KR101787009B1 - Substrate Coating Apparatus - Google Patents

Substrate Coating Apparatus Download PDF

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Publication number
KR101787009B1
KR101787009B1 KR1020150096664A KR20150096664A KR101787009B1 KR 101787009 B1 KR101787009 B1 KR 101787009B1 KR 1020150096664 A KR1020150096664 A KR 1020150096664A KR 20150096664 A KR20150096664 A KR 20150096664A KR 101787009 B1 KR101787009 B1 KR 101787009B1
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KR
South Korea
Prior art keywords
negative pressure
slit nozzle
discharge port
substrate
suction
Prior art date
Application number
KR1020150096664A
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Korean (ko)
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KR20170006154A (en
Inventor
조강일
Original Assignee
주식회사 케이씨텍
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Priority to KR1020150096664A priority Critical patent/KR101787009B1/en
Priority to CN201521034371.8U priority patent/CN205518423U/en
Publication of KR20170006154A publication Critical patent/KR20170006154A/en
Application granted granted Critical
Publication of KR101787009B1 publication Critical patent/KR101787009B1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

Abstract

A substrate coating apparatus is disclosed. The substrate coating apparatus according to the present invention includes a slit-shaped slit nozzle for discharging a chemical solution onto which a chemical solution is applied, and a negative pressure module provided in front of a rib of the slit nozzle based on the coating direction. The negative pressure module forms a negative pressure space in front of the discharge port of the slit nozzle so that the chemical liquid discharged from the discharge port of the slit nozzle is pulled toward the discharge port forward to form a half moon shape below the discharge port to perform smooth coating. The negative pressure module includes a suction portion having an upper portion closed and a lower portion forming an internal space portion opened toward the negative pressure space, and a suction pump connected to an outlet formed at the upper portion of the suction portion. The suction pump sucks air in the negative pressure space to form a negative pressure.

Description

[0001] Substrate Coating Apparatus [0002]

The present invention relates to a substrate coating apparatus, and more particularly, to a substrate coating apparatus in which a negative pressure is formed in front of a discharge port of a slit nozzle to cause a chemical liquid discharged from a slit nozzle to be discharged in a half- .

A coating apparatus for uniformly coating a chemical liquid on a flat substrate with a uniform thickness can be used in various fields, and a coating process for coating a photosensitive resin on the surface of a glass substrate for manufacturing a flat panel display such as an LCD is also one of them.

A slit coating method using a slit nozzle in a chemical coating method has been widely used as a display substrate becomes larger in size. In the slit coating method, a slit nozzle having a length corresponding to the width of a substrate to be processed is transferred along a substrate while spraying a chemical solution through a nozzle.

1, a substrate coating apparatus 100 is configured such that a substrate G is fixed to a substrate stage 102, and a slit nozzle 110 having a width of the substrate G is conveyed by a conveying means 120 And the chemical liquid is applied while being transferred along the substrate (G). The chemical liquid is supplied to the slit nozzle 110 through the slit nozzle 110 by the chemical liquid supply unit 112 approximately once for the amount to be used for the coating process, When the coater apparatus 100 applies a chemical solution, that is, a photosensitive resin (PR: Photoresist) on the substrate G, the substrate G is transferred to a drying process and dried.

The thickness of the chemical liquid to be coated on the substrate G is related to the viscosity of the chemical liquid, the coating speed and the coating gap, so that the viscosity and discharge speed of the chemical liquid corresponding to the required coating thickness must be matched.

For example, as shown in FIG. 2 (X), the chemical liquid m discharged from the slit nozzle 110 is transferred to the front side of the rib 110a of the slit nozzle 110, The speed of coating of the slit nozzle 110 may be appropriately adjusted so that the coating can be properly performed.

However, if the amount of the chemical liquid m discharged through the slit nozzle 110 is small or the coating speed is too high as shown in FIG. 2B, the chemical liquid m discharged from the slit nozzle 110 flows into the slit nozzle 110, and is drawn by the progress of the slit nozzle 110, the coating gap is not properly filled and the coating is not properly performed. On the other hand, if the discharge amount is too large, the coating is not properly performed.

In recent years, as the demand for thin film coatings increases, it becomes more and more difficult to meet such coating conditions when thinner coatings must be performed.

[Related Technical Literature]

Basically, it is difficult to find similar inventions.

1. Korean Patent Laid-Open No. 10-2015-0039901 (published April 14, 2014)

The present invention discloses a method for forming a suction flow path for sucking a chemical solution at both ends of a slit nozzle. The chemical liquid discharged from the discharge port is sucked through the suction passage so that the chemical liquid is applied only to the chemical liquid application region Thereby preventing unnecessary application of the chemical liquid and enabling a uniform coating on the whole.

It is an object of the present invention to provide a substrate coating apparatus in which a negative pressure is formed in front of a discharge port of a slit nozzle on the basis of a coating advancing direction to cause a chemical liquid discharged from a slit nozzle to be discharged in a half- have.

According to an aspect of the present invention, there is provided a substrate coating apparatus including: a slit-shaped slit nozzle for discharging a chemical solution to be coated with a chemical solution; a slit-shaped slit nozzle provided on a front side of the slit nozzle, And a negative pressure module. The negative pressure module disposed separately from the slit nozzle forms a negative pressure space in front of the discharge port of the slit nozzle so that the chemical liquid discharged from the discharge port of the slit nozzle is pulled to be discharged in a state of being frontward of the discharge port to form a half- do. Therefore, the slit nozzle need not have a dual slit shape. The negative pressure space is formed to surround the front of the lip of the slit nozzle so as to have a larger clearance than the discharge port formed in the slit nozzle. Since the negative pressure space is formed to have a larger space than the discharge port, there is no danger that the negative pressure build-up is obstructed or any intake port or the like for forming a negative pressure is blocked, so that negative pressure can be smoothly formed in the negative pressure space And the chemical liquid discharged from the entire area of the slit-shaped discharge port can be pulled uniformly toward the front side of the discharge port by the pressure difference between the negative pressure space and the discharge port, so that the coating quality of the chemical liquid can be improved.

According to an embodiment, the negative pressure module includes a suction portion forming an internal space portion opened toward the negative pressure space, and a suction pump connected to a discharge port formed in the upper portion of the suction portion, and is fixed to a side surface of the slit nozzle. The suction pump sucks air in the negative pressure space to form a negative pressure.

According to another embodiment, the lower surface of the suction portion may be formed at a height lower than a coating gap height between the slit nozzle and the substrate, and is preferably located at a height of 20 to 300 mu m from the substrate.

According to an embodiment, the internal space of the suction unit may have a flat panel shape arranged in parallel with the substrate, or may be opened obliquely toward the discharge port. Preferably, the discharge port of the suction unit is provided on the upper front side of the inner space to provide a uniform negative pressure in front of the discharge port.

The slit nozzle may be provided with a flat negative pressure resistance portion capable of preventing the chemical liquid discharged from the discharge port of the slit nozzle from being sucked into the negative pressure module by the negative pressure by the negative pressure module. The resistance portion preferably has a width of 1 mm or more.

According to the embodiment of the negative pressure module, the substrate coating apparatus of the present invention further includes a transport module for transporting and supporting the slit nozzle. Wherein the transfer module comprises a pair of gantries disposed on both sides of a substrate plate for supporting the substrate and a bridge disposed across the substrate plate and each end connected to the gantry to support the slit nozzle, And a bridged bar.

In this case, the negative pressure module is supported on the bridge bar and disposed in front of the slit nozzle. The negative pressure module includes a body portion connected to the bridge bar, a suction channel formed to penetrate the body portion and having an end opened toward the negative pressure space, and a suction portion that sucks air through the suction passage to form a negative pressure in the negative pressure space, Pump. According to an embodiment of the present invention, the suction passage may be opened with its tip end inclined toward the discharge port.

The substrate coating apparatus of the present invention forms a negative pressure in front of the slit nozzle discharge port by arranging the negative pressure module on the front end of the slit nozzle based on the coating advancing direction so that the chemical liquid discharged from the slit nozzle forms a meniscus shape toward the front of the discharge port . As is known, when the chemical liquid discharged from the slit nozzle forms an appropriate half-moon shape at the front end of the slit nozzle, a coating at a higher speed becomes possible, thinner thin film coating becomes possible without defect, and coating gap can be kept large.

Since the negative pressure module forming the negative pressure is provided to have a considerable size as compared with the discharge port of the slit nozzle, there is no risk that the negative pressure build-up is obstructed by the chemical liquid or any intake port for forming negative pressure is blocked.

Further, since the negative pressure module is disposed in front of the slit nozzle, the present invention can protect the nozzle from accidental impact or foreign matter on the substrate, which may be caused by an operation error during movement of the slit nozzle.

1 is a perspective view illustrating a substrate coating apparatus having a conventional foreign substance sensing apparatus,
FIG. 2 is a side cross-sectional view showing the chemical solution application process of the slit coater of FIG. 1,
3 is a schematic illustration of a substrate coating apparatus according to an embodiment of the present invention,
Fig. 4 is a cross-sectional view cut along the line AA in Fig. 3,
Figure 5 is a perspective view of the negative pressure module according to one embodiment of Figure 3,
6 is a schematic view of a substrate coating apparatus according to another embodiment of the present invention,
Figure 7 is a cross-sectional view of an embodiment of the negative pressure module of Figure 6, and
8 is a cross-sectional view showing another embodiment of the negative pressure module of FIG.
BRIEF DESCRIPTION OF THE DRAWINGS Fig.
102: substrate stage 110: slit nozzle
110a: Lip of slit nozzle 110b: Outlet of slit nozzle
110c: negative pressure resistance section 112: chemical liquid supply section
120: Feed module 121: Gantry
123: Bridged bar 125: Guide rail
310, 610: negative pressure module 311:
313: Outlet 315: Suction pump
710, 810: Body portion 711, 811:

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in more detail with reference to the drawings.

3 and 4, a substrate coating apparatus 300 according to the first embodiment of the present invention basically includes a substrate stage 102 on which a substrate G is fixed, A chemical solution supply unit 112 for supplying a chemical solution to the slit nozzle 110 and a slit nozzle 110 for transferring the slit nozzle 110 along the coating advancing direction X while supporting the slit nozzle 110 (Not shown).

The transfer module 120 includes a pair of gantries 121 provided on both sides of the substrate stage 102 and a pair of gantries 121 interconnecting the upper portions of the pair of gantries 121, A pair of guide rails 125 arranged on both sides of the substrate stage 102 in parallel in the coating advancing direction X to guide the movement of the gantry 121, Hour). The gantry drive unit can reciprocate the gantry 121 along the guide rail 125 in a magnetic levitation manner, for example.

The present invention is not limited to the case where the slit nozzle 110 is horizontally transported on the fixed substrate G, The same applies to the case where the substrate G is transported below the fixed slit nozzle 110. [ For example, according to the coating apparatus, a separate substrate holding means can grip the substrate G and transport it under the slit nozzle 110. [ In this case, the transfer module 120 serves to transfer the slit nozzle 110 for cleaning or the like, and the slit nozzle 110 during coating is fixedly supported without being transferred.

The basic operation except for the operation of the negative pressure module 310 described below is the same as that of the prior art. In other words, while the substrate G is fixed to the substrate stage 102, the slit nozzle 110 having the width of the substrate G is transported along the substrate G by the transport module 120, 110b on the substrate (G). The chemical liquid is supplied to the slit nozzle 110 through the slit nozzle 110 by the chemical liquid supply unit 112 approximately once for the amount to be used for the coating process, When the substrate coating apparatus 300 applies the chemical liquid on the substrate G, the substrate G is transferred to the next process. As described above, the coating can be performed while the substrate G is transported horizontally under the slit nozzle 110 by a separate holding means.

At this time, it is necessary that the chemical liquid discharged from the discharge port 110b of the slit nozzle 110 protrudes ahead of the discharge port 110b with respect to the coating advancing direction X to maintain the shape of the half-moon. The substrate coating apparatus 300 of the present invention further includes a negative pressure module 310 spaced apart from the substrate G in front of the lip 110a of the slit nozzle 110 based on the coating progression direction X do. The negative pressure module 310 is fixed to the front of the slit nozzle 110 during coating to form a negative pressure space 310a in front of the discharge port 110b of the slit nozzle 110. [

3 through 5, the negative pressure module 310 may be positioned on the side of the slit nozzle 110 in such a manner that the negative pressure module 310 is positioned in front of the lip 110a of the slit nozzle 110 during the coating process. And can be transported together with the slit nozzle 110 during coating. Alternatively, as shown in FIG. 6, the negative pressure module 610 may be directly supported on the bridge deck 123, not the slit nozzle 110, and fixed in front of the lip 110a of the slit nozzle 110. [

The negative pressure module forms an inner space portion whose lower surface is opened toward the negative pressure space, and makes the inner space portion vacuum, thereby forming a negative pressure in the negative pressure space. Examples of negative pressure modules can be designed in various ways.

3 to 5, the negative pressure module 310 is attached to the side surface of the slit nozzle 110 in a container shape whose lower surface is open toward the negative pressure space and has an inner space portion whose lower surface is opened toward the negative pressure space And a suction pump 315 connected with a discharge port 313 formed at the upper portion of the suction portion 311 and a hose or the like. The suction pump 315 sucks air in the negative pressure space 310a including the inner space through the discharge port 313 to form a negative pressure in the negative pressure space 310a.

Since the inner space portion of the suction portion 311 is spaced from the substrate G and the lower surface of the inner space portion is opened toward the substrate G, the negative pressure space 310a in the inner space portion is not completely vacuumed. Since the negative pressure in the negative pressure space 310a is for pulling the chemical solution discharged from the slit nozzle 110 in the coating advancing direction, the negative pressure of the negative pressure space 310a is discharged to the discharging port of the slit nozzle 110 110b) It is important to keep the negative pressure in the front.

Accordingly, the inner space of the suction unit 311 has a relatively wide flat panel shape parallel to the substrate G and extending in the coating direction, thereby forming a negative pressure space 310a on a relatively large surface on the substrate G . The discharge port 313 of the suction portion 311 is disposed on the opposite side of the discharge port 110b of the slit nozzle 110, that is, on the upper front side of the internal space portion of the suction portion 311, Lt; RTI ID = 0.0 > of < / RTI > In addition, designing the partition walls forming the suction portion 311 to have a considerable width is a method of minimizing the loss of negative pressure due to the space between the boards G.

The height of the lower surface of the suction unit 311 with respect to the upper surface of the substrate G is determined in consideration of a coating gap that is a height between the discharge port 110b of the slit nozzle 110 and the substrate G Preferably about 20 to 300 mu m, and preferably 50 to 150 mu m.

The lower surface of the suction portion 311 is not necessarily parallel to the substrate G and is designed to be inclined so as to be lower toward the front farthest from the slit nozzle 110 so that the inner space portion is directed toward the discharge port 110b of the slit nozzle 110 It can be inclined. The height of the inner space of the suction part 311 and the area of the lower surface of the slit nozzle 110 are desirably designed to be as low as possible within a range that does not invade the range of motion of the cleaning means for cleaning the lip 110a of the slit nozzle 110.

When the suction pump 315 operates to start sucking air in the inner space of the suction unit 311, a negative pressure is formed in the negative pressure space 310a. Since the negative pressure space 310a is formed in front of the discharge port 110b of the slit nozzle 110, the chemical liquid discharged from the discharge port 110b of the slit nozzle 110 for coating is discharged by the negative pressure formed in the negative pressure space 310a It receives the tension and protrudes in the shape of the meniscus.

On the other hand, the negative pressure resistance portion 110c is preferably formed at the end of the slit nozzle lip 110a. The negative pressure resistance part 110c prevents the chemical liquid discharged from the discharge port 110b of the slit nozzle 110 from being sucked into the internal space of the negative pressure module 310 by the negative pressure formed in the negative pressure space 310a. The width d of the negative pressure resistance portion 110C may be varied depending on the strength of the negative pressure. However, if the width d is less than 1 mm, the chemical solution may be sucked into the negative pressure module 310 regardless of the negative pressure. , And the width d of the negative pressure resistance portion 110C is preferably about 1 mm or more.

<Other Embodiments>

As described above, the negative pressure module 310 is directly supported by the bridge deck 123, not the slit nozzle 110, as shown in Figs. 6 to 8, and is fixed to the front of the lip 110a of the slit nozzle 110 .

7 includes a body portion 710 connected to the bridge deck 123 and a suction passage 711 formed through the body portion 710 and having an end opened toward the negative pressure space, (711) is connected to an external suction pump (315).

The negative pressure module of FIG. 8 includes a body portion 810 connected to the bridge deck 123, a suction passage 811 formed through the body portion 810 and opened at an end inclined toward the discharge port 110b, And the suction passage 811 is connected to an external suction pump 315. [

Compared to the prior art, the negative pressure module 310 allows the coating to proceed at a faster coating rate to a lower drug solution viscosity state. Naturally, compared with the prior art, thin film coating can also be performed more effectively.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the scope of the invention as defined by the appended claims. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention.

Claims (14)

A slit-shaped slit nozzle for discharging a chemical solution onto which a chemical solution is applied;
And a negative pressure space is formed in front of the discharge port of the slit nozzle so that the chemical liquid discharged from the slit nozzle is discharged toward the front side with respect to the discharge port, Negative pressure module;
A pair of gantries provided on both sides of the substrate plate supporting the substrate; And
And a transfer module disposed across the substrate plate and each end connected to the gantry, the transfer module having a bridged bar for supporting the slit nozzle to transfer and support the slit nozzle,
Wherein the negative pressure module is disposed in front of the slit nozzle supported by the bridged bar,
Wherein the negative pressure space is formed to surround the front of the lip of the slit nozzle so as to have a larger clearance than the discharge port formed in the slit nozzle.
The method according to claim 1,
The negative pressure module includes:
A suction part forming an internal space part opened toward the negative pressure space; And
And a suction pump connected to a discharge port formed in the suction unit to suck air in the internal space to form a negative pressure in the negative pressure space.
3. The method of claim 2,
Wherein the inner space of the suction unit is in the form of a flat panel disposed parallel to the substrate.
3. The method of claim 2,
Wherein an inner space portion of the suction portion is opened obliquely toward the discharge port.
3. The method of claim 2,
Wherein a lower surface of the suction portion is formed at a level lower than a coating gap height between the slit nozzle and the substrate.
6. The method of claim 5,
Wherein the open lower surface of the suction portion is located 20 to 300 占 퐉 above the substrate.
3. The method of claim 2,
Wherein the discharge port of the suction portion is provided at a front upper side of the inner space portion to provide a uniform negative pressure in front of the discharge port.
The method according to claim 1,
Wherein a flat negative pressure resistance portion capable of preventing the chemical liquid discharged from the discharge port of the slit nozzle from being sucked into the negative pressure module by the negative pressure by the negative pressure module is formed in the lip end of the slit nozzle. .
9. The method of claim 8,
Wherein the negative pressure resistance portion has a width of 1 mm or more.
The method according to claim 1,
The negative pressure module
Wherein the slit nozzle is fixed to a side surface of the slit nozzle.
A slit-shaped slit nozzle for discharging a chemical solution onto which a chemical solution is applied;
And a negative pressure space is formed in front of the discharge port of the slit nozzle so that the chemical liquid discharged from the slit nozzle is discharged toward the front side with respect to the discharge port, Negative pressure module;
A pair of gantries provided on both sides of the substrate plate supporting the substrate; And
And a transfer module disposed across the substrate plate and each end connected to the gantry, the transfer module having a bridged bar for supporting the slit nozzle to transfer and support the slit nozzle,
Wherein the negative pressure module is supported on the bridged bar and disposed in front of the slit nozzle.
12. The method of claim 11,
The transfer module includes:
A pair of guide rails disposed on both sides of the substrate plate to guide movement of the gantry; And
Further comprising a gantry driving unit for reciprocating the gantry along the guide rail in a magnetic levitation manner.
12. The method of claim 11,
The negative pressure module includes:
A body coupled to the bridge bar;
A suction passage formed through the body portion and having an open end toward the negative pressure space; And
And a suction pump for sucking air through the suction passage to form a negative pressure in the negative pressure space.
14. The method of claim 13,
Wherein the suction passage is opened at an end thereof inclined toward the discharge port.
KR1020150096664A 2015-07-07 2015-07-07 Substrate Coating Apparatus KR101787009B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020150096664A KR101787009B1 (en) 2015-07-07 2015-07-07 Substrate Coating Apparatus
CN201521034371.8U CN205518423U (en) 2015-07-07 2015-12-14 Substrate coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150096664A KR101787009B1 (en) 2015-07-07 2015-07-07 Substrate Coating Apparatus

Related Child Applications (1)

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KR1020170088850A Division KR101857770B1 (en) 2017-07-13 2017-07-13 Substrate Coating Apparatus

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KR101787009B1 true KR101787009B1 (en) 2017-10-17

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100775122B1 (en) 2006-07-25 2007-11-08 엘지전자 주식회사 A dischange control structure and a coating apparatus using the same
KR101253499B1 (en) 2006-12-26 2013-04-11 주식회사 케이씨텍 Chemical application module and chemical application device thereof
KR101384948B1 (en) 2005-09-27 2014-04-11 히라따기꼬오 가부시키가이샤 Coating method and coating apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101384948B1 (en) 2005-09-27 2014-04-11 히라따기꼬오 가부시키가이샤 Coating method and coating apparatus
KR100775122B1 (en) 2006-07-25 2007-11-08 엘지전자 주식회사 A dischange control structure and a coating apparatus using the same
KR101253499B1 (en) 2006-12-26 2013-04-11 주식회사 케이씨텍 Chemical application module and chemical application device thereof

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CN205518423U (en) 2016-08-31

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