KR101943708B1 - Photosensitive conductive paste composition and touch screen panel prepared by using the same - Google Patents

Abstract

상기 화학식 1에서 R₁은 수소 또는 치환 또는 비치환된 C1 내지 C20 알킬기임.
[화학식 2]

상기 화학식 2에서, 상기 R₂는 수소 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고, 상기 W는 단일 결합 또는 C1 내지 C10의 선형 또는 분지형 알킬렌기이며, X는 2가 유기기이고, 상기 Y는 말단에 1개 이상의 -OAg 기를 갖는 1가 유기기임.The present invention relates to a photosensitive resin composition comprising a conductive fine particle, an acrylic copolymer, a photopolymerizable monomer, a photopolymerization initiator and a solvent, wherein the acrylic copolymer comprises a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula Conductive paste composition and a touch screen panel made using the same.
[Chemical Formula 1]

In Formula 1, R ₁ is hydrogen or a substituted or unsubstituted C1 to C20 alkyl group.
(2)

In Formula 2, R ₂ is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, W is a single bond or a C 1 to C 10 linear or branched alkylene group, X is a divalent organic group, Y Is a monovalent organic group having at least one -OAg group at the terminal.

Description

TECHNICAL FIELD [0001] The present invention relates to a photosensitive conductive paste composition, and a touch screen panel using the same. BACKGROUND ART [0002]

The present invention relates to a photosensitive conductive paste composition and a touch screen panel manufactured using the same. More particularly, the present invention relates to a photosensitive conductive paste composition having a low resistance property when a fine line width is implemented and a touch screen panel manufactured using the same.

The touch screen panel is an input device that recognizes the contact position and transmits it to the system when the user presses the screen with a finger or a pen on the screen. A typical touch screen panel is a capacitive touch screen panel. The capacitive touch screen panel has a structure in which a conductive paste is patterned on one surface of a substrate made of a plastic film or glass to form a transparent electrode layer and then a certain amount of current is allowed to flow and a finger or a pen touches the surface of the touch screen panel And the tapped position is calculated by detecting the change in the minute capacitance that occurs when the tapped position is detected.

Conventionally, screen printing or gravure offset printing has been mainly used as a method of patterning a conductive paste for forming a transparent electrode layer. However, in the case of screen printing, there is a limitation in reducing the electrode line width, and in the case of the gravure offset printing method, the method is applicable only when the substrate is glass. In addition, in the above methods, the sharpness of the electrode pattern is lowered as the number of prints is increased, and the resistance value is significantly changed.

In order to solve the above problems, a method of forming a transparent electrode layer by applying a photoresist process has been developed, and a conductive paste composition having photosensitivity has been developed. In the case of forming the electrode layer using the photosensitive conductive paste composition, it is possible to realize a fine line width as compared with the screen printing method or the gravure offset printing method, and also the problem of unevenness of the pattern and unevenness of the resistance value There is an advantage that it does not.

Korean Patent Laid-Open Publication No. 2014-0094030 discloses a photosensitive conductive paste comprising conductive particles, a photosensitive component, a photopolymerization initiator, and an epoxy resin. The photosensitive component may be an alkali-soluble polymer obtained by addition reaction of a part of an unsaturated acid in an acrylic polymer with glycidyl (meth) acrylic acid or the like obtained by using an unsaturated acid such as a carboxylic acid as a monomer.

However, in the case of a photosensitive conductive paste composition using a polymer prepared by the addition reaction of an acrylic polymer with glycidyl (meth) acrylic acid as described above, there is no problem in resistance characteristics at a relatively wide line width. However, There is a problem that the value increases sharply.

Therefore, development of a photosensitive conductive paste composition having a low resistance value even in a fine line width is required.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and it is an object of the present invention to provide a photosensitive conductive paste composition capable of realizing a low resistance in a fine line width and a touch screen panel manufactured using the same.

In one aspect, the present invention provides a photosensitive resin composition comprising a conductive fine particle, an acrylic copolymer, a photopolymerizable monomer, a photopolymerization initiator and a solvent, wherein the acrylic copolymer contains a repeating unit represented by the following formula (1) By weight based on the total weight of the composition.

[Chemical Formula 1]

Wherein R ₁ is hydrogen or a substituted or unsubstituted C1 to C20 alkyl group.

(2)

In Formula 2, R ₂ is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, W is a single bond or a C 1 to C 10 linear or branched alkylene group, X is a divalent organic group, Y Is a monovalent organic group having at least one -OAg group at the terminal.

In one embodiment, in Formula 2, X may be -NHC (= O) O-, -NHC (= O) - or -C (= O) O-, Lt; / RTI >

(3)

Wherein A is an alkylene group, an ether group or an ester group, which is substituted or unsubstituted C1 to C20, n is an integer of 0 to 4, and m is an integer of 1 to 3.

In another embodiment, Y in Formula 2 may be a functional group represented by Formula 4 below.

[Chemical Formula 4]

The acrylic copolymer may further include a repeating unit represented by the following general formula (5).

 [Chemical Formula 5]

Z represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an amine group, an amino group, a hydroxyl group, a carboxyl group, an ester group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkene Substituted or unsubstituted C 2 to C 20 alkynyl group, substituted or unsubstituted C 3 to C 20 cycloalkyl group, substituted or unsubstituted C 6 to C 20 aryl group, substituted or unsubstituted C 2 to C 20 heteroaryl group, A substituted C2 to C20 heterocyclic group or a combination thereof.

Specifically, the repeating unit represented by the formula (5) is, for example, an alkyl (meth) acrylate, an isobornyl (meth) acrylate, an acrylomorpholine, a hydroxy acrylate, styrene, cyclohexyl methacryl At least one member selected from the group consisting of methacrylate, methacrylate, glycidyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, t-butyl methacrylate, vinyl chloride, vinyl acetate and acrylonitrile Or may be derived from a monomer.

The acrylic copolymer may be represented by the following general formula (6).

[Chemical Formula 6]

In Formula 6, W is a single bond or a C1 to C10 linear or branched alkylene group; X is -NHC (= O) O-, -NHC (= O) - or -C (= O) O-; Y is a functional group represented by the following formula (3); R ₁ , R ₂ and R ₃ are each independently hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group; R ₄ is a substituted or unsubstituted C 3 to C 20 cycloalkyl group, a substituted or unsubstituted C 6 to C 20 aryl group, a substituted or unsubstituted C 2 to C 20 heteroaryl group, or a substituted or unsubstituted C 2 to C 20 heterocyclic group ego; Wherein a is 0.1 to 0.3, b is 0.01 to 0.1, c is 0.4 to 0.75, and d is 0.1 to 0.3.

(3)

Wherein A is an alkylene group, an ether group or an ester group, which is substituted or unsubstituted C1 to C20, n is an integer of 0 to 4, and m is an integer of 1 to 3.

The acrylic copolymer is obtained by polymerizing a compound represented by the following general formula (7) and a compound represented by the following general formula (8) to synthesize an acrylic monomer having a vinyl group at its terminal and containing a silver atom, ≪ RTI ID = 0.0 > a < / RTI >

(7)

Wherein A is a substituted or unsubstituted C1 to C20 alkylene group, an ether group or an ester group, B is a carboxyl group, a hydroxyl group, an amine group or an oxirane group, and k is an integer of 1 to 10 , N is an integer of 0 to 4, and m is an integer of 1 to 3.

[Chemical Formula 8]

In Formula 8, C is hydrogen or a substituted or unsubstituted C1 to C10 alkyl group, D is a carboxyl group, a cyanate group or an epoxy group, and W is a single bond or a C1 to C10 linear or branched alkylene group , And o is an integer of 1 to 3.

On the other hand, the photosensitive conductive paste composition may contain 65 to 70 wt% of conductive fine particles, 1 to 15 wt% of an acrylic copolymer, 1 to 10 wt% of the photopolymerizable monomer, and 0.1 to 5 wt% Of a photopolymerization initiator and, if necessary, may further comprise a coupling agent, a surfactant, a dispersing agent, a leveling agent, or a combination thereof.

In another aspect, the present invention provides a touch screen panel manufactured using the photosensitive conductive paste composition according to the present invention.

The photosensitive conductive paste composition according to the present invention contains silver having conductivity in the acrylic copolymer, and has a low resistance value even in a fine line width.

Hereinafter, the present invention will be described in more detail.

Unless otherwise specified herein, "substituted" means that at least one hydrogen atom of the functional group is replaced by a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, A thio group, an ester group, an ether group, a carboxyl group, a sulfonic acid group, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkenyl group, an alkenyl group, C3 to C20 cycloalkenyl groups, C3 to C20 cycloalkynyl groups, C2 to C20 heterocycloalkyl groups, C2 to C20 heterocycloalkenyl groups, C2 to C20 heterocycloalkenyl groups, C2 to C20 alkynyl groups, C6 to C30 aryl groups, C3 to C20 cycloalkyl groups, C3 to C20 cycloalkenyl groups, An alkynyl group, a C3 to C30 heteroaryl group, or a combination thereof.

In the present specification, "hetero" means that at least one atom of N, O, S and P is included in the formula.

In addition, in the present specification, "(meth) acryl" means methacrylic and acrylic.

In the present specification, * denotes a bonding site.

According to one embodiment, the photosensitive conductive paste composition of the present invention comprises (A) conductive fine particles, (B) an acrylic copolymer, (C) a photopolymerizable monomer, (D) a photopolymerization initiator and (E) a solvent.

Hereinafter, each component of the photosensitive conductive paste composition of the present invention will be described in detail.

 (A) conductive fine particles

The conductive fine particles (A) are used for imparting electrical conductivity. The conductive fine particles (A) may include various metal fine particles such as Ag, Au, Cu, Pt, Pb, Sn, Ni, Al, W, Mi, Cr, Alloys thereof, oxides thereof, or mixtures thereof, and the like may be used. Among them, Ag, Cu, Au, indium tin oxide (ITO) and the like are preferable, and a mixture of Ag and indium tin oxide (ITO) is particularly preferable.

The volume average particle diameter of the conductive fine particles may be about 0.1 to 10 탆, and preferably about 1 to 5 탆. In the above numerical range, excellent resistance characteristics are exhibited after formation of the electrode layer, and fine pattern formation is easy.

The content of the conductive fine particles may be 50% by weight to 80% by weight, preferably 60% by weight to 80% by weight, and more preferably 65% by weight to 75% by weight, based on the solid content of the photosensitive conductive paste composition. When the content of the conductive fine particles satisfies the above-described numerical range, excellent resistance characteristics can be exhibited after the electrode layer is formed.

(B) an acrylic copolymer

The acrylic copolymer (B) is for imparting photosensitivity. The acrylic copolymer used in the present invention includes a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2).

[Chemical Formula 1]

In Formula 1, R ₁ is hydrogen or a substituted or unsubstituted C1 to C20 alkyl group, preferably a C1 to C20 alkyl group, more preferably a methyl group.

The repeating unit represented by the formula (1) is for imparting alkali solubility to the acrylic copolymer, and may be a unit derived, for example, from acrylic acid or methacrylic acid.

(2)

In Formula 2, R ₂ is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, W is a single bond or a C 1 to C 10 linear or branched alkylene group, X is a divalent organic group, Y Is a monovalent organic group having at least one -OAg group at the terminal.

Preferably, in Formula 2, X may be -NHC (= O) O-, -NHC (= O) - or -C (= O) O-, Lt; / RTI >

(3)

Wherein A is an alkylene group, an ether group or an ester group, which is substituted or unsubstituted C1 to C20, n is an integer of 0 to 4, and m is an integer of 1 to 3.

More preferably, Y in the formula (2) may be a functional group represented by the following formula (4).

[Chemical Formula 4]

The acrylic copolymer used in the present invention has a higher electrical conductivity than conventional photosensitive conductive paste compositions because it contains a repeating unit containing silver (Ag) as a conductive material at the end as described below. Further, since the conductive material is attached to the acrylic copolymer which is a binder resin, the conductive material is uniformly distributed even after the electrode is formed, and therefore, a low resistance value can be exhibited even when the fine line width is realized.

The acrylic copolymer may further include at least one repeating unit represented by the following general formula (5).

 [Chemical Formula 5]

Z represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an amine group, an amino group, a hydroxyl group, a carboxyl group, an ester group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkene Substituted or unsubstituted C 2 to C 20 alkynyl group, substituted or unsubstituted C 3 to C 20 cycloalkyl group, substituted or unsubstituted C 6 to C 20 aryl group, substituted or unsubstituted C 2 to C 20 heteroaryl group, A substituted C2 to C20 heterocyclic group or a combination thereof.

Specifically, the repeating unit represented by the above-mentioned formula (5) is, for example, an alkyl (meth) acrylate, an isobornyl (meth) acrylate, an acrylomorpholine, styrene, cyclohexyl methacrylate, methacrylate , At least one monomer selected from the group consisting of glycidyl methacrylate, n-butyl methacrylate, iso-butyl methacrylate, t-butyl methacrylate, vinyl chloride, vinyl acetate and acrylonitrile .

According to one embodiment, the acrylic copolymer may be represented by the following general formula (6).

 [Chemical Formula 6]

In Formula 6, W is a single bond or a C1 to C10 linear or branched alkylene group, and X is -NHC (= O) O-, -NHC (= O) - or -C -, and Y is a functional group represented by the following formula (3).

(3)

Wherein A is an alkylene group, an ether group or an ester group, which is substituted or unsubstituted C1 to C20, n is an integer of 0 to 4, and m is an integer of 1 to 3.

R ₁ , R ₂ and R ₃ are each independently hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, and R ₄ is a substituted or unsubstituted C 3 to C 20 cycloalkyl group, a substituted or unsubstituted C 6 to C 20 cycloalkyl group, C20 aryl group, a substituted or unsubstituted C2 to C20 heteroaryl group, or a substituted or unsubstituted C2 to C20 heterocyclic group.

The above-mentioned "a" is 0.1 to 0.3, the "b" is 0.01 to 0.1, the c is 0.4 to 0.75, and the d is 0.1 to 0.3. When a is less than 0.1, the straightness and residual characteristics of the post-development pattern may deteriorate, and when it exceeds 0.3, the undercut may be enlarged due to the over-development characteristic, and the phenomenon of pattern detachment may be intensified. When b is less than 0.01, the photocuring characteristics deteriorate and the pattern during development may become non-uniform. When it exceeds 0.1, overexposure characteristics may occur and pattern blurring may occur after development. When C is less than 0.4, the adhesion to the substrate may be deteriorated, and when C is more than 0.75, development characteristics may be deteriorated. When D is less than 0.1, the drying characteristics deteriorate, while when D exceeds 0.3, the drying characteristics become too high.

The acrylic copolymer of the present invention as described above is obtained by polymerizing a compound represented by the following general formula (7) and a compound represented by the following general formula (8) to synthesize an acrylic monomer having a vinyl group at the terminal thereof and having a silver atom, And (meth) acrylic acid.

 (7)

Wherein A is a substituted or unsubstituted C1 to C20 alkylene group, an ether group or an ester group, B is a carboxyl group, a hydroxyl group, an amine group or an oxirane group, and k is an integer of 1 to 10 , N is an integer of 0 to 4, and m is an integer of 1 to 3.

[Chemical Formula 8]

In Formula 8, C is hydrogen or a substituted or unsubstituted C1 to C10 alkyl group, W is a single bond or a C1 to C10 linear or branched alkylene group, and D is a carboxyl group, a cyanate group, or an epoxy group , And o is an integer of 1 to 3.

Preferably, the compound represented by the formula (7) may be silver citrate, and the compound represented by the formula (8) may be 2-isocyanate (meth) acrylate, but is not limited thereto.

On the other hand, the monomer mixture may optionally further comprise other comonomers. Examples of the other comonomers include alkyl (meth) acrylate, isobonyl (meth) acrylate, acrylomorpholine, hydroxyl group-containing (meth) acrylate, styrene, cyclohexyl methacrylate, Butyl methacrylate, t-butyl methacrylate, vinyl chloride, vinyl acetate, acrylonitrile, or combinations thereof, but are not limited thereto. It is not.

The content of the acrylic copolymer may be 1 to 15% by weight, preferably 4 to 12% by weight, more preferably 6 to 10% by weight based on the solid content of the photosensitive conductive paste composition. In the above range, there is an effect of excellent electrical resistance characteristics and coating film characteristics.

(C) Photopolymerization  Monomer

The photopolymerizable monomer (C) is intended to allow sufficient polymerization to occur during exposure in the pattern formation step. As the photopolymerizable monomer (C), monofunctional or polyfunctional esters of (meth) acrylic acid having at least one ethylenic unsaturated double bond may be used singly or in combination.

Examples of the photopolymerizable monomer include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylethylene glycol di (meth) acrylate, diethylene glycol di , Triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (Meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra Dipentaerythritol tri (meth) acrylate, dipentaerythritol di (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (Meth) acrylate, novolac epoxy (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A di (meth) acrylate, trimethylolpropane tri (Meth) acrylate derivatives having at least one functional group selected from the group consisting of dipentaerythritol penta (meth) acrylate, ethylene oxide glycerin trimethylol propane tri (meth) acrylate and propylene oxide glycerin tri (meth) acrylate. .

The content of the photopolymerizable monomer may be 1 to 10% by weight, preferably 1 to 8% by weight, more preferably 2 to 6% by weight, based on the solid content of the photosensitive conductive paste composition. When the content of the photopolymerizable monomer satisfies the above range, the photocurable crosslinking property is excellent and the alkali developing property is also excellent.

 (D) Photopolymerization initiator

The photopolymerization initiator is a photopolymerization initiator which is generally used in a photosensitive resin composition and is exemplified by a triazine-based compound, an acetophenone-based compound, a nonimidazole-based compound, a benzoin-based compound, a benzophenone-based compound, a thioxanthone- At least one kind selected from the group consisting of

Specific examples of the triazine compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis Azine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino- Methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4- dimethoxyphenyl) ethenyl] (Trichloromethyl) -6-piperonyl) -1,3,5-triazine, 2,4,6-trichloro-s-triazine, 2-phenyl- (Trichloromethyl) -s-triazine, 2- (3 ', 4'-dimethoxystyryl) -4,6-bis 4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine (Trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-tri Azine, 2-biphenyl-4,6-bis (trichloromethyl) -s-triazine, bis (trichloromethyl) 4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphtho-1-yl) (4'-methoxystyryl) -6-triazine and the like, among which 2,4-bis (trichloro Methyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxynaphthyl) (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine or 2,4-bis (trichloromethyl) -6-piperonyl 1,2,5-triazine, especially 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine.

Specific examples of the acetophenone-based compound include diethoxyacetophenone, 2-methyl-2-morpholino-1- (4-methylthiophenyl) propan- 2-methyl-1- [4- (2-hydroxyethoxy) phenyl] propan-1-one, 1-hydroxycyclohexylphenyl Ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan- 1-one and 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one. Of these, 2-dimethylamino-1- (4-morpholinophenyl) butan-1-one or 2- (4-methylbenzyl) 2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, especially 2-benzyl- 2- (4-methylbenzyl) -2-dimethylamino-1- (4- Phenyl) butane-1-one can be used.

Examples of the non-imidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'- -4,4 ', 5,5'-tetra (4-carboethoxyphenyl) biimidazole, 2,2', -bis (2-chlorophenyl) -4,4 ' (2-chlorophenyl) -4,4 ', 5,5'-tetra (2,4-dichlorophenyl) biimidazole, 2,2'-bis Bis (2-bromophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4' -Tetraphenylimidazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (m-methoxyphenyl) Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,6-dichlorophenyl) -4,4', 5,5'-tetra Phenylbimidazole, 2,2'-bis (2-nitrophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole and 2,2'-bis (2-methylphenyl) , And 5,5'-tetraphenylbiimidazole. Of these, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'- L, 2'-bis (2,3-dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole can be used.

Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

Examples of the benzophenone compound include benzophenone, benzoyl benzoic acid, methyl o-benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 3,3'-dimethyl- 4'-dichlorobenzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4-benzoyl- ', 4,4'-tetra (tert-butylperoxycarbonyl) benzophenone, and 2,4,6-trimethylbenzophenone.

Examples of the thioxanthone compound include thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, Isopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like.

Examples of the oxime compounds include O-acyloxime compounds, 1,2-octanedione, 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] (9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone, O-ethoxycarbonyl- Propan-1-one. Specific examples of the O-acyloxime-based compound include 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-O-benzoate, 1- -1-one oxime-O-acetate and 1- (4-phenylsulfanylphenyl) -butane-l, 2-dione 2-oxime- 1-one oxime-0-acetate.

In addition to the compounds enumerated above, examples include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethyl anthraquinone, benzyl, 9,10- Methylglyoxylate, titanocene compounds and the like can also be used.

The photopolymerization initiator may be used in combination with a photosensitizer that generates a chemical reaction by transferring energy after being excited by absorbing light.

The content of the photopolymerization initiator may be 0.1 to 5% by weight, preferably 0.5 to 3% by weight, based on the solid content of the photosensitive conductive paste composition. When the content of the photopolymerization initiator is within the above range, polymerization is sufficiently carried out in the pattern formation step, and side effects caused by the unreacted initiator do not occur.

 (E) Solvent

The solvent is compatible with the acrylic copolymer and other constituent materials and is not particularly limited. Examples of the solvent include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, n-butyl ether, diisobutyl ether, methylphenyl ether and tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate and diethyl cellosolve acetate; Carbitols such as methylethylcarbitol, diethylcarbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl- ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate and butyl oxyacetate; Alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, and ethyl ethoxyacetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate and methyl 3-ethoxypropionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate and propyl 2-oxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate and methyl 2-ethoxypropionate; 2-methylpropionic acid esters such as methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy- Monooximonocarboxylic acid alkyl esters of 2-alkoxy-2-methylpropionic acid alkyls such as ethyl methyl propionate; Esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate and methyl 2-hydroxy-3-methylbutanoate; Ketone acid esters such as ethyl pyruvate, and the like, but the present invention is not limited thereto.

The solvent may be used as a residual amount so that the solubility and viscosity of the photosensitive conductive paste composition are appropriately controlled after the addition of the other components to the total amount of the photosensitive conductive paste composition, and the physical and optical properties of the composition are applied.

(F) Additive

The photosensitive conductive paste composition may further include a coupling agent, a surfactant, a dispersing agent, a leveling agent, or a combination thereof, if necessary.

The additive may be contained in an amount of 0.1 to 5% by weight based on the solid content of the photosensitive conductive paste composition.

The photosensitive conductive paste composition of the present invention can be used to form an electrode layer of a touch screen panel. Specifically, the above photosensitive conductive paste composition of the present invention is applied onto a substrate, and the solvent is evaporated by heating to 70 to 110 캜. Then, the photosensitive conductive paste composition is exposed through a mask for pattern formation, and developed to form a pattern on the substrate. Then, the pattern may be cured to form an electrode layer of the touch screen panel, but the present invention is not limited thereto.

At this time, as the substrate, substrates used as a substrate for a touch screen panel in the related art can be used, and there is no particular limitation. Examples of the substrate include a polyethylene terephthalate film, a polyimide film, a polyester film, an aramid film, an epoxy resin substrate, a polyetherimide resin substrate, a polyether ketone resin substrate, a polysulfone resin substrate, May be used, but is not limited thereto.

Hereinafter, the present invention will be described more specifically with reference to preferred embodiments and comparative examples of the present invention. However, the following examples are for illustrative purposes only and are not intended to limit the invention.

Manufacturing example  1 - Acrylic Copolymer I

2-isocyanate ethyl methacrylate (trade name: Karenz MOI, Showa Denko K.K.) and silver citrate hydrate (Sigmaaldrich) were mixed at a molar ratio of 1: 1 and reacted at 40 ° C to 50 ° C for 6 hours An acrylic monomer (M-1) having silver (Ag) introduced at its terminal was synthesized by using the end of the disappearance of the NCO peak by FT-IR.

400 g of ethyl carbitol acetate (Samcheon Chemical), which is an organic solvent, was first added to a 2 L four-necked flask, a reflux condenser was installed on one side, a thermometer was provided on the other side, and a dropping panel was provided on the other side Respectively. After the temperature of the flask solution was raised to the reflux temperature (90 to 100 ° C), a mixed solution of 400 g of a mixture of isobornyl acrylate, methyl methacrylate, methacrylic acid and the acrylic monomer (M-1) and 9 g of azobisisobutylonitrile And then the mixed solution was dripped at 90 to 100 ° C for 3 hours using a dropping panel. The stirring speed at the time of the dropwise addition was 250 rpm. After completion of the dropwise addition, the reaction product was aged at a temperature of 80 to 85 ° C for 4 hours and then 100 g of ethylcarbitol acetate and 0.2 g of azobisisobutylonitrile were added thereto for 20 minutes The mixture was kept for 4 hours, and then 100 g of ethylcarbitol acetate was added. Viscosity and solid content were measured, and the reaction was stopped to prepare an acrylic copolymer I. The solid content of the copolymer was 42% and the weight average molecular weight was 3,5000.

Manufacturing example  2 -acrylic copolymer II

Acrylic copolymer II having a solid content of 42% and a weight average molecular weight of 3,5000 was prepared in the same manner as in Production Example 1, except that acrylic monomer (M-1) having silver (Ag) Respectively.

Example  And Comparative Example

Each component was mixed with the composition shown in Table 1 below to prepare a photosensitive resin composition. The specifications of each component used in Examples and Comparative Examples are as follows.

(A) conductive fine particles

(a1) Silver powder (4-8F, Dowa) having an average particle diameter of 1.5 to 2 占 퐉 was used.

(a2) An ITO powder (ITO Powder (Yellow), Nano New Material Co.) having an average particle diameter (D50) of 10 to 50 nm and a specific surface area of 30 m ² / g was used.

(B) an acrylic copolymer

(b1) The acrylic copolymer I prepared in Preparation Example 1 was used.

(b2) The acrylic copolymer II prepared in Preparation Example 2 was used.

(C) Photoinitiator : PBG-304 (Changzhou Tronly New Electronic Materials) was used.

(D) Photopolymerization monomer: TMPEOTA (soltech) was used.

(E) Solvent: Tecanol (soltech) was used.

(F) Additive: BYK3700 (BYK) was used.

Example 1 Example 2 Comparative Example 1 Comparative Example 2 (A) (a1) 68 75 68 75 (a2) One One One One (B) (b1) 26.2 19.2 - - (b2) - - 26.2 19.2 (b3) - - - - (C) 0.3 0.3 0.3 0.3 (D) 2 2 2 2 (E) 2 2 2 2 (F) 0.5 0.5 0.5 0.5

The properties of the photosensitive conductive paste composition prepared in Examples 1 to 2 and Comparative Examples 1 and 2 were measured by the following methods.

How to measure property

(1) Line resistance: The photosensitive conductive paste composition prepared in Examples 1 and 2 and Comparative Examples 1 and 2 was screen-printed on a PET film not coated with ITO, and then dried in an oven at 100 ° C for 10 minutes, , 20 탆, 30 탆. After exposure to UV light through a photomask in which the pattern was formed in a unit of 100 mu m, alkali development was performed, and curing was carried out in an oven at 140 DEG C for 60 minutes and after curing, the thickness was made 3.5 mu m. Resistance was measured for each line width

(2) Adhesion strength: The photosensitive conductive paste composition prepared in Examples 1 to 2 and Comparative Examples 1 and 2 was printed on an ITO-coated PET film (Nitto) and dried in a convection oven at 100 DEG C for 10 minutes, After curing at 40 mW and 20 sec in a halide lamp, it is developed with 0.2 wt% sodium carbonate solution and cured at 140 ° C. for 1 hour. After that, a coating layer having a thickness of 3.5 to 4.5 μm is obtained and 100 intervals are formed at intervals of 1 mm. The folded portion of the specimen was turned 180 ° to remove about 25 mm after 30 minutes had elapsed from the pressing, and after the test piece was peeled off about 25 mm, The lower side was fixed and evaluated, and the adhesive strength was confirmed by counting the number of lost areas in 100 sections.

Example 1 Example 2 Comparative Example 1 Comparative Example 2 Line resistance Line width (탆) 10 20 30 100 10 20 30 100 10 20 30 100 10 20 30 100 Resistance (Ω) 80 40 20 10 110 60 30 15 500 200 70 30 700 400 100 45 Adhesion 100 95 100 95

As shown in Table 2, in the case of the compositions of Examples 1 and 2 using the acrylic copolymer of the present invention, it was found that the compositions of Comparative Examples 1 and 2 Resistance characteristic. Particularly, the increase in the resistance value in the fine line width is remarkably small.

Claims (11)

Conductive fine particles, an acrylic copolymer, a photopolymerizable monomer, a photopolymerization initiator, and a solvent,
Wherein the acrylic copolymer comprises a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2).
[Chemical Formula 1]

In Formula 1, R ₁ is hydrogen or a substituted or unsubstituted C1 to C20 alkyl group.
(2)

In Formula 2, R ₂ is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, W is a single bond or a C 1 to C 10 linear or branched alkylene group, X is a divalent organic group, Y Is a functional group represented by the following formula (4).
[Chemical Formula 4]

delete Conductive fine particles, an acrylic copolymer, a photopolymerizable monomer, a photopolymerization initiator, and a solvent,
Wherein the acrylic copolymer comprises a repeating unit represented by the following formula (1) and a repeating unit represented by the following formula (2).
[Chemical Formula 1]

In Formula 1, R ₁ is hydrogen or a substituted or unsubstituted C1 to C20 alkyl group.
(2)

In Formula 2, R ₂ is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group, W is a single bond or a C 1 to C 10 linear or branched alkylene group, X is a divalent organic group, Y Is a functional group represented by the following general formula (3).
(3)

In the above formula (3), A is a substituted or unsubstituted C1 to C20 alkylene, ether or ester group, n is an integer of 0 to 4, and m is an integer of 1 to 3.
The method according to claim 1 or 3,
In Formula 2, X is -NHC (= O) O-, -NHC (= O) - or -C (= O) O-.
The method according to claim 1 or 3,
Wherein the acrylic copolymer further comprises a repeating unit represented by the following formula (5).
[Chemical Formula 5]

Z represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an amine group, an amino group, a hydroxyl group, a carboxyl group, an ester group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkene Substituted or unsubstituted C 2 to C 20 alkynyl group, substituted or unsubstituted C 3 to C 20 cycloalkyl group, substituted or unsubstituted C 6 to C 20 aryl group, substituted or unsubstituted C 2 to C 20 heteroaryl group, A substituted C2 to C20 heterocyclic group or a combination thereof.
6. The method of claim 5,
The repeating unit represented by the formula (5) is preferably a repeating unit selected from the group consisting of alkyl (meth) acrylate, isobonyl (meth) acrylate, acrylomorpholine, hydroxy Is derived from at least one monomer selected from glycidyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, t-butyl methacrylate, vinyl chloride, vinyl acetate and acrylonitrile. Photosensitive conductive paste composition.
The method of claim 3,
Wherein the acrylic copolymer is represented by the following general formula (6).
[Chemical Formula 6]

In Formula 6,
W is a single bond or a C1 to C10 linear or branched alkylene group;
X is -NHC (= O) O-, -NHC (= O) - or -C (= O) O-;
Y is a functional group represented by the following formula (3);
(3)

(Wherein A represents a substituted or unsubstituted C1 to C20 alkylene group, an ether group or an ester group, n is an integer of 0 to 4, and m is an integer of 1 to 3)
R ₁ , R ₂ and R ₃ are each independently hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group;
R ₄ is a substituted or unsubstituted C 3 to C 20 cycloalkyl group, a substituted or unsubstituted C 6 to C 20 aryl group, a substituted or unsubstituted C 2 to C 20 heteroaryl group, or a substituted or unsubstituted C 2 to C 20 heterocyclic group ego;
Wherein a is 0.1 to 0.3, b is 0.01 to 0.1, c is 0.4 to 0.75, and d is 0.1 to 0.3.
The method of claim 3,
The acrylic copolymer is obtained by polymerizing a compound represented by the following general formula (7) and a compound represented by the following general formula (8) to synthesize an acrylic monomer having a vinyl group at its terminal and containing a silver atom, ≪ / RTI > by weight of the total weight of the composition.
(7)

Wherein A is a substituted or unsubstituted C1 to C20 alkylene group, an ether group or an ester group, B is a carboxyl group, a hydroxyl group, an amine group or an oxirane group, and k is an integer of 1 to 10 , N is an integer of 0 to 4, and m is an integer of 1 to 3
[Chemical Formula 8]

In Formula 8, C is hydrogen or a substituted or unsubstituted C1 to C10 alkyl group, D is a carboxyl group, a cyanate group or an epoxy group, and W is a single bond or a C1 to C10 linear or branched alkylene group , And o is an integer of 1 to 3.
The method according to claim 1 or 3,
Wherein the photosensitive conductive paste composition contains 65 to 70 wt% of conductive fine particles, 1 to 15 wt% of an acrylic copolymer, 1 to 10 wt% of the photopolymerizable monomer, and 0.1 to 5 wt% of light polymerization A photosensitive conductive paste composition comprising an initiator.
The method according to claim 1 or 3,
Wherein the photosensitive conductive paste composition further comprises a coupling agent, a surfactant, a dispersant, a leveling agent, or a combination thereof.
A touch screen panel manufactured using the photosensitive conductive paste composition of any one of claims 1 to 3.