KR101532343B1 - Photocurable Resin Compositions Having High Refractive Index - Google Patents
Photocurable Resin Compositions Having High Refractive Index Download PDFInfo
- Publication number
- KR101532343B1 KR101532343B1 KR1020140142386A KR20140142386A KR101532343B1 KR 101532343 B1 KR101532343 B1 KR 101532343B1 KR 1020140142386 A KR1020140142386 A KR 1020140142386A KR 20140142386 A KR20140142386 A KR 20140142386A KR 101532343 B1 KR101532343 B1 KR 101532343B1
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- weight
- acrylate
- parts
- photocurable resin
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 74
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 79
- 239000000203 mixture Substances 0.000 claims abstract description 23
- 239000000178 monomer Substances 0.000 claims abstract description 23
- 239000000126 substance Substances 0.000 claims abstract description 13
- 125000000524 functional group Chemical group 0.000 claims abstract description 9
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims description 12
- 238000000016 photochemical curing Methods 0.000 claims description 9
- 239000004641 Diallyl-phthalate Substances 0.000 claims description 8
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 244000028419 Styrax benzoin Species 0.000 claims description 6
- 235000000126 Styrax benzoin Nutrition 0.000 claims description 6
- 235000008411 Sumatra benzointree Nutrition 0.000 claims description 6
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 claims description 6
- 229960002130 benzoin Drugs 0.000 claims description 6
- 235000019382 gum benzoic Nutrition 0.000 claims description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 5
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 claims description 3
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 claims description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 150000005215 alkyl ethers Chemical class 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 150000008366 benzophenones Chemical class 0.000 claims description 3
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 claims description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 3
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical compound NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 claims description 2
- 239000012788 optical film Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 abstract description 23
- -1 halogen acrylates Chemical class 0.000 description 37
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 18
- 239000002518 antifoaming agent Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 235000019198 oils Nutrition 0.000 description 7
- 230000001737 promoting effect Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000003153 chemical reaction reagent Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000010898 silica gel chromatography Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- 150000001491 aromatic compounds Chemical class 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 238000004383 yellowing Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- ZDNFTNPFYCKVTB-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,4-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C=C1 ZDNFTNPFYCKVTB-UHFFFAOYSA-N 0.000 description 3
- 239000012267 brine Substances 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000002952 polymeric resin Substances 0.000 description 3
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- YYJIYUNJTKCRHL-UHFFFAOYSA-N (2-hydroxy-3-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC(=O)C=C YYJIYUNJTKCRHL-UHFFFAOYSA-N 0.000 description 2
- KNLDVMWQLWJAML-UHFFFAOYSA-N 2-[[4-[2-[4-[2-[4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenyl]propan-2-yl]phenoxy]methyl]oxirane Chemical compound C=1C=C(C(C)(C)C=2C=CC(OCC3OC3)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 KNLDVMWQLWJAML-UHFFFAOYSA-N 0.000 description 2
- IXOFPUCWZCAFJX-UHFFFAOYSA-N 2-phenylethanethioic s-acid Chemical compound SC(=O)CC1=CC=CC=C1 IXOFPUCWZCAFJX-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical group C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000004359 castor oil Substances 0.000 description 2
- 235000019438 castor oil Nutrition 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical class OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- 229920002100 high-refractive-index polymer Polymers 0.000 description 2
- 239000004611 light stabiliser Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- CJJXHKDWGQADHB-DPMBMXLASA-N (z,12r)-12-hydroxyoctadec-9-enoic acid;propane-1,2,3-triol Chemical compound OCC(O)CO.CCCCCC[C@@H](O)C\C=C/CCCCCCCC(O)=O CJJXHKDWGQADHB-DPMBMXLASA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- XAMXITINZBKDFX-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylethanethioic S-acid Chemical compound COC(C(=S)O)(C1=CC=CC=C1)OC XAMXITINZBKDFX-UHFFFAOYSA-N 0.000 description 1
- ASUQXIDYMVXFKU-UHFFFAOYSA-N 2,6-dibromo-9,9-dimethylfluorene Chemical compound C1=C(Br)C=C2C(C)(C)C3=CC=C(Br)C=C3C2=C1 ASUQXIDYMVXFKU-UHFFFAOYSA-N 0.000 description 1
- SIVZFLKJXSKCGT-UHFFFAOYSA-N 2-(naphthalen-1-ylamino)acetic acid Chemical compound C1=CC=C2C(NCC(=O)O)=CC=CC2=C1 SIVZFLKJXSKCGT-UHFFFAOYSA-N 0.000 description 1
- HCPAOTGVQASBMP-UHFFFAOYSA-N 2-(oxiran-2-ylmethyl)oxirane Chemical compound C1OC1CC1CO1 HCPAOTGVQASBMP-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- MQYVLKKHFGGCPV-UHFFFAOYSA-N 2-[2-[4-[2-(2-hydroxyphenyl)propan-2-yl]phenyl]propan-2-yl]phenol Chemical compound C=1C=CC=C(O)C=1C(C)(C)C(C=C1)=CC=C1C(C)(C)C1=CC=CC=C1O MQYVLKKHFGGCPV-UHFFFAOYSA-N 0.000 description 1
- BYCFRIATIOXYQB-UHFFFAOYSA-N 2-chloro-2-phenylethanethioic s-acid Chemical compound SC(=O)C(Cl)C1=CC=CC=C1 BYCFRIATIOXYQB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- AIEYAQYHZORRJA-UHFFFAOYSA-N 2-methoxy-2-phenylethanethioic s-acid Chemical compound COC(C(S)=O)C1=CC=CC=C1 AIEYAQYHZORRJA-UHFFFAOYSA-N 0.000 description 1
- FLECPOVKQFMGCC-UHFFFAOYSA-N 2-methyl-2-phenylbutanethioic s-acid Chemical compound CCC(C)(C(S)=O)C1=CC=CC=C1 FLECPOVKQFMGCC-UHFFFAOYSA-N 0.000 description 1
- SNPDWKCPNKYNSI-UHFFFAOYSA-N 2-methyl-2-phenylpropanethioic s-acid Chemical compound SC(=O)C(C)(C)C1=CC=CC=C1 SNPDWKCPNKYNSI-UHFFFAOYSA-N 0.000 description 1
- RZCJYMOBWVJQGV-UHFFFAOYSA-N 2-naphthyloxyacetic acid Chemical compound C1=CC=CC2=CC(OCC(=O)O)=CC=C21 RZCJYMOBWVJQGV-UHFFFAOYSA-N 0.000 description 1
- PPBXTDYPAMPILJ-UHFFFAOYSA-N 2-phenylbutanethioic s-acid Chemical compound CCC(C(S)=O)C1=CC=CC=C1 PPBXTDYPAMPILJ-UHFFFAOYSA-N 0.000 description 1
- FCICNMFOICNGHZ-UHFFFAOYSA-N 2-phenylpropanethioic s-acid Chemical compound SC(=O)C(C)C1=CC=CC=C1 FCICNMFOICNGHZ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- YQUQWHNMBPIWGK-UHFFFAOYSA-N 4-isopropylphenol Chemical compound CC(C)C1=CC=C(O)C=C1 YQUQWHNMBPIWGK-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- CEGOLXSVJUTHNZ-UHFFFAOYSA-K aluminium tristearate Chemical compound [Al+3].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CEGOLXSVJUTHNZ-UHFFFAOYSA-K 0.000 description 1
- 229940063655 aluminum stearate Drugs 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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- C08F220/10—Esters
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- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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Abstract
Description
본 발명은 고굴절율을 갖는 아크릴레이트를 포함하는 광경화성 수지 조성물에 관한 것으로서, 보다 상세하게는 조밀구조로 인해 전자밀도가 증가함으로써 유리전이온도와 굴절률이 향상되는 방향족 화합물을 포함하는 아크릴레이트를 사용함으로써 프리즘 시트와 같은 디스플레이 부품 소재에 광범위하게 사용될 수 있고, 제조 공정이 간단하고, 효율이 좋은 광경화성 수지 조성물에 관한 것이다.
The present invention relates to a photo-curable resin composition containing an acrylate having a high refractive index, and more particularly, to a photo-curable resin composition using an acrylate containing an aromatic compound having an improved electron density and a glass transition temperature and a refractive index To a photo-curable resin composition which can be widely used for a display part material such as a prism sheet, and which is simple and efficient in the production process.
고굴절 유기재료는 디스플레이 부품소재 중 LCD 프리즘 시트나 도광판, OLED(Organic Light emitting Diode)의 필름용 재료, PDP의 AR필름용 재료, 광학렌즈 등 다양한 분야에서 사용되고 있다.High-refractive index organic materials are used in a variety of fields such as LCD prism sheet, light guide plate, OLED (organic light emitting diode) film material, PDP AR film material, and optical lens.
이 중에서 프리즘 시트는 액정디스플레이(LCD) 후면에 배치되는 백라이트 유닛의 휘도를 향상시킬 목적으로 사용되는 것으로서, 백라이트 유닛의 휘도를 높이기 위해서는 백라이트 유닛의 광 흐름을 적절히 이용하여야 한다.Among them, the prism sheet is used for the purpose of improving the brightness of the backlight unit disposed on the rear surface of the liquid crystal display (LCD), and in order to increase the brightness of the backlight unit, the light flow of the backlight unit should be appropriately used.
한편, 광(光)은 빛의 간섭, 회절, 편광과 광입자 원리를 적절히 변형시킬 수 있는 입체구조를 사용하면 광흐름을 제어할 수 있고, 이러한 입체구조를 구성하는 물질의 물리적 특성을 변형하면, 광의 흐름을 추가적으로 제어할 수 있어 사용자가 원하는 방향으로 광입자의 배출방향을 정렬시켜 그 방향에서 휘도를 향상시킬 수 있다.On the other hand, if a three-dimensional structure capable of appropriately modifying the light interference, diffraction, polarization and photo-induced principles is used, the optical flow can be controlled. If the physical properties of the material constituting the three- It is possible to further control the flow of light, so that the discharge direction of the light source can be aligned in a direction desired by the user, and the luminance can be improved in that direction.
또한, 프리즘 시트의 프리즘층을 구성하는 물질의 중요한 광학적 변수로는 굴절율을 들 수 있는데, 상기 굴절율이 높을수록 프리즘 필름의 성능이 향상되기 때문에 높은 굴절율을 가진 프리즘 시트를 사용하면 LCD 백라이트의 효율을 증가시킬 수 있다.In addition, as an important optical parameter of a material constituting the prism layer of the prism sheet, there is a refractive index. Since the performance of the prism film is improved as the refractive index is higher, the efficiency of the LCD backlight can be improved by using a prism sheet having a high refractive index. .
일반적으로 프리즘 시트의 프리즘층은 자유라디칼에 의해 중합이 가능한 고분자 수지가 사용되며, 이러한 일례로서 통상적으로 광경화성 수지가 많이 사용된다. Generally, a prism layer of a prism sheet is made of a polymer resin capable of being polymerized by free radicals, and a photo-curable resin is usually used in many cases as an example.
굴절율이 높은 광경화성 고분자 물질의 대표적인 예로는 방향족기를 한 개 또는 두개 이상을 함유한 (메타)아크릴레이트 또는 할로겐이나 황이 함유된 (메타)아크릴레이트 등을 들 수 있으며, 이와 같은 고굴절 고분자 수지를 적절하게 혼합하여 프리즘 시트를 제작하고 백라이트 유닛에 적용하고 있다. Representative examples of the photocurable polymer material having a high refractive index include (meth) acrylate containing one or two or more aromatic groups or (meth) acrylate containing halogen or sulfur. Such a high refractive index polymer resin is suitably used And a prism sheet is manufactured and applied to a backlight unit.
이러한 구체적인 예로서, 한국특허공개 제2001-0012340호와 한국특허공개 제2005-0010760호에는 고굴절율을 갖는 브롬화 단량체를 포함하는 중합성 조성물로 제조된 광학 제품이 개시되어 있다.As such specific examples, Korean Patent Laid-Open Nos. 2001-0012340 and 2005-0010760 disclose optical products made from a polymerizable composition comprising a brominated monomer having a high refractive index.
그러나 종래에 사용되던 할로겐 화합물은 독성이 강하고, 연소하게 되면 부식성 가스와 많은 양의 매연을 배출하게 되는 문제점이 있다. However, conventionally used halogen compounds are highly toxic, and when they are burned, corrosive gas and a large amount of soot are discharged.
또한, 황 화합물은 시간이 지나면서 산화가 이루어져 황변이 나타나게 되는데 이로 인해 광이 투과되는 투과율이 저하되는 단점을 지니고 있다. In addition, the sulfur compound is oxidized over time and yellowing appears, which has a disadvantage in that the transmittance through which light is transmitted is lowered.
이에, 전술한 문제점을 극복하기 위하여 다양한 연구가 진행되고 있지만, 비할로겐 아크릴레이트에 대한 국내 개발은 전무한 상태여서 수입에 의존하고 있는 실정이다.Accordingly, although various studies have been conducted to overcome the above-mentioned problems, there has been no domestic development of non-halogen acrylates, and they are dependent on imports.
또한, 프리즘 시트의 프리즘층 형성용 고굴절 수지조성물은 자외선에 대하여 안정적이어야 하며, 투명기재필름과 고굴절 고분자 수지가 단단하게 지지되기 위하여 충분한 접착력을 유지하고, 표면 강도를 증가시킬 수 있는 조건을 동시에 충족해야 한다. In addition, the high refractive index resin composition for forming the prism layer of the prism sheet must be stable to ultraviolet rays, maintain a sufficient adhesive force to firmly support the transparent base material film and the high refractive index polymer resin, and meet the conditions for increasing the surface strength Should be.
또한, 상기 고굴절 조성물이 지나치게 점도가 높으면 가공시 곤란한 점이 있으므로 상온에서 액체 상태를 유지하는 것이 바람직하다.
If the high refractive index composition has an excessively high viscosity, it is difficult to process it, and therefore it is preferable to maintain the liquid state at room temperature.
본 발명은 전술한 문제점을 극복하기 위해 창출된 것으로서, 고굴절율을 갖는 동시에 작업성이 좋고, 내황변성을 갖는 광경화성 수지 조성물을 제공한다.
The present invention has been made to overcome the above-described problems, and provides a photocurable resin composition having a high refractive index, good workability, and yellowing resistance.
본 발명은
화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머 20 내지 60중량부;
한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머 30 내지 70중량부; 및
벤조페논, 벤조페논 유도체, 벤조인, 벤조인 알킬 에테르 벤질디메틸케탈, 1-하이드록시 사이클로 헥실 페닐케톤, 디에톡시 아세토페논, 포스핀 옥사이드계, 아미노 아세토페논계, 2-하이드록시-2-메틸-1-페닐프로파-1-논, 2-벤질-2-디메틸아미드-1- (4-몰포리나페닐)-부타난으로 이루어진 군 으로부터 선택된 적어도 하나를 포함하는 광중중합 개시제 1 내지 10중량부를 포함하는 광경화성 수지 조성물에,
비스페놀A디글리스딜에테르디(메타)아크릴레이트를 광경화성 수지조성물 전체 중량부를 기준으로 0.01 내지 30중량부로 더 포함하고,
디알릴프탈레이트와 펜타에리스리톨테트라(3－머캅토프로피오네이트)가 2:1의 당량비로 혼합된 혼합물을 광경화성 수지조성물 전체 중량부를 기준으로 3 내지 15중량부로 더 포함하며,
인산계 아크릴레이트를 광경화성 수지조성물 전체 중량부를 기준으로 1 내지 5중량부로 더 포함하고,
불소실리콘 수지를 광경화성 수지조성물 전체 중량부를 기준으로 0.1 내지 5중량부로 더 포함하며,The present invention
20 to 60 parts by weight of an acrylate monomer comprising the general formula (1) to (3) or a mixture thereof;
30 to 70 parts by weight of a reactive acrylate monomer having at least one functional group; And
Benzophenone derivatives, benzoin, benzoin alkyl ether benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethoxy acetophenone, phosphine oxide type aminoacetophenone type, 2-hydroxy-2-methyl -1-phenylpropar-1-one, and 2-benzyl-2-dimethylamide-1- (4-morpholinaphenyl) -butanone. To the photo-curing resin composition,
Further comprising 0.01 to 30 parts by weight of bisphenol A diglycidyl ether di (meth) acrylate based on the total weight of the photocurable resin composition,
Further comprising 3 to 15 parts by weight, based on the total weight of the photocurable resin composition, of a mixture of diallyl phthalate and pentaerythritol tetra (3-mercaptopropionate) in an equivalent ratio of 2: 1,
Further comprising 1 to 5 parts by weight of phosphoric acid based acrylate based on the total weight of the photocurable resin composition,
Further comprising 0.1 to 5 parts by weight of a fluorosilicone resin based on the total weight of the photocurable resin composition,
지방족 설포네이트를 광경화성 수지조성물 전체 중량부를 기준으로 0.01 내지 10중량부로 더 포함하는 광경화성 수지 조성물을 제공한다.
Wherein the aliphatic sulfonate is further contained in an amount of 0.01 to 10 parts by weight based on the total weight of the photocurable resin composition.
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[화학식 1][Chemical Formula 1]
[화학식 2](2)
[화학식 3](3)
본 발명에 따른 광경화성 수지 조성물은 경화물의 굴절률이 높아 휘도 상승효과가 크고, 경화 후 탄성력이 우수하여 취급이 용이하고, 운송 시 발생할 수 있는 외관 손상의 문제를 미연에 방지할 수 있을 뿐만 아니라, 수지 조성물의 점도가 낮아 작업성이 좋고, 내황변성이 우수하다.The photo-curable resin composition according to the present invention is capable of preventing the problem of appearance damage which may occur during transportation, and it is also possible to prevent the problem of appearance damage which may occur during transportation, The resin composition has a low viscosity and is excellent in workability and has excellent vulcanization resistance.
또한, 본 발명에 따른 광경화성 수지 조성물은 비교적 저렴하고, 미반응 물질의 회수도 가능한 방향족 화합물을 출발물질로 하여 간단한 아크릴레이트화 반응을 수행하여 제조할 수 있어 경제성 및 상업화 가능성이 높다. The photo-curing resin composition according to the present invention is relatively inexpensive and can be prepared by performing a simple acrylating reaction using an aromatic compound capable of recovering unreacted materials as a starting material, which is highly economical and highly commercialized.
더욱이, 상기 광경화성 수지 조성물은 비할로겐 물질로 구성되므로 환경관련 규제에 적용받지 않는 친환경적인 수지 조성물을 제공한다.
Further, since the photo-curable resin composition is composed of a non-halogen material, it is possible to provide an environmentally friendly resin composition that is not subjected to environmental regulations.
이하, 본 발명을 구체적으로 설명한다.Hereinafter, the present invention will be described in detail.
본 발명은 화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머 20 내지 60중량부; 한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머 30 내지 70중량부; 및 광중중합 개시제 1 내지 10중량부를 포함하는 광경화성 수지 조성물을 제공한다.
The present invention relates to a rubber composition comprising 20 to 60 parts by weight of an acrylate monomer composed of the general formula (1) to (3) or a mixture thereof; 30 to 70 parts by weight of a reactive acrylate monomer having at least one functional group; And 1 to 10 parts by weight of a photopolymerization initiator.
[화학식 1][Chemical Formula 1]
[화학식 2](2)
[화학식 3](3)
본 발명에 따른 광경화성 수지 조성물은 경화시 고굴절율이 요구되는 LCD 프리즘 시트나 도광판, OLED(Organic Light emitting Diode)의 필름용 재료, PDP의 AR필름용 재료, 광학렌즈 등에 사용되는 것으로서, 이러한 목적을 위해 당업계에서 통상적으로 사용되는 광경화성 수지 조성물이라면 특별히 한정되지 않는다.The photo-curing resin composition according to the present invention is used for an LCD prism sheet, a light guide plate, a film material for OLED (Organic Light-Emitting Diode), a material for AR film of PDP, an optical lens and the like, Is not particularly limited as long as it is a photo-curable resin composition commonly used in the art.
본 발명에 따른 광경화성 수지 조성물, 특정적으로 고굴절율을 갖는 광경화성 수지 조성물은 광경화성 수지 조성물 전체 중량부 기준으로 화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머 20 내지 60중량부; 한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머 30 내지 70중량부; 및 광중중합 개시제 1 내지 10중량부로 구성된다.
The photo-curing resin composition according to the present invention, particularly the photo-curable resin composition having a high refractive index, comprises 20 to 60 parts by weight of an acrylate monomer composed of the general formula (1) to (3) or a mixture thereof based on the total weight of the photo- 30 to 70 parts by weight of a reactive acrylate monomer having at least one functional group; And 1 to 10 parts by weight of a photopolymerization initiator.
[화학식 1][Chemical Formula 1]
[화학식 2](2)
[화학식 3](3)
이때, 상기 화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머는 평면 구조를 지니고 있어 분자 간 쌓임이 매우 촘촘하게 구성된 조밀구조를 형성할 수 있는 방향족 화합물을 포함하며, 그 사용량은 광경화성 수지 조성물 전체 중량부 기준으로 20 내지 60중량부를 사용하는 것이 좋지만, 이에 한정되는 것은 아니다.At this time, the acrylate monomers having the above-mentioned general formulas (1) to (3) or the mixture thereof contain an aromatic compound having a planar structure and capable of forming a closely packed dense structure, It is preferable to use 20 to 60 parts by weight based on the total weight part, but not limited thereto.
상기 방향족 화합물은 그 조밀구조로 인해 전자밀도가 증가하여 유리전이온도(Tg)와 굴절률을 향상시킬 수 있다. The aromatic compound has an increased electron density due to its dense structure and can improve the glass transition temperature (Tg) and refractive index.
여기서, 상기 광경화성 수지 조성물을 구성하는 화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머는 상기 방향족 화합물을 글리시딜 에테르 형태로 제조한 후 아크릴레이트와 반응시켜 고굴절율을 갖는 형태로 제조된다.Here, the acrylate monomer composed of the general formulas (1) to (3) or the mixture thereof constituting the photocurable resin composition is prepared by preparing the aromatic compound in glycidyl ether form and then reacting with the acrylate to form a form having a high refractive index do.
또한, 본 발명에 따른 화학식 1 내지 화학식 3 또는 이들의 혼합물로 이루어진 아크릴레이트 모노머는 굴절율이 1.50이상이고, 점도가 25℃에서 200내지 1,500cps인 것이 바람직하다.Also, it is preferable that the acrylate monomer having the formula (1) to (3) or the mixture thereof according to the present invention has a refractive index of 1.50 or more and a viscosity of 200 to 1,500 cps at 25 ° C.
본 발명에 따른 한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머는 광경화형 화합물로서, 광경화성 수지 조성물의 점도를 조절하는 희석 단량체인 동시에 굴절률을 크게 낮추지 않으면서도 우수한 탄성력을 유지할 수 있도록 한다.The reactive acrylate monomer having at least one functional group according to the present invention is a photo-curable compound, which is a diluent monomer for controlling the viscosity of the photo-curable resin composition, and maintains excellent elasticity without significantly lowering the refractive index.
바람직한 반응성 아크릴레이트 모노머는 당업계에서 통상적으로 사용되는 반응성 아크릴레이트 모노머, 특정적으로 한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머라면 특별히 한정되지 않지만, 바람직하게는 메틸(메타)아크릴레이트, 알릴(메타)아크릴레이트, 2-에톡시에틸(메타)아크릴레이트, 이소데실(메타)아크릴레이트, 2-도데실티오에틸(메타)아크릴레이트, 옥틸(메타)아크릴레이트, 2-메톡시에틸(메타)아크릴레이트, 히드록시에틸(메타)아크릴레이트, 히드록시프로필(메타)아크릴레이트, 히드록시부틸(메타)아크릴레이트, 이소옥틸(메타)아크릴레이트, 스테아릴(메타)아크릴레이트, 테트라퍼푸릴(메타)아크릴레이트, 우레탄(메타)아크릴레이트 등의 1관능성 화합물; 1,3-부탄디올디(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 비스페놀A-에틸렌글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 프로필렌글리콜디(메타)아크릴레이트, 디프로필렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 디시클로펜타닐디(메타)아크릴레이트, 카프로락톤 변성 디시클로펜테닐디(메타)아크릴레이트, 에틸렌옥사이드 변성 인산디(메타)아크릴레이트, 비스(2-히드록시에틸)이소시아누레이트디(메타)아크릴레이트, 디(아크릴옥시에틸)이소시아누레이트, 알릴화시클로헥실디(메타)아크릴레이트, 디메틸올디시클로펜탄디(메타)아크릴레이트, 에틸렌옥사이드 변성 헥사히드로프탈산디(메타)아크릴레이트, 트리시클로데칸디메탄올(메타)아크릴레이트, 네오펜틸글리콜 변성 트리메틸올프로판디(메타)아크릴레이트, 아다만탄디(메타)아크릴레이트 등의 2관능성 화합물; 트리메틸올프로판트리(메타)아크릴레이트, 디펜타에리트리톨트리(메타)아크릴레이트, 프로피온산 변성 디펜타에리트리톨트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 프로필렌옥사이드 변성 트리메틸올프로판트리(메타)아크릴레이트, 트리스(2-히드록시에틸)이소시아누레이트트리(메타)아크릴레이트, 트리스(아크릴옥시에틸)이소시아누레이트, 글리세롤트리(메타)아크릴레이트 등의 3관능성 화합물; 디글리세린테트라(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 디트리메틸올프로판테트라(메타)아크릴레이트 등의 4관능성 화합물; 디펜타에리트리톨펜타(메타)아크릴레이트, 프로피온산 변성 디펜타에리트리톨펜타(메타)아크릴레이트 등의 5관능성 화합물; 디펜타에리트리톨헥사(메타)아크릴레이트, 카프로락톤 변성 디펜타에리트리톨헥사(메타)아크릴레이트 등의 6관능성 화합물을 사용하는 것이 좋다. 이때, 상기 화합물은 적어도 하나 이상 혼합하여 사용할 수도 있다.Preferable reactive acrylate monomers are not particularly limited as long as they are reactive acrylate monomers commonly used in the art, specifically reactive acrylate monomers having one or more functional groups, but preferred are methyl (meth) acrylate, allyl (Meth) acrylate, 2-ethoxyethyl (meth) acrylate, isodecyl (meth) acrylate, 2-dodecylthioethyl (Meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, isooctyl (Meth) acrylate, and urethane (meth) acrylate; Butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, bisphenol A- Acrylate, diethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di (Meth) acrylate, ethylene oxide modified di (meth) acrylate, neopentyl glycol di (meth) acrylate, dicyclopentanyl di (meth) acrylate, caprolactone modified dicyclopentenyl (Meth) acrylates such as bis (2-hydroxyethyl) isocyanurate di (meth) acrylate, di (acryloxyethyl) isocyanurate, allylcyclohexyl di (Meth) acrylate, neopentyl glycol-modified trimethylolpropane di (meth) acrylate, adamantanedi (meth) acrylate, and the like Of a bifunctional compound; (Meth) acrylate such as trimethylolpropane tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, propionic acid modified dipentaerythritol tri (meth) acrylate, pentaerythritol tri Trifunctional compounds such as tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, tris (acryloxyethyl) isocyanurate and glycerol tri ; Tetrafunctional compounds such as diglycerin tetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, and ditrimethylol propane tetra (meth) acrylate; Pentafunctional compounds such as dipentaerythritol penta (meth) acrylate and propionic acid-modified dipentaerythritol penta (meth) acrylate; It is preferable to use hexafunctional compounds such as dipentaerythritol hexa (meth) acrylate and caprolactone-modified dipentaerythritol hexa (meth) acrylate. At this time, at least one of the above compounds may be used in combination.
한편, 본 발명에 따른 한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머의 사용량은 특별히 한정되지 않지만, 추천하기로는 광경화성 수지 조성물 전체 중량부 기준으로 30 내지 70중량부를 사용하는 것이 좋다.On the other hand, the amount of the reactive acrylate monomer having at least one functional group according to the present invention is not particularly limited, but is preferably 30 to 70 parts by weight based on the total weight of the photocurable resin composition.
본 발명에 따른 광중합 개시제는 광경화 반응의 효율을 향상시키기 위한 것으로서, 이러한 목적을 갖는 광중합 개시제라면 어떠한 것을 사용하여도 무방하지만, 바람직하게는 벤젠 에테르계, 벤질 케탈계, 알파히드록시알킬페논계, 아미노 알킬 페논계, 포스핀 옥사이드계로 이루어진 군으로부터 선택된 적어도 하나를 사용할 수 있다.The photopolymerization initiator according to the present invention is intended to improve the efficiency of the photopolymerization reaction, and any photopolymerization initiator having such a purpose may be used. Preferably, the photopolymerization initiator is a benzene ether, benzyl ketal, , An aminoalkylphenone-based compound, and a phosphine oxide-based compound.
상기 광중합 개시제는 보다 구체적으로 벤조페논, 벤조페논 유도체, 벤조인, 벤조인 알킬 에테르 벤질디메틸케탈, 1-하이드록시 사이클로 헥실 페닐케톤, 디에톡시 아세토페논, 포스핀 옥사이드계, 아미노 아세토페논계, 2-하이드록시-2-메틸-1-페닐프로파-1-논, 2-벤질-2-디메틸아미드-1- (4-몰포리나페닐)-부타난으로 이루어진 군 으로부터 선택된 적어도 하나 이상을 사용할 수 있다.The photopolymerization initiator is more specifically a benzophenone, benzophenone derivative, benzoin, benzoin alkyl ether benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethoxy acetophenone, phosphine oxide type, At least one selected from the group consisting of 2-hydroxy-2-methyl-1-phenylpropar-1-one and 2-benzyl-2-dimethylamide-1- (4-morpholinaphenyl) .
바람직하게 상기 광중합 개시제는 벤젠에테르계, 벤질케탈계, 알파히드록시알킬페논계 및 아미노알킬페논계 개시제로 이루어진 군으로부터 선택되는 적어도 하나와 포스핀 옥사이드계 개시제로 이루어진 군으로부터 선택되는 적어도 하나를 조합하여 사용할 수도 있다.Preferably, the photopolymerization initiator is at least one selected from the group consisting of benzene ether, benzyl ketal, alphahydroxyalkylphenone, and aminoalkylphenone-based initiators and phosphine oxide-based initiators .
본 발명에 따른 광중합 개시제의 사용량은 특별히 한정되지 않지만, 추천하기로는 광경화성 수지 조성물 전체 중량부 기준으로 1 내지 10중량부를 사용하는 것이 좋다.The amount of the photopolymerization initiator according to the present invention is not particularly limited, but it is recommended to use 1 to 10 parts by weight based on the total weight of the photopolymerizable resin composition.
여기서, 상기 광중합 개시제의 사용량이 1중량부 미만인 경우 경화속도가 감소하고, 10중량부를 초과하는 경우 황변이 발생할 수 있다.When the amount of the photopolymerization initiator is less than 1 part by weight, the curing rate is decreased. When the amount is more than 10 parts by weight, yellowing may occur.
특정적으로, 본 발명에 따른 광경화성 수지 조성물을 구성하는 광중합 개시제에는 광중합 개시 보조제를 조합하여 사용할 수도 있다. Specifically, a photopolymerization initiator may be used in combination with the photopolymerization initiator constituting the photocurable resin composition according to the present invention.
여기서, 상기 광중합 개시제에 광중합 개시 보조제를 병용하면, 이들을 함유하는 경화성 수지 조성물이 더욱 고감도가 되어 이 조성물을 사용하여 수지층을 형성할 때, 생산성이 향상된다. Here, when the photopolymerization initiator is used in combination with the photopolymerization initiator, the curable resin composition containing the photopolymerization initiator has higher sensitivity, and productivity is improved when the resin layer is formed using the composition.
그러므로 본 발명에 따른 광중합 개시제는 별도로 광중합 개시 보조제를 더 포함할 수 있으며, 그 사용량은 특별히 한정되는 것은 아니지만, 바람직하게는 광중합 개시제 전체 중량을 기준으로 2 내지 30중량%를 사용하는 것이 좋다.Therefore, the photopolymerization initiator according to the present invention may further include a photopolymerization initiator, and the amount of the photopolymerization initiator is not particularly limited, but preferably 2 to 30% by weight based on the total weight of the photopolymerization initiator.
또한, 상기 광중합 개시 보조제는 당업계에서 통상적으로 사용하는 광중합 개시 보조제라면 특별히 한정되지 않지만, 추천하기로는 아민 화합물, 카르복실산 화합물을 사용하는 것이 좋다.The photopolymerization initiation assistant is not particularly limited as long as it is a photopolymerization initiator commonly used in the art, but an amine compound or a carboxylic acid compound is preferably used.
바람직한 아민 화합물은 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올 아민 등의 지방족 아민 화합물, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이 소아밀, 4-디메틸아미노벤조산2-에틸헥실, 벤조산2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메 틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논 등의 방향족 아민 화합물 등이 있으며, 아민 화합물로서는 방향족 아민 화합물이 바람직하게 사용된다.Preferred amine compounds include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine; aliphatic amine compounds such as methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, Aromatic amines such as ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (diethylamino) And the like. As the amine compound, an aromatic amine compound is preferably used.
바람직한 카르복실산 화합물의 구체예로서는 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신, 나프톡시아세트산 등의 방향족 헤테로아세트산류 등이 있다.Specific examples of the preferable carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichloro And aromatic heteroacetic acids such as phenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid.
특정 양태로서, 본 발명에 따른 광경화성 수지 조성물, 특정적으로 고굴절율을 갖는 광경화성 수지 조성물은 광경화성 수지 조성물 전체 중량부 기준으로 0.01 내지 10중량부의 대전방지제를 더 포함할 수 있다.In a specific embodiment, the photocurable resin composition according to the present invention, specifically the photocurable resin composition having a high refractive index, may further comprise 0.01 to 10 parts by weight of an antistatic agent based on the total weight of the photocurable resin composition.
바람직한 대전방지제는 설포네이트, 예를 들면 지방족 설포네이트, 치환된 페닐 설포네이트 및 나프틸 설포네이트; 포스포늄, 예를 들면 테트라메틸포스포늄, 테트라에틸포스포늄 및 테트라부틸포스포늄; 또는 이들의 혼합물을 사용하는 것이 좋다.Preferred antistatic agents include sulfonates, such as aliphatic sulfonates, substituted phenyl sulfonates and naphthyl sulfonates; Phosphonium, such as tetramethylphosphonium, tetraethylphosphonium and tetrabutylphosphonium; Or a mixture thereof.
다른 특정 양태로서, 본 발명에 따른 광경화성 수지 조성물, 특정적으로 고굴절율을 갖는 광경화성 수지 조성물은 기재와의 접착력을 향상시키는 성분으로서 반응형 (메타)아크릴레이트 올리고머를 더 포함할 수 있다.As another specific embodiment, the photo-curable resin composition according to the present invention, specifically the photo-curable resin composition having a high refractive index, may further include a reactive (meth) acrylate oligomer as a component for improving adhesion to a substrate.
상기 반응형 (메타)아크릴레이트 올리고머는 비스페놀A디글리스딜에테르디(메타)아크릴레이트, 비스페놀F디글리스딜에테르디(메타)아크릴레이트, 티오비스페놀디글리스딜에테르디(메타)아크릴레이트, 비스페놀S디글리스딜에테르디(메타)아크릴레이트우레탄 아크릴레이트계 올리고머, 에폭시 아크릴레이트계 올리고머 등을 단독 또는 2종 이상 혼합하여 사용할 수 있다. The reactive (meth) acrylate oligomer is preferably selected from the group consisting of bisphenol A diglycidyl ether di (meth) acrylate, bisphenol F diglycidyl ether di (meth) acrylate, thiobisphenol diglycidyl ether di S-diglycidyl ether di (meth) acrylate urethane acrylate oligomer, epoxy acrylate oligomer, and the like, or a mixture of two or more thereof.
상기 반응형 (메타)아크릴레이트 올리고머의 사용량은 광경화성 수지 조성물 전체 중량부 기준으로 0.01 내지 30중량부를 더 포함할 수 있다.The amount of the reactive (meth) acrylate oligomer may further be 0.01 to 30 parts by weight based on the total weight of the photocurable resin composition.
여기서, 상기 반응형 (메타)아크릴레이트 올리고머의 사용량이 30중량부 초과일 경우 굴절률이 낮아질 수 있다.Here, when the amount of the reactive (meth) acrylate oligomer used is more than 30 parts by weight, the refractive index may be lowered.
또 다른 특정 양태로서, 본 발명에 따른 광경화성 수지 조성물은 기재와 수지 조성물을 이용하여 형성하는 코팅층 사이의 접착성을 보다 향상시키기 위해, 디알릴프탈레이트, 디알릴이소프탈레이트 및 디알릴테레프탈레이트 가운데 적어도 1종 및 펜타에리스리톨테트라(3－머캅토프로피오네이트)로 이루어진 광중합형 접착증진 성분을 더 첨가할 수 있다.As another specific embodiment, the photocurable resin composition according to the present invention may contain at least one of diallyl phthalate, diallyl isophthalate and diallyl terephthalate in order to further improve the adhesion between the base material and the coating layer formed by using the resin composition 1 and pentaerythritol tetra (3-mercaptopropionate) can be further added to the composition.
여기서, 상기 디알릴프탈레이트는 내열성과 투명성을 겸비한 피막을 형성할 수 있는데, 이것에 특정의 유황 화합물을 배합하면, 빛 또는 자외선에 의해 간단한 중합 반응이 일어나, 접착성이 뛰어난 삼차원 구조를 가지는 투명성이 향상된 중합물을 제조할 수가 있다.Here, the diallyl phthalate can form a coating having both heat resistance and transparency. When a specific sulfur compound is blended with the diallyl phthalate, a simple polymerization reaction occurs due to light or ultraviolet rays, and transparency having a three- An improved polymer can be produced.
상기 광중합형 접착증진 성분을 광경화성 수지 조성물에 사용함으로써, 광경화된 코팅층이 프라이머층이 없는 기재에 직접 접착할 수 있도록 접착성이 향상될 수 있다.By using the photopolymerizable type adhesion promoting component in the photocurable resin composition, adhesiveness can be improved so that the photocured coating layer can be directly adhered to a substrate without a primer layer.
또한, 상기 광중합형 접착증진 성분에 의한 중합물은 분자쇄 사이의 가교 부분에서 벤젠 고리가 존재하여 강직해지고, 형태 및 치수안정성이 우수하므로 코팅층의 컬 발생을 감소시킬 수 있다.Also, since the benzene ring exists in the cross-linked portion between the molecular chains, the polymer due to the light-cured adhesion promoting component is rigid and has excellent shape and dimensional stability, so that curling of the coating layer can be reduced.
또한, 상기 광중합형 접착증진 성분은 디알릴 프탈레이트, 디알릴이소프탈레이트 및 디알릴 테레프탈레이트 가운데 적어도 1종 및 펜타에리스리톨 테트라(3－머캅토프로피오네이트)를 2:1 내지 1:3의 당량비로 포함하는 것이 바람직하다.The light-curable adhesion promoting component may include at least one of diallyl phthalate, diallyl isophthalate and diallyl terephthalate, and pentaerythritol tetra (3-mercaptopropionate) in an equivalent ratio of 2: 1 to 1: 3 .
상기 당량비의 범위를 벗어나면, 광중합 반응이 완결되지 않아 미중합 부분이 잔존하여, 액상 상태가 유지될 수 있어 바람직하지 못하다. 당량비 범위보다 디알릴프탈레이트, 디알릴이소프탈레이트, 디알릴테레프탈레이트의 적어도 1종으로부터 되는 디알릴 성분의 양이 많아지면 중합이 완결하지 않고, 펜타에리스리톨테트라(3－머캅토프로피오네이트)의 양이 많아지면 광중합 후 모노머 냄새가 강해질 수 있다. 디알릴 성분과 관능기 함유 성분을 1.1:1 내지 1:1.1의 당량비로 이용하는 것이, 광중합 반응 및 경화물의 균일성 관점에서 보다 바람직하다.Exceeding the range of the equivalence ratio is not preferable because the photopolymerization reaction is not completed and the unpolymerized portion remains and the liquid phase state can be maintained. If the amount of the diallyl component comprising at least one of diallyl phthalate, diallyl isophthalate and diallyl terephthalate is larger than the equivalence ratio range, the polymerization is not completed and the amount of pentaerythritol tetra (3-mercaptopropionate) Can increase the monomer odor after photopolymerization. It is more preferable to use the diallyl component and the functional group-containing component at an equivalent ratio of 1.1: 1 to 1: 1.1 in view of the photopolymerization reaction and the uniformity of the cured product.
상기 광중합형 접착증진 성분의 함량은 상기 광경화성 수지 조성물 전체 중량부를 기준으로 3 내지 15중량부 더 포함되는 것이 바람직하다.The content of the photopolymerization type adhesion promoting component is preferably 3 to 15 parts by weight based on the total weight of the photocurable resin composition.
또 다른 특정 양태로서, 본 발명에 따른 광경화성 수지 조성물은 각종 형상이 있는 몰드 또는 롤과의 이형성을 부여하기 위하여 실리콘 변형 또는 불소 변형 화합물을 더 포함할 수 있으며, 그 사용량은 광경화성 수지 조성물 전체 중량부 기준으로 0.1 내지 5중량부를 더 포함할 수 있다. In another specific embodiment, the photo-curable resin composition according to the present invention may further contain a silicone-modified or fluorine-modified compound to impart releasability to molds or rolls having various shapes, and the amount of the photo- 0.1 to 5 parts by weight based on parts by weight.
또 다른 특정 양태로서, 본 발명에 따른 광경화성 수지 조성물은 자외선을 차단하거나 흡수하여 경화물이 지속적인 자외선 노출에 의해 분해되거나 잘 부스러지거나 변색되는 것을 방지하기 위한 자외선 안정제를 더 포함할 수 있다. In another specific embodiment, the photo-curable resin composition according to the present invention may further include a UV stabilizer to prevent or absorb ultraviolet rays to decompose, break or discolor the cured product by continuous ultraviolet exposure.
바람직한 자외선 안정제로는 광경화성 수지 조성물의 초기 색상을 크게 변화시키지 않는 것이라면 그 종류가 특별히 한정되지 않는다.The ultraviolet stabilizer is not particularly limited as long as it does not significantly change the initial color of the photocurable resin composition.
이때, 상기 자외선 안정제는 그 사용 형태에 따라 자외선 흡수제, 소광제(Quenchers), 힌더드 아민계 광 안정제(HALS) 등을 들 수 있으며, 화학 구조에 따라 페닐살리실레이트계 화합물, 벤조페논계 화합물, 벤조트리아졸계 화합물, 니켈 유도체, 라디칼 스캐빈저 등을 들 수 있다. 자외선 안정제는 광경화성 수지 조성물의 경화도에 영향을 미치지 않는 함량, 예를 들면 적어도 광경화성 수지 조성물 중량 기준으로 3중량부 미만으로 사용할 수 있다.The ultraviolet light stabilizer may be an ultraviolet light absorber, a quencher, a hindered amine light stabilizer (HALS), or the like depending on the mode of use. Depending on the chemical structure, a phenyl salicylate compound, a benzophenone compound , Benzotriazole-based compounds, nickel derivatives, radical scavengers and the like. The ultraviolet stabilizer may be used in an amount not affecting the degree of curing of the photocurable resin composition, for example, at least 3 parts by weight based on the weight of the photocurable resin composition.
또 다른 양태로서, 본 발명에 따른 광경화성 수지 조성물은 광경화성 수지 조성물이 기재와 보다 더 용이하게 부착되는 동시에, 부착된 상태를 지속적으로 유지할 수 있도록 광경화성 수지 조성물 전체 중량부 기준으로 1 내지 5중량부의 부착 증진제를 더 포함할 수 있다.In another embodiment, the photo-curable resin composition according to the present invention is used in an amount of 1 to 5 parts by weight based on the total weight of the photo-curing resin composition so that the photo-curable resin composition can be more easily attached to the substrate, By weight of adhesion promoting agent.
상기 부착증진제는 인산계 아크릴레이트, 반응성이 없는 아크릴 수지 및/또는 이들의 혼합물 등을 사용할 수 있다.The adhesion promoter may be selected from phosphoric acid acrylate, non-reactive acrylic resin, and mixtures thereof.
여기서, 상기 부착증진제의 사용량이 1중량부 미만으로 포함되면 부착력 증진 효과가 미미하고, 그 사용량이 5중량부를 초과하면 조성물의 저장성 및 물성 저하의 원인이 되고, 고가이므로 경제성이 낮다.If the amount of the adhesion promoting agent is less than 1 part by weight, the effect of improving the adhesion is small. If the amount of the adhesion promoting agent is more than 5 parts by weight, the storage stability and physical properties of the composition deteriorate.
또 다른 특정 양태로서, 본 발명에 따른 광경화성 수지 조성물은 전체 수지 조성물 중량부 기준으로 1 내지 5중량부의 첨가제를 더 포함할 수 있다.In yet another specific embodiment, the photocurable resin composition according to the present invention may further comprise 1 to 5 parts by weight of an additive based on the total weight of the resin composition.
이때, 상기 첨가제는 당업계의 통상적인 첨가제라면 특별히 한정되지 않지만, 바람직하게는 흐름방지제, 점도조절제, 소포제, 열안정제 및 분산제 또는 이들로부터 선택된 적어도 하나 이상의 혼합물을 사용할 수 있다.At this time, the additive is not particularly limited as long as it is an additive customary in the art, but it is preferable to use a flow inhibitor, a viscosity modifier, a defoamer, a heat stabilizer and a dispersant or a mixture of at least one thereof.
상기 소포제는 저온에서도 소포성, 분산성 및 유화성 등이 탁월한 실리콘계 소포제, 예를 들면 폴리실록산을 주성분으로 하는 소포제를 사용하는 것이 좋다.The antifoaming agent is preferably a defoaming agent containing a silicon-based antifoaming agent, for example, polysiloxane as a main component, which has excellent antifoaming, dispersing and emulsifying properties even at a low temperature.
다른 바람직한 소포제로는 등유, 파라핀 등과 같은 광유계 소포제, 동식물유, 참기름, 피마자유와 이들의 알킬렌옥사이드 부가물 등과 같은 유지계 소포제, 올레인산, 스테아린산과 이들의 알킬렌옥사이드 부가물 등과 간은 지방산계 소포제, 글리세린모노리시놀레이트, 알케닐호박산 유동체, 솔비톨모노라울에이트, 솔비톨트리올레이트, 천연 왁스 등과 같은 지방산 에스테르계 소포제, 폴리옥시알킬렌류, (폴리)옥시알킬에테르류, 아세틸렌에테르류, (폴리)옥시알킬렌알킬인산에스테르류, (폴리)옥시알킬렌알킬아민류,(폴리)옥시알킬렌아미드 등과 같은 옥시알킬렌계 소포제, 옥틸알콜, 헥사데실알콜, 아세틸렌알콜, 글리콜류 등과 같은 알콜계 소포제, 아크릴레이트폴리아민 등과 같은 아미드계 소포제, 인산트리부틸, 나트륨옥틸포스페이트 등과 같은 인산에스테르계 소포제, 알루미늄스테아레이트, 칼슘올레이트 등과 같은 금속비누계 소포제, 디메틸실리콘유, 실리콘 페이슷, 실리콘 에멀젼, 유기변성 폴리실록산(디메틸폴리실록산 등의 폴리오르가노실록산). 플루오로실리콘유 등과 같은 실리콘계 소포제로 이루어진 군에서 선택되는 어느 하나 이상이 사용될 수 있으나, 이에 제한되는 것은 아니다.Other preferred defoaming agents include mineral oil defoaming agents such as kerosene and paraffin, retention defoaming agents such as animal and vegetable oils, sesame oil, castor oil and castor oil and their alkylene oxide adducts, oleic acid, stearic acid and their alkylene oxide adducts, Fatty acid ester antifoaming agents such as antifoaming agents, glycerin monoricinolate, alkenyl succinic acid liquid, sorbitol monolaurate, sorbitol trioleate, and natural wax, polyoxyalkylene, (poly) oxyalkyl ethers, acetylene ethers, Oxyalkylene antifoaming agents such as (poly) oxyalkylene alkylphosphoric acid esters, (poly) oxyalkylene alkylamines and (poly) oxyalkylene amides, alcohols such as octyl alcohol, hexadecyl alcohol, acetylene alcohol and glycols Defoaming agents, amide-based antifoaming agents such as acrylate polyamines and the like, tributyl phosphate, sodium octyl phosphate and the like A metal soap antifoaming agent such as a phosphate ester antifoaming agent, aluminum stearate, calcium oleate, etc., a dimethyl silicone oil, a silicone paste, a silicone emulsion, and an organic modified polysiloxane (a polyorganosiloxane such as a dimethylpolysiloxane). And silicone-based antifoaming agents such as fluorosilicone oil, etc., but is not limited thereto.
한편, 상기 분산제는 당업계에서 통상적으로 사용하는 분산제라면 어떠한 것을 사용하여도 무방하지만, 바람직하게는 폴리카르본산계 분산제를 사용하는 것이 좋다.The dispersant may be any dispersant conventionally used in the art, but it is preferable to use a polycarboxylic acid-based dispersant.
또한, 상기 열안정제는 폴리페놀계, 포스파이트계, 락톤계 또는 이들의 혼합물을 사용하는 것이 좋다.
The heat stabilizer may be a polyphenol-based, phosphite-based, lactone-based or a mixture thereof.
전술한 구성을 갖는 본 발명에 따른 광경화성 수지 조성물은 점도가 25℃에서 200 내지 1500cps인 것이 좋다. 점도가 200cps 미만인 경우 코팅 두께가 너무 얇아져 충분한 탄성력을 확보하기 어려울 수 있고, 1500cps 초과인 경우 점도가 너무 높아져 작업성이 저하되고 코팅 두께가 너무 두꺼워질 수 있다.The photo-curing resin composition according to the present invention having the above-described structure preferably has a viscosity of 200 to 1500 cps at 25 占 폚. If the viscosity is less than 200 cps, the coating thickness becomes too thin, and it may be difficult to secure a sufficient elasticity. If the viscosity exceeds 1500 cps, the viscosity may become too high, and the workability may be deteriorated and the coating thickness may become too thick.
본 발명에 따른 광경화성 수지 조성물은 굴절률이 높아 상승된 휘도를 갖고 헤이즈가 낮으며 황변이 없고, 수축이 적어 우수한 표면 경도를 부여할 수 있을 뿐만 아니라, 탄성력이 좋아 프리즘 시트 및/또는 광학필름에 특히 적합할 수 있다.The photo-curable resin composition according to the present invention has a high refractive index and thus has an increased brightness, low haze, no yellowing, less shrinkage and an excellent surface hardness, as well as being excellent in elasticity, Particularly suitable.
한편, 본 발명은 기재의 적어도 일면에 상기 광경화성 수지 조성물로 코팅된 프리즘층이 구비된 프리즘 시트를 제공한다.According to another aspect of the present invention, there is provided a prism sheet including a prism layer coated on the at least one surface with the photocurable resin composition.
기재의 종류는 특별히 한정되지 않지만, 바람직하게는 폴리에틸렌테레프탈레이트(PET) 또는 폴리카보네이트(PC)로 된 투명 광학용 고분자 기재를 포함할 수 있다. The kind of the base material is not particularly limited, but preferably includes a polymer base material for transparent optics made of polyethylene terephthalate (PET) or polycarbonate (PC).
또한, 이 투명 광학용 고분자 기재는 일면에 수분산 폴리우레탄 또는 아크릴 에멀젼이 1 내지 2㎛ 두께로 코팅되어 프라이머층이 형성될 수도 있다.In addition, the transparent base polymer substrate may be coated with a water-dispersed polyurethane or acrylic emulsion in a thickness of 1 to 2 m on one side to form a primer layer.
상기 기재의 두께는 특별히 한정되지 않지만, 바람직하게는 1 내지 200㎛, 특히 바람직하게는 20 내지 100㎛인 것이 좋다.The thickness of the substrate is not particularly limited, but is preferably 1 to 200 占 퐉, particularly preferably 20 to 100 占 퐉.
이러한 기재의 적어도 일면에 광경화성 수지 조성물을 코팅한 후 경화시켜 프리즘층을 형성할 수 있다.The photocurable resin composition may be coated on at least one side of such a substrate and then cured to form a prism layer.
본 발명에 따른 광경화성 수지 조성물의 코팅은 당 분야에서 공지된 방법으로 수행될 수 있으며, 이러한 일례로서 그라비아 코팅, 롤 코팅, 나이프 코팅 등을 이용할 수 있다. The coating of the photocurable resin composition according to the present invention can be performed by a method known in the art. Examples of such coatings include gravure coating, roll coating, knife coating and the like.
상기 코팅시 그 두께는 광경화 후 1 내지 50㎛, 바람직하게 5 내지 40㎛, 보다 바람직하게 5 내지 15㎛인 것이 좋다.The thickness at the time of coating is preferably 1 to 50 占 퐉, preferably 5 to 40 占 퐉, more preferably 5 to 15 占 퐉 after photocuring.
코팅된 광경화성 수지 조성물의 경화에는 고압수은 램프, 무전극 램프, 크세논(xenon) 램프, 메탈할라이드 계열의 램프 등을 이용할 수 있으며, 예컨대 365㎚를 주파장으로 하는 메탈할라이드 계열의 램프가 바람직하다. For curing the coated photocurable resin composition, a high-pressure mercury lamp, a non-electrode lamp, a xenon lamp, a metal halide lamp or the like can be used, and for example, a metal halide lamp having a main wavelength of 365 nm is preferable .
또한, 조사량은 약 0.1 내지 2J/㎠, 바람직하게 0.2 내지 0.5J/㎠인 것이 좋다.It is also preferable that the irradiation amount is about 0.1 to 2 J / cm 2, preferably 0.2 to 0.5 J / cm 2.
이와 같이 형성된 프리즘층은 높이가 5 내지 50㎛이고 삼각형 형상의 단면을 갖는 복수개의 프리즘 산이 배열된 것일 수 있다.The prism layer thus formed may have a plurality of prism mountains having a height of 5 to 50 mu m and a triangular cross-section.
본 발명의 프리즘 시트는 휘도가 높고 헤이즈가 낮으며 색변화와 황변이 없고, 프리즘 산의 표면 경도가 우수한 동시에 탄성력이 좋아 프리즘 산의 형상 파괴가 적을 뿐만 아니라 기재와의 접착력이 우수한 특성을 갖는다.The prism sheet of the present invention has high brightness, low haze, no color change and no yellowing, excellent surface hardness of the prismatic acid, good elasticity, and good properties of adhesion to the substrate as well as reduced shape fracture of the prismatic acid.
또한, 본 발명은 상기 프리즘 시트를 구비한 백라이트 유닛과 이 백라이트 유닛을 구비한 액정표시장치를 제공한다.The present invention also provides a backlight unit including the prism sheet and a liquid crystal display device including the backlight unit.
상기 백라이트 유닛의 구조는 특별히 한정되지 않으며, 당업계의 통상적인 구조의 것일 수 있다. 예컨대, 냉음극선관(CCFL), 발광다이오드(LED) 등의 광원, 도광판, 확산시트 또는 확산판과 함께 상기 프리즘 시트를 구비할 수 있다.The structure of the backlight unit is not particularly limited, and may be a conventional structure in the art. For example, the prism sheet may be provided together with a light source such as a cold cathode ray tube (CCFL) or a light emitting diode (LED), a light guide plate, a diffusion sheet, or a diffusion plate.
이러한 백라이트 유닛은 액정표시장치 이외에도 플라즈마표시장치(PDP), 전계방출소자(FED), 유기발광다이오드 소자, 무기발광다이오드소자, 전자 페이퍼 등에 적용될 수 있다.
Such a backlight unit may be applied to a plasma display device (PDP), a field emission device (FED), an organic light emitting diode device, an inorganic light emitting diode device, an electronic paper, etc. in addition to a liquid crystal display device.
이하에서 실시예를 통하여 본 발명을 구체적으로 설명하기로 한다. 그러나 하기의 실시예는 오로지 본 발명을 구체적으로 설명하기 위한 것으로 이들 실시예에 의해 본 발명의 범위를 한정하는 것은 아니다.
Hereinafter, the present invention will be described in detail by way of examples. However, the following examples are for illustrative purposes only and are not intended to limit the scope of the present invention.
[실시예 1][Example 1]
4,4'-(propane-2,2-diyl)diphenol (0.570g, 2.5mmol)을 출발물질로 하여 50mL 둥근바닥 플라스크에 KOH(0.295g, 5.0mmol)를 첨가한 후 메탄올과 함께 교반하였다.KOH (0.295 g, 5.0 mmol) was added to a 50 mL round bottom flask using 4,4 '- (propane-2,2-diyl) diphenol (0.570 g, 2.5 mmol) as a starting material and stirred with methanol.
그 다음, 반응 시약들이 반응용매에 완전히 녹으면 증발기(evaporator)와 프리즈-펌프(Freeze-pump)를 이용하여 용매를 완전히 제거시켜 건조된 칼륨염을 수득 하였다. Then, when the reaction reagents were completely dissolved in the reaction solvent, the solvent was completely removed using an evaporator and a freeze-pump to obtain a dried potassium salt.
그 다음, 오일 베스의 온도를 60 내지 90℃까지 올린 후 플라스크를 오일 베스에 담그고 3.91mL, 10.0mmol의 에피클로히드린(epichlorohydrin)을 용매 겸 시약으로 사용하여 약 60℃에서 약 30분 반응을 수행하였다. Then, the temperature of the oil bath was raised to 60 to 90 ° C., the flask was immersed in an oil bath, and 3.91 mL, 10.0 mmol of epichlorohydrin as a solvent and reagent was reacted at about 60 ° C. for about 30 minutes Respectively.
그 다음, 반응 후 염수로 반응용액을 씻어준 후, 충분한 양의 CH2Cl2를 이용하여 수용액으로부터 생성물을 추출하였다. Then, after the reaction, the reaction solution was washed with brine, and the product was extracted from the aqueous solution using a sufficient amount of CH 2 Cl 2 .
그 다음, Na2SO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다.The water was then removed by Na 2 SO 4 and the solvent was removed under reduced pressure.
그 다음, 수득된 조생성물로부터 실리카겔 칼럼 크로마토그래피(Rf = 0.20, hexane:ethyl acetate = 16 : 1, v/v)를 수행하여 4,4’-다이페놀 글리시딜 에테르 (0.748 g, 88%)를 추출하였다.Then, 4,4'-diphenol glycidyl ether (0.748 g, 88%) was obtained from the obtained crude product by performing silica gel column chromatography (Rf = 0.20, hexane: ethyl acetate = 16: ) Were extracted.
상기 제조방법은 다음 화학식 4와 같다.
The preparation method is shown in the following chemical formula 4.
<화학식 4>≪ Formula 4 >
그 다음, 상기 추출된 4,4’-다이페놀 글리시딜 에테르(0.6828 g, 2.0 mmol)을 50 mL 둥근바닥 플라스크에 넣고 소량의 톨루엔에 녹인 후 아크릴산 (0.2957 g, 4.09 mmol)을 넣고 약 100℃에서 약 20시간 반응 시켰다. Then, the extracted 4,4'-diphenol glycidyl ether (0.6828 g, 2.0 mmol) was added to a 50 mL round bottom flask and dissolved in a small amount of toluene. Then, acrylic acid (0.2957 g, 4.09 mmol) Lt; 0 > C for about 20 hours.
그 다음, 반응이 종결된 후 MgSO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다. Then, after the reaction was completed, water was removed by MgSO 4 , and the solvent was removed under reduced pressure.
그 다음, 수득된 생성물로부터 실리카겔 칼럼 크로마토그래피(Rr = 0.25, hexane:ethyl acetate = 15:1, v/v)를 수행하여 비스(4,4’-다이페놀) 아크릴레이트(0.6386 g, 70%)를 추출하였다.
Then, bis (4,4'-diphenol) acrylate (0.6386 g, 70%) was obtained from the obtained product by performing a silica gel column chromatography (Rr = 0.25, hexane: ethyl acetate = 15: ) Were extracted.
상기 제조방법은 다음 화학식 5와 같다.
The preparation method is shown in the following chemical formula 5.
<화학식 5>≪ Formula 5 >
[실시예 2][Example 2]
4,4'-(1,4-phenylenebis(propane-2,2-diyl))diphenol(0.865g, 2.5mmol)을 출발물질로 하여 50mL 둥근바닥 플라스크에 KOH(0.295g, 5.0mmol)를 첨가한 후 메탄올과 함께 교반하였다. KOH (0.295 g, 5.0 mmol) was added to a 50 mL round bottom flask using 4,4 '- (1,4-phenylenebis (propane-2,2-diyl) diphenol (0.865 g, 2.5 mmol) Followed by stirring with methanol.
그 다음, 반응 시약들이 반응용매에 완전히 녹으면 증발기(evaporator)와 프리즈-펌프(Freeze-pump)를 이용하여 용매를 완전히 제거시켜 건조된 칼륨염을 얻었다. Then, when the reaction reagents were completely dissolved in the reaction solvent, the solvent was completely removed using an evaporator and a freeze-pump to obtain a dried potassium salt.
그 다음, 오일 베스의 온도를 60 내지 90℃까지 올린 후 플라스크를 오일 베스에 담그고 에피클로히드린(epichlorohydrin)(3.91mL, 10.0mmol)을 용매 겸 시약으로 사용하여 약 60℃에서 약 30분 반응을 수행하였다. Then, the temperature of the oil bath was raised to 60 to 90 ° C., the flask was immersed in an oil bath, and epichlorohydrin (3.91 mL, 10.0 mmol) was used as a solvent and reagent at about 60 ° C. for about 30 minutes Respectively.
그 다음, 반응 후 염수로 반응용액을 씻어준 후, 충분한 양의 CH2Cl2를 이용하여 수용액으로부터 생성물을 추출하였다. Na2SO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다. Then, after the reaction, the reaction solution was washed with brine, and the product was extracted from the aqueous solution using a sufficient amount of CH 2 Cl 2 . The water was removed by Na 2 SO 4 and the solvent was removed under reduced pressure.
그 다음, 얻어진 조생성물로부터 실리카겔 칼럼 크로마토그래피(Rf = 0.25, hexane:ethyl acetate = 16 : 1, v/v)를 수행하여 1,4-bis(2-(4-(oxiran-2-ylmethoxy)phenyl)propan-2-yl)benzene(0.976g, 85%)를 추출하였다.
The resulting crude product was subjected to silica gel column chromatography (Rf = 0.25, hexane: ethyl acetate = 16: 1, v / v) to obtain 1,4-bis (2- (4- (oxiran- 2- ylmethoxy) phenyl) propan-2-yl) benzene (0.976 g, 85%).
상기 제조방법은 다음 화학식 6과 같다.
The preparation method is shown in the following chemical formula (6).
<화학식 6>(6)
그 다음, 상기 추출된 1,4-bis(2-(4-(oxiran-2-ylmethoxy)phenyl)propan-2-yl)benzene (0.917 g, 2.0 mmol)을 50mL 둥근바닥 플라스크에 넣고 소량의 톨루엔에 녹인 후 아크릴산(0.2957g, 4.09mmol)을 넣고 100℃에서 20시간 반응 시켰다. Then, the extracted 1,4-bis (2- (4- (oxiran-2-ylmethoxy) phenyl) propan-2-yl) benzene (0.917 g, 2.0 mmol) was placed in a 50 mL round bottom flask, , And acrylic acid (0.2957 g, 4.09 mmol) was added thereto, followed by reaction at 100 ° C for 20 hours.
그 다음, 반응이 종결된후 MgSO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다. 얻어진 생성물로부터 실리카겔 칼럼 크로마토그래피(Rr = 0.23, hexane:ethyl acetate = 15:1, v/v)를 수행하여 (((1,4-phenylenebis(propane-2,2-diyl))bis(4,1-phenylene))bis(oxy))bis(2-hydroxypropane-3,1-diyl) diacrylate(1.084 g, 90%)를 추출하였다.
Then, after the reaction was completed, water was removed by MgSO 4 , and the solvent was removed under reduced pressure. The obtained product was subjected to silica gel column chromatography (Rr = 0.23, hexane: ethyl acetate = 15: 1, v / v) to obtain (((1,4-phenylenebis (propane-2,2- 1-phenylene)) bis (oxy)) bis (2-hydroxypropane-3,1-diyl) diacrylate (1.084 g, 90%).
상기 제조방법은 다음 화학식 7과 같다.The preparation method is shown in the following chemical formula (7).
<화학식 7>≪ Formula 7 >
[실시예 3][Example 3]
4'-(2-(4-(2-(4-hydroxyphenyl)propan-2-yl)phenyl)propan-2-yl)-[1,1'-biphenyl]-4-ol (1.05 g, 2.5 mmol)을 출발물질로 하여 50mL 둥근바닥 플라스크에 KOH(0.295g, 5.0mmol)를 첨가한 후 메탄올과 함께 교반하였다. 2-yl) - [1,1'-biphenyl] -4-ol (1.05 g, 2.5 mmol) was added to a solution of 4 '- (2- (4- (2- (4- hydroxyphenyl) propan- ) As a starting material, KOH (0.295 g, 5.0 mmol) was added to a 50 mL round bottom flask, and the mixture was stirred with methanol.
그 다음, 반응 시약들이 반응용매에 완전히 녹으면 증발기(evaporator)를 이용하여 용매를 완전히 제거시켜 건조된 칼륨염을 얻었다. 오일 베스의 온도를 60 내지 90 ℃까지 올린 후 플라스크를 오일 베스에 담그고 에피클로히드린(epichlorohydrin)(3.91 mL, 10.0 mmol)을 용매 겸 시약으로 사용하여 약 60℃에서 약 30분 반응을 수행하였다. Then, when the reaction reagents were completely dissolved in the reaction solvent, the solvent was completely removed using an evaporator to obtain a dried potassium salt. After raising the temperature of the oil bath to 60 to 90 ° C, the flask was immersed in an oil bath and reaction was carried out at about 60 ° C for about 30 minutes using epichlorohydrin (3.91 mL, 10.0 mmol) as a solvent and reagent .
그 다음, 반응 후 염수로 반응용액을 씻어준 후, 충분한 양의 CH2Cl2를 이용하여 수용액으로부터 생성물을 추출하였다. Then, after the reaction, the reaction solution was washed with brine, and the product was extracted from the aqueous solution using a sufficient amount of CH 2 Cl 2 .
그 다음, Na2SO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다. The water was then removed by Na 2 SO 4 and the solvent was removed under reduced pressure.
그 다음, 얻어진 조생성물로부터 실리카겔 칼럼 크로마토그래피(Rf = 0.23, hexane:ethyl acetate = 16 : 1, v/v)를 수행하여 2,2'-(((((propane-2,2-diylbis(4,1-phenylene))bis(propane-2,2-diyl))bis(4,1-phenylene))bis(oxy))bis(methylene))bis(oxirane)(1.20g, 83%)를 추출하였다.
The obtained crude product was then subjected to silica gel column chromatography (Rf = 0.23, hexane: ethyl acetate = 16: 1, v / v) to obtain 2,2 '- (((((propane-2,2-diylbis Bis (4,1-phenylene)) bis (oxy)) bis (methylene) bis (oxirane) (1.20 g, 83%) was extracted Respectively.
상기 제조방법은 다음 화학식 8과 같다.
The preparation method is shown in the following chemical formula (8).
<화학식 8>(8)
그 다음, 상기 추출된 2,2'-(((((propane-2,2-diylbis(4,1-phenylene))bis(propane-2,2-diyl))bis(4,1-phenylene))bis(oxy))bis(methylene))bis(oxirane) (1.15g, 2.0mmol)을 50 mL 둥근바닥 플라스크에 넣고 소량의 톨루엔에 녹인 후 아크릴산 (0.2957g, 4.09mmol)을 넣고 100℃에서 20시간 반응 시켰다. 반응이 종결된후 MgSO4에 의해 수분을 제거하고, 감압 하에 용매를 제거하였다. 얻어진 생성물로부터 실리카겔 칼럼 크로마토그래피(Rr = 0.23, hexane:ethyl acetate = 15:1, v/v)를 수행하여 ((((propane-2,2-diylbis(4,1-phenylene))bis(propane-2,2-diyl))bis(4,1-phenylene))bis(oxy))bis(2-hydroxypropane-3,1-diyl) diacrylate (1.32 g, 92%)를 추출 하였다.
Then, the extracted 2,2 '- ((((propane-2,2-diylbis (4,1-phenylene)) bis (propane-2,2- bis (oxy)) bis (methylene) bis (oxirane) (1.15 g, 2.0 mmol) were dissolved in a small amount of toluene, and then acrylic acid (0.2957 g, 4.09 mmol) Lt; / RTI > After the reaction was completed, water was removed by MgSO4 and the solvent was removed under reduced pressure. The resulting product was purified by silica gel column chromatography (Rr = 0.23, hexane: ethyl acetate = 15: 1, v / v) to give (propane-2,2-diylbis (4,1- Bis (4,1-phenylene)) bis (oxy)) bis (2-hydroxypropane-3,1-diyl) diacrylate (1.32 g, 92%).
상기 제조방법은 다음 화학식 9와 같다.
The preparation method is shown in the following chemical formula (9).
<화학식 9>≪ Formula 9 >
[실시예 4][Example 4]
실시예 1에 따라 제조된 비스(4,4’-다이페놀) 아크릴레이트 모노머 42g, 반응성 아크릴레이트 모노머인 메틸(메타)아크릴레이트 55g 및 광중합 개시제인 벤조페논 3g을 혼합하여 광경화성 수지 조성물을 제조하였다.
42 g of bis (4,4'-diphenol) acrylate monomer prepared according to Example 1, 55 g of methyl (meth) acrylate as a reactive acrylate monomer and 3 g of benzophenone as a photopolymerization initiator were mixed to prepare a photocurable resin composition Respectively.
[실시예 5][Example 5]
실시예 4에 따라 제조된 광경화성 수지 조성물에 지방족 설포네이트 5g을 더 포함시켜 광경화성 수지 조성물을 제조하였다.
5 g of an aliphatic sulfonate was further contained in the photo-curable resin composition prepared in Example 4 to prepare a photo-curable resin composition.
[실시예 6][Example 6]
실시예 4에 따라 제조된 광경화성 수지 조성물에 비스페놀A디글리스딜에테르디(메타)아크릴레이트 10g을 더 포함시켜 광경화성 수지 조성물을 제조하였다.
10 g of bisphenol A diglycidyl ether di (meth) acrylate was further contained in the photocurable resin composition prepared in Example 4 to prepare a photocurable resin composition.
[실시예 7][Example 7]
실시예 4에 따라 제조된 광경화성 수지 조성물에 디알릴프탈레이트와 펜타에리스리톨테트라(3－머캅토프로피오네이트)가 2:1의 당량비로 혼합된 혼합물 7g을 더 포함시켜 광경화성 수지 조성물을 제조하였다.
7 g of a mixture of diallyl phthalate and pentaerythritol tetra (3-mercaptopropionate) in an equivalent ratio of 2: 1 was further added to the photo-curable resin composition prepared in Example 4 to prepare a photocurable resin composition .
[실시예 8][Example 8]
실시예 4에 따라 제조된 광경화성 수지 조성물에 불소실리콘 수지 2g을 더 포함시켜 광경화성 수지 조성물을 제조하였다.
2 g of a fluorosilicone resin was further contained in the photo-curable resin composition prepared in Example 4 to prepare a photo-curable resin composition.
[실시예 9][Example 9]
실시예 4에 따라 제조된 광경화성 수지 조성물에 인산계 아크릴레이트 3g을 더 포함시켜 광경화성 수지 조성물을 제조하였다.
3 g of phosphoric acid-based acrylate was further contained in the photocurable resin composition prepared in Example 4 to prepare a photocurable resin composition.
이상에서 설명한 바와 같이, 본 발명이 속하는 기술 분야의 당업자는 본 발명이 그 기술적 사상이나 필수적 특징을 변경하지 않고서 다른 구체적인 형태로 실시될 수 있다는 것을 이해할 수 있을 것이다. 그러므로 이상에서 기술한 실시예는 모두 예시적인 것이며 한정적인 것이 아닌 것으로서 이해해야만 한다. 본 발명의 범위는 상기 상세한 설명보다는 후술하는 특허청구범위의 의미 및 범위 그리고 그 등가개념으로부터 도출되는 모두 변경 또는 변형된 형태가 본 발명의 범위에 포함되는 것으로 해석되어야 한다.
As described above, those skilled in the art will understand that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. It is therefore to be understood that the embodiments described above are all illustrative and not restrictive. The scope of the present invention should be construed as being included in the scope of the present invention without departing from the scope of the present invention.
Claims (6)
한 개 이상의 작용기를 갖는 반응성 아크릴레이트 모노머 30 내지 70중량부; 및
벤조페논, 벤조페논 유도체, 벤조인, 벤조인 알킬 에테르 벤질디메틸케탈, 1-하이드록시 사이클로 헥실 페닐케톤, 디에톡시 아세토페논, 포스핀 옥사이드계, 아미노 아세토페논계, 2-하이드록시-2-메틸-1-페닐프로파-1-논, 2-벤질-2-디메틸아미드-1- (4-몰포리나페닐)-부타난으로 이루어진 군 으로부터 선택된 적어도 하나를 포함하는 광중중합 개시제 1 내지 10중량부를 포함하는 광경화성 수지 조성물에,
비스페놀A디글리스딜에테르디(메타)아크릴레이트를 광경화성 수지조성물 전체 중량부를 기준으로 0.01 내지 30중량부로 더 포함하고,
디알릴프탈레이트와 펜타에리스리톨테트라(3－머캅토프로피오네이트)가 2:1의 당량비로 혼합된 혼합물을 광경화성 수지조성물 전체 중량부를 기준으로 3 내지 15중량부로 더 포함하며,
인산계 아크릴레이트를 광경화성 수지조성물 전체 중량부를 기준으로 1 내지 5중량부로 더 포함하고,
불소실리콘 수지를 광경화성 수지조성물 전체 중량부를 기준으로 0.1 내지 5중량부로 더 포함하며,
지방족 설포네이트를 광경화성 수지조성물 전체 중량부를 기준으로 0.01 내지 10중량부로 더 포함하는 광경화성 수지 조성물.
[화학식 1]
[화학식 2]
[화학식 3]
20 to 60 parts by weight of an acrylate monomer comprising the general formula (1) to (3) or a mixture thereof;
30 to 70 parts by weight of a reactive acrylate monomer having at least one functional group; And
Benzophenone derivatives, benzoin, benzoin alkyl ether benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethoxy acetophenone, phosphine oxide type aminoacetophenone type, 2-hydroxy-2-methyl -1-phenylpropar-1-one, and 2-benzyl-2-dimethylamide-1- (4-morpholinaphenyl) -butanone. To the photo-curing resin composition,
Further comprising 0.01 to 30 parts by weight of bisphenol A diglycidyl ether di (meth) acrylate based on the total weight of the photocurable resin composition,
Further comprising 3 to 15 parts by weight, based on the total weight of the photocurable resin composition, of a mixture of diallyl phthalate and pentaerythritol tetra (3-mercaptopropionate) in an equivalent ratio of 2: 1,
Further comprising 1 to 5 parts by weight of phosphoric acid based acrylate based on the total weight of the photocurable resin composition,
Further comprising 0.1 to 5 parts by weight of a fluorosilicone resin based on the total weight of the photocurable resin composition,
Wherein the aliphatic sulfonate is further contained in an amount of 0.01 to 10 parts by weight based on the total weight of the photocurable resin composition.
[Chemical Formula 1]
(2)
(3)
An optical film comprising the photo-curable resin composition according to claim 1.
A prism sheet comprising the photocurable resin composition according to claim 1.
A liquid crystal display unit comprising the photo-curing resin composition according to claim 1.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20080102749A (en) * | 2007-05-22 | 2008-11-26 | 동우 화인켐 주식회사 | Curable coating composition and self-recovered prism sheet |
| KR20090121895A (en) * | 2008-05-23 | 2009-11-26 | 주식회사 코오롱 | Photopolymerizable composition and optical sheet |
| KR20110111628A (en) * | 2010-04-05 | 2011-10-12 | 동우 화인켐 주식회사 | Uv curable resin composition, prism sheet of the same, and backlight unit and liquid crystal display device using the sheet |
| KR20120131419A (en) * | 2011-05-25 | 2012-12-05 | 동우 화인켐 주식회사 | UV Curable Resin Composition, Prism Sheet Using the same, Backlight Unit and Liquid Crystal Display Device Including the sheet |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20080102749A (en) * | 2007-05-22 | 2008-11-26 | 동우 화인켐 주식회사 | Curable coating composition and self-recovered prism sheet |
| KR20090121895A (en) * | 2008-05-23 | 2009-11-26 | 주식회사 코오롱 | Photopolymerizable composition and optical sheet |
| KR20110111628A (en) * | 2010-04-05 | 2011-10-12 | 동우 화인켐 주식회사 | Uv curable resin composition, prism sheet of the same, and backlight unit and liquid crystal display device using the sheet |
| KR20120131419A (en) * | 2011-05-25 | 2012-12-05 | 동우 화인켐 주식회사 | UV Curable Resin Composition, Prism Sheet Using the same, Backlight Unit and Liquid Crystal Display Device Including the sheet |
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