KR101546576B1 - Black matrix composition of a touch panel for photolithography - Google Patents

Abstract

The present invention relates to a black matrix composition for photolithography for a touch panel, wherein the black matrix composition for photolithography for a touch panel according to the present invention comprises a red pigment, a yellow pigment, a blue pigment and a violet pigment A silicon-based photo-curable binder, a polyfunctional monomer, an adhesion promoter, and an organic solvent to minimize cracks in the wiring or electrode pattern formed on the black matrix, and the surface roughness of the black matrix To provide improved insulation, and to improve the heat resistance and durability of the black matrix.

Description

TECHNICAL FIELD [0001] The present invention relates to a black matrix composition for photolithography for a touch panel,

The present invention relates to a black matrix composition for photolithography for touch panels, and more particularly, to a black matrix composition for photolithography for touch panels that can be used in the manufacture of touch panels.

2. Description of the Related Art Recently, various electronic devices have become popular, and various personal portable electronic devices such as a smart phone, a tablet PC, and the like have become widespread. Since it is cumbersome to provide a separate input device such as a keyboard and a mouse in using such a personal portable electronic device, a touch panel capable of receiving input through a user's touch on the display screen of the personal portable electronic device is used , Recently, the touch panel is also applied to a fixed type electronic device such as a TV and a monitor.

The touch panel is disposed on a top surface of a display panel such as an LCD, an OLED or the like, and receives a touch input from a user. Generally, the touch panel includes a touch sensing area for sensing a touch and a wiring area for forming a wiring pattern for sensing signals from the touch sensing area. In this regard, in the case of the touch sensing area, a substantially transparent electrode pattern for touch sensing is formed to sense the touch, while a metal wiring or the like is formed in the wiring area, so that the metal wiring formed in the wiring area is not visible from above A black matrix is formed in the wiring region.

A screen printing method can be used as the black matrix forming method. However, in the case of black matrix screen printing, the thickness of the final black matrix is about 15 to 30 [mu] m so that the thickness of the black matrix is about 5 to 10 [mu] m, Mu m and is considerably thick. Therefore, there is a high possibility that an electrode pattern such as ITO or a wiring portion due to a black matrix printed step may crack.

Thus, a photolithography method may be used as a black matrix forming method, and carbon black is currently used. However, since carbon black has a particle size of several micrometers when carbon black is coated with a resin in order to increase the insulating property, the surface roughness of the finally formed black matrix increases, and thus, when wiring or electrode pattern is deposited on the black matrix, (pin hole) is generated, so that it can be energized without being isolated. In addition, a general binder used in a black matrix composition when forming a black matrix by a photolithography method is low in heat resistance, and durability is poor when a wiring or an electrode pattern is deposited on a black matrix, resulting in lower product yield.

A problem to be solved by the present invention is to provide a black matrix composition for photolithography for a touch panel capable of minimizing cracks in wiring or electrode patterns formed on a black matrix by reducing the thickness of the black matrix to 3 m or less.

Another object of the present invention is to provide a black matrix composition for photolithography for a touch panel capable of lowering the surface roughness of a black matrix and providing improved insulation.

Another object of the present invention is to provide a black matrix composition for photolithography for a touch panel capable of improving heat resistance and durability of a black matrix.

The problems of the present invention are not limited to the above-mentioned problems, and other problems not mentioned can be clearly understood by those skilled in the art from the following description.

Disclosure of the Invention In order to solve the above problems, a black matrix composition for photolithography according to an embodiment of the present invention includes insulating organic particles including a red pigment, a yellow pigment, a blue pigment, and a violet pigment in a size of several tens of nano- Dispersed and mixed dispersions, silicone-based photocurable binders, polyfunctional monomers, photoinitiators, adhesion promoters, and organic solvents.

According to another aspect of the present invention, a silicone-based photocurable binder is characterized by comprising at least one of a compound represented by the following general formula (1) and a compound represented by the following general formula (2).

[Chemical Formula 1]

(2)

R1 is an organic functional group having photo-curability and contains at least one carbon atom directly covalently bonded to a silicon atom in a unit of one unit; R2 is an ether group forming an aliphatic carbon ring, an alkyl group having 1 to 30 carbon atoms, Functional group, and contains at least one carbon atom directly covalently bonded to a silicon atom in a unit of one unit.

According to another aspect of the present invention, there is provided a silicone-based photocurable binder comprising both a compound represented by the formula (1) and a compound represented by the formula (2), wherein, in the moles of the total organic functional groups combined with the organic functional groups contained in R1 and R2, R1 Is 20 to 50 mol%, and the organic functional group of R 2 is 50 to 80 mol%.

According to still another aspect of the present invention, the adhesion promoter is an imidazole silane based system.

The details of other embodiments are included in the detailed description and drawings.

The present invention can provide a black matrix composition for a photolithography for a touch panel capable of minimizing cracks in a wiring or an electrode pattern formed on a black matrix by reducing the thickness of the black matrix to 3 m or less.

The present invention can provide a black matrix composition for photolithography for a touch panel capable of lowering the surface roughness of a black matrix and providing improved insulation.

The present invention can provide a black matrix composition for photolithography for a touch panel capable of improving heat resistance and durability adhesion of a black matrix.

The effects according to the present invention are not limited by the contents exemplified above, and more various effects are included in the specification.

1 to 3 are process sectional views of a touch panel using a black matrix composition for photolithography for a touch panel according to an embodiment of the present invention.
4 is a perspective view of a touch panel manufactured by a method for manufacturing a touch panel using a black matrix composition for photolithography for a touch panel according to an embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims.

It is to be understood that elements or layers are referred to as being "on " other elements or layers, including both intervening layers or other elements directly on or in between.

Like reference numerals refer to like elements throughout the specification.

The sizes and thicknesses of the individual components shown in the figures are shown for convenience of explanation and the present invention is not necessarily limited to the size and thickness of the components shown.

It is to be understood that each of the features of the various embodiments of the present invention may be combined or combined with each other partially or entirely and technically various interlocking and driving is possible as will be appreciated by those skilled in the art, It may be possible to cooperate with each other in association.

Hereinafter, various embodiments of the present invention will be described in detail.

The black matrix composition for photolithography for a touch panel according to an embodiment of the present invention includes a dispersed and mixed dispersion of insulating organic particles including red pigment, yellow pigment, blue pigment and purple pigment having a size of several tens of nano, Binders, multifunctional monomers, adhesion promoters and organic solvents. Hereinafter, each component of the black matrix composition for photolithography for a touch panel will be described in more detail.

Silicon system Photocuring  bookbinder

The silicon-based photocurable binder includes at least one of a compound represented by the following Chemical Formula 1 and a compound represented by Chemical Formula 2 below. The fact that the silicon-based photocurable binder contains at least one of the compound represented by the formula (1) and the compound represented by the formula (2) may include any one of the compound represented by the formula (1) and the compound represented by the formula (2) And the compound represented by the general formula (2).

First, the compound represented by the formula (1) is as follows.

[Chemical Formula 1]

Formula (1) represents the unit of the polysilsesquioxane molecule. R1 is an organic functional group having photo-curability. R1 may contain at least one carbon atom directly covalently bonded to a silicon atom in a unit of one unit as shown in formula (1).

Next, the compound represented by the formula (2) is as follows.

(2)

Formula (2) represents the unit of the polysilsesquioxane molecule. R2 is an organic functional group selected from the group consisting of an ether group forming an aliphatic carbon ring, an alkyl group having from 1 to 30 carbon atoms, and an aromatic functional group. R2 may contain at least one carbon atom directly covalently bonded to a silicon atom in a unit of one unit as shown in formula (2).

The silicon-based photocurable binder may contain both a compound represented by the formula (1) and a compound represented by the formula (2). When the silicon-based photocurable binder contains both the compound represented by the formula (1) and the compound represented by the formula (2), the organic functional groups contained in R1 in the moles of the total organic functional groups combined with the organic functional groups contained in R1 and R2 are 20 To 50 mol%, and the organic functional group contained in R2 may be 50 to 80 mol%.

In the production of a silicone-based photocurable binder, in addition to the above-mentioned compounds, a solvent generally used in the production of a binder may be used.

The black matrix composition for photolithography for a touch panel according to an embodiment of the present invention may include a silicon-based photo-curable binder to improve the heat resistance of the black matrix composition. In addition, when the black matrix composition for photolithography for a touch panel is used in manufacturing a touch panel, the durability of the electrode pattern and wiring formed in the black matrix can be improved.

Silicon system Photocuring  Of binder Manufacturing example  One

50 g of 3-acryloxypropyltrimethoxysilane, 116 g of phenyltrimethoxysilane, 38.7 g of a 1.6% hydrochloric acid aqueous solution and 160 ml of toluene were charged into a 500 ml round bottom flask and stirred at 30 DEG C for 18 hours to obtain a resin solution. The obtained resin solution was washed with water, then dried and concentrated. Propylene glycol methyl ether acetate (PGMEA) was added to obtain a silicone-based photocurable binder having an oil-type molecular weight of 2,500, a distribution of 2.1 and a solid content of 60% ).

Dispersion

The dispersion contains insulating organic particles comprising a red pigment, a yellow pigment, a blue pigment and a violet pigment in a size of several tens of nanometers, and the insulating organic particles are dispersed and mixed in the dispersion. The dispersion may be a dispersion in which insulating organic particles containing a red pigment are dispersed, a dispersion in which insulating organic particles containing a yellow pigment are dispersed, a dispersion in which insulating organic particles are dispersed in which a blue pigment is dispersed, and an insulating organic particle containing a purple pigment Or may be produced by mixing dispersed dispersions.

The dispersion contains insulating organic particles including red pigment, yellow pigment, blue pigment and purple pigment so that the black matrix is black. That is, the dispersion contains insulating organic particles including red pigment, yellow pigment, blue pigment, and violet pigment, so that the black matrix has shading properties.

Insulating organic particles, including red pigments, yellow pigments, blue pigments and purple pigments, contained in the dispersion are several ten nanometers in size. Carbon black may be used to provide light shielding in the black matrix. However, in order to increase the insulating property, when the carbon black is coated with a resin, the surface roughness of the black matrix is increased because the particle size thereof is several micrometers, Pin holes may be formed at the time of forming the electrode patterns or the wirings, and insulation may not be secured. In the black matrix composition for photolithography for a touch panel according to an exemplary embodiment of the present invention, insulating organic particles including a red pigment, a yellow pigment, a blue pigment, and a violet pigment having a size of several tens of nanometers are included in the dispersion to provide shielding properties, The surface roughness of the black matrix can be reduced and the insulating property of the black matrix can be improved.

Of the red pigment dispersion Manufacturing example  2

40 g of CI Pigment Red 254, 40 g of Binder A polymerized in Production Example 1, 30 g of BYK-2163 (BYK chemie) as a dispersant, and solvent PGMEA were charged into a mixing tank so that the total weight was 1000 g. The mixture was pre-mixed at 100 to 200 rpm for 30 minutes and dispersed for 6 hours at 2000 rpm using a bead mill. Here, 0.1 mm zirconia beads were used as the beads.

Of the yellow pigment dispersion Manufacturing example  2

40 g of CI Pigment Yellow 139, 40 g of Binder A polymerized in Production Example 1, 30 g of BYK-161 (BYK chemie) as a dispersant, and solvent PGMEA were charged into a mixing tank so that the total weight was 1000 g. The mixture was pre-mixed at 100 to 200 rpm for 30 minutes and then dispersed at 2000 rpm for 6 hours using a bead mill. Here, 0.1 mm zirconia beads were used as the beads.

Of the blue pigment dispersion Manufacturing example  2

40 g of CI Pigment Blue 15: 6, 40 g of Binder A polymerized in Production Example 1, 30 g of BYK-2163 (BYK chemie) as a dispersant, and solvent PGMEA were charged into a mixing tank so that the total weight was 1000 g. The mixture was pre-mixed at 100 to 200 rpm for 30 minutes and then dispersed at 2000 rpm for 6 hours using a bead mill. Here, 0.1 mm zirconia beads were used as the beads.

Of a purple pigment dispersion Manufacturing example  2

40 g of CI Pigment Violet 23, 40 g of Binder A polymerized in Production Example 1, 35 g of Solsperse 32500 (Lubrizol) as a dispersing agent, and solvent PGMEA were charged into a mixing tank so that the total weight was 1000 g. 30 to 100 rpm, followed by dispersion at 2000 rpm for 6 hours using a bead mill. Here, 0.1 mm zirconia beads were used as the beads.

Multifunctional Monomer

The polyfunctional monomer serves to form a photoresist phase by light, and is not particularly limited. Various polyfunctional monomers conventionally used in the art can be used. For example, dipentaerythritol hexaacryl Rate (DPHA) can be used.

Photoinitiator

The photoinitiator is a material for initiating the polymerization reaction by absorbing energy at the time of exposure. Various photoinitiators conventionally used in the related art can be used. For example, OXE-02 (produced by Ciba Geigy Corp. ) Can be used.

Adhesion promoter

The adhesion promoter is used for increasing the adhesion of the black matrix in forming the black matrix, and it is possible to use an imidazole silane based adhesion promoter.

Organic solvent

The organic solvent used for dissolving or dispersing the black matrix composition for photolithography for a touch panel is not particularly limited and various organic solvents conventionally used in the art can be used. For example, PGMEA Can be used.

Example  1 to 4

Binder A prepared in Preparation Example 1, DPHA as a polyfunctional monomer, OXE-02 as a photoinitiator and PGMEA as a solvent were charged into a stirrer and stirred for 30 minutes. Thereafter, the dispersion of Production Example 2, the dispersion of Production Example 3, the dispersion of Production Example 3, and the dispersion of Production Example 4 were fed and imidazole silane compound IM-1000 (Japan Energy Company), which is an adhesion promoter, PGMEA was added thereto so as to be 100 g. The mixture was stirred for 4 hours to obtain a composition.

[Table 1]

Comparative Example  One

Comparative Example 1 is produced as follows as a black matrix composition for photolithography.

6 g of BzMA / MAA binder, 6 g of DPHA as a multifunctional monomer, 52 g of NexBM-02 as a liquid dispersion for LCD black, 1.4 g of OXE-02 as a photoinitiator and 25 g of PGMEA as a solvent were added to a stirrer and stirred for 30 minutes. 1 g of imidazole silane compound IM-1000 (Japan Energy Co., Ltd.) as an adhesion promoter was added as an additive, and PGMEA was added so that the total weight g was 100 g. The mixture was stirred for 4 hours to obtain a composition.

Optical density

The composition was applied on a glass substrate at a speed of 800 rpm at a speed of 800 rpm for 20 seconds and then prebaked at 100 캜 for 100 seconds and exposed to 80 mJ and developed with a developer having a pH of 11.4 to 11.7 to form a pattern , Post-baking was performed at 200 캜 for 30 minutes to form a black matrix having a thickness of 1.0 탆, and the optical density was measured by passing through a UV-visible spectrophotometer

resolution

The composition was applied on a glass substrate at a speed of 800 rpm for 20 seconds using a spin coater, pre-baked at 100 캜 for 100 seconds, exposed at 80 mJ and developed with a developer having a pH of 11.4 to 11.7 for 60 seconds to form a pattern , The area of the portion spin-coated on the substrate, the exposure and the unexposed portion after development are removed, and the resolution is shown using the area ratio (%) of the portion where the pattern is formed.

Pattern stability

The substrate on which the pattern is formed is cut from the vertical direction of the line pattern, and the result of observation with an electron microscope in the cross-sectional direction of the pattern is used to show the pattern stability. The film was judged to be 'good' when the film thickness was less than 5% and 'poor' when the film thickness was more than 5%.

Sheet resistance  Measure

After the pattern formation, the sheet resistance was measured with a sheet resistance meter (MCP-HT450, Mitsubishi). The sheet resistance is preferably 10 ¹² Ω or more.

[Table 2]

As shown in Table 2, it can be seen that all of Examples 1 to 4 have higher optical density, higher resolution, and a sufficient sheet resistance value as compared with Comparative Example 1. [

Various embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

1 to 3 are process sectional views of a touch panel using a black matrix composition for photolithography for a touch panel according to an embodiment of the present invention. 4 is a perspective view of a touch panel manufactured by a method for manufacturing a touch panel using a black matrix composition for photolithography for a touch panel according to an embodiment of the present invention.

First, referring to FIG. 1, a black matrix composition layer 25 including a black matrix composition for photolithography for a touch panel according to an embodiment of the present invention is applied on a substrate 10. The substrate 10 may be glass or plastic as a support member made of a transparent material.

2, a mask 30 is disposed on a region corresponding to the touch sensing region 11 of the touch sensing region 11 and the wiring region 12 of the substrate 10, and a photolithography process is performed Go ahead. The touch sensing area 11 is an area for receiving a touch input from a user and the wiring area 12 is an area where a wiring pattern or the like for transmitting a sensing signal from the touch sensing area 11 is formed. Although the black matrix composition layer 25 is shown as being a negative type photoresist in FIG. 2, it may be a positive type photoresist. In this case, the mask 30 may be formed on the wiring region 12 As shown in FIG.

Next, referring to FIGS. 3 and 4, when the photolithography process is completed, a black matrix 20 is formed on the wiring region 12 of the substrate 10.

Although the embodiments of the present invention have been described in detail with reference to the accompanying drawings, it is to be understood that the present invention is not limited to those embodiments and various changes and modifications may be made without departing from the scope of the present invention. . Therefore, the embodiments disclosed in the present invention are intended to illustrate rather than limit the scope of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. Therefore, it should be understood that the above-described embodiments are illustrative in all aspects and not restrictive. The scope of protection of the present invention should be construed according to the following claims, and all technical ideas within the scope of equivalents should be construed as falling within the scope of the present invention.

10: substrate
11: Touch sensing area
12: wiring area
20: Black Matrix
25: Black matrix composition layer
30: Mask

Claims (4)

A black matrix composition for photolithography,
Based photocurable binders, multifunctional monomers, photoinitiators, adhesion promoters, and organic solvents, which are dispersed and mixed with insulating organic particles including a red pigment, a yellow pigment, a blue pigment, and a purple pigment of several tens of nano-
Based photocurable binder comprises at least one of a compound represented by the following formula (1) and a compound represented by the following formula (2).
[Chemical Formula 1]

(2)

R1 is an organic functional group having photo-curable properties and contains at least one carbon atom directly covalently bonded to a silicon atom in a unit of one unit,
R2 is an organic functional group selected from the group consisting of an ether group constituting an aliphatic carbon ring, an alkyl group having 1 to 30 carbon atoms and an aromatic functional group, and at least a carbon atom which is directly covalently bonded to a silicon atom in a unit One. delete The method according to claim 1,
The silicone-based photocurable binder includes both the compound represented by Formula 1 and the compound represented by Formula 2,
Wherein the organic functional group of R 1 is 20 to 50 mol% and the organic functional group of R 2 is 50 to 80 mol% in the total organic functional group mols of R 1 and the organic functional groups contained in R 2. A black matrix composition for photolithography. The method according to claim 1,
Wherein the adhesion promoter is an imidazole silane-based black matrix composition for a touch panel.

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