KR101910471B1 - 전자부품 용기 - Google Patents
전자부품 용기 Download PDFInfo
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- KR101910471B1 KR101910471B1 KR1020180003817A KR20180003817A KR101910471B1 KR 101910471 B1 KR101910471 B1 KR 101910471B1 KR 1020180003817 A KR1020180003817 A KR 1020180003817A KR 20180003817 A KR20180003817 A KR 20180003817A KR 101910471 B1 KR101910471 B1 KR 101910471B1
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- base layer
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- 229920005989 resin Polymers 0.000 claims abstract description 32
- 239000011347 resin Substances 0.000 claims abstract description 32
- 239000002904 solvent Substances 0.000 claims abstract description 28
- 239000010419 fine particle Substances 0.000 claims abstract description 24
- 239000003960 organic solvent Substances 0.000 claims abstract description 24
- 239000004020 conductor Substances 0.000 claims description 19
- 229920001940 conductive polymer Polymers 0.000 claims description 18
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 16
- 229920001467 poly(styrenesulfonates) Polymers 0.000 claims description 16
- 229960002796 polystyrene sulfonate Drugs 0.000 claims description 16
- 239000011970 polystyrene sulfonate Substances 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 239000004744 fabric Substances 0.000 claims description 6
- 239000005977 Ethylene Substances 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 239000002041 carbon nanotube Substances 0.000 claims description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 5
- 238000007598 dipping method Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 229920000767 polyaniline Polymers 0.000 claims description 4
- 238000007761 roller coating Methods 0.000 claims description 4
- 238000000465 moulding Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 2
- 230000005611 electricity Effects 0.000 abstract description 11
- 230000003068 static effect Effects 0.000 abstract description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- -1 polyethylene Polymers 0.000 description 22
- 239000004698 Polyethylene Substances 0.000 description 14
- 239000004743 Polypropylene Substances 0.000 description 14
- 229920000573 polyethylene Polymers 0.000 description 14
- 229920001155 polypropylene Polymers 0.000 description 14
- 229920000139 polyethylene terephthalate Polymers 0.000 description 13
- 239000005020 polyethylene terephthalate Substances 0.000 description 13
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 12
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 12
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000004800 polyvinyl chloride Substances 0.000 description 9
- 229920003002 synthetic resin Polymers 0.000 description 9
- 239000000057 synthetic resin Substances 0.000 description 9
- 239000004417 polycarbonate Substances 0.000 description 7
- 229920000515 polycarbonate Polymers 0.000 description 7
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 5
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 5
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229960001760 dimethyl sulfoxide Drugs 0.000 description 5
- 229960002415 trichloroethylene Drugs 0.000 description 5
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- 229940022682 acetone Drugs 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000915 polyvinyl chloride Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Natural products CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical group CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67333—Trays for chips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67356—Closed carriers specially adapted for containing chips, dies or ICs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laminated Bodies (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
도 2는 도 1을 A-A 선으로 절단한 단면도.
도 3 및 도 4는 전자부품 용기의 절단면을 현미경으로 촬영한 사진.
도 5a 내지 도 5d는 본 발명에 따른 전자부품 용기의 제조 공정도.
15 : 제 2 제전층 17 : 도전층
19 : 수용홈 21 : 버(burr)
Claims (7)
- 베이스층과,
상기 베이스층 상부 및 하부 표면에 각각 형성된 제 1 및 제 2 제전층과,
상기 베이스층과 제 1 및 제 2 제전층이 매트릭스 형상으로 M × N(M 및 N은 자연수)개가 배열되게 성형되어 형성된 수용홈과,
상기 베이스층의 측면에 상기 제 1 및 제 2 제전층을 전기적으로 연결하면서 상기 베이스층의 절단시 상기 측면에 발생되어 있는 버(burr)와 미세 입자들이 용해되어 제거되거나 또는 매몰되어 외부에 노출되지 않게 전도성 고분자가 혼합된 유기용제가 자동 또는 수동에 의한 침지법, 롤러 코팅법 또는 스프레이법이나, 또는, 천, 스펀지(sponge) 또는 붓(brush)으로 도포되어 형성된 도전층을 포함하는 전자부품 용기.
- 청구항 1에 있어서 상기 베이스층이 용제성 수지 또는 내용제성 수지로 형성된 전자부품 용기.
- 청구항 1에 있어서 상기 베이스층이 0.5 ∼ 3㎜의 두께로 형성된 전자부품 용기.
- 청구항 1에 있어서 상기 제 1 및 제 2 제전층과 상기 도전층이 전도성 물질 또는 도전성 금속이 포함된 용제성 수지 또는 내용제성 수지로 형성된 전자부품 용기.
- 청구항 4에 있어서 상기 전도성 물질이 탄소 나노 튜브 또는 전도성 탄소를 포함하는 전자부품 용기.
- 청구항 1에 있어서 상기 제 1 및 제 2 제전층과 도전층이 피닷(PEDOT : 3,4-Ethylene Di Oxy Thiophene), PSS(Poly Stylene Sulfonate), 피롤(Pyrrole) 및 폴리아닐린(Poly Aniline)의 전도성 고분자 중 어느 하나로 형성된 전자부품 용기.
- 청구항 1에 있어서 상기 제 1 및 제 2 제전층이 0.05 ∼ 0.3㎜ 정도의 두께로 형성된 전자부품 용기.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180003817A KR101910471B1 (ko) | 2018-01-11 | 2018-01-11 | 전자부품 용기 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020180003817A KR101910471B1 (ko) | 2018-01-11 | 2018-01-11 | 전자부품 용기 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020170023538A Division KR101843982B1 (ko) | 2017-02-22 | 2017-02-22 | 전자부품 용기 및 그의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20180097127A KR20180097127A (ko) | 2018-08-30 |
KR101910471B1 true KR101910471B1 (ko) | 2018-10-22 |
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Family Applications (1)
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KR1020180003817A KR101910471B1 (ko) | 2018-01-11 | 2018-01-11 | 전자부품 용기 |
Country Status (1)
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KR (1) | KR101910471B1 (ko) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100196633B1 (ko) | 1995-04-18 | 1999-06-15 | 이사오 우치가사키 | 정전기 보호장치 및 그의 제조방법 |
JP5638182B2 (ja) * | 2007-11-27 | 2014-12-10 | 株式会社レグルス | 電子部品の収納容器 |
-
2018
- 2018-01-11 KR KR1020180003817A patent/KR101910471B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100196633B1 (ko) | 1995-04-18 | 1999-06-15 | 이사오 우치가사키 | 정전기 보호장치 및 그의 제조방법 |
JP5638182B2 (ja) * | 2007-11-27 | 2014-12-10 | 株式会社レグルス | 電子部品の収納容器 |
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Publication number | Publication date |
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KR20180097127A (ko) | 2018-08-30 |
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