KR101592017B1 - Display device and method for manufacturing the same - Google Patents

Abstract

A method of manufacturing a display device according to an embodiment of the present invention includes forming a thin film transistor connected to a gate line, a data line, a gate line, and a data line on a substrate, forming a barrier rib on the gate line, Forming a color filter in the barrier ribs, forming a first protective film on the color filters by an ink jet printing method to reduce a step between the color filters and the barrier ribs, forming a second protective film on the first protective film and the barrier ribs, Forming a pixel electrode connected to the thin film transistor on the second protective film, forming a common electrode on the second insulating substrate facing the first insulating substrate, forming a common electrode between the first insulating substrate and the second insulating substrate, To form a layer.

Ink jet, barrier rib, protective film, cell gap, light shielding member,

Description

TECHNICAL FIELD [0001] The present invention relates to a display device,

The present invention relates to a display device and a method of manufacturing the same.

The liquid crystal display device is one of the most widely used flat panel display devices, and is composed of two display panels having electrodes formed thereon and a liquid crystal layer interposed therebetween, and applying voltage to the electrodes to rearrange the liquid crystal molecules of the liquid crystal layer It is a display device that adjusts the amount of transmitted light.

Among the liquid crystal display devices, a structure which is mainly used at present is a structure in which electric field generating electrodes are provided on two display panels. Among them, a plurality of thin film transistors and pixel electrodes are arranged in the form of a matrix in one display panel (hereinafter referred to as 'thin film transistor display panel'), and red, green, and blue A structure in which a blue color filter is formed and a common electrode covers the entire surface is the mainstream.

However, since the pixel electrode and the color filter are formed on different display panels, it is difficult to precisely align the pixel electrode and the color filter, so that an alignment error may occur.

To solve this problem, a color filter on array (COA) has been proposed in which a color filter and a pixel electrode are formed on the same display panel.

When forming the color filter together with the thin film transistor, the color filter may be formed by an inkjet printing method. The ink-jet printing method is a technique in which liquid inks are jetted to a predetermined position partitioned by each ink to realize a colored image, and a plurality of color filters including a red filter, a green filter and a blue filter can be formed at one time, , Time and cost can be greatly reduced.

However, when the color filter is formed by the inkjet printing method, the characteristics of the color filter and the barrier rib are different and it is difficult to fill the color filter with the height of the barrier rib. When the height of the barrier ribs is low, the ink may be mixed with the neighboring pixels beyond the barrier ribs. When the height of the barrier ribs is high, a step due to the ink-unfilled portion is generated in the barrier ribs, and a step margin is formed in the protective film due to the step, thereby reducing the process margin for forming the light-

SUMMARY OF THE INVENTION Accordingly, the present invention has been made keeping in mind the above problems occurring in the prior art, and it is an object of the present invention to provide a display device and a method of manufacturing the same, in which the process margin of the light shielding member and the photosensitive film is not reduced even if the height of the barrier rib is increased.

According to another aspect of the present invention, there is provided a method of manufacturing a display device including forming a gate line, a data line, a thin film transistor connected to a gate line and a data line on a substrate, Forming a barrier rib on the transistor, forming a color filter in the barrier rib, forming a first protective layer on the color filter by an ink jet printing method to reduce a step between the color filter and the barrier rib, Forming a pixel electrode connected to the thin film transistor on the second protective film, forming a common electrode on the second insulating substrate facing the first insulating substrate, And forming a liquid crystal layer between the first insulating substrate and the second insulating substrate.

The second protective film may be formed by slit coating, and the step difference may be 1 탆 to 2 탆.

The color filter can be formed by an inkjet printing method.

And forming a spacing member and a light shielding member on the second protective film.

The spacers and the light shielding members may be formed simultaneously using one halftone optical mask, and the spacers and the light shielding members may be formed of an organic material colored with a black dye.

The optical mask may comprise a slit.

And forming a third protective film between the gate line, the data line, and the thin film transistor and the color filter.

According to another aspect of the present invention, there is provided a display device including a first insulating substrate, a gate line disposed on the first insulating substrate, a data line crossing the gate line, a thin film transistor connected to the gate line and the data line, A first upper protective film filled in the barrier ribs, a first upper protective film, and a second upper protective film formed on the barrier ribs, the first upper protective film being formed in the barrier ribs and the color filter having a lower height than the barrier ribs, A pixel electrode located on the second upper protective film and connected to the thin film transistor, a second insulating substrate facing the first insulating substrate, a common electrode located on the second insulating substrate, and a first insulating substrate, And a liquid crystal layer disposed in the liquid crystal layer.

And a light shielding member located above the second upper protective film and having a thickness of 1 탆 or more.

And a gap member made of the same material as the light shielding member while maintaining a gap between the first insulating substrate and the second insulating substrate.

The spacer and the light shielding member may be made of an organic material colored with a black dye.

The first upper protective film and the second upper protective film may be made of the same material.

A lower protective layer disposed between the thin film transistor, the gate line, and the data line and the barrier rib.

The barrier rib may include a lower barrier rib and an upper barrier rib that is narrower than the lower barrier rib. The barrier rib may be integrally formed with the barrier rib and may further include a gap material that maintains a gap between the first and second insulation substrates.

The spacers and barrier ribs may be made of an organic material colored with a black dye.

The display device according to the embodiment of the present invention can sufficiently secure the spacing and the process margin of the light shielding member even if the height of the partition wall is increased in order to prevent color mixing of the color filter.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

In the drawings, the thickness is enlarged to clearly represent the layers and regions. Like parts are designated with like reference numerals throughout the specification. Whenever a portion of a layer, film, region, plate, or the like is referred to as being "on" another portion, it includes not only the case where it is "directly on" another portion, but also the case where there is another portion in between. Conversely, when a part is "directly over" another part, it means that there is no other part in the middle.

1 is a schematic cross-sectional view of a liquid crystal display device according to an embodiment of the present invention.

1, the liquid crystal display includes a lower panel 100 and an upper panel 200 facing each other, and a liquid crystal layer 3 is formed between the two panels 100 and 200.

The upper panel 200 includes a common electrode (not shown).

A partition wall 361 is formed on a lower panel 100 including a thin film transistor (not shown), and a color filter 230 is filled in a region partitioned by the partition wall 361.

A first upper protective film 180q is formed on the color filter 230 and a second upper protective film 180r is formed on the entire surface of the substrate including the first upper protective film 180q and the barrier ribs 361. [

The first upper protective film 180q reduces the step between the barrier ribs 361 and the color filter 230 so that the second upper protective film 180r can be formed flat. The second upper protective film 180r is formed on the entire surface of the substrate to flatten the substrate. The first upper protective film 180q and the second upper protective film 180r may be formed of the same organic material.

A pixel electrode 191 is formed on the second upper protective film 180r and a light shielding member 220 and a spacing material 320 are formed on the pixel electrode 191.

In the embodiment of the present invention, the second upper protective film 180r is formed by reducing the step between the color filter 230 and the barrier ribs 361 by using the first upper protective film 180q to planarize the substrate. At this time, the second upper protective film 180r can provide a more flat surface due to the first upper protective film 180q.

Unlike the embodiment of the present invention, if a protective film is formed with a single film, the step between the color filter 230 and the partition wall 361 may form a stepped portion of the protective film, so that the protective film may not be flat. The higher the height of the partition wall 361, the larger the step becomes. The larger the step, the thicker the protective film is to remove the step.

On the other hand, the cell gap between the two display panels 100 and 200 has a predetermined gap, but if the thickness of the protective film is increased, the cell gap is reduced, and the process margin for forming the spacers 320 and the light shielding member 220 is reduced.

The light shielding member 220 can prevent light leakage if the light shielding member 220 is formed over a certain thickness. However, if the cell gap is reduced, the light shielding member 220 can not completely prevent the light shielding because the thickness of the light shielding member 220 is reduced.

However, in the embodiment of the present invention, since the step between the color filter 230 and the barrier ribs 361 is reduced by the first upper protective film 180q and the second upper protective film 180r is formed, the second upper protective film 180r And a sufficient cell gap can be ensured. The light shielding member 220 is preferably formed to a thickness of 1 탆 or more.

2 is an equivalent circuit diagram of a pixel of a liquid crystal display according to an exemplary embodiment of the present invention.

2, the liquid crystal display according to the present embodiment includes a plurality of signal lines including a plurality of gate lines GL, a plurality of data lines DLa and DLb and a plurality of sustain electrode lines SL, And a pixel PX. The liquid crystal display device includes a lower panel 100, an upper panel 200, and a liquid crystal layer 3 interposed therebetween.

Each pixel PX includes a pair of subpixels PXa and PXb and the subpixels PXa and PXb are connected to the switching elements Qa and Qb and liquid crystal capacitors Clca and Clcb and a storage capacitor, (Csta, Cstb).

The switching elements Qa and Qb are three terminal elements such as a thin film transistor provided on the lower panel 100. The control terminal is connected to the gate line GL and the input terminal is connected to the data lines DLa and DLb. And the output terminal is connected to the liquid crystal capacitors Clca and Clcb and the storage capacitors Csta and Cstb.

The liquid crystal capacitors Clca and Clcb are formed by using the sub-pixel electrodes 191a and 191b and the common electrode 270 as two terminals and the liquid crystal layer 3 between the two terminals as a dielectric.

The storage capacitors Csta and Cstb serving as auxiliary capacitors of the liquid crystal capacitors Clca and Clcb are formed by stacking the sustain electrode lines SL and the sub pixel electrodes 191a and 191b provided in the lower panel 100, And a predetermined voltage such as the common voltage Vcom is applied to the sustain electrode lines SL.

The voltages charged in the two liquid crystal capacitors (Clca, Clcb) are set so as to slightly differ from each other. For example, the data voltage applied to the liquid crystal capacitor Clca is always set to be lower or higher than the data voltage applied to the liquid crystal capacitor Clcb. By appropriately adjusting the voltages of the two liquid crystal capacitors Clca and Clcb, the image viewed from the side can be made as close as possible to the image viewed from the front, thereby improving the lateral visibility of the liquid crystal display device.

A liquid crystal display according to an embodiment of the present invention will now be described in more detail with reference to FIGS. 3 to 7. FIG.

FIG. 3 is a layout diagram of a liquid crystal display device according to an embodiment of the present invention, FIG. 4 is a cross-sectional view of the liquid crystal display device of FIG. 3 cut along line IV-IV, FIG. 6 is a layout view showing a pixel electrode of the liquid crystal display device of FIG. 3, and FIG. 7 is a plan view of a basic electrode of a pixel electrode according to an embodiment of the present invention. Fig.

3 to 6, a liquid crystal display according to an exemplary embodiment of the present invention includes a lower panel 100, an upper panel 200, and a liquid crystal layer (not shown) 3).

First, the lower panel 100 will be described.

A plurality of gate lines 121 and a plurality of storage electrode lines 131 and 135 are formed on the insulating substrate 110.

The gate line 121 transmits the gate signal and extends mainly in the horizontal direction. Each gate line 121 includes a plurality of first and second gate electrodes 124a and 124b protruding upward.

The storage electrode lines 131 and 135 include a stem 131 extending substantially in parallel with the gate line 121 and a plurality of storage electrodes 135 extending therefrom. do. The shape and arrangement of the sustain electrode lines 131 and 135 may be modified in various forms.

A gate insulating layer 140 is formed on the gate line 121 and the sustain electrode lines 131 and 135. A plurality of semiconductors 154a and 154b made of amorphous or crystalline silicon are formed on the gate insulating layer 140, Respectively.

A plurality of pairs of ohmic contacts 163a, 163b, 165a and 165b are formed on the semiconductors 154a and 154b, and the resistive contact members 163a, 163b, 165a, and 165b are formed of silicide or an n + hydrogenated amorphous silicon in which an n-type impurity is highly doped.

A plurality of pairs of data lines 171a and 171b and a plurality of pairs of first and second drain electrodes 175a and 175b are formed on the resistive contact members 163a, 163b, 165a and 165b and the gate insulating layer 140, And 175b are formed.

The data lines 171a and 171b transmit data signals and extend mainly in the vertical direction and cross the gate lines 121 and the stem lines 131 of the sustain electrode lines. The data lines 171a and 171b include first and second source electrodes 173a and 173b extending toward the first and second gate electrodes 124a and 124b and bent in a U shape, The second source electrodes 173a and 173b face the first and second drain electrodes 175a and 175b around the first and second gate electrodes 124a and 124b, respectively.

The first and second drain electrodes 175a and 175b extend upward from one end partially surrounded by the first source electrode 173a and the opposite end may have a large area for connection with another layer.

However, the shapes and arrangements of the data lines 171a and 171b including the first and second drain electrodes 175a and 175b may be modified into various forms.

The first and second gate electrodes 124a and 124b and the first and second source electrodes 173a and 173b and the first and second drain electrodes 175a and 175b are electrically connected to the first and second semiconductors 154a and 154b, And the channel of the first and second thin film transistors Qa and Qb is connected to the first and second source electrodes (Qa and Qb) 173a and 173b and the first and second semiconductors 154a and 154b between the first and second drain electrodes 175a and 175b.

The resistive contact members 163a, 163b, 165a and 165b are present only between the underlying semiconductor layers 154a and 154b and the data lines 171a and 171b and the drain electrodes 175a and 175b thereon, . Semiconductors 154a and 154b are exposed between the source electrodes 173a and 173b and the drain electrodes 175a and 175b as well as between the data lines 171a and 171b and the drain electrodes 175a and 175b.

A lower protective film 180p made of silicon nitride or silicon oxide is formed on the data lines 171a and 171b, the drain electrodes 175a and 175b and the exposed semiconductor portions 154a and 154b.

A partition wall 361 is formed on the lower protective film 180p. The barrier ribs 361 are formed along the gate lines 121 and the data lines 171a and 171b, and are also formed over the thin film transistors. The region surrounded by the barrier ribs 361 is a rectangular region filled with the color filter 230 and the first upper protective film 180q.

The color filter 230 is filled in the filling region and the height of the color filter 230 is lower than the partition wall 361.

A first upper protective film 180q is formed on the barrier ribs 361 and the color filters 230. [ The first upper protective film 180q reduces a step due to a difference in height between the barrier ribs 361 and the color filters 230.

A second upper protective film 180r is formed on the first upper protective film 180q and the barrier ribs 361. The second upper protective film 180r is formed over the entire substrate to planarize the substrate. The first upper protective film 180q and the second upper protective film 180r may be formed of the same organic material.

The first upper protective film 180q and the second upper protective film 180r may be formed of the same material as the first upper protective film 180q and the second upper protective film 180r, The boundary between the two membranes may not be distinguished.

A plurality of contact holes 185a and 185b for exposing the first and second drain electrodes 175a and 175b are formed in the second upper protective film 180r, the first upper protective film 180q, the color filter 230, and the lower protective film 180p. Is formed.

A plurality of pixel electrodes 191 are formed on the second upper protective film 180r.

Each of the pixel electrodes 191 includes first and second sub-pixel electrodes 191a and 191b separated from each other with a gap 91 therebetween. The first and second sub-pixel electrodes 191a and 191b Each of which includes at least one of the basic electrode 199 shown in Fig. 7 or a modification thereof.

7, the basic electrode 199 will be described in detail.

As shown in FIG. 7, the overall shape of the base electrode 199 is rectangular, and includes a cruciform stem made up of a transverse stem 193 and a vertical stem base 192 that is orthogonal thereto. The basic electrode 199 is divided into a first sub-area Da, a second sub-area Db, a third sub-area Dc, and a fourth sub-area Dc by the transverse strike line 193 and the vertical strike line 192, And each sub-area Da-Dd includes a plurality of first to fourth fine branches 194a, 194b, 194c, and 194d.

The first fine arcuate portion 194a extends obliquely from the transverse arcuate portion 193 or the vertical arbor portion 192 in the upper left direction and the second fine arbor portion 194b extends obliquely from the transverse arcuate portion 193 or the vertical stripe portion 192, And extends obliquely from the base 192 in the upper right direction. The third fine arcuate portion 194c extends from the transverse arcuate portion 193 or the vertical arbor portion 192 in the lower left direction and the fourth fine arbor portion 194d extends from the transverse arbor portion 193 or the vertical arbor portion 192. [ And extends obliquely downward in the right-down direction from the upper side 192.

The first to fourth fine branches 194a to 194d form an angle of approximately 45 degrees or 135 degrees with respect to the gate line 121 or the transverse branch 193. Further, the fine branches 194a-194d of the neighboring two sub-regions Da-Dd may be orthogonal to each other.

Although not shown, the width of the fine branch portions 194a-194d may become wider as they approach the transverse branch base 193 or the vertical branch base 192. [

Referring again to FIGS. 2 to 6, the first and second sub-pixel electrodes 191a and 191b include one basic electrode 199, respectively. The area occupied by the second sub-pixel electrode 191b in the entire pixel electrode 191 may be larger than the area occupied by the first sub-pixel electrode 191a. At this time, the second sub- The size of the basic electrode 199 is formed to be different from the area of the pixel electrode 191a by 1.0 to 2.2 times.

The second sub-pixel electrode 191b includes a pair of branches 195 extending along the data line 171. The second sub- Pixel electrode 191b and the data line 171 and is connected at the lower end of the first sub-pixel electrode 191b. One of the two is extended and physically and electrically connected to the second drain electrode 175b through the contact hole 185b. The first sub-pixel electrode 191a is connected to the first drain electrode 175a through a contact hole 185a.

The first and second sub-pixel electrodes 191a and 191b receive the data voltages from the first and second drain electrodes 175a and 175b.

On the pixel electrode 191, a spacing member 320 and a light shielding member 220 are formed. The light shielding member 220 is formed along the gate line 121 and the data line 171 and the spacers 320 may include portions corresponding to the thin film transistors.

The spacer 320 and the light shielding member 220 may be formed using respective optical masks, but may be formed simultaneously using one optical mask. At this time, the spacing member 320 and the light shielding member 220 may be formed of an organic material colored with a black dye.

An alignment film 11 is formed on the spacers 320 and the light shielding member 220.

Next, the upper display panel 200 will be described.

In the upper panel 200, a common electrode 270 is formed on a transparent insulating substrate 210, and an alignment layer 21 is formed on the common electrode 270.

The manufacturing method of the thin film transistor substrate for a liquid crystal display of Figs. 3 and 4 will be described with reference to Figs. 8 to 12. Fig.

8 to 12 are sectional views sequentially showing the method of manufacturing the thin film transistor substrate for a liquid crystal display shown in Figs. 3 and 4. Fig.

A sustain electrode line including a gate line 121 and a sustain electrode 135 including gate electrodes 124a and 124b is formed on an insulating substrate 110 as shown in FIG.

9, a silicon oxide film or the like is deposited on the substrate 110 including the gate line 121 to form a gate insulating film 140. Next, as shown in FIG.

An amorphous silicon film not doped with an impurity and an amorphous silicon film doped with an impurity are formed on the gate insulating film 140 and patterned to form the resistive contact layer pattern and the semiconductors 154a and 154b.

Thereafter, a conductive material is deposited on the resistive contact layer pattern and then patterned to form data lines 171a and 171b and drain electrodes 175a and 175b including the source electrodes 173a and 173b.

The resistive contact layer patterns exposed between the source electrodes 173a and 173b and the drain electrodes 175a and 175b are used as a mask to form resistive contact layers 163a and 163b and 165a and 165b.

Although the semiconductors 154a and 154b, the resistive contact layers 163a and 163b and 165a and 165b, the data lines 171a and 171b and the drain electrodes 175a and 175b can be formed using respective masks, It can be formed together using photoresist patterns having different thicknesses. In this case, the ohmic contact layer has the same planar pattern as the data line and the drain electrode.

The lower protective film 180p is formed on the data lines 171a and 171b and the drain electrodes 175a and 175b as shown in Fig. An organic insulating layer is formed on the lower protective layer 180p and then patterned to form the barrier ribs 361. [ At this time, the barrier ribs 361 may be formed to have a thickness of 4.0 to 5.0 탆 so as to prevent the color filters formed thereafter from being mixed.

As shown in Fig. 11, a color filter 230 is formed in a pixel defined by a partition wall 361. [ The color filter 230 can be formed by an inkjet printing method. In the inkjet printing method, the color filter solution is dripped while moving the inkjet head, and the color filter solution is dried.

The first upper protective film 180q is formed in the barrier ribs 361 to reduce the step between the barrier ribs 361 and the color filters 230. [ The first upper protective film 180q can be formed by an inkjet printing method like a color filter.

If the thickness of the color filter 230 is too high, it is difficult to adjust the amount of ink for forming the first upper protective film 180q because the step between the barrier rib 361 and the color filter 230 is reduced. Therefore, it is preferable that the color filter 230 is formed to be about 1 μm to 2 μm lower than the barrier ribs 361.

As shown in FIG. 12, a second upper protective film 180r is formed on the color filter 230 and the first upper protective film 180q. The second upper protective film 180r may be formed by a method such as slit coating. In the slit coating, nozzles arranged at regular intervals spray organic materials while passing through the substrate.

The difference in height between the barrier ribs 361 and the color filters 230 is reduced by the first upper protective film 180q so that the substrate can be easily planarized without forming the second upper protective film 180r thick. Even if the first upper protective film 180q is formed higher than the barrier ribs 361, since the second upper protective film 180r is further formed, the step due to the first upper protective film 180q can be removed. Further, when forming the first upper protective film 180q, even if the first upper protective film 180q flows over the barrier ribs 361, it does not cause a problem.

Contact holes 185a and 185b are then formed by patterning the second upper protective film 180r, the first upper protective film 180q, the barrier ribs 361 and the lower protective film 180p. When the second upper protective film 180r and the first upper protective film 180q are photosensitive organic materials, the two films 180r and 180q can be patterned only by photolithography. Thereafter, an etching process may be added to pattern the barrier ribs 361 and the lower protective film 180p. The second upper protective film 180r and the first upper protective film 180q may also be patterned by a photolithography process.

Then, as shown in FIG. 4, the pixel electrode 191 is formed on the second upper protective film 180r. Then, a photosensitive organic material layer is formed on the pixel electrode 191, exposed using a photomask having a slit pattern, and then developed to form a light shielding member 220 and a spacing member 320 having different thicknesses.

13 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

The liquid crystal display device according to the embodiment of FIG. 13 differs from the embodiment of FIGS. 3 and 4 in the form of the barrier ribs and spacing members. The barrier ribs include lower barrier ribs 361a and 361b and upper barrier ribs 362a and 362b and a gap material 363 is formed integrally with the upper barrier ribs 362a and 362b. The second upper protective film 180r covers the upper partition walls 362a and 362b and the first upper protective film 180q and exposes the spacers 363. The second upper protective film 180r may be formed so as to cover the gap material 363 as well. The lower barrier ribs 361a and 361b and the upper barrier ribs 362a and 362b may be formed of a black organic material and used as a light shielding member for preventing light leakage. The spacers 363 may also be formed of a black organic material.

The method of forming the liquid crystal display device having such a structure differs from the method of manufacturing the liquid crystal display device described with reference to FIGS. 8 to 12 in the process of forming the barrier ribs and the spacers. That is, the lower partitions 361a and 361b are formed, and the upper partitions 362a and 362b and the spacing part 363 are simultaneously formed thereon. At this time, the upper barrier ribs 362a and 362b having a different height and the spacing member 363 can be formed at the same time by using the exposure method through a half-tone mask. The color filter 230 and the first upper protective film 180q are formed by an ink jet printing method and the second upper protective film 180r is formed by a method such as slit coating.

Although the liquid crystal display device has been described as an example in the above description, the present invention can also be applied to an organic light emitting display device in which barrier ribs are formed to partition a region and fill a color filter or a light emitting material in the region.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, Of the right.

1 is a schematic cross-sectional view of a liquid crystal display device according to an embodiment of the present invention.

2 is an equivalent circuit diagram of a pixel of a liquid crystal display according to an exemplary embodiment of the present invention.

3 is a layout diagram of a liquid crystal display device according to an embodiment of the present invention.

FIG. 4 is a cross-sectional view of the liquid crystal display of FIG. 3 taken along the line IV-IV.

5 is a layout diagram of a thin film transistor panel except the pixel electrode of the liquid crystal display of FIG.

6 is a layout diagram showing a pixel electrode of the liquid crystal display device of FIG.

7 is a plan view showing a basic electrode as a basic element of a pixel electrode according to an embodiment of the present invention.

8 to 12 are sectional views sequentially showing the method of manufacturing the thin film transistor substrate for a liquid crystal display shown in Figs. 3 and 4. Fig.

13 is a cross-sectional view of a liquid crystal display device according to another embodiment of the present invention.

Description of the Related Art

3: liquid crystal layer 11, 21: alignment layer

31: liquid crystal molecule 100: thin film transistor display panel

110, 210: insulating substrate 121: gate line

124a, 124b: gate electrode 131: sustain electrode line

135: sustain electrode

140: gate insulating film 154a, 154b: semiconductor

163a, 163b, 165a, 165b: resistive contact member

171a and 171b: data lines 173a and 173b: source electrodes

175a, 175b: drain electrode 180p: lower protective film

180q: first upper protective film 180r: second upper protective film

185a 185b: contact hole 191: pixel electrode

191a: first sub-pixel electrode 191b: second sub-pixel electrode

200: Common electrode plate

230: color filter 270: common electrode

Claims (20)

Forming a gate line, a data line, and a thin film transistor connected to the gate line and the data line on the first insulating substrate, Forming a barrier on the gate, the data line, and the thin film transistor; Forming a color filter in the partition wall, Forming a first organic layer on the color filter by an inkjet printing method to reduce a step between the color filter and the partition, Forming a first organic layer on the first organic layer and a second organic layer on the barrier, Forming a pixel electrode connected to the thin film transistor on the second organic layer, Forming a common electrode on a second insulating substrate facing the first insulating substrate, and And forming a liquid crystal layer between the first insulating substrate and the second insulating substrate. In claim 1, The second organic film is a method of manufacturing a display device for flattening the barrier rib and the first organic film 3. The method of claim 2, Wherein the step is 1 占 퐉 to 2 占 퐉. 3. The method of claim 2, Wherein the color filter is formed by an inkjet printing method. The method of claim 1, The second organic And forming a spacer and a light shielding member on the film. The method of claim 5, Wherein the spacers and the light shielding members are simultaneously formed using one halftone optical mask. The method of claim 6, Wherein the spacers and the light shielding members are formed of an organic material colored with a black dye. 8. The method of claim 7, Wherein the optical mask includes a slit. The method of claim 1, Wherein the color filter is formed by an inkjet printing method. The method of claim 9, And forming a protective film between the gate line, the data line, and the thin film transistor and the color filter. A first insulating substrate, A gate line disposed on the first insulating substrate, A data line crossing the gate line, A thin film transistor connected to the gate line and the data line, The gate lines, the data lines, and the barrier ribs located above the thin film transistors, A color filter which is filled in the region partitioned by the partition and is lower in height than the partition, A first organic film filled in the barrier rib, The first organic film and the second organic film located on the barrier, A pixel electrode located on the second organic layer and connected to the thin film transistor, A second insulating substrate facing the first insulating substrate, A common electrode located on the second insulating substrate, and And a liquid crystal layer disposed between the first insulating substrate and the second insulating substrate, . 12. The method of claim 11, And the second organic film flattens the partition and the first organic film. 12. The method of claim 11, And a light shielding member located above the second organic film and having a thickness of 1 占 퐉 or more. The method of claim 13, Further comprising a spacing member made of the same material as said light-shielding member while maintaining a gap between said first insulating substrate and said second insulating substrate. The method of claim 14, Wherein the spacer and the light shielding member are made of an organic material colored with a black dye. 12. The method of claim 11, Wherein the first organic film and the second organic film are made of the same material. 17. The method of claim 16, And a protective film located between the thin film transistor, the gate line, and the data line and the barrier rib. 12. The method of claim 11, Wherein the barrier rib includes a lower barrier rib and an upper barrier rib that is narrower than the lower barrier rib. The method of claim 18, And a spacing member that is formed integrally with the partition and that maintains a gap between the first insulating substrate and the second insulating substrate. 20. The method of claim 19, Wherein the spacers and the barrier ribs are made of an organic material colored with a black dye.

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