KR102081707B1 - Valve unit and liquid supplying unit - Google Patents

Abstract

The present invention provides a device for opening and closing the supply of a liquid or fluid. A valve unit comprises: a housing having a flow path including an inlet into which a fluid flows and an outlet through which the fluid is discharged; a diaphragm disposed in the housing, and opening and closing the flow path by pneumatic driving; and an air supply member supplying air for driving the diaphragm to a first space in the housing having the diaphragm. The air supply member includes: an air supply line provided outside the housing, and having a supply flow path through which the air flows; and a speed control member located between the air supply line and the housing, and controlling the driving speed of the diaphragm. The speed control member has a body in which a passage through which the air flows is formed, wherein the passage has a volume larger than the volume of the first space. The exhaust pressure of the air can be maintained constant due to the large volume, and hunting can be prevented from occurring.

Description

Valve unit and liquid supplying unit

The present invention relates to a device for opening and closing a liquid or a fluid supply.

In order to manufacture a semiconductor device or a liquid crystal display, various processes such as photographing, etching, ashing, ion implantation, thin film deposition, and cleaning are performed on the substrate. Among these, the photolithography, etching, ashing and cleaning processes are subjected to a liquid treatment step of supplying a liquid onto a substrate.

In general, in the liquid treatment step, the nozzle supplies the liquid from the upper portion of the substrate, and the supply of the liquid is terminated after supplying a predetermined amount. This supply of liquid and stop of supply are performed by a valve, which is installed on the line through which the liquid flows.

1 is a cross-sectional view showing a general valve. Referring to FIG. 1, the valve 2 has a flow path 4 through which a liquid flows, and a diaphragm 6 for opening and closing the flow path 4 is located. The diaphragm 6 is raised and lowered by supply and exhaust of air. For example, when air is supplied into the valve 2, the diaphragm 6 is lifted to open the flow path, and when air is exhausted, the diaphragm 6 is lowered to block the flow path.

However, when air is exhausted while the diaphragm 6 is raised and lowered, the pressure at which air is exhausted is not constant, and hunting is generated. Accordingly, the flow path is incompletely blocked, and liquid condensation or a drop of the liquid is generated at the discharge end of the nozzle.

To solve this problem, a suction valve may be further installed in the liquid supply line to suction residual liquid in the nozzle. However, these suction valves are expensive to install and worsen the space efficiency.

An object of the present invention is to provide a device for preventing the opening and closing of the flow path in which the liquid flows.

In addition, an object of the present invention is to provide a device capable of preventing the formation of liquid condensation or a drop of the liquid from the discharge end of the nozzle.

Embodiments of the present invention provide an apparatus for opening and closing the supply of liquid or fluid. The valve unit includes a housing having a flow path having an inflow port through which the fluid flows in and a discharge port through which the fluid flows out, a diaphragm disposed in the housing, opening and closing the flow path by pneumatic driving, and air for driving the diaphragm. And an air supply member for supplying the diaphragm to the first space in the housing, wherein the air supply member is provided outside of the housing and has a supply flow path through which the air flows. A speed control member positioned between the housings and controlling a driving speed of the diaphragm, wherein the speed control member has a body having a passage through which the air flows, wherein the passage has a volume larger than the first space. Has

The speed control member is directly coupled to one surface of the housing, and a coupling port through which the air is supplied is formed, and the first space communicates with the coupling port, and serves as a space formed by one surface of the housing and the diaphragm. Can be,

The volume of the passage may be provided at 1.5 to 2 times the volume of the first space.

The housing has a flow path and a driving space formed therein, wherein the driving space is a second space facing the flow path with the first space supplied with the air therebetween and the first space interposed therebetween and independent of the first space. May have The cross-sectional area of the passage in a plane perpendicular to the air flowing direction may be provided larger than the cross-sectional area of the supply passage.

The speed control member further includes an adjustment member installed on the body to change the volume size of the passage, wherein the adjustment member is partly located outside the body and another part is located inside the body. It can be moved in the inserted state to change the volume size of the passage.

The body has a curved shape, the body has one end coupled to the housing, the other end is connected to the air supply line, and has a curved bent portion between one end and the other end, and the adjustment member is inserted into the bent portion. Can be,

In addition, one end of the body is coupled to the housing, the other end is connected to the air supply line, between one end and the other end has a protrusion projecting outward, the adjustment member may be inserted into the protrusion.

In addition, the apparatus for supplying liquid includes a liquid supply line for supplying liquid and a valve unit installed in the liquid supply line to supply or stop the liquid, wherein the valve unit includes an inlet port through which the fluid is introduced and an outlet port through which the fluid is discharged. A housing having a flow path having a flow path formed therein, the diaphragm opening and closing the flow path by pneumatic driving, and an air supply member supplying air for driving the diaphragm to the first space in the housing provided with the diaphragm. It includes, The air supply member is provided on the outside of the housing and the air supply line having a supply flow path through which the air flows and is located between the air supply line and the housing, the speed control to control the driving speed of the diaphragm And a member, wherein the speed control member is internal to the e. Being of a body passageway is formed to flow, it said passage has a larger volume than the first space.

The speed control member is directly coupled to one surface of the housing, and a coupling port through which the air is supplied is formed, and the first space communicates with the coupling port, and serves as a space formed by one surface of the housing and the diaphragm. Can be. The volume of the passage may be provided at 1.5 to 2 times the volume of the first space.

The housing is provided with a drive space having the flow path and the first space therein, wherein the drive space faces the flow path with the first space supplied with the air and the first space interposed therebetween. It may have a second space independent of the space.

The cross-sectional area of the passage in a plane perpendicular to the air flowing direction may be provided larger than the cross-sectional area of the supply passage.

The speed control member further includes an adjustment member installed on the body to change the volume size of the passage, wherein the adjustment member is inserted such that a part is located outside the body and another part is located inside the body. Can be moved to change the volume size of the passageway.

According to an embodiment of the invention, the passage through which air flows has a volume larger than the space in which the diaphragm is located. As a result, the exhaust pressure of the air can be kept constant, and hunting can be prevented from occurring.

In addition, according to the embodiment of the present invention, since hunting of the air is prevented while the diaphragm is raised and lowered, liquid condensation or drop of the liquid from the discharge end of the nozzle can be prevented.

In addition, according to an embodiment of the present invention, since the formation of liquid or drop of the liquid can be prevented by the driving of the valve, it is possible to prevent the formation of liquid or drop of liquid without the installation of a separate suction member.

1 is a cross-sectional view showing a general valve unit.
2 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention.
3 is a cross-sectional view of the substrate processing apparatus showing the application block or development block of FIG. 2.
4 is a plan view of the substrate processing apparatus of FIG. 2.
5 is a diagram illustrating an example of a hand of the carrier robot of FIG. 4.
6 is a plan view schematically illustrating an example of the heat treatment chamber of FIG. 4.
7 is a front view of the heat treatment chamber of FIG. 6.
8 is a view schematically illustrating an example of the liquid processing chamber of FIG. 4.
9 is a cross-sectional view showing the liquid supply unit of FIG. 8.
10 is a cross-sectional view illustrating the valve unit of FIG. 9.
FIG. 11 is a cross-sectional view illustrating a valve unit in which a flow path is opened in FIG. 10.
12 and 13 are views illustrating a process of changing the passage volume of the body of FIG. 10.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. Embodiments of the invention may be modified in various forms, the scope of the invention should not be construed as limited to the following embodiments. This embodiment is provided to more completely explain the present invention to those skilled in the art. Therefore, the shape of the elements in the drawings are exaggerated to emphasize a more clear description.

2 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention, FIG. 3 is a cross-sectional view of the substrate processing apparatus showing the coating block or the developing block of FIG. 2, and FIG. 4 is the substrate processing apparatus of FIG. 2. Top view of the.

2 to 4, the substrate processing apparatus 1 includes an index module 20, a processing module 30, and an interface module 40. According to one embodiment, the index module 20, the processing module 30, and the interface module 40 are sequentially arranged in a row. Hereinafter, a direction in which the index module 20, the processing module 30, and the interface module 40 are arranged is referred to as a first direction 12, and a direction perpendicular to the first direction 12 when viewed from the top. A direction perpendicular to both the first direction 12 and the second direction 14 is referred to as a second direction 14 and is referred to as a third direction 16.

The index module 20 conveys the board | substrate W from the container 10 in which the board | substrate W was accommodated to the processing module 30, and accommodates the processed board | substrate W in the container 10. FIG. The longitudinal direction of the index module 20 is provided in the second direction 14. The index module 20 has a load port 22 and an index frame 24. The load port 22 is located on the opposite side of the processing module 30 with respect to the index frame 24. The container 10 in which the substrates W are accommodated is placed in the load port 22. A plurality of load ports 22 may be provided, and the plurality of load ports 22 may be disposed along the second direction 14.

As the container 10, a sealed container 10 such as a front open unified pod (FOUP) may be used. The vessel 10 may be placed on the load port 22 by an operator or by a transfer means (not shown), such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle. Can be.

An index robot 2200 is provided inside the index frame 24. In the index frame 24, a guide rail 2300 having a longitudinal direction in the second direction 14 may be provided, and the index robot 2200 may be provided to be movable on the guide rail 2300. The index robot 2200 includes a hand 2220 on which the substrate W is placed, and the hand 2220 moves forward and backward, rotates about the third direction 16, and the third direction 16. Can be provided to be movable accordingly.

The processing module 30 performs an application process and a development process on the substrate W. FIG. The processing module 30 has an application block 30a and a developing block 30b. The coating block 30a performs a coating process on the substrate W, and the developing block 30b performs a developing process on the substrate W. As shown in FIG. A plurality of application blocks 30a are provided, and they are provided stacked on each other. A plurality of developing blocks 30b are provided, and the developing blocks 30b are provided stacked on each other. According to the embodiment of Fig. 2, two application blocks 30a are provided, and two development blocks 30b are provided. The application blocks 30a may be disposed below the development blocks 30b. According to one example, the two application blocks 30a perform the same process with each other and may be provided in the same structure with each other. In addition, the two developing blocks 30b may perform the same process and may be provided in the same structure.

Referring to FIG. 4, the application block 30a has a heat treatment chamber 3200, a transfer chamber 3400, a liquid treatment chamber 3600, and a buffer chamber 3800. The heat treatment chamber 3200 performs a heat treatment process on the substrate (W). The heat treatment process may include a cooling process and a heating process. The liquid processing chamber 3600 supplies a liquid on the substrate W to form a liquid film. The liquid film may be a photoresist film or an antireflection film. The transfer chamber 3400 transfers the substrate W between the heat treatment chamber 3200 and the liquid processing chamber 3600 in the application block 30a.

The conveying chamber 3400 is provided with its longitudinal direction parallel to the first direction 12. The transfer robot 3342 is provided in the transfer chamber 3400. The transfer robot 3342 transfers the substrate between the heat treatment chamber 3200, the liquid treatment chamber 3600, and the buffer chamber 3800. According to one example, the transfer robot 3422 has a hand 3420 on which the substrate W is placed, and the hand 3420 moves forward and backward, rotates about the third direction 16, and the third direction. It may be provided to be movable along 16. In the transfer chamber 3400, a guide rail 3300 having a longitudinal direction thereof is provided in parallel with the first direction 12, and the transfer robot 3342 may be provided to be movable on the guide rail 3300. .

5 is a diagram illustrating an example of a hand of the carrier robot of FIG. 4. Referring to FIG. 7, hand 3420 has a base 3428 and support protrusions 3429. The base 3428 may have an annular ring shape in which a portion of the circumference is bent. The base 3428 has an inner diameter larger than the diameter of the substrate W. The support protrusion 3429 extends inward from the base 3428. A plurality of support protrusions 3429 may be provided to support edge regions of the substrate W. As shown in FIG. By way of example, four support protrusions 3429 may be provided at equal intervals.

The heat treatment chamber 3202 is provided in plural numbers. The heat treatment chambers 3202 are arranged to be arranged along the first direction 12. The heat treatment chambers 3202 are located at one side of the transfer chamber 3400.

6 is a plan view schematically illustrating an example of the heat treatment chamber of FIG. 4, and FIG. 7 is a front view of the heat treatment chamber of FIG. 6. 6 and 7, the heat treatment chamber 3202 has a housing 3210, a cooling unit 3220, a heating unit 3230, and a conveying plate 3240.

The housing 3210 is generally provided in the shape of a cuboid. A sidewall of the housing 3210 is formed with an inlet (not shown) through which the substrate W enters and exits. The inlet can be kept open. A door (not shown) may optionally be provided to open and close the entrance. The cooling unit 3220, the heating unit 3230, and the conveying plate 3240 are provided in the housing 3210. The cooling unit 3220 and the heating unit 3230 are provided side by side along the second direction 14. According to one example, the cooling unit 3220 may be located closer to the transfer chamber 3400 than the heating unit 3230.

The cooling unit 3220 has a cooling plate 3222. The cooling plate 3222 may have a generally circular shape when viewed from the top. The cooling plate 3222 is provided with a cooling member 3224. According to one example, the cooling member 3224 is formed inside the cooling plate 3222 and may be provided as a flow path through which a cooling fluid flows.

The heating unit 3230 has a heating plate 3322, a cover 3234, and a heater 3333. The heating plate 3322 has a generally circular shape when viewed from the top. The heating plate 3322 has a larger diameter than the substrate W. As shown in FIG. The heater 3333 is provided in the heating plate 3322. The heater 3333 may be provided as a heating resistor to which a current is applied. The heating plate 3322 is provided with lift pins 3238 that can be driven in the vertical direction along the third direction 16. The lift pins 3238 may receive the substrate W from the conveying means outside the heating unit 3230, lower the substrate W onto the heating plate 3322, or lift the substrate W from the heating plate 3322 to external the heating unit 3230. Turn over to the conveying means. In one example, three lift pins 3238 may be provided. The cover 3234 has a space in which the lower portion is opened. The cover 3234 is positioned above the heating plate 3322 and moved up and down by the driver 3236. When the cover 3234 is in contact with the heating plate 3322, the space surrounded by the cover 3234 and the heating plate 3322 is provided as a heating space for heating the substrate W.

The conveying plate 3240 is generally provided in a disc shape and has a diameter corresponding to that of the substrate W. As shown in FIG. The notch 3244 is formed at the edge of the conveying plate 3240. The notch 3244 may have a shape corresponding to the protrusion 3429 formed on the hand 3420 of the transfer robot 3422 described above. In addition, the notch 3344 is provided in a number corresponding to the protrusion 3429 formed in the hand 3420, and is formed at a position corresponding to the protrusion 3429. When the upper and lower positions of the hand 3420 and the conveying plate 3240 are changed at the position where the hand 3420 and the conveying plate 3240 are aligned in the vertical direction, the substrate W may be moved between the hand 3420 and the conveying plate 3240. Delivery takes place. The conveying plate 3240 is mounted on the guide rail 3249 and may be moved between the first area 3212 and the second area 3214 along the guide rail 3249 by the driver 3246. The conveying plate 3240 is provided with a plurality of slit-shaped guide grooves 3322. The guide groove 3324 extends from the end of the conveying plate 3240 to the inside of the conveying plate 3240. The guide grooves 3324 are provided in the longitudinal direction along the second direction 14, and the guide grooves 3324 are positioned to be spaced apart from each other along the first direction 12. The guide groove 3324 prevents the transfer plate 3240 and the lift pin 1340 from interfering with each other when the takeover of the substrate W is made between the transfer plate 3240 and the heating unit 3230.

The heating of the substrate W is performed while the substrate W is placed directly on the support plate 1320, and the cooling of the substrate W is performed by the transfer plate 3240 on which the substrate W is placed. Is made in contact with The transfer plate 3240 is made of a material having a high heat transfer rate so that heat transfer between the cooling plate 3222 and the substrate W is performed well. According to one example, the conveying plate 3240 may be provided with a metal material.

The heating unit 3230 provided in the heat treatment chambers of some of the heat treatment chambers 3200 may supply gas during heating of the substrate W to improve the adhesion rate of the substrate W to the photoresist. According to one example, the gas may be a hexamethyldisilane gas.

The liquid treatment chamber 3600 is provided in plurality. Some of the liquid treatment chambers 3600 may be provided to be stacked on each other. The liquid processing chambers 3600 are disposed at one side of the transfer chamber 3402. The liquid processing chambers 3600 are arranged side by side along the first direction 12. Some of the liquid processing chambers 3600 are provided at a location adjacent to the index module 20. Hereinafter, these liquid treatment chambers are referred to as front liquid treating chambers 3602. Other portions of the liquid processing chambers 3600 are provided at positions adjacent to the interface module 40. Hereinafter, these liquid treatment chambers are referred to as rear heat treating chambers 3604.

The front liquid treatment chamber 3602 applies the first liquid onto the substrate W, and the rear liquid treatment chamber 3604 applies the second liquid onto the substrate W. FIG. The first liquid and the second liquid may be different kinds of liquids. According to one embodiment, the first liquid is an antireflection film and the second liquid is a photoresist. The photoresist may be applied onto the substrate W on which the antireflection film is applied. Optionally, the first liquid may be a photoresist and the second liquid may be an antireflection film. In this case, the antireflection film may be applied onto the substrate W to which the photoresist is applied. Optionally, the first liquid and the second liquid are liquids of the same kind, both of which may be photoresists.

3 and 4, a plurality of buffer chambers 3800 are provided. Some of the buffer chambers 3800 are disposed between the index module 20 and the transfer chamber 3400. These buffer chambers are hereinafter referred to as front buffers 3802 (front buffer). The front end buffers 3802 are provided in plural numbers and are positioned to be stacked on each other along the vertical direction. The other portion of the buffer chambers 3802 and 3804 is disposed between the transfer chamber 3400 and the interface module 40. These buffer chambers are called rear buffers 3804. The rear buffers 3804 are provided in plural numbers and are positioned to be stacked on each other in the vertical direction. Each of the front end buffers 3802 and the back end buffers 3804 temporarily stores a plurality of substrates (W). The substrate W stored in the front end buffer 3802 is loaded or unloaded by the index robot 2200 and the transfer robot 3342. The substrate W stored in the rear buffer 3804 is carried in or out by the transfer robot 3422 and the first robot 4602.

The developing block 30b has a heat treatment chamber 3200, a transfer chamber 3400, and a liquid treatment chamber 3600. Since the heat treatment chamber 3200 and the transfer chamber 3400 of the developing block 30b are provided in a structure and arrangement generally similar to those of the heat treatment chamber 3200 and the transfer chamber 3400 of the application block 30a, the description thereof will be provided. Is omitted.

In the developing block 30b, the liquid processing chambers 3600 are all provided to the developing chamber 3600 for supplying a developing solution to develop the substrate.

8 is a view schematically illustrating an example of the liquid processing chamber of FIG. 4. Referring to FIG. 8, the liquid processing chamber 3600 has a housing 3610, a cup 3620, a substrate support unit 3640, and a liquid supply unit 1000. Housing 3610 is generally provided in the shape of a cuboid. An inlet (not shown) through which the substrate W enters and exits is formed on the sidewall of the housing 3610. The inlet can be opened and closed by a door (not shown). The cup 3620, the support unit 3640, and the liquid supply unit 1000 are provided in the housing 3610. An upper wall of the housing 3610 may be provided with a fan filter unit 3670 that forms a downdraft in the housing 3260. Cup 3620 has a processing space with an open top. The substrate support unit 3640 is disposed in the processing space and supports the substrate W. As shown in FIG. The substrate support unit 3640 is provided such that the substrate W is rotatable during the liquid processing. The liquid supply unit 1000 supplies the liquid to the substrate W supported by the substrate support unit 3640.

9 is a cross-sectional view showing the liquid supply unit of FIG. 8. Referring to FIG. 9, the liquid supply unit 1000 includes a nozzle 1100, a liquid supply line 1200, and a valve unit 1300. The nozzle 1100 supplies the liquid from the upper portion of the substrate W supported by the substrate support unit. The nozzle 1100 is connected to the liquid supply line 1200, and the liquid is supplied to the nozzle 1100 through the liquid supply line 1200. The valve unit 1300 is installed on the liquid supply line 1200, and the valve unit 1300 supplies or stops supplying the liquid.

FIG. 10 is a cross-sectional view illustrating the valve unit of FIG. 9, and FIG. 11 is a cross-sectional view illustrating the valve unit in which the flow path 1322 is opened in FIG. 10. 10 and 11, the valve unit 1300 includes a housing 1320, a diaphragm 1350, and an air supply member 1400.

The housing 1320 is provided with a flow path 1322 through which liquid flows, one end of the flow path 1322 is provided to the outlets 1326 and 1324 through which the liquid flows, and the other end is provided as the outlet through which the liquid flows out. The first port 1336 and the second port 1338 are formed at one side of the housing 1320. Each of the first port 1336 and the second port 1338 functions as a passage through which air is supplied or exhausted. Air supplied or exhausted from the outside passes through the first port 1336, and air supplied or exhausted therein passes through the second port 1338 as it is pressurized or decompressed by the first port 1336. For example, the first port 1336 may be located at a height lower than the second port 1338. The first port 1336 may be provided as a coupling port in which the air supply member 1400 is installed.

The diaphragm 1350 is moved in the drive space 1330 formed in the housing 1320 to open and close the flow path 1322. The diaphragm 1350 is positioned to be coupled to the ceiling surface of the drive space 1330 by the elastic member 1352. The elastic member 1352 may be a spring. The diaphragm 1350 is driven up and down by pneumatic pressure to open and close the flow path 1322. For example, when the diaphragm 1350 is moved up and down, the flow path 1322 may be opened, and when the diaphragm 1350 moves down, the flow path 1322 may be closed. The driving space 1330 is partitioned into a first space 1332 and a second space 1334 by the diaphragm 1350. The first space 1332 is a space provided to the diaphragm 1350 by pneumatic pressure, and the second space 1334 is provided as a space excluding the first space 1332 in the driving space 1330. The first space 1332 is provided at a height facing the first port 1336 of the housing 1320, and the second space 1334 is provided at a height opposite the second space 1334 of the housing 1320. Can be.

The air supply member 1400 supplies air to the first space 1332 in which the diaphragm 1350 is located. The air supply member 1400 includes an air supply line 1420 and a speed control member 1440. The air supply line 1420 is located outside the housing 1320 and has a supply flow path through which air flows. The exhaust line 1422 branches from the air supply line 1420, and opens the air supplied to the first space 1332 upon exhausting the air. For example, while the air is supplied to the first space 1332, the exhaust line 1422 is blocked, and the exhaust line 1422 can be opened to exhaust the air in the first space 1332. The pressure reducing member may be installed in the exhaust line 1422.

The speed control member 1440 connects the air supply line 1420 and the housing 1320 to each other. The speed control member 1440 controls the speed at which air is supplied to the first space 1332 and the speed at which the air is exhausted, respectively. The speed control member 1440 controls the driving speed of the diaphragm 1350 by controlling the air supply speed and the air exhaust speed in the first space 1332. For example, the speed control member 1440 may be a speed controller.

Speed control member 1440 includes a body 1442, an inlet adjustment screw 1444, and an outlet adjustment screw 1446. The body 1442 has a passage 1443 through which air passes. The passage 1443 formed in the body 1442 is provided to have a volume larger than that of the first space 1332. The body 1442 is coupled to the coupling port of the housing 1320 to supply air supplied from the air supply line 1420 to the first space 1332. In one example, the passage 1443 is provided to have a volume of 1.5 to 2 times that of the first space 1332. The passage 1443 has a volume capable of sufficiently securing the amount of air moved from the first space 1332 to the passage 1443, and hunting is generated in the process of exhausting air, or exhaust pressure is not constant. The phenomenon can be prevented.

Optionally, the cross-sectional area of the passage 1443 may be provided larger than the cross-sectional area of the supply passage 1322 with respect to the direction in which air flows.

The inflow adjustment screw 1444 adjusts the inflow amount of air flowing into the passage 1443 of the body 1442, and the outflow adjustment screw 1446 adjusts the outflow amount of the air flowing out of the passage 1443 of the body 1442. do. That is, the inflow adjustment screw 1444 adjusts the flow rate in the supply direction of air, and the outflow adjustment screw 1446 may adjust the flow rate in the direction opposite to the supply direction of the air.

The inflow adjustment screw 1444 prevents the air from being supplied in the supply direction from the air supply line 1420 toward the first space 1332, but exhausted in the exhaust direction opposite thereto. The outflow adjustment screw 1446 also suppresses the air from being supplied in the supply direction in the opposite direction thereof, while the air is exhausted in the exhaust direction toward the air supply line 1420 in the first space 1332.

In the above-described embodiment, the inflow adjustment screw 1444 and the outflow adjustment screw 1446 are installed in the body 1442. However, as shown in FIGS. 12 and 13, an adjusting member 1500a for changing the volume of the passage 1443 of the body 1442 may be further installed. In FIG. 12, the adjustment member 1500a is inserted into the body 1442 inwardly to change the volume of the passage 1443. In FIG. 13, the adjustment member 1500b is removed in the outward direction of the body 1442. The volume size of (1443) was greatly changed.

Referring to FIG. 12, the body 1442 has a curved shape. One end of the body 1442 is coupled to the coupling port 1336, and the other end is connected to the air supply line 1420. A plurality of bends 1442a are formed in the body 1442, and one of the bends may be further provided with an adjusting member 1500a for changing the size of the passage 1443. The adjusting member 1500a may be inserted from the outside to the inside of the body 1442 through the bent portion. The volume size of the passage 1443 may be changed according to the degree of insertion of the adjustment member 1500a, and it may be minimized to prevent the supply or exhaust of air.

Also, referring to FIG. 13, the body 1442 may further have a protrusion protruding outward. The adjusting member 1500b may be inserted from the outer side to the inner side of the body 1442 through the protrusion 1442b. The volume size of the passage 1443 may be changed according to the degree of insertion of the adjustment member 1500b, and it is possible to minimize the interference of the adjustment member 1500b with the supply or exhaust of air.

In the embodiment of the present invention, the passage 1443 of the body 1442 is provided in a larger volume than the first space 1332, thereby ensuring sufficient space when the air is exhausted. As a result, when the diaphragm 1350 blocks the flow path 1322 as the air is exhausted, air may be hunted or the diaphragm 1350 may not properly block the flow path 1322, and the nozzle 1100 may be discharged. Dropping of liquid from the stage can be prevented.

As the liquid is prevented from falling, the liquid supply line 1200 does not need to install a suction member for sucking the liquid, which may improve the space efficiency of the liquid supply unit 1000.

In addition, although the valve unit 1300 has been described as supplying or stopping supplying the developer in the present embodiment, the present invention is not limited to the developer and may be variously applied to a configuration for supplying a liquid or a fluid such as an antireflection film and a photoresist.

3 and 4, the interface module 40 connects the processing module 30 to the external exposure apparatus 50. The interface module 40 has an interface frame 4100, an additional process chamber 4200, an interface buffer 4400, and a transfer member 4600.

The upper end of the interface frame 4100 may be provided with a fan filter unit to form a downdraft therein. The additional process chamber 4200, the interface buffer 4400, and the transfer member 4600 are disposed inside the interface frame 4100. The additional process chamber 4200 may perform a predetermined additional process before the substrate W, which has been processed in the application block 30a, is carried into the exposure apparatus 50. Optionally, the additional process chamber 4200 may perform a predetermined additional process before the substrate W, which has been processed in the exposure apparatus 50, is carried into the developing block 30b. According to an example, the addition process may be an edge exposure process of exposing the edge region of the substrate W, an upper surface cleaning process of cleaning the upper surface of the substrate W, or a lower surface cleaning process of cleaning the lower surface of the substrate W. Can be. The plurality of additional process chambers 4200 may be provided, and they may be provided to be stacked on each other. The additional process chambers 4200 may all be provided to perform the same process. Optionally, some of the additional process chambers 4200 may be provided to perform different processes.

The interface buffer 4400 provides a space in which the substrate W to be transported between the application block 30a, the additional process chamber 4200, the exposure apparatus 50, and the development block 30b temporarily stays during the transport. The interface buffer 4400 may be provided in plurality, and the plurality of interface buffers 4400 may be provided to be stacked on each other.

According to an example, an additional process chamber 4200 may be disposed on one side of the transfer chamber 3400 and an interface buffer 4400 may be disposed on the other side of the transfer chamber 3400.

The conveying member 4600 conveys the substrate W between the application block 30a, the additional process chamber 4200, the exposure apparatus 50, and the developing block 30b. The conveying member 4600 may be provided by one or a plurality of robots. According to one example, the conveying member 4600 has a first robot 4602 and a second robot 4606. The first robot 4602 conveys the substrate W between the application block 30a, the additional process chamber 4200, and the interface buffer 4400, and the interface robot 4606 uses the interface buffer 4400 and the exposure apparatus ( The substrate W may be transported between 50, and a second robot 4604 may be provided to transport the substrate W between the interface buffer 4400 and the developing block 30b.

The first robot 4602 and the second robot 4606 each comprise a hand on which the substrate W is placed, the hand moving forward and backward, rotating about an axis parallel to the third direction 16, and It may be provided to be movable along three directions 16.

The hands of the index robot 2200, the first robot 4602, and the second robot 4606 may all be provided in the same shape as the hands 3420 of the transfer robot 3342. Optionally, the hand of the robot that directly exchanges the substrate W with the transfer plate 3240 of the heat treatment chamber is provided in the same shape as the hand 3420 of the transfer robot 3342, and the hand of the other robot is provided in a different shape. Can be.

According to an embodiment, the index robot 2200 may be provided to directly exchange the substrate W with the heating unit 3230 of the shear heat treatment chamber 3200 provided in the application block 30a.

In addition, the transfer robot 3342 provided to the application block 30a and the development block 30b may be provided to directly exchange the substrate W with the transfer plate 3240 located in the heat treatment chamber 3200.

Next, an embodiment of a method of processing a substrate using the substrate processing apparatus 1 described above will be described.

The coating treatment step S20, the edge exposure step S40, the exposure step S60, and the development step S80 are sequentially performed on the substrate W. FIG.

Coating treatment step (S20) is the heat treatment step (S21) in the heat treatment chamber (3200), the anti-reflection film coating step (S22) in the front liquid treatment chamber 3602, the heat treatment step (S23), the rear end liquid treatment in the heat treatment chamber 3200 The photoresist film applying process (S24) in the chamber 3604, and the heat treatment process (S25) in the heat treatment chamber 3200 are carried out sequentially.

Hereinafter, an example of the conveyance path | route of the board | substrate W from the container 10 to the exposure apparatus 50 is demonstrated.

The index robot 2200 takes the substrate W out of the container 10 and transfers it to the front end buffer 3802. The transfer robot 3422 transfers the substrate W stored in the front end buffer 3802 to the front end heat treatment chamber 3200. The substrate W conveys the substrate W to the heating unit 3230 by the conveying plate 3240. When the heating step of the substrate is completed in the heating unit 3230, the conveying plate 3240 conveys the substrate to the cooling unit 3220. The transfer plate 3240 is in contact with the cooling unit 3220 in a state of supporting the substrate W to perform a cooling process of the substrate W. When the cooling process is completed, the transfer plate 3240 is moved to the upper portion of the cooling unit 3220, and the transfer robot 3342 takes out the substrate W from the heat treatment chamber 3200 to the front liquid treatment chamber 3602. Return.

In the shear liquid treatment chamber 3602, an antireflection film is applied onto the substrate W. FIG.

The transfer robot 3422 takes out the substrate W from the front end liquid processing chamber 3602 and carries the substrate W into the heat treatment chamber 3200. The above-mentioned heating process and cooling process progress sequentially to the heat processing chamber 3200, and when each heat processing process is completed, the conveyance robot 3342 will carry out the board | substrate W, and will convey to the rear liquid processing chamber 3604.

Thereafter, a photoresist film is coated on the substrate W in the rear liquid treatment chamber 3604.

The transfer robot 3422 takes out the substrate W from the rear stage liquid processing chamber 3604 and carries the substrate W into the heat treatment chamber 3200. The above-mentioned heating process and cooling process progress sequentially in the heat processing chamber 3200, and when each heat processing process is completed, the transfer robot 3422 conveys the board | substrate W to the back buffer 3804. As shown in FIG. The first robot 4602 of the interface module 40 takes the substrate W out of the rear buffer 3804 and transports it to the auxiliary process chamber 4200.

An edge exposure process is performed on the substrate W in the auxiliary process chamber 4200.

Thereafter, the first robot 4602 transports the substrate W from the auxiliary process chamber 4200 and conveys the substrate W to the interface buffer 4400.

Thereafter, the second robot 4606 unloads the substrate W from the interface buffer 4400 and transfers it to the exposure apparatus 50.

The development process S80 is performed by sequentially performing the heat treatment process S81 in the heat treatment chamber 3200, the developing process S82 in the liquid treatment chamber 3600, and the heat treatment process S83 in the heat treatment chamber 3200. do.

Hereinafter, an example of the conveyance path | route of the board | substrate W from the exposure apparatus 50 to the container 10 is demonstrated.

The second robot 4606 carries the substrate W out of the exposure apparatus 50 and conveys the substrate W to the interface buffer 4400.

Thereafter, the first robot 4602 carries the substrate W out of the interface buffer 4400 and conveys the substrate W to the rear buffer 3804. The transfer robot 3422 transports the substrate W from the rear buffer 3804 and transfers the substrate W to the heat treatment chamber 3200. In the heat treatment chamber 3200, a heating process and a cooling process of the substrate W are sequentially performed. When the cooling step is completed, the substrate W is transferred to the developing chamber 3600 by the transfer robot 3342.

The developing process is performed by supplying a developing solution onto the substrate W to the developing chamber 3600.

The substrate W is carried out from the developing chamber 3600 by the transfer robot 3422 and carried into the heat treatment chamber 3200. The substrate W is sequentially heated and cooled in the heat treatment chamber 3200. When the cooling process is completed, the substrate W is carried out from the heat treatment chamber 3200 by the transfer robot 3422 to be conveyed to the front end buffer 3802.

Thereafter, the index robot 2200 takes the substrate W out of the front end buffer 3802 and transfers it to the container 10.

The processing block of the substrate processing apparatus 1 described above has been described as performing a coating treatment process and a developing treatment process. Alternatively, the substrate processing apparatus 1 may include only the index module 20 and the processing block 37 without the interface module. In this case, the processing block 37 performs only a coating treatment process, and the film applied on the substrate W may be a spin-on hard mask film SOH.

The foregoing detailed description illustrates the present invention. In addition, the above description shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications can be made within the scope of the concept of the invention disclosed in this specification, the scope equivalent to the disclosures described above, and / or the skill or knowledge in the art. The described embodiments illustrate the best state for implementing the technical idea of the present invention, and various modifications required in the specific application field and use of the present invention are possible. Thus, the detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Also, the appended claims should be construed to include other embodiments.

1300: valve unit 1320: housing
1350: diaphragm 1400: air supply member
1440: speed control member 1442: body
1444: inflow adjustment screw 1446: outflow adjustment screw

Claims (14)

In the valve unit,
A housing having a flow path having an inlet port through which the fluid flows in and an outlet port through which the fluid flows out;
A diaphragm disposed in the housing, the diaphragm opening and closing the flow path by driving by pneumatic pressure;
An air supply member supplying air for driving the diaphragm to a first space in the housing provided with the diaphragm,
The air supply member,
An air supply line provided outside the housing and having a supply flow path through which the air flows;
A speed control member positioned between the air supply line and the housing and configured to control a driving speed of the diaphragm,
The speed control member has a body formed with a passage through which the air flows,
The passage unit has a larger volume than the first space. The method of claim 1,
The speed control member is directly coupled to one surface of the housing, a coupling port to which the air is supplied is formed,
The first space is in communication with the coupling port, the valve unit is provided as a space formed by one surface of the housing and the diaphragm. The method of claim 2,
The volume of the passage is provided in the valve unit 1.5 to 2 times the volume of the first space. The method of claim 3,
The housing is formed with the flow path and the driving space therein,
The driving unit has a second space facing the flow path with the first space supplied with the air and the first space therebetween, and having a second space independent of the first space. The method according to any one of claims 1 to 4,
And the cross-sectional area of the passage in a plane perpendicular to the air flow direction is provided to be larger than the cross-sectional area of the supply passage. The method according to any one of claims 1 to 4,
The speed control member,
It is provided on the body further comprises an adjustment member for changing the volume size of the passage,
And the regulating member is moved with a portion positioned outside the body and the other portion positioned inside the body to change the volume size of the passage. The method of claim 6,
The body has a curved shape,
The body has one end coupled to the housing, the other end connected to the air supply line, and having a bent portion between one end and the other end,
The valve member is inserted into the bent portion. The method of claim 6,
The body has one end coupled to the housing, the other end connected to the air supply line, and has a protrusion projecting outwardly between one end and the other end,
The valve member is inserted into the protrusion. In the device for supplying a liquid,
A liquid supply line for supplying a liquid;
A valve unit installed in the liquid supply line to supply or stop the liquid,
The valve unit
A housing having a flow path having an inlet port through which the fluid flows in and an outlet port through which the fluid flows out;
A diaphragm disposed in the housing, the diaphragm opening and closing the flow path by driving by pneumatic pressure;
An air supply member for supplying air for driving the diaphragm to a first space in the housing provided with the diaphragm,
The air supply member,
An air supply line provided outside the housing and having a supply flow path through which the air flows;
A speed control member positioned between the air supply line and the housing and configured to control a driving speed of the diaphragm,
The speed control member has a body formed with a passage through which the air flows,
And the passage has a volume larger than that of the first space. The method of claim 9,
The speed control member is directly coupled to one surface of the housing, a coupling port to which the air is supplied is formed,
And the first space communicates with the coupling port and is provided as a space formed by one surface of the housing and the diaphragm. The method of claim 10,
And a volume of the passage is provided at 1.5 to 2 times the volume of the first space. The method of claim 11,
The housing is formed with a drive space having the flow path and the first space therein,
And the driving space has a second space facing the flow path with the first space supplied with the air and the first space therebetween and independent of the first space. The method according to any one of claims 9 to 12,
And a cross sectional area of the passage in a plane perpendicular to the air flow direction is provided to be larger than the cross sectional area of the supply passage. The method according to any one of claims 9 to 12,
The speed control member,
It is provided on the body further comprises an adjustment member for changing the volume size of the passage,
And the adjusting member is moved with a part positioned outside the body and the other part positioned inside the body to change the volume size of the passage.

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