KR101745308B1 - Method for controlling trace elements in low melting metals - Google Patents
Method for controlling trace elements in low melting metals Download PDFInfo
- Publication number
- KR101745308B1 KR101745308B1 KR1020150085773A KR20150085773A KR101745308B1 KR 101745308 B1 KR101745308 B1 KR 101745308B1 KR 1020150085773 A KR1020150085773 A KR 1020150085773A KR 20150085773 A KR20150085773 A KR 20150085773A KR 101745308 B1 KR101745308 B1 KR 101745308B1
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- South Korea
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- metal
- tube
- heating means
- impurity element
- cooling
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/28—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
The present invention relates to a method for controlling a trace element of a low melting point metal, comprising the steps of: a) charging a boat containing a metal to be refined into a tube, b) heating means provided on the outer surface of the tube, C) the target metal in the portion where the heating means is located is locally heated to become a molten zone in a liquid state, d) the region of the metal object excluding the molten portion is in a solid state E) cooling the molten metal as the heating means is moved toward the other end side of the target metal at a constant speed along the longitudinal direction of the tube, and e) , The impurity element is moved to the other end of the target metal due to the property that the impurity element contained in the target metal collects in the molten portion The step of focusing control may be made, including.
Description
The present invention relates to a method for controlling a trace element of a low melting point metal, and more particularly, to a method for controlling a trace element contained in a metal to increase the purity of the metal, The present invention relates to a method for controlling a trace element of a low melting point metal, which can control a trace element contained in a low melting point metal.
The conventional process for removing impurities in a single crystal solid to increase the purity is referred to as zone refining.
FIG. 1 briefly illustrates the principle of such a zone purification method. A narrow ring-shaped heater is used to heat and melt the rod-shaped monocrystalline ingot. The molten zone gradually moves from one end of the ingot to the other as the heater moves . At this time, when the main material, which has been melted and liquid, is recrystallized as the heater moves, the tendency to make crystals among the same materials causes the impurity to move to the molten portion in the liquid state at the liquid and solid interface.
That is, the ingot partly repeats the melting-crystallization process, and the impurities gradually move along the moving direction of the heater and finally gather at one end. This process is repeated several times, and at the end, one end of the ingot with denser impurities is cut off to obtain a high-purity crystal.
A related art is described in Korean Patent Laid-Open Publication No. 2003-0005722 ("Dry metallic germanium manufacturing method and its refining apparatus").
The purification apparatus according to the prior art is shown in FIG. 2, and the purification process will be briefly described with reference to FIG. After the metal germanium has been completely melted by heating the rotary tube (3) with the heater (4) after putting the germanium into the inside of the rotary tube and vacuuming the inside of the rotary tube, the heater is rotated in the axial direction of the rotary tube . At this time, impurities in the metal germanium move with the transfer of the heater 4 from the high temperature part to the low temperature part, and finally, the metal germanium is purified by cutting the tip where the impurities are gathered.
However, the purification method described in the above-mentioned prior art is a method of purifying germanium having a melting point of 958.5 ° C. In the case of low melting metals such as Ga and In (metal materials practically used at a melting point of Pb melting at 327.4 占 폚), even when the heater moves, the melted portion remains in a liquid state without recrystallization There is a problem that the impurities can not be collected on one side. That is, the prior art has a problem that it can not be applied to purification of a low melting point metal.
Disclosure of Invention Technical Problem [8] The present invention has been conceived to solve the problem that it is not easily melted and recrystallized when refining a low melting point metal having a melting point of 327.4 [deg.] C or less. The object of the present invention is to effectively control the trace elements contained in the low melting point metal, And a method for controlling a trace element of a low melting point metal, which enables a refining step of high purity of the metal.
A method of controlling a trace element of a low melting point metal according to the present invention comprises the steps of: a) charging a boat containing a metal to be refined into a tube (S100); b) a step S200 in which the heating means provided on the outer surface of the tube is located on one side of the end of the target metal; c) a step S300 in which the metal in the portion where the heating means is located is locally heated to become a molten zone in a liquid state; d) cooling (S400) the target metal so that a region of the target metal excluding the molten portion becomes a crystal zone; And e) as the heating means is moved toward the other end side of the target metal at a constant speed along the longitudinal direction of the tube, the molten metal is moved as well. Depending on the property of the impurity element contained in the metal to be collected in the molten metal (S500) in which the impurity element is moved to the other end of the target metal and concentrated.
In addition, the step d) includes cooling the cooling water to a predetermined temperature (S410), supplying the cooling water to the micro tube provided to contact the outer surface of the boat (S420), and cooling the cooling water through the micro tube And cooling the target metal by circulation (S430).
Further, after the step (e), the step (f) may include cutting the other end of the metal to which the impurity element is concentrated to obtain a metal of high purity (S600).
After the step a), a1) the inside of the tube is evacuated (S110); And a2) forming a process atmosphere by injecting an atmospheric gas into the tube (S120).
In the present invention, the target metal may be any one selected from Ga, In, Bi, Pb, Sn, Li, Na and Rb.
Also, steps d) and e) may be performed simultaneously, and steps b) to e) may be repeatedly performed.
According to the present invention, the molten metal and the crystallized portion of the target metal can be formed by controlling the cooling temperature of the target metal, the heating temperature of the heating means, and the moving speed of the heating means.
In the conventional refining method, it is impossible to purify a metal having a low melting point due to the problem that the melted portion of the metal is not recrystallized despite the movement of the heater. However, the method for controlling a trace element of a low melting point metal according to the present invention, The present invention is advantageous in that the high refinement refining process can be performed for the low melting point metal by performing the step of cooling the metal so that the region where the metal is melted can be effectively recrystallized simultaneously with the movement of the heater.
Further, in the control method according to the present invention, since the cooling temperature, the heating temperature of the heater, and the moving speed of the heater are mutually adjusted, the portion to be removed after the process is completed can be minimized, thereby maximizing the yield of the process.
1 is a view showing the principle of the zone refining method
2 is a schematic diagram of a conventional metal germanium purification apparatus
3 is a block diagram showing a method for controlling a trace element of a low melting point metal according to the present invention
FIG. 4 is a diagram showing a configuration of a control device using a method for controlling a trace element of a low melting point metal according to the present invention
5 is a schematic view showing the principle of a method of controlling a trace element of a low melting point metal according to the present invention
FIG. 6 is a schematic view of an embodiment of the heating means and the cooling means according to the present invention
Fig. 7 is a view showing another embodiment of the heating means and the cooling means according to the present invention
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to the present embodiments of the present invention, examples of which are illustrated in the accompanying drawings.
The following drawings are provided as examples for allowing a person skilled in the art to sufficiently convey the idea of the present invention. Therefore, the present invention is not limited to the drawings and may be embodied in other forms. In addition, like reference numerals designate like elements throughout the specification.
In this case, unless otherwise defined, technical terms and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In the following description and the accompanying drawings, A description of known functions and configurations that may unnecessarily obscure the description of the present invention will be omitted.
FIG. 3 is a block diagram showing a method for controlling a trace element in a low melting point metal according to the present invention, FIG. 4 is a diagram illustrating a control apparatus using a trace element control method for a low melting point metal according to the present invention, Is a schematic diagram showing a principle of a method of controlling a trace element of a low melting point metal according to the present invention.
As shown in FIG. 3, the present invention may include steps a) to e).
The step a) is a step in which the
The
At this time, the
A1) a step S110 in which the inside of the
For example, referring to FIG. 4, after the
In step b), the heating means 300 provided on the outer surface of the
Since the heating means 300 is provided on the outer surface of the
In a subsequent step c), a
Next, in step d), the
At this time, it is preferable that the steps d) and e) are performed simultaneously. Also, the steps b) to e) may be repeated several times in order to obtain the
Thereafter, f) step S600 of obtaining a high-
As described above, the
Specifically, in the case of a low melting point metal such as Ga metal, the process of recrystallization of the
A more serious problem is that as the number of repeating steps b) to e) increases, the atmospheric gas in the
Therefore, in the method of controlling a trace element of a low melting point metal according to the present invention, a cooling step like the step d) is essential.
Hereinafter, a process of controlling the trace elements of the
the heating means 300 provided on the outer surface of the
That is, as the heating means 300 gradually moves from one end side to the other end side of the
Thereafter, in step f), the
That is, according to the present invention, as the heating means 300 moves, the melted portion is effectively recrystallized by performing the d) step (cooling step) at the same time as the e) step (the molten part moving step) . Therefore, the present invention is advantageous in that it is possible to purify the
4 and 5 for performing the step d) as described above. 6 and 7 illustrate various embodiments of the heating means 300 and the cooling means 500 according to the present invention. Hereinafter, an example of step d) will be described in detail with reference to FIGS.
The step d) includes cooling the cooling water to a predetermined temperature at step S410, supplying cooling water to the
That is, in step d), the temperature of the cooling water is appropriately set according to the melting point of the
6 and 7, it is preferable that the heating means 300 is provided on the outer surface of the
6, when the
In addition, in the present invention, it is preferable that the
Therefore, the
As described above, the
As described above, in the step d), the cooling of the
The method for controlling a trace element of a low melting point metal according to the present invention is a method for controlling a trace element of a low melting point metal by controlling mutually the cooling temperature (set temperature of cooling water), the heating temperature of the heating means (300) The
That is, in the present invention, by appropriately controlling the temperature of the cooling water flowing through the micro-tube 510 and the heating temperature of the heating means 300, And the tangent at the intermediate point is an interface gradient (T), it is preferable to optimize the interface gradient (T) to be maximum (see FIG. 5). At this time, since the temperature of the cooling water and the heating temperature of the heating means 300 are inversely related to each other, they are mutually adjusted to find a point at which the interface slope T becomes maximum. The closer the interface slope (T) is to the vertical, the more the process yield can be maximized since the portion removed after the process is completed (cut off at the point where the trace element concentration begins to increase sharply) can be minimized.
Also, since the temperature inside the
In addition, the moving speed of the heating means 300 should be suitably adjusted. If the moving speed is high, it is preferable to adjust the speed as low as possible because a sufficient amount of element can not be removed. However, if the moving speed is too slow, It is inappropriate in terms of bringing the interface slope (T) to the maximum, so it should be appropriately adjusted.
The unillustrated reference moving means 400 is shown as a
Although the present invention has been described with reference to particular embodiments and specific embodiments thereof with reference to the accompanying drawings, it is to be understood that the invention is not limited to the disclosed embodiments, It is to be understood that the invention is not limited to the above-described embodiment, and that various modifications and changes may be made by those skilled in the art to which the present invention pertains.
That is, it goes without saying that the control device according to the present invention may be used not only for refining low-melting metal but also for refining other metals.
Therefore, the spirit of the present invention should not be construed as being limited to the embodiments described, and all of the equivalents or equivalents of the claims, as well as the appended claims, fall within the scope of the present invention.
10: Target metal
11: melting portion 12: crystal portion
100: tube 110: vacuum pump
120: nozzle 121: gas regulator
200: boat 300: heating means
400: moving means 410: gear
420: Belt 500: Cooling means
510: micro tube 520: cooling control device
600: Burner
Claims (8)
b) a step S200 in which the heating means provided on the outer surface of the tube is located on one side of the end of the target metal;
c) a step S300 in which the metal in the portion where the heating means is located is locally heated to become a molten zone in a liquid state;
d) cooling (S400) the target metal so that a region of the target metal excluding the molten portion becomes a crystal zone; And
e) As the heating means is moved toward the other end side of the target metal at a constant speed along the longitudinal direction of the tube, the molten metal is moved as well, and depending on the property of the impurity element contained in the metal, (S500) in which the impurity element is moved to the other end of the target metal and concentrated;
/ RTI >
The step d)
Cooling the cooling water to a predetermined temperature (S410);
A step S420 of supplying the cooling water to the micro tube provided to contact the outer surface of the boat; And
Cooling the object metal by circulating the cooling water through the micro-tube (S430);
Wherein the impurity element is a metal.
The target metal may be,
Ga, In, Bi, Pb, Sn, Li, Na, and Rb.
A method for controlling an impurity element of a metal,
Wherein the step d) and the step e) are simultaneously performed.
The steps b) to e)
Wherein the impurity element is a metal.
A method for controlling an impurity element of a metal,
Wherein the molten metal and the crystallized portion are formed in the metal by mutually adjusting the cooling temperature of the metal, the heating temperature of the heating means, and the moving speed of the heating means.
After step e)
f) obtaining an object metal having a high purity by cutting the other end of the metal to which the impurity element is concentrated (S600);
Wherein the impurity element is a metal.
After step a)
a1) the inside of the tube is evacuated (S110); And
a2) injecting an atmospheric gas into the tube to form a process atmosphere (S120);
Wherein the impurity element is a metal.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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KR1020150085773A KR101745308B1 (en) | 2015-06-17 | 2015-06-17 | Method for controlling trace elements in low melting metals |
CN201580059461.9A CN107075716A (en) | 2014-09-03 | 2015-08-20 | The ultramicro-element control device and control method of low-melting-point metal |
PCT/KR2015/008683 WO2016036030A1 (en) | 2014-09-03 | 2015-08-20 | Method and apparatus for controlling trace elements of low-melting point metal |
Applications Claiming Priority (1)
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KR1020150085773A KR101745308B1 (en) | 2015-06-17 | 2015-06-17 | Method for controlling trace elements in low melting metals |
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KR20160148945A KR20160148945A (en) | 2016-12-27 |
KR101745308B1 true KR101745308B1 (en) | 2017-06-12 |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4888051A (en) | 1988-08-19 | 1989-12-19 | Cominco Ltd. | Method for the zone refining of gallium |
JP2001123232A (en) * | 1999-10-26 | 2001-05-08 | Furukawa Co Ltd | Method for refining gallium |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20030005722A (en) | 2001-07-10 | 2003-01-23 | (주)나인디지트 | Manufacturing method of metal Germanium without liquid and refining device thereof |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4888051A (en) | 1988-08-19 | 1989-12-19 | Cominco Ltd. | Method for the zone refining of gallium |
JP2001123232A (en) * | 1999-10-26 | 2001-05-08 | Furukawa Co Ltd | Method for refining gallium |
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