KR102103722B1 - Apparatus and method for generating structured light - Google Patents

Abstract

A structured light generating apparatus and method capable of acquiring a depth image of a subject by using a multiple vertical resonant surface emitting laser (VCSEL) light source, wherein a plurality of light sources are arranged in a matrix form And, a pattern conversion unit for converting the first light pattern generated from the light emitting unit to the second light pattern, and a plurality of the converted second light pattern is duplicated to generate structure light, and the generated structure light is transmitted to the subject In the light emitting unit, light sources adjacent to each other have a minimum reference interval, and the minimum reference interval may be determined according to the amount of light of the light sources adjacent to each other.

Description

Structure light generating device and method {APPARATUS AND METHOD FOR GENERATING STRUCTURED LIGHT}

The present invention relates to a structured light generating device, and more specifically, a structured light generating device and method capable of acquiring a depth image of a subject using a multiple vertical resonant surface emitting laser (VCSEL) light source It is about.

Generally, the 3D image information includes geometry information and color information, and the shape information can be obtained using a depth image.

Recently, in order to acquire such a 3D depth image, a method of acquiring depth image information using an infrared image using an active light source has been used instead of the conventional method using two or more visible light images.

In addition, among the depth measurement methods, a measurement method using a two-dimensional light meter may be representative of a structured light method using spatial deformation of a light source and a time of flight (ToF) method using temporal deformation of a light source.

Here, the structured light method is a method of measuring the depth of an object by irradiating a laser beam with a specific pattern coded to an object, recording reflected light with a camera, and calculating the amount of pattern shift of the reflected light. .

This method has a disadvantage in that it is difficult to apply to a mobile product due to the limitation in miniaturization due to the physical size of a light transmitting unit and a light receiving unit using a laser light source and receiving the coded reflected light.

In addition, since this method requires a plurality of structural light sources to be generated using a small number of light sources, a high-power light source is required, and there is a problem in that pattern formation degrades light efficiency in an optical element.

In this case, in a light-receiving sensor such as a camera, in order to distinguish structural light from disturbance light, the greater the difference in brightness between a portion with a light point and a portion without a light point, the more stable 3D depth information can be obtained.

Therefore, in order for the light receiving system to acquire stable depth information, a high-power laser light source is required, and inevitably, heat is generated.

As described above, due to the characteristics of the laser light source, when heat is generated, a wavelength shift of the light source occurs. In order to separate the disturbance light and structural light existing in the surroundings, an optical filter that passes only light of a specific wavelength is used. , Light efficiency can be further reduced rapidly.

In order to prevent such deterioration of light efficiency, a cooling device for cooling light around the laser light source and its surroundings has been used, but due to the addition of a cooling device, there are limitations in miniaturization and cost reduction. There was a problem of having a cost limit.

The technical problem to be achieved by an embodiment of the present invention is to provide a structured light generating device and method capable of reducing the overall size of the device and improving the light efficiency and stability of the structured light by configuring the light emitting part with a vertical resonant surface light laser light source. do.

In addition, the technical problem to be achieved by an embodiment of the present invention is to generate a structured light that can greatly reduce the replication distortion generated when replicating structured light in the copying unit by using the pattern conversion unit, thereby increasing the recognition rate of the structured light in the light receiving system. It is intended to provide an apparatus and method.

The structured light generating apparatus according to an embodiment of the present invention includes a light emitting unit in which a plurality of light sources are arranged in a matrix form, a pattern converting unit for converting a first light pattern generated from the light emitting unit into a second light pattern A plurality of duplicated second light patterns are generated, and the structured light is generated, and a replica unit that transmits the generated structured light to a subject is provided. In the light emitting unit, adjacent light sources have a minimum reference interval and a minimum reference interval. Silver may be determined according to light amounts of light sources adjacent to each other.

Here, the light source of the light emitting unit may be a vertical resonance surface light laser light source.

In addition, the light sources of the light emitting unit may have the same minimum reference interval between light sources adjacent to each other, and may have the same amount of light as each other.

Subsequently, the pattern converting unit converts the first optical pattern generated from the light emitting unit into the second optical pattern, wherein the second optical pattern is predetermined in the X-axis direction or the Y-axis direction with respect to the minimum pattern interval of the first optical pattern. It may be a light pattern increased by a value.

In addition, the pattern conversion unit may include at least one of a first optical member that provides light having a first optical pattern as parallel light and a second optical member that converts a first optical pattern into a second optical pattern. .

Further, a third optical member is disposed between the first optical member and the second optical member, and the third optical member may be a diffractive optical element.

A method of generating structured light in a structured light generating apparatus according to an embodiment of the present invention includes generating light having a first light pattern from a light emitting unit, and converting light generated from the light emitting unit into parallel light, Converting light having one light pattern into a second light pattern, replicating a plurality of light converted into a second light pattern, generating structured light, and transmitting the generated structured light to a subject. It can contain.

According to an embodiment of the present invention, by using a vertical resonant surface light laser light source, the light emitting portion is manufactured as a surface light source having a plurality of light source arrays, thereby optimizing the arrangement distance between light sources, minimizing the size of the light emitting portion And, there is an effect that can improve the light efficiency and stability of the structured light.

In addition, the present invention modulates the first optical pattern into the second optical pattern by taking into account distortions, such as pin cushions, etc. that occur when replicating the structured light in the replica unit using the pattern conversion unit, so that the replica distortion in the replica unit It has the effect of significantly reducing the structure light recognition rate in the light receiving system.

1 schematically shows a structured light generating device according to the present invention
2A and 2B are diagrams showing a minimum reference interval between light sources.
3 is a view showing that the minimum reference interval between light sources is different.
4 is a view showing a light emitting unit in which light sources are disposed
5 is a view showing a light pattern generated from the light emitting unit
6A to 6C are diagrams showing light patterns converted from a pattern converter
7A to 7D are views showing the configuration of the pattern conversion unit of FIG. 1.
8 is a view showing the second optical member of FIG. 7A;
9 is a view showing another embodiment of the configuration of the pattern conversion unit of FIG.
10A and 10B are views showing another embodiment of the configuration of the pattern conversion unit of FIG. 1.
11 is a view showing a pincushion deformation according to optical pattern replication.
12 is a flowchart for explaining a method of generating structured light in a structured light generating apparatus according to the present invention

Hereinafter, the present invention will be described in more detail with reference to the drawings.

The suffixes "modules" and "parts" for components used in the following description are simply given in consideration of the ease of writing this specification, and the "modules" and "parts" may be used interchangeably.

Furthermore, embodiments of the present invention will be described in detail with reference to the accompanying drawings and the contents described in the accompanying drawings, but the present invention is not limited or limited by the embodiments.

The terminology used in the present specification is a general terminology that is currently widely used while considering functions in the present invention, but this may vary depending on the intention or custom of a person skilled in the art or the appearance of new technologies. In addition, in certain cases, some terms are arbitrarily selected by the applicant, and in this case, their meaning will be described in the description of the applicable invention. Therefore, the terms used in the present specification are intended to clarify that the terms should be interpreted based on the actual meaning of the terms and the contents of the present specification, not simply the names of the terms.

1 is a view schematically showing a structured light generating apparatus according to the present invention.

As shown in FIG. 1, the structured light generating apparatus of the present invention may include a light emitting unit 100, a pattern conversion unit 200, and a copying unit 300.

Here, the light emitting unit 100, a plurality of light sources may be arranged in a matrix form.

In this case, the light source of the light emitting unit 100 may be a vertical resonant surface light laser light source.

The vertical resonant surface light laser light source is a surface light source used in the field of optical communication, and has high mass productivity, low cost, high temperature stability, and has advantages such as high modulation speed, narrow spectrum, narrow radiation angle, high conversion efficiency, and low operating current. Have

In addition, the vertical resonant surface light laser light source has the advantage of being capable of mass production by printing a plurality of low-power and high-efficiency lasers in the form of surface light sources on a semiconductor wafer.

Therefore, when a vertical resonant surface light laser light source is applied to a structured light generating device, light source or light source and pattern generation can be utilized at the same time, so the price, size, light efficiency and stability of the structured light generating device can replace existing small-scale high-power lasers. It is more effective than the structured light generating device used.

As described above, since the vertical resonance surface light laser light source has better light efficiency than the existing high-power laser, it is possible to optimize the structure light shape, thereby increasing the recognition rate of the 3D depth information of the light receiving system.

When the vertical resonant surface light laser light source is applied to the light emitting unit 100 of the present invention, light sources adjacent to each other may have a minimum reference interval.

Here, the minimum reference interval means a minimum interval for maintaining heat generation characteristics between vertical resonant surface light laser light sources.

Therefore, the minimum reference interval may be determined according to the amount of light of light sources adjacent to each other.

That is, the present invention uses a vertical resonant surface light laser light source to manufacture the light emitting unit 100 as a surface light source having a plurality of light source arrays. The size of the light emitting unit 100 may be minimized by setting the minimum distance to be maintained as an arrangement distance between light sources.

For example, the light sources of the light emitting unit 100 may have the same minimum reference interval between light sources adjacent to each other.

Here, the light sources of the light emitting unit 100 may have the same amount of light as each other.

As described above, when all of the minimum reference intervals between adjacent light sources are the same, the reason why the light sources of the light emitting units 100 have the same amount of light is that the minimum reference interval between the light sources depends on the light amounts of the adjacent light sources. Because, it is decided.

For example, if the interval between the light sources having a large amount of light and the distance between the light sources having a small amount of light are the same, the light sources having a large amount of light have a smaller distance than the amount of light, thus affecting the heat generation characteristics between the light sources, Since the wavelength shift of the light source occurs and is blocked by the optical filter, the light efficiency may drop rapidly.

Therefore, depending on the amount of light of the light sources, the light sources should be arranged at a minimum reference interval.

As an example, the light sources of the light emitting unit 100 may include first light sources adjacent to each other and having a first distance, and second light sources adjacent to each other and having a second distance, in this case, the first light sources. The spacing may be closer than the second spacing.

Here, when the first light sources have a first light amount and the second light sources have a second light amount, the first light amount may be smaller than the second light amount.

That is, if the amount of light between the light sources is large, the distance between the light sources can be widened, and if the amount of light between the light sources is small, the distance between the light sources can be narrowed.

In one embodiment, in the light emitting unit 100 of the present invention, the distance between light sources adjacent to each other is about 20 to 30 μm, and the light amount of light sources adjacent to each other may be about 2 to 3 mW.

Accordingly, the light emitting unit 100 may include a substrate and a plurality of light sources arranged in a matrix form on the substrate and generating a first light pattern.

That is, the light emitting unit 100 is made of a surface light source in which a plurality of light sources are arranged, and can generate a light pattern through a light point.

Next, the pattern conversion unit 200 may convert the first light pattern generated from the light emitting unit 100 into a second light pattern.

Here, the second optical pattern may be an optical pattern increased by a predetermined value in the X-axis direction or the Y-axis direction with respect to the minimum pattern interval of the first optical pattern.

That is, the first light pattern is a structure light point generated by the arrangement of the minimum reference spacing of the light sources, and the second light pattern is a pattern obtained by modulating the minimum reference distance between the structure light points generated by the light sources.

Therefore, the pattern converter 200 modulates the first optical pattern into the second optical pattern and transforms the structural light, thereby increasing the recognition rate of the structural light in the light receiving system.

In addition, the pattern converting unit 200 modulates the first light pattern into the second light pattern in consideration of distortions, such as pin cushions, etc. generated when replicating the structured light in the copying unit 300, so that the copying unit 300 Distortion of replication can be greatly reduced.

In addition, the pattern conversion unit 200 may include at least one of a first optical member that provides light having a first optical pattern as parallel light and a second optical member that converts the first optical pattern into a second optical pattern. It can contain.

For example, the first optical member may be a collimating lens, but is not limited thereto.

In addition, the second optical member may be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and a combination member thereof, but is not limited thereto.

Here, the first optical member may be disposed adjacent to the light emitting unit 100, and the second optical member may be disposed adjacent to the replica unit 300.

At this time, the first optical member and the second optical member may be formed integrally in contact with each other.

In some cases, the first optical member and the second optical member may be arranged at regular intervals.

In another case, a third optical member may be disposed between the first optical member and the second optical member, for example, the third optical member may be a diffractive optical element.

Then, the replicating unit 300 may duplicate the converted second light pattern into a plurality, generate structured light, and transmit the generated structured light to the subject.

Here, the replica unit 300 may be a diffractive optical element.

As described above, according to the present invention, the vertical distance between the light sources can be optimized by manufacturing the light emitting unit 100 as a surface light source having a plurality of light source arrays using a vertical resonant surface light laser light source. The size of 100) can be minimized.

In addition, the present invention modulates the first light pattern into the second light pattern by taking into account distortions, such as pin cushions, etc., generated during duplication of structured light in the replica unit 300 using the pattern converter 200. , The replication distortion in the replication unit 300 can be greatly reduced, thereby increasing the recognition rate of structured light in the light receiving system.

2A and 2B are diagrams showing a minimum reference interval between light sources.

2A and 2B, the light emitting unit may include a plurality of light sources arranged in a matrix form.

Here, the light source of the light emitting unit may be a vertical resonance surface light laser light source.

At this time, the light sources adjacent to each other may have a minimum reference interval d.

Here, the minimum reference interval d means a minimum interval for maintaining the heat generation characteristics between the light sources.

Therefore, the minimum reference interval d may be determined according to the amount of light of light sources adjacent to each other.

That is, the present invention uses a vertical resonant surface light laser light source to manufacture a light emitting part as a surface light source having a plurality of light source arrays. In order to manufacture a surface light source with a minimum area, a minimum distance to maintain heat generation characteristics between light sources It is possible to minimize the size of the light emitting unit by setting the distance between the light sources.

As an example, when the first, second, and third light sources 110a, 110b, and 110c adjacent to each other are arranged in a triangular shape, as shown in FIG. 2A, the minimum reference between the first and second light sources 110a, 110b The interval d, the minimum reference interval d between the second and third light sources 110b and 110c, and the minimum reference interval d between the first and third light sources 110a and 110c may all be the same.

Here, the first, second, and third light sources 110a, 110b, and 110c may have the same amount of light as each other.

In one embodiment, the minimum reference spacing d between the first and second light sources 110a and 110b, the minimum reference spacing d between the second and third light sources 110b and 110c, and the first and third light sources 110a , 110c), the minimum reference interval d may be about 20-30 um, and the light amounts of the first, second, and third light sources 110a, 110b, and 110c may be about 2-3 mW.

As described above, when the minimum reference intervals d between the adjacent first, second, and third light sources 110a, 110b, and 110c are all the same, the first, second, and third light sources 110a, 110b, 110c The reason why they have the same amount of light is that the first, second, and third light sources 110a, 110b, in which the minimum reference interval between the first, second, and third light sources 110a, 110b, 110c are adjacent to each other. This is because it is determined according to the amount of light of 110c).

For example, if the interval between the light sources having a large amount of light and the distance between the light sources having a small amount of light are the same, the light sources having a large amount of light have a smaller distance than the amount of light, thus affecting the heat generation characteristics between the light sources, Since the wavelength shift of the light source occurs and is blocked by the optical filter, the light efficiency may drop rapidly.

Therefore, depending on the amount of light of the light sources, the light sources should be arranged at a minimum reference interval.

As another example, when the first, second, third, and fourth light sources 110a, 110b, 110c, and 110d adjacent to each other are arranged in a square shape, as shown in FIG. 2B, the first and second light sources 110a, 110b ), The minimum reference spacing d between the second and third light sources 110b, 110c, the minimum reference spacing d between the third and fourth light sources 110c, 110d, and the first and fourth The minimum reference distance d between the light sources 110a and 110d may be the same.

Here, the first, second, third, and fourth light sources 110a, 110b, 110c, and 110d may have the same amount of light as each other.

In one embodiment, the minimum reference spacing d between the first and second light sources 110a and 110b, the minimum reference spacing d between the second and third light sources 110b and 110c, the third and fourth light sources 110c, The minimum reference spacing d between 110d) and the minimum reference spacing d between the first and fourth light sources 110a and 110d may be about 20 to 30 um, and the first, second, third, and fourth light sources ( The amount of light of 110a, 110b, 110c, and 110d) may be about 2-3 mW.

3 is a view showing that the minimum reference interval between light sources is different.

As illustrated in FIG. 3, the light emitting unit may include a plurality of light sources arranged in a matrix form.

Here, the light source of the light emitting unit may be a vertical resonance surface light laser light source.

At this time, the light sources adjacent to each other may have a minimum reference interval d.

Here, the minimum reference interval d means a minimum interval for maintaining the heat generation characteristics between the light sources.

Therefore, the minimum reference interval d may be determined according to the amount of light of light sources adjacent to each other.

For example, as shown in FIG. 3, when the first, second, third, and fourth light sources 110a, 110b, 110c, and 110d adjacent to each other are arranged in a square shape, the first and second light sources 110a, 110b ), The minimum reference spacing d1 between the third and fourth light sources 110c, 110d is the same, and the minimum reference spacing d2 between the second and third light sources 110b, 110c, The minimum reference interval d2 between the first and fourth light sources 110a and 110d may be the same as each other.

Further, the minimum reference interval d1 between the first and second light sources 110a and 110b and the minimum reference interval d1 between the third and fourth light sources 110c and 110d are the second and third light sources 110b and 110c. ), Or may be smaller than the minimum reference distance d2 between the first and fourth light sources 110a and 110d.

Here, the light amounts of the first and second light sources 110a and 110b may be smaller than the light amounts of the third and fourth light sources 110c and 110d.

That is, if the amount of light between the light sources is large, the distance between the light sources can be widened, and if the amount of light between the light sources is small, the distance between the light sources can be narrowed.

4 is a view showing a light emitting unit in which light sources are disposed.

As shown in FIG. 4, the light emitting unit may include a substrate 120 and a plurality of light sources 110 arranged on a substrate 120 in a matrix form and generating a first light pattern.

That is, the light emitting unit may be made of a surface light source in which a plurality of light sources 110 are arranged, and generate a light pattern through a light point.

Here, the light sources 110 adjacent to each other have a minimum reference distance d, and the minimum reference distance d may be determined according to the amount of light of the light sources 110 adjacent to each other.

In addition, the light source 110 may be a vertical resonance surface light laser light source.

At this time, the light source 110 can be mass-produced by printing a plurality of low-power, high-efficiency lasers in the form of surface light sources on a semiconductor wafer.

Therefore, the light source 110, since the light efficiency is superior to the conventional high-power laser, it is possible to optimize the structure light shape, it is possible to increase the recognition rate of the three-dimensional depth information of the light receiving system.

That is, the light emitting unit is made of a surface light source having a plurality of light source arrays. In order to manufacture a surface light source with a minimum area, the minimum reference distance between the light sources 110 is the minimum distance that maintains the heat generation characteristics between the light sources 110. At intervals, the size of the light emitting portion can be minimized.

5 is a view showing a light pattern generated from the light emitting unit.

As shown in FIG. 5, the light emitting unit may generate various first light patterns 130.

Here, in the first light pattern 130, light points adjacent to each other may have a minimum reference interval d.

At this time, the minimum reference interval d means a minimum interval for maintaining heat generation characteristics between light sources.

In addition, the first light pattern 130 may be designed using various characteristics such as shape, distribution, and brightness of the light spot.

Here, the minimum independent structure light is a structure light that exists in a section without the same structure light shape as itself, and is related to the minimum area of the subject capable of detecting the structure light in the light receiving system, and thus is designed to be the smallest possible size. Can.

In addition, the first optical pattern 130 may be designed in the light receiving system in consideration of the degree of distortion of the structured light that appears when the structured light is detected.

The present invention can be designed in two stages when designing a structured light shape.

The first step is designing a normal distributed structured light shape using a minimum reference distance d between the light sources, which is called normalized pattern design.

In addition, the second step is a structured light in which the generated normal distributed structured light is deformed while passing through the pattern conversion unit, and is a non-normalized pattern design for increasing the recognition rate compared to the normally distributed structured light generated by the light source.

Here, the normalization pattern design stage, which is the first step, in the 3D depth information measurement system, provides various required characteristics such as shape, distribution, and brightness of the light spot according to the parallax distance, which is the distance between the illumination system and the light receiving system. Can be designed using.

At this time, the shape-independent section is a section in which the structured light shape does not have the same shape except for itself in the section.

Therefore, the size of the minimum independent structure light can be designed to the minimum size.

In addition, the normalized pattern design stage may be designed to be distinguished from errors when the structured light is measured by the characteristics of the structured light measurement system or when the structured light is deformed due to disturbance, or by including the specific conditions of the structured light shape so that error correction is possible.

In addition, the design results of the shape-independent section of the normal distribution structured light can be combined in multiple shapes independent sections in consideration of the amount of light according to the needs of the utilization region.

And, the result of the multiple combined structured light can be matched with the arrangement of each laser light source of the multiple vertical resonant surface light laser.

6A to 6C are views showing light patterns converted from the pattern converter.

6A to 6C, the pattern conversion unit may convert the first light pattern 130 generated from the light emitting unit to the second light pattern 140.

Here, the second optical pattern 140 may be an optical pattern increased by a predetermined value in the X-axis direction or the Y-axis direction with respect to the minimum pattern spacing of the first optical pattern 130.

The pattern converting unit may make the second optical pattern 130 of various shapes by deforming the first optical pattern 130 in various ways.

For example, as shown in FIG. 6A, the pattern converting unit may deform the first optical pattern 130 by the origin rotation method to make the second optical pattern 140.

As another example, as shown in FIG. 6B, the pattern conversion unit may deform the first optical pattern 130 in an enlarged manner, thereby creating the second optical pattern 140.

As another example, as shown in FIG. 6C, the pattern converting unit may deform the first optical pattern 130 in a barrel deformation method to alleviate the pin cushion phenomenon, thereby making the second optical pattern 140.

The present invention can be designed in two stages when designing a structured light shape.

The first step is designing a normal distributed structured light shape using a minimum reference distance d between the light sources, which is called normalized pattern design.

In addition, the second step is a structured light in which the generated normal distributed structured light is deformed while passing through the pattern conversion unit, and is a non-normalized pattern design for increasing the recognition rate compared to the normally distributed structured light generated by the light source.

Here, the second stage, the denormalized pattern design stage, is based on the results generated by the normalized pattern design stage, in the shape independent section, such as cross-correlation value, such as to minimize the similarity between each shape. , Shape, distribution, brightness, etc.

The non-normalized pattern design stage applies various strains (size, rotation, distortion, etc.) individually or independently to parts that can be easily applied among irradiation optical systems such as a projection lens and a diffractive optical element.

In addition, in order to replicate the structure-independent section of the structure light as much as the viewing angle of the light receiving system, the structure light replication optical system, such as a diffractive optical element used, distributes the structure light radially, so that pincushion deformation is generally caused at the outside.

Therefore, a non-normalized pattern design stage such as a pattern converting unit may perform non-normal deformation of the structured light in consideration of the barrel deformation to some extent in order to correct such pincushion deformation.

7A to 7D are diagrams showing the configuration of the pattern conversion unit of FIG. 1.

7A to 7D, the pattern conversion unit 200 can be designed with various optical systems.

The pattern converting unit 200 is for converting the first light pattern 130 generated from the light emitting unit into the second light pattern 140, and the pattern converting unit 200 receives light having a first light pattern. At least one of the first optical member provided as parallel light and the second optical member converting the first light pattern to the second light pattern may be included.

As shown in FIG. 7A, the pattern conversion unit 200 may include a first optical member 210 and a second optical member 220 between the light emitting unit 100 and the replica unit 300.

Here, the first optical member 210 may be disposed adjacent to the light emitting unit 100, and the second optical member 220 may be disposed adjacent to the replica unit 300.

In this case, the first optical member 210 may provide light having the first light pattern 130 incident from the light emitting unit 100 as parallel light.

For example, the first optical member 210 may be a collimating lens.

In addition, the second optical member 220 may be an optical member that converts the first optical pattern 130 into the second optical pattern 140.

For example, the second optical member 220 may be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and a combination member thereof.

Here, the beam shaping prism and the beam shaping lens are devices that give a strain that extends or reduces the incident light in a specific direction.

The beam shaping lens may have the same function as the beam shaping prism, but instead of a prism, an anamorphic lens having different curvature radii of horizontal and vertical, which changes the output ratio of the horizontal and vertical input light. to be.

When such a beam shaping lens is used, it is advantageous to reduce parts since it is not necessary to use a separate beam shaping prism by integrating with the collimating lens.

As described above, in the present invention, if a beam shaping prism or a beam shaping lens is used and these are arranged at an appropriate angle with respect to the input light, the normal pattern can be modified in a desired direction.

In addition, when a beam shaping element is used, since there is no need to add a separate diffraction element, the light pattern can be changed while maintaining the contrast of the light source, which is advantageous in the identification of the light pattern.

As another example, as illustrated in FIG. 7B, the pattern conversion unit 200 includes a first optical member 210 and a second optical member including a plurality of optical elements between the light emitting unit 100 and the replica unit 300. It may include (220).

Here, the first optical member 210 may be disposed adjacent to the light emitting unit 100, and the second optical member 220 may be disposed adjacent to the replica unit 300.

In this case, the second optical member 220 may include a first optical element 220a and a second optical element 220b.

The first optical member 210 may be a collimating lens capable of providing light having a first light pattern 130 incident from the light emitting unit 100 as parallel light.

In addition, the second optical member 220 is an optical member that converts the first optical pattern 130 into the second optical pattern 140, and may include a plurality of optical elements, for example, the first optical element It may include (220a) and the second optical element (220b).

Here, the first optical element 220a and the second optical element 220b are any one of a beam shaping prism, a beam shaping lens, a reflecting mirror, and a reflecting prism, and may be different devices.

For example, the first optical element 220a is a beam shaping lens, the second optical element 220b is a reflective mirror or a reflective prism, or the first optical element 220a is a reflective mirror or a reflective prism, 2, the optical element 220b may be a beam shaping prism.

As another example, as shown in FIG. 7C, the pattern converting unit 200 may be disposed in front of the light emitting unit 100 and may serve as the replicating unit 300 instead of omitting the replicating unit 300.

Here, the pattern conversion unit 200 includes a first optical member 210 and a second optical member 220, the first optical member 210 may be a collimating lens, the second optical member 220 ) May be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and combination members thereof.

As another example, as shown in FIG. 7D, the pattern conversion unit 200 may be disposed between the light emitting unit 100 and the replica unit 300.

Here, the pattern conversion unit 200, the first optical member 210, which is a collimating lens, is omitted, and only the second optical member 220 may be disposed.

In this case, the second optical member 220 may be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and a combination member thereof.

8 is a view showing the second optical member of FIG. 7A.

The second optical member 220 may be at least one of a beam shaping prism, a beam shaping lens, a reflective mirror, a reflecting prism, and a combination member thereof. As shown in FIG. 8, the beam shaping prism is incident light Is a device that gives a strain that increases or decreases the circular symmetrical shape in a specific direction.

Here, the beam shaping prism can deform the emitted light by extending the incident light in a specific direction on the optical structure.

Therefore, the beam shaping prism can be deformed in a desired direction by arranging at an appropriate angle with respect to the incident light having the first light pattern.

9 is a view showing another embodiment of the configuration of the pattern conversion unit of FIG. 1.

As illustrated in FIG. 9, the pattern conversion unit 200 may include a first optical member 210 and a second optical member 220 between the light emitting unit 100 and the replica unit 300. .

In addition, a third optical member 230 may be disposed between the first optical member 210 and the second optical member 220.

Here, the first optical member 210 may be disposed adjacent to the light emitting unit 100, and the second optical member 220 may be disposed adjacent to the replica unit 300.

In this case, the first optical member 210 may provide light having the first light pattern 130 incident from the light emitting unit 100 as parallel light.

For example, the first optical member 210 may be a collimating lens.

In addition, the second optical member 220 may be an optical member that converts the first optical pattern 130 into the second optical pattern 140.

For example, the second optical member 220 may be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and a combination member thereof.

In addition, the third optical member 230 may duplicate the first optical pattern 130.

For example, the third optical member 230 may be a diffractive optical element.

That is, the third optical member 230 can form a desired pattern by slightly twisting the normalization pattern of the light source.

In addition, the third optical member 230, by generating a diffraction pattern on one surface, and using the optical power on the other surface, it is possible to alleviate the replication distortion generated by the replica unit 300.

Therefore, the third optical member 230 replicates the first optical pattern in consideration of distortions, such as pin cushions, etc. that occur when replicating the structural light in the replica unit 300, thereby twisting and deforming the first optical pattern. , The replication distortion in the replication unit 300 can be greatly reduced.

10A and 10B are views showing another embodiment of the configuration of the pattern conversion unit of FIG. 1.

10A and 10B, the pattern conversion unit 200 includes a first optical member 210 and a second optical member 220 between the light emitting unit 100 and the replica unit 300. can do.

Here, the first optical member 210 may be disposed adjacent to the light emitting unit 100, and the second optical member 220 may be disposed adjacent to the replica unit 300.

In this case, the first optical member 210 may provide light having the first light pattern 130 incident from the light emitting unit 100 as parallel light.

For example, the first optical member 210 may be a collimating lens.

In addition, the second optical member 220 may be an optical member that converts the first optical pattern 130 into the second optical pattern 140.

For example, the second optical member 220 may be at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, a reflecting prism, and a combination member thereof.

As shown in FIG. 10A, the first optical member 210 and the second optical member 220 may be formed integrally in contact with each other.

In some cases, as shown in FIG. 10B, the first optical member 210 and the second optical member 220 may be disposed apart at a predetermined interval d11.

Here, the distance between the first optical member 210 and the second optical member 220 may be an element that reduces the size of the optical system of the structured light generating device, and it is important to transform the first optical pattern into a second optical pattern It can be an element.

Accordingly, the present invention adjusts the distance between the first optical member 210 and the second optical member 220 to obtain a desired structured light pattern, or the first optical member 210 and the second optical member ( 220) may also be manufactured.

11 is a view showing a pincushion deformation according to light pattern replication.

As illustrated in FIG. 11, the replica unit replicates a plurality of converted second light patterns to generate structure light, and pin cushion deformation may occur in the structure light.

That is, the replica unit may generate distortions, such as a pin cushion, when replicating structured light.

Therefore, the present invention, in consideration of these distortions, modulates the first optical pattern into the second optical pattern, thereby greatly reducing the replication distortion in the replicating unit and increasing the recognition rate of the structured light in the light receiving system.

12 is a flowchart illustrating a structured light generating method of the structured light generating device according to the present invention.

As illustrated in FIG. 12, first, the light emitting unit generates light having a first light pattern. (S10)

Subsequently, the pattern converting unit converts light generated from the light emitting unit into parallel light. (S20)

Then, the pattern conversion unit converts light having the first light pattern into a second light pattern. (S30)

Here, when converting the light having the first light pattern into the second light pattern, the second light pattern is converted to increase by a predetermined value in the X-axis direction or the Y-axis direction with respect to the minimum pattern interval of the first light pattern Can be.

Next, the duplication unit may replicate a plurality of light converted to the second light pattern, generate structure light (S40), and transmit the generated structure light to the subject. (S50)

As described above, according to the present invention, by using a vertical resonant surface light laser light source, the light emitting unit is manufactured as a surface light source having a plurality of light source arrays, thereby optimizing the arrangement distance between light sources, minimizing the size of the light emitting unit, It is possible to improve the light efficiency and stability of the structured light.

In addition, the present invention modulates the first optical pattern into the second optical pattern by taking into account distortions, such as pin cushions, etc. that occur when replicating the structured light in the replica unit using the pattern conversion unit, so that the replica distortion in the replica unit By greatly reducing, it is possible to increase the recognition rate of the structured light in the light receiving system.

In the above, preferred embodiments of the present invention have been illustrated and described, but the present invention is not limited to the specific embodiments described above, and it is usually in the technical field to which the present invention belongs without departing from the gist of the present invention claimed in the claims. Of course, various modifications can be made by those having knowledge of, and these modifications should not be individually understood from the technical idea or prospect of the present invention.

100: light emitting unit 130: first light pattern
140: second optical pattern 200: pattern conversion unit
210: first optical member 220: second optical member
230: third optical member 300: replica

Claims (18)

A light emitting unit in which a plurality of light sources are arranged in a matrix form;
A pattern converting unit converting the first light pattern generated from the light emitting unit into a second light pattern; And,
And a replica unit for replicating the converted second light pattern into a plurality, generating structure light, and transmitting the generated structure light to an object,
In the light emitting unit, light sources adjacent to each other have a minimum reference interval,
The minimum reference interval is determined according to the amount of light of the light sources adjacent to each other,
The pattern converting unit converts the second optical pattern by applying an origin rotation method, an enlargement method, or a barrel deformation method to the first pattern using at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, and a reflecting prism. Characterized in that, the structured light generating device. delete The structure light generating apparatus of claim 1, wherein the light sources of the light emitting units have the same minimum reference interval between light sources adjacent to each other. delete The light source of the light emitting unit,
First light sources adjacent to each other and having a first interval,
Second light sources adjacent to each other and having a second distance,
The first interval, the structured light generating apparatus, characterized in that closer than the second interval. The method of claim 5, wherein the first light sources, have a first light amount,
The second light sources have a second amount of light,
The first light amount, the structure light generating apparatus, characterized in that smaller than the second light amount. delete delete According to claim 1, The pattern conversion unit,
The first light pattern generated from the light emitting unit is converted into a second light pattern,
The second light pattern,
A structured light generating apparatus, characterized in that it is an optical pattern increased by a predetermined value in the X-axis direction or the Y-axis direction with respect to the minimum pattern interval of the first optical pattern. According to claim 1, The pattern conversion unit,
At least one of a first optical member that provides light having the first optical pattern as parallel light, and a second optical member that converts the first optical pattern to the second optical pattern,
The second optical member includes a plurality of optical elements,
The plurality of optical elements is a structured light generating device, characterized in that any one of the beam shaping prism, the beam shaping lens, the reflective mirror and the reflective prism. delete The method of claim 10, wherein the first optical member is disposed adjacent to the light emitting portion,
The second optical member is a structured light generating device, characterized in that disposed adjacent to the replica. The structured light generating apparatus according to claim 10, wherein the first optical member and the second optical member are formed integrally in contact with each other. delete 11. The method of claim 10, A third optical member is disposed between the first optical member and the second optical member,
The third optical member is a structured light generating device, characterized in that a diffractive optical element. delete In the structure light generating method of the structure light generating apparatus including a light emitting unit in which a plurality of light sources are arranged at a minimum reference interval,
Generating light having a first light pattern from the light emitting unit;
Making light generated from the light emitting unit into parallel light;
Converting light having the first light pattern into a second light pattern;
Generating a structured light by duplicating a plurality of light converted into the second light pattern; And,
And transmitting the generated structural light to an object,
The step of converting the light having the first light pattern into the second light pattern may include an origin rotation method, an enlargement method, or a barrel deformation method using at least one of a beam shaping prism, a beam shaping lens, a reflecting mirror, and a reflecting prism. And applying it to the first pattern to convert it into the second optical pattern. delete

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