KR101722307B1 - 마이크로파 방사 안테나, 마이크로파 플라즈마원 및 플라즈마 처리 장치 - Google Patents

마이크로파 방사 안테나, 마이크로파 플라즈마원 및 플라즈마 처리 장치 Download PDF

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Publication number
KR101722307B1
KR101722307B1 KR1020147029665A KR20147029665A KR101722307B1 KR 101722307 B1 KR101722307 B1 KR 101722307B1 KR 1020147029665 A KR1020147029665 A KR 1020147029665A KR 20147029665 A KR20147029665 A KR 20147029665A KR 101722307 B1 KR101722307 B1 KR 101722307B1
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KR
South Korea
Prior art keywords
microwave
antenna
plasma
main body
chamber
Prior art date
Application number
KR1020147029665A
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English (en)
Korean (ko)
Other versions
KR20140137450A (ko
Inventor
다로 이케다
토모히토 고마츠
시게루 가사이
준 나카고미
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20140137450A publication Critical patent/KR20140137450A/ko
Application granted granted Critical
Publication of KR101722307B1 publication Critical patent/KR101722307B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/12—Supports; Mounting means
    • H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
    • H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
    • H01Q1/38—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/463—Microwave discharges using antennas or applicators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
KR1020147029665A 2012-03-27 2013-02-14 마이크로파 방사 안테나, 마이크로파 플라즈마원 및 플라즈마 처리 장치 KR101722307B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012072595A JP5916467B2 (ja) 2012-03-27 2012-03-27 マイクロ波放射アンテナ、マイクロ波プラズマ源およびプラズマ処理装置
JPJP-P-2012-072595 2012-03-27
PCT/JP2013/053583 WO2013145916A1 (fr) 2012-03-27 2013-02-14 Antenne à rayonnement de micro-ondes, source de plasma par micro-ondes, et dispositif de traitement au plasma

Publications (2)

Publication Number Publication Date
KR20140137450A KR20140137450A (ko) 2014-12-02
KR101722307B1 true KR101722307B1 (ko) 2017-03-31

Family

ID=49259198

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147029665A KR101722307B1 (ko) 2012-03-27 2013-02-14 마이크로파 방사 안테나, 마이크로파 플라즈마원 및 플라즈마 처리 장치

Country Status (4)

Country Link
JP (1) JP5916467B2 (fr)
KR (1) KR101722307B1 (fr)
TW (1) TWI587751B (fr)
WO (1) WO2013145916A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6356415B2 (ja) * 2013-12-16 2018-07-11 東京エレクトロン株式会社 マイクロ波プラズマ源およびプラズマ処理装置
JP6870408B2 (ja) * 2017-03-21 2021-05-12 日新電機株式会社 プラズマ処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4255563B2 (ja) 1999-04-05 2009-04-15 東京エレクトロン株式会社 半導体製造方法及び半導体製造装置
CN101385129B (zh) * 2006-07-28 2011-12-28 东京毅力科创株式会社 微波等离子体源和等离子体处理装置
JP5231441B2 (ja) * 2007-10-31 2013-07-10 国立大学法人東北大学 プラズマ処理システム及びプラズマ処理方法
JP5376816B2 (ja) * 2008-03-14 2013-12-25 東京エレクトロン株式会社 マイクロ波導入機構、マイクロ波プラズマ源およびマイクロ波プラズマ処理装置
JP5213530B2 (ja) * 2008-06-11 2013-06-19 東京エレクトロン株式会社 プラズマ処理装置
JP5143662B2 (ja) * 2008-08-08 2013-02-13 東京エレクトロン株式会社 プラズマ処理装置
WO2010140526A1 (fr) * 2009-06-01 2010-12-09 東京エレクトロン株式会社 Appareil de traitement par plasma et procédé d'alimentation électrique pour appareil de traitement par plasma

Also Published As

Publication number Publication date
TWI587751B (zh) 2017-06-11
JP2013206634A (ja) 2013-10-07
TW201345325A (zh) 2013-11-01
JP5916467B2 (ja) 2016-05-11
WO2013145916A1 (fr) 2013-10-03
KR20140137450A (ko) 2014-12-02

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