KR101688455B1 - An ultrasonic transmitter having piezoelectric element capable of transverse prevention and ultrasonic cleaning device including the same - Google Patents
An ultrasonic transmitter having piezoelectric element capable of transverse prevention and ultrasonic cleaning device including the same Download PDFInfo
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- KR101688455B1 KR101688455B1 KR1020150069457A KR20150069457A KR101688455B1 KR 101688455 B1 KR101688455 B1 KR 101688455B1 KR 1020150069457 A KR1020150069457 A KR 1020150069457A KR 20150069457 A KR20150069457 A KR 20150069457A KR 101688455 B1 KR101688455 B1 KR 101688455B1
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- South Korea
- Prior art keywords
- piezoelectric element
- ultrasonic
- transverse wave
- transducer
- preventing
- Prior art date
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- 230000002265 prevention Effects 0.000 title claims abstract description 28
- 238000004506 ultrasonic cleaning Methods 0.000 title abstract description 23
- 238000000034 method Methods 0.000 claims description 8
- 230000001154 acute effect Effects 0.000 claims description 3
- 239000012809 cooling fluid Substances 0.000 description 16
- 239000004065 semiconductor Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 13
- 238000009826 distribution Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004148 unit process Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
- H01L21/449—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428 involving the application of mechanical vibrations, e.g. ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
- B08B7/026—Using sound waves
- B08B7/028—Using ultrasounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2209/00—Details of machines or methods for cleaning hollow articles
- B08B2209/005—Use of ultrasonics or cavitation, e.g. as primary or secondary action
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/76—Apparatus for connecting with build-up interconnects
- H01L2224/7625—Means for applying energy, e.g. heating means
- H01L2224/763—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/76343—Means for applying energy, e.g. heating means by means of pressure by ultrasonic vibrations
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The ultrasonic transducer according to the present invention includes a piezoelectric element having a piezoelectric element capable of preventing the transverse wave from being generated. The transducer is formed in a fan shape and the center of the sector is recessed to form a transverse wave prevention part.
The present invention also provides an ultrasonic cleaning apparatus including an ultrasonic vibrator having a piezoelectric element capable of preventing a transverse wave from occurring. The ultrasonic cleaning apparatus includes the piezoelectric element, a first transducer coupled to the piezoelectric transducer on an upper surface thereof, An ultrasonic transducer including a first transducer; And a housing which is provided so as to face the object to be cleaned and in which the piezoelectric element and the first carrier are housed.
Description
BACKGROUND OF THE
Ultrasonic cleaning apparatuses are widely used for cleaning, sterilizing, and the like.
As a specific example, the process of manufacturing a semiconductor substrate includes unit processes such as deposition, lithography, etching, chemical polishing and mechanical polishing, cleaning, and drying.
Among these unit processes, the cleaning process is a process for removing foreign substances or unnecessary films adhering to the surface of the semiconductor substrate during each unit process.
At one time, as the pattern formed on the semiconductor substrate becomes finer and the aspect ratio of the pattern becomes larger, the importance of the cleaning process gradually increases.
In the early stage of the semiconductor cleaning process, a method of immersing and removing the semiconductor substrate into the cleaning liquid to clean the semiconductor substrate has been widely used. However, as the importance of the cleaning process has increased as described above, much progress has been made in the structure of the cleaning apparatus.
Recently, a substrate cleaning apparatus having a structure for increasing cleaning efficiency by applying ultrasonic vibration of several hundred kHz or more to a cleaning liquid while immersing a semiconductor substrate in a cleaning liquid is mainly used.
That is, the semiconductor substrate is cleaned using ultrasonic waves.
The ultrasonic transducer has a diaphragm or a rod, and the piezoelectric element is attached to one surface (plane) of the diaphragm or rod as described above.
Fig. 1 is a schematic view for explaining a transverse wave and a longitudinal wave generated through an ultrasonic vibrator (in this case, A is a schematic view showing a sound pressure distribution along a longitudinal wave of the piezoelectric element, and B is a schematic view showing a sound pressure distribution along a transverse wave of the piezoelectric element 2 is a schematic diagram for explaining an output state (a state in which a transverse wave and a longitudinal wave meet and a peak sound pressure is generated) output by a conventional ultrasonic vibrator.
As shown in FIG. 1, in the conventional ultrasonic vibrator, the longitudinal wave of the piezoelectric element is fairly uniform, while the transverse wave of the piezoelectric element is superposed on the stading wave at the center, so that the sound pressure is very strong. At this time, the transverse waves of the piezoelectric element are generated when ultrasonic waves generated at one end in the horizontal direction of the piezoelectric element are transmitted to the other end, and then fed back to the other end in the horizontal direction.
As shown in FIG. 2, in the conventional ultrasonic vibrator, a peak sound pressure (1) having a very strong negative pressure due to a transverse wave of the piezoelectric element is generated at the center after the longitudinal wave and the transverse wave meet.
When the peak sound pressure reaches the pattern of the semiconductor substrate, there is a problem that the pattern of the semiconductor substrate is damaged by a very strong negative pressure of the peak sound pressure.
Therefore, it is necessary to develop various ultrasonic vibrators and ultrasonic cleaning apparatuses to solve the above-mentioned problems.
As a related art, the present applicant has proposed Korean Patent Publication No. 2011-0136345.
It is an object of the present invention to provide an ultrasonic vibrator having a piezoelectric element capable of preventing a transverse wave from being generated in a piezoelectric element and an ultrasonic cleaning apparatus including the same, .
The ultrasonic transducer having the piezoelectric element capable of preventing the transverse wave according to the present invention is recessed such that the center of the sector shape has a flat cross section and the cross section between the flat cross section and the center line of the sector shape Shaped piezoelectric element including a transverse wave preventing portion formed at an obtuse angle or an acute angle with respect to the center of the fan shape, the plurality of piezoelectric elements being arranged in contact with each other along the circumferential direction with respect to the center of the fan shape, And a first transducer coupled to a bottom surface of the circularly arrayed fan-shaped piezoelectric element and having an upper circular surface is coupled.
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The transverse wave prevention part is characterized in that the transverse wave prevention part is formed in such a shape that two sides are recessed from the center of the sector shape to the inside of a sector.
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The ultrasonic cleaning apparatus including the ultrasonic vibrator having the piezoelectric element capable of preventing the transverse wave according to the present invention is characterized in that the ultrasonic cleaning apparatus includes a housing having a lower surface opposed to the object to be cleaned and accommodating the ultrasonic oscillator therein .
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The ultrasonic transducer may further include a second transducer coupled to a lower surface of the first transducer.
Further, the ultrasonic cleaning apparatus including the ultrasonic vibrator having the piezoelectric element capable of preventing the transverse wave from being generated, is formed in a shape in which the upper surface of the second transporter is recessed, the lower surface is formed in a protruding shape, And is coupled to the upper surface of the second carrier.
Accordingly, the ultrasonic transducer having the piezoelectric element capable of preventing the transverse wave according to the present invention has a fan shape, and the piezoelectric element includes the transverse wave prevention part formed by recessing the center of the sector shape, And the transverse wave prevention part are formed in a shape that is not symmetrical with respect to each other, and ultrasonic waves generated in a sectoral arc part of the piezoelectric element are transmitted to the transverse wave prevention part, So that it is possible to prevent the transverse wave of the piezoelectric element from being generated.
Fig. 1 is a schematic view for explaining a transverse wave and a longitudinal wave generated through an ultrasonic vibrator (in this case, A is a schematic view showing a sound pressure distribution along a longitudinal wave of the piezoelectric element, and B is a schematic view showing a sound pressure distribution along a transverse wave of the piezoelectric element )
2 is a schematic diagram for explaining the output state of ultrasonic waves output from a conventional ultrasonic vibrator (a state in which a transverse wave and a longitudinal wave meet and a peak sound pressure is generated)
3 is a plan view showing an ultrasonic vibrator having a piezoelectric element capable of preventing transverse waves according to the present invention
4 is a plan view showing an ultrasonic transducer according to a first embodiment of the present invention having a piezoelectric element capable of preventing transverse waves
5 is a plan view showing an ultrasonic vibrator according to a second embodiment of the present invention having a piezoelectric element capable of preventing the generation of a transverse wave
6 is a plan view showing an ultrasonic vibrator according to a third embodiment of the present invention having a piezoelectric element capable of preventing the occurrence of transverse waves
Fig. 7 is a plan view showing an ultrasonic vibrator according to a fourth embodiment of the present invention having a piezoelectric element capable of preventing the occurrence of transverse waves
8 is a cross-sectional view showing an ultrasonic cleaning apparatus including an ultrasonic vibrator having a piezoelectric element capable of preventing the transverse wave from occurring according to the present invention
9 is a cross-sectional
Hereinafter, the technical idea of the present invention will be described more specifically with reference to the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are included to provide a further understanding of the technical concept of the present invention, are incorporated in and constitute a part of the specification, and are not intended to limit the scope of the present invention.
BACKGROUND OF THE
3 is a plan view showing an ultrasonic vibrator having a piezoelectric element capable of preventing transverse waves according to the present invention.
As shown in FIG. 3, the ultrasonic transducer having a piezoelectric element capable of preventing transverse waves according to the present invention includes a
The
The transverse
That is, the portion of the sector-
When ultrasonic waves generated at one end in the horizontal direction of the
The ultrasonic transducer having a piezoelectric element capable of preventing the generation of a transverse wave according to the present invention includes a
The prevention of transverse waves of the
That is, the ultrasonic transducer having the piezoelectric element capable of preventing the transverse wave according to the present invention originally blocks the generation of the transverse wave in the
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, various embodiments of an ultrasonic vibrator having a piezoelectric element capable of preventing transverse waves according to the present invention will be described.
≪ Ultrasonic vibrator - Example 1 &
4 is a plan view showing an ultrasonic vibrator according to a first embodiment of the present invention having a piezoelectric element capable of preventing a transverse wave from being generated.
4, in the ultrasonic transducer according to the first embodiment of the present invention having the piezoelectric element capable of preventing the generation of the transverse wave, the transverse
At this time, two portions divided by the center point of the
The ultrasonic waves generated in the first call 112-1 are transmitted to the transverse
The ultrasonic waves generated in the second call 112-2 are transmitted to the transverse
That is, the first embodiment of the ultrasonic transducer having the piezoelectric element capable of preventing the transverse wave according to the present invention has the effect of accurately grasping the movement path of the ultrasonic wave generated in the area of the
≪ Ultrasonic vibrator - Example 2 >
5 is a plan view showing a second embodiment of an ultrasonic transducer having a piezoelectric element capable of preventing transverse waves according to the present invention.
5 is a plan view showing a second embodiment of an ultrasonic vibrator having a piezoelectric element capable of preventing transverse waves according to the present invention, as shown in FIG.
5, in the ultrasonic transducer according to the second embodiment of the present invention having the piezoelectric element capable of preventing the occurrence of the transverse wave, the transverse
At this time, two portions divided by the center point of the
The ultrasonic waves generated in the first call 112-1 are transmitted to the transverse
The ultrasonic waves generated in the second call 112-2 are transmitted to the transverse
However, in the ultrasonic transducer according to the second embodiment of the present invention having the piezoelectric element capable of preventing the transverse wave from being generated, the ultrasonic waves generated in the first call (112-1) and the second call (112-2) The
≪ Ultrasonic vibrator - Example 3 >
6 is a plan view showing a third embodiment of an ultrasonic vibrator having a piezoelectric element capable of preventing the generation of a transverse wave according to the present invention.
6, in the ultrasonic transducer according to the third embodiment of the present invention having the piezoelectric element capable of preventing the transverse wave from occurring, the transverse
At this time, the ultrasonic waves generated from the arc-shaped
≪ Ultrasonic vibrator - Example 4 >
7 is a plan view showing a fourth embodiment of an ultrasonic vibrator having a piezoelectric element capable of preventing the generation of a transverse wave according to the present invention.
As shown in FIG. 7, in the ultrasonic transducer according to the fourth embodiment of the present invention having the piezoelectric element capable of preventing the transverse wave from occurring, a plurality of the
Accordingly, in the ultrasonic transducer according to the fourth embodiment of the present invention having the piezoelectric element capable of preventing the generation of the transverse wave according to the present invention, the transverse waves are generated in the
8 is a cross-sectional view showing an ultrasonic cleaning apparatus including an ultrasonic vibrator having a piezoelectric element capable of preventing a transverse wave from occurring according to the present invention.
8, an
The
The
The
The
The
The cooling
In addition, although the cooling
In addition, the cooling
The cooling
The cooling fluid flowing into the
Hereinafter, embodiments of an
≪ Ultrasonic Cleaning Device - Example 1 >
9 is a cross-sectional
As shown in FIG. 9, the
Accordingly, in the
It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
1000: an ultrasonic cleaning device including an ultrasonic vibrator having a piezoelectric element capable of preventing the transverse wave from occurring according to the present invention
100: ultrasonic vibrator
110: piezoelectric element L110: seam
111: transverse wave prevention part 112: arc
112-1: No. 1 112-2: No. 2
113: Radius θ s : Angle between sides
θ c : central angle
120: first carrier 130: carrier
200: Housing
210: cooling fluid inlet 220: cooling fluid outlet
Claims (8)
The fan-shaped piezoelectric elements are arranged in contact with each other along the circumferential direction with respect to the center of the fan shape, and are formed so as to have a circular perimeter,
Wherein the first transducer is coupled to a lower surface of the circularly arrayed fan-shaped piezoelectric element, and the upper surface of the first transducer is formed into a flat circular surface.
Wherein the transverse wave prevention part is formed in a shape in which two sides are recessed from the center of the sector shape to the inside of a sector.
And a second transducer coupled to a lower surface of the first transducer.
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KR1020150069457A KR101688455B1 (en) | 2015-05-19 | 2015-05-19 | An ultrasonic transmitter having piezoelectric element capable of transverse prevention and ultrasonic cleaning device including the same |
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KR1020150069457A KR101688455B1 (en) | 2015-05-19 | 2015-05-19 | An ultrasonic transmitter having piezoelectric element capable of transverse prevention and ultrasonic cleaning device including the same |
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KR20160136493A KR20160136493A (en) | 2016-11-30 |
KR101688455B1 true KR101688455B1 (en) | 2016-12-23 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190027547A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic dry cleaning module and cleaning method using gas for large substrate |
KR20190027517A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic cleaning module and cleaning system using uniform liquid droplet for plate |
KR20190027534A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic cleaning module and cleaning system using air fir substrate |
KR20190027531A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Droplet ultrasonic cleaning apparatus of large surface and that method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101031374B1 (en) * | 2010-03-12 | 2011-05-06 | (주) 경일메가소닉 | Ultrasonic cleaning apparatus preventing spike pulse |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0244890U (en) * | 1988-09-20 | 1990-03-28 | ||
KR20110136345A (en) | 2010-06-15 | 2011-12-21 | 한국기계연구원 | Vibrator device for ultrasonics wave and ultrasonics wave apparatus having the same |
KR101511018B1 (en) * | 2013-08-01 | 2015-04-10 | 한국기계연구원 | An ultrasonic cleaning apparatus and ultrasonic cleaning system using the same |
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2015
- 2015-05-19 KR KR1020150069457A patent/KR101688455B1/en active IP Right Grant
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Publication number | Priority date | Publication date | Assignee | Title |
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KR101031374B1 (en) * | 2010-03-12 | 2011-05-06 | (주) 경일메가소닉 | Ultrasonic cleaning apparatus preventing spike pulse |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190027547A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic dry cleaning module and cleaning method using gas for large substrate |
KR20190027517A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic cleaning module and cleaning system using uniform liquid droplet for plate |
KR20190027534A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Ultrasonic cleaning module and cleaning system using air fir substrate |
KR20190027531A (en) | 2017-09-07 | 2019-03-15 | 한국기계연구원 | Droplet ultrasonic cleaning apparatus of large surface and that method |
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KR20160136493A (en) | 2016-11-30 |
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