of X-ray generator 10]

1 is a perspective view of the X-ray generator 10 according to the first embodiment, FIG. 2 is a cross-sectional view taken along line II-II of FIG. 1, and FIG. 3 is a cross-sectional view taken along line III-III of FIG. 1. For convenience of explanation, in these FIGS. 1 to 3, a three-axis direction (X direction, Y direction, Z direction) representing a three-dimensional orthogonal coordinate system is defined.

As shown in Fig. 1, the X-ray generator 10 is a device that generates X-rays (X-rays) using a so-called rotating countercathode system. The X-ray generator 10 has a substantially rectangular parallelepiped chamber 12 made of a metallic material having a low X-ray transmittance. A recess 16 recessed in a triangular shape is formed at one corner portion on one side 14 side of the chamber 12.

A circular opening 18 is formed on the inclined surface 17 constituting the concave portion 16, and a window 22 through which a beryllium thin film having high X-ray transmittance is interposed is inserted on the opposite surface 20 of one surface 14. Is formed. The airtight condition is maintained inside the chamber 12 by attaching the cover portion 46 at a position covering the opening portion 18.

2 and 3, the X-ray generator 10 includes an electron generator 24 that generates a linear electron beam B1, a rotating counter electrode 26 in a disk shape or a columnar shape, and rotation A cooling mechanism (not shown) for cooling the counter electrode 26 is further provided. The electron generator 24 and the rotating counter electrode 26 are accommodated in a fixed state in the chamber 28 of the chamber 12, respectively.

The electron generator 24 is a thermoelectron type, field emission type, or Schottky type electron gun, and the thermoelectron type will be described here as an example. Specifically, the electron generator 24 is switched to switch the extending direction of the electron source 32 and the electron source 32 made of a substantially rectangular parallelepiped body portion 30, a tungsten filament, or the like into a plurality of directions. It comprises a mechanism 34. Note that, for example, the body portion 30 has a floating structure (not shown), and the electron source 32 is electrically insulated from the chamber 12.

The switching mechanism 34 is rotatable about a rotation axis along the Y direction, and further has a disk portion to which the electron source 32 is fixed. In other words, the switching mechanism 34 rotates the disk part integrally with the electron source 32 to fix the extension direction of the electron source 32 while fixing the center position O of the electron source 32 (FIG. 2). It can be switched in X or Z direction.

The rotating countercatalyst 26 is configured to be rotatable in the A direction around the rotation shaft 36, for example, at a speed of 5000 to 12000 [rpm]. The rotating counter electrode 26 includes a circumferential surface portion 38 coated with a metal layer such as molybdenum (Mo) and copper (Cu), and a side portion 40 on which the rotating mechanism 42 of the rotating counter electrode 26 is mounted. Have

The rotating mechanism 42 includes a cylindrical shaft portion 44 that supports the rotating counter electrode 26 and a disc-shaped cover portion 46 formed on one end side of the shaft portion 44. The lid portion 46 has a large diameter major surface as compared to the opening portion 18 and is detachable at a position that covers the opening portion 18 from the outside of the chamber 12.

As understood from FIG. 2, the rotating counter electrode 26 is fixedly arranged under a positional relationship in which the rotating shaft 36 is inclined with respect to the X direction and the Z direction. That is, when defining the angle formed by the radial direction and the Z direction of the rotating counter electrode 26 as "inclination angle (φ)" (0 ≤ φ ≤ 90, unit: degree), the relationship of 0 <φ <90 is satisfied. . In this embodiment, phi = 45 [degrees] is particularly satisfied.

As understood from FIG. 3, since the electron source 32 and the circumferential surface portion 38 are in a positional relationship facing each other, the linear focus (first focus (by the first focus () by the electron beam B1 from the electron source 32) 51)) is formed on the circumferential surface portion 38. The circumferential surface portion 38 emits the X-ray beam B2 from the position or the vicinity of the first focal point 51 when a specific occurrence condition is satisfied when the electron beam B1 collides. As will be described later, the shape of the X-ray beam B2 emitted to the outside of the chamber 12 changes according to the geometrical relationship between the linear focus and the window 22.

[Operation of X-ray generator 10]

Subsequently, the operation of the X-ray generator 10 according to the first embodiment will be described with reference to the respective diagrams of FIGS. 1 to 3 and the schematic diagram of FIG. 4.

(1) Fixed batch steps

First, the user accommodates the electron generator 24 and the rotating counter electrode 26 in the chamber 28 of the chamber 12, and then mounts the cover portion 46 at a position covering the opening 18. Thereby, while the electron source 32 and the circumferential surface portion 38 face each other, the electron generator 24 and the rotating countercathode (under the positional relationship where the rotating shaft 36 inclines with respect to the first direction and the second direction) ( 26) This is fixedly arranged.

The first direction and the second direction are orthogonal to each other, and intersect the separation direction (that is, the Y direction) of the electron source 32 and the circumferential surface portion 38, respectively. Here, the first direction corresponds to the "Z direction" and the second direction corresponds to the "X direction".

(2) Conversion step

The switching mechanism 34 switches the extending direction of the electron source 32 according to the user's selection operation. Specifically, when using the X-ray beam B2 (see FIG. 4) on the line, when switching to the "first direction", and when using the X-ray beam B3 (same drawing) as the dot Switch to the "second direction".

(3) Generation step

The inside of the seal 28 is vacuumed using a vacuum pump (not shown), and the rotating counter electrode 26 is rotated in the A direction at a predetermined speed. Then, after various preparations for satisfying the conditions for generating X-rays are completed, the electron generator 24 generates an electron beam B1 on the line in accordance with a user's operation instruction. Thereby, the X-ray beams B2 and B3 are emitted to the outside of the X-ray generator 10 through the window portion 22.

4 is a schematic diagram showing the shapes of the X-ray beams B2 and B3 according to the switching operation in the first direction and the second direction. Depending on the extension direction of the electron source 32 (FIGS. 2 and 3), the first focus 51 curved along the first direction or the second focus 52 curved along the second direction is selectively formed. do.

In the former case, the circumferential surface portion 38 emits the X-ray beam B2 from the position of the first focal point 51 on the line where the electron beam B1 is incident. At this time, since the first focus 51 is in a substantially parallel relationship with the plane formed by the window portion 22, the X-ray beam B2 on the line is emitted.

In the latter case, the circumferential surface portion 38 emits the X-ray beam B3 from the position of the second focal point 52 on the line where the electron beam B1 is incident. At this time, since the second focal point 52 is in a substantially orthogonal relationship to the plane formed by the window portion 22, the pointed X-ray beam B3 is emitted.

As described above, the electron generator 24 is provided with a switching mechanism 34 for switching the extending direction of the electron source 32, and the electron source 32 and the circumferential portion 38 are electrons under a positional relationship facing each other. The generator 24 and the rotating counter electrode 26 are fixedly arranged. Thus, the linear or pointed X-ray beams B2 and B3 are selectively switched by simply switching the extension direction of the electron source 32 without changing the position and orientation of the electron generator 24 and the rotating counter electrode 26 at all. Can be caused by

[Effects by the X-ray generator 10]

Next, the effect by the X-ray generator 10 will be described in detail with reference to FIGS. 5 to 7.

5 is a schematic view showing a focal point formation position at an inclination angle φ of 0 degrees (φ = 0). More specifically, Fig. 5 (a) is a projection view in which the first focus 51 formed on the circumferential surface portion 38 is viewed from the Y direction, and Fig. 5 (b) is a second formed on the circumferential surface portion 38. It is a projection view in which the focus 52 is viewed from the Y direction.

As shown in FIG. 5 (a), the first focus 51 has a rectangular shape with a width of W [mm] and a height of H [mm] (H> W) when viewed in a plane from the Y direction. The line segment 53 shown by the broken line corresponds to the focal length traversing in the circumferential direction. Hereinafter, the length of the line segment 53 in the first focus 51 is referred to as "circumferential focal length L1". In this example of the drawing, L1 = H [mm] because the height direction of the first focus 51 coincides with the circumferential direction of the circumferential surface portion 38.

As shown in Fig. 5 (b), the second focus 52 has a shape substantially the same as the first focus 51 shown in Fig. 5 (a) when viewed in a plane from the Y direction. Hereinafter, the length of the line segment 53 in the second focus 52 is referred to as "circumferential focal length L2". In this example of the drawing, L2 = W [mm] because the width direction of the second focus 52 coincides with the circumferential direction of the circumferential surface portion 38.

With respect to this X-ray generating method, the larger the circumferential focal lengths L1 and L2, the more the heat load received by the rotating counter electrode 26 tends to increase. And, as the heat load increases, the metal formed on the circumferential surface portion 38 becomes difficult to cool, so a phenomenon in which the output efficiency of X-rays decreases is seen. In other words, in FIG. 5 (a), the output efficiency is relatively low because L1 is large, and in FIG. 5 (b), the output efficiency is relatively high because L2 is small. In terms of ease of use at the time of measurement, it is not preferable that a difference in output efficiency occurs due to selection of X-ray beams B2 and B3.

6 is a schematic view showing a focal position at an inclination angle φ of 45 degrees (φ = 45). More specifically, Fig. 6 (a) is a projection view in which the first focus 51 formed on the circumferential surface portion 38 is viewed from the Y direction, and Fig. 6 (b) is a second formed on the circumferential surface portion 38. It is a projection view in which the focus 52 is viewed from the Y direction.

As shown in FIG. 6 (a), the first focus 51 has a shape substantially the same as the first focus 51 shown in FIG. 5 (a) when viewed in a plane from the Y direction. In this example of the drawing, since the height direction of the first focus 51 is inclined 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L1 = √2 · W [mm].

As shown in Fig. 6 (b), the second focus 52 has a shape substantially the same as the first focus 51 shown in Fig. 5 (a) when viewed in a plane from the Y direction. In this example of the drawing, since the width direction of the second focus 52 is inclined at 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L2 = √2 · W [mm].

7 is a graph showing the relationship between the inclination angle φ and the circumferential focal lengths L1 and L2. The horizontal axis of the graph is the inclination angle (φ) (unit: degree), and the vertical axis of the graph is the circumferential focal length (L1, L2) (unit: mm). In addition, the solid line indicates the function of L1, and the one-dot chain line indicates the function of L2.

As understood from this figure, the circumferential focal length L1 satisfies L1 = H [mm] when φ = 0 [degrees] and L1 = W [mm] when φ = 90 [degrees]. , Decreases monotonically with increasing inclination angle (φ). On the other hand, the focal length L2 in the circumferential direction satisfies L2 = H [mm] when L2 = W [mm], and φ = 90 [degree] when φ = 0 [degree], and the As it increases, it increases monotonically.

That is, when the inclination angle φ satisfies φ = 0 [degree] or φ = 90 [degree], the values of | L1-L2 | become the maximum, and the inclination angle (φ) is in the range of 0 <φ <90 By setting, the values of | L1-L2 | become relatively small. Note that in the vicinity of φ = 45 [degree], the relationship of L1 = W / sinφ and L2 = W / cosφ is established.

In the first embodiment, the rotating counter electrode 26 is in the first direction and the first direction because the rotating shaft 36 is in a positional relationship (0 <φ <90) inclined with respect to the first direction and the second direction. With respect to the first focus 51 and the second focus 52 formed by the emission of the electron beam B1 from the two directions, the amount of separation between the focal lengths L1 and L2 in the circumferential direction | L1-L2 | When the rotating shaft 36 is not inclined, it becomes smaller compared with (φ = 0, 90). In short, instead of lowering the output efficiency of the highest side, by increasing the output efficiency of the lowest side, the maximum amount that can be commonly output by both X-ray beams (B2, B3) is pulled (in other words, the limit output of the X-rays) Is raised.

Further, the rotation shaft 36 may be in a positional relationship (30 ≤ φ ≤ 60) inclined within a range of 30 to 60 degrees relative to the first direction. Thereby, the ratio (L1 / L2 or L2 / L1) of the circumferential focal lengths L1 and L2 can be suppressed to be substantially less than two times, and the gap between the output performances of both is further reduced.

Moreover, you may be in the positional relationship (phi = 45) where the rotating shaft 36 inclines 45 degrees with respect to the 1st direction. In this case, since the circumferential focal length L1 = L2 = √2 · W [mm] becomes the same, the limit output amount common to both X-ray beams B2 and B3 is maximized.

As described above, the X-ray generator 10, while fixing the electron source 32 that emits the electron beam B1 on the line [1], and the central position O of the electron source 32, the electron source ( An electron generator 24 having a switching mechanism 34 for switching the extending direction of 32 in either the first direction (Z direction) or the second direction (X direction), and [2] the electron beam B1 It has a circumferential surface portion 38 through which the X-ray beams B2 and B3 are emitted by collision, and further includes a disk-shaped or columnar rotating countercatalyst 26 configured to be rotatable about the rotation shaft 36. . In addition, the electron generator 24 and the rotating counter electrode 26 have the electron source 32 and the circumferential surface portion 38 facing each other, and the rotating shaft 36 is inclined with respect to the first direction and the second direction. It is fixedly placed in relation to the position.

In addition, the X-ray generating method using the X-ray generator 10 includes: an arrangement step in which the electron generator 24 and the rotating counter electrode 26 are fixedly arranged, and an extension direction of the electron source 32 in the first direction and And a switching step of switching to either one of the second directions.

In this way, it is possible to improve the output performance of the entire device while selectively generating the linear or dot X-ray beams B2 and B3 while having a very simple device configuration. For example, when the aspect ratio of the electron source 32 is H / W = 10, when the heat load in Fig. 5 (a) is set as a reference (100%), Fig. 5 (b), Fig. 6 (a) And the heat loads in Fig. 6 (b) are estimated to be 32%, 84%, and 84%, respectively. In short, by adopting the configuration of Fig. 6, although there is a loss of 16% compared to the maximum value, a high gain of the same degree can be obtained.

[Configuration example of sample measurement system 100]

Subsequently, the sample measurement system 100 equipped with the X-ray generator 10 will be described with reference to FIG. 8. Here, the "X-ray diffraction apparatus" will be described as an example, but is not limited to this configuration and measurement method.

The sample measurement system 100 includes an X-ray generator 10 that generates X-ray beams B2 and B3, and an X-ray detection device that detects X-ray beams B2 and B3 reflecting the sample S A 102, a goniometer 104 for setting angles in the θ1 and θ2 directions, and a control device 106 (measurement means) for controlling each part are provided.

The goniometer 104 includes a first arm 110 for holding the X-ray generator 10, a θ1 rotating mechanism 112 for rotationally driving the first arm 110 in the θ1 direction, and X-ray detection It comprises the 2nd arm 114 which grasps the detector 126 of the apparatus 102, and the rotating mechanism 116 which drives the 2nd arm 114 to rotate in the (theta) 2 direction.

At the centers of rotation of the first arm 110 and the second arm 114, a sample stand 118 for placing the sample S to be measured is fixedly arranged. The diverging slits 120 and the X-ray generator 10 are fixed to the first arm 110 in order from the center of rotation toward the outside. A scattering slit 122, a light receiving slit 124, and a detector 126 are fixed to the second arm 114 in order from the center of rotation toward the outside. When using the concentration method, as shown in this figure, the positions of the first focus 51 and the light receiving slit 124 are adjusted to exist on a single circular trajectory C.

The X-ray detection apparatus 102 includes a detector 126 that outputs a detection signal according to the intensity of the X-ray beams B2 and B3, and an X-ray beam B2 or B3 based on the detection signal from the detector 126. ) Has a detection circuit 128 for determining the detection amount. The detector 126 includes a single X-ray detection element or an array of X-ray detection elements arranged in a linear or planar manner.

The control device 106 controls the θ1 rotating mechanism 112 and the θ2 rotating mechanism 116 to arrange the X-ray generator 10, the sample S, and the detector 126 under appropriate positional relationships. In this measurement example, the first arm 110 and the second arm 114 are set at the same angle (θ1 = θ2).

The control apparatus 106 emits the electron beam B1 (FIG. 3) by controlling the X-ray generating apparatus 10, and also generates the X-ray beams B2 and B3. The control device 106 measures the physical quantity of the sample S based on the set angle of the goniometer 104 and the detection amount of the X-ray beams B2 and B3 reflecting the sample S. The output device 130 outputs the measurement result of the sample S, including the lattice spacing, diffraction intensity, Miller coefficient, lamination cycle, stress, and identified material name, according to the output instruction from the control device 106. do.

Depending on the type of sample (S), the nature, or a combination of physical quantities to be measured, either linear or pointed X-ray beams (B2, B3) are selected. The user adjusts the X-ray optical system suitable for the beam shape, specifically, exchanges the diverging slits 120, the scattering slits 122, or the light receiving slits 124. Thereafter, the control device 106 transmits an instruction signal to the switching mechanism 34 in order to rotate the electron source 32 in accordance with the operation by the user. Thereby, the extension direction of the electron source 32 is automatically switched, and desired X-ray measurement can be performed. Further, instead of the above configuration, a configuration in which the extension direction of the electron source 32 is switched manually by the user may be used.

As described above, the sample measurement system 100 generates the X-ray generator 10 and the X-ray generator 10, and further transmits or reflects the sample S to the X-ray beam B2. , And an X-ray detection device 102 for detecting B3, and a control device 106 (measurement means) for measuring the physical quantity of the sample S based on the detected X-ray beams B2 and B3. Be equipped. Thereby, the X-ray measurement which switched the shape of the X-ray beams B2 and B3 in a timely manner can be performed without performing the adjustment operation of the X-ray generator 10 side.

<Second Embodiment>

[Configuration of X-ray generator 1010]

9 is a perspective view of the X-ray generator 1010 according to the second embodiment, FIG. 10 is a cross-sectional view taken along line II-II in FIG. 9, and FIG. 11 is an X-ray generator 1010 shown in FIG. It is a side view, and FIG. 12 is a sectional view taken along line IV-IV in FIG. 9. For convenience of explanation, in these FIGS. 9 to 12, a three-axis direction (X direction, Y direction, Z direction) representing a three-dimensional orthogonal coordinate system is defined.

As shown in FIG. 9, the X-ray generator 1010 is a device which generates X-rays (X-rays) using a so-called rotating countercathode system. The X-ray generator 1010 has a substantially rectangular parallelepiped chamber 1012 made of a metal material having low X-ray transmittance.

A circular first opening 1016 is formed on the first surface 1014 side of the chamber 1012. A recess 1020 recessed into a triangular column is formed at one corner portion on the second surface 1018 side of the chamber 1012. A second opening 1024 having a circular shape is formed on the inclined surface 1022 forming the concave portion 1020, and a third surface 1026 facing the second surface 1018 is interposed with a beryllium thin film having high X-ray transmittance. The inserted window portion 1028 is formed.

By passing the electron generator 1030 through the first opening 1016 and inserting the cover portion 1032 in a position to cover the second opening 1024, the chamber 1034 of the chamber 1012 (FIG. 10) And FIG. 12) I remain confidential. The electron generator 1030 is a thermoelectron type, field emission type, or Schottky type electron gun, and the thermoelectron type will be described here as an example.

As shown in FIG. 10, the electron generator 1030 includes an electron source 1036 emitting a linear electron beam B1, a columnar support 1038 supporting the electron source 1036, and a support ( The holding portion 1040 for holding the 1038, the rotation introducing mechanism 1042 for introducing a rotational motion from the outside of the chamber 1012, and a housing case for accommodating component parts necessary for various operations of the electron generator 1030 ( 1044). The necessary component parts include, for example, a power supply portion of a heater that heats the electron source 1036, and a high pressure introduction portion for introducing high voltage into the chamber 1012.

The electron source 1036 is made of, for example, tungsten filament and has a coil shape extending in one direction. The substantially cylindrical holding portion 1040 is made of an insulating material containing ceramics. Thereby, the electron source 1036 is disposed in the chamber 1034 while being electrically insulated from the chamber 1012.

The rotation introduction mechanism 1042 is a mechanism that introduces a rotational movement along the T direction, centered on one cathode side (hereinafter, the cathode axis (Ac)), and the base end of the holding portion 1040 It is connected to the side. Thereby, the rotation introduction mechanism 1042 rotates the holding portion 1040 and the support base 1038 integrally, while fixing the central position O of the electron source 1036 (FIG. 4), and the electron source 1036 It is possible to change the extension direction.

Here, the rotation introduction mechanism 1042 can change the extending direction of the electron source 1036 in either the first direction or the second direction by the rotation operation of the support 1038. The first direction corresponds to the "Z direction", and the second direction corresponds to the "X direction". In this case, the first direction and the second direction are perpendicular to each other and perpendicular to the cathode axis Ac (Y direction).

Specifically, the rotation introduction mechanism 1042 includes a rotation shaft portion 1046 whose one end is connected to the holding portion 1040, a circumferential sealing portion 1047 sealing the first opening 1016, A connection flange 1048 for connecting to the chamber 1012 and a handle portion 1050 engaged with the other end side of the rotation shaft portion 1046 are provided.

An O-ring, not shown, is formed on the outer circumferential wall of the encapsulation portion 1047, and the low-pressure air in the seal 1034 is prevented from flowing out by the O-ring. The connection flange 1048 has a large diameter major surface as compared with the first opening 1016, and is detachable at a position that covers the first opening 1016 from the outside of the chamber 1012. The handle portion 1050 imparts a rotational force to the rotation shaft portion 1046 by a bellows method or a magnetic coupling method in accordance with the rotational movement along the T direction.

11, the receiving case 1044, the handle part 1050, and the connecting flange 1048 are arranged coaxially in order from the side with the smallest diameter, as viewed from the first surface 1014 side. It is done. On the side surface of the annular handle portion 1050, a first projecting portion 1052 (indicating means) on the line extending and projecting in the radial direction is formed. On the side surfaces of the annular connecting flange 1048, two marks 1054 and 1055 are respectively formed.

The mark 1054 is made of one single line arranged under the "L" and "L" of the alphabetic character. The mark 1055 is made up of "P" of alphabetic characters and one disconnection arranged to the left of "P". In addition, on the outer circumferential surface of the housing case 1044, the second protrusion 1056 (rotation regulating means) in the vicinity of the mark 1054 and the second protrusion 1057 (rotation regulating means) in the vicinity of the mark 1055 are provided. Each is formed.

10 and 12, the X-ray generator 1010 includes, in addition to the chamber 1012 and the electron generator 1030, a circular or circumferential rotating counter electrode 1060 and a rotating counter electrode 1060. It further has a cooling mechanism (not shown) for cooling.

The rotating countercathode 1060 is configured to be rotatable in the R direction at a speed of, for example, 5000 to 12000 [rpm], centered on one anode side (hereinafter, the anode axis (Aa)). The rotating counter electrode 1060 includes a circumferential surface portion 1062 coated with a metal layer such as molybdenum (Mo) and copper (Cu), and a side portion 1064 on which the rotating mechanism 1066 of the rotating counter electrode 1060 is mounted. Have

The rotating mechanism 1066 includes a cylindrical rotating shaft portion 1068 that supports the rotating counter electrode 1060 and a disk-shaped cover portion 1032 (FIG. 9) formed on one end side of the rotating shaft portion 1068. It includes. The lid portion 1032 has a large diameter major surface as compared to the second opening 1024 and is detachable at a position that covers the second opening 1024 from the outside of the chamber 1012.

As understood from FIG. 12, the rotating countercathode 1060 is fixedly arranged under a positional relationship in which the anode axis Aa is inclined with respect to the X direction and the Z direction. In other words, when defining the angle formed by the radial direction and the Z direction of the rotating counter electrode 1060 as "inclination angle (φ)" (0 ≤ φ ≤ 90, unit: degree), the relationship of 0 <φ <90 is satisfied. . In this embodiment, phi = 45 [degrees] is particularly satisfied.

10 and 12, since the electron source 1036 and the circumferential surface portion 1062 are in a positional relationship facing each other, linear focus by the electron beam B1 from the electron source 1036 (zero) One focus 1071) is formed on the circumferential surface portion 1062. The circumferential surface portion 1062 emits the X-ray beam B2 from the position or the vicinity of the first focus 1071 when a specific occurrence condition is satisfied when the electron beam B1 collides. As described later, the shape of the X-ray beam B2 exiting the outside of the chamber 1012 changes according to the geometrical relationship between the linear focus and the window portion 1028.

[Operation of X-ray generator 1010]

Subsequently, the operation of the X-ray generator 1010 according to the second embodiment will be described with reference to each of FIGS. 9 to 12 and the schematic diagram of FIG. 13.

(1) Fixed and arranged steps

The user inserts the electron source 1036 into the chamber 1012 through the first opening 1016 while gripping the connection flange 1048 of the electron generator 1030. Then, by attaching the connection flange 1048 to a predetermined position on the first surface 1014 (that is, a position covering the first opening 1016), the electron source 1036 is fixedly arranged in the chamber 1012.

Along with this, the user inserts the rotating counter electrode 1060 into the chamber 1012 through the second opening 1024 while gripping the lid portion 1032. Then, by attaching the cover portion 1032 at a predetermined position on the inclined surface 1022 (that is, a position covering the second opening 1024), the rotating countercathode 1060 is fixedly disposed in the chamber 1012.

Thereby, an airtight state is maintained in the chamber 1034 of the chamber 1012. In addition, the point where the electron source 1036 and the circumferential surface portion 1062 face each other and are in a positional relationship where the anode axis Aa is inclined with respect to the first direction (Z direction) and the second direction (X direction). Please note.

(2) Setting step

The user sets the shape of the X-ray beams B2 and B3 by rotating the handle portion 1050 along the T direction. Specifically, by aligning the first projection 1052 with the position of the mark 1054 (meaning “L = Line”), the support 1038 interlocks with the handle portion 1050 to generate an electron source 1036. The extension direction is set to "first direction". In contrast, by aligning the first protrusion 1052 with the position of the mark 1055 (meaning "P = Point"), the support 1038 interlocks with the handle portion 1050 to extend the electron source 1036 The direction is set to "second direction".

Thus, the rotation introduction mechanism 1042 has a handle portion 1050 rotatably disposed outside the chamber 1012 and rotates the support 1038 according to the rotation operation of the handle portion 1050. You may employ a structure. The operator can easily change the extending direction of the electron source 1036 by performing an operation to rotate the handle portion 1050.

Moreover, you may provide the rotation introduction mechanism 1042 with the instruction | indication means (specifically, 1st protrusion 1052) which instructs the rotation state of the handle part 1050 to be visible from the outside of the chamber 1012. The operator can at first glance and grasp the rotational state of the handle portion 1050 and the direction in which the electron source 1036 extends by acknowledging the position indicated by the first protrusion 1052 from the outside of the chamber 1012.

In addition, a member (connection flange 1048) that is different from the handle portion 1050 by the marks 1054 and 1055 showing the corresponding relationship between the rotational position of the handle portion 1050 and the shape of the X-ray beams B2 and B3, or It may be provided in the housing case (1044). Thereby, the target position of the rotation operation becomes clear, which is convenient for the operator.

(3) Generation step

A purge operation by a vacuum pump (not shown) is performed to make the inside of the chamber 1034 in a vacuum state, and the rotating counter electrode 1060 is rotated in the R direction at a predetermined speed. Then, after various preparations for satisfying the conditions for generating X-rays have been completed, the electron generator 1030 generates a linear electron beam B1 in accordance with an instruction operation by the user.

13 is a schematic diagram showing the shapes of the X-ray beams B2 and B3 according to the switching operation in the first direction and the second direction. Depending on the extension direction of the electron source 1036 (FIGS. 10 and 12), the first focus 1071 curved along the first direction or the second focus 1072 curved along the second direction is selectively formed. do.

In the former case, the circumferential surface portion 1062 emits the X-ray beam B2 from the position of the first focal point 1071 on the line where the electron beam B1 is incident. At this time, since the first focus 1071 is substantially parallel to the plane formed by the window portion 1028, the X-ray beam B2 on the line is emitted.

In the latter case, the circumferential surface portion 1062 emits the X-ray beam B3 from the position of the second focal point 1072 on the line where the electron beam B1 is incident. At this time, since the second focus 1072 is in a substantially orthogonal relationship to the plane formed by the window portion 1028, the pointed X-ray beam B3 is emitted.

(4) Change step

The user changes the shape of the X-ray beams B2 and B3 to "line-to-line" or "line-to-line" according to the same operation procedure as the above-described "setting step". Replacing the electron generator 1030 or rotating counter electrode 1060 by adopting a configuration capable of rotating the support 1038 in accordance with the operation from the outside of the chamber 1012 (specifically, the operation of the handle portion 1050) The extension direction of the electron source 1036 can be changed without performing a work.

Here, since the second protrusions 1056 and 1057 are disposed on the track of the first protrusion 1052, the first protrusion 1052 is rotated within a section of the second protrusions 1056 and 1057 (here, 90 degrees) Rotational motion is allowed only within the range). As described above, rotation regulating means (specifically, the second protrusions 1056 and 1057) that regulate the rotation range of the handle portion 1050 may be formed in the rotation introduction mechanism 1042. Thereby, it can prevent that the drive component of the electron source 1036 is excessively twisted and damaged.

[Effects by the X-ray generator 1010]

As described above, the X-ray generator 1010 includes an electron generator 1030 comprising an electron source 1036 that emits an electron beam B1 on the line [1], and an electron source 1036 [2]. A rotating countercathode 1060 comprising the peripheral surface portion 1062 that emits the X-ray beams B2, B3 by colliding the electron beam B1 from), [3] an electron source 1036 and rotation And a chamber 1012 accommodating the countercathode 1060.

Then, the electron generator 1030 and the rotating countercathode 1060 are fixedly arranged in the chamber 1012 under the positional relationship between the electron source 1036 and the circumferential surface portion 1062, and the electron generator 1030 includes: A support 1038 for supporting the electron source 1036 and a rotation introduction mechanism 1042 that is airtightly inserted into the chamber 1012 and rotates the support 1038 according to operation from outside the chamber 1012. ).

Thus, since the rotation introduction mechanism 1042 is formed to rotate the support 1038 for supporting the electron source 1036 in response to the operation from the outside of the chamber 1012, the electron generator 1030 or the rotating counter electrode ( It is possible to change the extending direction (first direction / second direction) of the electron source 1036 while maintaining the vacuum state in the chamber 1012 without performing the replacement operation of 1060). This makes it possible to selectively generate the linear or dot X-ray beams B2 and B3 while having a very simple device configuration, and suppress the decrease in work efficiency accompanying this selection.

In addition, the rotation introduction mechanism 1042 can change the extension direction of the electron source 1036 in the first direction and the second direction by the rotation operation of the support 1038, and the anode axis of the rotating countercathode 1060 ( Aa) may be inclined with respect to the first direction and the second direction. The effect obtained by this configuration will be described. Hereinafter, it is assumed that the first focus 1071 and the second focus 1072 (FIG. 13) are quadrilateral with a width of W [mm] and a height of H [mm] (H> W) when viewed from a plane. When the focal length traversing in the circumferential direction of the circumferential surface portion 1062 is defined as "circumferential focal length", the circumferential focal lengths of the first focus 1071 and the second focus 1072 are L1 and L2, respectively. Shall be

14 is a graph showing the relationship between the inclination angle φ and the circumferential focal lengths L1 and L2. The horizontal axis of the graph is the inclination angle (φ) (unit: degree), and the vertical axis of the graph is the circumferential focal length (L1, L2) (unit: mm). In addition, the solid line indicates the function of L1, and the one-dot chain line indicates the function of L2.

As understood from this figure, the circumferential focal length L1 satisfies L1 = H [mm] when φ = 0 [degrees] and L1 = W [mm] when φ = 90 [degrees]. , Decreases monotonically with increasing inclination angle (φ). On the other hand, the focal length L2 in the circumferential direction satisfies L2 = H [mm] when L2 = W [mm], and φ = 90 [degree] when φ = 0 [degree], and the As it increases, it increases monotonically.

That is, when the inclination angle φ satisfies φ = 0 [degree] or φ = 90 [degree], the values of | L1-L2 | become the maximum, and the inclination angle (φ) is in the range of 0 <φ <90 By setting, the values of | L1-L2 | become relatively small. Note that in the vicinity of φ = 45 [degree], the relationship of L1 = W / sinφ and L2 = W / cosφ is established.

In the second embodiment, the rotating counter electrode 1060 is in the first direction and because the anode axis Aa is in a positional relationship (0 <φ <90) inclined with respect to the first direction and the second direction. With respect to the first focus 1071 and the second focus 1072 formed by the emission of the electron beam B1 from the second direction, the amount of separation of the focal lengths L1 and L2 in the circumferential direction | L1-L2 | , When the anode axis Aa is not inclined, it becomes small compared with (φ = 0, 90).

In short, instead of lowering the output efficiency of the highest side, by increasing the output efficiency of the lowest side, the maximum amount that can be commonly output to both X-ray beams B2 and B3 (in other words, the limit output of X-rays) is attracted. Is raised. In particular, when the anode axis Aa is inclined at 45 degrees with respect to the first direction (φ = 45), since the focal length L1 = L2 = √2 · W [mm] in the circumferential direction becomes the same, both X-ray beams The limit output amount common to (B2, B3) is maximized.

[Example of configuration of sample measurement system 1100]

Subsequently, a sample measurement system 1100 equipped with the X-ray generator 1010 will be described with reference to FIG. 15. Here, the "X-ray diffraction apparatus" will be described as an example, but is not limited to this configuration and measurement method.

The sample measurement system 1100 includes an X-ray generator 1010 generating X-ray beams B2 and B3, and an X-ray detection device detecting X-ray beams B2 and B3 reflecting the sample S It includes a 1102, a goniometer 1104 for setting angles in the θ1 and θ2 directions, and a control device 1106 (measurement means) for controlling each part.

The goniometer 1104 includes a first arm 1110 gripping the X-ray generator 1010, a θ1 rotation mechanism 1112 for rotationally driving the first arm 1110 in the θ1 direction, and X-ray detection It comprises the 2nd arm 1114 which grips the detector 1126 of the apparatus 1102, and the rotation mechanism 1116 which drives the 2nd arm 1114 rotationally in (theta) 2 direction.

At the rotation centers of the first arm 1110 and the second arm 1114, a sample stand 1118 for placing the sample S to be measured is fixedly arranged. The diverging slits 1120 and the X-ray generator 1010 are fixed to the first arm 1110 in order from the center of rotation toward the outside. The scattering slit 1122, the light receiving slit 1124, and the detector 1126 are fixed to the second arm 1114 in order from the center of rotation toward the outside. In the case of using the concentration method, as shown in the figure, the positions of the first focus 1051 and the light receiving slit 1124 are adjusted to exist on a single circular trajectory C.

The X-ray detection apparatus 1102 includes a detector 1126 outputting a detection signal corresponding to the intensity of the X-ray beams B2, B3, and X-ray beams B2, B3 based on the detection signals from the detector 1126 ) Has a detection circuit 1128 for determining the detection amount. The detector 1126 includes a single X-ray detection element or an array of X-ray detection elements arranged in a linear or planar manner.

The control device 1106 controls the θ1 rotating mechanism 1112 and the θ2 rotating mechanism 1116 to arrange the X-ray generator 1010, the sample S, and the detector 1126 under appropriate positional relationships. In this measurement example, the first arm 1110 and the second arm 1114 are set at the same angle (θ1 = θ2).

The control device 1106 emits the electron beam B1 (FIG. 3) by controlling the X-ray generator 1010, and also generates the X-ray beams B2 and B3. The control device 1106 measures the physical quantity of the sample S based on the set angle of the goniometer 1104 and the detection amount of the X-ray beams B2 and B3 reflecting the sample S. The output device 1130 outputs the measurement result of the sample S, including the lattice spacing, diffraction intensity, Miller coefficient, lamination cycle, stress, and identified material name, according to the output instruction from the control device 1106. do.

Depending on the type of sample (S), the nature, or a combination of physical quantities to be measured, either linear or pointed X-ray beams (B2, B3) are selected. The user adjusts the X-ray optical system suitable for the beam shape, specifically, exchanges the diverging slits 1120, the scattering slits 1122, or the light receiving slits 1124. The user further performs an operation of rotating the handle portion 1050 along the T direction. Thereby, the extension direction of the electron source 1036 is switched manually, and desired X-ray measurement can be performed. In addition, instead of the above configuration, the control device 1106 transmits an indication signal toward the X-ray generator 1010, and drives the handle portion 1050 using an actuator (not shown), so that the electron source 1036 is The extension direction may be automatically switched.

As described above, the sample measurement system 1100 generates X-ray beams B2 generated from the above-described X-ray generator 1010 and the X-ray generator 1010 and transmitted or reflected through the sample S. , X-ray detection device 1102 for detecting B3), and control device 1106 (measurement means) for measuring the physical quantity of sample S based on the detected amount of X-ray beams B2, B3 detected. Be equipped. Thereby, the X-ray measurement which switched the shape of the X-ray beams B2 and B3 in a timely manner can be performed, maintaining the vacuum state in the chamber 1012.

Further, in the second embodiment, the handle portion 1050 (FIG. 11) is composed of a rotating handle, but instead of this, a crank handle disposed rotatably outside the chamber 1012 may be used.

In the second embodiment, the indicating means is composed of one first protrusion 1052 (FIG. 11), but as long as it can grasp the extending direction of the electron source 1036, which is not visible, from the outside of the chamber 1012. However, it does not matter whether the form of the instruction means. For example, a leader line may be printed on the side surface of the handle portion 1050 or may be formed on a component separate from the handle portion 1050.

In the second embodiment, the rotation regulating means is composed of two second protrusions 1056 and 1057 (FIG. 11). However, if the rotation range of less than 360 degrees can be arbitrarily set, the type of the rotation regulating means is Do not ask. For example, the number of members may be one, or may be formed in a component separate from the housing case 1044.

[Remarks]

In addition, it is needless to say that the present invention is not limited to the above-described embodiment, and can be freely changed without departing from the gist of the present invention.

10, 1010: X-ray generator
12, 1012: chamber
22, 1028: Changbu
24, 1030: electron generator
26, 1060: Rotating Cathode
28, 1034: thread
32, 1036: electron source
34: switching mechanism
36: rotating shaft
38, 1062: circumferential surface
42: rotating mechanism
51, 1071: first focus
52, 1072: second focus
53: line segment
100, 1100: sample measurement system
102, 1102: X-ray detection device
104, 1104: Goniometer
106, 1106: control unit (measurement means)
1016: first opening
1024: second opening
1038: support
1040: holding unit
1042: Organization to introduce rotation
1044: accommodation case
1046: rotating shaft
1047: sealing bag
1048: connection flange
1050: handle part
1052: first protrusion (instruction means)
1054, 1055: Mark
1056, 1057: 2nd protrusion (rotation regulating means)
1064: side part
Aa: anode axis (rotation axis)
Ac: Cathode shaft (rotation shaft)
B1: electron beam
B2, B3: X-ray beam
L1, L2: Circumferential focal length
S: Sample

Claims (11)

A switching mechanism for converting an electron source emitting a linear electron beam to one of a first direction and a second direction orthogonal to the first direction while fixing the center position of the electron source. Having an electron generator,
It has a circumferential surface portion for emitting an X-ray beam by colliding the electron beam from the electron source, and further includes a disk-like or columnar rotating counter electrode configured to be rotatable about an axis of rotation,
In the electron generator and the rotating countercathode, the electron source and the circumferential surface portions face each other, and the rotation axis is the first direction and the first axis in one plane including the first direction and the second direction. X-ray generator, characterized in that fixedly arranged in a positional relationship inclined with respect to the two directions. According to claim 1,
X-ray generator, characterized in that the rotating shaft is inclined within the range of 30 to 60 degrees with respect to the first direction. According to claim 2,
X-ray generator, characterized in that the axis of rotation is inclined 45 degrees with respect to the first direction. An electron generator having an electron source that emits a linear electron beam, and a disk shape having a circumferential surface portion that emits an X-ray beam by colliding the electron beam from the electron source and is rotatable about an axis of rotation Or as an X-ray generating method using a device having a circumferential rotating countercathode,
While the electron source and the circumferential surface portions face each other, the inclined paper in one plane including the first direction and the second direction with respect to a second direction in which the rotation axis is orthogonal to the first direction and the first direction Is a step of fixedly positioning the electron generator and the rotating countercatalyst under a positional relationship,
And fixing the central position of the electron source and switching the extending direction of the electron source to either one of the first direction and the second direction. The X-ray generator according to any one of claims 1 to 3,
An X-ray detection device that detects an X-ray beam generated from the X-ray generation device and transmitted or reflected through a sample;
And a measurement means for measuring a physical quantity of the sample based on the detection amount of the X-ray beam detected by the X-ray detection device. An electron generator comprising an electron source emitting a linear electron beam,
A rotating counter electrode comprising a circumferential surface portion that emits an X-ray beam by colliding the electron beam from the electron source,
And a chamber accommodating the electron source and the rotating countercathode,
The electron generator and the rotating countercathode are fixedly arranged in the chamber under a positional relationship where the electron source and the circumferential surface portions face each other,
The electron generator,
A support for supporting the electron source,
It is additionally provided with a rotation introduction mechanism that is airtightly inserted into the chamber and rotates the support according to an operation from the outside of the chamber,
The rotation introduction mechanism is capable of changing the extension direction of the electron source to a first direction and a second direction orthogonal to the first direction by the rotation operation of the support,
The rotation axis of the rotating countercathode, X-ray generating apparatus, characterized in that inclined with respect to the first direction and the second direction in one plane including the first direction and the second direction. The X-ray generator according to claim 6,
An X-ray detection device that detects an X-ray beam generated from the X-ray generation device and transmitted or reflected through a sample;
And a measurement means for measuring a physical quantity of the sample based on the detection amount of the X-ray beam detected by the X-ray detection device. delete delete delete delete

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