KR101603785B1 - Hydrogen peroxide refined system using reverse osmosis and hydrogen peroxide produced thereof - Google Patents

Abstract

The present invention relates to a hydrogen peroxide purification system using a reverse osmosis system and a hydrogen peroxide produced by the reverse osmosis system, wherein the hydrogen peroxide purification system using the reverse osmosis system according to the present invention comprises an organic carbon contained in the raw hydrogen peroxide and a reverse osmosis membrane ; A processing resin for removing sodium ions from the raw hydrogen peroxide passing through the reverse osmosis membrane; A pretreatment resin disposed in front of the reverse osmosis membrane to remove organic carbon contained in the raw hydrogen peroxide and pretreat it; And a pretreatment filter for collecting the resin leaking from the pretreatment resin, wherein the pretreatment resin and the pretreatment filter are provided on the pretreatment line.
According to the present invention, the raw material hydrogen peroxide is pretreated through the pretreatment resin and the pretreatment filter to prolong the lifetime of the expensive membrane, and it is possible to refine the hydrogen peroxide of electronic grade quality such as semiconductor / It is possible to extend the application field of the hydrogen peroxide refining facility by applying the reverse osmosis facility for seawater refining that has not been applied to the conventional one.

Description

BACKGROUND OF THE INVENTION Field of the Invention [0001] The present invention relates to a hydrogen peroxide purification system using a reverse osmosis system and a hydrogen peroxide produced by the hydrogen peroxide purification system using the reverse osmosis system,

The present invention relates to a hydrogen peroxide purification system using a reverse osmosis system and a hydrogen peroxide produced by the reverse osmosis system. More particularly, the present invention relates to a process for removing hydrogen peroxide from organic carbon, ) Hydrogen peroxide and a hydrogen peroxide produced thereby.

In general, hydrogen peroxide has a strong oxidizing action, and the product is harmless, which is used as a oxidizing agent for reagents, a bleaching agent for silk or wool, a catalyst for vinyl polymerization in the plastics industry, a disinfectant and explosives, and a 90% Propellants, and submarine engines.

In addition to the above-mentioned uses, it is also used in semiconductor wafer cleaning. Techniques for cleaning the surface of a semiconductor wafer can be roughly divided into wet cleaning and dry cleaning. The cleaning process is similar to the etching process in that the material on the surface of the semiconductor wafer is removed, but the object is to remove the impurities present on the surface of the semiconductor wafer. The typical wet cleaning method is a chemical wet process using hydrogen peroxide .

However, when hydrogen peroxide is used to clean the surface of a semiconductor wafer as described above, hydrogen peroxide sold in the market is used as it is, since it contains impurities. Therefore, if used as it is, it reacts with impurities existing on the surface of the semiconductor wafer, It is made of pure hydrogen peroxide after impurities are removed because it is damaged.

Techniques relating to such hydrogen peroxide purification have been proposed in patent registration No. 0132528 and patent registration No. 0713249.

Hereinafter, a conventional method for concentrating and purifying an aqueous hydrogen peroxide solution disclosed in Patent Registration No. 0132528 and No. 0713249, and a purification apparatus and purification method for hydrogen peroxide will be briefly described.

1 is a flowchart of a system for concentrating and refining a crude hydrogen peroxide aqueous solution in Patent Registration No. 0132528 (hereinafter referred to as "Prior Art 1"). 1, the aqueous hydrogen peroxide solution obtained by the anthraquinone method in the prior art 1 is introduced into the evaporator 2 through the pipe 1 and is evaporated therefrom together with the mist-like liquid, Liquid separator 4. The gas- In the gas-liquid separator 4, the vapor composed of hydrogen peroxide, water vapor and volatile impurities is composed of an aqueous hydrogen peroxide solution which is in equilibrium with the vapor phase and at the same time the mist-like water containing non-volatile impurities is removed, A part of the liquid separated from the steam is discharged through the pipe 12 but recirculated to the evaporator 2 in order to prevent the accumulation of non-volatile impurities, To the middle height of the fractionation column (6). In the fractionation distillation column 6, the concentration of hydrogen peroxide in the ascending vapor ascending from the fractionation distillation column 6 gradually decreases in contact with the distilled water introduced into the distillation column in the distillation column 9, Steam containing substantially no hydrogen peroxide is introduced into the condenser 8 via the pipe 7 where the water vapor is condensed into condensed water so that part of the water vapor is returned and part of the steam is returned to the piping 10 ≪ / RTI > On the other hand, the concentration of hydrogen peroxide in the downstream liquid descending through the fractionation distillation column 6 gradually increases and is discharged through the pipe 11 from the bottom of the fractionation pipe 6 as a concentrated and purified aqueous hydrogen peroxide solution. Evaporation, gas-liquid separation and fractional distillation of the crude hydrogen peroxide solution are usually carried out under reduced pressure.

However, since the system for concentrating and purifying crude hydrogen peroxide solution according to the prior art 1 can purify hydrogen peroxide through the concentration process, the time required for the process increases and the structure of the equipment becomes complicated.

FIG. 2 is a view showing a device for purifying hydrogen peroxide in Patent Registration No. 0713249 (hereinafter referred to as "Prior Art 2"). 2, in the apparatus for purifying hydrogen peroxide in the prior art 2, resin valves 130 and 140 are formed in the interior of the body 110 to form ion exchange resin 200, which is a refining material of hydrogen peroxide containing impurities, And a purifier column 100 having an inlet pipe 131 and a drain pipe 121 formed in the body 110 so as to allow the hydrogen peroxide to flow through the body 110. In the upper part 120 of the body 110, And a safety plate 150 communicating with the safety tube 150 is connected to the safety tube 150. The safety plate 150 is provided with a sight window 162 and a sight tube 161, And is formed so as to be covered in a state that it is not fastened to the frame.

However, in the apparatus for purifying hydrogen peroxide according to the prior art 2, the hydrogen peroxide introduced through the inlet pipe is passed through the ion exchange resin so that the hydrogen peroxide is directly passed through the ion exchange resin to shorten the lifetime of the ion exchange resin there was.

KR 0132528 B1 KR 0713249 B1

The object of the present invention is to solve the problems of the prior art as described above, and it is an object of the present invention to provide a method for pretreating raw hydrogen peroxide through a pretreatment resin and a pretreatment filter to prolong the lifetime of expensive membrane, It is economical because it can be refined with electronic grade grade hydrogen peroxide. It is a hydrogen peroxide refining system using reverse osmosis method which can expand the application field of hydrogen peroxide refining facility by applying reverse osmosis equipment for seawater refining And to provide hydrogen peroxide to be produced.

According to an aspect of the present invention, there is provided a reverse osmosis membrane for removing organic carbon and cations contained in raw hydrogen peroxide; A processing resin for removing sodium ions from the raw hydrogen peroxide passing through the reverse osmosis membrane; A pretreatment resin disposed in front of the reverse osmosis membrane to remove organic carbon contained in the raw hydrogen peroxide and pretreat it; And a pretreatment filter for collecting the resin leaking from the pretreatment resin, wherein the pretreatment resin and the pretreatment filter are provided on a pretreatment line, and a hydrogen peroxide purification system using a reverse osmosis system.

The present invention may further comprise a filter for collecting resin leaking from the processing resin.

In the present invention, a plurality of the pretreatment resins may be arranged in parallel.

In addition, the pretreatment resin and the pretreatment filter in the present invention may be alternately arranged at least one.

In addition, the present invention may include a heat exchanger for maintaining the temperature of the raw hydrogen peroxide at the predetermined temperature on the pretreatment line.

Also, in the present invention, the output temperature of the heat exchanger may be 5 to 25 ° C.

In addition, the present invention may include a pump for supplying the raw hydrogen peroxide at high pressure to the reverse osmosis membrane.

In addition, the present invention may include a stabilizer injecting device provided on the pretreatment line to inject a stabilizer into the raw hydrogen peroxide to prevent oxidation promotion.

In addition, the pretreatment resin in the present invention may be used by recycling the waste paper, and the pretreatment filter may be replaceable.

In addition, the hydrogen peroxide purification system of the present invention may be arranged in the order of the pretreatment resin, pretreatment filter, stabilizer input device, heat exchanger and pump in front of the reverse osmosis membrane.

In addition, the hydrogen peroxide purification system of the present invention may be disposed in front of the reverse osmosis membrane in the order of the stabilizer charging device, the pretreatment resin, the pretreatment filter, the heat exchanger and the pump.

In addition, the hydrogen peroxide purification system of the present invention may be arranged in the order of the pump, the pretreatment resin, the pretreatment filter, the stabilizer injection device, and the heat exchanger in front of the reverse osmosis membrane.

In addition, the hydrogen peroxide purification system of the present invention may be arranged in the order of the heat exchanger, the pretreatment resin, the pretreatment filter, the stabilizer input device, and the pump in front of the reverse osmosis membrane.

The present invention is also achieved through the hydrogen peroxide produced by the hydrogen peroxide purification system using the reverse osmosis system of any one of claims 1 to 13.

According to the present invention, the raw material hydrogen peroxide is pretreated through the pretreatment resin and the pretreatment filter to prolong the lifetime of the expensive membrane, and the hydrogen peroxide can be refined into an electronic grade quality such as semiconductor / LCD using a simple structure. It is possible to extend the application field of the hydrogen peroxide refining facility by applying the reverse osmosis facility for seawater refining that has not been applied to the conventional one.

1 is a flow chart of a system for concentrating and purifying a crude hydrogen peroxide aqueous solution according to Prior Art 1;
FIG. 2 is a schematic view showing a device for purifying hydrogen peroxide according to the prior art 2. FIG.
FIG. 3 is a schematic view showing a hydrogen peroxide purification system using a reverse osmosis system according to the first embodiment of the present invention.
4 is a schematic view showing a hydrogen peroxide purification system using a reverse osmosis system according to a second embodiment of the present invention.
5 is a schematic view showing a hydrogen peroxide purification system using a reverse osmosis system according to a third embodiment of the present invention.
6 is a schematic view showing a hydrogen peroxide purification system using a reverse osmosis system according to a fourth embodiment of the present invention.

The terms or words used in the present specification and claims are intended to mean that the inventive concept of the present invention is in accordance with the technical idea of the present invention based on the principle that the inventor can appropriately define the concept of the term in order to explain its invention in the best way Should be interpreted as a concept.

Throughout the specification, when an element is referred to as "comprising ", it means that it can include other elements as well, without excluding other elements unless specifically stated otherwise.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a hydrogen peroxide purification system using the reverse osmosis system of the present invention and a structure of an embodiment of hydrogen peroxide produced thereby will be described in detail with reference to the drawings.

FIG. 3 is a schematic view of a hydrogen peroxide purification system using a reverse osmosis system according to the first embodiment of the present invention.

The hydrogen peroxide purification system using the reverse osmosis system according to the first embodiment of the present invention includes a pretreatment resin 100, a pretreatment filter 110, a stabilizer input device 120, a heat exchanger 130, a pump 140, a reverse osmosis membrane 150, a cation resin 160, and a filter 170.

The pretreatment resin 100 is a pretreatment adsorption filter for firstly removing organic carbon, and a plurality of filters are arranged in parallel, and one of them is used. If regeneration and replacement are required, the other is used.

At this time, although the total organic carbon (TOC) and the cations are removed from the reverse osmosis membrane 150 to be described later, the pre-treatment resin 100 may shorten the lifetime due to the high organic carbon of the raw hydrogen peroxide. .

In particular, considering that the reverse osmosis membrane 150, which will be described later, is easily damaged by the solvent, the pretreatment resin 100 is primarily used to remove the solvent contained in the hydrogen peroxide by using the pretreatment adsorption resin, It is possible to extend the service life of each unit membrane constituting the membrane 150.

As the pre-treatment resin 100, resins such as HP-20 and SP-207 can be used. The waste resin can be used, and the resin can be regenerated through steam.

The pretreatment filter 110 is disposed behind the pretreatment resin 100 to collect the resin when the resin is leaked from the pretreatment resin 100. The pretreatment filter 110 protects the membrane of the reverse osmosis membrane 150 . At this time, the pre-processing filter 110 is required to be replaced when the pressure difference between the inlet and outlet and the operation time reaches the set value.

The stabilizer injector 120 is installed behind the pretreatment filter 110 to inject the stabilizer to protect the membrane of the reverse osmosis membrane 150 before the raw hydrogen peroxide is sent to the heat exchanger 130.

That is, the stabilizer injector 120 promotes the oxidation of the membrane of the reverse osmosis membrane 150 such as iron (Fe), germ (Cr) and the like in the hydrogen peroxide. The stabilizer charging device 120 includes a stabilizer tank for storing a stabilizer and a stabilizer pump for forcibly transporting the stabilizer stored in the stabilizer tank to the heat exchanger 130.

The heat exchanger 130 is disposed behind the pretreatment filter 110 to maintain the temperature of the raw hydrogen peroxide at a predetermined temperature. In other words, when the temperature is high, the recovery rate is increased but the removal rate is decreased. In the case of hydrogen peroxide, the film damage rate may be accelerated. On the contrary, if the temperature is low, the removal rate is increased, but the recovery rate is decreased and the production amount is decreased. In order to solve such a problem, the heat exchanger 130 is used to cool the temperature by a component cooling water system (CCW) in the summer, and the temperature is raised by steam in the winter season to an appropriate temperature (5 to 25 ° C) It can be managed to be operated.

The pump 140 functions to supply the raw hydrogen peroxide filtered by the pretreatment filter 110 to the reverse osmosis membrane 150 at a high pressure.

That is, the pump 140 is operated to maintain a pressure higher than the osmotic pressure to make reverse osmosis, and may be designed to be automatically stopped by a pressure switch (not shown) when the suction pressure is low have.

In this case, the pump 140 is composed of two or more pumps, and when the flow rate is large, the pump 140 can be operated by recirculating the pump from the discharge portion of the one pump to the suction portion of the other pump.

The reverse osmosis membrane 150 functions to remove organic carbon and cations contained in the raw hydrogen peroxide, and is composed of a plurality of membranes and a vessel. Further, the reverse osmosis membrane 150 discharges the drainage flow (non-permeate) and the production flowrate (purified product) while the inlet flow rate (feed) drawn in at the set flow rate is filtered, Drainage flow and production flow rate can be visually checked through a flow meter while adjusting with a concentration adjustment valve (not shown).

The reverse osmosis membrane 150 uses a reverse osmosis unit for seawater and has an excellent removal efficiency of not only organic carbon (TOC) but also positive ions (Cr, Fe, Al, etc.).

Meanwhile, the size of the reverse osmosis membrane 150 can be determined in consideration of the size of materials to be filtered, such as Na ions. At this time, the reverse osmosis membrane 150 can filter particles (particle size of 0.001 μm) such as sugar, soluble salts and metal ions which can be confirmed through an electron microscope, (Particle size of 10-100 μm) such as hair, sand, etc., which can be filtered by filtering particles (oil particle, virus, claw, protein / enzyme, Filterable.

Moreover, the above-described refillable material is applicable not only to the reverse osmosis membrane 150 but also to the pretreatment resin 100 and the cation resin 160.

Here, to understand the reverse osmosis, you first need to know the osmosis phenomenon. The phenomenon of osmosis refers to the phenomenon that a dilute solution flows through a semipermeable membrane to a high concentration solution so as to become a concentration equilibrium. (High concentration: sugar, low concentration: water, semi-permeable membrane: skin), (high concentration: saline, low concentration: water, semi-permeable membrane: skin). At this time, if pressure is applied to the liquid at a high concentration, reverse osmosis occurs. That is, ions of a high concentration remain untransferred through the semipermeable membrane, and only the lean solution (water) passes through the semipermeable membrane and is transmitted to the low concentration portion. As a result, the high-concentration liquid is further concentrated and the low-concentration liquid is purified. As a representative example thereof, the reverse osmosis system for seawater is used for producing fresh water (fresh water) by passing seawater through salt osmosis at high pressure.

The cation resin 160 is a resin which is disposed behind the reverse osmosis membrane 150 as a processing resin and removes sodium ions, especially sodium ions, which have not been removed by the reverse osmosis membrane 150 after purification to be. At this time, the cation resin 160 is excellent in the removal rate of the positive ions, but it is necessary to improve the specification of the electronic grade hydrogen peroxide in consideration of the characteristics of the reverse osmosis membrane 150 in which the sodium removal rate drops sharply.

A filter (second filter) 170 is installed behind the cation resin 160 to collect the resin when the cation resin 160 leaks.

Therefore, the operation of the hydrogen peroxide purification system using the reverse osmosis system according to the first embodiment of the present invention is as follows.

First, the resin is put into the pretreatment resin 100 and the cation resin 160, and then the operation is prepared. That is, the waste resin is put into the pretreatment resin 100 and the cation resin 160 together with water, and cleaned with pure water after the resin is injected, so that the liquid level is sufficiently immersed in the resin layer during cleaning. The pretreatment resin 100 and the cation resin 160 are filled with pure water before the hydrogen peroxide is supplied.

Next, hydrogen peroxide is supplied to the pretreated resin (100) and the cation resin (160) and the operation is performed. At this time, if an abnormality of the reverse osmosis membrane 150 is not found in an opened state of the inlet and outlet valves (not shown) provided on the inlet and outlet lines of the pretreatment resin 100, Closing.

At this time, if regeneration is required, the filter resin used in the pretreatment resin 100 and the cation resin 160 squeezes the hydrogen peroxide with nitrogen, squeezes the remaining pure water with nitrogen, and regenerates the resin with steam.

Next, organic carbon is firstly removed from the raw hydrogen peroxide in the pretreatment resin 100, and when the resin leaks from the pretreatment resin 100, the pretreatment filter 110 collects the resin.

Next, the raw hydrogen peroxide from which the organic carbon has been removed is maintained at the set temperature in the heat exchanger 130, and when the pressure is lower than the osmotic pressure in order to make the reverse osmosis phenomenon, the pump 140 is operated to maintain the pressure higher than osmotic pressure do.

On the other hand, before the raw hydrogen peroxide is sent to the heat exchanger 130, a stabilizer may be added to protect the membrane of the reverse osmosis membrane 150. At this time, the stabilizer is supplied after the pump 140 is normally operated, and the stabilizer is stopped even when the pump 140 is stopped. Then, the reverse osmosis membrane 150 is stopped.

Next, the pressure and flow rate of the reverse osmosis membrane 150 are controlled by the line-up check and the operation of the pump 140, and the organic carbon (TOC) and the positive ions (Cr, Fe, Al or the like) is discharged, and the remainder is supplied to the cation resin 160.

Meanwhile, when the reverse osmosis membrane 150 is operated, a plurality of membranes and a part of the vessels may be set as a set, or may be operated for each set or comprehensively.

Next, the raw hydrogen peroxide is purified in the reverse osmosis membrane 150 while passing through the cationic resin 160, thereby removing sodium ions, especially sodium ions, which have not been removed.

Next, the raw hydrogen peroxide from which sodium (Na) ions have been removed collects when the resin leaks from the cation resin 160 through the filter 170, and finally the purified product is discharged.

Though not shown in the figure, the final refined product can be stored in a separate tank and used as a raw material for the concentration operation, and the concentrated product can be stored in a separate tank and used as an industrial product.

Further, when the reverse osmosis membrane 150 is washed with hydrogen peroxide, the reverse osmosis membrane is mainly composed of poly-amide, which is easily oxidized by hydrogen peroxide to dissolve the amine (NH 2 -). This appears as total nitrogen (TN) in hydrogen peroxide, and the reverse osmosis protection solution contains organic substances that can adversely affect the electronic grade etching.

At this time, the hydrogen peroxide cleaning initially cleans the total nitrogen and organic matter through the flushing operation, analyzes the total nitrogen and organics after the set time, and decides whether to extend or terminate the cleaning. Then, the hydrogen peroxide cleaning is carried out by the pump 140 in the same manner as the normal operation, but the purified product is sent to the industrial use without being sent to the concentrated raw material,

FIG. 4 is a schematic view of a hydrogen peroxide purification system using a reverse osmosis system according to a second embodiment of the present invention.

The hydrogen peroxide purification system using the reverse osmosis system according to the second embodiment of the present invention includes a stabilizer injection device 120, a pretreatment resin 100, a pretreatment filter 110, a heat exchanger 130, a pump 140, a reverse osmosis membrane 150, a cation resin 160, and a filter 170 in this order.

The present embodiment differs from the stabilizer injector 120 in that the stabilizer injector 120 is provided in front of the pretreatment resin 100, and the function and structure of each constituent element are the same as those of the first embodiment, and thus a detailed description thereof will be omitted.

At this time, the stabilizer is injected into the raw hydrogen peroxide by the stabilizer input device 120, and then the stabilizer is passed through the reverse osmosis membrane 150 and refined.

FIG. 5 is a schematic diagram of a hydrogen peroxide purification system using a reverse osmosis system according to a third embodiment of the present invention.

The hydrogen peroxide purification system using the reverse osmosis system according to the third embodiment of the present invention comprises a pump 140, a pretreatment resin 100, a pretreatment filter 110, a stabilizer input device 120, a heat exchanger 130, a reverse osmosis membrane 150, a cation resin 160, and a filter 170 in this order.

In the present embodiment, the function and structure of each component are the same as those of the first embodiment except that the pump 140 is installed in front of the pretreatment resin 100, and therefore detailed description will be omitted.

At this time, the present embodiment is implemented in such a manner that the raw hydrogen peroxide is first pumped by the pump 140 so as to maintain the pressure higher than the osmotic pressure, and then purified by passing through the reverse osmosis membrane 150.

FIG. 6 is a schematic diagram of a hydrogen peroxide purification system using a reverse osmosis system according to a fourth embodiment of the present invention.

The hydrogen peroxide refining system using the reverse osmosis system according to the fourth embodiment of the present invention includes a heat exchanger 130, a pretreatment resin 100, a pretreatment filter 110, a stabilizer input device 120, a pump 140, a reverse osmosis membrane 150, a cation resin 160, and a filter 170 in this order.

The present embodiment differs only in that the heat exchanger 130 is installed in front of the pretreatment resin 100, and the function and structure of each constituent element are the same as those of the first embodiment, and thus a detailed description thereof will be omitted.

At this time, the present embodiment is implemented in such a manner that the temperature of the raw hydrogen peroxide is maintained at a set temperature so as to maintain the recovery rate and the removal rate at a proper level through the heat exchanger 130, and then the purified hydrogen peroxide is passed through the reverse osmosis membrane 150 .

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.

Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the equivalents of the appended claims, as well as the appended claims.

100: Pretreatment resin
110: Pretreatment filter
120: Stabilizer input device
130: Heat exchanger
140: pump
150: reverse osmosis membrane
160: Cationic resin
170: filter

Claims (14)

A reverse osmosis membrane for removing organic carbon and cations contained in the raw hydrogen peroxide;
A processing resin for removing sodium ions from the raw hydrogen peroxide passing through the reverse osmosis membrane;
A filter for collecting resin leaking from the processing resin;
A pretreatment resin disposed in front of the reverse osmosis membrane to remove the solvent contained in the raw hydrogen peroxide and to perform pretreatment;
A pretreatment filter disposed behind the pretreatment resin to collect the resin leaking from the pretreatment resin;
A heat exchanger installed at the rear of the pretreatment filter and having an output temperature of 5 to 25 ° C;
And a stabilizer injecting device for injecting stabilizer into the raw hydrogen peroxide to prevent oxidation promotion,
A hydrogen peroxide purification system using a reverse osmosis system in which the pretreatment resin and the pretreatment filter are provided on a pretreatment line,
Wherein the heat exchanger maintains the temperature of the raw hydrogen peroxide at the predetermined temperature on the pretreatment line,
The pretreatment resin is a reproducible resin. The regeneration of the pretreatment resin is performed by squeezing hydrogen peroxide in the pretreatment resin using nitrogen, squeezing residual pure water in the pretreatment resin with nitrogen, regenerating the pretreatment resin with steam,
Wherein the pretreatment resin comprises a plurality of pretreatment resins arranged in parallel,
Wherein the pre-treatment resin and the pre-treatment filter are alternately arranged at least one,
Wherein the stabilizer charging device comprises a stabilizer tank in which the stabilizer is stored and a stabilizer pump for transporting the stabilizer stored in the stabilizer tank to the heat exchanger.
Hydrogen Peroxide Refining System Preventing Reduction of Life Time of Reverse Osmosis Membrane.
delete delete delete delete delete The method according to claim 1,
And a pump for supplying the raw hydrogen peroxide at a high pressure to the reverse osmosis membrane.
delete The method according to claim 1,
The pre-treatment resin is used for recycling the waste resin, and the pre-treatment filter is replaceable.
The method according to claim 1,
The hydrogen peroxide purification system is disposed in front of the reverse osmosis membrane in the order of the pretreatment resin, the pretreatment filter, the stabilizer charging device, the heat exchanger, and the pump.
The method according to claim 1,
The hydrogen peroxide purification system comprises a reverse osmosis system disposed in front of the reverse osmosis membrane in the order of a stabilizer charging device, a pretreatment resin, a pretreatment filter, a heat exchanger and a pump.
The method according to claim 1,
The hydrogen peroxide purification system comprises a pump, a pretreatment resin, a pretreatment filter, a stabilizer input device, and a heat exchanger in the order of a reverse osmosis membrane in the reverse of the reverse osmosis membrane.
The method according to claim 1,
The hydrogen peroxide purification system includes a heat exchanger, a stabilizer input device, a pretreatment resin, a pretreatment filter, and a pump arranged in the forward of the reverse osmosis membrane in the order of reverse osmosis.

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