KR101750873B1 - Exposing method using maskless exposure apparatus and method of fabricating liquid crystal display using thereof - Google Patents

Abstract

An exposure method using a maskless exposure apparatus and a method of manufacturing a liquid crystal display using the same according to the present invention can selectively expose a plurality of digital micro-mirror devices (DMD) Thereby minimizing the error of the pattern by the stage driving and shortening the exposure tact time.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure method using a maskless exposure apparatus and a manufacturing method of a liquid crystal display apparatus using the maskless exposure apparatus.

The present invention relates to an exposure method and a method of manufacturing a liquid crystal display using the same, and more particularly, to an exposure method using a maskless exposure apparatus that does not use a photomask and a method of manufacturing a liquid crystal display using the method.

Recently, interest in information display has increased, and a demand for using portable information media has increased, and a light-weight flat panel display (FPD) that replaces a cathode ray tube (CRT) And research and commercialization are being carried out. Particularly, among such flat panel display devices, a liquid crystal display (LCD) is an apparatus for displaying an image using the optical anisotropy of a liquid crystal, and is excellent in resolution, color display and picture quality and is actively applied to a notebook or a desktop monitor have.

The liquid crystal display comprises a color filter substrate, an array substrate, and a liquid crystal layer formed between the color filter substrate and the array substrate.

An active matrix (AM) method, which is a driving method mainly used in the liquid crystal display, is a method of driving a liquid crystal of a pixel portion by using an amorphous silicon thin film transistor (a-Si TFT) to be.

Hereinafter, the structure of a typical liquid crystal display device will be described in detail with reference to FIG.

1 is an exploded perspective view schematically showing a general liquid crystal display device.

As shown in the figure, the liquid crystal display comprises a color filter substrate 5, an array substrate 10, and a liquid crystal layer (not shown) formed between the color filter substrate 5 and the array substrate 10 30).

The color filter substrate 5 includes a color filter C composed of a plurality of sub-color filters 7 implementing colors of red (R), green (G) and blue (B) A black matrix 6 for separating the sub-color filters 7 from each other and shielding light transmitted through the liquid crystal layer 30 and a transparent common electrode for applying a voltage to the liquid crystal layer 30 8).

The array substrate 10 includes a plurality of gate lines 16 and data lines 17 arranged vertically and horizontally to define a plurality of pixel regions P and a plurality of gate lines 16 and data lines 17 A thin film transistor T which is a switching element formed in the intersection region and a pixel electrode 18 formed on the pixel region P. [

The color filter substrate 5 and the array substrate 10 constructed as described above are adhered to each other by a sealant (not shown) formed on the periphery of the image display region to constitute a liquid crystal display device, 5 and the array substrate 10 are bonded together through a cemented key (not shown) formed on the color filter substrate 5 or the array substrate 10.

On the other hand, the color filter substrate and the array substrate are manufactured by allocating a plurality of color filter substrates and array substrates to a large-sized mother substrate, respectively. In other words, a plurality of panel regions are allocated to the mother substrate of a large area, and a thin film transistor and a color filter layer, which are driving elements, are formed in the panel region, so that the color filter substrate and the array substrate are manufactured.

At this time, the array substrate has a structure in which a thin film transistor, which is a switching device, is patterned in the form of a matrix in a panel region of a mother substrate, and the thin film transistor is generally formed by a photo, exposure and etching process using a photo mask Layer structure.

At this time, the exposure process proceeds by irradiating light onto a substrate coated with a photosensitive film through a separate photomask having a predetermined pattern formed thereon from an exposure apparatus. Due to the limit of the effective exposure region, Step movement, alignment and scan are essential.

FIGS. 2A to 2D are plan views sequentially showing a general exposure method using a mask, in which an exposure method in the case where an effective exposure area of a mask corresponds to four panel areas is shown as an example.

As shown in FIG. 2A, after loading the large-sized mother board 1 of six panel areas 10 into a stage (not shown) of an exposure apparatus, the stage is driven And is moved to the exposure position of the mask 20.

Thereafter, the loaded mother substrate 1 is aligned corresponding to the effective exposure area of the mask 20, and the primary exposure is performed by the scanning method.

Next, as shown in FIGS. 2B to 2D, by moving, aligning and exposing three times to a predetermined exposure position using the above-described method, the entire panel area 10 in the large- ) To complete the exposure process.

In the conventional exposure method using the mask, there is a limitation in the size of the mask and the optical system, and therefore, the movement, alignment, and scanning must be performed several times, thereby increasing the overall exposure time.

In addition, since accuracy is not ensured in driving the stage in various directions and there is an error in the alignment, a variation, i.e., an error, occurs in the pattern exposed through the mask due to the movement of the stage and the alignment several times.

An object of the present invention is to provide an exposure method using a maskless exposure apparatus capable of exposing a large-sized mother substrate without using a photomask and a manufacturing method of a liquid crystal display using the same. have.

It is another object of the present invention to provide an exposure method using a maskless exposure apparatus that selectively moves the stage in one direction while selectively controlling an effective exposure area in exposure using a maskless exposure apparatus and a liquid crystal display device using the same And a method of manufacturing the same.

Other objects and features of the present invention will be described in the following description of the invention and claims.

According to an aspect of the present invention, there is provided an exposure method using a maskless exposure apparatus including loading a substrate on which a first coating layer is formed on a stage, performing a single scan using a DMD Forming a first pattern on the substrate through the first exposure and then forming a second coated layer on the substrate by exposing the entire surface of the substrate to light by exposure; (2) exposing the substrate by a plurality of times of scanning exposure (second exposure) by selectively separating the DMD array into a plurality of exposure areas according to an effective exposure area, And forming the second electrode layer.

In this case, the first coating layer and the second coating layer are formed of photoresist.

The first coating layer is formed on a first thin film for forming a first pattern and the second coating layer is formed on a second thin film for forming a second pattern.

The DMD is characterized in that a plurality of DMDs are arranged in two rows to scan-expose the entire surface of the substrate.

In this case, the columns of the DMDs are alternately arranged.

When the effective exposure area corresponds to half of the substrate during the second exposure, the DMD is divided into two exposure areas of the first and second exposure areas.

At this time, the DMD of the first exposure region is selectively turned on, and the stage on which the substrate is loaded is moved in one direction to scan-expose the A region of the substrate.

In this case, the DMD of the first exposure region is turned off and the DMD of the second exposure region is selectively turned on, and the stage on which the substrate is loaded is moved in another direction to scan and expose the B region of the substrate .

The method of manufacturing a liquid crystal display of the present invention includes the steps of providing a first mother substrate on which a plurality of color filter substrates are arranged and a second mother substrate on which a plurality of array substrates are arranged, A color filter process is performed on the plurality of color filter substrates using a maskless exposure apparatus, and an array process is performed on the plurality of array substrates, and the color filter process and the array process 1. A method for manufacturing a liquid crystal display device, comprising the steps of: forming an alignment film on a surface of a mother substrate and a mother substrate; advancing a rubbing process on the alignment film; bonding the first mother substrate and the second mother substrate, Forming a display panel, cutting the first mother substrate and the second mother substrate to separate them into a plurality of unit liquid crystal display panels It can comprise the steps:
At this time, the color filter process and the array process form a first pattern by exposing the entire surface of the first and second mother substrates with a single scan exposure using the DMD, The DMD array is divided into a plurality of exposure areas according to the effective exposure area in consideration of the alignment margin with respect to the layer and is selectively turned on to scan and expose the first and second mother substrate plates a plurality of times .

If 3x2 panel areas are defined on the first and second mother substrate, the DMD is divided into three exposure areas, DMD of the first exposure area and DMD of the second exposure area, And the DMD of the third exposure region is selectively turned on to perform the scan exposure three times.

When 2x2 panel areas are defined on the first and second mother substrate, the DMD is divided into two exposure areas, DMD of the first exposure area and DMD of the second exposure area are selectively And the second scan exposure is performed.

As described above, the exposure method using the maskless exposure apparatus and the method of manufacturing the liquid crystal display using the maskless exposure apparatus according to the present invention can control the effective exposure area of the maskless exposure apparatus by selectively turning on / off a plurality of DMDs, It is possible to minimize the error of the pattern by the driving and shorten the exposure tack time.

1 is an exploded perspective view schematically showing a general liquid crystal display device.
2A to 2D are plan views sequentially showing a general exposure method using a mask.
3 is a cross-sectional view schematically showing an optical system of a maskless exposure apparatus according to an embodiment of the present invention.
4 is a perspective view schematically showing a maskless exposure apparatus according to an embodiment of the present invention.
FIG. 5 is a partially enlarged view schematically showing a configuration of a DMD in the maskless exposure apparatus shown in FIG. 3; FIG.
6A and 6B are perspective views for explaining the operation of the DMD shown in FIG. 5; FIG.
7A to 7C are plan views sequentially showing an exposure method according to an embodiment of the present invention.
8A and 8B are plan views showing, for example, a second exposure by control of an effective exposure area in the exposure method according to the embodiment of the present invention.
9 is a flow chart sequentially showing a method of manufacturing a liquid crystal display device according to an embodiment of the present invention.
10 is a flowchart sequentially illustrating a method of manufacturing a liquid crystal display device according to another embodiment of the present invention.

Hereinafter, preferred embodiments of an exposure method using a maskless exposure apparatus and a method of manufacturing a liquid crystal display using the same according to the present invention will be described in detail with reference to the accompanying drawings.

The present invention relates to a maskless exposure apparatus which does not use a photomask. In the maskless exposure apparatus, an electronic device is used to transfer a light beam onto a substrate according to pattern information made of an electrical signal.

At this time, a digital micro-mirror device (DMD) is a typical example of the electronic device. The DMD uses a principle in which a large number of micromirrors transmit light incident at a desired angle with a predetermined angle and transmit the other light at different angles, thereby making a single screen using only the necessary light.

3 is a cross-sectional view schematically showing an optical system of a maskless exposure apparatus according to an embodiment of the present invention.

4 is a perspective view schematically showing a maskless exposure apparatus according to an embodiment of the present invention.

3 and 4, the maskless exposure apparatus 130 according to the embodiment of the present invention includes a substrate 136 for supporting a substrate 101 as a workpiece on a base 136, . The base 136 is in the form of a thick flat plate and is supported by four base support units 134.

At this time, a thin coating layer (not shown) such as photoresist is formed on the surface of the substrate 101.

More specifically, on the upper surface of the base 136, at least two Y-direction drive guides 132 extending along the moving direction of the stage 135, for example, the Y-axis direction, are provided. A Y-direction driving stage 135 is provided on the Y-direction driving guide 132 to move along the Y-direction driving guide 132. The substrate 101 is rotated on the Y- Direction driving stage 138 for correcting it by driving in the? -Axis direction can be provided.

At this time, the substrate supporting stage 137 is positioned on the θ-direction driving stage 138, and between the θ-direction driving stage 138 and the substrate supporting stage 137, A pin unit (not shown) to be used may be provided.

A DMD array fixing block 133 is disposed above the base 136 so as to extend over the movement path of the stage 135. At this time, for example, both sides of the DMD array fixing block 133 may be fixed to both sides of the base 136. The DMD array fixing block 133 is provided on its front surface or rear surface with a DMD 131 for irradiating light radiated from the DMD unit 150, which will be described later, by a scanning method.

The DMD unit 150 receives the light from the optical unit 140 and emits the light to the substrate 101. The DMD unit 150 is disposed on the stage 135, Respectively.

At this time, the optical unit 140 is provided with a light source 141 for providing light for performing exposure. As the light source 141, a laser diode may be used. The light emitted from the light source 141 is uniformly distributed through the fly-eye lens 142. At this time, a rod lens or a hollow lens may be used instead of the fly-eye lens 142.

The light passing through the fly-eye lens 142 is reflected by the guide mirror 145 to change its path, and the light reflected by the guide mirror 145 is transmitted to the DMD unit 150.

The DMD unit 150 selectively irradiates the light received from the optical unit 140 onto the substrate 101.

At this time, the DMD unit 150 is provided with a DMD 155 for selectively reflecting light without using a separate mask. The DMD 155 is arranged so that a plurality of small unit mirrors can adjust the angle, and reflects light while changing the angle of each unit mirror.

The light transmitted from the optical unit 140 is reflected by the guide mirror 156 provided in the DMD unit 150 and transmitted to the DMD 155, And selectively reflects light according to the pattern information input through the mirror.

The light reflected by the DMD 155 passes through a projection lens 157 provided at a lower portion of the DMD 155, and the size of the light is reduced or enlarged. The light passing through the projection lens 157 is irradiated to the substrate 101.

Each DMD unit 150 is provided with a DMD adjusting unit 165 for adjusting the position of the DMD 155. Although not shown, the DMD adjusting device 165 may include an X-axis micrometer and a Y-axis micrometer, and the DMD 155 may be provided by the X-axis micrometer and the Y- The X-axis movement and the Y-axis movement of the wafer W are controlled.

The DMD unit 150 is connected to the pattern information transmitting unit 160. The pattern information transmitting unit 160 transmits pattern information to be formed on the substrate 101 to the DMD 155 and the DMD 155 transmits the pattern information inputted from the pattern information transmitting unit 160 So that a desired pattern is formed on the substrate 101 by correspondingly reflecting light.

FIG. 5 is a partial enlarged view schematically showing the configuration of the DME in the maskless exposure apparatus shown in FIG. 3. FIG. 6A and FIG. 6B are perspective views for explaining the operation of the DME shown in FIG. to be.

5, the DMD 155 includes a plurality of (for example, 1024 × 768) micromirrors 155b forming respective pixels on a static RAM cell 155a in a lattice shape It is an arrayed mirror device.

In each pixel, a rectangular micromirror 155b supported by a post is provided at the uppermost portion. Further, a high reflectance material such as aluminum is deposited on the surface of the micromirror 155b. The reflectance of the micromirror 155b is 90% or more.

The arrangement pitch is, for example, 13.7 占 퐉 in both the vertical direction and the horizontal direction. In addition, a CMOS (Complementary Metal Oxide Semiconductor) static RAM cell 155a manufactured in a general semiconductor memory manufacturing line is arranged under the micromirror 155b through a support post made of a hinge and a yoke, May have a monolithic structure.

When a digital signal is recorded in the static RAM cell 155a of the DMD 155, the micro mirror 155b supported by the support post is inclined with respect to the diagonal line. The micromirror 155b is inclined at +/- alpha degrees (e.g., +/- 12 degrees) with respect to the substrate on which the DMD 155 is located.

6A shows the ON state of the micromirror 155b inclined at +? 6B shows the OFF state of the micromirror 155b, which is inclined at -α to the micro mirror 155b.

The inclination angle of the micromirror 155b in each pixel of the DMD 155 is controlled based on the image signal as shown in Fig. Therefore, the laser beam B incident on the DMD 155 is reflected in the oblique direction of each micromirror 155b.

In the maskless exposure apparatus according to the embodiment of the present invention having such a structure, the area of the DMD itself is narrow, while the area of the substrate (for example, mother substrate for a liquid crystal display) is gradually increased, Can not be performed.

Therefore, in exposure of a single substrate, a DMD array composed of a plurality of DMDs is used. And light emitted from the DMD is scanned while relatively moving along the surface of the substrate to perform exposure. In practice, the substrate moves at a constant speed, and light is exposed while moving along the surface of the substrate.

At this time, in order to expose the entire substrate using the DMD, it is said that the light is irradiated while moving the DMD along the surface of the substrate.

7A to 7C are plan views schematically showing an exposure method according to an embodiment of the present invention.

First, as shown in FIG. 7A, a predetermined substrate 101 on which a thin coating layer (not shown) such as a photoresist is formed is loaded on a stage 135 of a maskless exposure apparatus according to an embodiment of the present invention . Here, the stage 135 may be a Y-direction driving stage 135 that moves in the Y-axis direction along the Y-direction driving guide, and the Y- The driving stage and the substrate supporting stage can be positioned.

Thereafter, the loaded substrate 101 is aligned corresponding to the effective exposure region, and the primary exposure is performed by the scanning method.

As described above, the stage 135 is moved in the Y-axis direction by advancing and retreating the stage 135 by two Y-direction drive guides 132 installed on the upper surface of the base 136 And the substrate 101 loaded on the stage 135 is moved.

The substrate 101 may be, for example, a large-sized mother substrate for a liquid crystal display, and the coating layer is formed on a thin film (not shown) for forming a predetermined pattern.

The DMD 131 used in the exposure method according to the embodiment of the present invention includes a plurality of DMDs 155 arranged in two rows and the entire surface of the substrate 101 loaded on the stage 135 The regions of the DMDs 155 are arranged in a staggered arrangement so that the region scanned and exposed by the DMD 131 may have a substantially rectangular shape that is substantially the same as the shape of the substrate 101 .

However, the present invention is not limited to the number and arrangement of rows of the plurality of DMDs 155, and may be a structure capable of exposing the entire surface of the substrate 101 by a single scan exposure.

Therefore, the first pattern can be formed on the substrate 101 by exposing the entire surface of the substrate 101 with a single scan exposure using the maskless exposure apparatus according to the embodiment of the present invention.

In the thin film patterning after the first patterning through the front scan exposure, the partial scan exposure is performed by selectively lighting the effective exposure region in consideration of the alignment margin with respect to the lower layer.

For example, when the effective exposure area corresponds to half of the substrate 101 in the second exposure, as shown in FIGS. 7B and 7C, the DMD 131 is divided into two exposure regions The effective exposure area can be controlled as desired. That is, as shown in FIG. 7B, by moving the stage 135 in which the substrate 101 is loaded in the forward direction, that is, in the + Y axis direction, with the DMD 155 'of the first exposure region selectively lit The area A of the substrate 101 is scanned and exposed. 7C, when the DMD 155 'of the first exposure area is turned off and the DMD 155' 'of the second exposure area is selectively turned on, the substrate 101 is loaded The B region of the substrate 101 is scanned and exposed by moving the stage 135 in the backward direction, that is, in the -Y axis direction.

At this time, the loaded substrate 101 is aligned corresponding to the effective exposure region, and the second and subsequent exposures are performed by a scanning method.

8A and 8B are plan views showing, for example, the second exposure by the control of the effective exposure area in the exposure method according to the embodiment of the present invention.

8A and 8B illustrate the second and subsequent exposure methods in the case where 3x2 and 2x2 panel regions 210 and 310 are defined in the large-sized mother substrate 201 and 301 for a liquid crystal display device, respectively. For example.

8A, when 3x2 panel areas 210 are defined on the mother substrate 201, the DMD array 231 is divided into three exposure areas, and the DMD of the first exposure area The DMD 255 '' of the second exposure area and the DMD 255 '' of the second exposure area and the DMD 255 '' of the third exposure area are selectively turned on to perform the scan exposure three times.

8B, when 2x2 panel regions 310 are defined in the mother substrate 301, the DMD array 331 is divided into two regions of exposure regions, and the first exposure region The DMD 355 'and the DMD 355 "of the second exposure region are selectively turned on to perform the scan exposure twice.

As described above, the DMD is divided into two or three or more exposure regions to selectively illuminate the effective exposure region, thereby minimizing pattern errors and shortening the exposure time by stage driving. This is because the stage is moved only in one direction, that is, in the Y-axis direction during scan exposure, and the effective exposure area can be selectively controlled by DMD lighting and fine driving of the optical system.

Hereinafter, a manufacturing method of a liquid crystal display device using the above-described exposure method will be described in detail with reference to the drawings.

FIG. 9 is a flowchart sequentially illustrating a manufacturing method of a liquid crystal display device according to an embodiment of the present invention, and FIG. 10 is a flowchart sequentially illustrating another manufacturing method of the liquid crystal display device according to another embodiment of the present invention.

9 shows a method of manufacturing a liquid crystal display device in the case of forming a liquid crystal layer by a liquid crystal injection method, and FIG. 10 shows a method of manufacturing a liquid crystal display device in the case of forming a liquid crystal layer by a liquid drop method.

The manufacturing process of the liquid crystal display device can be largely divided into a driving element array process for forming driving elements on the lower array substrate, a color filter process for forming a color filter on the upper color filter substrate, and a cell process.

First, a plurality of gate lines and data lines arranged in an array substrate and defining pixel regions are formed by an array process, and thin film transistors, which are driving elements connected to the gate lines and the data lines, are formed in each of the pixel regions (S101 ). In addition, a pixel electrode connected to the thin film transistor through the array process and driving the liquid crystal layer as a signal is applied through the thin film transistor is formed.

In addition, a color filter layer composed of sub-color filters of red, green, and blue and a common electrode are formed on the color filter substrate by a color filter process (S103). At this time, when an in-plane switching (IPS) liquid crystal display device is manufactured, the common electrode is formed on the array substrate on which the pixel electrode is formed through the array process.

At this time, a plurality of the color filter substrate and the array substrate are divided into a large-sized mother substrate. In other words, a plurality of panel regions are defined in a large-sized mother substrate, and thin film transistors and color filters, which are driving elements, are formed in each of the panel regions.

When a thin film transistor and a color filter are formed on each of the panel regions of the mother substrate, a plurality of thin film patterns are required. In this case, the above-described exposure method can be used. At this time, in the thin film patterning after the first patterning through the front scan exposure, the partial scan exposure is performed by selectively lighting the effective exposure area in consideration of the alignment margin with the lower layer.

Then, after aligning films are printed on the color filter substrate and the array substrate, alignment control force or surface fixing force (that is, pretilt angle and orientation) is applied to the liquid crystal molecules of the liquid crystal layer formed between the color filter substrate and the array substrate Direction) of the alignment film is provided (S102, S104).

After the rubbing process, the color filter substrate and the array substrate are inspected for defects in the alignment layer through an alignment film tester as shown in Figs. 9 and 10 (S105).

If the rubbing is not uniform, the degree of alignment of the liquid crystal molecules is not spatially constant and locally causes defects indicating different optical characteristics.

Such methods of inspecting the rubbing defect include a primary inspection for inspecting the surface of the applied alignment film after the alignment film is applied for the presence or absence of stains, streaks, or pin holes, and the like for checking the uniformity of the surface of the alignment film rubbed after rubbing, there is a secondary inspection to check for the presence of scratches or the like.

As shown in FIG. 9, a spacer for keeping the cell gap constant is formed on the array substrate after the alignment film inspection, and a sealing material is applied to the outer frame portion of the color filter substrate. Then, the color filter substrate and the array substrate (S106, S107, S108). At this time, the spacer may be a ball spacer by a scattering method, or may be a column spacer by patterning.

As described above, since a plurality of panel regions are formed on a large-sized mother substrate, and thin film transistors and color filter layers, which are driving elements, are formed in each of the panel regions, the mother substrate is cut to form a single liquid crystal display panel (S109).

Then, a liquid crystal display device is manufactured by injecting liquid crystal through the liquid crystal injection port into each liquid crystal display panel processed as described above, sealing the liquid crystal injection port to form a liquid crystal layer, and inspecting each liquid crystal display panel (S110, S111).

At this time, the liquid crystal is injected by a vacuum injection method using a pressure difference. In the vacuum injection method, the liquid crystal injection port of the unit liquid crystal display panel separated from the large-sized mother substrate is filled with liquid crystal in a chamber The liquid crystal is injected into the liquid crystal display panel by a pressure difference between the inside and the outside of the liquid crystal display panel. When the liquid crystal is filled in the liquid crystal display panel, Thereby forming a liquid crystal layer of the liquid crystal display panel. Accordingly, when the liquid crystal layer is formed on the liquid crystal display panel through the vacuum injection method, a part of the seal pattern should be opened to have the function of the liquid crystal injection hole.

However, the vacuum injection method as described above has the following problems.

First, the time required to fill the liquid crystal display panel with the liquid crystal is very long. In general, since a bonded liquid crystal display panel has a gap of several micrometers on an area of several hundreds cm ^2, the injection amount of liquid crystal per unit time is very small even if a vacuum injection method using a pressure difference is applied. For example, when a liquid crystal display panel of about 15 inches is manufactured, it takes about 8 hours to fill the liquid crystal, so that it takes a lot of time to manufacture the liquid crystal display panel, and productivity is lowered. Further, as the size of the liquid crystal display panel is increased, the time required for filling the liquid crystal becomes longer and the filling failure of the liquid crystal is generated. As a result, the liquid crystal display panel can not be increased in size.

Second, the consumption of liquid crystal is high. Generally, the amount of liquid crystal injected into a liquid crystal display panel is very small compared to the amount of liquid crystal filled in the container, and when the liquid crystal is exposed to the atmosphere or a specific gas, it reacts with the gas and deteriorates. Therefore, even if the liquid crystal filled in the container is filled in the plurality of liquid crystal display panels, a large amount of liquid crystal remaining after filling is discarded. As a result, expensive liquid crystal is discarded and the cost of the liquid crystal display panel is increased as a result This weakens the price competitiveness of the product.

In order to overcome the problem of the vacuum injection method as described above, a dropping method can be applied.

As shown in FIG. 10, after the alignment film inspection (S105) is completed, a seal pattern is formed on the color filter substrate to form a predetermined seal pattern, and a liquid crystal layer is formed on the array substrate (S106 ', S107').

The dropping system dispenses liquid crystal on an image display area of a large-area first mother substrate on which a plurality of array substrates are arranged or a second mother substrate on which a plurality of color filter substrates are arranged by using a dispenser And the liquid crystal is uniformly distributed over the entire image display area by the pressure for attaching the first and second mother substrates to each other to form a liquid crystal layer.

Therefore, when the liquid crystal layer is formed on the liquid crystal display panel through the dropping method, the seal pattern should be formed in a closed pattern surrounding the periphery of the pixel region so as to prevent the liquid crystal from leaking out of the image display region.

The dropping method can drop the liquid crystal in a shorter time than the vacuum injection method, and even when the liquid crystal display panel is enlarged, the liquid crystal layer can be formed very quickly.

In addition, since only a necessary amount of liquid crystal is dropped onto the substrate, it is possible to prevent an increase in the price of the liquid crystal display panel due to the disposal of expensive liquid crystal such as a vacuum injection method, thereby enhancing the price competitiveness of the product.

Thereafter, the first mother substrate and the second mother substrate are bonded together by applying a pressure in a state in which the first mother substrate and the second mother substrate, to which the liquid crystal is dropped and the sealing material is coated, are aligned, The liquid crystal dropped by the application of the pressure is uniformly spread over the entire liquid crystal display panel (S108 '). By such a process, a plurality of liquid crystal display panels each having a liquid crystal layer formed on the large-area first and second mother substrate, the first and second mother substrates are processed and cut into a plurality of liquid crystal display panels Each liquid crystal display panel is inspected to produce a liquid crystal display device (S109 ', S110').

While a great many are described in the foregoing description, it should be construed as an example of preferred embodiments rather than limiting the scope of the invention. Therefore, the invention should not be construed as limited to the embodiments described, but should be determined by equivalents to the appended claims and the claims.

101 to 301: Substrate 130: Maskless exposure device
131 ~ 331: DiMedia132: Guide
133: DMD array fixing block 134: base supporting unit
135: stage 136: base
140: optical unit 150: DMD unit
155: DMD 155a: Static RAM cell
155b: Micromirror 160: Pattern information transmission unit
165: DMD adjustment device 210, 310: Panel area

Claims (11)

Loading a substrate on which a first coating layer is formed on a stage;
Exposing the entire surface of the substrate to a single scan exposure (first exposure) using a DMD with a plurality of DMDs;
Forming a first pattern on the substrate through the first exposure, and then forming a second coating layer on the substrate;
Loading the substrate on which the second coating layer is formed on the stage; And
Forming a second pattern by dividing the DMD array into a plurality of exposure areas according to an effective exposure area and selectively lighting the substrate to scan exposure (second exposure) the substrate a plurality of times; Using exposure method. The exposure method according to claim 1, wherein the first coating layer and the second coating layer are formed of photoresist. The exposure method according to claim 1, wherein the stage moves only in one direction during the first exposure and the second exposure. The exposure method according to claim 1, wherein the DMD array is arranged such that the DMDs are arranged in two rows to scan and expose the surface of the substrate. 5. The exposure method according to claim 4, wherein the columns of the DMDs are alternately arranged. 2. The method according to claim 1, wherein when the effective exposure area corresponds to half of the substrate during the second exposure, the DMD is divided into two exposure areas of the first and second exposure areas and selectively illuminated Exposure method using a maskless exposure apparatus. 7. The exposure apparatus according to claim 6, further comprising a maskless exposure apparatus for scanning exposure of the area A of the substrate by moving the stage in which the substrate is loaded in one direction in a state in which the DMD of the first exposure region is selectively turned on Exposure method. The method of claim 7, further comprising: moving the stage loaded with the substrate in another direction while turning off the DMD of the first exposure area and selectively illuminating the DMD of the second exposure area, B region by scanning exposure using a maskless exposure apparatus. Providing a first mother substrate on which a plurality of color filter substrates are disposed and a second mother substrate on which a plurality of array substrates are disposed;
Performing a color filter process on the plurality of color filter substrates using a maskless exposure apparatus including a DMD array including a plurality of DMDs, and performing an array process on the plurality of array substrates;
Forming an alignment film on surfaces of the first mother substrate and the second mother substrate, the color filter process and the array process respectively;
Performing a rubbing process on the alignment film;
Attaching the first mother substrate and the second mother substrate to each other to form a plurality of liquid crystal display panels; And
Separating the first mother substrate and the second mother substrate into a plurality of unit liquid crystal display panels,
Wherein the color filter process and the array process form a first pattern by exposing a surface of the first and second mother substrates with a single scan exposure using the DMD, A method of manufacturing a liquid crystal display device in which the DMD array is divided into a plurality of exposure areas according to an effective exposure area and selectively illuminated to scan and expose the first and second mother substrate plates a plurality of times, . The method as claimed in claim 9, wherein when 3x2 panel areas are defined on the first and second mother substrate, the DMD is divided into three exposure areas, DMD of the first exposure area, The DMD of the exposure region and the DMD of the third exposure region are selectively turned on to perform the scan exposure three times. The method according to claim 9, wherein when 2x2 panel regions are defined on the first and second mother substrate, the DMD is divided into two regions of exposure regions, and the DMD and the second exposure of the first exposure region And the second DMD is selectively turned on to perform the second scan exposure.

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