KR102092949B1 - Dual bellows for slit valves for semiconductor processes and Leak monitoring system for slit valves using the same - Google Patents

Abstract

The present invention relates to dual bellows for slit valves for semiconductor processes and a leak monitoring system for slit valves using the same. According to an embodiment of the present invention, disclosed are dual bellows for slit valves for semiconductor processes and a leak monitoring system for slit valves using the same, wherein the bellows are used for mutually isolating a valve housing and a valve drive unit of a slit valve for semiconductor processes in terms of gas pressure, and are applied with a dual bellows structure having outer bellows and inner bellows to reduce a risk of a gas leak. Moreover, a connection member is used to reduce interference between the outer bellows and the inner bellows and a risk of damage caused by the interference.

Description

Double bellows for slit valves for semiconductor processes and Leak monitoring system for slit valves using the same}

The present invention relates to a double bellows for a slit valve for a semiconductor process and a slit valve leak monitoring system using the same, a bellows used to isolate the valve housing and the valve drive of the slit valve for a semiconductor process from each other in terms of gas pressure. Double for bevel valves for semiconductor processes configured to reduce the risk of gas leaks by applying a double bellows structure with bellows and inner bellows, and reduce the risk of interference and consequent damage between the outer and inner bellows using a connecting member A bellows and a slit valve leak monitoring system using the same.

In substrate processing systems such as semiconductors, flat panel displays, and solar panels, vacuum chambers (eg, transfer chambers, processing chambers) of various functions are installed, and these vacuum chambers are arranged (eg, cluster arrangement, in-line arrangement) to form a vacuum chamber. Alternatively, the substrate is transferred to the outside and the substrate is processed inside the vacuum chamber.

A slit-shaped gate capable of vacuum blocking is used to access the inside of the vacuum chamber to draw or withdraw the substrate and to enable vacuum operation, and this gate is commonly referred to as a slit valve.

The slit valve typically includes a valve housing in which a blocking opening / closing operation is performed by vertical movement of the gate and a valve driving unit that provides driving force to drive the gate up and down, and prevents the gas environment inside the valve housing from being exposed to the outside. A vacuum bellows is installed that isolates the housing and the valve drive from each other in terms of gas pressure.

As an example of the prior art, the Republic of Korea registered utility model 20-0460437 (registered on May 14, 2012) relates to a slit valve of semiconductor manufacturing equipment, a shaft having a metal bellows seal applied to a piston shaft of a cylinder and A slit valve assembly consisting of a bellows integrated body was proposed.

As another example of the prior art, Korean Patent Registration No. 10-1846005 (registered on March 30, 2018) relates to a slit valve, receiving a plate unit sealing the chamber, receiving the plate unit, and communicating with the chamber on the side surface. A housing including a gate, a driving unit including a bellows coupled to a lower portion of the housing and moving the plate unit up and down and coupled to a housing coupled to a main shaft, and a control unit controlling the plate unit and the driving unit. The composition was proposed.

However, since the vacuum bellows of the prior art applied to the slit valve for a semiconductor process is composed of one layer, there is a risk of leaking the vacuum bellows when damage due to long-term use or corrosion occurs.

In addition, a number of vacuum chambers and slit valves are disposed and used in the semiconductor process. However, when a leak occurs in the vacuum bellows, there is a limitation in that it is difficult to easily identify which slit valve is installed in the vacuum bellows.

On the other hand, prior art has been proposed for a bellows to which a dual structure is applied, such as Republic of Korea Patent Publication No. 10-2015-0114300 (published on October 12, 2015), such a prior art structure of the valve drive of the slit valve for semiconductor processing There was a limitation in that it was unsuitable for application to a slit valve in that it was not proposed considering.

Republic of Korea registered utility model 20-0460437 (registered on May 14, 2012) Republic of Korea Registered Patent 10-1846005 (Registration on March 30, 2018) Republic of Korea Patent Publication 10-2015-0114300 (released on October 12, 2015)

The present invention has been devised in view of the above problems, and is a bellows used to isolate the valve housing and the valve drive of the slit valve for semiconductor processing from each other in terms of gas pressure, and a double bellows structure having an outer bellows and an inner bellows A double bellows for a slit valve for a semiconductor process and a slit valve leak monitoring system using the same are used to reduce the risk of gas leak and reduce the risk of interference and consequent damage between the outer and inner bellows using a connecting member. The purpose is to provide.

According to an aspect of the present invention for achieving the above object, a ring-shaped flange body portion is formed on the upper side of the hollow pipe-shaped short pipe portion is formed, the first flange formed on the side of the pipe portion pressure gauge connection measuring pipe ; One or more through-holes are formed in the ring-shaped connecting body portion in the vertical direction, and at least one connecting member spaced apart from the upper side of the first flange; One end is hermetically coupled to the upper end of the short pipe part, and the other end is hermetically coupled to the lower surface of the connecting body portion of the connecting member adjacent to the first flange, the metal material being combined in a form surrounding the outer position of the through hole The first outer bellows; One end is hermetically coupled to the upper side of the flange body portion, the other end is hermetically coupled to the lower side of the connecting body portion of the connecting member adjacent to the first flange, the metal is coupled in a form surrounding the inner position of the through hole A first inner bellows of the material; A second flange formed in a ring shape and spaced apart from the upper side of the connecting member; One end is hermetically coupled to the upper side of the connecting body portion of the connecting member adjacent to the second flange, and the other end is hermetically coupled to the lower side of the second flange to be coupled in a form surrounding the outer position of the through hole. A second outer bellows made of metal; And one end is hermetically coupled to the upper side of the connecting body portion of the connecting member adjacent to the second flange, and the other end is hermetically coupled to the lower side of the second flange to be coupled to surround the inner position of the through hole. Disclosed is a double bellows for a slit valve for a semiconductor process comprising a; second inner bellows of a metallic material.

Preferably, the connecting member is provided with two or more spaced apart from each other, one end is hermetically coupled to the upper side of the connecting body of the lower connecting member, and the other end is hermetically coupled to the lower side of the connecting body of the upper connecting member. , External bellows for connection of a metal material coupled in a form surrounding the outer position of the through hole; And one end is hermetically coupled to the upper side of the connecting body portion of the lower connecting member, and the other end is hermetically coupled to the lower side of the connecting body portion of the upper connecting member, the metal material being combined in a form surrounding the inner position of the through hole. It is configured to further include; the inner bellows for connection of.

Preferably, one outer bellows and one inner bellows located therein constitute one bellows set, and one bellows set and another one bellows set have different elastic strains.

Preferably, the elastic strain of the first bellows set constituted by the first outer bellows and the first inner bellows has the smallest elastic strain than another bellows set located further upward, and the second outer bellows and the second inner The elastic strain of the second bellows set constituted by the bellows is further configured to have the greatest elastic strain than another bellows set located at the lower side.

Preferably, the double bellows is disposed in an inverted state up and down such that the first flange is located at the top and the second flange is located at the bottom, and the first bellows constituted by the first outer bellows and the first inner bellows Another set of elastic strains of the second bellows set constituted by the second outer bellows and the second inner bellows has a greater elastic strain than another set of bellows having a lower elastic strain of the set. It is configured to have the smallest elastic strain than the bellows set.

Preferably, one set of bellows and another set of bellows have different elastic strains by being configured to have different lengths.

Preferably, one bellows set and another bellows set have different elastic strains by being configured to have different bellows cross-sectional shapes.

Preferably, one set of bellows and another set of bellows have different elastic strains by being composed of metal materials of different thickness.

Preferably, one set of bellows and another set of bellows have different elastic strains by being composed of metal materials having different modulus of elasticity.

According to another aspect of the present invention, a vacuum chamber for a semiconductor process is installed between a first vacuum chamber and a second vacuum chamber, and the first vacuum chamber and the second vacuum chamber are installed to be connected to or isolated from each other. , A slit valve in which the double bellows of claim 1 is installed to insulate the valve housing and the valve drive from each other in terms of gas pressure; A pressure gauge connected to a measurement pipe formed in the first flange of the double bellows provided in the slit valve; And a control unit that receives the detection value of the pressure gauge and monitors the leaking state of the double bellows, wherein the first vacuum chamber and the second vacuum chamber are provided in plural, and the slit valve is provided in plural. It is installed between any one of the first vacuum chamber and any one of the plurality of first vacuum chambers and the second vacuum chambers, and each of the slit valves is provided with the pressure gauge, and the control unit Disclosed is a slit valve leak monitoring system characterized by distinguishing and identifying each pressure gauge, and receiving and detecting a detection value of each pressure gauge to classify and monitor the leak occurrence state of each double bellows.

The present invention has the advantage of reducing the risk of gas leak by applying a double bellows structure having an outer bellows and an inner bellows, and reducing the risk of interference between the outer and inner bellows by using a connecting member and thus damage. have.

In addition, in the semiconductor process environment in which a plurality of vacuum chambers and slit valves are disposed and used, the present invention has an advantage that it is possible to easily identify which slit valve is installed in a vacuum bellows when a leak occurs in the vacuum bellows. .

In addition, the present invention has the advantage of reducing the risk of damage due to long-term use even in the use environment of the slit valve for semiconductor processing, which is installed in the vertical direction and repeats the expansion / contraction of the bellows.

1 is a cross-sectional view of a double bellows according to an embodiment of the present invention,
Figure 2 is a perspective view of a double bellows according to an embodiment of the present invention,
Figure 3 is an exploded perspective view of a double bellows according to an embodiment of the present invention,
4 to 6 is a schematic cross-sectional view illustrating a state in which the double bellows according to an embodiment of the present invention is installed on the slit valve,
Figure 7 is a schematic cross-sectional view illustrating a state in which the pressure gauge is installed on the double bellows according to an embodiment of the present invention,
8 is a block diagram of a slit valve leak monitoring system using a double bellows according to an embodiment of the present invention,
9 is a schematic view for explaining the deformation conditions of each of the bellows set constituting the double bellows of the present embodiment in the elongation process of the bellows;
10 is a schematic view for explaining the elastic strain of the bellows having different bellows cross-sectional shapes,
11 is a schematic view showing a double bellows that does not include a connecting member.

The present invention can be implemented in various other forms without departing from its technical spirit or main characteristics. Therefore, the embodiments of the present invention are merely illustrative in all respects and should not be interpreted as limiting.

Terms such as first and second are used only for the purpose of distinguishing one component from other components. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

When an element is said to be "connected" or "connected" to another element, it may be directly connected to or connected to the other element, but other elements may exist in the middle.

The singular expression used in the present application includes the plural expression unless the context clearly indicates otherwise. In this application, the terms "comprises", "haves", "have", etc. are intended to express the presence of a component or a combination thereof described in the specification, and the possibility that another component or feature is present or added. It is not excluded in advance.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view of a double bellows according to an embodiment of the present invention, Figure 2 is a perspective view of a double bellows according to an embodiment of the present invention, Figure 3 is an exploded perspective view of the double bellows according to an embodiment of the present invention, 7 is a schematic cross-sectional view illustrating a state in which a pressure gauge is installed in a double bellows according to an embodiment of the present invention.

The double bellows (DB) for the slit valve (SV) for the semiconductor process of this embodiment includes a first flange 10, at least one connecting member 30, a first outer bellows 40, a first inner bellows 140 , A second flange 20, a second outer bellows 50 and a second inner bellows 150. Preferably, the double bellows (DB) of this embodiment is installed and used in a state arranged in the vertical direction to the slit valve (SV) for semiconductor processing. Each of the elements constituting the double bellows DB of the present embodiment may be formed of a metal material, and may be mutually coupled through a machining process such as welding.

As illustrated through FIGS. 4 to 6, the slit valve SV in which the double bellows DB of this embodiment is installed is provided between the first vacuum chamber C1 and the second vacuum chamber C2 installed in the semiconductor process. It is installed to be connected or isolated, and is installed to isolate the valve housing (VH) and the valve drive (VD) from each other in terms of gas pressure.

Isolating the valve housing VH and the valve driving part VD from each other in terms of gas pressure means that the vacuum pressure of the first vacuum chamber C1 or the second vacuum chamber C2 is through the valve housing VH. ), Or means that the gas existing inside the first vacuum chamber C1 or the second vacuum chamber C2 is blocked from being transmitted to the valve driving unit VD through the valve housing VH. That is, it means that the outer space OS and the inner space IS of the double bellows DB are mutually isolated in terms of vacuum pressure conditions or gas environment conditions.

The double bellows DB of this embodiment may be installed and used in a slit valve SV in which the gate 230 is driven in the vertical direction, as illustrated through FIGS. 4 to 6, and the gate 230 may be raised or lowered. According to the elongation (a1 in FIG. 4) and contraction (a2 in FIG. 4) in the vertical direction.

Referring to FIG. 1, the first flange 10 is formed with a hollow tube-shaped short pipe portion 14 extending above the ring-shaped flange body portion 12, and pressure is applied to one side of the short pipe portion 14. The measuring conduit 16 for gauge connection is formed. A pressure gauge (PG) connection pipe 6 is installed in the measurement pipe 16 in communication. The flange body portion 12 may be composed of one single body, but the inner ring member 18 may be separately manufactured and configured in a combined form in consideration of processing and assembly conditions.

The connecting member 30 has one or more through-holes 34 formed in the ring-shaped connecting body portion 32 in the vertical direction, spaced apart on the upper side of the first flange 10, and at least one or more. It is provided between the first flange 10 and the second flange 20. The space between the outer bellows 40, 50 or 60 and the inner bellows 140, 150 or 160 forms an intermediate space MS, wherein the through hole 34 is an upper intermediate space of the connecting member 30 The (MS) and the lower intermediate space (MS) are mutually communicated so that the double bellows (DB) of this embodiment forms one intermediate space (MS) from the viewpoint of pressure maintenance and measurement.

The majority of the slit valve (SV) for a semiconductor process, as illustrated through FIGS. 4 to 6, the gate 230 is opened and closed vertically and vertically, and the double bellows (DB) of this embodiment installed in the slit valve (SV) ) Is also stretched / contracted in the vertical direction.

For example, as illustrated in FIG. 11, while applying the double bellows structure DB ′ of the outer bellows OB and the inner bellows IB, the first flange 10 and the second flange 20 are one without a connecting member. When directly connected to the outer bellows (OB) and the inner bellows (IB), each of the outer bellows (OB) and the inner bellows (IB) has a length as long as the moving distance of the gate 230 of the slit valve SV It should be formed as a single bellows.

When the outer bellows (OB) and the inner bellows (IB) are formed in a long length, as shown in a1 and a2 in FIG. 4, the outer bellows (OB) and the double bellows (DB ') are stretched / contracted in the vertical direction. / Or because the transverse deformation of the inner bellows (IB) is more easily caused, the likelihood of frictional contact or interference between the inner corrugation of the outer bellows (OB) and the outer corrugation of the inner bellows (IB) increases. The transverse deformation of the bellows will be described later.

When friction contact or interference occurs between the inner corrugation of the outer bellows (OB) and the outer corrugation of the inner bellows (IB), abrasion or damage occurs due to frictional contact to shorten the life of the bellows or by mutual interference. Since the unfolding / folding operation of the wrinkles is not smoothly performed, a problem may occur in providing the normal function of the bellows.

In consideration of this point, the double bellows DB of this embodiment is provided with a ring-shaped connecting member 30 between the first flange 10 and the second flange 20, and the outer bellows OB and / or The internal bellows (IB) allows the pre-set gap to be maintained through the connecting member 30 during the stretching / contraction process.

The first outer bellows 40 is formed of a metal material, one end 40b is hermetically coupled to the upper end 14a of the short tube portion 14, and the other end 40a is the first flange 10 ) Is tightly coupled to the lower surface 32b of the connecting body portion 32 of the connecting member 30 adjacent to each other, and is coupled in a form surrounding the outer position of the through hole 34.

The first inner bellows 140 is formed of a metal material, one end 140b is hermetically coupled to the upper side 12a of the flange body 12, and the other end 140a is the first flange ( 10) is coupled to the lower side (32b) of the connecting body portion 32 of the connecting member 30 adjacent to, it is coupled in a form surrounding the inner position of the through hole (34). As an example, the bellows of this embodiment may be manufactured by cutting and bending a metal plate and forming a corrugated portion through welding.

The second flange 20 is formed in a ring shape and is spaced apart above the connecting member 30.

The second outer bellows 50 is formed of a metal material, and one end 50b is sealed to the upper side 32a of the connecting body portion 32 of the connecting member 30 adjacent to the second flange 20. Is coupled, the other end 50a is hermetically coupled to the lower side 20b of the second flange 20, it is coupled in a form surrounding the outer position of the through hole (34).

The second inner bellows 150 is formed of a metal material, and one end 150b is sealed to the upper side 32a of the connecting body portion 32 of the connecting member 30 adjacent to the second flange 20. Is coupled, the other end 150a is hermetically coupled to the lower side 20b of the second flange 20, it is coupled in a form surrounding the inner position of the through hole (34).

The connecting member 30 may be provided only one according to the design conditions of the double bellows (DB), preferably two or more (30-1,30-2) are provided spaced apart from each other. An external bellows 60 for connection and an internal bellows 160 for connection are provided between any one of the connecting members 30-1 and another 30-2.

The connecting external bellows 60 is formed of a metal material, and one end 60b is hermetically coupled to the upper side 32a of the connecting body 32 of the lower connecting member 30-1, and the other end ( 60a) is hermetically coupled to the lower surface 32b of the connecting body portion 32 of the upper connecting member 30-2, but is coupled in a form surrounding the outer position of the through hole 34.

The connecting inner bellows 160 is formed of a metal material, one end 160b is hermetically coupled to the upper side 32a of the connecting body 32 of the lower connecting member 30-1, and the other end ( 160a) is hermetically coupled to the lower side 32b of the connecting body portion 32 of the upper connecting member 30-2, but is coupled in a form surrounding the inner position of the through hole 34.

On the other hand, one outer bellows 40 and one inner bellows 140 located therein constitute one bellows set 40s, preferably, any one bellows set 40s and another one The bellows set 50s has different elastic strains. When one bellows set is considered as one elastic body, the fact that each of the bellows sets has a different elastic strain is that elastic deformation occurs to different extents for the same force. It can be understood that a bellows set having a high elastic strain has a greater elastic deformation for the same force than a bellows set having a low elastic strain.

As an example, in the vertically arranged state as shown in FIGS. 1 and 4, the elastic strain of the first bellows set 40s constituted by the first outer bellows 40 and the first inner bellows 140 is further positioned above. It has the smallest elastic strain than another bellows set (50s or 60s), and the elastic strain of the second bellows set (50s) constituted by the second outer bellows 50 and the second inner bellows 150 is further lower. It is configured to have the greatest elastic strain than another positioned bellows set (40s or 60s).

In FIGS. 4 to 6, for convenience of explanation, the valve driving part VD of the slit valve SV is illustrated as a simplified pneumatic cylinder driving structure, but in various slit valve SV products, the valve driving part VD has the same cam mechanism. A mechanical element is provided so that when the gate 230 of the slit valve SV rises in the direction A1 of FIG. 4, it can be configured to make a slight lateral movement (direction A3) for reliable sealing. Such a configuration can be referred to, for example, through Korean Patent Publication No. 10-2014-0075096 (published on June 19, 2014). Republic of Korea Patent Publication No. 10-2014-0075096 discloses a door valve structure for closing a chamber while moving a door plate horizontally by moving a door plate up and down in a cylinder and converting up and down movement generated in a cylinder to a horizontal movement in a camshaft. do.

For example, when driven from the a2 state (bellows reduced state) of FIG. 4 to the a1 state (bellows extended state), the gate 230 of the slit valve SV is attached to a cam mechanism (not shown) with a rise in the A1 direction. The lateral movement (A3 direction) is thereby achieved.

In this process, as illustrated in Figure 9 (a), the first bellows set 40s is a load (W '') of the connecting bellows set (60s) located on the upper side and the load of the second bellows set (50s) (W ''). Due to this, if the first bellows set 40s is configured to have the same elastic strain as the connecting bellows set 60s and the second bellows set 50s, the first bellows set 40s is a connecting bellows set ( 60s) or a larger deformation than the second bellows set 50s may occur. 9 is a schematic view for explaining the deformation conditions of each bellows set constituting the double bellows of the present embodiment in the process of elongating the bellows, and for convenience of description, the bellows wrinkles and the like are omitted and briefly displayed.

In this embodiment, in consideration of this point, the elastic strain of the first bellows set 40s, which has the largest cause of deformation due to external force such as a load when the bellows is stretched, is configured to be the smallest, and the first bellows set 40s The elastic strain of the bellows set for connection 60s located on the upper side is set to be greater than that, and the elastic strain of the second bellows set 50s positioned on the upper side is configured to be the largest.

Through such a configuration, the double bellows DB of this embodiment meets the elastic strain condition required in the overall design condition, and the elastic strain is reduced as the set of bellows having a relatively large deformation-causing factor such as load is located at a relatively large position. By configuring, a plurality of bellows sets having vertical position differences are configured to have a balanced deformation characteristic as a whole.

In another example, FIG. 6 is a slit valve SV having a configuration in which the valve driving part VD is installed on the upper part of the valve housing VH. In the arrangement state as shown in FIG. 6, the double bellows DB is disposed in an inverted state up and down such that the first flange 10 is positioned at the uppermost position and the second flange 20 is positioned at the lowermost position.

In this arrangement, the elastic strain of the first bellows set 40s constituted by the first outer bellows 40 and the first inner bellows 140 is further lower than that of another bellows set 50s or 60s. Another bellows set (40s or 60s) having the largest elastic strain and the elastic strain of the second bellows set (50s) constituted by the second outer bellows (50) and the second inner bellows (150) is further located above ). Deformation conditions of each bellows set in the elongation process of the bellows of the slit valve SV in FIG. 6 may be understood through FIG. 9B.

As described above, having different elastic strains between bellows sets may be implemented through the following configuration.

As an example, one bellows set 40s and another one bellows set 50s may have different elastic strains by being configured to have different lengths. For example, a set of bellows having a shorter length (upper and lower length) may have a smaller elastic strain.

In another example, one bellows set 40s and another one bellows set 50s are configured to have different bellows cross-sectional shapes (eg, the size of the bellows corrugation, the bending angle of the bellows corrugation, etc.) It may have different elastic strains. For example, a bellows set having a small bellows wrinkle as shown in FIG. 10 (b) may have a smaller elastic strain than the case of FIG. 10 (a).

As another example, one bellows set 40s and another one bellows set 50s may have different elastic strains by being formed of metal materials having different thicknesses. For example, bellows made of a thicker metal plate may have a smaller elastic strain.

As another example, one bellows set 40s and another one bellows set 50s may have different elastic strains by being made of metal materials having different modulus of elasticity. In the case of a metal material conforming to Hooke's law, the elastic modulus can be defined as 'stress / strain = elastic modulus'. For example, even if the bellows are made of the same thickness and shape, the bellows made of a metal material having a greater elastic modulus may have a smaller elastic strain.

4 to 6 is a schematic cross-sectional view illustrating a state in which the double bellows according to an embodiment of the present invention is installed on a slit valve, and FIG. 8 is a configuration of a slit valve leak monitoring system using a double bellows according to an embodiment of the present invention It is.

A slit valve SV is installed between the first vacuum chamber C1 and the second vacuum chamber C2, which are vacuum chambers for semiconductor processes.

The slit valve SV is installed to connect or isolate the first vacuum chamber C1 and the second vacuum chamber C2 from each other, and the valve housing VH and the valve driving unit VD are mutually interchangeable in terms of gas pressure. The double bellows (DB) is installed to isolate.

A pressure gauge PG connected to the measurement pipe 16 formed in the first flange 10 of the double bellows DB provided in the slit valve SV is provided.

In the slit valve SV for semiconductor processing, the valve driving part VD is usually installed below the valve housing VH (see FIGS. 4 to 5), or the valve driving part VD is provided above the valve housing VH. It has a structure to be installed (see Fig. 6).

4, the first vacuum chamber (C1) and the second vacuum chamber (C2) are respectively formed with openings (G1, G2) for introducing or removing a semiconductor substrate, the slit valve at a position corresponding thereto Openings 262 and 264 are also formed on both sides of the valve housing VH of SV. A gate 230 for connecting or blocking the opening 262 or 264 is installed in the valve housing VH. Reference numeral 250 is a sealing element for blocking and sealing the gas flow between the gate 230 and the valve housing VH while the gate 230 blocks the opening 264.

The valve driving unit VD has been known to have various driving methods, but FIGS. 4 to 6 illustrate the valve driving unit VD of the pneumatic cylinder driving method.

The valve driving unit VD of the pneumatic cylinder driving method is installed on the upper side of the piston 202 and the piston 202 which is raised or lowered by pneumatic control in the cylinder casing VD, and the valve housing VH ) Is provided with a cylinder rod 204 that drives the gate 230 in the rising or falling direction. In the present embodiment, although the casing of the valve driving unit VD serves as a cylinder casing, a separate protective casing may be further provided outside the cylinder casing. As described above, the cam mechanism for the lateral movement (A3 direction) of the gate 230 may be provided in the valve driving part VD. Reference numeral 280 is a guide member that guides the rise or fall of the cylinder rod 204 in the vertical direction.

For example, in the installation state of the slit valve SV in FIG. 4, the double bellows DB of this embodiment is installed in the vertical direction as in the arrangement state of FIG. 1, and the first flange 10 has a valve housing VH ) The cylinder rod 204 provided at the lower end is hermetically coupled to the upper surface of the through part 212 for passage, and the second flange 20 is hermetically coupled to the flange engaging portion 206 provided at the cylinder rod 204. . A well-known O-ring or the like may be further installed at the sealed coupling portion.

When the blocking control of the gate 230 is achieved, air pressure is applied to the lower side of the piston 202 from an external pneumatic source (eg, a compressor), and the piston 202, cylinder rod 204, gate ( 230) integrally rises in the A1 direction, and the gate 230 blocks the opening 264. In this process, the gate 230 may also move in the lateral direction (A3 direction). At this time, the double bellows DB of this embodiment is extended in the vertical direction as shown in Figure 4 (a1).

When the opening control of the gate 230 is achieved, air pressure is applied to the upper side of the piston 202 from an external pneumatic source (eg, a compressor), and the piston 202, the cylinder rod 204, the gate ( 230) integrally descends in the A2 direction, and the gate 230 opens the opening 264. At this time, the double bellows DB of this embodiment is contracted in the vertical direction as shown in Figure 4 (a2).

The intermediate bellows (MS) formed by the external bellows (40, 50, or 60) and the internal bellows (140, 150, or 160) during this elongation or contraction process maintains a state where the gas inflow / outflow from the bellows is blocked Therefore, there is a pressure change in pressure (when the bellows contracts) and decompression (when the bellows extends) within a preset pressure range. When manufacturing by setting the pressure in the intermediate space (MS) to a low vacuum pressure of about 10- ² ~ 10 ^-3 Torr, it is shrinkage or expansion of the bellows yirwojige while maintaining a pressure range previously set.

In this state, when a leak occurs in either the outer bellows 40, 50 or 60 and the inner bellows 140, 150 or 160, a state in which the pressure in the intermediate space MS is out of a preset pressure range occurs. The pressure gauge (PG) senses this.

The pressure gauge (PG) of the present embodiment may be a known electronic pressure gauge, and the control unit (CU) receives the detection value of the pressure gauge (PG) in the form of an electrical signal and leaks the double bellows (DB). Status can be monitored.

When the control unit (CU) is in a state in which the pressure of the intermediate space (MS) is out of the preset pressure range while monitoring the detection value of the pressure gauge (PG), the control unit (CU) is doubled to the administrator A signal informing of the leak generation state of the bellows DB (eg, an alarm sound, warning light, display display, etc.) is generated. The manager recognizes this signal and can stop the operation of the first vacuum chamber C1, the second vacuum chamber C2, and the slit valve SV and repair or replace the leaked double bellows DB. .

On the other hand, in the actual semiconductor process, the first vacuum chamber C1 and the second vacuum chamber C2 are provided with a plurality, and the slit valve SV is also provided with a plurality of the first vacuum chamber C1 and It is installed between any one of the first vacuum chambers C1 and the second vacuum chamber C2 of the second vacuum chamber C2. Each of the slit valve SV is provided with the pressure gauge PG, respectively.

When a plurality of first vacuum chambers C1, second vacuum chambers C2, and slit valves SV are provided, the control unit CU distinguishes and identifies each pressure gauge PG, respectively The detection value of the pressure gauge (PG) is received and the leakage occurrence state of each double bellows (DB) is classified and monitored. When taking such a configuration, the administrator has the advantage of easily monitoring the leak generation state of the plurality of slit valves (SV) through the control unit (CU), and can easily know the location of the double bellows (DB) where the leak has occurred.

For example, the control unit CU may be a computing means installed with a program for monitoring the occurrence of leakage of the slit valve SV.

On the other hand, the double bellows (DB) of this embodiment may be installed in a slit valve (SV) for semiconductor processing of various structures.

It may be installed as shown in the embodiment of Figure 4 illustrated above, it may be installed as shown in Figures 5 to 6.

In the case of Figure 5 (b), the first flange 10 of the double bellows (DB) is hermetically coupled to the cylinder road guide member 280 located in the valve drive (VD), the second flange 20 is a cylinder It is hermetically coupled to the flange coupling portion 206 provided on the rod 204.

In the case of Figure 5 (c), the first flange 10 of the double bellows (DB) is hermetically coupled to the flange coupling portion 206 provided in the cylinder rod 204, the second flange 20 is a valve housing (VH) The cylinder rod 204 provided at the lower end is hermetically coupled to the upper surface of the through portion 212 for passage.

6 is a configuration in which the valve driving unit VD is installed on the upper portion of the valve housing VH. In the arrangement shown in FIG. 6, the double bellows DB has the first flange 10 positioned at the uppermost position and the second. The flange 20 is arranged in an inverted state up and down so that it is located at the bottom.

On the other hand, the double bellows (DB) of the present embodiment is installed in the valve housing (VH) and / or valve driving unit (VD) of the slit valve (SV), the cylinder rod 204 for driving the gate 230 therein up and down Various driving rods and guide rods that are installed in the direction but need to be separated from the outer space (OS) and the inner space (IS) of the double bellows (DB) in addition to the cylinder rod (204) under vacuum pressure or gas environment conditions Can be applied to.

Although the present invention has been described with reference to the accompanying drawings and preferred embodiments, it is apparent to those skilled in the art that many various and obvious modifications are possible without departing from the scope of the present invention. Therefore, the scope of the invention should be construed by the claims set forth to cover these many variations.

10: first flange
12: flange body
14: short tube
16: Measuring pipe for pressure gauge connection
20: second flange
30: Connection member
32: connecting body
34: through hole
40: first outer bellows
50: second outer bellows
140: first inner bellows
150: second inner bellows
C1, C2: First and second vacuum chambers
CU: Control unit
DB: double bellows
PG: Pressure gauge
SV: Slit valve
VD: valve drive
VH: valve housing

Claims (10)

A first flange in which a hollow pipe-shaped short pipe portion is formed on an upper side of the ring-shaped flange body portion, and a measuring pipe for connecting a pressure gauge is formed on one side of the short pipe portion;
One or more through-holes are formed in the ring-shaped connecting body portion in the vertical direction, and at least one connecting member spaced apart from the upper side of the first flange;
One end is hermetically coupled to the upper end of the short pipe part, and the other end is hermetically coupled to the lower surface of the connecting body portion of the connecting member adjacent to the first flange, the metal material being combined in a form surrounding the outer position of the through hole The first outer bellows;
One end is hermetically coupled to the upper side of the flange body portion, the other end is hermetically coupled to the lower side of the connecting body portion of the connecting member adjacent to the first flange, the metal is coupled in a form surrounding the inner position of the through hole A first inner bellows of the material;
A second flange formed in a ring shape and spaced apart from the upper side of the connecting member;
One end is hermetically coupled to the upper side of the connecting body portion of the connecting member adjacent to the second flange, and the other end is hermetically coupled to the lower side of the second flange to be coupled in a form surrounding the outer position of the through hole. A second outer bellows made of metal; And
One end is hermetically coupled to the upper side of the connecting body portion of the connecting member adjacent to the second flange, and the other end is hermetically coupled to the lower side of the second flange to be coupled in a form surrounding the inner position of the through hole. And a second inner bellows made of a metal material.
One outer bellows and one inner bellows located on the inner side constitute one bellows set, and one bellows set and another one bellows set have different elastic strains. Double bellows for the valve.
According to claim 1,
The connecting member is provided with two or more spaced apart from each other,
One end of the metal material that is hermetically coupled to the upper side of the connecting body portion of the lower connecting member, the other end is hermetically coupled to the lower side of the connecting body portion of the upper connecting member, and is coupled in a form surrounding the outer position of the through hole External bellows for connection; And
One end is sealingly coupled to the upper surface of the connecting body portion of the lower connecting member, the other end is sealingly coupled to the lower surface of the connecting body portion of the upper connecting member, the metal material is coupled in a form surrounding the inner position of the through hole Double bellows for a slit valve for semiconductor processing, characterized in that further comprises a; internal bellows for connection.
delete According to claim 1,
The first outer bellows and the first inner bellows have the elastic strain of the first bellows set is the smallest elastic strain than another set of bellows located on the upper side,
Double for a slit valve for a semiconductor process, characterized in that the elastic strain of the second bellows set constituted by the second outer bellows and the second inner bellows is configured to have the greatest elastic strain than another bellows set located further down. Bellows.
According to claim 1,
The double bellows is arranged in an inverted state up and down such that the first flange is located at the top and the second flange is located at the bottom.
The first outer bellows and the first inner bellows have the largest elastic strain than the other set of bellows, the elastic strain of the first bellows set further comprises,
Double for a slit valve for a semiconductor process, characterized in that the elastic strain of the second bellows set constituted by the second outer bellows and the second inner bellows is configured to have the smallest elastic strain than another bellows set located further upward. Bellows.
According to claim 1,
Double bellows for a slit valve for a semiconductor process, characterized in that one bellows set and another bellows set have different elastic strains by being configured to have different lengths.
According to claim 1,
Double bellows for a slit valve for semiconductor processing, characterized in that one bellows set and another bellows set have different elastic strains by being configured to have different bellows cross-sectional shapes.
According to claim 1,
Double bellows for a slit valve for a semiconductor process, characterized in that one bellows set and another bellows set have different elastic strains by being composed of metal materials of different thickness.
According to claim 1,
Double bellows for slit valves for semiconductor processing, characterized in that one bellows set and another bellows set have different elastic strains by being composed of metal materials having different modulus of elasticity. .
It is installed between a first vacuum chamber and a second vacuum chamber, which are vacuum chambers for semiconductor processing, and is installed to be able to connect or isolate each other between the first vacuum chamber and the second vacuum chamber. A slit valve having the double bellows of claim 1 installed therebetween;
A pressure gauge connected to a measurement pipe formed in the first flange of the double bellows provided in the slit valve; And
It includes; a control unit for receiving the detection value of the pressure gauge and monitoring the leaking state of the double bellows;
A plurality of the first vacuum chamber and the second vacuum chamber are provided, and the slit valve is provided with a plurality of first vacuum chambers and any second ones of the plurality of first vacuum chambers and second vacuum chambers. It is installed between the vacuum chamber, each of the slit valve is provided with the pressure gauge,
The control unit distinguishes and identifies each pressure gauge, and receives the sensing value of each pressure gauge to distinguish and monitor the leak occurrence state of each double bellows.

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