KR101652802B1 - Y2o3 coating apparatus and coating method for ceramic - Google Patents

Y2o3 coating apparatus and coating method for ceramic Download PDF

Info

Publication number
KR101652802B1
KR101652802B1 KR1020150056286A KR20150056286A KR101652802B1 KR 101652802 B1 KR101652802 B1 KR 101652802B1 KR 1020150056286 A KR1020150056286 A KR 1020150056286A KR 20150056286 A KR20150056286 A KR 20150056286A KR 101652802 B1 KR101652802 B1 KR 101652802B1
Authority
KR
South Korea
Prior art keywords
coating
powder
coating material
base material
yttria
Prior art date
Application number
KR1020150056286A
Other languages
Korean (ko)
Inventor
권혁천
김범섭
Original Assignee
주식회사 원익큐엔씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 원익큐엔씨 filed Critical 주식회사 원익큐엔씨
Priority to KR1020150056286A priority Critical patent/KR101652802B1/en
Application granted granted Critical
Publication of KR101652802B1 publication Critical patent/KR101652802B1/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching

Abstract

The present invention relates to an apparatus and a method for coating a ceramic base material with yttria which can form an yttria coating layer having a uniform particle diameter on a ceramic base material to be coated, and recycle remaining yttria powder when coating to improve economic efficiency. According to the present invention, the apparatus for coating a ceramic base material with yttria comprises: a coating material supply device to provide only coating material powder of a uniform particle diameter; an acceleration device to acceleratively transport a coating material supplied by the coating material supply device; a spray nozzle to spray the coating material accelerated by the acceleration device to a ceramic base material; a coating chamber to set the ceramic base material; and a coating material recycling unit which is connected to the coating chamber, and collects the coating material remaining after coating the ceramic base material to supply the remaining coating material to the coating material supply device.

Description

Technical Field [0001] The present invention relates to a yttria coating apparatus and a coating method for a ceramic base material,

The present invention relates to a yttria coating apparatus and a coating method of a ceramic base material, and more particularly, to a yttria coating apparatus and a coating method thereof which can form an yttria coating layer having a uniform particle size in a ceramic base material to be coated, The present invention relates to a yttria coating apparatus and a coating method of a ceramic base material.

Recently, with the development of the semiconductor and display industries, a high precision machining process is required, and a high-speed precision etching method using a dry etching technique using plasma is increasingly used. Such a dry etching technique is advantageous in that it can perform a vertical direction etching at a high speed by forming a corrosive environment by using a halogen gas plasma, but at the same time, the etching device parts including a susceptor etc. are also corroded there is a problem.

Until recently, as a material for corrosion resistant parts for semiconductor devices, a sintered body of alumina or a material coated with alumina by spray coating, an aluminum nitride sintered body and an aluminum modified by alumina surface through anodic oxidation have been used. However, The use of yttria (Y2O3), which is superior in corrosion resistance due to the high concentration of plasma, is increasing.

At present, a method of applying yttria to a corrosion-resistant part for a semiconductor device includes a method of using a sintered body or spray coating on the surface of the product. The method using the sintered body has a problem in that yttria is difficult to sinter and is sintered at a high temperature of 1600 DEG C or more and is difficult to sinter with a large sintered body and the strength of the sintered body is weak so that it is not suitable for use as a semiconductor structure.

The yttria coating by plasma spraying has a merit that the material cost is relatively low due to the coating of the surface of the product with tria, and it is possible to manufacture a thick film having a thickness of 100 탆 or more at a high speed, but it is impossible to coat uniform particles, There are many defects such as pores and cracks inside. Such defects are not only difficult to secure enough electrical insulation due to corrosion due to the accumulation of plasma by the plasma, but also have a problem that the corrosion products are adhered to the defects and are difficult to clean and serve as a main cause of particle dropout.

(Document 1): Korean Patent No. 10-1254618 (March 31, 2013) (Document 2): Korean Patent No. 10-1338090 (Dec. 20, 2013)

DISCLOSURE Technical Problem Accordingly, the present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide a yttria coating layer having a uniform particle size in a ceramic base material to be coated, And to provide a yttria coating apparatus and a coating method of a ceramic base material capable of improving economic efficiency.

The present invention has been made in view of the above problems, and it is an object of the present invention to provide an apparatus and method for controlling the same.

According to an aspect of the present invention, there is provided a coating material supply apparatus configured to provide only yttria coating raw material powder of uniform particle size; An accelerator for accelerating and conveying the coating material supplied from the coating material supply device; A spray nozzle for injecting the coating material accelerated by the accelerator into the ceramic base material; A coating chamber in which the ceramic base material is set; And a coating material recycling unit connected to the coating chamber, coating the ceramic base material, collecting the remaining coating material, and supplying the coating material to the coating material supply apparatus.

In one aspect of the present invention, it is preferable that the coating material supply apparatus is configured to supply powder of the coating material powder of yttria in an atmospheric pressure and atmospheric pressure at room temperature by means of the hydraulic pressure of the air blower.

In one aspect of the present invention, the coating material supply device is a large powder which collects a powder larger than the particle size yttria coating raw material powder so as to provide an yttria coating raw material powder having a particle diameter of 0.1 to 50 micrometers as an oil pressure of an air blower Collection tank; A crusher for crushing a large powder transferred from the large powder collecting tank; And a transfer pipe for feeding the powder pulverized in the pulverizer back to the coating material feeder, is provided.

In one aspect of the present invention, a vibrator is connected between the coating material supply device and the accelerator so that the gas pressure source is connected so that the yttria coating material powder supplied from the coating material supply device is not vigorously vibrated vertically and horizontally .

In one aspect of the present invention, the coating material recycling unit includes a recycling powder collecting chamber connected to a lower portion of the coating chamber; And a recycling supply pipe connected to the recycling powder collecting chamber and supplying the collected recycling powder to the powder inlet of the coating material supplying apparatus.

In one aspect of the present invention, the apparatus further includes a base material heating device for heating the base material on one side where the ceramic base material is positioned, and the base material heating device is preferably heated to 300 to 500 ° C.

According to another aspect of the present invention, there is provided a method for producing a yttria-coated raw material powder, comprising: An accelerated transfer step of accelerating the supplied coating material; A coating step of spray-coating the accelerated coating material onto a ceramic base material provided in a coating chamber; And a coating material recycling step of collecting the coating material remaining after coating in the coating step and supplying the coating material to the coating material supplying step.

According to another aspect of the present invention, it is preferable that the method further comprises: a vibrating step of vibrating the coating material supplied in the coating material supplying step up, down, left and right.

According to another aspect of the present invention, the coating material supplying step supplies the coating material for use in the range of 0.1 to 50 micrometers in diameter by the hydraulic pressure of the air blower, and the coating material supplying step collects powder particles larger than the coating material powder, And grinding the pulverized powder and supplying the pulverized powder to the input side of the coating material supply step.

According to another aspect of the present invention, it is preferable that the step of recycling the coating material includes providing a powder inlet of the coating material supplying step with the recycled powder collected through the recycling powder collecting chamber connected to the lower portion of the coating chamber.

In another aspect of the present invention, it is preferable to further include a heating step of heating the ceramic base material.

The yttria coating apparatus and coating method of a ceramic base material according to the present invention can form an yttria coating layer having a uniform particle size in a ceramic base material to be coated, thereby achieving reliability and homogeneity of a product.

In addition, the present invention has an effect of improving the economical efficiency by allowing the yttria powder remaining in the coating to be recycled.

The effects of the present invention are not limited to those mentioned above, and other solutions not mentioned may be clearly understood by those skilled in the art from the following description.

1 is a view showing a yttria coating apparatus of a ceramic base material according to the present invention,
2 is a schematic view showing a coating material supply unit constituting the yttria coating apparatus of the ceramic base material according to the present invention, and Fig.
3 is a flow chart showing a yttria coating method of a ceramic base material according to the present invention.

Further objects, features and advantages of the present invention will become more apparent from the following detailed description and the accompanying drawings.

Before describing the present invention in detail, it is to be understood that the present invention is capable of various modifications and various embodiments, and the examples described below and illustrated in the drawings are intended to limit the invention to specific embodiments It is to be understood that the invention includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, the terms "comprises" or "having" and the like refer to the presence of stated features, integers, steps, operations, elements, components, or combinations thereof, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

Further, terms such as " part, "" unit," " module, "and the like described in the specification may mean a unit for processing at least one function or operation.

In the following description of the present invention with reference to the accompanying drawings, the same components are denoted by the same reference numerals regardless of the reference numerals, and redundant explanations thereof will be omitted. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description, well-known functions or constructions are not described in detail since they would obscure the invention in unnecessary detail.

Hereinafter, a yttria coating apparatus and a coating method of a ceramic base material according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

First, the yttria coating apparatus of a ceramic base material according to the present invention will be described with reference to Figs. 1 and 2. Fig. FIG. 1 is a schematic view showing a yttria coating apparatus of a ceramic base material according to the present invention, and FIG. 2 is a schematic view showing a coating material supply unit constituting an yttria coating apparatus of a ceramic base material according to the present invention .

The yttria coating apparatus for a ceramic base material according to the present invention is an apparatus for coating a ceramic base material (alumina ceramic base material or specimen) by spraying yttria as a coating material, and as shown in Figs. 1 and 2, A coating material feeder 100 configured to provide only the powder of equal particle size by the hydraulic pressure of the air blower 110, the coating material powder of yttria introduced into the coating powder inlet; An accelerator 200 for accelerating and conveying the coating material supplied from the coating material supplying device 100 by the hydraulic pressure of the gas pressurizing source 210; A spray nozzle 300 for spraying the coating material accelerated by the accelerator 200 onto a ceramic base material to be coated; A coating chamber 400 in which the ceramic base material is set; And a coating material recycling unit connected to the coating chamber 400, coating the ceramic base material, collecting the remaining coating material, and supplying the coating material to the coating material supply apparatus 100.

Between the coating material supplying device 100 and the accelerator 200, the coating material powder supplied from the coating material supplying device 100 is supplied to the gas pressurizing source 210 And a vibrator 500 connected to the vibrator 500.

Reference numeral 111 denotes an air flow rate controller for controlling the flow rate supplied from the air blower 110. Reference numeral 212 denotes a gas flow rate controller for controlling the flow rate of gas supplied from the gas pressure source 210. Reference numeral 213 denotes a gas flow rate controller And a gas flow controller (MFC) for precisely controlling the flow rate.

The coating material supply apparatus 100 is configured to provide only a powder having a specific micrometer size (0.1 to 50 micrometers) usable as the hydraulic pressure of the air blower 110 (hereinafter referred to as 'use coating powder').

The coating material supply apparatus 100 includes a large powder collecting tank 115 and a small powder collecting tank 120 which are larger or smaller than the used coating powder to collect large powder and small powder filtered by the hydraulic pressure of the air blower 110; A pulverizer 130 for pulverizing a large powder larger than the used coating powder transferred from the large powder collecting tank 115 through ball milling; And a transfer pipe 140 for supplying the powder pulverized in the pulverizer 130 to the powder inlet of the coating material feeder 100.

The spray nozzle 300 is not particularly limited as long as it is provided inside the coating chamber 400 and the supplied coating powder is uniformly dispersed and sprayed on the ceramic base material to be coated.

Specifically, the injection nozzle 300 is of a replaceable nozzle type. According to one embodiment of the present invention, it may be a circular nozzle having a diameter ranging from 1 to 5 mm. Also, according to another embodiment of the present invention, it may be a square nozzle having a width in the range of 1 to 2 mm and a length in the range of 100 to 500 mm. By replacing these nozzles with the required speeds, the speed can be adjusted without minor modification of the process system. At this time, the velocity range that occurs is 100 to 1000 m / s.

The coating chamber 400 has a rectangular parallelepiped shape and blocks contact with air to prevent oxidation. Also, the shape of the coating chamber 400 affects the gas flow in the interior, so the design is important.

The coating material recycling unit includes a recycling powder collecting chamber 610 connected to a lower portion of the coating chamber 400 so as to recycle the powder that has been repelled without being deposited on the ceramic base material in the course of spraying the coating material and the recycling powder collecting chamber 610 And a recycling supply pipe 620 for supplying the collected recycled powder to the powder inlet of the coating material supply apparatus 100. [

The present invention further includes a base material heating apparatus 700 for heating the base material on one side where the ceramic base material is placed. The parent material heating apparatus 700 may include an electric heater and is preferably heated to a temperature of about 300 to 500 ° C.

The base material heating apparatus 700 heats the ceramic base material to increase the base material adhesion force of the coating powder (yttria) to the base material.

Next, the yttria coating method of the ceramic base material according to the present invention will be described with reference to Fig. 3 is a flow chart showing a yttria coating method of a ceramic base material according to the present invention.

As shown in FIG. 3, the yttria coating method of a ceramic base material according to the present invention is characterized in that the coating material powder of yttria introduced into the coating powder inlet at room temperature and atmospheric pressure is mixed with powder of uniform particle size by the hydraulic pressure of the air blower A coating material supplying step (S100) supplied through a coating material supplying apparatus provided; An accelerated transfer step (S200) for accelerating and conveying the coating material supplied in the coating material supplying step by the hydraulic pressure of the gas pressurizing source; A coating step (S300) of spraying the coating material to be accelerated transported through a spray nozzle onto a ceramic base material to be coated in a coating chamber; And a coating material recycling step (S400) for collecting the coating material remaining after coating in the coating step and supplying the coating material to the coating material supplying step (S100).

Here, it is preferable that the present invention further includes a vibrating step (S500) for vibrating the coating material supplied in the coating material supply step so as to prevent the coating material from being hardened.

The coating material supply step (S100) provides only a powder having a specific micrometer size (0.1 to 50 micrometers) usable as the hydraulic pressure of the air blower (hereinafter referred to as 'use coating powder').

The coating material supplying step (S100) collects a large powder that is larger than the used coating powder and is filtered by the hydraulic pressure of the air blower, and grinds the collected large powder through a ball mill or the like, To the input side of the step.

The coating step S300 is not particularly limited as long as it is provided inside the coating chamber to uniformly disperse the supplied coating powder to be coated on the ceramic base material to be coated.

Next, in the step of recycling the coating material, the recycled powder collected through the recycling powder collecting chamber connected to the lower portion of the coating chamber is discharged to the coating material supplying step To a powder inlet of the powder.

Meanwhile, the yttria coating method of a ceramic base material of the present invention further includes a heating step of heating the base material through a base material heating device provided on a side where the ceramic base material is seated. The heating temperature to be performed in the heating step is preferably about 300 to 500 ° C.

In the yttria coating method and coating method of the ceramic base material according to the present invention, if the coating powder is uneven, there is a problem that the coating surface is uneven and the defective rate is high and the cost is increased. It is possible to form a uniform yttria coating layer on the coated surface of the ceramic base material with a uniform size of the coating powder, which is advantageous in that the reliability and homogeneity of the product can be improved.

Further, the present invention can improve the economical efficiency by making it possible to recycle the yttria powder remaining in the coating, and it is possible to improve the adhesion of the base material by using the base material heating apparatus.

The embodiments and the accompanying drawings described in the present specification are merely illustrative of some of the technical ideas included in the present invention. Accordingly, the embodiments disclosed herein are for the purpose of describing rather than limiting the technical spirit of the present invention, and it is apparent that the scope of the technical idea of the present invention is not limited by these embodiments. It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (11)

A coating material supply device configured to provide only yttria coating raw material powder of uniform particle size;
An accelerator for accelerating and conveying the coating material supplied from the coating material supply device;
A spray nozzle for injecting the coating material accelerated by the accelerator into the ceramic base material;
A coating chamber in which the ceramic base material is set;
A coating material recycling unit connected to the coating chamber, coating the ceramic base material, collecting the remaining coating material, and supplying the coating material to the coating material supply device;
A vibrator disposed between the coating material supply device and the accelerator so as to vibrate the yttria coating material powder supplied from the coating material supply device so as not to be hardened; And
And a base material heating device for heating the base material to 300 to 500 ° C to heat the base material on one side where the ceramic base material is located,
Wherein the coating material supply device comprises a large powder collection tank for collecting powders larger than the particle size yttria coating raw material powder so as to provide an yttria coating raw material powder having a particle size of 0.1 to 50 micrometers by hydraulic pressure of an air blower, And a conveyance pipe for feeding the powder pulverized in the pulverizer back to the coating material feeder,
The coating material recycling unit includes a recycling powder collecting chamber connected to a lower portion of the coating chamber, and a recycling powder collecting chamber connected to the recycling powder collecting chamber for supplying the recycling powder to a powder inlet of the coating material supplying apparatus.
And the yttria coater.
The method according to claim 1,
The coating material supply device
And the coating material powder of yttria is supplied only by the powder of the uniform particle size by the hydraulic pressure of the air blower under the normal temperature and atmospheric pressure atmosphere
Yttria Coating Apparatus for Ceramic Base Material.
delete delete delete delete delete delete delete delete delete
KR1020150056286A 2015-04-22 2015-04-22 Y2o3 coating apparatus and coating method for ceramic KR101652802B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020150056286A KR101652802B1 (en) 2015-04-22 2015-04-22 Y2o3 coating apparatus and coating method for ceramic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150056286A KR101652802B1 (en) 2015-04-22 2015-04-22 Y2o3 coating apparatus and coating method for ceramic

Publications (1)

Publication Number Publication Date
KR101652802B1 true KR101652802B1 (en) 2016-09-01

Family

ID=56942693

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150056286A KR101652802B1 (en) 2015-04-22 2015-04-22 Y2o3 coating apparatus and coating method for ceramic

Country Status (1)

Country Link
KR (1) KR101652802B1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970006854Y1 (en) * 1993-12-13 1997-07-09 정인관 Selective separation of solid materials for pulverizer
KR20050075092A (en) * 2004-01-15 2005-07-20 에스엔티 주식회사 Coating layer preparing method of semiconductor manufacturing equipment
KR101254618B1 (en) 2011-02-22 2013-04-15 서울대학교산학협력단 Ceramic coating method for corrosion resistant member
KR101338090B1 (en) 2012-07-27 2014-01-20 경상대학교산학협력단 Full density yttria ceramic sintered by using for conventional sintering method with fused yttria as starting materials
KR20140100030A (en) * 2013-02-05 2014-08-14 (주)코미코 Method of treating a surface and ceramic structure useof
KR101493415B1 (en) * 2013-09-10 2015-02-16 한국기계연구원 Coating apparatus of room temperature spray for powder recovering or gathering

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970006854Y1 (en) * 1993-12-13 1997-07-09 정인관 Selective separation of solid materials for pulverizer
KR20050075092A (en) * 2004-01-15 2005-07-20 에스엔티 주식회사 Coating layer preparing method of semiconductor manufacturing equipment
KR101254618B1 (en) 2011-02-22 2013-04-15 서울대학교산학협력단 Ceramic coating method for corrosion resistant member
KR101338090B1 (en) 2012-07-27 2014-01-20 경상대학교산학협력단 Full density yttria ceramic sintered by using for conventional sintering method with fused yttria as starting materials
KR20140100030A (en) * 2013-02-05 2014-08-14 (주)코미코 Method of treating a surface and ceramic structure useof
KR101493415B1 (en) * 2013-09-10 2015-02-16 한국기계연구원 Coating apparatus of room temperature spray for powder recovering or gathering

Similar Documents

Publication Publication Date Title
CN105428195B (en) The component of plasma processing apparatus and the manufacturing method of component
KR100767395B1 (en) Composite structured material
JP6639585B2 (en) Method for manufacturing parts for plasma processing apparatus
JP7287037B2 (en) Surface treatment method and manufacturing method for RTB based sintered magnet
CN108602726B (en) Method for producing ceramic sintered body, and method and apparatus for producing ceramic molded body
US20210069829A1 (en) Method and system for metal-coating
KR101497854B1 (en) Film forming method
JP2008132749A (en) End surface treating device for honeycomb molded article, method for sealing honeycomb molded article and method for producing honeycomb structure
KR101652802B1 (en) Y2o3 coating apparatus and coating method for ceramic
TW202123358A (en) Near netshape additive manufacturing using low temperature plasma jets
CN107937904B (en) Method and device for preparing aluminum coating by laser cold spraying
JP2008202117A (en) Nozzle for film deposition system, and film deposition system
CN111655457B (en) Discharge device, forming device and method for producing formed body
JP2006352151A (en) Electrostatic chuck and its manufacturing method
WO2021235361A1 (en) Blasting abrasive and manufacturing method thereof, blasting method, and blasting apparatus
JP3847253B2 (en) Manufacturing method of electrostatic chuck
CN109468567A (en) A kind of tungsten carbide spraying method of drawing block
KR101835840B1 (en) Silicon Based Ceramic with Crystalline Zircon Coating and Method for Manufacturing the Same
CN207372279U (en) A kind of uniform feed proportioning system of grinding tool composite material
JP6934401B2 (en) Manufacturing method of thermal spraying member
JP2021161499A (en) Film deposition apparatus, film deposition method, and film-deposited article
KR100964062B1 (en) Deposition and substrate etching apparatus and method using powder
CN111054917A (en) Multi-material solid additive manufacturing system and method
JP4952436B2 (en) Setter for sintering and method for producing sintered body
CN106283029A (en) A kind of thickness adjustable film coating preset mechanism

Legal Events

Date Code Title Description
E701 Decision to grant or registration of patent right
GRNT Written decision to grant