JP6537936B2 - X-ray generator and method, and sample measurement system - Google Patents

Description

  The present invention relates to an X-ray generator and an X-ray generation method for generating X-rays using a so-called rotating anticathode method, and a sample measurement system configured to include the X-ray generator.

  Conventionally, in the field of measurement, a "focused method" using a linear x-ray beam or a "parallel beam method" using a point-like x-ray beam is known. For example, the former technique can be applied when quantitatively analyzing a powder sample, and the latter technique can be applied when qualitatively analyzing a thin film sample.

  Patent Document 1 proposes a method of generating a linear X-ray beam by irradiating an electron beam on the outer peripheral surface of a rotating anticathode to form a long focal point in the circumferential direction. It is also described that a point-like X-ray beam is generated by rotating the direction of the filament by 90 degrees from the arrangement shown in FIG. 1 of the same document to form a long focal point in the width direction ( Figure 6 of the same document.

JP-A-6-020629 (Fig. 1, Fig. 6, etc.)

  By the way, regarding this X-ray generation method, the heat load to which the rotating anticathode is subjected tends to increase as the focal length crossing in the circumferential direction becomes larger. Then, as the heat load is increased, the metal provided on the outer peripheral surface becomes more difficult to be cooled, so that the phenomenon that the output efficiency of the X-ray decreases is observed. That is, in the method proposed in Patent Document 1, it is presumed that the output efficiency is largely different depending on the arrangement state of FIG. 1 and FIG. 6 despite the substantially same focal area.

  From the viewpoint of ease of use in measurement, it is desirable that a device that selectively generates a linear or point X-ray beam generates the same degree of X-ray dose regardless of the selection of the beam shape. In order to realize this, it is necessary to bring the X dose of both closer to the lower side by intentionally reducing the irradiation amount of the electron beam in the arrangement state of FIG. As a result, the problem that the original performance of the X-ray generator can not be fully realized becomes apparent.

  The present invention has been made in view of the above-described problems, and it is possible to selectively generate a linear or spot X-ray beam while improving the output performance of the entire apparatus while having a very simple apparatus configuration. It is an object of the present invention to provide an X-ray generator and method, and a sample measurement system.

  The "X-ray generator" according to the present invention comprises an electron source for emitting a linear electron beam, and a first direction and a first direction of extension of the electron source while fixing the center position of the electron source. An electron generator having a switching mechanism for switching to one of the second directions orthogonal to the direction, and a peripheral surface portion for emitting an X-ray beam by colliding the electron beam from the electron source; It is an apparatus provided with a disk-like or cylindrical-shaped rotating anticathode configured to be rotatable about a rotation axis, wherein the electron generator and the rotating anticathode are such that the electron source and the peripheral surface portion face each other. In addition, the rotational axis is fixedly disposed under a positional relationship inclining with respect to the first direction and the second direction.

  Thus, a switching mechanism is provided which switches the extension direction of the electron source to either the first direction or the second direction orthogonal to the first direction while fixing the central position of the electron source, and also providing the electron source Since the electron generator and the rotating anticathode are fixedly arranged in a positional relationship in which the peripheral portions face each other, the extending direction of the electron source is simply changed without changing the position and attitude of the electron generator and the rotating anticathode. By switching, a linear or point-like X-ray beam can be selectively generated.

  In addition, since the rotation anticathode is in a positional relationship in which the rotation axis is inclined with respect to the first direction and the second direction, two focal points formed by the emission of the electron beam from the first direction and the second direction In the above, the amount of deviation of the focal length transverse to the circumferential direction is smaller than in the case where the rotation axis is not inclined. That is, raising the lowest output efficiency instead of lowering the highest output efficiency raises the maximum amount that can be output commonly to both X-ray beams (that is, the X-ray limit output amount). Ru.

  This makes it possible to selectively generate a linear or spot X-ray beam while having a very simple apparatus configuration, and to improve the output performance of the entire apparatus.

  Moreover, it is preferable that the said rotating shaft inclines within the range of 30 to 60 degree | times with respect to the said 1st direction. As a result, it is possible to suppress the deviation amount of the focal length traversing in the circumferential direction, more specifically, the ratio of the focal lengths to less than about twice, and the gap between the output performances of the both becomes smaller.

  Further, it is preferable that the rotation axis is inclined 45 degrees with respect to the first direction. Because the circumferentially-crossed focal lengths are equal, the critical power amount common to both x-ray beams is maximized.

  The “X-ray generation method” according to the present invention includes an electron generator having an electron source that emits a linear electron beam, and a circumferential surface portion that emits an X-ray beam by colliding the electron beam from the electron source. And an X-ray generator including a disk-like or cylindrical rotating anticathode configured to be rotatable about a rotation axis, wherein the electron source and the peripheral surface portion Fixedly arranging the electron generator and the rotating anticathode under a positional relationship in which the rotation axis is inclined with respect to a first direction and a second direction orthogonal to the first direction, and the electrons; and Switching the extension direction of the electron source to any one of the first direction and the second direction while fixing the center position of the source.

  The “sample measurement system” according to the present invention includes: any one of the X-ray generator described above; and an X-ray detector for detecting an X-ray beam generated from the X-ray generator and transmitted or reflected from the sample And a measuring unit configured to measure a physical quantity related to the sample based on a detection amount of the X-ray beam detected by the X-ray detection apparatus.

  According to the X-ray generator and method and sample measurement system according to the present invention, a linear or spot X-ray beam can be selectively generated with an extremely simple apparatus configuration, and the output performance of the entire apparatus Can be improved.

It is a perspective view of the X-ray generator concerning this embodiment. It is sectional drawing along the II-II line of FIG. It is sectional drawing along the III-III line of FIG. It is a schematic diagram which shows the shape of the X-ray beam according to the switching operation of a 1st direction and a 2nd direction. It is a schematic diagram which shows the formation position of the focus in 0 degree of inclination angles. It is a schematic diagram which shows the formation position of the focus in 45 degrees of inclination angles. It is a graph which shows the relationship between inclination angle and circumferential direction focal length. It is a whole block diagram of the sample measurement system incorporating the X-ray generator of FIG.

  BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, an X-ray generator according to the present invention will be described by way of preferred embodiments in relation to an X-ray generation method and a sample measurement system with reference to the accompanying drawings.

[Configuration of X-ray generator 10]
FIG. 1 is a perspective view of an X-ray generator 10 according to this embodiment, FIG. 2 is a cross-sectional view taken along line II-II of FIG. 1, and FIG. 3 is taken along line III-III of FIG. FIG. For convenience of explanation, in FIGS. 1 to 3, three axial directions (X direction, Y direction, Z direction) indicating a three-dimensional orthogonal coordinate system are defined.

  As shown in FIG. 1, the X-ray generator 10 is a device that generates X-rays (X-rays) using a so-called rotating anticathode method. The X-ray generator 10 has a substantially rectangular parallelepiped shaped chamber 12 made of a metal material having a low X-ray transmittance due to its outer shape. At one corner on one surface 14 side of the chamber 12, a concave portion 16 recessed in a triangular prism shape is formed.

  A circular opening 18 is provided on the inclined surface 17 forming the recess 16, and a window 22 in which a beryllium thin film having high X-ray transmittance is inserted is provided on the opposing surface 20 of the first surface 14. By mounting the lid 46 at a position covering the opening 18, the inside of the chamber 12 is kept airtight.

  As shown in FIGS. 2 and 3, the X-ray generator 10 includes an electron generator 24 for generating a linear electron beam B 1, a rotating anticathode 26 having a disk shape or a cylindrical shape, and a rotating anticathode 26. Furthermore, it has a cooling mechanism (not shown) for cooling. The electron generator 24 and the rotating anticathode 26 are each housed in a fixed manner in the chamber 28 of the chamber 12.

  The electron generator 24 is a thermal electron type, field emission type, or Schottky type electron gun, and here, the thermal electron type will be described as an example. Specifically, the electron generator 24 includes a substantially rectangular parallelepiped main body 30, an electron source 32 formed of a tungsten filament or the like, and a switching mechanism 34 for switching the extension direction of the electron source 32 to a plurality of directions. It consists of For example, it should be noted that the main body 30 has a floating structure not shown, and the electron source 32 is electrically isolated from the chamber 12.

  The switching mechanism 34 is pivotable about a pivot axis along the Y direction, and has a disk portion to which the electron source 32 is fixed. That is, the switching mechanism 34 rotates the disk portion integrally with the electron source 32 to fix the center position O (FIG. 2) of the electron source 32 in the extending direction of the electron source 32 in the X direction or Z It is switchable in the direction.

  The rotating anticathode 26 is configured to be rotatable around the rotation axis 36 in the A direction, for example, at a speed of 5000 to 12000 [rpm]. The rotating anticathode 26 has a circumferential surface portion 38 coated with a metal layer such as molybdenum (Mo) or copper (Cu), and a side surface portion 40 to which a rotating mechanism 42 of the rotating anticathode 26 is attached.

  The rotating mechanism 42 is configured to include a cylindrical shaft portion 44 for supporting the rotating anticathode 26 and a disc-like lid portion 46 provided on one end side of the shaft portion 44. The lid 46 has a major surface with a diameter larger than that of the opening 18 and is removable from the outside of the chamber 12 at a position covering the opening 18.

  As understood from FIG. 2, the rotating anticathode 26 is fixedly disposed under the positional relationship in which the rotation axis 36 is inclined with respect to the X direction and the Z direction. That is, when the angle between the radial direction of the rotating anticathode 26 and the Z direction is defined as “inclination angle φ” (0 ≦ φ ≦ 90, unit: degree), the relationship of 0 <φ <90 is satisfied. In this embodiment, particularly, φ = 45 degrees.

  As understood from FIG. 3, since the electron source 32 and the circumferential surface portion 38 are in a positional relationship facing each other, the linear focal point (first focal point 51) by the electron beam B1 from the electron source 32 is on the circumferential surface portion 38 Is formed. The circumferential surface portion 38 emits the X-ray beam B2 from the position of or near the first focal point 51 if the specific generation condition is satisfied at the time of collision of the electron beam B1. As described later, the shape of the X-ray beam B2 emitted to the outside of the chamber 12 changes in accordance with the geometrical relationship between the linear focus and the window 22.

[Operation of X-ray generator 10]
Subsequently, the operation of the X-ray generator 10 according to this embodiment will be described with reference to FIGS. 1 to 3 and a schematic view of FIG. 4.

(1) Fixing step First, the user mounts the lid 46 at a position covering the opening 18 after the electron generator 24 and the rotating anticathode 26 are accommodated in the chamber 28 of the chamber 12. Thus, the electron generator 24 and the rotating anticathode 26 are fixedly disposed in a positional relationship in which the electron source 32 and the circumferential surface portion 38 face each other and the rotating shaft 36 is inclined with respect to the first direction and the second direction. Ru.

  The first direction and the second direction are orthogonal to each other, and intersect with the separation direction of the electron source 32 and the circumferential surface portion 38 (that is, the Y direction). Here, the first direction corresponds to the “Z direction”, and the second direction corresponds to the “X direction”.

(2) Switching Step The switching mechanism 34 switches the extending direction of the electron source 32 in accordance with the user's selection operation. Specifically, when using the linear X-ray beam B2 (see FIG. 4), switching to the “first direction”, and when using the point-like X-ray beam B3 (the same figure), “second direction” Switch to

(3) Generation Step While making the inside of the chamber 28 vacuum by using a vacuum pump (not shown), the rotating anticathode 26 is rotated in the A direction at a predetermined speed. Then, after various preparations for satisfying the X-ray generation condition are completed, the electron generator 24 generates a linear electron beam B1 according to the user's operation instruction. As a result, the X-ray beams B2 and B3 are emitted to the outside of the X-ray generator 10 through the windows 22.

  FIG. 4 is a schematic view showing the shapes of the X-ray beams B2 and B3 according to the switching operation in the first direction and the second direction. Depending on the extending direction of the electron source 32 (FIGS. 2 and 3), a first focal point 51 curved along the first direction or a second focal point 52 curved along the second direction is selectively formed. Be done.

  In the former case, the peripheral surface portion 38 emits the X-ray beam B2 from the position of the linear first focal point 51 where the electron beam B1 is incident. At this time, since the first focal point 51 is in a substantially parallel relationship with the plane formed by the window portion 22, a linear X-ray beam B2 is emitted.

  In the latter case, the peripheral surface portion 38 emits the X-ray beam B3 from the position of the linear second focal point 52 where the electron beam B1 is incident. At this time, since the second focal point 52 is in a relation substantially orthogonal to the plane formed by the window portion 22, the point-like X-ray beam B3 is emitted.

  As described above, the electron generator 24 is provided with the switching mechanism 34 for switching the extension direction of the electron source 32, and the electron generator 24 and the rotation pair are disposed in a positional relationship in which the electron source 32 and the circumferential surface 38 face each other. The cathode 26 is fixed. Thus, the linear or point-like X-ray beams B2 and B3 can be selectively selected by simply switching the extending direction of the electron source 32 without changing the positions and orientations of the electron generator 24 and the rotating anticathode 26 at all. Can be generated.

[Effect by X-ray generator 10]
Subsequently, the effects of the X-ray generator 10 will be described in detail with reference to FIGS. 5 to 7.

  FIG. 5 is a schematic view showing the formation position of the focal point at the inclination angle φ of 0 degree (φ = 0). More specifically, FIG. 5A is a projection view in which the first focal point 51 formed on the circumferential surface 38 is viewed from the Y direction, and FIG. 5B is a second focal spot formed on the circumferential surface 38 52 is a projection view in which the display 52 is viewed in the Y direction.

  As shown in FIG. 5A, the first focal point 51 has a rectangular shape having a width of W [mm] and a height of H [mm] (H> W) in plan view from the Y direction. . A line segment 53 illustrated by a broken line corresponds to a focal length that crosses in the circumferential direction. Hereinafter, the length of the line segment 53 at the first focal point 51 is referred to as “circumferential focal length L1”. In the present example, since the height direction of the first focal point 51 coincides with the circumferential direction of the circumferential surface portion 38, L1 = H [mm].

  As shown in FIG. 5B, the second focal point 52 has substantially the same shape as the first focal point 51 shown in FIG. 5A in a plan view from the Y direction. Hereinafter, the length of the line segment 53 at the second focal point 52 is referred to as “circumferential focal length L2”. In the present example, since the width direction of the second focal point 52 coincides with the circumferential direction of the circumferential surface portion 38, L1 = W [mm].

  With this X-ray generation method, the heat load applied to the rotating anticathode 26 tends to increase as the circumferential focal lengths L1 and L2 increase. And since the metal provided in the surrounding surface part 38 becomes difficult to be cooled as a thermal load increases, the phenomenon in which the output efficiency of X-ray falls is seen. That is, in FIG. 5A, the output efficiency is relatively low because L1 is large, and in FIG. 5B, the output efficiency is relatively high because L2 is small. From the viewpoint of ease of use in measurement, it is not preferable that the selection of the X-ray beams B2 and B3 causes a difference in output efficiency.

  FIG. 6 is a schematic view showing the formation position of the focal point at the inclination angle φ of 45 degrees (φ = 45). More specifically, FIG. 6A is a projection view in which the first focal point 51 formed on the circumferential surface 38 is viewed from the Y direction, and FIG. 6B is a second focal spot formed on the circumferential surface 38 52 is a projection view in which the display 52 is viewed in the Y direction.

  As shown to Fig.6 (a), the 1st focus 51 has a substantially the same shape as the 1st focus 51 shown to Fig.5 (a) in planar view from a Y direction. In the present example, since the height direction of the first focal point 51 is inclined 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L1 = √2 · W [mm].

  As shown in FIG. 6B, the second focal point 52 has substantially the same shape as the first focal point 51 shown in FIG. 5A in a plan view from the Y direction. In the present example, since the width direction of the second focal point 52 is inclined 45 degrees with respect to the circumferential direction of the circumferential surface portion 38, L2 = √2 · W [mm].

  FIG. 7 is a graph showing the relationship between the inclination angle φ and the circumferential focal lengths L1 and L2. The horizontal axis of the graph is the inclination angle φ (unit: degree), and the vertical axis of the graph is the circumferential focal lengths L1 and L2 (unit: mm). The solid line indicates the function of L1, and the dashed-dotted line indicates the function of L2.

  As understood from this figure, the circumferential focal length L1 satisfies L1 = H [mm] when φ = 0 [degree] and L1 = W [mm] when φ = 90 [degree]. It decreases monotonically as the inclination angle φ increases. On the other hand, the circumferential focal length L2 satisfies L2 = W [mm] when φ = 0 [degree], L2 = H [mm] when φ = 90 [degree], and monotonously increases as the inclination angle φ increases. To increase.

  That is, when the inclination angle φ satisfies φ = 0 [degree] or φ = 90 [degree], the value of | L1-L2 | becomes maximum, and the inclination angle φ should be set in the range of 0 <φ <90. The value of | L 1 −L 2 | is relatively small. It should be noted that the relationship of L1 = W / sin φ and L2 = W / cos φ holds in the vicinity of φ = 45 degrees.

  In this embodiment, since the rotary anticathode 26 is in a positional relationship (0 <φ <90) in which the rotation axis 36 is inclined with respect to the first direction and the second direction, When the amount of divergence | L1-L2 | of the circumferential focal lengths L1 and L2 does not cause the rotation axis 36 to tilt with respect to the first focal point 51 and the second focal point 52 formed by the emission of the electron beam B1 (φ = 0, Smaller than 90). That is, by increasing the output efficiency on the lowest side instead of reducing the output efficiency on the highest side, the maximum amount that can be output commonly to both X-ray beams B2 and B3 (that is, the limit output amount of X-rays) Bottom up.

  In addition, the positional relationship may be such that the rotation shaft 36 is inclined within a range of 30 to 60 degrees with respect to the first direction (30 ≦ φ ≦ 60). As a result, the ratio (L1 / L2 or L2 / L1) of the circumferential focal lengths L1 and L2 can be suppressed to less than approximately twice, and the gap between the two output performances is further reduced.

  Further, the rotational shaft 36 may be under the positional relationship (φ = 45) inclining 45 degrees with respect to the first direction. In this case, since the circumferential focal lengths L1 = L2 = √2 · W [mm] become equal, the limit output amount common to both X-ray beams B2 and B3 becomes maximum.

  As described above, in the X-ray generator 10, the extending direction of the electron source 32 is first while the electron source 32 emitting the [1] linear electron beam B1 and the center position O of the electron source 32 are fixed. Electron generator 24 having a switching mechanism 34 for switching to any one of the direction (Z direction) and the second direction (X direction) and the [2] electron beam B1 to collide the X-ray beams B2 and B3 A disk-shaped or cylindrical rotating anti-cathode 26 is provided which has an emitting peripheral surface portion 38 and is configured to be rotatable about a rotating shaft 36. The electron generator 24 and the rotating anticathode 26 are arranged so that the electron source 32 and the peripheral surface 38 face each other, and the rotating shaft 36 is fixed relative to the first direction and the second direction. .

  In the X-ray generation method using the X-ray generator 10, the step of arranging the electron generator 24 and the rotating anticathode 26 in a fixed position, and the extending direction of the electron source 32 among the first direction and the second direction It has a switching step of switching to either one.

  As a result, the linear or point-like X-ray beams B2 and B3 can be selectively generated with an extremely simple apparatus configuration, and the output performance of the entire apparatus can be improved. For example, when the aspect ratio of the electron source 32 is H / W = 10, if the heat load in FIG. 5A is taken as a reference (100%), FIG. 5B, FIG. 6A and FIG. The heat loads in b) are estimated to be 32%, 84% and 84%, respectively. That is, by employing the configuration of FIG. 6, although the loss is 16% compared to the maximum value, the same high gain can be obtained.

[Configuration Example of Sample Measurement System 100]
Subsequently, a sample measurement system 100 incorporating the above-mentioned X-ray generator 10 will be described with reference to FIG. Here, although an "X-ray diffraction apparatus" is demonstrated to an example, it is not restricted to this structure and measurement system.

  The sample measurement system 100 includes an X-ray generator 10 that generates X-ray beams B2 and B3, an X-ray detector 102 that detects the X-ray beams B2 and B3 reflecting the sample S, and angles in the θ1 and θ2 directions. A goniometer 104 for setting and a control device 106 (measuring means) for controlling each part are provided.

  The goniometer 104 has a first arm 110 for gripping the X-ray generator 10, a θ1 rotation mechanism 112 for rotationally driving the first arm 110 in the θ1 direction, and a second arm for gripping the detector 126 of the X-ray detection device 102. 114 and a rotation mechanism 116 for rotationally driving the second arm 114 in the θ2 direction.

  At the rotation centers of the first arm 110 and the second arm 114, a sample table 118 for mounting a sample S to be measured is fixedly arranged. The diverging slit 120 and the X-ray generator 10 are fixed to the first arm 110 in order from the center of rotation to the outside. The scattering slit 122, the light receiving slit 124, and the detector 126 are fixed to the second arm 114 in order from the rotation center outward. When the concentration method is used, as shown in the figure, the positions of the first focal point 51 and the light receiving slit 124 are adjusted to exist on a single circular orbit C.

  The X-ray detection apparatus 102 detects the amount of detection of the X-ray beams B2 and B3 based on the detection signal from the detector 126 which outputs a detection signal corresponding to the intensity of the X-ray beams B2 and B3. And a circuit 128. The detector 126 is configured to include a single X-ray detection element or an X-ray detection element array arranged linearly or in a plane.

  The controller 106 controls the θ1 rotation mechanism 112 and the θ2 rotation mechanism 116 to place the X-ray generator 10, the sample S, and the detector 126 in an appropriate positional relationship. In this measurement example, the first arm 110 and the second arm 114 are set to the same angle (θ1 = θ2).

  The controller 106 controls the X-ray generator 10 to emit the electron beam B1 (FIG. 3) and generate the X-ray beams B2 and B3. The controller 106 measures the physical quantity of the sample S based on the set angle of the goniometer 104 and the detected amounts of the X-ray beams B2 and B3 reflected by the sample S. The output device 130 outputs the measurement result of the sample S including the lattice spacing, the diffraction intensity, the mirror coefficient, the lamination period, the stress, and the identified substance name according to the output instruction from the control device 106.

  Either linear or point-like X-ray beams B2 and B3 are selected according to the type, properties of the sample S, or the combination of physical quantities to be measured. The user performs adjustment of the X-ray optical system suitable for the beam shape, specifically, replacement work of the divergence slit 120, the scattering slit 122 or the light receiving slit 124. Thereafter, the control device 106 transmits an instruction signal to the effect that the electron source 32 is turned to the switching mechanism 34 according to the operation by the user. Thereby, the extension direction of the electron source 32 is automatically switched, and desired X-ray measurement can be performed. Note that, instead of the above configuration, the extension direction of the electron source 32 may be switched manually by the user.

  As described above, the sample measurement system 100 detects the X-ray beams B2 and B3 generated from the X-ray generator 10 and the X-ray generator 10 described above and transmitted or reflected by the sample S. The apparatus 102 is provided with a controller 106 (measuring means) that measures a physical quantity related to the sample S based on the detected amounts of the X-ray beams B2 and B3. As a result, X-ray measurement can be performed in which the shapes of the X-ray beams B2 and B3 are switched in a timely manner without performing adjustment work on the X-ray generator 10 side.

[Notes]
In addition, this invention is not limited to embodiment mentioned above, Of course, it can change freely in the range which does not deviate from the main point of this invention.

10. X-ray generator 12. Chamber 22. Window portion 24. Electron generator 26. Rotating anticathode 28. Chamber 32. Electron source 34. Switching mechanism 36. Rotating shaft 38. Peripheral surface portion 42. Rotating mechanism 51. First Focal point 52 .. Second focal point 53 .. Line segment 100 .. Sample measurement system 102 .. X-ray detection device 104 .. Goniometer 106 .. Control device (measurement means)
B1 .. Electron beam B2, B3 .. X-ray beam L1, L2 .. circumferential focal length S .. sample

Claims (5)

An electron source for emitting a linear electron beam, and an extension direction of the electron source is fixed in one of a first direction and a second direction orthogonal to the first direction while fixing a central position of the electron source. An electron generator having a switching mechanism for switching;
A disk-shaped or cylindrical rotating anticathode having a peripheral surface portion for emitting an X-ray beam by colliding the electron beam from the electron source, and configured to be rotatable about a rotation axis; Equipped
The electron generator and the rotating anticathode are fixedly disposed in a positional relationship in which the electron source and the peripheral surface portion face each other, and the rotation axis is inclined with respect to the first direction and the second direction. An X-ray generator characterized by   The X-ray generator according to claim 1, wherein the rotation axis is inclined within a range of 30 to 60 degrees with respect to the first direction.   The X-ray generator according to claim 2, wherein the rotation axis is inclined 45 degrees with respect to the first direction. An electron generator having an electron source for emitting a linear electron beam, and a peripheral portion for emitting an X-ray beam by colliding the electron beam from the electron source, and rotating around a rotation axis A method of generating X-rays using an apparatus comprising a disk-shaped or cylindrical rotating anticathode configured as follows:
The electron generator and the rotating anticathode are arranged in a positional relationship in which the electron source and the circumferential surface portion face each other, and the rotation axis is inclined with respect to a first direction and a second direction orthogonal to the first direction. Fixedly placing the
Switching the extension direction of the electron source to any one of the first direction and the second direction while fixing the central position of the electron source. The X-ray generator according to any one of claims 1 to 3.
An X-ray detector for detecting an X-ray beam generated from the X-ray generator and transmitted or reflected from a sample;
A measuring unit configured to measure a physical quantity related to the sample based on a detected amount of the X-ray beam detected by the X-ray detection apparatus.

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