KR101714812B1 - 에피택셜 리프트오프를 이용한 플렉시블 광기전 디바이스의 제조 방법 및 에피택셜 성장에 사용되는 성장 기판의 무결성의 보존 방법 - Google Patents

에피택셜 리프트오프를 이용한 플렉시블 광기전 디바이스의 제조 방법 및 에피택셜 성장에 사용되는 성장 기판의 무결성의 보존 방법 Download PDF

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KR101714812B1
KR101714812B1 KR1020127009157A KR20127009157A KR101714812B1 KR 101714812 B1 KR101714812 B1 KR 101714812B1 KR 1020127009157 A KR1020127009157 A KR 1020127009157A KR 20127009157 A KR20127009157 A KR 20127009157A KR 101714812 B1 KR101714812 B1 KR 101714812B1
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protective layer
growth
growth substrate
substrate
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KR20120103762A (ko
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스티븐 알 포레스트
제라미 짐머만
규상 이
?팅 슈
??팅 슈
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더 리젠츠 오브 더 유니버시티 오브 미시간
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/139Manufacture or treatment of devices covered by this subclass using temporary substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/163Photovoltaic cells having only PN heterojunction potential barriers comprising only Group III-V materials, e.g. GaAs/AlGaAs or InP/GaInAs photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/127The active layers comprising only Group III-V materials, e.g. GaAs or InP
    • H10F71/1276The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising growth substrates not made of Group III-V materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/139Manufacture or treatment of devices covered by this subclass using temporary substrates
    • H10F71/1395Manufacture or treatment of devices covered by this subclass using temporary substrates for thin-film devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169Thin semiconductor films on metallic or insulating substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/11Separation of active layers from substrates
    • H10P95/112Separation of active layers from substrates leaving a reusable substrate, e.g. epitaxial lift off
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials

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  • Photovoltaic Devices (AREA)
  • Weting (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Energy (AREA)
KR1020127009157A 2009-09-10 2010-09-09 에피택셜 리프트오프를 이용한 플렉시블 광기전 디바이스의 제조 방법 및 에피택셜 성장에 사용되는 성장 기판의 무결성의 보존 방법 Active KR101714812B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US24137309P 2009-09-10 2009-09-10
US24137409P 2009-09-10 2009-09-10
US61/241,374 2009-09-10
US61/241,373 2009-09-10
US35829810P 2010-06-24 2010-06-24
US61/358,298 2010-06-24
PCT/US2010/048213 WO2011066029A2 (en) 2009-09-10 2010-09-09 Methods of preparing flexible photovoltaic devices using epitaxial liftoff, and preserving the integrity of growth substrates used in epitaxial growth

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KR20120103762A KR20120103762A (ko) 2012-09-19
KR101714812B1 true KR101714812B1 (ko) 2017-03-22

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US (2) US8378385B2 (https=)
EP (1) EP2462631B1 (https=)
JP (1) JP5619901B2 (https=)
KR (1) KR101714812B1 (https=)
CN (1) CN102804408B (https=)
AU (1) AU2010325106B2 (https=)
CA (1) CA2789391A1 (https=)
IN (1) IN2012DN03051A (https=)
TW (1) TWI550895B (https=)
WO (1) WO2011066029A2 (https=)

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WO2023287120A1 (ko) * 2021-07-14 2023-01-19 한국광기술원 기판의 재활용이 가능한 ⅲ-ⅴ족 나노로드 태양전지 제조방법

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AU2010325106B2 (en) 2015-04-09
AU2010325106A1 (en) 2012-04-12
US8378385B2 (en) 2013-02-19
US8927319B2 (en) 2015-01-06
TW201125152A (en) 2011-07-16
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JP2013504878A (ja) 2013-02-07
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IN2012DN03051A (https=) 2015-07-31
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